JPS53128278A - Production of lsi mask - Google Patents
Production of lsi maskInfo
- Publication number
- JPS53128278A JPS53128278A JP4200877A JP4200877A JPS53128278A JP S53128278 A JPS53128278 A JP S53128278A JP 4200877 A JP4200877 A JP 4200877A JP 4200877 A JP4200877 A JP 4200877A JP S53128278 A JPS53128278 A JP S53128278A
- Authority
- JP
- Japan
- Prior art keywords
- production
- mask
- lsi mask
- lsi
- faces
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
PURPOSE: To eliminate the need for covering faces other than a chip face and reduce mask negative production processes at the time of exposing the mask negative by utilizing all the faces, other than the chip face, of a dry plate for forming an LSI mask.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4200877A JPS53128278A (en) | 1977-04-14 | 1977-04-14 | Production of lsi mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4200877A JPS53128278A (en) | 1977-04-14 | 1977-04-14 | Production of lsi mask |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS53128278A true JPS53128278A (en) | 1978-11-09 |
Family
ID=12624144
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4200877A Pending JPS53128278A (en) | 1977-04-14 | 1977-04-14 | Production of lsi mask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53128278A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6244740A (en) * | 1985-08-23 | 1987-02-26 | Hoya Corp | Formation of pattern |
JPS6247642A (en) * | 1985-08-27 | 1987-03-02 | Hoya Corp | Pattern forming method |
JPS62179748U (en) * | 1987-04-23 | 1987-11-14 | ||
JPS63200152A (en) * | 1987-02-17 | 1988-08-18 | Matsushita Electronics Corp | Mask for producing semiconductor |
JPH04177348A (en) * | 1990-11-13 | 1992-06-24 | Nec Yamaguchi Ltd | Reticule for reduction projection aligner |
-
1977
- 1977-04-14 JP JP4200877A patent/JPS53128278A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6244740A (en) * | 1985-08-23 | 1987-02-26 | Hoya Corp | Formation of pattern |
JPH0355815B2 (en) * | 1985-08-23 | 1991-08-26 | ||
JPS6247642A (en) * | 1985-08-27 | 1987-03-02 | Hoya Corp | Pattern forming method |
JPS63200152A (en) * | 1987-02-17 | 1988-08-18 | Matsushita Electronics Corp | Mask for producing semiconductor |
JPS62179748U (en) * | 1987-04-23 | 1987-11-14 | ||
JPS638900Y2 (en) * | 1987-04-23 | 1988-03-16 | ||
JPH04177348A (en) * | 1990-11-13 | 1992-06-24 | Nec Yamaguchi Ltd | Reticule for reduction projection aligner |
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