JPH11512885A - ダイヤモンド状ナノコンポジット物質を使用する容量性の薄いフィルム - Google Patents
ダイヤモンド状ナノコンポジット物質を使用する容量性の薄いフィルムInfo
- Publication number
- JPH11512885A JPH11512885A JP9514314A JP51431497A JPH11512885A JP H11512885 A JPH11512885 A JP H11512885A JP 9514314 A JP9514314 A JP 9514314A JP 51431497 A JP51431497 A JP 51431497A JP H11512885 A JPH11512885 A JP H11512885A
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- Prior art keywords
- network
- diamond
- dopant
- carbon
- silicon
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- 239000000463 material Substances 0.000 title claims abstract description 43
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- 239000002019 doping agent Substances 0.000 claims abstract description 66
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 49
- 239000003990 capacitor Substances 0.000 claims abstract description 47
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 47
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 34
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 32
- 239000010703 silicon Substances 0.000 claims abstract description 30
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 25
- 150000001875 compounds Chemical class 0.000 claims abstract description 24
- 239000001257 hydrogen Substances 0.000 claims abstract description 24
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 24
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- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 17
- 239000000126 substance Substances 0.000 claims description 13
- 229910052751 metal Inorganic materials 0.000 claims description 11
- 239000002184 metal Substances 0.000 claims description 11
- 125000004429 atom Chemical group 0.000 claims description 9
- 239000010432 diamond Substances 0.000 claims description 6
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 6
- 150000002431 hydrogen Chemical class 0.000 claims description 6
- 230000015572 biosynthetic process Effects 0.000 claims description 5
- 239000004020 conductor Substances 0.000 claims description 5
- 229910003460 diamond Inorganic materials 0.000 claims description 5
- 229910052757 nitrogen Inorganic materials 0.000 claims description 5
- 229910052804 chromium Inorganic materials 0.000 claims description 4
- 239000011521 glass Substances 0.000 claims description 4
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- -1 polyphenylmethylsiloxane Polymers 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- 229910052721 tungsten Inorganic materials 0.000 claims description 4
- 229910052726 zirconium Inorganic materials 0.000 claims description 4
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- 229910052796 boron Inorganic materials 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 229910052732 germanium Inorganic materials 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 229910052741 iridium Inorganic materials 0.000 claims description 3
- 229910052744 lithium Inorganic materials 0.000 claims description 3
- 229910052749 magnesium Inorganic materials 0.000 claims description 3
- 229910052748 manganese Inorganic materials 0.000 claims description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 229910052758 niobium Inorganic materials 0.000 claims description 3
- 229910052763 palladium Inorganic materials 0.000 claims description 3
- 229910052697 platinum Inorganic materials 0.000 claims description 3
