JPH11509972A - 粒子光学機器のレンズ収差補正用補正装置 - Google Patents
粒子光学機器のレンズ収差補正用補正装置Info
- Publication number
- JPH11509972A JPH11509972A JP9541912A JP54191297A JPH11509972A JP H11509972 A JPH11509972 A JP H11509972A JP 9541912 A JP9541912 A JP 9541912A JP 54191297 A JP54191297 A JP 54191297A JP H11509972 A JPH11509972 A JP H11509972A
- Authority
- JP
- Japan
- Prior art keywords
- particle
- field
- optical axis
- correction device
- lens
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000004075 alteration Effects 0.000 title claims abstract description 58
- 238000012937 correction Methods 0.000 title claims abstract description 57
- 239000002245 particle Substances 0.000 title claims abstract description 43
- 230000003287 optical effect Effects 0.000 claims description 37
- 230000005684 electric field Effects 0.000 claims description 13
- 230000001902 propagating effect Effects 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 abstract description 6
- 230000005405 multipole Effects 0.000 description 17
- 238000010894 electron beam technology Methods 0.000 description 15
- 230000005284 excitation Effects 0.000 description 11
- 201000009310 astigmatism Diseases 0.000 description 6
- 238000003384 imaging method Methods 0.000 description 6
- 238000013461 design Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 3
- 230000033001 locomotion Effects 0.000 description 3
- 230000001133 acceleration Effects 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 description 1
- 235000003899 Brassica oleracea var acephala Nutrition 0.000 description 1
- 235000012905 Brassica oleracea var viridis Nutrition 0.000 description 1
- 244000064816 Brassica oleracea var. acephala Species 0.000 description 1
- 230000002730 additional effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004590 computer program Methods 0.000 description 1
- 238000005094 computer simulation Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000004816 latex Substances 0.000 description 1
- 229920000126 latex Polymers 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 230000005404 monopole Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/04—Means for controlling the discharge
- H01J2237/049—Focusing means
- H01J2237/0492—Lens systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/153—Correcting image defects, e.g. stigmators
- H01J2237/1534—Aberrations
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1. 機器内で照射されるべき対象物(14)を粒子ビームに晒すために装置の 光軸(4)に沿って伝搬する荷電粒子のビームを生成する粒子ソースと、 荷電粒子のビームを集束させる集束レンズ(8)と、 上記集束レンズ(8)のレンズ収差を補正する補正装置(28)とからなり、 上記補正装置(28)は、均一電界と、この均一電界に直交して延在する均一 磁界とを生成する磁極面を含み、両方の双極面は上記機器の光軸(4)に直交し て延在し、 上記補正装置は、電気的及び磁気的四重極場、六重極場、並びに、電気的及び /又は磁気的八重極場を生成する磁極面を更に有し、上記磁極面(30−i)は 上記機器の光軸(4)と実質的に平行して延在し、 上記補正装置は、上記六重極場の一部を形成し、かつ、相対的に上記光軸の周 りに180°回転させられた少なくとも二つの付加的な六重磁場を生成するため に配置されている粒子光学機器であって、 上記付加的な六重極場を決定する上記磁極面(30−i)は相互に隣接して配 置され、他の粒子光学素子がそれらの磁極面の間に設けられていないことを特徴 とする粒子光学機器。 2. 上記補正装置の二重極場及び四重極場は、上記機器の光軸に沿って伝搬す る荷電粒子の軌道が実質的に1周期を備えたサイン曲線として成形されるような 強度を有する請求項一記載の粒子光学機器。 3. 第1の付加的な六重極場を決定する磁極面の長さは、光軸の方向から見た 場合に、第2の付加的な六重極場を決定する磁極面の 長さと一致している請求項2記載の粒子光学機器。 4. スポット形成対物レンズを備えた走査型粒子光学機器として形成され、 上記補正装置が上記粒子ソースから見た場合に上記対物レンズよりも前になる ように機器無いに配置されている請求項1乃至3のうちいずれか1項記載の粒子 光学機器。 5. 粒子光学機器において集束レンズのレンズ収差を補正するため機械的剛性 ユニットとして構成されている請求項1乃至4のうちいずれか1項記載の補正装 置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP96201381 | 1996-05-21 | ||
