JPH1174076A - Manufacture of luminous display - Google Patents

Manufacture of luminous display

Info

Publication number
JPH1174076A
JPH1174076A JP9232634A JP23263497A JPH1174076A JP H1174076 A JPH1174076 A JP H1174076A JP 9232634 A JP9232634 A JP 9232634A JP 23263497 A JP23263497 A JP 23263497A JP H1174076 A JPH1174076 A JP H1174076A
Authority
JP
Japan
Prior art keywords
bank
die
light
banks
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP9232634A
Other languages
Japanese (ja)
Inventor
Sadao Kanbe
貞男 神戸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP9232634A priority Critical patent/JPH1174076A/en
Publication of JPH1174076A publication Critical patent/JPH1174076A/en
Withdrawn legal-status Critical Current

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  • Electroluminescent Light Sources (AREA)

Abstract

PROBLEM TO BE SOLVED: To manufacture banks, for demarcating a luminous layer, by a simple method, by closely fitting a silicon resin die, bored with a groove into a bank shape, to a substrate after forming a transparent electrode, penetrating and packing a liquid raw material for the banks into a formed space, and then solidifying the raw material, after that, removing the resin die to make the banks. SOLUTION: A metallic substrate, wherein holes are bored into a grid state at the width and height of banks 21 and at a size enclosed by a grid, is adopted as a die to form the die by silicon resin. A silicon resin die 22 thus obtained is closely fitted to a TFT substrate formed of a TFTT element and an ITO transparent electrode having a matrix state. The periphery of the die is covered by a glass precursor to be left at ambient temperature, and is entered into the inside by utilizing surface tension. When the entering is completed, the periphery of the die is left at room temperature to be solidified; and after the solidification, the silicon resin die 22 is removed to be dried at given temperature. The solution of an organic EL material, in accordance with blue, green, and red, is partitioned into the grids formed of the bank 21 in the obtained TFT substrate with the banks.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は発光ディスプレイの
製造方法に係わり、更に詳しくは有機EL材料を用いた
発光ディスプレイの製造方法に関する。
The present invention relates to a method for manufacturing a light emitting display, and more particularly, to a method for manufacturing a light emitting display using an organic EL material.

【0002】[0002]

【従来の技術】近年液晶表示体がワードプロセッサー、
パーソナルコンピュータ等の表示部として盛んに用いら
れている。この液晶表示体は非発光素子であり、明るさ
の点、特に反射型ディスプレイで用いるとき問題とな
る。ここへきて薄型、軽量の特徴を有す有機の発光材料
(以後有機EL材料という)を用いた発光ディスプレイ
が注目されている。
2. Description of the Related Art In recent years, liquid crystal displays have become word processors,
It is widely used as a display unit of a personal computer or the like. This liquid crystal display is a non-light-emitting element, and poses a problem in terms of brightness, particularly when used in a reflective display. Attention has been paid to a light-emitting display using an organic light-emitting material having a thin and lightweight characteristic (hereinafter referred to as an organic EL material).

【0003】この発光ディスプレイの断面図を図1に示
す。図において1はアルミニウム電極を、2は有機EL
材料を、3はITO透明電極を、4はガラス基板を、5
は電源をそれぞれ示す。図よりわかるようにガラス基板
がわずかに厚みを要求される他はミクロンのオーダーで
あり、非常に薄いディスプレイである。
FIG. 1 shows a cross-sectional view of this light emitting display. In the figure, 1 is an aluminum electrode, 2 is an organic EL
Material, 3 is ITO transparent electrode, 4 is glass substrate, 5
Indicates a power source, respectively. As can be seen, the display is of the order of microns and very thin, except that the glass substrate is required to be slightly thick.