- 229910052702 rhenium Inorganic materials 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 229910052715 tantalum Inorganic materials 0.000 claims description 3
- 229910052720 vanadium Inorganic materials 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims description 2
- 239000011343 solid material Substances 0.000 claims 3
- 238000000354 decomposition reaction Methods 0.000 claims 2
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- 229910052708 sodium Inorganic materials 0.000 claims 2
- 125000005375 organosiloxane group Chemical group 0.000 claims 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 61
- 239000010408 film Substances 0.000 description 28
- 238000000151 deposition Methods 0.000 description 23
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- 239000002243 precursor Substances 0.000 description 12
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 10
- 239000007787 solid Substances 0.000 description 10
- 239000002245 particle Substances 0.000 description 8
- 238000005087 graphitization Methods 0.000 description 6
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- 229910052786 argon Inorganic materials 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 5
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- 229910018557 Si O Inorganic materials 0.000 description 3
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- 238000001704 evaporation Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 229910002804 graphite Inorganic materials 0.000 description 3
- 239000010439 graphite Substances 0.000 description 3
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- 230000007774 longterm Effects 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000004157 plasmatron Methods 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 2
- 229910018540 Si C Inorganic materials 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 229910052755 nonmetal Inorganic materials 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 150000003961 organosilicon compounds Chemical class 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- WTDRDQBEARUVNC-LURJTMIESA-N L-DOPA Chemical compound OC(=O)[C@@H](N)CC1=CC=C(O)C(O)=C1 WTDRDQBEARUVNC-LURJTMIESA-N 0.000 description 1
- 235000004443 Ricinus communis Nutrition 0.000 description 1
- 229910052770 Uranium Inorganic materials 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 210000001015 abdomen Anatomy 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 230000001464 adherent effect Effects 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 230000006793 arrhythmia Effects 0.000 description 1
- 206010003119 arrhythmia Diseases 0.000 description 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000007833 carbon precursor Substances 0.000 description 1
- 230000000747 cardiac effect Effects 0.000 description 1
- 206010061592 cardiac fibrillation Diseases 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000013626 chemical specie Substances 0.000 description 1
- 210000000038 chest Anatomy 0.000 description 1
- 230000009194 climbing Effects 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000007607 die coating method Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002003 electron diffraction Methods 0.000 description 1
- 238000001941 electron spectroscopy Methods 0.000 description 1
- 238000000192 extended X-ray absorption fine structure spectroscopy Methods 0.000 description 1