EP96201381.9 | 1996-05-21 | ||
PCT/IB1997/000513 WO1997044811A1 (en) | 1996-05-21 | 1997-05-07 | Correction device for the correction of lens aberrations in particle-optical apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH11509972A true JPH11509972A (ja) | 1999-08-31 |
JP3985057B2 JP3985057B2 (ja) | 2007-10-03 |
Family
ID=8224004
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP54191297A Expired - Fee Related JP3985057B2 (ja) | 1996-05-21 | 1997-05-07 | 粒子光学機器のレンズ収差補正用補正装置 |
Country Status (6)
Country | Link |
---|---|
US (1) | US5838011A (ja) |
EP (1) | EP0840939B1 (ja) |
JP (1) | JP3985057B2 (ja) |
KR (1) | KR19990028770A (ja) |
DE (1) | DE69733873T2 (ja) |
WO (1) | WO1997044811A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006114304A (ja) * | 2004-10-14 | 2006-04-27 | Jeol Ltd | 自動収差補正方法及び装置 |
Families Citing this family (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001510624A (ja) * | 1996-12-03 | 2001-07-31 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 粒子光学的装置の動作方法 |
DE19739290A1 (de) * | 1997-09-08 | 1999-03-11 | Ceos Gmbh | Verfahren zur Beseitigung axialer Bildfehler erster, zweiter und dritter Ordnung bei Korrektur des Öffnungsfehlers dritter Ordnung in elektronen-optischen Systemen |
WO1999027558A1 (en) * | 1997-11-20 | 1999-06-03 | Philips Electron Optics B.V. | Electrostatic device for correcting chromatic aberration in a particle-optical apparatus |
WO1999030342A1 (en) | 1997-12-11 | 1999-06-17 | Philips Electron Optics B.V. | Correction device for correcting the spherical aberration in particle-optical apparatus |
WO1999033085A1 (en) * | 1997-12-22 | 1999-07-01 | Philips Electron Optics B.V. | Correction device for correcting chromatic aberration in particle-optical apparatus |
DE69827791T2 (de) * | 1998-09-23 | 2005-04-21 | Advantest Corp | Vorrichtung zur Reduzierung der Energieverteilung eines Teilchenstrahls und Teilchenstrahlgerät mit einer solchen Anordnung |
JP3757371B2 (ja) * | 1999-07-05 | 2006-03-22 | 日本電子株式会社 | エネルギーフィルタ及びそれを用いた電子顕微鏡 |
DE19944857A1 (de) * | 1999-09-18 | 2001-03-22 | Ceos Gmbh | Elektronenoptische Linsenanordnung mit weit verschiebbarer Achse |
JP2001118536A (ja) * | 1999-10-19 | 2001-04-27 | Nikon Corp | 荷電粒子ビーム制御素子および荷電粒子ビーム装置 |
DE10102527A1 (de) * | 2001-01-20 | 2002-07-25 | Ceos Gmbh | Elektrostatischer Korrektor |
JP4074185B2 (ja) * | 2002-12-17 | 2008-04-09 | 日本電子株式会社 | エネルギーフィルタ及び電子顕微鏡 |
EP1783811A3 (en) * | 2005-11-02 | 2008-02-27 | FEI Company | Corrector for the correction of chromatic aberrations in a particle-optical apparatus |
EP2091062A1 (en) * | 2008-02-13 | 2009-08-19 | FEI Company | TEM with aberration corrector and phase plate |
EP2128885A1 (en) | 2008-05-26 | 2009-12-02 | FEI Company | Charged particle source with integrated energy filter |
EP2131385A1 (en) * | 2008-06-05 | 2009-12-09 | FEI Company | Hybrid phase plate |
EP2166557A1 (en) * | 2008-09-22 | 2010-03-24 | FEI Company | Method for correcting distortions in a particle-optical apparatus |
EP2197018A1 (en) * | 2008-12-12 | 2010-06-16 | FEI Company | Method for determining distortions in a particle-optical apparatus |
