JPS5280041A - Method for selectively exposing photosensitive material - Google Patents

Method for selectively exposing photosensitive material

Info

Publication number
JPS5280041A
JPS5280041A JP50156655A JP15665575A JPS5280041A JP S5280041 A JPS5280041 A JP S5280041A JP 50156655 A JP50156655 A JP 50156655A JP 15665575 A JP15665575 A JP 15665575A JP S5280041 A JPS5280041 A JP S5280041A
Authority
JP
Japan
Prior art keywords
photosensitive material
selectively exposing
exposing photosensitive
mirror
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50156655A
Other languages
Japanese (ja)
Other versions
JPS615131B2 (en
Inventor
Kenji Kajiyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP50156655A priority Critical patent/JPS5280041A/en
Publication of JPS5280041A publication Critical patent/JPS5280041A/en
Publication of JPS615131B2 publication Critical patent/JPS615131B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70408—Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Holo Graphy (AREA)

Abstract

PURPOSE: To form a fine pattern due to exposure using interference fringes by changing an angle made between two of coherent light by rotating a mirror.
COPYRIGHT: (C)1977,JPO&Japio
JP50156655A 1975-12-26 1975-12-26 Method for selectively exposing photosensitive material Granted JPS5280041A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50156655A JPS5280041A (en) 1975-12-26 1975-12-26 Method for selectively exposing photosensitive material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50156655A JPS5280041A (en) 1975-12-26 1975-12-26 Method for selectively exposing photosensitive material

Publications (2)

Publication Number Publication Date
JPS5280041A true JPS5280041A (en) 1977-07-05
JPS615131B2 JPS615131B2 (en) 1986-02-15

Family

ID=15632391

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50156655A Granted JPS5280041A (en) 1975-12-26 1975-12-26 Method for selectively exposing photosensitive material

Country Status (1)

Country Link
JP (1) JPS5280041A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56131959A (en) * 1980-03-19 1981-10-15 Matsushita Electric Ind Co Ltd Manufacture of semiconductor device
JPS58154233A (en) * 1982-03-10 1983-09-13 Agency Of Ind Science & Technol Periodical etching method for semiconductor material
JPS59200515A (en) * 1983-04-26 1984-11-13 Clarion Co Ltd Manufacture of surface acoustic wave element
JPS61278140A (en) * 1985-05-31 1986-12-09 Fuji Photo Optical Co Ltd Method of setting exposure time in exposure device for diffraction grating
JPS63244736A (en) * 1987-03-31 1988-10-12 Yokogawa Electric Corp Photo-lithography device
JP2006210923A (en) * 2005-01-26 2006-08-10 Taiwan Semiconductor Manufacturing Co Ltd System for manufacturing pattern on substrate and method therefor

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
APPLIED OPTICS#V12#N3 *

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56131959A (en) * 1980-03-19 1981-10-15 Matsushita Electric Ind Co Ltd Manufacture of semiconductor device
JPS58154233A (en) * 1982-03-10 1983-09-13 Agency Of Ind Science & Technol Periodical etching method for semiconductor material
JPH0153499B2 (en) * 1982-03-10 1989-11-14 Kogyo Gijutsuin
JPS59200515A (en) * 1983-04-26 1984-11-13 Clarion Co Ltd Manufacture of surface acoustic wave element
JPS61278140A (en) * 1985-05-31 1986-12-09 Fuji Photo Optical Co Ltd Method of setting exposure time in exposure device for diffraction grating
JPS63244736A (en) * 1987-03-31 1988-10-12 Yokogawa Electric Corp Photo-lithography device
JP2006210923A (en) * 2005-01-26 2006-08-10 Taiwan Semiconductor Manufacturing Co Ltd System for manufacturing pattern on substrate and method therefor
JP4495679B2 (en) * 2005-01-26 2010-07-07 台湾積體電路製造股▲ふん▼有限公司 System and method for producing a pattern on a substrate

Also Published As

Publication number Publication date
JPS615131B2 (en) 1986-02-15

Similar Documents

Publication Publication Date Title
JPS5290269A (en) Forming method for fine resist patterns
JPS5280041A (en) Method for selectively exposing photosensitive material
JPS5226171A (en) Mask creation method
JPS52149978A (en) Developing treatment method of photoresist film
GB1280625A (en) Method of forming fringe pattern images
JPS51126073A (en) Pattern printing equpment made available by photo-etching method
JPS5251870A (en) Electron bean exposure method
JPS5230428A (en) Photoresist exposure method
JPS51148365A (en) Electron beam exposure method
JPS5347825A (en) Photoresist exposure
JPS5277671A (en) Method and equipment of masking
JPS5433747A (en) Formation of hologram
JPS559429A (en) Method of interdigital type pattern exposure
JPS51115822A (en) Silver halogenide photo emulsion for ruby laser exposure
JPS51139267A (en) Photo-mask
JPS51114931A (en) Photoresist pattern formation method
JPS52119079A (en) Electron beam exposure
JPS5517933A (en) Crt face marking
JPS5267651A (en) Method for interference exposure
JPS541650A (en) Developing method of photographic materials
JPS51115821A (en) Silver halogenide photo emulsion for ruby laser exposure
JPS5243444A (en) Process for fabricating an acoustic hologram
JPS51140577A (en) Wafer holder for electronic beam exposing device
JPS5299775A (en) Pattern exposing method
JPS5214421A (en) Method for exposure