JPH11340102A - Manufacture of electrode foil for aluminum electrolytic capacitor - Google Patents
Manufacture of electrode foil for aluminum electrolytic capacitorInfo
- Publication number
- JPH11340102A JPH11340102A JP14269498A JP14269498A JPH11340102A JP H11340102 A JPH11340102 A JP H11340102A JP 14269498 A JP14269498 A JP 14269498A JP 14269498 A JP14269498 A JP 14269498A JP H11340102 A JPH11340102 A JP H11340102A
- Authority
- JP
- Japan
- Prior art keywords
- foil
- electrolytic capacitor
- aluminum electrolytic
- electrode foil
- oxide film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- ing And Chemical Polishing (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は各種電子機器に使用
されるアルミニウム電解コンデンサの中で、特に低圧用
のアルミニウム電解コンデンサに使用される電極箔を製
造する際に最適なアルミニウム電解コンデンサ用電極箔
の製造方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electrode foil for an aluminum electrolytic capacitor which is most suitable for manufacturing an electrode foil used for an aluminum electrolytic capacitor for a low voltage among aluminum electrolytic capacitors used for various electronic devices. And a method for producing the same.
【０００２】[0002]
【従来の技術】従来、この種のアルミニウム電解コンデ
ンサは、エッチング工程によって実効表面積を拡大させ
たアルミニウム箔の表面に化成工程により誘電体となる
酸化皮膜を形成し、そしてこの陽極となるアルミニウム
箔と陰極箔とをその間に介在させたセパレータとともに
巻回することによりコンデンサ素子を構成し、このコン
デンサ素子に駆動用電解液を含浸させ、そしてこのコン
デンサ素子を金属ケース内に封止することにより構成し
ているのものであった。2. Description of the Related Art Conventionally, an aluminum electrolytic capacitor of this type forms an oxide film serving as a dielectric on a surface of an aluminum foil having an effective surface area enlarged by an etching process, and forms an anode with the aluminum foil serving as an anode. A capacitor element is formed by winding a cathode foil together with a separator interposed therebetween, by impregnating the capacitor element with a driving electrolyte, and sealing the capacitor element in a metal case. Was what it was.
【０００３】上記アルミニウム電解コンデンサにおける
アルミニウム箔のエッチング工程とは、アルミニウム箔
を塩化物溶液を主とした溶液中で化学的あるいは電気化
学的に腐食させることにより粗面化し、これを硝酸、硫
酸、リン酸などを用いてアルミニウム箔に付着した塩素
成分を除去する脱塩素処理を行ってからアルミニウム箔
の表面に水和皮膜を生成させ、これを乾燥後あるいは乾
燥なしでエッチングにより粗面化したアルミニウム箔の
表面に熱酸化皮膜を形成させるために熱処理を行い（特
開平４−２７９０１８号公報参照）、この熱処理後のエ
ッチングされたアルミニウム箔を巻き取った状態で次の
化成工程に移すようにしたものであった。なお、上記熱
処理によって熱酸化皮膜を形成するのは、次の化成工程
に生成する酸化皮膜への転化を促進するために行うもの
であり、大気中で行われているものであった。
[0003] The etching step of the aluminum foil in the aluminum electrolytic capacitor is to roughen the aluminum foil by chemically or electrochemically corroding the aluminum foil in a solution mainly containing a chloride solution, and to make the surface roughened by nitric acid, sulfuric acid, or the like. After performing a dechlorination treatment to remove the chlorine component attached to the aluminum foil using phosphoric acid, etc., a hydrated film is formed on the surface of the aluminum foil, and this aluminum is roughened by etching after drying or without drying Heat treatment is performed to form a thermal oxide film on the surface of the foil (see Japanese Patent Application Laid-Open No. Hei 4-279018), and the aluminum foil after the heat treatment is wound up and transferred to the next chemical conversion step. Was something. The formation of the thermal oxide film by the above heat treatment was performed to promote the conversion to the oxide film generated in the next chemical conversion step, and was performed in the air.
【０００４】[0004]
【発明が解決しようとする課題】しかしながら上記従来
の製造方法では、エッチングされたアルミニウム箔を大
気中で熱処理するために熱処理雰囲気の酸素濃度の影響
が大きく、酸素濃度が多すぎると単位面積当たりの静電
容量をロスさせるだけでなく漏れ電流の増加にもつなが
るという課題があった。However, in the above conventional manufacturing method, since the etched aluminum foil is heat-treated in the air, the influence of the oxygen concentration in the heat treatment atmosphere is large. There is a problem that not only loss of capacitance but also increase of leakage current occurs.
