JPH11305422A - Photosensitive planographic printing plate using photocatalyst and unnecessitating development and its printing method - Google Patents
Photosensitive planographic printing plate using photocatalyst and unnecessitating development and its printing methodInfo
- Publication number
- JPH11305422A JPH11305422A JP10906298A JP10906298A JPH11305422A JP H11305422 A JPH11305422 A JP H11305422A JP 10906298 A JP10906298 A JP 10906298A JP 10906298 A JP10906298 A JP 10906298A JP H11305422 A JPH11305422 A JP H11305422A
- Authority
- JP
- Japan
- Prior art keywords
- printing plate
- semiconductor particles
- lithographic printing
- photosensitive lithographic
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は湿し水を用いて印刷
するオフセット印刷用の感光性平版印刷版に関する。よ
り詳しくは現像プロセスなしで露光のみで刷版が完了す
るいわゆるプロセスレスの感光性平版印刷版に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photosensitive lithographic printing plate for offset printing which is printed using a dampening solution. More specifically, the present invention relates to a so-called processless photosensitive lithographic printing plate in which a printing plate is completed only by exposure without a developing process.
【０００２】[0002]
【従来の技術】従来、オフセット印刷用の感光性平版印
刷版は予め親水性化された支持体の砂目表面上に、光化
学反応により溶解性の変化をもたらす感光層を塗布した
もので、印刷版を作製する刷版工程において、かかる感
光性平板印刷版を画像露光した後に、非画像部となる砂
目親水性表面を形成させるために現像液による感光層の
溶出工程がある。例えば、キノンジアジドを含有したポ
ジ型の感光性平版印刷版は画像露光後に、アルカリ水溶
液を主成分とした現像液で露光部の感光層を溶出して刷
版を行う。またジアゾ樹脂を含有したネガ型感光性平版
印刷版は有機溶剤を含む現像液で刷版を行う。何れの場
合もこれら溶出した感光層を含む現像液は、直接廃棄す
ることはできず産業廃液として処理されている。2. Description of the Related Art Conventionally, a photosensitive lithographic printing plate for offset printing is obtained by applying a photosensitive layer which causes a change in solubility by a photochemical reaction onto a grain surface of a support which has been made hydrophilic in advance. In a printing plate process for producing a plate, there is a step of eluting the photosensitive layer with a developing solution after the photosensitive lithographic printing plate is image-exposed to form a grain-grained hydrophilic surface serving as a non-image portion. For example, for a positive photosensitive lithographic printing plate containing quinonediazide, after image exposure, the photosensitive layer in the exposed area is eluted with a developing solution mainly composed of an aqueous alkali solution to perform printing. A negative photosensitive lithographic printing plate containing a diazo resin is subjected to printing using a developer containing an organic solvent. In any case, the developing solution containing the eluted photosensitive layer cannot be directly discarded and is treated as industrial waste liquid.
【０００３】また、上記の現像液は版の現像に伴い、ま
た空気中の二酸化炭素などにより劣化を受けるために、
現像工程においてはこれらの劣化を補うため現像液の補
充が必要であるが、多数枚処理するときの補充のコント
ロールは煩雑なものであり、時として現像液過剰になっ
たり、或いは現像液不足になったりして安定処理は極め
て困難なものである。[0003] Further, the above-mentioned developer is deteriorated by the development of the plate and by carbon dioxide in the air.
In the development step, replenishment of the developer is necessary to compensate for these deteriorations, but the control of replenishment when processing a large number of sheets is complicated, and sometimes the developer becomes excessive or insufficient. Stabilization is extremely difficult.
【０００４】[0004]
【発明が解決しようとする課題】以上のように従来の現
像液による現像工程は様々なトラブルの原因と成りやす
く、また、現像液等のランニングコストを要するという
問題点を抱えている。本発明は、廃液と安定的処理に数
多くの問題があった従来の現像プロセスを経ること無し
に画像露光のみでオフセット印刷が可能となる感光性平
版印刷版を提供することを目的とする。As described above, the conventional developing process using a developing solution is liable to cause various troubles and has a problem that a running cost of the developing solution and the like is required. SUMMARY OF THE INVENTION An object of the present invention is to provide a photosensitive lithographic printing plate capable of performing offset printing only by image exposure without going through a conventional developing process which has many problems in waste liquid and stable processing.
