JPH11330509A - Cbd film forming device - Google Patents
Cbd film forming deviceInfo
- Publication number
- JPH11330509A JPH11330509A JP10140545A JP14054598A JPH11330509A JP H11330509 A JPH11330509 A JP H11330509A JP 10140545 A JP10140545 A JP 10140545A JP 14054598 A JP14054598 A JP 14054598A JP H11330509 A JPH11330509 A JP H11330509A
- Authority
- JP
- Japan
- Prior art keywords
- reaction solution
- substrate
- film forming
- cbd
- forming apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/541—CuInSe2 material PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Photovoltaic Devices (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、ＣＩＳ太陽電池のバッ
ファ層の成膜などに利用されるＣＢＤ成膜装置に関する
ものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a CBD film forming apparatus used for forming a buffer layer of a CIS solar cell.
【０００２】[0002]
【従来の技術】CIS( CuInSe2）太陽電池の製造工程で
は、基板表面の能動層と、この能動層上に形成される透
明電極層との間にCdS のバッファ層が形成される。この
バッファ層の形成方法として、化学浴槽堆積法( CBD: C
hemical Bath Deposition 法) が利用される。このＣＢ
Ｄ法では、表面側にCIS 能動層が形成された基板を CdI
2とNH2CSNH2のアンモニア溶液から成る反応溶液中に浸
すことによって、CIS 能動層上にCdS の層が堆積・形成
される。 2. Description of the Related Art In a process of manufacturing a CIS (CuInSe 2 ) solar cell, a buffer layer of CdS is formed between an active layer on a substrate surface and a transparent electrode layer formed on the active layer. As a method for forming this buffer layer, a chemical bath deposition method (CBD: C
Chemical Bath Deposition method) is used. This CB
In the D method, the substrate with the CIS active layer
A CdS layer is deposited and formed on the CIS active layer by immersion in a reaction solution consisting of ammonia solution of 2 and NH 2 CSNH 2 .
【０００３】一般に、ＣＢＤ成膜法では、反応を促進す
るうえで基板表面の成膜形成領域に常に新鮮な反応溶液
を接触させることが必要であり、このため、反応溶液を
攪拌する機構が必要になる。従来、このような攪拌機構
としては、図２に示すように、恒温水槽１４内に保持さ
れた反応溶液槽１１の外部の下方に回転磁界発生装置１
３を設置すると共に、反応溶液槽１１の底に樹脂などの
耐腐食性の素材で被覆された鉄などの磁性体から成る攪
拌子１２（スターラー）を投入し、このスターラーを恒
温水槽１４の外部で発生させた回転磁界で回転させるこ
とにより行っている。なお、Ｓは処理対象の基板であ
り、１５はこの基板Ｓの保持体である。In general, in the CBD film forming method, it is necessary to always bring a fresh reaction solution into contact with a film forming region on the substrate surface in order to promote the reaction, and therefore, a mechanism for stirring the reaction solution is required. become. Conventionally, as such a stirring mechanism, as shown in FIG. 2, a rotating magnetic field generator 1 is provided below the outside of a reaction solution tank 11 held in a constant temperature water tank 14.
3 and a stirrer 12 (a stirrer) made of a magnetic material such as iron covered with a corrosion-resistant material such as a resin is put into the bottom of the reaction solution tank 11. The rotation is performed by the rotating magnetic field generated in step (1). Note that S is a substrate to be processed, and 15 is a holder for the substrate S.
【０００４】[0004]
【発明が解決しようとする課題】上記従来のスターラを
使用するＣＢＤ成膜装置の攪拌機構では、攪拌を反応溶
液槽の底のスターラーで行っている。このため、スター
ラーから離れる従って攪拌力が弱まり、成膜の均一性が
損なわれるという問題がある。また、反応溶液槽内にス
ターラーを動かすための空間が必要になるため反応溶液
槽の小型化には限界が生じ、１個の基板の処理ごとに廃
棄される反応溶液の量がかさみ、資源の調達と廃液の処
理という２面において製造費用がかさむという問題があ
る。更に、基板をその周辺部分で保持しているため、自
重によって中央部分に撓みが生じ、基板が大面積になる
につれて撓みに伴うストレスが成膜層に悪影響を及ぼす
という問題がある。In the stirring mechanism of the conventional CBD film forming apparatus using a stirrer, stirring is performed by a stirrer at the bottom of a reaction solution tank. For this reason, there is a problem that the agitation force is weakened due to the separation from the stirrer, and the uniformity of film formation is deteriorated. In addition, a space for moving the stirrer is required in the reaction solution tank, which limits the miniaturization of the reaction solution tank. There is a problem in that the production cost increases in two aspects, procurement and waste liquid treatment. Further, since the substrate is held at the peripheral portion, the central portion bends due to its own weight, and there is a problem that, as the substrate becomes large in area, the stress caused by the bending adversely affects the film formation layer.
