JPS52139374A - Alignment pattern forming method for mask alignment - Google Patents
Alignment pattern forming method for mask alignmentInfo
- Publication number
- JPS52139374A JPS52139374A JP5539176A JP5539176A JPS52139374A JP S52139374 A JPS52139374 A JP S52139374A JP 5539176 A JP5539176 A JP 5539176A JP 5539176 A JP5539176 A JP 5539176A JP S52139374 A JPS52139374 A JP S52139374A
- Authority
- JP
- Japan
- Prior art keywords
- alignment
- forming method
- pattern forming
- mask
- alignment pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To make possible the recognition of pattern serrations definitely despite existence of inteference fringes by etching the metal gloss surface of a wafer according to the alignment patterns on the wafer, then coating thereon a resist film.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5539176A JPS52139374A (en) | 1976-05-17 | 1976-05-17 | Alignment pattern forming method for mask alignment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5539176A JPS52139374A (en) | 1976-05-17 | 1976-05-17 | Alignment pattern forming method for mask alignment |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS52139374A true JPS52139374A (en) | 1977-11-21 |
Family
ID=12997207
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5539176A Pending JPS52139374A (en) | 1976-05-17 | 1976-05-17 | Alignment pattern forming method for mask alignment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52139374A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56126921A (en) * | 1980-03-12 | 1981-10-05 | Fujitsu Ltd | Automatic positioning method |
JPS5743420A (en) * | 1980-08-29 | 1982-03-11 | Hitachi Ltd | Mask alignment method |
JPS5764920A (en) * | 1980-10-08 | 1982-04-20 | Toshiba Corp | Manufacture of gaas integrated circuit |
JPS5764921A (en) * | 1980-10-08 | 1982-04-20 | Toshiba Corp | Manufacture of gaas integrated circuit |
JPS5785231A (en) * | 1980-11-17 | 1982-05-27 | Fujitsu Ltd | Formation of positional matching mark |
JPS5856333A (en) * | 1981-09-29 | 1983-04-04 | Fujitsu Ltd | Formation of key pattern for mask alignment |
JPS62211957A (en) * | 1986-03-13 | 1987-09-17 | Fujitsu Ltd | Manufacture of field-effect transistor |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5023779A (en) * | 1973-07-02 | 1975-03-14 |
-
1976
- 1976-05-17 JP JP5539176A patent/JPS52139374A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5023779A (en) * | 1973-07-02 | 1975-03-14 |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56126921A (en) * | 1980-03-12 | 1981-10-05 | Fujitsu Ltd | Automatic positioning method |
JPS5743420A (en) * | 1980-08-29 | 1982-03-11 | Hitachi Ltd | Mask alignment method |
JPS5764920A (en) * | 1980-10-08 | 1982-04-20 | Toshiba Corp | Manufacture of gaas integrated circuit |
JPS5764921A (en) * | 1980-10-08 | 1982-04-20 | Toshiba Corp | Manufacture of gaas integrated circuit |
JPH0140487B2 (en) * | 1980-10-08 | 1989-08-29 | Tokyo Shibaura Electric Co | |
JPS5785231A (en) * | 1980-11-17 | 1982-05-27 | Fujitsu Ltd | Formation of positional matching mark |
JPS5856333A (en) * | 1981-09-29 | 1983-04-04 | Fujitsu Ltd | Formation of key pattern for mask alignment |
JPS62211957A (en) * | 1986-03-13 | 1987-09-17 | Fujitsu Ltd | Manufacture of field-effect transistor |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0152227A3 (en) | The fabrication of microstructures over large areas using physical replication | |
JPS52139374A (en) | Alignment pattern forming method for mask alignment | |
JPS5211774A (en) | Method of detecting relative position of patterns | |
JPS52119172A (en) | Forming method of fine pattern | |
JPS5494881A (en) | Exposure method | |
JPS532082A (en) | Photo etching mask | |
JPS542685A (en) | Forming method for metal wiring | |
JPS5277671A (en) | Method and equipment of masking | |
JPS55138839A (en) | Method of fabricating semiconductor device | |
JPS53107274A (en) | Forming method of patterns | |
JPS5427367A (en) | Manufacture of microwave circuit pattern | |
JPS5382173A (en) | Positioning method | |
JPS5346700A (en) | Exposuring method for resist | |
JPS5315768A (en) | Production of semiconductor device | |
JPS5381083A (en) | Focusing method of projection exposure apparatus | |
JPS5384478A (en) | Forming method for micropattern | |
JPS52117072A (en) | Hard mask | |
JPS5384477A (en) | Forming method of dry etching mask | |
JPS52127174A (en) | Minute patern formation method | |
JPS52130292A (en) | Patterning method | |
JPS545659A (en) | Manufacture of semiconductor device | |
JPS53144271A (en) | Process system for mask alignment signal | |
JPS5380167A (en) | Manufacture of semiconductor device | |
JPS5283176A (en) | Lift-off method | |
JPS5227371A (en) | Pattern film formed on upper surface of substrate |