【0004】この発光ディスプレイの製造方法は以下の
通りである。まず、透明基板上にスパッター法、又は蒸
着法によりITO等の透明電極を作成する。しかる後、
ホトリソグラフィー法等により所望の電極を形成する。
更に、この基板上にスピンコート法、蒸着法等により有
機EL材料を成膜し発光層とする。更に、この上に仕事
関数の低い金属、例えば、マグネシウム、カルシウム、
アルミニウム、リチウム、銀、あるいはこれら金属の合
金を蒸着法、スパッター法等により成膜する事により対
向電極とする。以上が基本の工程であるが、発光効率を
上げるために、更に透明電極と発光層の間にホール輸送
層、例えばN,N’−ジフェニル−N,N’−(2,4
−ジメチルフェニル)−1,1’−ビフェニル−4,
4’−ジアミン層を設けても良い。また発光層と対向電
極の間に電子輸送層、例えば2−(4−ビフェニル)−
5−(4−tert−ブチルフェニル)−1,3,4−
オキシジアゾール層を設けても良い。
[0004] The manufacturing method of this light emitting display is as follows. First, a transparent electrode such as ITO is formed on a transparent substrate by a sputtering method or a vapor deposition method. After a while
A desired electrode is formed by photolithography or the like.
Further, an organic EL material is formed on the substrate by a spin coating method, a vapor deposition method, or the like to form a light emitting layer. In addition, low work function metals such as magnesium, calcium,
A counter electrode is formed by forming a film of aluminum, lithium, silver, or an alloy of these metals by a vapor deposition method, a sputtering method, or the like. The above is the basic process, but in order to increase the luminous efficiency, a hole transport layer such as N, N′-diphenyl-N, N ′-(2,4
-Dimethylphenyl) -1,1'-biphenyl-4,
A 4'-diamine layer may be provided. Also, an electron transporting layer between the light emitting layer and the counter electrode, for example, 2- (4-biphenyl)-
5- (4-tert-butylphenyl) -1,3,4-
An oxydiazole layer may be provided.

【0005】この対向する電極間に電界を印加する事に
より発光させることができる。この発光ディスプレイの
特徴として、10ボルト以下の電圧で駆動できることが
ある。
Light can be emitted by applying an electric field between the opposing electrodes. A feature of this light emitting display is that it can be driven with a voltage of 10 volts or less.

【0006】[0006]

【発明が解決しようとする課題】この有機EL材料を用
いた発光ディスプレイは将来有望な技術であるが、フル
カラー化をねらう場合問題があった。すなわち、青、
緑、赤をどのように別々に区分けするかが問題であっ
た。ここへきてリソグラフィー法により電極上に土手を
形成し、その土手内に吐出装置を用い青、緑、赤の有機
EL材料を溶かした溶液を吐出し、溶媒を乾燥除去し発
光層とする方法が注目されている。
The light-emitting display using the organic EL material is a promising technology in the future, but has a problem in the case of achieving full color. That is, blue,
The problem was how to separate green and red separately. Here, there is a method in which a bank is formed on the electrode by lithography, a solution in which blue, green, and red organic EL materials are dissolved is discharged using a discharge device into the bank, and the solvent is removed by drying to form a light emitting layer. Attention has been paid.

【0007】従来、土手はホトリソグラフィー法により
形成されていたが、この場合あまり深い土手を形成する
ことは困難であった。このため吐出装置により吐出され
る有機EL材料の濃度を濃くする必要があった。しかし
あまり濃くすると吐出装置が目詰まりを起こす欠点があ
った。本発明はこのような問題を解決するためになされ
たもので、その目的は、発光層を区切る土手を、ホトリ
ソグラフィー法を使わない簡便な方法で作成する事にあ
り、さらに色々な材料で好適な土手を形成でき、深く形
成出来る方法を提供するためになされたものである。そ
してその結果、吐出装置を用いフルカラー化可能な発光
ディスプレイを効率良く、低コストで実現することにあ
る。
Conventionally, a bank was formed by photolithography, but in this case, it was difficult to form a very deep bank. Therefore, it is necessary to increase the concentration of the organic EL material discharged by the discharge device. However, if the density is too high, there is a disadvantage that the discharge device is clogged. The present invention has been made to solve such a problem, and its purpose is to create a bank that separates a light emitting layer by a simple method that does not use a photolithography method. The purpose of the present invention is to provide a method that can form a deep bank and a deep bank. As a result, an object of the present invention is to realize a light-emitting display capable of full-color display using an ejection device efficiently and at low cost.