【０００５】従って、本発明の一つの目的は、成膜の均
一性を向上でき、反応溶液槽の小型化が可能で、ストレ
スのない良質の成膜を形成できるＣＢＤ成膜装置を提供
することにある。Accordingly, an object of the present invention is to provide a CBD film forming apparatus capable of improving the uniformity of film formation, reducing the size of a reaction solution tank, and forming a high quality film without stress. It is in.
【０００６】[0006]
【課題を解決するための手段】本発明のＣＢＤ成膜装置
は、反応溶液槽と、複数の振動子と、これら複数の振動
子のそれぞれが発生した振動を反応溶液槽の反応溶液に
伝達する複数の振動伝達体とを備え、振動よって均一な
攪拌を行うように構成されている。According to the CBD film forming apparatus of the present invention, a reaction solution tank, a plurality of oscillators, and vibrations generated by each of the plurality of oscillators are transmitted to the reaction solution in the reaction solution tank. A plurality of vibration transmitting bodies are provided, and are configured to perform uniform stirring by vibration.
【０００７】[0007]
【発明の実施の形態】本発明の好適な実施の形態によれ
ば、このＣＢＤ成膜装置は、複数の振動子を個別に駆動
するための駆動回路を備えることより、一層均一な攪拌
を実現している。According to a preferred embodiment of the present invention, the CBD film forming apparatus has a drive circuit for individually driving a plurality of vibrators, thereby realizing more uniform stirring. doing.
【０００８】本発明の他の好適な実施の形態によれば、
複数の振動伝達体は反応溶液槽内にわたってほぼ等間隔
で配置され、各振動伝達体は先端に向けて直径が増加す
る円錐形状を呈しており、基板は成膜を形成しようとす
る表面を上向きにして反応溶液槽の底面に水平に保持さ
れ、基板の上方に形成される反応溶液層の厚みはこの基
板の厚みの数倍程度以下であり、振動伝達体の先端面と
基板の表面との距離はこの基板の厚みよりも小さな値に
設定されている。According to another preferred embodiment of the present invention,
The plurality of vibration transmitters are arranged at substantially equal intervals throughout the reaction solution tank, each vibration transmitter has a conical shape whose diameter increases toward the tip, and the substrate faces upward to form a film. The substrate is held horizontally on the bottom of the reaction solution tank, and the thickness of the reaction solution layer formed above the substrate is about several times less than the thickness of the substrate, and the distance between the tip surface of the vibration transmitter and the surface of the substrate The distance is set to a value smaller than the thickness of the substrate.
【０００９】[0009]
【実施例】図１は、本発明の一実施例のＣＢＤ成膜装置
の構成を示す要部断面図である。このＣＢＤ成膜装置で
は、紙面と直交する方向に所定の長さにわたって矩形状
の恒温水槽６が延長され、この恒温水槽の底面に、薄手
の矩形状の反応溶液槽１が設置されている。この反応溶
液槽１の内部には、CdI2( 沃化カドミウム) とNH2CSNH2
( チオ尿素) のアンモニア溶液から成る反応溶液反応溶
液が充填されると共に、その底面にはCIS 能動層が形成
された表面を上向きにして基板Ｓが配置されている。こ
の基板Ｓは矩形状を呈しており、図１の紙面と直行する
方向に所定の長さにわたって延長される所定の幅を有し
ている。この基板Ｓの上方には基板Ｓの厚みと同程度の
深さの反応溶液の層が形成されている。FIG. 1 is a sectional view showing a main part of a CBD film forming apparatus according to an embodiment of the present invention. In this CBD film forming apparatus, a rectangular constant temperature water tank 6 is extended over a predetermined length in a direction orthogonal to the paper surface, and a thin rectangular reaction solution tank 1 is provided on the bottom surface of the constant temperature water tank. Inside the reaction solution tank 1, CdI 2 (cadmium iodide) and NH 2 CSNH 2
A reaction solution composed of an ammonia solution of (thiourea) is filled with a reaction solution, and a substrate S is disposed on the bottom surface thereof with the surface on which the CIS active layer is formed facing upward. The substrate S has a rectangular shape, and has a predetermined width extending over a predetermined length in a direction perpendicular to the paper surface of FIG. Above the substrate S, a reaction solution layer having a depth substantially equal to the thickness of the substrate S is formed.