【０００５】また、熱処理の狙いは、エッチングされた
アルミニウム箔の表面に生成した水和皮膜中に残存する
結晶水を幾分か除去して熱酸化皮膜に転化することで化
成工程での酸化皮膜の促進へ寄与させると考えられる
が、この熱酸化皮膜への転化時に結晶水除去に伴う体積
収縮が起こり、このために熱酸化皮膜中に化成後の漏れ
電流の原因となる亀裂が生じる。[0005] The purpose of the heat treatment is to remove some of the water of crystallization remaining in the hydrated film formed on the surface of the etched aluminum foil and to convert it into a thermal oxide film, thereby forming an oxide film in the chemical conversion step. Is considered to contribute to the promotion of the thermal oxidation. However, when the film is converted into the thermal oxide film, volume shrinkage occurs due to the removal of water of crystallization, and as a result, a crack occurs in the thermal oxide film, which causes a leakage current after the chemical conversion.
【０００６】この時に酸素濃度が多すぎると、その亀裂
から雰囲気中の酸化がアルミニウム箔の表面に達し、ア
ルミニウム箔の表面で余分な熱酸化皮膜を生成しやすく
なり、この余分な熱酸化皮膜は、無定形酸化皮膜の生
成、熱酸化皮膜への変化、体積収縮による亀裂の発生が
順に繰り返されながら成長するため、熱酸化皮膜中の亀
裂が増加し過ぎて化成後の漏れ電流が増大し、期待され
るような静電容量を十分に得ることができないという課
題を有したものであった。At this time, if the oxygen concentration is too high, oxidation in the atmosphere reaches the surface of the aluminum foil from the cracks, and an excessive thermal oxide film is easily formed on the surface of the aluminum foil. Since the growth of the amorphous oxide film, the change to the thermal oxide film, and the generation of cracks due to volume shrinkage are repeated in order, the cracks in the thermal oxide film increase too much and the leakage current after chemical formation increases. There was a problem that the expected electrostatic capacity could not be sufficiently obtained.
【０００７】本発明は上記従来の問題点を解決するもの
で、従来より大きな静電容量が得られて漏れ電流を低減
させることができるアルミニウム電解コンデンサ用電極
箔の製造方法を提供することを目的とするものである。An object of the present invention is to solve the above-mentioned conventional problems, and an object of the present invention is to provide a method of manufacturing an electrode foil for an aluminum electrolytic capacitor capable of obtaining a larger capacitance and reducing a leakage current. It is assumed that.
【０００８】[0008]
【課題を解決するための手段】この課題を解決するため
に本発明のアルミニウム電解コンデンサ用電極箔の製造
方法は、エッチング箔を酸素濃度が１０％以下の雰囲気
中で熱処理してから化成を行うようにしたものであり、
この製造方法により化成工程での酸化皮膜の促進に寄与
し、大きな静電容量と漏れ電流の低減を図った優れたア
ルミニウム電解コンデンサ用電極箔を得ることができ
る。According to the present invention, there is provided a method for manufacturing an electrode foil for an aluminum electrolytic capacitor, comprising the steps of: forming an etched foil in an atmosphere having an oxygen concentration of 10% or less; It is like that,
This manufacturing method contributes to the promotion of the oxide film in the chemical conversion step, and it is possible to obtain an excellent electrode foil for an aluminum electrolytic capacitor with a large capacitance and a reduced leakage current.
