JPS56111225A - X ray exposuring device - Google Patents

X ray exposuring device

Info

Publication number
JPS56111225A
JPS56111225A JP1122680A JP1122680A JPS56111225A JP S56111225 A JPS56111225 A JP S56111225A JP 1122680 A JP1122680 A JP 1122680A JP 1122680 A JP1122680 A JP 1122680A JP S56111225 A JPS56111225 A JP S56111225A
Authority
JP
Japan
Prior art keywords
positioning
marks
ray
wafer
mark
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1122680A
Other languages
Japanese (ja)
Other versions
JPS6212657B2 (en
Inventor
Koichi Okada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP1122680A priority Critical patent/JPS56111225A/en
Publication of JPS56111225A publication Critical patent/JPS56111225A/en
Publication of JPS6212657B2 publication Critical patent/JPS6212657B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To make it possible to conduct positioning with high precision, by measuring the X ray amount using pattern asymmetric to the positioning mark. CONSTITUTION:As generally known, marks 24 on a wafer 23 correspond to marks 22 on a mask 21. The precise positioning can be ascertained by identical amount of X rays that are radiated on the mask passed through on the left and the right side and detected 25. In the present method, the shape of the marks are asymmetric. When positioning matches, an Au mark 31 on the mask falls on a mark 32 on the wafer precisely. The marks on the right side likewise fall on each other precisely. The X rays pass through the penetration region 100 and are measured. Measurement on both sides are identical. If the positioning is not precise, the X ray penetration regions below the left and right marks are 101, 101' respectively, not identical. The difference is returned back to the driving system of the wafer so that the measurement on both sides are identical. With such an arrangement, positioning by the X ray flux that has been not feasible hitherto can be made possible to the copying the ultra fine patterns.
JP1122680A 1980-02-01 1980-02-01 X ray exposuring device Granted JPS56111225A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1122680A JPS56111225A (en) 1980-02-01 1980-02-01 X ray exposuring device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1122680A JPS56111225A (en) 1980-02-01 1980-02-01 X ray exposuring device

Publications (2)

Publication Number Publication Date
JPS56111225A true JPS56111225A (en) 1981-09-02
JPS6212657B2 JPS6212657B2 (en) 1987-03-19

Family

ID=11772035

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1122680A Granted JPS56111225A (en) 1980-02-01 1980-02-01 X ray exposuring device

Country Status (1)

Country Link
JP (1) JPS56111225A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63175859A (en) * 1987-01-16 1988-07-20 Ushio Inc Exposure system for production of liquid crystal substrate
JPH0218924A (en) * 1988-05-13 1990-01-23 Mrs Technol Inc Optical aligner with low reflection error for photolithography

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51147264A (en) * 1975-06-13 1976-12-17 Fujitsu Ltd High-precision positioning system
JPS53144681A (en) * 1977-05-20 1978-12-16 Siemens Ag Method of relatively positioning projecting mask and semiconductor wafer

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51147264A (en) * 1975-06-13 1976-12-17 Fujitsu Ltd High-precision positioning system
JPS53144681A (en) * 1977-05-20 1978-12-16 Siemens Ag Method of relatively positioning projecting mask and semiconductor wafer

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63175859A (en) * 1987-01-16 1988-07-20 Ushio Inc Exposure system for production of liquid crystal substrate
JPH0218924A (en) * 1988-05-13 1990-01-23 Mrs Technol Inc Optical aligner with low reflection error for photolithography

Also Published As

Publication number Publication date
JPS6212657B2 (en) 1987-03-19

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