【００１０】反応溶液槽１の上蓋１ａには、長さ方向と
幅方向とに適宜な一定の間隔を保って複数の振動伝達体
２ａ，２ｂ，２ｃ・・・と、これらの振動伝達体のそれ
ぞれに伝達する振動を発生するための超音波振動子３
ａ，３ｂ，３ｃ・・・が設置されている。各振動伝達体
は、先端に向けて直径が増加する円錐形状を呈すると共
に、その反応溶液中に浸される先端部分は耐腐食性の表
面素材で覆われている。各超音波振動子には、個別の超
音波駆動回路４ａ，４ｂ，４ｃ・・・が設置されてい
る。A plurality of vibration transmitters 2a, 2b, 2c... Are provided on the upper lid 1a of the reaction solution tank 1 at appropriate and constant intervals in the length direction and the width direction. Ultrasonic transducer 3 for generating vibration transmitted to each
a, 3b, 3c,... Each of the vibration transmitters has a conical shape whose diameter increases toward the tip, and the tip portion immersed in the reaction solution is covered with a corrosion-resistant surface material. Each ultrasonic transducer is provided with an individual ultrasonic drive circuit 4a, 4b, 4c,....
【００１１】各超音波駆動回路から供給された電気信号
は、対応の超音波振動子３ａ，３ｂ，３ｃ・・・によっ
て超音波振動に変換され、対応の振動伝達体２ａ，２
ｂ，２ｃ・・・中を反応溶液槽１の上蓋を通して反応溶
液中に伝達される。各振動伝達体の先端面と基板Ｓの表
面との間には基板Ｓの厚みよりも小さな厚みの反応溶液
層が形成されている。基板Ｓの表面の上部の反応溶液中
に伝達された超音波の振動エネルギーにより、反応溶液
が十分に攪拌され、基板表面のCIS 能動層上に均一な厚
みのCdS のバッファ層が形成される。The electric signals supplied from the respective ultrasonic driving circuits are converted into ultrasonic vibrations by the corresponding ultrasonic vibrators 3a, 3b, 3c,.
.. are transmitted through the upper lid of the reaction solution tank 1 into the reaction solution. A reaction solution layer having a thickness smaller than the thickness of the substrate S is formed between the front end surface of each vibration transmitter and the surface of the substrate S. The reaction solution is sufficiently stirred by the ultrasonic vibration energy transmitted into the reaction solution on the upper surface of the substrate S, and a CdS buffer layer having a uniform thickness is formed on the CIS active layer on the substrate surface.
【００１２】所定時間にわたるバッファ層の形成が終了
すると、処理済みの基板Ｓが反応溶液槽１から取り出さ
れる。基板Ｓの表面に形成されたバッファ層の厚みの均
一性が検査され、この検査結果に応じて、次回のＣＢＤ
処理時における各超音波駆動回路の出力の調整が個別に
行われる。基板Ｓの取り出しの後、反応溶液槽１内の反
応溶液が廃棄される。この廃棄される反応溶液の量は、
反応溶液槽１が薄型になったことから、従来の装置にお
けるものと比べて極めて少量に留まる。When the formation of the buffer layer for a predetermined time is completed, the processed substrate S is taken out of the reaction solution tank 1. The uniformity of the thickness of the buffer layer formed on the surface of the substrate S is inspected, and according to the inspection result, the next CBD
Adjustment of the output of each ultrasonic drive circuit at the time of processing is performed individually. After taking out the substrate S, the reaction solution in the reaction solution tank 1 is discarded. The amount of this discarded reaction solution is
Since the thickness of the reaction solution tank 1 has been reduced, the reaction solution tank 1 has an extremely small amount as compared with the conventional apparatus.
