JPS52141443A - Method of etching films - Google Patents
Method of etching filmsInfo
- Publication number
- JPS52141443A JPS52141443A JP5894476A JP5894476A JPS52141443A JP S52141443 A JPS52141443 A JP S52141443A JP 5894476 A JP5894476 A JP 5894476A JP 5894476 A JP5894476 A JP 5894476A JP S52141443 A JPS52141443 A JP S52141443A
- Authority
- JP
- Japan
- Prior art keywords
- etching films
- etching
- films
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5894476A JPS52141443A (en) | 1976-05-21 | 1976-05-21 | Method of etching films |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5894476A JPS52141443A (en) | 1976-05-21 | 1976-05-21 | Method of etching films |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS52141443A true JPS52141443A (en) | 1977-11-25 |
Family
ID=13098929
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5894476A Pending JPS52141443A (en) | 1976-05-21 | 1976-05-21 | Method of etching films |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52141443A (en) |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5533060A (en) * | 1978-08-28 | 1980-03-08 | Semiconductor Res Found | Composite dry etching process |
JPS56158427A (en) * | 1980-05-13 | 1981-12-07 | Victor Co Of Japan Ltd | Reactive ion etching |
JPS577936A (en) * | 1980-06-18 | 1982-01-16 | Fujitsu Ltd | Manufacture of semiconductor device |
JPS57117241A (en) * | 1981-01-13 | 1982-07-21 | Matsushita Electric Ind Co Ltd | Reactive ion etching method |
JPS58123728A (en) * | 1982-01-18 | 1983-07-23 | Seiko Epson Corp | Manufacture of semiconductor device |
JPS58186937A (en) * | 1982-04-26 | 1983-11-01 | Hitachi Ltd | Dry etching method |
JPS5947733A (en) * | 1982-09-13 | 1984-03-17 | Hitachi Ltd | Plasma processing apparatus |
JPS6050923A (en) * | 1983-08-31 | 1985-03-22 | Hitachi Ltd | Method of plasma surface treatment and device therefor |
JPS60120523A (en) * | 1983-12-05 | 1985-06-28 | Seiko Instr & Electronics Ltd | Dry etching method |
JPS60153129A (en) * | 1984-01-20 | 1985-08-12 | Seiko Instr & Electronics Ltd | Manufacture of semiconductor device |
JPS61114530A (en) * | 1984-11-09 | 1986-06-02 | Oki Electric Ind Co Ltd | Method and device for dry etching |
JPS6240781A (en) * | 1985-08-15 | 1987-02-21 | Toshiba Corp | Manufacture of schottky gate field effect transistor |
-
1976
- 1976-05-21 JP JP5894476A patent/JPS52141443A/en active Pending
Cited By (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6349372B2 (en) * | 1978-08-28 | 1988-10-04 | Handotai Kenkyu Shinkokai | |
JPS5533060A (en) * | 1978-08-28 | 1980-03-08 | Semiconductor Res Found | Composite dry etching process |
JPS56158427A (en) * | 1980-05-13 | 1981-12-07 | Victor Co Of Japan Ltd | Reactive ion etching |
JPS577936A (en) * | 1980-06-18 | 1982-01-16 | Fujitsu Ltd | Manufacture of semiconductor device |
JPH0313744B2 (en) * | 1980-06-18 | 1991-02-25 | Fujitsu Ltd | |
JPS57117241A (en) * | 1981-01-13 | 1982-07-21 | Matsushita Electric Ind Co Ltd | Reactive ion etching method |
JPS58123728A (en) * | 1982-01-18 | 1983-07-23 | Seiko Epson Corp | Manufacture of semiconductor device |
JPS58186937A (en) * | 1982-04-26 | 1983-11-01 | Hitachi Ltd | Dry etching method |
JPH0454373B2 (en) * | 1982-04-26 | 1992-08-31 | Hitachi Ltd | |
JPS5947733A (en) * | 1982-09-13 | 1984-03-17 | Hitachi Ltd | Plasma processing apparatus |
JPH0522378B2 (en) * | 1982-09-13 | 1993-03-29 | Hitachi Ltd | |
JPS6050923A (en) * | 1983-08-31 | 1985-03-22 | Hitachi Ltd | Method of plasma surface treatment and device therefor |
JPH0473287B2 (en) * | 1983-08-31 | 1992-11-20 | Hitachi Ltd | |
JPS60120523A (en) * | 1983-12-05 | 1985-06-28 | Seiko Instr & Electronics Ltd | Dry etching method |
JPS60153129A (en) * | 1984-01-20 | 1985-08-12 | Seiko Instr & Electronics Ltd | Manufacture of semiconductor device |
JPS61114530A (en) * | 1984-11-09 | 1986-06-02 | Oki Electric Ind Co Ltd | Method and device for dry etching |
JPS6240781A (en) * | 1985-08-15 | 1987-02-21 | Toshiba Corp | Manufacture of schottky gate field effect transistor |
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