【０００９】[0009]
【発明の実施の形態】本発明の請求項１に記載の発明
は、アルミニウム箔の表面をエッチングにより粗面化
し、続いてこのエッチングされたエッチング箔に付着し
た塩素成分を除去し、さらに表面に水和皮膜を形成した
後、このエッチング箔を酸素濃度が１０％以下の雰囲気
中で熱処理してから化成を行うようにしたもので、この
製造方法によれば、熱処理による余分な熱酸化皮膜は生
成しなくなるだけでなく、熱酸化皮膜の生成に伴う亀裂
が生じても、酸化濃度が適度にあるために熱酸化皮膜中
に生じる亀裂を埋める効果がある。その結果、化成工程
により上記エッチング箔の表面には薄くて耐電圧を有す
る緻密な酸化皮膜を形成されることになり、この電極箔
は単位面積当たりの静電容量を増大させることができる
とともに、漏れ電流を低減させることができるという作
用を有する。DETAILED DESCRIPTION OF THE INVENTION According to the first aspect of the present invention, the surface of an aluminum foil is roughened by etching, and then the chlorine component attached to the etched foil is removed. After the formation of the hydrated film, the etching foil is heat-treated in an atmosphere having an oxygen concentration of 10% or less, and then the chemical conversion is performed. Not only does it stop being generated, but even if cracks are generated due to the formation of the thermal oxide film, the cracks generated in the thermal oxide film can be filled because the oxidation concentration is appropriate. As a result, a thin oxide film having a withstand voltage is formed on the surface of the etching foil by the chemical conversion step, and this electrode foil can increase the capacitance per unit area, This has the effect that the leakage current can be reduced.
【００１０】請求項２に記載の発明は、請求項１に記載
の発明において、熱処理の雰囲気が、酸素とアルゴン、
窒素、水素、二酸化炭素、一酸化炭素のうちの少なくと
も１種類以上の混合気体としたもので、これにより、ア
ルミニウムと反応しにくい気体を用いるためにエッチン
グ箔の表面で余分な熱酸化皮膜が増加しなくなり、さら
に高い静電容量が得られるという作用を有する。According to a second aspect of the present invention, in the first aspect, the atmosphere for the heat treatment is oxygen and argon,
A mixture of at least one of nitrogen, hydrogen, carbon dioxide, and carbon monoxide, which increases the excess thermal oxide film on the surface of the etching foil due to the use of a gas that does not easily react with aluminum. This has the effect that higher capacitance can be obtained.
【００１１】請求項３に記載の発明は、請求項１に記載
の発明において、熱処理の温度を３００〜５７０℃と
し、かつ処理時間を０．００４〜１０時間としたもの
で、これにより、水和皮膜中の結晶水を幾分か除去して
熱酸化皮膜に転化し、この熱酸化皮膜が化成皮膜の促進
へ寄与するためにさらに高い静電容量が得られるという
作用を有する。According to a third aspect of the present invention, in the first aspect, the temperature of the heat treatment is set to 300 to 570 ° C. and the processing time is set to 0.004 to 10 hours. Some of the water of crystallization in the Japanese film is removed and converted into a thermal oxide film, and this thermal oxide film contributes to the promotion of the chemical conversion film, and thus has the effect of obtaining a higher capacitance.
【００１２】以下、本発明の実施の形態を従来例を比較
例として共に説明する。 （実施の形態１） エッチング工程：純度９９．９８％、厚み１００μｍ
のアルミニウム箔を塩酸７％、リン酸０．５％、硝酸１
％の水溶液からなる温度３０℃のエッチング液中に浸漬
し、正弦交流電流で電流密度０．２Ａ／cm2、電気量１
２０Ｃ／cm2のエッチングを行った。Hereinafter, embodiments of the present invention will be described together with a conventional example as a comparative example. Embodiment Mode 1 Etching Step: Purity 99.98%, Thickness 100 μm
7% hydrochloric acid, 0.5% phosphoric acid, 1% nitric acid
% Of an aqueous solution containing 30% aqueous solution at a temperature of 30 ° C., a current density of 0.2 A / cm 2 and a quantity of electricity of 1 with a sine AC current.
Etching at 20 C / cm 2 was performed.
【００１３】脱塩素処理：７％硝酸水溶液、液温６０
℃中に１分間浸漬して脱塩素処理行った。Dechlorination treatment: 7% nitric acid aqueous solution, liquid temperature 60
The sample was immersed in a temperature of 1 ° C. for 1 minute to perform a dechlorination treatment.
【００１４】水和処理：純水、液温７０℃中に３分間
浸漬して水和処理を行った。 乾燥：大気中２００℃で８分間乾燥を行った。Hydration treatment: The hydration treatment was carried out by immersing in pure water at a liquid temperature of 70 ° C. for 3 minutes. Drying: Drying was performed at 200 ° C. in the atmosphere for 8 minutes.
