JPS52139374A - Alignment pattern forming method for mask alignment - Google Patents

Alignment pattern forming method for mask alignment

Info

Publication number
JPS52139374A
JPS52139374A JP5539176A JP5539176A JPS52139374A JP S52139374 A JPS52139374 A JP S52139374A JP 5539176 A JP5539176 A JP 5539176A JP 5539176 A JP5539176 A JP 5539176A JP S52139374 A JPS52139374 A JP S52139374A
Authority
JP
Japan
Prior art keywords
alignment
forming method
pattern forming
mask
alignment pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5539176A
Other languages
Japanese (ja)
Inventor
Tomohiro Kuji
Nobuyuki Akiyama
Mitsuyoshi Koizumi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP5539176A priority Critical patent/JPS52139374A/en
Publication of JPS52139374A publication Critical patent/JPS52139374A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To make possible the recognition of pattern serrations definitely despite existence of inteference fringes by etching the metal gloss surface of a wafer according to the alignment patterns on the wafer, then coating thereon a resist film.
COPYRIGHT: (C)1977,JPO&Japio
JP5539176A 1976-05-17 1976-05-17 Alignment pattern forming method for mask alignment Pending JPS52139374A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5539176A JPS52139374A (en) 1976-05-17 1976-05-17 Alignment pattern forming method for mask alignment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5539176A JPS52139374A (en) 1976-05-17 1976-05-17 Alignment pattern forming method for mask alignment

Publications (1)

Publication Number Publication Date
JPS52139374A true JPS52139374A (en) 1977-11-21

Family

ID=12997207

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5539176A Pending JPS52139374A (en) 1976-05-17 1976-05-17 Alignment pattern forming method for mask alignment

Country Status (1)

Country Link
JP (1) JPS52139374A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56126921A (en) * 1980-03-12 1981-10-05 Fujitsu Ltd Automatic positioning method
JPS5743420A (en) * 1980-08-29 1982-03-11 Hitachi Ltd Mask alignment method
JPS5764920A (en) * 1980-10-08 1982-04-20 Toshiba Corp Manufacture of gaas integrated circuit
JPS5764921A (en) * 1980-10-08 1982-04-20 Toshiba Corp Manufacture of gaas integrated circuit
JPS5785231A (en) * 1980-11-17 1982-05-27 Fujitsu Ltd Formation of positional matching mark
JPS5856333A (en) * 1981-09-29 1983-04-04 Fujitsu Ltd Formation of key pattern for mask alignment
JPS62211957A (en) * 1986-03-13 1987-09-17 Fujitsu Ltd Manufacture of field-effect transistor

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5023779A (en) * 1973-07-02 1975-03-14

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5023779A (en) * 1973-07-02 1975-03-14

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56126921A (en) * 1980-03-12 1981-10-05 Fujitsu Ltd Automatic positioning method
JPS5743420A (en) * 1980-08-29 1982-03-11 Hitachi Ltd Mask alignment method
JPS5764920A (en) * 1980-10-08 1982-04-20 Toshiba Corp Manufacture of gaas integrated circuit
JPS5764921A (en) * 1980-10-08 1982-04-20 Toshiba Corp Manufacture of gaas integrated circuit
JPH0140487B2 (en) * 1980-10-08 1989-08-29 Tokyo Shibaura Electric Co
JPS5785231A (en) * 1980-11-17 1982-05-27 Fujitsu Ltd Formation of positional matching mark
JPS5856333A (en) * 1981-09-29 1983-04-04 Fujitsu Ltd Formation of key pattern for mask alignment
JPS62211957A (en) * 1986-03-13 1987-09-17 Fujitsu Ltd Manufacture of field-effect transistor

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