JPS5299072A - Mask for x-ray exposure - Google Patents
Mask for x-ray exposureInfo
- Publication number
- JPS5299072A JPS5299072A JP1497576A JP1497576A JPS5299072A JP S5299072 A JPS5299072 A JP S5299072A JP 1497576 A JP1497576 A JP 1497576A JP 1497576 A JP1497576 A JP 1497576A JP S5299072 A JPS5299072 A JP S5299072A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- ray exposure
- forming
- platinum
- gold
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To obtain good corrosion resistance by forming absorber patterns with dual films comprising of a thin titanium or nickel layer and laminated layer with gold or platinum thereon in a mask for X-ray exposure for removing and forming single crystal silicon being a transparent support substrate by a photoetching method.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1497576A JPS5299072A (en) | 1976-02-16 | 1976-02-16 | Mask for x-ray exposure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1497576A JPS5299072A (en) | 1976-02-16 | 1976-02-16 | Mask for x-ray exposure |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5299072A true JPS5299072A (en) | 1977-08-19 |
JPS5329574B2 JPS5329574B2 (en) | 1978-08-22 |
Family
ID=11875969
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1497576A Granted JPS5299072A (en) | 1976-02-16 | 1976-02-16 | Mask for x-ray exposure |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5299072A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5950443A (en) * | 1982-09-16 | 1984-03-23 | Hitachi Ltd | X-ray mask |
JPS60168145A (en) * | 1984-02-13 | 1985-08-31 | Nec Corp | X-ray exposing mask |
JPH04269832A (en) * | 1991-02-26 | 1992-09-25 | Shin Etsu Chem Co Ltd | Manufacture of mask for x-ray lithography |
JP2016040763A (en) * | 2014-08-13 | 2016-03-24 | 国立研究開発法人産業技術総合研究所 | Electrode for secondary battery operand measurement with soft x-ray |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5577637A (en) * | 1978-12-06 | 1980-06-11 | Toshiba Corp | Ignition control circuit |
JPS613920A (en) * | 1984-06-19 | 1986-01-09 | Taada:Kk | Device of detecting ignition of gas burner |
-
1976
- 1976-02-16 JP JP1497576A patent/JPS5299072A/en active Granted
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5950443A (en) * | 1982-09-16 | 1984-03-23 | Hitachi Ltd | X-ray mask |
JPS60168145A (en) * | 1984-02-13 | 1985-08-31 | Nec Corp | X-ray exposing mask |
JPH0460332B2 (en) * | 1984-02-13 | 1992-09-25 | Nippon Denki Kk | |
JPH04269832A (en) * | 1991-02-26 | 1992-09-25 | Shin Etsu Chem Co Ltd | Manufacture of mask for x-ray lithography |
JP2016040763A (en) * | 2014-08-13 | 2016-03-24 | 国立研究開発法人産業技術総合研究所 | Electrode for secondary battery operand measurement with soft x-ray |
Also Published As
Publication number | Publication date |
---|---|
JPS5329574B2 (en) | 1978-08-22 |
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