【００１５】アルゴンガス中の酸素濃度がそれぞれ
５，７，１０，１３，１５，１８，２１％となる混合気
体中で３５０℃、０．５時間の熱処理を行った。Heat treatment was performed at 350 ° C. for 0.5 hour in a mixed gas in which the oxygen concentration in the argon gas was 5, 7, 10, 13, 15, 18, and 21%, respectively.
【００１６】上記実施の形態１で得られたエッチング箔
と比較例として実施の形態１の〜まで行ったエッチ
ング箔とを、５％アジピン酸アルモニウム水溶液、液温
７０℃中で４５Ｖの定電流化成を行い、それらの単位面
積当たりの静電容量と漏れ電流を測定した結果を（表
１）に示す。The etching foil obtained in the first embodiment and the etching foil obtained in the first to third embodiments as comparative examples were subjected to a constant current conversion of 45 V in a 5% aqueous solution of aluminium adipate at a liquid temperature of 70 ° C. Table 1 shows the results of measuring the capacitance and the leakage current per unit area.
【００１７】[0017]
【表１】 [Table 1]
【００１８】（表１）から明らかなように、酸素濃度を
１０％以下にすることで比較例に比べ静電容量を高める
と共に漏れ電流も低減することができる。As is clear from Table 1, by setting the oxygen concentration to 10% or less, the capacitance can be increased and the leakage current can be reduced as compared with the comparative example.
【００１９】（実施の形態２） エッチング工程：実施の形態１と同じ。(Embodiment 2) Etching step: Same as in Embodiment 1.
【００２０】脱塩素処理：実施の形態１と同じ。 水和処理：実施の形態１と同じ。Dechlorination treatment: Same as in the first embodiment. Hydration treatment: Same as in the first embodiment.
【００２１】乾燥：実施の形態１と同じ。 熱処理雰囲気が、酸素とアルゴン、窒素、水素、二酸
化炭素、一酸化炭素のうちの少なくとも１種類以上とし
た混合気体中で４００℃、１時間の熱処理を行った。Drying: Same as in the first embodiment. The heat treatment was performed at 400 ° C. for one hour in a mixed gas containing oxygen and at least one of argon, nitrogen, hydrogen, carbon dioxide, and carbon monoxide.
【００２２】上記実施の形態２で得られたエッチング箔
と比較例として実施の形態２の〜まで行ったエッチ
ング箔とを５％アジピン酸アンモニウム水溶液、液温７
０℃中で４５Ｖの定電流化成を行い、それらの単位面積
当たりの静電容量と漏れ電流を測定した結果を（表２）
に示す。The etching foil obtained in the second embodiment and the etching foil obtained in the first to third embodiments as a comparative example were combined with a 5% aqueous ammonium adipate solution at a liquid temperature of 7%.
The results of performing a constant current formation of 45 V at 0 ° C. and measuring the capacitance and the leakage current per unit area are shown in Table 2 below.
Shown in
【００２３】[0023]
【表２】 [Table 2]
【００２４】（表２）から明らかなように、熱処理雰囲
気が、酸素とアルゴン、窒素、水素、二酸化炭素、一酸
化炭素のうちの少なくとも１種類以上とした混合気体中
であれば、比較例に比べ静電容量を高めると共に漏れ電
流も低減することができる。As is clear from Table 2, if the heat treatment atmosphere is a gas mixture of oxygen and at least one of argon, nitrogen, hydrogen, carbon dioxide and carbon monoxide, the comparative example In addition, the capacitance can be increased and the leakage current can be reduced.
【００２５】（実施の形態３） エッチング工程：実施の形態１と同じ。(Embodiment 3) Etching step: Same as in Embodiment 1.
【００２６】脱塩素処理：実施の形態１と同じ。 水和処理：実施の形態１と同じ。Dechlorination treatment: Same as in the first embodiment. Hydration treatment: Same as in the first embodiment.
【００２７】乾燥：実施の形態１と同じ。 窒素濃度９６％、水素濃度３％および酸素濃度１％の
混合気体中で処理時間０，０．００４，０．１，１，１
０，１５時間で４００℃で熱処理を行った。Drying: Same as in the first embodiment. Processing time 0,0.004,0.1,1,1 in a mixed gas of 96% nitrogen, 3% hydrogen and 1% oxygen
The heat treatment was performed at 400 ° C. for 0.15 hours.