【０００５】[0005]
【課題を解決するための手段】本発明者らは、上記目的
を達成するため鋭意研究の結果、露光により親水性化す
る光触媒性半導体粒子を含有するインキ着肉性のある親
油性表面が、光触媒性半導体粒子を励起可能な光線によ
り画像露光することにより、未露光部は親油性が保持さ
れ、露光部が光触媒作用により両親媒性化されることに
より保水力を発現することを見出し本発明に到達した。
即ち本発明の要旨は、支持体上に、少なくとも露光によ
り親水性化する光触媒性半導体粒子を含有する層を設け
てなる現像不要の感光性平版印刷版に存する。本発明の
支持体上に、光触媒性半導体粒子を含有する層を設けて
なる平版印刷版は、露光により、未露光部はインキ着肉
性の親油性であり、露光部が湿し水を受容する両親媒性
化されることにより印刷潜像を形成し、通常のオフセッ
ト印刷が可能となる。Means for Solving the Problems The inventors of the present invention have conducted intensive studies in order to achieve the above object, and as a result, have found that an ink-adhesive lipophilic surface containing photocatalytic semiconductor particles that become hydrophilic by exposure to light, The present invention has been found that by exposing the photocatalytic semiconductor particles to an image with an excitable light beam, the unexposed portion retains lipophilicity, and the exposed portion expresses water retention by becoming amphiphilic by photocatalysis. Reached.
That is, the gist of the present invention resides in a development-free photosensitive lithographic printing plate comprising a support and at least a layer containing photocatalytic semiconductor particles which are made hydrophilic by exposure to light. A lithographic printing plate comprising a support of the present invention and a layer containing photocatalytic semiconductor particles is provided. By exposure, an unexposed portion has ink-inking lipophilicity, and the exposed portion receives dampening water. A latent image is formed by the amphiphilic treatment, and normal offset printing can be performed.
【０００６】[0006]
【発明の実施形態】以下、本発明を詳細に説明する。本
発明の光触媒を用いた現像不要の感光性平版印刷版に好
適に用いられる支持体としては、印刷機に取り付けられ
る適度なたわみ性と強度があり、かつ光触媒性半導体粒
子を含有する塗布層と密着できるものであればいかなる
ものでもかまわない。例えば、金属板やプラスチックフ
ィルム等があるが、好ましくはアルミニウム板である。
特に従来のＰＳ版に用いられているアルミニウム板が好
ましく、合金組成としては３１０３，３００３，１０５
０，１１００等が挙げられる。支持体の厚みとしては
０．１ｍｍ〜０．５ｍｍの範囲が良い。このアルミニウ
ム原反を単に脱脂処理したものでも、従来のＰＳ版のよ
うに砂目だてされ陽極酸化されたものでも好適に用いら
れる。また上層との密着性を向上させる目的で支持体に
プライマー層を設けるのもよい。特にプライマーとして
はトリメトキシシラン等のシランカップリング剤が好適
に使用される。BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be described in detail. As a support preferably used for a photosensitive lithographic printing plate which does not require development using the photocatalyst of the present invention, there is a moderate flexibility and strength attached to a printing machine, and a coating layer containing photocatalytic semiconductor particles. Any material can be used as long as it can adhere. For example, there are a metal plate and a plastic film, but an aluminum plate is preferable.
Particularly, an aluminum plate used for a conventional PS plate is preferable, and the alloy composition is 3103, 3003, 105
0, 1100 and the like. The thickness of the support is preferably in the range of 0.1 mm to 0.5 mm. A material obtained by simply degreased this aluminum material or a material subjected to graining and anodizing as in a conventional PS plate is suitably used. Further, a primer layer may be provided on the support for the purpose of improving the adhesion to the upper layer. In particular, a silane coupling agent such as trimethoxysilane is preferably used as a primer.
【０００７】本発明の感光性平版印刷版に好適に用いら
れる光触媒性半導体粒子としては、励起光によりそれ自
体親水性化するものであればいかなるものでもよいが、
チタニア（ＴｉＯ2 ）、ＺｎＯ、ＳｎＯ2 、ＳｒＴｉＯ
2 、ＷＯ3 、Ｂｉ2 Ｏ3 等が好ましい。さらに好ましく
チタニアである。チタニアは、アナターゼ型及びルチル
型のいずれも使用できるが、特にアナターゼ型のチタニ
アが好適に使用される。これらの光触媒性半導体粒子の
平均結晶径（粒径）としては０．５〜１００ｎｍ程度が
好ましい。支持体上にこれらの光触媒性半導体粒子を含
有する層を設けるには、少なくともこれらの微粒子を溶
剤中に分散させた液を塗布し乾燥させればよい。微粒子
の分散方法としては公知の何れの方法も用いることがで
きる。The photocatalytic semiconductor particles suitably used for the photosensitive lithographic printing plate of the present invention may be any as long as they themselves become hydrophilic by excitation light.