【0008】[0008]

【課題を解決するための手段】上記課題を解決するため
に、請求項1の本発明の製造方法は、透明電極付き基板
の作成、発光層を区切る土手の透明電極基板上への形
成、その土手内に満たされる青、緑、赤色を発光する発
光層の形成、及び発光層上に形成される電極の形成より
なる発光ディスプレイの製造方法において、透明電極形
成後、土手の形状に溝の掘られたシリコン樹脂型を基板
に密着させ、出来た空間に土手用の液状の原料をしみ込
ませ、充填した後に固化させ、固化後シリコン樹脂型を
取り除き、土手とすることを特徴としている。このよう
な製造方法を採ることにより、ホトリソグラフィー法の
ような複雑高価な方法を採る必要がなくなる。またホト
リソグラフィー法では出来なかった深い土手を形成で
き、型は壊れるまで使用可能でコスト低減に役立つ。
In order to solve the above-mentioned problems, a manufacturing method of the present invention according to claim 1 includes the steps of: preparing a substrate with a transparent electrode; forming a light-emitting layer on the bank of the transparent electrode substrate; In a method for manufacturing a light-emitting display, comprising forming a light-emitting layer emitting blue, green, and red filled in a bank and forming an electrode formed on the light-emitting layer, after forming a transparent electrode, forming a groove in a bank shape. The obtained silicon resin mold is brought into close contact with a substrate, and a liquid material for a bank is impregnated into a formed space, solidified after filling, and after solidification, the silicon resin mold is removed to form a bank. By employing such a manufacturing method, it is not necessary to employ a complicated and expensive method such as a photolithography method. Also, a deep embankment that could not be formed by photolithography can be formed, and the mold can be used until it breaks, which helps to reduce costs.

【0009】本発明の製造方法はシリコン樹脂で型どり
し、溶液原料を用い型に流し込み固化させ土手とするこ
とに特徴を有する事にあり。その他の電極の型、土手の
材料、有機EL材料等にはとらわれないものである。例
えば電極としては、アクティーブ駆動型のTFT基板を
用いた発光ディスプレイや、パシイーブ駆動のマトリク
スディスプレイ等、いずれの電極にも対応できるもので
ある。また有機EL材料としては低分子型有機EL材
料、高分子型有機EL材料にも、溶液に出来る限り選択
出来ることは周知のことである。
The manufacturing method of the present invention is characterized in that it is molded with a silicone resin, poured into a mold using a solution raw material, and solidified to form a bank. It is not limited to other electrode types, bank materials, organic EL materials, and the like. For example, as the electrodes, any electrodes such as a light emitting display using an active drive type TFT substrate and a passive drive matrix display can be used. It is well known that a low molecular weight organic EL material and a high molecular weight organic EL material can be selected as a solution as much as possible.

【0010】請求項2の本発明の製造方法は、上述の土
手の液状原料がモノマー原料、又は高分子前駆体を含む
溶液であることを特徴としている。モノマー原料として
は、スチレン、メチルメタアクリレート等が、高分子前
駆体としてはポリアミド酸等が考えられる。
In a second aspect of the present invention, the liquid material of the bank is a solution containing a monomer material or a polymer precursor. Styrene, methyl methacrylate and the like can be considered as the monomer raw material, and polyamic acid and the like can be considered as the polymer precursor.

【0011】請求項3の本発明の製造方法は上述の土手
の液状原料がガラス前駆体溶液であることを特徴として
いる。ガラス前駆体溶液としては、テトラエチルシリケ
ート等のゾル溶液やポリシラザンの溶液等が考えられ
る。
A third aspect of the present invention is characterized in that the liquid material of the bank is a glass precursor solution. Examples of the glass precursor solution include a sol solution such as tetraethyl silicate and a polysilazane solution.

【0012】[0012]

【発明の実施の形態】以下本発明の実施形態を図面に基
づいて詳しく説明する。
Embodiments of the present invention will be described below in detail with reference to the drawings.

