JPS51147264A - High-precision positioning system - Google Patents
High-precision positioning systemInfo
- Publication number
- JPS51147264A JPS51147264A JP50071597A JP7159775A JPS51147264A JP S51147264 A JPS51147264 A JP S51147264A JP 50071597 A JP50071597 A JP 50071597A JP 7159775 A JP7159775 A JP 7159775A JP S51147264 A JPS51147264 A JP S51147264A
- Authority
- JP
- Japan
- Prior art keywords
- positioning system
- precision positioning
- prescision
- independently
- precision
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50071597A JPS51147264A (en) | 1975-06-13 | 1975-06-13 | High-precision positioning system |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50071597A JPS51147264A (en) | 1975-06-13 | 1975-06-13 | High-precision positioning system |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS51147264A true JPS51147264A (en) | 1976-12-17 |
Family
ID=13465219
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50071597A Pending JPS51147264A (en) | 1975-06-13 | 1975-06-13 | High-precision positioning system |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS51147264A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52112280A (en) * | 1976-03-17 | 1977-09-20 | Mitsubishi Electric Corp | X-ray exposure mask |
JPS56111225A (en) * | 1980-02-01 | 1981-09-02 | Chiyou Lsi Gijutsu Kenkyu Kumiai | X ray exposuring device |
JP2020508578A (en) * | 2017-02-15 | 2020-03-19 | サントル ナシオナル ドゥ ラ ルシェルシェ シアンティフィクCentre National De La Recherche Scientifique | Electron beam lithography process suitable for samples containing at least one fragile nanostructure |
JP2020509409A (en) * | 2017-02-15 | 2020-03-26 | サントル ナシオナル ドゥ ラ ルシェルシェ シアンティフィクCentre National De La Recherche Scientifique | Optical lithography process suitable for a sample containing at least one fragile light emitter |
-
1975
- 1975-06-13 JP JP50071597A patent/JPS51147264A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52112280A (en) * | 1976-03-17 | 1977-09-20 | Mitsubishi Electric Corp | X-ray exposure mask |
JPS5746648B2 (en) * | 1976-03-17 | 1982-10-05 | ||
JPS56111225A (en) * | 1980-02-01 | 1981-09-02 | Chiyou Lsi Gijutsu Kenkyu Kumiai | X ray exposuring device |
JPS6212657B2 (en) * | 1980-02-01 | 1987-03-19 | Cho Eru Esu Ai Gijutsu Kenkyu Kumiai | |
JP2020508578A (en) * | 2017-02-15 | 2020-03-19 | サントル ナシオナル ドゥ ラ ルシェルシェ シアンティフィクCentre National De La Recherche Scientifique | Electron beam lithography process suitable for samples containing at least one fragile nanostructure |
JP2020509409A (en) * | 2017-02-15 | 2020-03-26 | サントル ナシオナル ドゥ ラ ルシェルシェ シアンティフィクCentre National De La Recherche Scientifique | Optical lithography process suitable for a sample containing at least one fragile light emitter |
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