- 230000002600 fibrillogenic effect Effects 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 230000003116 impacting effect Effects 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000010849 ion bombardment Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000012705 liquid precursor Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 150000002843 nonmetals Chemical class 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920006289 polycarbonate film Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 238000001552 radio frequency sputter deposition Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 230000033764 rhythmic process Effects 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000004513 sizing Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 210000000115 thoracic cavity Anatomy 0.000 description 1
- WLTSUBTXQJEURO-UHFFFAOYSA-N thorium tungsten Chemical compound [W].[Th] WLTSUBTXQJEURO-UHFFFAOYSA-N 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 230000005641 tunneling Effects 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/018—Dielectrics
- H01G4/06—Solid dielectrics
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/018—Dielectrics
- H01G4/06—Solid dielectrics
- H01G4/08—Inorganic dielectrics
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S427/00—Coating processes
- Y10S427/103—Diamond-like carbon coating, i.e. DLC
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/43—Electric condenser making
- Y10T29/435—Solid dielectric type
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Inorganic Insulating Materials (AREA)
- Carbon And Carbon Compounds (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
- Ceramic Capacitors (AREA)
- Semiconductor Integrated Circuits (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.複数の導電性層および隣接導電性層の間の誘電性層を含んでなるコンデン サーの製造方法であって、誘電性層が、水素によって安定化されたダイヤモンド 状炭素ネットワーク、酸素によって安定化されたガラス状シリコンネットワーク 、および要すれば、周期表の1−7bおよび8族からの元素を含む非導電性ドー パント元素または非導電性ドーパント化合物の少なくとも1種のネットワークを 含んでなる相互侵入したネットワークを有するダイヤモンド状固体物質から形成 される方法。 2.炭素、水素、シリコンおよび酸素が、約1〜約10のシリコン原子を有す る有機シロキサンの分解から得られる請求項1に記載の方法。 3.有機シロキサンが、ポリフェニルメチルシロキサンである請求項2に記載 の方法。 4.ダイヤモンド状物質の炭素含量が、約40重量%〜約98重量%である請 求項1に記載の方法。 5.ダイヤモンド状物質の炭素含量が、約50重量〜約98重量%である請求 項1に記載の方法。 6.炭素とシリコンの重量比が、約2:1〜約8:1である請求項1に記載の 方法。 7.炭素とシリコンの重量比が、約0.5:1〜約3:1である請求項1に記 載の方法。 8.被覆を、金属基材上に蒸着する請求項1に記載の方法。 9.被覆を、非金属基材上に蒸着する請求項1に記載の方法。 10.ドーパント元素が、B、Li、Na、Si、Ge、Te、O、Mo、W 、Ta、Nb、Pd、Ir、Pt、V、Fe、Co、Mg、Mn、Ni、Ti、 Zr、Cr、Re、Hf、Cu、Al、N、AgおよびAuからなる群から選択 される請求項1に記載の方法。 11.炭素含量が、被覆の約40原子%より多く、水素含量が、炭素の約1〜 約40原子%であり、シリコン、酸素およびドーパントの合計が被覆の約2原 子%より多い請求項1に記載の方法。 12.誘電性物質が、約0.05〜約5μmの厚さで蒸着される請求項1に記 載の方法。 13.誘電性物質が、約0.1〜約2.0μmの厚さで蒸着される請求項1に 記載の方法。 14.導電性層が、水素によって安定化されたダイヤモンド状炭素ネットワー ク、酸素によって安定化されたガラス状シリコンネットワーク、および要すれば 、周期表の1−7bおよび8族からの元素を含む非導電性ドーパント元素または 非導電性ドーパント化合物の少なくとも1種のネットワークを含んでなる相互侵 入したネットワークを有するダイヤモンド状固体物質から形成される請求項1に 記載の方法。 15.導電性物質および誘電性物質の層を含んでなるコンデンサーであって、 誘電性物質の層が、導電性物質の隣接層の間に配置され、誘電性物質が、水素に よって安定化されたダイヤモンド状炭素ネットワーク、酸素によって安定化され たガラス状シリコンネットワーク、および要すれば、周期表の1−7bおよび8 族からの元素を含むドーパント元素またはドーパント化合物の少なくとも1種の ネットワークを含んでなる相互侵入したネットワークから形成されるダイヤモン ド状固体物質から形成されるコンデンサー。 16.炭素含量が、被覆の約40原子%より多く、水素含量が、炭素の約1〜 約40原子%であり、シリコン、酸素およびドーパントの合計が被覆の約2原子 %より多い請求項15に記載のコンデンサー。 17.炭素、水素、シリコンおよび酸素が、約1〜約10のシリコン原子を有 する有機シロキサンの分解から得られる請求項15に記載のコンデンサー。 18.有機シロキサンが、ポリフェニルメチルシロキサンである請求項15に 記載のコンデンサー。 19.ダイヤモンド状物質の炭素含量が、約40重量%〜約98重量%である 請求項15に記載のコンデンサー。 20.炭素とシリコンの重量比が、約2:1〜約8:1である請求項15に記 載のコンデンサー。 21.炭素とシリコンの重量比が、約0.5:1〜約3:1である請求項15 に記載のコンデンサー。 22.ドーパント元素が、B、Li、Na、Si、Ge、Te、O、Mo、W 、Ta、Nb、Pd、Ir、Pt、V、Fe、Co、Mg、Mn、Ni、Ti、 Zr、Cr、Re、Hf、Cu、Al、N、AgおよびAuからなる群から選択 される請求項15に記載のコンデンサー。 