JPS51117136A - Plasma etching process - Google Patents

Plasma etching process

Info

Publication number
JPS51117136A
JPS51117136A JP4219875A JP4219875A JPS51117136A JP S51117136 A JPS51117136 A JP S51117136A JP 4219875 A JP4219875 A JP 4219875A JP 4219875 A JP4219875 A JP 4219875A JP S51117136 A JPS51117136 A JP S51117136A
Authority
JP
Japan
Prior art keywords
etching process
plasma etching
plasma
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4219875A
Other languages
Japanese (ja)
Other versions
JPS5745308B2 (en
Inventor
Kiyokatsu Jinno
Suekichi Inomata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP4219875A priority Critical patent/JPS51117136A/en
Publication of JPS51117136A publication Critical patent/JPS51117136A/en
Publication of JPS5745308B2 publication Critical patent/JPS5745308B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP4219875A 1975-04-09 1975-04-09 Plasma etching process Granted JPS51117136A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4219875A JPS51117136A (en) 1975-04-09 1975-04-09 Plasma etching process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4219875A JPS51117136A (en) 1975-04-09 1975-04-09 Plasma etching process

Publications (2)

Publication Number Publication Date
JPS51117136A true JPS51117136A (en) 1976-10-15
JPS5745308B2 JPS5745308B2 (en) 1982-09-27

Family

ID=12629299

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4219875A Granted JPS51117136A (en) 1975-04-09 1975-04-09 Plasma etching process

Country Status (1)

Country Link
JP (1) JPS51117136A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS535974A (en) * 1976-07-02 1978-01-19 Philips Nv Method of manufacturing appartus and apparatus manufactured by method thereof
JPS54158183A (en) * 1978-06-05 1979-12-13 Oki Electric Ind Co Ltd Manufacture of semiconductor device
JPS56118355A (en) * 1980-02-22 1981-09-17 Chiyou Lsi Gijutsu Kenkyu Kumiai Preparation of semiconductor device
JPS5984529A (en) * 1982-11-08 1984-05-16 Nippon Denso Co Ltd Forming method of pattern
JPS59165423A (en) * 1983-03-11 1984-09-18 Comput Basic Mach Technol Res Assoc Tapered etching of organic resin film
JPS611027A (en) * 1984-05-18 1986-01-07 Fujitsu Ltd Manufacture of semiconductor device
JPS611028A (en) * 1984-05-18 1986-01-07 Fujitsu Ltd Manufacture of semiconductor device

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS535974A (en) * 1976-07-02 1978-01-19 Philips Nv Method of manufacturing appartus and apparatus manufactured by method thereof
JPS6031100B2 (en) * 1976-07-02 1985-07-20 エヌ・ベ−・フイリツプス・フル−イランペンフアブリケン Method of manufacturing the device
JPS54158183A (en) * 1978-06-05 1979-12-13 Oki Electric Ind Co Ltd Manufacture of semiconductor device
JPS56118355A (en) * 1980-02-22 1981-09-17 Chiyou Lsi Gijutsu Kenkyu Kumiai Preparation of semiconductor device
JPS6234149B2 (en) * 1980-02-22 1987-07-24 Cho Eru Esu Ai Gijutsu Kenkyu Kumiai
JPS5984529A (en) * 1982-11-08 1984-05-16 Nippon Denso Co Ltd Forming method of pattern
JPH045260B2 (en) * 1982-11-08 1992-01-30
JPS59165423A (en) * 1983-03-11 1984-09-18 Comput Basic Mach Technol Res Assoc Tapered etching of organic resin film
JPS611027A (en) * 1984-05-18 1986-01-07 Fujitsu Ltd Manufacture of semiconductor device
JPS611028A (en) * 1984-05-18 1986-01-07 Fujitsu Ltd Manufacture of semiconductor device
JPH037146B2 (en) * 1984-05-18 1991-01-31 Fujitsu Ltd
JPH037145B2 (en) * 1984-05-18 1991-01-31 Fujitsu Ltd

Also Published As

Publication number Publication date
JPS5745308B2 (en) 1982-09-27

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