JPS53110378A - Plasma carrying device - Google Patents

Plasma carrying device

Info

Publication number
JPS53110378A
JPS53110378A JP2477777A JP2477777A JPS53110378A JP S53110378 A JPS53110378 A JP S53110378A JP 2477777 A JP2477777 A JP 2477777A JP 2477777 A JP2477777 A JP 2477777A JP S53110378 A JPS53110378 A JP S53110378A
Authority
JP
Japan
Prior art keywords
plasma
carrying device
plasma carrying
simplify
ensuring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2477777A
Other languages
Japanese (ja)
Other versions
JPS6139730B2 (en
Inventor
Takashi Tsuchimoto
Kuniyuki Sakumichi
Keizo Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP2477777A priority Critical patent/JPS53110378A/en
Publication of JPS53110378A publication Critical patent/JPS53110378A/en
Publication of JPS6139730B2 publication Critical patent/JPS6139730B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE: To simplify the structure of the deposition device for the semiconductor substrate by the plasma current or the etching device and also ensuring a stabilized operation for a long time, by using the microwave discharge via a disc waveguide for the plasma growing means used in the plasma generating chamber.
COPYRIGHT: (C)1978,JPO&Japio
JP2477777A 1977-03-09 1977-03-09 Plasma carrying device Granted JPS53110378A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2477777A JPS53110378A (en) 1977-03-09 1977-03-09 Plasma carrying device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2477777A JPS53110378A (en) 1977-03-09 1977-03-09 Plasma carrying device

Related Child Applications (3)

Application Number Title Priority Date Filing Date
JP17294883A Division JPS59103341A (en) 1983-09-21 1983-09-21 Plasma processing apparatus
JP17294683A Division JPS59103331A (en) 1983-09-21 1983-09-21 Plasma processing apparatus
JP17294783A Division JPS59103340A (en) 1983-09-21 1983-09-21 Plasma processing apparatus

Publications (2)

Publication Number Publication Date
JPS53110378A true JPS53110378A (en) 1978-09-27
JPS6139730B2 JPS6139730B2 (en) 1986-09-05

Family

ID=12147595

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2477777A Granted JPS53110378A (en) 1977-03-09 1977-03-09 Plasma carrying device

Country Status (1)

Country Link
JP (1) JPS53110378A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5440078A (en) * 1977-09-06 1979-03-28 Fujitsu Ltd Ion milling device
JPS56155535A (en) * 1980-05-02 1981-12-01 Nippon Telegr & Teleph Corp <Ntt> Film forming device utilizing plasma
JPS59100516A (en) * 1982-11-12 1984-06-09 エナ−ジ−・コンバ−シヨン・デバイセス・インコ−ポレ−テツド Apparatus and assembly for producing photocell element
JP2009130154A (en) * 2007-11-26 2009-06-11 Ulvac Japan Ltd Vacuum processing apparatus
CN117105521A (en) * 2023-10-25 2023-11-24 武汉市飞瓴光电科技有限公司 Device and method for preparing doped silicon dioxide material

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5440078A (en) * 1977-09-06 1979-03-28 Fujitsu Ltd Ion milling device
JPS5615570B2 (en) * 1977-09-06 1981-04-10
JPS56155535A (en) * 1980-05-02 1981-12-01 Nippon Telegr & Teleph Corp <Ntt> Film forming device utilizing plasma
JPS6243335B2 (en) * 1980-05-02 1987-09-12 Nippon Telegraph & Telephone
JPS59100516A (en) * 1982-11-12 1984-06-09 エナ−ジ−・コンバ−シヨン・デバイセス・インコ−ポレ−テツド Apparatus and assembly for producing photocell element
JP2009130154A (en) * 2007-11-26 2009-06-11 Ulvac Japan Ltd Vacuum processing apparatus
CN117105521A (en) * 2023-10-25 2023-11-24 武汉市飞瓴光电科技有限公司 Device and method for preparing doped silicon dioxide material
CN117105521B (en) * 2023-10-25 2024-01-19 武汉市飞瓴光电科技有限公司 Device and method for preparing doped silicon dioxide material

Also Published As

Publication number Publication date
JPS6139730B2 (en) 1986-09-05

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