【0013】(実施例1)図2に示すような、土手の幅
20ミクロン、高さ4ミクロンで格子状に、格子の囲む
大きさ30ミクロン×130ミクロンで穴を掘った金属
基板を型とし、シリコン樹脂(東芝シリコーン製、TS
E3450)で型どりした。この様にして得た48.5
cm×36.5cmの大きさのシリコン樹脂型を、TF
T素子とITO透明電極をマトリクス状に形成したTF
T基板に密着させた後、型の回りを、ガラス前駆体(E
TSB−7000、テー・エス・ビー開発センター製、
粘度2CP)で覆い室温に放置し、表面張力を利用し、
内部に進入させた。進入が完結したところで1日室温で
放置し固化させた。固化後シリコン樹脂型を取り除き、
200度Cで乾燥し、強度を増した。このようにして得
られた土手付きTFT基板に、吐出装置を用い青、緑、
赤色に対応する有機EL材料の溶液を土手により形成さ
れる格子内に打ち分けた。以上の製造工程の概念図を図
3に示す。図において、31はインク材を打ち出すノズ
ルを、32は有機EL材料を、33は土手を、34はマ
トリクス状に形成されたITO透明電極を、35絶縁層
を、36はTFT素子をマトリクス状に形成したガラス
基板を、37はマトリクス状に形成され、ITO透明電
極と直結したTFT素子をそれぞれ示す。この後、溶媒
を乾燥除去し発光層とした後、最後にアルミニウム電極
を蒸着により形成し対向電極とした。
(Example 1) As shown in FIG. 2, a metal substrate having a width of 20 μm and a height of 4 μm in a grid shape as shown in FIG. , Silicone resin (made by Toshiba Silicone, TS
E3450). 48.5 obtained in this way
cm × 36.5 cm silicone resin mold with TF
TF with T element and ITO transparent electrode formed in matrix
After being brought into close contact with the T substrate, the glass precursor (E
TSB-7000, manufactured by TSB Development Center,
2CP) and leave it at room temperature.
Let go inside. When the entry was completed, it was left at room temperature for one day to solidify. After solidification, remove the silicone resin mold,
Dried at 200 ° C. to increase strength. On the TFT substrate with the bank thus obtained, blue, green,
The solution of the organic EL material corresponding to red was cut into the lattice formed by the banks. FIG. 3 shows a conceptual diagram of the above manufacturing process. In the figure, 31 is a nozzle for ejecting an ink material, 32 is an organic EL material, 33 is a bank, 34 is an ITO transparent electrode formed in a matrix, 35 is an insulating layer, and 36 is a TFT in a matrix. In the formed glass substrate, reference numeral 37 denotes a TFT element formed in a matrix and directly connected to an ITO transparent electrode. Thereafter, the solvent was removed by drying to form a light emitting layer. Finally, an aluminum electrode was formed by vapor deposition to form a counter electrode.

【0014】この対向電極上にガラス板をエポキシ樹脂
で張り合わせ保護層とした。
A glass plate was laminated on the counter electrode with an epoxy resin to form a protective layer.

【0015】このようにして得た発光ディスプレイは1
0ボルトで駆動でき、フルカラーを表示できた。 (実施例2)実施例1同様にして、図2に示すような、
土手の幅20ミクロン、高さ4ミクロンで格子状に、格
子の囲む大きさ30ミクロン×130ミクロンで穴を掘
った金属基板を型とし、シリコン樹脂(東芝シリコーン
製、TSE3450)で型どりした。このシリコン樹脂
型(48.5cm×36.5cm)を、短冊状に電極の
形成されたITO透明電極付き基板に密着させた後、型
の回りを、ガラス前駆体(ETSB−7000、テー・
エス・ビー開発センター製、粘度2CP)で覆い、室温
で表面張力を利用し、内部に進入させた。進入が完結し
たところで1日室温で放置し固化させた。固化後シリコ
ン樹脂型を取り除き、200度Cで乾燥し、強度を増し
た。このようにして得られた土手付きITO透明電極付
き基板に、吐出装置を用い青、緑、赤色に対応する有機
EL材料の溶液を土手により形成される格子内に打ち分
けた。以上の製造工程の概念図を図4に示す。図におい
て、41はインク材を打ち出すノズルを、42はガラス
基板を、43はITO透明電極を、45は土手を、46
は有機EL材をそれぞれ示す。この後、溶媒を乾燥除去
し発光層とした後、最後にアルミニウム電極を蒸着によ
りITO透明電極と直行するように短冊状に形成し対向
電極とした。
The light emitting display thus obtained is
It could be driven at 0 volts and could display full color. (Example 2) In the same manner as in Example 1, as shown in FIG.
A metal substrate having a bank width of 20 μm and a height of 4 μm in a grid shape and a hole surrounded by a grid with a size of 30 μm × 130 μm was used as a mold, and was molded with silicon resin (TSE3450, manufactured by Toshiba Silicone). After this silicon resin mold (48.5 cm × 36.5 cm) was brought into close contact with a substrate with an ITO transparent electrode having electrodes formed in a strip shape, a glass precursor (ETSB-7000, TA.
It was covered with SCP Development Center, viscosity 2CP) and allowed to enter inside at room temperature using surface tension. When the entry was completed, it was left at room temperature for one day to solidify. After solidification, the silicone resin mold was removed and dried at 200 ° C. to increase the strength. A solution of an organic EL material corresponding to blue, green, and red was separated into a lattice formed by the banks on the thus obtained substrate with the ITO transparent electrodes on the banks using a discharge device. FIG. 4 shows a conceptual diagram of the above manufacturing process. In the figure, 41 is a nozzle for ejecting an ink material, 42 is a glass substrate, 43 is an ITO transparent electrode, 45 is a bank, 46
Indicates an organic EL material. Thereafter, the solvent was removed by drying to form a light-emitting layer. Finally, an aluminum electrode was formed in a strip shape so as to be perpendicular to the ITO transparent electrode by vapor deposition to form a counter electrode.

