JPS53108385A - Manufacture for semiconductor device - Google Patents
Manufacture for semiconductor deviceInfo
- Publication number
- JPS53108385A JPS53108385A JP2268877A JP2268877A JPS53108385A JP S53108385 A JPS53108385 A JP S53108385A JP 2268877 A JP2268877 A JP 2268877A JP 2268877 A JP2268877 A JP 2268877A JP S53108385 A JPS53108385 A JP S53108385A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- manufacture
- semiconductor device
- insulating film
- gate insulating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electrodes Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
PURPOSE: To prevent the deterioration in the performance of the second layer gate insulating film due to the contamination of photo resist process, by forming the gate insulating film as the gate electrodes of the first and second layer with the condition covered polycrystal Si layer.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2268877A JPS53108385A (en) | 1977-03-04 | 1977-03-04 | Manufacture for semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2268877A JPS53108385A (en) | 1977-03-04 | 1977-03-04 | Manufacture for semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS53108385A true JPS53108385A (en) | 1978-09-21 |
Family
ID=12089801
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2268877A Pending JPS53108385A (en) | 1977-03-04 | 1977-03-04 | Manufacture for semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53108385A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5575245A (en) * | 1978-12-04 | 1980-06-06 | Fujitsu Ltd | Method of fabricating semiconductor device |
-
1977
- 1977-03-04 JP JP2268877A patent/JPS53108385A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5575245A (en) * | 1978-12-04 | 1980-06-06 | Fujitsu Ltd | Method of fabricating semiconductor device |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS53108390A (en) | Semiconductor device and its manufacture | |
JPS5351970A (en) | Manufacture for semiconductor substrate | |
JPS5395571A (en) | Semiconductor device | |
JPS53108385A (en) | Manufacture for semiconductor device | |
JPS5222481A (en) | Method of manufacturing semiconductor device | |
JPS531471A (en) | Manufacture for semiconductor device | |
JPS53112686A (en) | Manufacture for semiconductor device | |
JPS5220769A (en) | Longitudinal semi-conductor unit | |
JPS53135581A (en) | Manufacture for mos semiconductor device | |
JPS53123678A (en) | Manufacture of field effect semiconductor device of insulation gate type | |
JPS524789A (en) | Semiconductor equipment | |
JPS5413273A (en) | Semiconductor device | |
JPS5436182A (en) | Manufacture for semiconductor device | |
JPS51145267A (en) | Manufacture of semiconductor device | |
JPS547867A (en) | Manufacture for semiconductor device | |
JPS52144980A (en) | Sos semiconductor device | |
JPS5380160A (en) | Manufacture of substrate for semiconductor device | |
JPS5335375A (en) | Heating method | |
JPS535580A (en) | Field effect type semiconductor device | |
JPS5412566A (en) | Production of semiconductor device | |
JPS5372482A (en) | Manufacture for semiconductor device | |
JPS536579A (en) | Semiconductor device | |
JPS5335383A (en) | Semiconductor device | |
JPS5368081A (en) | Manufacture of mos-structure field effect type semiconductor device | |
JPS5311574A (en) | Production of semiconductor device |