23.層が、約0.05〜約5μmの厚さで蒸着される請求項15に記載のコ ンデンサー。 24.層が、約0.1〜約2.0μmの厚さで蒸着される請求項15に記載の コンデンサー。 25.導電性層が、水素によって安定化されたダイヤモンド状炭素ネットワー ク、酸素によって安定化されたガラス状シリコンネットワーク、および要すれば 、周期表の1−7bおよび8族からの元素を含む非導電性ドーパント元素または 非導電性ドーパント化合物の少なくとも1種のネットワークを含んでなる相互侵 入したネットワークを有するダイヤモンド状物質を含んでなる物質から形成され る請求項15に記載のコンデンサー。 26.基材表面を供給すること および少なくとも1種の誘電性層で基材表面を被覆することを含んでな る基材の静電容量を制御する方法であって、誘電性層が、水素によって安定化さ れたダイヤモンド状炭素ネットワーク、酸素によって安定化されたガラス状シリ コンネットワーク、および要すれば、周期表の1−7bおよび8族からの元素を 含むドーパント元素またはドーパント化合物の少なくとも1種のネットワークを 含んでなる相互侵入したネットワークを有するダイヤモンド状固体状態物質から 形成される方法。 27.素子表面に帯電できる素子であって、 素子が、少なくとも1つの誘電性層および要すれば少なくとも1つの導電性層 を含んでなり、 誘電性の層が、水素によって安定化されたダイヤモンド状炭素ネットワーク、 酸素によって安定化されたガラス状シリコンネットワーク、および要すれば、周 期表の1−7bおよび8族からの元素を含むドーパント元素またはドーパント化 合物の少なくとも1種のネットワークを含んでなる相互侵入したネットワークを 有するダイヤモンド状物質を含んでなる素子。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/538,475 | 1995-10-03 | ||
US08/538,475 US5638251A (en) | 1995-10-03 | 1995-10-03 | Capacitive thin films using diamond-like nanocomposite materials |
PCT/US1996/015368 WO1997013263A1 (en) | 1995-10-03 | 1996-09-25 | Capacitive thin films using diamond-like nanocomposite materials |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH11512885A true JPH11512885A (ja) | 1999-11-02 |
JP3961025B2 JP3961025B2 (ja) | 2007-08-15 |
Family
ID=24147084
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP51431497A Expired - Fee Related JP3961025B2 (ja) | 1995-10-03 | 1996-09-25 | ダイヤモンド状ナノコンポジット物質を使用する容量性の薄いフィルム |
Country Status (12)
Country | Link |
---|---|
US (1) | US5638251A (ja) |
EP (1) | EP1008157B1 (ja) |
JP (1) | JP3961025B2 (ja) |
KR (1) | KR100449603B1 (ja) |
CN (1) | CN1111882C (ja) |
AT (1) | ATE293835T1 (ja) |
AU (1) | AU700713B2 (ja) |
CA (1) | CA2233631A1 (ja) |
DE (1) | DE69634641T2 (ja) |
MX (1) | MX9802581A (ja) |
TW (1) | TW355803B (ja) |
WO (1) | WO1997013263A1 (ja) |
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-
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- 1996-09-25 AU AU75132/96A patent/AU700713B2/en not_active Ceased
- 1996-09-25 WO PCT/US1996/015368 patent/WO1997013263A1/en active IP Right Grant
- 1996-09-25 AT AT96937640T patent/ATE293835T1/de not_active IP Right Cessation
- 1996-09-25 EP EP96937640A patent/EP1008157B1/en not_active Expired - Lifetime
- 1996-09-25 KR KR10-1998-0702428A patent/KR100449603B1/ko not_active IP Right Cessation
- 1996-09-25 CN CN96198464A patent/CN1111882C/zh not_active Expired - Fee Related
- 1996-09-25 DE DE69634641T patent/DE69634641T2/de not_active Expired - Lifetime
- 1996-09-25 JP JP51431497A patent/JP3961025B2/ja not_active Expired - Fee Related
-
1997
- 1997-04-01 TW TW086104157A patent/TW355803B/zh not_active IP Right Cessation
-
1998
- 1998-04-02 MX MX9802581A patent/MX9802581A/es unknown
Also Published As
Publication number | Publication date |
---|---|
ATE293835T1 (de) | 2005-05-15 |
CN1202978A (zh) | 1998-12-23 |
EP1008157A4 (en) | 2001-02-07 |
TW355803B (en) | 1999-04-11 |
JP3961025B2 (ja) | 2007-08-15 |
MX9802581A (es) | 1998-11-30 |
DE69634641D1 (de) | 2005-05-25 |
CN1111882C (zh) | 2003-06-18 |
DE69634641T2 (de) | 2006-03-02 |
AU700713B2 (en) | 1999-01-14 |
CA2233631A1 (en) | 1997-04-10 |
EP1008157A1 (en) | 2000-06-14 |
EP1008157B1 (en) | 2005-04-20 |
AU7513296A (en) | 1997-04-28 |
KR100449603B1 (ko) | 2004-11-16 |
KR19990063955A (ko) | 1999-07-26 |
WO1997013263A1 (en) | 1997-04-10 |
US5638251A (en) | 1997-06-10 |
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