【００１３】以上、複数の超音波振動子のそれぞれに対
応して超音波駆動回路を設置することにより、個々の超
音波振動子の動作を個別に調整する最適な構成を例示し
た。しかしながら、原理的には、費用の節減などのため
に、一つの駆動回路によって複数の超音波振動子を駆動
する構成とすることもできる。As described above, the optimum configuration for individually adjusting the operation of each ultrasonic transducer by installing the ultrasonic drive circuit corresponding to each of the plurality of ultrasonic transducers has been exemplified. However, in principle, a configuration in which a plurality of ultrasonic transducers are driven by a single drive circuit may be employed to reduce costs.
【００１４】また、反応溶液の層の厚みを基板の厚み程
度とし、一つの基板を処理するたびに反応溶液を交換す
る例を説明した。しかしながら、反応溶液を交換するこ
となく複数枚の基板を連続して処理する目的などから、
反応溶液の層の厚みを更に大きく、例えば基板の厚みの
数倍程度とすることもできる。Further, an example has been described in which the thickness of the reaction solution layer is set to about the thickness of the substrate, and the reaction solution is replaced each time one substrate is processed. However, for the purpose of processing multiple substrates continuously without changing the reaction solution,
The thickness of the reaction solution layer can be further increased, for example, to about several times the thickness of the substrate.
【００１５】[0015]
【発明の効果】以上詳細に説明したように、本発明のＣ
ＢＤ成膜装置は、振動伝達体を介して反応溶液中に振動
を伝達し、反応溶液の攪拌を行う構成であるから、攪拌
にむらが生ぜず成膜の均一性が向上するという効果が奏
される。As described in detail above, the C of the present invention
Since the BD film forming apparatus transmits vibrations into the reaction solution through the vibration transmitting body and stirs the reaction solution, the effect of improving the uniformity of film formation without causing unevenness in the stirring is exerted. Is done.
【００１６】また、反応溶液槽内にスターラーを動かす
ための空間が不要になるため反応溶液槽を薄くできる。
この結果、１個の基板を処理するたびに廃棄される反応
溶液の量が節減され、資源の調達と廃液の処理という２
面において製造費用が低減される。In addition, since a space for moving the stirrer is not required in the reaction solution tank, the thickness of the reaction solution tank can be reduced.
As a result, the amount of the reaction solution to be discarded each time one substrate is processed is reduced, and resources such as resource procurement and waste liquid treatment are reduced.
In terms of manufacturing costs.
【００１７】さらに、超音波振動子を駆動するための駆
動回路を個別に設置する本発明の実施例によれば、駆動
出力を個別に調整することにより成膜の均一性を一層高
めることができるという利点がある。Further, according to the embodiment of the present invention in which the driving circuits for driving the ultrasonic transducers are individually provided, the uniformity of the film formation can be further improved by individually adjusting the driving output. There is an advantage.
【００１８】さらに、基板を反応溶液槽の底面に接触さ
せて置くだけであるから、基板を保持するための治具が
不要になり、基板が大型になっても中央部分に撓みによ
るストレスが発明しない。また、基板を処理するたびに
そのような治具を洗浄する労力も時間も不要になる。更
に、図１の実施例のように反応溶液槽を密閉して恒温水
槽内に浸す構成とすれば、加熱された反応溶液からアン
モニアが蒸発するのを有効に防止できる。Furthermore, since the substrate is merely placed in contact with the bottom surface of the reaction solution tank, a jig for holding the substrate is not required, and even if the substrate becomes large, the stress caused by bending in the central portion is invented. do not do. Also, labor and time for cleaning such a jig each time the substrate is processed are not required. Further, if the reaction solution tank is closed and immersed in a constant temperature water tank as in the embodiment of FIG. 1, ammonia can be effectively prevented from evaporating from the heated reaction solution.
【図１】本発明の一実施例のＣＢＤ成膜装置の構成を示
す要部断面図である。FIG. 1 is a sectional view of a main part showing a configuration of a CBD film forming apparatus according to an embodiment of the present invention.
【図２】従来のＣＢＤ成膜装置の構成を示す要部断面図
である。FIG. 2 is a sectional view of a main part showing a configuration of a conventional CBD film forming apparatus.