US8053725B2 (en) * | 2009-06-29 | 2011-11-08 | Fei Company | Beam quality in FIB systems |
EP2325862A1 (en) * | 2009-11-18 | 2011-05-25 | Fei Company | Corrector for axial aberrations of a particle-optical lens |
US20110142362A1 (en) * | 2009-12-11 | 2011-06-16 | Marimon Sanjuan David | Method for filtering data with symmetric weighted integral images |
JP5677081B2 (ja) * | 2010-12-28 | 2015-02-25 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
DE102011009954A1 (de) * | 2011-02-01 | 2012-08-02 | Ceos Corrected Electron Optical Systems Gmbh | Korrektor |
EP2681755B1 (en) * | 2011-03-04 | 2017-06-07 | PerkinElmer Health Sciences, Inc. | Electrostatic lenses and systems including the same |
EP2511936B1 (en) | 2011-04-13 | 2013-10-02 | Fei Company | Distortion free stigmation of a TEM |
EP2584584A1 (en) | 2011-10-19 | 2013-04-24 | FEI Company | Method for adjusting a STEM equipped with an aberration corrector |
EP2704177B1 (en) | 2012-09-04 | 2014-11-26 | Fei Company | Method of investigating and correcting aberrations in a charged-particle lens system |
JP6134145B2 (ja) * | 2013-01-24 | 2017-05-24 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置及び荷電粒子線装置における軌道修正方法 |
JP6077960B2 (ja) * | 2013-07-24 | 2017-02-08 | 日本電子株式会社 | 球面収差補正装置、球面収差補正方法、および荷電粒子線装置 |
JP6219741B2 (ja) * | 2014-02-13 | 2017-10-25 | 日本電子株式会社 | 多極子レンズの製造方法、多極子レンズ、および荷電粒子線装置 |
TWI506666B (zh) * | 2014-08-08 | 2015-11-01 | Nat Univ Tsing Hua | 桌上型電子顯微鏡及其複合多極-聚焦可調式磁透鏡 |
US10157727B2 (en) | 2017-03-02 | 2018-12-18 | Fei Company | Aberration measurement in a charged particle microscope |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1463748A (en) * | 1973-09-03 | 1977-02-09 | Jeol Ltd | Electron beam apparatus |
DE3841715A1 (de) * | 1988-12-10 | 1990-06-13 | Zeiss Carl Fa | Abbildender korrektor vom wien-typ fuer elektronenmikroskope |
DE69026242T2 (de) * | 1990-04-12 | 1996-10-02 | Philips Electronics Nv | Korrekturvorrichtung für ein teilchengeladenes Strahlgerät |
NL9100294A (nl) * | 1991-02-20 | 1992-09-16 | Philips Nv | Geladen deeltjesbundelinrichting. |
US5336891A (en) * | 1992-06-16 | 1994-08-09 | Arch Development Corporation | Aberration free lens system for electron microscope |
-
1997
- 1997-05-07 DE DE69733873T patent/DE69733873T2/de not_active Expired - Lifetime
- 1997-05-07 JP JP54191297A patent/JP3985057B2/ja not_active Expired - Fee Related
- 1997-05-07 KR KR1019980700069A patent/KR19990028770A/ko not_active Application Discontinuation
- 1997-05-07 WO PCT/IB1997/000513 patent/WO1997044811A1/en active IP Right Grant
- 1997-05-07 EP EP97919578A patent/EP0840939B1/en not_active Expired - Lifetime
- 1997-05-21 US US08/861,345 patent/US5838011A/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006114304A (ja) * | 2004-10-14 | 2006-04-27 | Jeol Ltd | 自動収差補正方法及び装置 |
Also Published As
Publication number | Publication date |
---|---|
EP0840939A1 (en) | 1998-05-13 |
EP0840939B1 (en) | 2005-08-03 |
DE69733873T2 (de) | 2006-04-06 |
WO1997044811A1 (en) | 1997-11-27 |
US5838011A (en) | 1998-11-17 |
JP3985057B2 (ja) | 2007-10-03 |
DE69733873D1 (de) | 2005-09-08 |
KR19990028770A (ko) | 1999-04-15 |
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