【００２８】上記実施の形態３で得られたエッチング箔
を５％アジピン酸アンモニウム水溶液、液温７０℃中で
４５Ｖの定電流化成を行い、それらの単位面積当たりの
静電容量と漏れ電流を測定した結果を（表３）に示す。The etching foil obtained in the third embodiment is subjected to constant current formation at 45 V in a 5% aqueous solution of ammonium adipate and a liquid temperature of 70 ° C., and the capacitance per unit area and the leakage current are measured. The results obtained are shown in (Table 3).
【００２９】[0029]
【表３】 [Table 3]
【００３０】（表３）から明らかなように、熱処理の処
理時間は０．００４〜１０時間であれば比較例に比べ静
電容量を高めると共に漏れ電流も低減することができ
る。As is clear from Table 3, if the processing time of the heat treatment is 0.004 to 10 hours, the capacitance can be increased and the leakage current can be reduced as compared with the comparative example.
【００３１】（実施の形態４） エッチング工程：実施の形態１と同じ。(Embodiment 4) Etching step: Same as in Embodiment 1.
【００３２】脱塩素処理：実施の形態１と同じ。 水和処理：実施の形態１と同じ。Dechlorination treatment: Same as in the first embodiment. Hydration treatment: Same as in the first embodiment.
【００３３】乾燥：実施の形態１と同じ。 一酸化酸素濃度９５％と酸素濃度５％の混合気体中で
１００，２００，３００，４００，５７０℃で０．５時
間の熱処理を行った。Drying: Same as in the first embodiment. Heat treatment was performed at 100, 200, 300, 400, and 570 ° C. for 0.5 hour in a mixed gas having an oxygen monoxide concentration of 95% and an oxygen concentration of 5%.
【００３４】上記実施の形態４で得られたエッチング箔
と比較例として実施の形態４の〜まで行ったエッチ
ング箔とを、５％アジピン酸アンモニウム水溶液、液温
７０℃中で４５Ｖの定電流化成を行い、それらの単位面
積当たりの静電容量と漏れ電流を測定した結果を（表
４）に示す。The etching foil obtained in the fourth embodiment and the etching foil obtained in the fourth to fourth embodiments as a comparative example were subjected to a constant current conversion of 45 V in a 5% aqueous ammonium adipate solution at a liquid temperature of 70 ° C. The results of measuring the capacitance per unit area and the leakage current are shown in Table 4 below.
【００３５】[0035]
【表４】 [Table 4]
【００３６】（表４）から明らかなように、熱処理の処
理温度は３００℃未満では効果が無く、５７０℃以上で
はアルミニウムの溶解が起こるため、３００〜５７０℃
であれば比較例に比べ静電容量を高めると共に漏れ電流
も低減することができる。As is clear from Table 4, if the heat treatment temperature is lower than 300.degree. C., there is no effect, and if the heat treatment temperature is 570.degree. C. or higher, aluminum dissolution occurs.
If so, the capacitance can be increased and the leakage current can be reduced as compared with the comparative example.
【００３７】[0037]
【発明の効果】以上のように本発明のアルミニウム電解
コンデンサ用電極箔の製造方法によれば、エッチング箔
を酸素濃度が１０％以下の雰囲気中で熱処理してから化
成を行うようにすることにより、熱処理による余分な熱
酸化皮膜は生成しなくなるだけでなく、熱酸化皮膜の生
成に伴う亀裂が生じても、酸素濃度が適度にあるために
熱酸化皮膜中に生じる亀裂を埋める効果がある。その結
果、化成処理により上記エッチング箔の表面には薄くて
耐電圧を有する緻密な酸化皮膜が形成されることにな
り、この電極箔は単位面積当たりの静電容量を増大させ
ることができるとともに、漏れ電流を低減させることが
できるものである。As described above, according to the method for manufacturing an electrode foil for an aluminum electrolytic capacitor of the present invention, the etching foil is heat-treated in an atmosphere having an oxygen concentration of 10% or less, and then the chemical conversion is performed. In addition to the fact that an excess thermal oxide film is not generated due to the heat treatment, even if cracks are generated due to the thermal oxide film being formed, the cracks generated in the thermal oxide film are filled because the oxygen concentration is moderate. As a result, a thin oxide film having a withstand voltage is formed on the surface of the etching foil by the chemical conversion treatment, and this electrode foil can increase the capacitance per unit area, The leakage current can be reduced.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 ＦＩ Ｃ２２Ｆ 1/00 ６９１ Ｃ２２Ｆ 1/00 ６９１Ｃ ──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 6 Identification code FI C22F 1/00 691 C22F 1/00 691C
Claims (3)
り粗面化し、続いてこのエッチングされたエッチング箔
に付着した塩素成分を除去し、さらに表面に水和皮膜を
形成した後、このエッチング箔を酸素濃度が１０％以下
の雰囲気中で熱処理してから化成を行うようにしたアル
ミニウム電解コンデンサ用電極箔の製造方法。1. The surface of an aluminum foil is roughened by etching, the chlorine component adhered to the etched foil is removed, and a hydrated film is formed on the surface of the aluminum foil. A method for producing an electrode foil for an aluminum electrolytic capacitor, wherein a heat treatment is carried out in an atmosphere of 10% or less.
