JPS4954999A - - Google Patents

Info

Publication number
JPS4954999A
JPS4954999A JP48046324A JP4632473A JPS4954999A JP S4954999 A JPS4954999 A JP S4954999A JP 48046324 A JP48046324 A JP 48046324A JP 4632473 A JP4632473 A JP 4632473A JP S4954999 A JPS4954999 A JP S4954999A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP48046324A
Other languages
Japanese (ja)
Other versions
JPS5218958B2 (de
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4954999A publication Critical patent/JPS4954999A/ja
Publication of JPS5218958B2 publication Critical patent/JPS5218958B2/ja
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1471Arrangements for directing or deflecting the discharge along a desired path for centering, aligning or positioning of ray or beam
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/70Arrangements for deflecting ray or beam
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045Object or beam position registration
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00Superconductor technology: apparatus, material, process
    • Y10S505/825Apparatus per se, device per se, or process of making or operating same
    • Y10S505/872Magnetic field shield

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Particle Accelerators (AREA)
  • Welding Or Cutting Using Electron Beams (AREA)
JP48046324A 1972-04-25 1973-04-25 Expired JPS5218958B2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR727214639A FR2181467B1 (de) 1972-04-25 1972-04-25

Publications (2)

Publication Number Publication Date
JPS4954999A true JPS4954999A (de) 1974-05-28
JPS5218958B2 JPS5218958B2 (de) 1977-05-25

Family

ID=9097484

Family Applications (1)

Application Number Title Priority Date Filing Date
JP48046324A Expired JPS5218958B2 (de) 1972-04-25 1973-04-25

Country Status (5)

Country Link
US (1) US3864597A (de)
JP (1) JPS5218958B2 (de)
DE (1) DE2320888C3 (de)
FR (1) FR2181467B1 (de)
GB (1) GB1396209A (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5186357A (ja) * 1975-01-27 1976-07-28 Nippon Electron Optics Lab Denshisenichisetsuteihohooyobisoreojitsushiserusochi

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL182924C (nl) * 1978-05-12 1988-06-01 Philips Nv Inrichting voor het implanteren van ionen in een trefplaat.
DE2831602A1 (de) * 1978-07-19 1980-02-07 Leybold Heraeus Gmbh & Co Kg Vorrichtung zur erfassung von strahlparametern eines periodisch ueber eine zielflaeche gefuehrten, fokussierten ladungstraegerstrahls und messverfahren unter verwendung der vorrichtung
JPS5548949A (en) * 1978-10-02 1980-04-08 Jones Geraint A C Scribing device and method
US4243866A (en) * 1979-01-11 1981-01-06 International Business Machines Corporation Method and apparatus for forming a variable size electron beam
JPS5621321A (en) * 1979-07-27 1981-02-27 Fujitsu Ltd Automatically setting method of focus and exposure coefficient of electron beam exposure apparatus
JPS5633830A (en) * 1979-08-29 1981-04-04 Fujitsu Ltd Detecting method for mark positioning by electron beam
JPS6068692U (ja) * 1983-10-14 1985-05-15 横河電機株式会社 回路ユニツト収納機構
JPS60201626A (ja) * 1984-03-27 1985-10-12 Canon Inc 位置合わせ装置
US4677296A (en) * 1984-09-24 1987-06-30 Siemens Aktiengesellschaft Apparatus and method for measuring lengths in a scanning particle microscope
US4721842A (en) * 1986-08-29 1988-01-26 Ferranti Sciaky, Inc. Beam position correction device
US5786601A (en) * 1994-06-28 1998-07-28 Leica Lithography Systems Ltd. Electron beam lithography machine

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1171461A (en) * 1965-09-23 1969-11-19 Ass Elect Ind Improvements relating to the Focussing of Microscopes
US3547074A (en) * 1967-04-13 1970-12-15 Block Engineering Apparatus for forming microelements
US3491236A (en) * 1967-09-28 1970-01-20 Gen Electric Electron beam fabrication of microelectronic circuit patterns
US3699304A (en) * 1969-12-15 1972-10-17 Ibm Electron beam deflection control method and apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5186357A (ja) * 1975-01-27 1976-07-28 Nippon Electron Optics Lab Denshisenichisetsuteihohooyobisoreojitsushiserusochi

Also Published As

Publication number Publication date
DE2320888B2 (de) 1979-02-22
FR2181467B1 (de) 1974-07-26
GB1396209A (en) 1975-06-04
DE2320888A1 (de) 1973-11-08
US3864597A (en) 1975-02-04
DE2320888C3 (de) 1979-10-25
FR2181467A1 (de) 1973-12-07
JPS5218958B2 (de) 1977-05-25

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