【0016】この対向電極上にガラス板をエポキシ樹脂
で張り合わせ保護層とした。
A glass plate was laminated on the counter electrode with an epoxy resin to form a protective layer.

【0017】このようにして得た発光ディスプレイは1
0ボルトで駆動でき、マルチプレックス駆動によりフル
カラー表示できた。
The light emitting display thus obtained is
Driving was possible at 0 volts, and full-color display was achieved by multiplex driving.

【0018】[0018]

【発明の効果】以上述べたように、本発明の発光ディス
プレイの製造方法によれば、従来用いられていたホトリ
ソグラフィー法の変わりに、シリコン樹脂型を用いるこ
とが出来るのでコスト低減につながる。またシリコン樹
脂型を用いるため深い土手を形成できる。このため低濃
度の有機EL材を使用できるため、吐出装置の目詰まり
を防ぐことが出来る。
As described above, according to the method for manufacturing a light emitting display of the present invention, a silicon resin mold can be used in place of the conventionally used photolithography method, leading to cost reduction. Further, since a silicon resin mold is used, a deep bank can be formed. For this reason, since a low-concentration organic EL material can be used, clogging of the discharge device can be prevented.

【図面の簡単な説明】[Brief description of the drawings]

【図1】発光ディスプレイの断面図。FIG. 1 is a cross-sectional view of a light-emitting display.

【図2】シリコン樹脂型を作成する金属型とシリコン樹
脂型の断面図。
FIG. 2 is a cross-sectional view of a metal mold and a silicone resin mold for producing a silicone resin mold.

【図3】TFT基板を用いた製造工程の概念図。FIG. 3 is a conceptual diagram of a manufacturing process using a TFT substrate.

【図4】短冊状ITO透明電極付き基板を用いた製造工
程の概念図。
FIG. 4 is a conceptual diagram of a manufacturing process using a substrate having a rectangular ITO transparent electrode.

【符号の説明】[Explanation of symbols]

1.アルミニウム電極 2.有機EL材料 3.ITO透明電極 4.ガラス基板 5.電源 21.土手 22.シリコン樹脂型 31.ノズル 32.有機EL材料 33.土手 34.ITO透明電極 35.絶縁層 36.ガラス基板 37.TFT素子 41.ノズル 42.ガラス基板 43.ITO透明電極 44.土手 45.有機EL材 1. Aluminum electrode 2. Organic EL material 3. 3. ITO transparent electrode Glass substrate 5. Power supply 21. Embankment 22. Silicon resin mold 31. Nozzle 32. Organic EL material 33. Embankment 34. ITO transparent electrode 35. Insulating layer 36. Glass substrate 37. TFT element 41. Nozzle 42. Glass substrate 43. ITO transparent electrode 44. Embankment 45. Organic EL materials

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】透明電極付き基板の作成、発光層を区切る
土手の透明電極基板上への形成、その土手内に満たされ
る青、緑、赤色を発光する発光層の形成、及び発光層上
に形成される電極の形成よりなる発光ディスプレイの製
造方法において、透明電極形成後、土手の形状に溝の掘
られたシリコン樹脂型を基板に密着させ、出来た空間に
土手用の液状の原料をしみ込ませ、充填した後に固化さ
せ、固化後シリコン樹脂型を取り除き、土手とすること
を特徴とする発光ディスプレイの製造方法。
1. A substrate with a transparent electrode is formed, a light-emitting layer is formed on a transparent electrode substrate which divides a light-emitting layer, a light-emitting layer which emits blue, green, and red light is filled in the bank, and a light-emitting layer is formed on the light-emitting layer. In a method of manufacturing a light emitting display comprising forming electrodes to be formed, after forming a transparent electrode, a silicon resin mold in which a groove is dug into a bank shape is brought into close contact with a substrate, and a liquid material for the bank is impregnated into the formed space. And solidifying it after filling, removing the silicone resin mold after solidification, and using it as a bank.
【請求項2】請求項1の土手用の液状原料がモノマー原
料、又は高分子前駆体を含む溶液であることを特徴とす
る発光ディスプレイの製造方法。
2. A method for producing a light emitting display, wherein the liquid material for the bank of claim 1 is a solution containing a monomer material or a polymer precursor.
【請求項3】請求項1の土手用の液状原料がガラス前駆
体溶液であることを特徴とする発光ディスプレイの製造
方法。
3. A method for manufacturing a light-emitting display, wherein the liquid material for a bank according to claim 1 is a glass precursor solution.
JP9232634A 1997-08-28 1997-08-28 Manufacture of luminous display Withdrawn JPH1174076A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9232634A JPH1174076A (en) 1997-08-28 1997-08-28 Manufacture of luminous display