１ 反応溶液槽 2a〜2d 振動伝達体 3a〜3d 超音波振動子 4a〜4d 超音波駆動回路 6 恒温水槽 S 基板 1 Reaction solution tank 2a ~ 2d Vibration transmitter 3a ~ 3d Ultrasonic vibrator 4a ~ 4d Ultrasonic drive circuit
Claims (7)
応溶液槽の反応溶液に伝達する複数の振動伝達体とを備
えたことを特徴とするＣＢＤ成膜装置。1. A reaction solution tank, a plurality of vibrators, and a plurality of vibration transmitters for transmitting vibrations generated by each of the plurality of vibrators to a reaction solution in the reaction solution tank. CBD film forming apparatus.
えたことを特徴とするＣＢＤ成膜装置。2. The CBD film forming apparatus according to claim 1, further comprising a drive circuit for individually driving the plurality of vibrators.
ほぼ等間隔で配置されたことを特徴とするＣＢＤ成膜装
置。3. The CBD film forming apparatus according to claim 1, wherein the plurality of vibration transmitting bodies are arranged at substantially equal intervals in the reaction solution tank.
形状を呈することを特徴とするＣＢＤ成膜装置。4. The CBD film forming apparatus according to claim 1, wherein each of the vibration transmitting bodies has a conical shape whose diameter increases toward a tip.
て前記反応溶液槽の底面に接触して水平に保持されるこ
とを特徴とするＣＢＤ成膜装置。5. The method according to claim 1, wherein the substrate is horizontally held in contact with the bottom surface of the reaction solution tank with the surface facing upward to form a film. CBD film forming apparatus.
記基板の厚みの数倍程度以下であることを特徴とするＣ
ＢＤ成膜装置。6. The method according to claim 5, wherein the thickness of the reaction solution layer formed above the substrate is about several times or less the thickness of the substrate.
BD film forming equipment.
の基板の厚みよりも小さな値に設定されたことを特徴と
するＣＢＤ成膜装置。7. The CBD film according to claim 4, wherein a distance between a front end surface of the vibration transmitting body and a surface of the substrate is set to a value smaller than a thickness of the substrate. apparatus.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14054598A JP4443645B2 (en) | 1998-05-07 | 1998-05-07 | CBD deposition system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14054598A JP4443645B2 (en) | 1998-05-07 | 1998-05-07 | CBD deposition system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH11330509A true JPH11330509A (en) | 1999-11-30 |
| JP4443645B2 JP4443645B2 (en) | 2010-03-31 |
Family
ID=15271176
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14054598A Expired - Fee Related JP4443645B2 (en) | 1998-05-07 | 1998-05-07 | CBD deposition system |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4443645B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100954364B1 (en) | 2008-04-17 | 2010-04-26 | (주)텔리오솔라코리아 | Apparatus for manufacturing ??-?? compound semiconductor thin film by chemical bath deposition and method thereof |
| JP2013062394A (en) * | 2011-09-14 | 2013-04-04 | Honda Motor Co Ltd | Method for manufacturing chalcopyrite solar cell, and buffer layer deposition apparatus |
| TWI835812B (en) | 2019-06-25 | 2024-03-21 | 久盛光電股份有限公司 | chemical bath deposition device |
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| JPS5916327A (en) * | 1982-07-19 | 1984-01-27 | Agency Of Ind Science & Technol | Manufacture of thin film |
| JPS6283396A (en) * | 1985-10-04 | 1987-04-16 | Nec Corp | Method for growing compound semiconductor crystal |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100954364B1 (en) | 2008-04-17 | 2010-04-26 | (주)텔리오솔라코리아 | Apparatus for manufacturing ??-?? compound semiconductor thin film by chemical bath deposition and method thereof |
| JP2013062394A (en) * | 2011-09-14 | 2013-04-04 | Honda Motor Co Ltd | Method for manufacturing chalcopyrite solar cell, and buffer layer deposition apparatus |
| TWI835812B (en) | 2019-06-25 | 2024-03-21 | 久盛光電股份有限公司 | chemical bath deposition device |
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| Publication number | Publication date |
|---|---|
| JP4443645B2 (en) | 2010-03-31 |
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