JPS5225575A - Inspection method of the state of object - Google Patents
Inspection method of the state of objectInfo
- Publication number
- JPS5225575A JPS5225575A JP10120875A JP10120875A JPS5225575A JP S5225575 A JPS5225575 A JP S5225575A JP 10120875 A JP10120875 A JP 10120875A JP 10120875 A JP10120875 A JP 10120875A JP S5225575 A JPS5225575 A JP S5225575A
- Authority
- JP
- Japan
- Prior art keywords
- state
- inspection method
- inspection
- masks
- correcting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
PURPOSE: To make the inspection of the state of defects of an object plane without the position slide possible, by means of always detecting and correcting the outside appearance of two photo-masks with the identical pattern.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50101208A JPS6043657B2 (en) | 1975-08-22 | 1975-08-22 | Object condition inspection method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50101208A JPS6043657B2 (en) | 1975-08-22 | 1975-08-22 | Object condition inspection method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5225575A true JPS5225575A (en) | 1977-02-25 |
JPS6043657B2 JPS6043657B2 (en) | 1985-09-30 |
Family
ID=14294493
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50101208A Expired JPS6043657B2 (en) | 1975-08-22 | 1975-08-22 | Object condition inspection method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6043657B2 (en) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS542074A (en) * | 1977-06-07 | 1979-01-09 | Canon Inc | Alignment unit |
JPS54111774A (en) * | 1978-02-22 | 1979-09-01 | Hitachi Ltd | Inspection method of mask and its unit |
JPS5648631A (en) * | 1979-09-28 | 1981-05-01 | Hitachi Ltd | Photomask inspecting apparatus |
JPS57194304A (en) * | 1981-05-27 | 1982-11-29 | Hitachi Ltd | Inspecting method for circuit pattern |
JPS5821111A (en) * | 1981-07-29 | 1983-02-07 | Nippon Kogaku Kk <Nikon> | Positioning device for pattern detection |
JPS5860538A (en) * | 1981-10-06 | 1983-04-11 | Fujitsu Ltd | Inspecting method for rattern |
JPS5987607U (en) * | 1982-12-03 | 1984-06-13 | 日立電子エンジニアリング株式会社 | Alignment device for mutual comparison pattern inspection machine |
JPS59132129A (en) * | 1983-01-19 | 1984-07-30 | Hitachi Ltd | Inspection device for defect |
JPS59157505A (en) * | 1983-02-28 | 1984-09-06 | Hitachi Ltd | Pattern inspecting device |
JPS59171808A (en) * | 1983-03-18 | 1984-09-28 | Takaharu Miyazaki | Comparing and determining method for luminance signal |
JPS62171767U (en) * | 1986-03-19 | 1987-10-31 |
-
1975
- 1975-08-22 JP JP50101208A patent/JPS6043657B2/en not_active Expired
Cited By (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS542074A (en) * | 1977-06-07 | 1979-01-09 | Canon Inc | Alignment unit |
JPS6114654B2 (en) * | 1977-06-07 | 1986-04-19 | Canon Kk | |
JPS54111774A (en) * | 1978-02-22 | 1979-09-01 | Hitachi Ltd | Inspection method of mask and its unit |
JPS5648631A (en) * | 1979-09-28 | 1981-05-01 | Hitachi Ltd | Photomask inspecting apparatus |
JPH0160766B2 (en) * | 1981-05-27 | 1989-12-25 | Hitachi Ltd | |
JPS57194304A (en) * | 1981-05-27 | 1982-11-29 | Hitachi Ltd | Inspecting method for circuit pattern |
JPS5821111A (en) * | 1981-07-29 | 1983-02-07 | Nippon Kogaku Kk <Nikon> | Positioning device for pattern detection |
JPS5860538A (en) * | 1981-10-06 | 1983-04-11 | Fujitsu Ltd | Inspecting method for rattern |
JPS6239816B2 (en) * | 1981-10-06 | 1987-08-25 | Fujitsu Ltd | |
JPS5987607U (en) * | 1982-12-03 | 1984-06-13 | 日立電子エンジニアリング株式会社 | Alignment device for mutual comparison pattern inspection machine |
JPS59132129A (en) * | 1983-01-19 | 1984-07-30 | Hitachi Ltd | Inspection device for defect |
JPH0478980B2 (en) * | 1983-01-19 | 1992-12-14 | Hitachi Ltd | |
JPS59157505A (en) * | 1983-02-28 | 1984-09-06 | Hitachi Ltd | Pattern inspecting device |
JPH0160767B2 (en) * | 1983-02-28 | 1989-12-25 | Hitachi Ltd | |
JPS59171808A (en) * | 1983-03-18 | 1984-09-28 | Takaharu Miyazaki | Comparing and determining method for luminance signal |
JPH0559363B2 (en) * | 1983-03-18 | 1993-08-30 | Ukai Kuniji | |
JPS62171767U (en) * | 1986-03-19 | 1987-10-31 | ||
JPH0448454Y2 (en) * | 1986-03-19 | 1992-11-16 |
Also Published As
Publication number | Publication date |
---|---|
JPS6043657B2 (en) | 1985-09-30 |
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