JPS5246514B2 - - Google Patents
Info
- Publication number
- JPS5246514B2 JPS5246514B2 JP47009866A JP986672A JPS5246514B2 JP S5246514 B2 JPS5246514 B2 JP S5246514B2 JP 47009866 A JP47009866 A JP 47009866A JP 986672 A JP986672 A JP 986672A JP S5246514 B2 JPS5246514 B2 JP S5246514B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/252—Tubes for spot-analysing by electron or ion beams; Microanalysers
- H01J37/256—Tubes for spot-analysing by electron or ion beams; Microanalysers using scanning beams
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/26—Mass spectrometers or separator tubes
- H01J49/28—Static spectrometers
- H01J49/284—Static spectrometers using electrostatic and magnetic sectors with simple focusing, e.g. with parallel fields such as Aston spectrometer
- H01J49/286—Static spectrometers using electrostatic and magnetic sectors with simple focusing, e.g. with parallel fields such as Aston spectrometer with energy analysis, e.g. Castaing filter
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP47009866A JPS5246514B2 (ja) | 1972-01-28 | 1972-01-28 | |
US00327683A US3840743A (en) | 1972-01-28 | 1973-01-29 | Ion microanalyzer |
DE2304159A DE2304159A1 (de) | 1972-01-28 | 1973-01-29 | Ionen-mikroanalysator |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP47009866A JPS5246514B2 (ja) | 1972-01-28 | 1972-01-28 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS4879693A JPS4879693A (ja) | 1973-10-25 |
JPS5246514B2 true JPS5246514B2 (ja) | 1977-11-25 |
Family
ID=11732047
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP47009866A Expired JPS5246514B2 (ja) | 1972-01-28 | 1972-01-28 |
Country Status (3)
Country | Link |
---|---|
US (1) | US3840743A (ja) |
JP (1) | JPS5246514B2 (ja) |
DE (1) | DE2304159A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5551931Y2 (ja) * | 1976-12-08 | 1980-12-03 |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5015594A (ja) * | 1973-06-08 | 1975-02-19 | ||
US3916190A (en) * | 1974-03-01 | 1975-10-28 | Minnesota Mining & Mfg | Depth profile analysis apparatus |
US3937958A (en) | 1975-03-31 | 1976-02-10 | Minnesota Mining And Manufacturing Company | Charged particle beam apparatus |
JPS5728396Y2 (ja) * | 1975-06-24 | 1982-06-21 | ||
JPS5836464B2 (ja) * | 1975-09-12 | 1983-08-09 | 株式会社島津製作所 | シツリヨウブンセキソウチ |
SE440600B (sv) * | 1979-05-17 | 1985-08-12 | Scanditronix Instr | Anordning for bestralning av en materievolym med en strale av laddade partiklar |
US4874946A (en) * | 1985-04-30 | 1989-10-17 | The United States Of America As Represented By The United States Department Of Energy | Method and apparatus for analyzing the internal chemistry and compositional variations of materials and devices |
US5089699A (en) * | 1989-03-14 | 1992-02-18 | Hitachi, Ltd. | Secondary charged particle analyzing apparatus and secondary charged particle extracting section |
US5019712A (en) * | 1989-06-08 | 1991-05-28 | Hughes Aircraft Company | Production of focused ion cluster beams |
EP0523033A1 (de) * | 1991-07-10 | 1993-01-13 | IMS Ionen Mikrofabrikations Systeme Gesellschaft m.b.H. | Ionenoptisches Abbildungssystem |
JP3396980B2 (ja) * | 1994-12-22 | 2003-04-14 | ソニー株式会社 | 濃度分布の解析方法 |
US10473599B2 (en) * | 2017-12-01 | 2019-11-12 | Bruker Axs Gmbh | X-ray source using electron impact excitation of high velocity liquid metal beam |
-
1972
- 1972-01-28 JP JP47009866A patent/JPS5246514B2/ja not_active Expired
-
1973
- 1973-01-29 US US00327683A patent/US3840743A/en not_active Expired - Lifetime
- 1973-01-29 DE DE2304159A patent/DE2304159A1/de active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5551931Y2 (ja) * | 1976-12-08 | 1980-12-03 |
Also Published As
Publication number | Publication date |
---|---|
US3840743A (en) | 1974-10-08 |
JPS4879693A (ja) | 1973-10-25 |
DE2304159A1 (de) | 1973-08-23 |