JPS51117136A - Plasma etching process - Google Patents
Plasma etching processInfo
- Publication number
- JPS51117136A JPS51117136A JP4219875A JP4219875A JPS51117136A JP S51117136 A JPS51117136 A JP S51117136A JP 4219875 A JP4219875 A JP 4219875A JP 4219875 A JP4219875 A JP 4219875A JP S51117136 A JPS51117136 A JP S51117136A
- Authority
- JP
- Japan
- Prior art keywords
- etching process
- plasma etching
- plasma
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4219875A JPS51117136A (en) | 1975-04-09 | 1975-04-09 | Plasma etching process |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4219875A JPS51117136A (en) | 1975-04-09 | 1975-04-09 | Plasma etching process |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS51117136A true JPS51117136A (en) | 1976-10-15 |
JPS5745308B2 JPS5745308B2 (en) | 1982-09-27 |
Family
ID=12629299
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4219875A Granted JPS51117136A (en) | 1975-04-09 | 1975-04-09 | Plasma etching process |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS51117136A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS535974A (en) * | 1976-07-02 | 1978-01-19 | Philips Nv | Method of manufacturing appartus and apparatus manufactured by method thereof |
JPS54158183A (en) * | 1978-06-05 | 1979-12-13 | Oki Electric Ind Co Ltd | Manufacture of semiconductor device |
JPS56118355A (en) * | 1980-02-22 | 1981-09-17 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Preparation of semiconductor device |
JPS5984529A (en) * | 1982-11-08 | 1984-05-16 | Nippon Denso Co Ltd | Forming method of pattern |
JPS59165423A (en) * | 1983-03-11 | 1984-09-18 | Comput Basic Mach Technol Res Assoc | Tapered etching of organic resin film |
JPS611027A (en) * | 1984-05-18 | 1986-01-07 | Fujitsu Ltd | Manufacture of semiconductor device |
JPS611028A (en) * | 1984-05-18 | 1986-01-07 | Fujitsu Ltd | Manufacture of semiconductor device |
-
1975
- 1975-04-09 JP JP4219875A patent/JPS51117136A/en active Granted
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS535974A (en) * | 1976-07-02 | 1978-01-19 | Philips Nv | Method of manufacturing appartus and apparatus manufactured by method thereof |
JPS6031100B2 (en) * | 1976-07-02 | 1985-07-20 | エヌ・ベ−・フイリツプス・フル−イランペンフアブリケン | Method of manufacturing the device |
JPS54158183A (en) * | 1978-06-05 | 1979-12-13 | Oki Electric Ind Co Ltd | Manufacture of semiconductor device |
JPS56118355A (en) * | 1980-02-22 | 1981-09-17 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Preparation of semiconductor device |
JPS6234149B2 (en) * | 1980-02-22 | 1987-07-24 | Cho Eru Esu Ai Gijutsu Kenkyu Kumiai | |
JPS5984529A (en) * | 1982-11-08 | 1984-05-16 | Nippon Denso Co Ltd | Forming method of pattern |
JPH045260B2 (en) * | 1982-11-08 | 1992-01-30 | ||
JPS59165423A (en) * | 1983-03-11 | 1984-09-18 | Comput Basic Mach Technol Res Assoc | Tapered etching of organic resin film |
JPS611027A (en) * | 1984-05-18 | 1986-01-07 | Fujitsu Ltd | Manufacture of semiconductor device |
JPS611028A (en) * | 1984-05-18 | 1986-01-07 | Fujitsu Ltd | Manufacture of semiconductor device |
JPH037146B2 (en) * | 1984-05-18 | 1991-01-31 | Fujitsu Ltd | |
JPH037145B2 (en) * | 1984-05-18 | 1991-01-31 | Fujitsu Ltd |
Also Published As
Publication number | Publication date |
---|---|
JPS5745308B2 (en) | 1982-09-27 |
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