JPS5192740A - - Google Patents
Info
- Publication number
- JPS5192740A JPS5192740A JP50144047A JP14404775A JPS5192740A JP S5192740 A JPS5192740 A JP S5192740A JP 50144047 A JP50144047 A JP 50144047A JP 14404775 A JP14404775 A JP 14404775A JP S5192740 A JPS5192740 A JP S5192740A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/285—Interference filters comprising deposited thin solid films
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
- C03C17/09—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals by deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0084—Producing gradient compositions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/25—Metals
- C03C2217/263—Metals other than noble metals, Cu or Hg
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physical Vapour Deposition (AREA)
- Surface Treatment Of Glass (AREA)
- Optical Filters (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CA215,398A CA1014889A (en) | 1974-12-06 | 1974-12-06 | Sputtered dielectric thin films |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5192740A true JPS5192740A (ja) | 1976-08-14 |
JPS62229B2 JPS62229B2 (ja) | 1987-01-06 |
Family
ID=4101793
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50144047A Expired JPS62229B2 (ja) | 1974-12-06 | 1975-12-05 |
Country Status (7)
Country | Link |
---|---|
JP (1) | JPS62229B2 (ja) |
CA (1) | CA1014889A (ja) |
DE (1) | DE2554854A1 (ja) |
FR (1) | FR2333056A1 (ja) |
GB (1) | GB1496590A (ja) |
NL (1) | NL7514208A (ja) |
SE (1) | SE435298B (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57177971A (en) * | 1981-04-28 | 1982-11-01 | Yoichi Murayama | High frequency ion plating device |
JPS58140705A (ja) * | 1982-02-15 | 1983-08-20 | Fujitsu Ltd | 光学フイルタおよびその製造方法 |
JPS61269804A (ja) * | 1985-05-23 | 1986-11-29 | 松下電器産業株式会社 | 誘電体膜の製造法 |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4142958A (en) * | 1978-04-13 | 1979-03-06 | Litton Systems, Inc. | Method for fabricating multi-layer optical films |
DE3027256A1 (de) * | 1980-07-18 | 1982-02-18 | Robert Bosch Gmbh, 7000 Stuttgart | Mehrschichtsystem fuer waermeschutzanwendungen und verfahren zu seiner herstellung |
GB2264718B (en) * | 1992-03-04 | 1995-04-26 | Univ Hull | Coatings produced by vapour deposition |
GB2310218B (en) * | 1996-02-13 | 1999-12-22 | Marconi Gec Ltd | Coatings |
GB9901093D0 (en) * | 1999-01-20 | 1999-03-10 | Marconi Electronic Syst Ltd | Method of making coatings |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1953070A1 (de) * | 1968-10-28 | 1970-09-10 | Western Electric Co | Verfahren zum Herstellen eines auf Tantal basierenden Schichtwiderstandes |
DE2215151A1 (de) * | 1972-03-28 | 1973-10-04 | Siemens Ag | Verfahren zum herstellen von duennen schichten aus tantal |
-
1974
- 1974-12-06 CA CA215,398A patent/CA1014889A/en not_active Expired
-
1975
- 1975-11-26 SE SE7513312A patent/SE435298B/xx unknown
- 1975-12-05 FR FR7537373A patent/FR2333056A1/fr not_active Withdrawn
- 1975-12-05 NL NL7514208A patent/NL7514208A/xx not_active Application Discontinuation
- 1975-12-05 GB GB50078/75A patent/GB1496590A/en not_active Expired
- 1975-12-05 JP JP50144047A patent/JPS62229B2/ja not_active Expired
- 1975-12-05 DE DE19752554854 patent/DE2554854A1/de active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1953070A1 (de) * | 1968-10-28 | 1970-09-10 | Western Electric Co | Verfahren zum Herstellen eines auf Tantal basierenden Schichtwiderstandes |
DE2215151A1 (de) * | 1972-03-28 | 1973-10-04 | Siemens Ag | Verfahren zum herstellen von duennen schichten aus tantal |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57177971A (en) * | 1981-04-28 | 1982-11-01 | Yoichi Murayama | High frequency ion plating device |
JPS58140705A (ja) * | 1982-02-15 | 1983-08-20 | Fujitsu Ltd | 光学フイルタおよびその製造方法 |
JPS61269804A (ja) * | 1985-05-23 | 1986-11-29 | 松下電器産業株式会社 | 誘電体膜の製造法 |
Also Published As
Publication number | Publication date |
---|---|
DE2554854A1 (de) | 1976-06-16 |
FR2333056A1 (fr) | 1977-06-24 |
CA1014889A (en) | 1977-08-02 |
SE7513312L (sv) | 1976-06-08 |
SE435298B (sv) | 1984-09-17 |
NL7514208A (nl) | 1976-06-09 |
GB1496590A (en) | 1977-12-30 |
JPS62229B2 (ja) | 1987-01-06 |