JPS52151024A - Method of recording image with laser beam - Google Patents

Method of recording image with laser beam

Info

Publication number
JPS52151024A
JPS52151024A JP6879477A JP6879477A JPS52151024A JP S52151024 A JPS52151024 A JP S52151024A JP 6879477 A JP6879477 A JP 6879477A JP 6879477 A JP6879477 A JP 6879477A JP S52151024 A JPS52151024 A JP S52151024A
Authority
JP
Japan
Prior art keywords
laser beam
recording image
recording
image
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6879477A
Other languages
Japanese (ja)
Inventor
Yoozefu Fuausuto Raimunto
Jiefuaazu Uiriamu
Riyuu Shiyuuchien
Aren Shiirii Dagurasu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CNA Holdings LLC
Original Assignee
Hoechst Celanese Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Celanese Corp filed Critical Hoechst Celanese Corp
Publication of JPS52151024A publication Critical patent/JPS52151024A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G03F7/2055—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Laser Beam Printer (AREA)
  • Exposure Or Original Feeding In Electrophotography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Dot-Matrix Printers And Others (AREA)
JP6879477A 1976-06-10 1977-06-10 Method of recording image with laser beam Pending JPS52151024A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US69469376A 1976-06-10 1976-06-10

Publications (1)

Publication Number Publication Date
JPS52151024A true JPS52151024A (en) 1977-12-15

Family

ID=24789881

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6879477A Pending JPS52151024A (en) 1976-06-10 1977-06-10 Method of recording image with laser beam

Country Status (8)

Country Link
JP (1) JPS52151024A (en)
BE (1) BE855507A (en)
BR (1) BR7703742A (en)
CA (1) CA1094860A (en)
DE (1) DE2725309A1 (en)
FR (1) FR2354575A1 (en)
NL (1) NL7706254A (en)
SE (1) SE7706658L (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61167941A (en) * 1985-01-15 1986-07-29 チバ―ガイギー　アクチエンゲゼルシヤフト Highly sensitive polyamideester photoresist composition
JPS62210443A (en) * 1986-02-27 1987-09-16 バスフ　アクチェン　ゲゼルシャフト Photosensitive recording element
EP0784233A1 (en) 1996-01-10 1997-07-16 Mitsubishi Chemical Corporation Photosensitive composition and lithographic printing plate
EP1655132A2 (en) 1996-08-06 2006-05-10 Mitsubishi Chemical Corporation Positive photosensitive lithographic printing plate

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4419675A (en) * 1979-05-24 1983-12-06 American Hoechst Corporation Imaging system and method for printed circuit artwork and the like
EP0089506A3 (en) * 1982-03-18 1984-04-11 American Hoechst Corporation Light-sensitive mixture based on polycondensation products of diazonium salts, and light-sensitive recording material made therefrom
DE3733874A1 (en) * 1987-10-07 1989-04-27 Hell Rudolf Dr Ing Gmbh PRINTING MANUFACTURING WITH A WASHABLE IMAGE CARRIER
US4940651A (en) * 1988-12-30 1990-07-10 International Business Machines Corporation Method for patterning cationic curable photoresist

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61167941A (en) * 1985-01-15 1986-07-29 チバ―ガイギー　アクチエンゲゼルシヤフト Highly sensitive polyamideester photoresist composition
JPS62210443A (en) * 1986-02-27 1987-09-16 バスフ　アクチェン　ゲゼルシャフト Photosensitive recording element
EP0784233A1 (en) 1996-01-10 1997-07-16 Mitsubishi Chemical Corporation Photosensitive composition and lithographic printing plate
EP1655132A2 (en) 1996-08-06 2006-05-10 Mitsubishi Chemical Corporation Positive photosensitive lithographic printing plate

Also Published As

Publication number Publication date
FR2354575A1 (en) 1978-01-06
FR2354575B1 (en) 1980-02-15
DE2725309A1 (en) 1977-12-22
SE7706658L (en) 1977-12-11
CA1094860A (en) 1981-02-03
BE855507A (en) 1977-12-08
BR7703742A (en) 1978-04-04
NL7706254A (en) 1977-12-13

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