JPS53117383A - Production of photo mask - Google Patents
Production of photo maskInfo
- Publication number
- JPS53117383A JPS53117383A JP3254877A JP3254877A JPS53117383A JP S53117383 A JPS53117383 A JP S53117383A JP 3254877 A JP3254877 A JP 3254877A JP 3254877 A JP3254877 A JP 3254877A JP S53117383 A JPS53117383 A JP S53117383A
- Authority
- JP
- Japan
- Prior art keywords
- photo mask
- production
- durability
- potential
- plate surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
PURPOSE: To rapidly obtain a photo mask having durability and resolution equivalent to those of ordinary hard masks by making use of physical phenomena being the change in the potential, i.e., charge density, on dry plate surface for photo mask through light radiation.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3254877A JPS53117383A (en) | 1977-03-23 | 1977-03-23 | Production of photo mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3254877A JPS53117383A (en) | 1977-03-23 | 1977-03-23 | Production of photo mask |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS53117383A true JPS53117383A (en) | 1978-10-13 |
Family
ID=12361976
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3254877A Pending JPS53117383A (en) | 1977-03-23 | 1977-03-23 | Production of photo mask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53117383A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2003050618A1 (en) * | 2001-12-11 | 2003-06-19 | Renesas Technology Corp. | Method for manufacturing wiring board |
JP2007298805A (en) * | 2006-05-01 | 2007-11-15 | Seiko Epson Corp | Photomask, method for manufacturing photomask, device for manufacturing photomask, and circuit board |
CN104244767A (en) * | 2012-04-02 | 2014-12-24 | 株式会社百客美 | Hair measurement tool |
-
1977
- 1977-03-23 JP JP3254877A patent/JPS53117383A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2003050618A1 (en) * | 2001-12-11 | 2003-06-19 | Renesas Technology Corp. | Method for manufacturing wiring board |
JP2007298805A (en) * | 2006-05-01 | 2007-11-15 | Seiko Epson Corp | Photomask, method for manufacturing photomask, device for manufacturing photomask, and circuit board |
CN104244767A (en) * | 2012-04-02 | 2014-12-24 | 株式会社百客美 | Hair measurement tool |
CN104244767B (en) * | 2012-04-02 | 2017-02-22 | 株式会社百客美 | Hair measurement tool |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5383617A (en) | Recording material | |
JPS5228875A (en) | Mask | |
JPS53117383A (en) | Production of photo mask | |
JPS5394770A (en) | Photo mask | |
JPS5361280A (en) | Pattern projector | |
JPS51126073A (en) | Pattern printing equpment made available by photo-etching method | |
JPS5389673A (en) | Fine pattern forming method of semiconductor device | |
JPS53116831A (en) | Radioactive-ray sensitive material | |
JPS51111073A (en) | Fine pattern forming | |
JPS5429975A (en) | Photo mask | |
JPS5399772A (en) | Optical mask | |
JPS5314570A (en) | Production of photo mask | |
JPS5375768A (en) | Size check pattern | |
JPS5421273A (en) | Manufacture for photo mask | |
JPS542745A (en) | Image former | |
JPS53120528A (en) | Positive type radiation sensitive material | |
JPS5437579A (en) | Chrome plate | |
JPS53135844A (en) | Photochemical etching procee | |
JPS5350938A (en) | Generation of character pattern | |
JPS5555528A (en) | Mask aligner | |
JPS53125023A (en) | Radiation sensitive resist composition | |
JPS5240339A (en) | Electrophotographic printing machine | |
JPS52117072A (en) | Hard mask | |
JPS5354974A (en) | Electron beam exposure system | |
JPS5440572A (en) | Electron-beam pattern projector |