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9232634A JPH1174076A (en) 1997-08-28 1997-08-28 Manufacture of luminous display

Publications (1)

Publication Number Publication Date
JPH1174076A true JPH1174076A (en) 1999-03-16

Family

ID=16942385

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9232634A Withdrawn JPH1174076A (en) 1997-08-28 1997-08-28 Manufacture of luminous display

Country Status (1)

Country Link
JP (1) JPH1174076A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001093332A1 (en) * 2000-06-01 2001-12-06 Microemissive Displays Limited A method of creating a color optoelectronic device
KR20040007823A (en) * 2002-07-11 2004-01-28 엘지.필립스 엘시디 주식회사 The organic electro-luminescence device and method of fabricating of the same
US6720029B2 (en) 1999-08-06 2004-04-13 Sharp Kabushiki Kaisha Coating liquid for forming organic layer in organic LED display and method of manufacturing organic LED display
KR100450460B1 (en) * 2002-08-13 2004-09-30 엘지.필립스 엘시디 주식회사 Soft Mold for Organic Electroluminescent Device and Method for Fabricating the same
KR100472854B1 (en) * 2002-07-18 2005-03-10 엘지.필립스 엘시디 주식회사 Dual Panel Type Organic Electroluminescent Device and Method for Fabricating the same
KR100505343B1 (en) * 2002-11-28 2005-08-03 주식회사 미뉴타텍 Elastomer mold fabrication method for patterning and method for forming cathode separator wall of organic light emitting device by using it
KR100685930B1 (en) 2004-12-29 2007-02-23 엘지.필립스 엘시디 주식회사 A electro-Luminescence display device and a method for fabricating the same
US7378790B2 (en) 2001-05-02 2008-05-27 Seiko Epson Corporation Color display substrate, color filter substrate, color luminescent substrate, manufacturing method of color display substrate, electro-optical apparatus, electronic device, film-forming method, film-forming apparatus, and display motherboard

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6720029B2 (en) 1999-08-06 2004-04-13 Sharp Kabushiki Kaisha Coating liquid for forming organic layer in organic LED display and method of manufacturing organic LED display
WO2001093332A1 (en) * 2000-06-01 2001-12-06 Microemissive Displays Limited A method of creating a color optoelectronic device
US7378790B2 (en) 2001-05-02 2008-05-27 Seiko Epson Corporation Color display substrate, color filter substrate, color luminescent substrate, manufacturing method of color display substrate, electro-optical apparatus, electronic device, film-forming method, film-forming apparatus, and display motherboard
KR20040007823A (en) * 2002-07-11 2004-01-28 엘지.필립스 엘시디 주식회사 The organic electro-luminescence device and method of fabricating of the same
KR100472854B1 (en) * 2002-07-18 2005-03-10 엘지.필립스 엘시디 주식회사 Dual Panel Type Organic Electroluminescent Device and Method for Fabricating the same
KR100450460B1 (en) * 2002-08-13 2004-09-30 엘지.필립스 엘시디 주식회사 Soft Mold for Organic Electroluminescent Device and Method for Fabricating the same
KR100505343B1 (en) * 2002-11-28 2005-08-03 주식회사 미뉴타텍 Elastomer mold fabrication method for patterning and method for forming cathode separator wall of organic light emitting device by using it
KR100685930B1 (en) 2004-12-29 2007-02-23 엘지.필립스 엘시디 주식회사 A electro-Luminescence display device and a method for fabricating the same

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