JPS4854868A - - Google Patents
Info
- Publication number
- JPS4854868A JPS4854868A JP8899371A JP8899371A JPS4854868A JP S4854868 A JPS4854868 A JP S4854868A JP 8899371 A JP8899371 A JP 8899371A JP 8899371 A JP8899371 A JP 8899371A JP S4854868 A JPS4854868 A JP S4854868A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8899371A JPS5117376B2 (ja) | 1971-11-10 | 1971-11-10 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8899371A JPS5117376B2 (ja) | 1971-11-10 | 1971-11-10 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4854868A true JPS4854868A (ja) | 1973-08-01 |
| JPS5117376B2 JPS5117376B2 (ja) | 1976-06-02 |
Family
ID=13958321
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8899371A Expired JPS5117376B2 (ja) | 1971-11-10 | 1971-11-10 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5117376B2 (ja) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5060184A (ja) * | 1973-09-21 | 1975-05-23 | ||
| JPS5837137U (ja) * | 1981-09-04 | 1983-03-10 | 株式会社日立国際電気 | 半導体基板保持治具 |
| JPS5866325A (ja) * | 1981-10-15 | 1983-04-20 | Toshiba Ceramics Co Ltd | エピタキシヤル成長用サセプタ− |
| JPS6077971A (ja) * | 1983-10-06 | 1985-05-02 | Ulvac Corp | 化学反応を利用した縦型インラインプロセス装置 |
| JPS6223983A (ja) * | 1985-07-25 | 1987-01-31 | Anelva Corp | 真空化学反応装置 |
| WO2023153369A1 (ja) * | 2022-02-10 | 2023-08-17 | 株式会社シー・ヴィ・リサーチ | 成膜装置及び成膜方法 |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5325425Y2 (ja) * | 1974-07-23 | 1978-06-29 | ||
| JPS5118477U (ja) * | 1974-07-29 | 1976-02-10 | ||
| JPS5115584A (ja) * | 1974-07-29 | 1976-02-07 | Tokunao Narumi | Kasoro |
| JPS52131877U (ja) * | 1976-04-01 | 1977-10-06 | ||
| JPS54105868A (en) * | 1979-01-16 | 1979-08-20 | Tokunao Narumi | Crematory |
| JPS55150228U (ja) * | 1979-04-17 | 1980-10-29 | ||
| JPS6086725U (ja) * | 1983-11-11 | 1985-06-14 | 鳴海 徳直 | 火葬炉における渦流火導孔装置 |
-
1971
- 1971-11-10 JP JP8899371A patent/JPS5117376B2/ja not_active Expired
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5060184A (ja) * | 1973-09-21 | 1975-05-23 | ||
| JPS5420117B2 (ja) * | 1973-09-21 | 1979-07-20 | ||
| JPS5837137U (ja) * | 1981-09-04 | 1983-03-10 | 株式会社日立国際電気 | 半導体基板保持治具 |
| JPS5866325A (ja) * | 1981-10-15 | 1983-04-20 | Toshiba Ceramics Co Ltd | エピタキシヤル成長用サセプタ− |
| JPS6077971A (ja) * | 1983-10-06 | 1985-05-02 | Ulvac Corp | 化学反応を利用した縦型インラインプロセス装置 |
| JPH0365432B2 (ja) * | 1983-10-06 | 1991-10-11 | ||
| JPS6223983A (ja) * | 1985-07-25 | 1987-01-31 | Anelva Corp | 真空化学反応装置 |
| WO2023153369A1 (ja) * | 2022-02-10 | 2023-08-17 | 株式会社シー・ヴィ・リサーチ | 成膜装置及び成膜方法 |
| JP2023117377A (ja) * | 2022-02-10 | 2023-08-23 | 株式会社シー・ヴィ・リサーチ | 成膜装置、成膜方法及びガスノズル |
| JP2023117347A (ja) * | 2022-02-10 | 2023-08-23 | 株式会社シー・ヴィ・リサーチ | 成膜装置、成膜方法及びガスノズル |
| KR20230157469A (ko) | 2022-02-10 | 2023-11-16 | 씨브이 리사치 가부시키가이샤 | 성막 장치 및 성막 방법 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5117376B2 (ja) | 1976-06-02 |