素、水素、二酸化炭素、一酸化炭素のうち少なくとも１
種類以上の混合気体である請求項１に記載のアルミニウ
ム電解コンデンサ用電極箔の製造方法。2. The heat treatment atmosphere is at least one of oxygen and argon, nitrogen, hydrogen, carbon dioxide, and carbon monoxide.
2. The method for producing an electrode foil for an aluminum electrolytic capacitor according to claim 1, wherein the gaseous mixture is a mixture of at least two kinds of gases.
かつ処理時間を０．００４〜１０時間とした請求項１に
記載のアルミニウム電解コンデンサ用電極箔の製造方
法。3. The heat treatment temperature is 300 to 570 ° C.,
The method for producing an electrode foil for an aluminum electrolytic capacitor according to claim 1, wherein the treatment time is 0.004 to 10 hours.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14269498A JP3480311B2 (en) | 1998-05-25 | 1998-05-25 | Method for producing electrode foil for aluminum electrolytic capacitor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14269498A JP3480311B2 (en) | 1998-05-25 | 1998-05-25 | Method for producing electrode foil for aluminum electrolytic capacitor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH11340102A true JPH11340102A (en) | 1999-12-10 |
| JP3480311B2 JP3480311B2 (en) | 2003-12-15 |
Family
ID=15321374
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14269498A Expired - Lifetime JP3480311B2 (en) | 1998-05-25 | 1998-05-25 | Method for producing electrode foil for aluminum electrolytic capacitor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3480311B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002198265A (en) * | 2000-12-26 | 2002-07-12 | Matsushita Electric Ind Co Ltd | Method of manufacturing electrode foil for electrolytic capacitor and electrolytic capacitor using the same |
| WO2004070749A1 (en) * | 2003-02-07 | 2004-08-19 | Showa Denko K.K. | Capacitor and production method for the capacitor |
| JP2006108395A (en) * | 2004-10-06 | 2006-04-20 | Nichicon Corp | Manufacturing method for electrode foil for aluminum electrolytic capacitor |
| CN115148501A (en) * | 2022-07-15 | 2022-10-04 | 新疆众和股份有限公司 | Hot-pressed foil and preparation method thereof, electrode and capacitor |
-
1998
- 1998-05-25 JP JP14269498A patent/JP3480311B2/en not_active Expired - Lifetime
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002198265A (en) * | 2000-12-26 | 2002-07-12 | Matsushita Electric Ind Co Ltd | Method of manufacturing electrode foil for electrolytic capacitor and electrolytic capacitor using the same |
| WO2004070749A1 (en) * | 2003-02-07 | 2004-08-19 | Showa Denko K.K. | Capacitor and production method for the capacitor |
| KR101049431B1 (en) | 2003-02-07 | 2011-07-15 | 쇼와 덴코 가부시키가이샤 | Capacitor and method of manufacturing the capacitor |
| JP2006108395A (en) * | 2004-10-06 | 2006-04-20 | Nichicon Corp | Manufacturing method for electrode foil for aluminum electrolytic capacitor |
| JP4576192B2 (en) * | 2004-10-06 | 2010-11-04 | ニチコン株式会社 | Method for producing electrode foil for aluminum electrolytic capacitor |
| CN115148501A (en) * | 2022-07-15 | 2022-10-04 | 新疆众和股份有限公司 | Hot-pressed foil and preparation method thereof, electrode and capacitor |
| CN115148501B (en) * | 2022-07-15 | 2023-10-03 | 新疆众和股份有限公司 | Hot-pressed foil, preparation method thereof, electrode and capacitor |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3480311B2 (en) | 2003-12-15 |
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