JPS52141443A - Method of etching films - Google Patents

Method of etching films

Info

Publication number
JPS52141443A
JPS52141443A JP5894476A JP5894476A JPS52141443A JP S52141443 A JPS52141443 A JP S52141443A JP 5894476 A JP5894476 A JP 5894476A JP 5894476 A JP5894476 A JP 5894476A JP S52141443 A JPS52141443 A JP S52141443A
Authority
JP
Japan
Prior art keywords
etching films
etching
films
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5894476A
Other languages
Japanese (ja)
Inventor
Soukichi Yamagishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP5894476A priority Critical patent/JPS52141443A/en
Publication of JPS52141443A publication Critical patent/JPS52141443A/en
Pending legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP5894476A 1976-05-21 1976-05-21 Method of etching films Pending JPS52141443A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5894476A JPS52141443A (en) 1976-05-21 1976-05-21 Method of etching films

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5894476A JPS52141443A (en) 1976-05-21 1976-05-21 Method of etching films

Publications (1)

Publication Number Publication Date
JPS52141443A true JPS52141443A (en) 1977-11-25

Family

ID=13098929

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5894476A Pending JPS52141443A (en) 1976-05-21 1976-05-21 Method of etching films

Country Status (1)

Country Link
JP (1) JPS52141443A (en)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5533060A (en) * 1978-08-28 1980-03-08 Semiconductor Res Found Composite dry etching process
JPS56158427A (en) * 1980-05-13 1981-12-07 Victor Co Of Japan Ltd Reactive ion etching
JPS577936A (en) * 1980-06-18 1982-01-16 Fujitsu Ltd Manufacture of semiconductor device
JPS57117241A (en) * 1981-01-13 1982-07-21 Matsushita Electric Ind Co Ltd Reactive ion etching method
JPS58123728A (en) * 1982-01-18 1983-07-23 Seiko Epson Corp Manufacture of semiconductor device
JPS58186937A (en) * 1982-04-26 1983-11-01 Hitachi Ltd Dry etching method
JPS5947733A (en) * 1982-09-13 1984-03-17 Hitachi Ltd Plasma processing apparatus
JPS6050923A (en) * 1983-08-31 1985-03-22 Hitachi Ltd Method of plasma surface treatment and device therefor
JPS60120523A (en) * 1983-12-05 1985-06-28 Seiko Instr & Electronics Ltd Dry etching method
JPS60153129A (en) * 1984-01-20 1985-08-12 Seiko Instr & Electronics Ltd Manufacture of semiconductor device
JPS61114530A (en) * 1984-11-09 1986-06-02 Oki Electric Ind Co Ltd Method and device for dry etching
JPS6240781A (en) * 1985-08-15 1987-02-21 Toshiba Corp Manufacture of schottky gate field effect transistor

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6349372B2 (en) * 1978-08-28 1988-10-04 Handotai Kenkyu Shinkokai
JPS5533060A (en) * 1978-08-28 1980-03-08 Semiconductor Res Found Composite dry etching process
JPS56158427A (en) * 1980-05-13 1981-12-07 Victor Co Of Japan Ltd Reactive ion etching
JPS577936A (en) * 1980-06-18 1982-01-16 Fujitsu Ltd Manufacture of semiconductor device
JPH0313744B2 (en) * 1980-06-18 1991-02-25 Fujitsu Ltd
JPS57117241A (en) * 1981-01-13 1982-07-21 Matsushita Electric Ind Co Ltd Reactive ion etching method
JPS58123728A (en) * 1982-01-18 1983-07-23 Seiko Epson Corp Manufacture of semiconductor device
JPS58186937A (en) * 1982-04-26 1983-11-01 Hitachi Ltd Dry etching method
JPH0454373B2 (en) * 1982-04-26 1992-08-31 Hitachi Ltd
JPS5947733A (en) * 1982-09-13 1984-03-17 Hitachi Ltd Plasma processing apparatus
JPH0522378B2 (en) * 1982-09-13 1993-03-29 Hitachi Ltd
JPS6050923A (en) * 1983-08-31 1985-03-22 Hitachi Ltd Method of plasma surface treatment and device therefor
JPH0473287B2 (en) * 1983-08-31 1992-11-20 Hitachi Ltd
JPS60120523A (en) * 1983-12-05 1985-06-28 Seiko Instr & Electronics Ltd Dry etching method
JPS60153129A (en) * 1984-01-20 1985-08-12 Seiko Instr & Electronics Ltd Manufacture of semiconductor device
JPS61114530A (en) * 1984-11-09 1986-06-02 Oki Electric Ind Co Ltd Method and device for dry etching
JPS6240781A (en) * 1985-08-15 1987-02-21 Toshiba Corp Manufacture of schottky gate field effect transistor

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