JPS5251868A - Semiconductor integrated circuit - Google Patents

Semiconductor integrated circuit

Info

Publication number
JPS5251868A
JPS5251868A JP12718975A JP12718975A JPS5251868A JP S5251868 A JPS5251868 A JP S5251868A JP 12718975 A JP12718975 A JP 12718975A JP 12718975 A JP12718975 A JP 12718975A JP S5251868 A JPS5251868 A JP S5251868A
Authority
JP
Japan
Prior art keywords
integrated circuit
semiconductor integrated
works
forming
coating method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12718975A
Other languages
Japanese (ja)
Inventor
Koichi Oguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Suwa Seikosha KK
Original Assignee
Seiko Epson Corp
Suwa Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, Suwa Seikosha KK filed Critical Seiko Epson Corp
Priority to JP12718975A priority Critical patent/JPS5251868A/en
Publication of JPS5251868A publication Critical patent/JPS5251868A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

PURPOSE: To achieve higher safety of works and higher passivation effect by forming a silica film containing P2O5 by a coating method without using PH3.
COPYRIGHT: (C)1977,JPO&Japio
JP12718975A 1975-10-22 1975-10-22 Semiconductor integrated circuit Pending JPS5251868A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12718975A JPS5251868A (en) 1975-10-22 1975-10-22 Semiconductor integrated circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12718975A JPS5251868A (en) 1975-10-22 1975-10-22 Semiconductor integrated circuit

Publications (1)

Publication Number Publication Date
JPS5251868A true JPS5251868A (en) 1977-04-26

Family

ID=14953878

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12718975A Pending JPS5251868A (en) 1975-10-22 1975-10-22 Semiconductor integrated circuit

Country Status (1)

Country Link
JP (1) JPS5251868A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58189263A (en) * 1982-04-28 1983-11-04 Hitachi Chem Co Ltd Coating fluid for sio2 film formation
JPH04237132A (en) * 1990-07-31 1992-08-25 Internatl Business Mach Corp <Ibm> Semiconductor structure with polysilicon-land and forming method thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58189263A (en) * 1982-04-28 1983-11-04 Hitachi Chem Co Ltd Coating fluid for sio2 film formation
JPS6358867B2 (en) * 1982-04-28 1988-11-17
JPH04237132A (en) * 1990-07-31 1992-08-25 Internatl Business Mach Corp <Ibm> Semiconductor structure with polysilicon-land and forming method thereof

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