JPS5012971A - - Google Patents

Info

Publication number
JPS5012971A
JPS5012971A JP6281173A JP6281173A JPS5012971A JP S5012971 A JPS5012971 A JP S5012971A JP 6281173 A JP6281173 A JP 6281173A JP 6281173 A JP6281173 A JP 6281173A JP S5012971 A JPS5012971 A JP S5012971A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6281173A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6281173A priority Critical patent/JPS5012971A/ja
Publication of JPS5012971A publication Critical patent/JPS5012971A/ja
Pending legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
JP6281173A 1973-06-04 1973-06-04 Pending JPS5012971A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6281173A JPS5012971A (ja) 1973-06-04 1973-06-04

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6281173A JPS5012971A (ja) 1973-06-04 1973-06-04

Publications (1)

Publication Number Publication Date
JPS5012971A true JPS5012971A (ja) 1975-02-10

Family

ID=13211083

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6281173A Pending JPS5012971A (ja) 1973-06-04 1973-06-04

Country Status (1)

Country Link
JP (1) JPS5012971A (ja)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5522140U (ja) * 1978-07-28 1980-02-13
JPS5745932A (en) * 1980-09-03 1982-03-16 Hitachi Ltd Heat treating device for wafer
JPS5787528U (ja) * 1980-11-18 1982-05-29
JPS57188341U (ja) * 1981-05-25 1982-11-30
EP0079121A2 (en) * 1981-11-07 1983-05-18 E.I. Du Pont De Nemours And Company Apparatus and method for conveying flat members through a processing unit
JPS5932123A (ja) * 1982-08-18 1984-02-21 Sony Corp 気相成長法
JPS5950095A (ja) * 1982-09-10 1984-03-22 ジェミニ リサーチ, インコーポレイテッド 化学反応器
JPS5996829U (ja) * 1982-12-21 1984-06-30 日本電気株式会社 半導体ウエ−ハの発熱担体
US5242501A (en) * 1982-09-10 1993-09-07 Lam Research Corporation Susceptor in chemical vapor deposition reactors
JP2000269150A (ja) * 1999-03-19 2000-09-29 Toshiba Ceramics Co Ltd 半導体ウエハ加熱処理用治具及びこれを用いた半導体ウエハ加熱処理用装置
JP2010245396A (ja) * 2009-04-08 2010-10-28 Sumco Corp Soiウェーハの製造方法及び貼り合わせ装置

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5742174Y2 (ja) * 1978-07-28 1982-09-17
JPS5522140U (ja) * 1978-07-28 1980-02-13
JPS5745932A (en) * 1980-09-03 1982-03-16 Hitachi Ltd Heat treating device for wafer
JPS5787528U (ja) * 1980-11-18 1982-05-29
JPS57188341U (ja) * 1981-05-25 1982-11-30
EP0079121A3 (en) * 1981-11-07 1984-05-16 E.I. Du Pont De Nemours And Company Apparatus and method for conveying flat members through a processing unit
EP0079121A2 (en) * 1981-11-07 1983-05-18 E.I. Du Pont De Nemours And Company Apparatus and method for conveying flat members through a processing unit
JPS5932123A (ja) * 1982-08-18 1984-02-21 Sony Corp 気相成長法
JPS5950095A (ja) * 1982-09-10 1984-03-22 ジェミニ リサーチ, インコーポレイテッド 化学反応器
US5242501A (en) * 1982-09-10 1993-09-07 Lam Research Corporation Susceptor in chemical vapor deposition reactors
JPS5996829U (ja) * 1982-12-21 1984-06-30 日本電気株式会社 半導体ウエ−ハの発熱担体
JP2000269150A (ja) * 1999-03-19 2000-09-29 Toshiba Ceramics Co Ltd 半導体ウエハ加熱処理用治具及びこれを用いた半導体ウエハ加熱処理用装置
JP2010245396A (ja) * 2009-04-08 2010-10-28 Sumco Corp Soiウェーハの製造方法及び貼り合わせ装置

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