Titania (TiO 2 ), ZnO, SnO 2 , SrTiO
2 , WO 3 and Bi 2 O 3 are preferred. More preferred is titania. As the titania, any of anatase type and rutile type can be used. In particular, anatase type titania is preferably used. The average crystal diameter (particle size) of these photocatalytic semiconductor particles is preferably about 0.5 to 100 nm. In order to provide a layer containing these photocatalytic semiconductor particles on a support, a liquid in which at least these fine particles are dispersed in a solvent may be applied and dried. Any known method can be used for dispersing the fine particles.
【０００８】而して塗布性や皮膜形成性を向上させる為
には、光触媒性半導体粒子を親油性高分子化合物を溶解
した溶剤中に分散させた液を塗布することが好ましい。
更に光触媒性半導体粒子を含む層は、露光後に形成され
た表面の親水性保持のため、インキ着肉性があり、また
含水構造を有するバインダーを用い、このバインダーの
中に光触媒性半導体粒子が分散され、支持体上に塗布さ
れていることが好ましい。インキ着肉性があり、また含
水構造を有するバインダーとしては、（ａ）親油性高分
子化合物及び分子構造中に水を取り込むことのできる蓄
水性物質との混合物、または（ｂ）親油性高分子化合物
の分子構造中に蓄水性構造を含む高分子化合物が挙げら
れる。この含水構造を有するバインダーとしては、かか
る性能を有するものであれば特に限定されるものではな
いが、好適な親油性高分子化合物はアクリル樹脂であ
り、蓄水性物質はポリオルガノシロキサンである。アク
リル樹脂としては、例えば、アクリル酸、メタクリル
酸、アクリル酸アルキル、メタクリル酸アルキル、アク
リル酸水酸化アルキル、メタクリル酸水酸化アルキル、
アクリロニトリル等の共重合体等が好ましく、また、ポ
リオルガノシロキサンとしてはポリジメチルシロキサン
が好ましい。また、ポリジメチルシロキサンは架橋され
ていることが好ましい。架橋手段としては、付加型であ
っても、縮合型であってもかまわない。[0008] In order to improve coating properties and film forming properties, it is preferable to apply a liquid in which photocatalytic semiconductor particles are dispersed in a solvent in which a lipophilic polymer compound is dissolved.
Further, the layer containing the photocatalytic semiconductor particles has an ink-injecting property to maintain the hydrophilicity of the surface formed after exposure, and uses a binder having a water-containing structure, and the photocatalytic semiconductor particles are dispersed in the binder. And it is preferably applied on a support. Examples of the binder having an ink-adhering property and a water-containing structure include (a) a mixture of a lipophilic polymer compound and a water-storing substance capable of taking water into a molecular structure, or (b) a lipophilic high-molecular compound. A high molecular compound having a water storage structure in the molecular structure of the molecular compound is exemplified. The binder having the water-containing structure is not particularly limited as long as it has such performance, but a preferred lipophilic polymer compound is an acrylic resin, and a water storage material is a polyorganosiloxane. As the acrylic resin, for example, acrylic acid, methacrylic acid, alkyl acrylate, alkyl methacrylate, alkyl acrylate hydroxide, alkyl methacrylate hydroxide,
Copolymers such as acrylonitrile and the like are preferable, and polydimethylsiloxane is preferable as the polyorganosiloxane. Further, the polydimethylsiloxane is preferably crosslinked. The crosslinking means may be an addition type or a condensation type.
【０００９】また、分子構造中に水を取り込むことので
きる蓄水性のある物質を含んだ親油性高分子化合物の例
としては、ポリオルガノシロキサンとアクリル樹脂のブ
ロックまたはグラフト共重合体が挙げられる。これは例
えば、アルキルまたは水酸化アルキル等の（メタ）アク
リルモノマーと、末端にビニル基のあるポリオルガノシ
ロキサンマクロマーをラジカル共重合することにより得
られる。[0009] Examples of lipophilic high molecular compounds containing a water-storing substance capable of incorporating water into the molecular structure include a block or graft copolymer of polyorganosiloxane and an acrylic resin. . This can be obtained, for example, by radical copolymerization of a (meth) acrylic monomer such as an alkyl or alkyl hydroxide and a polyorganosiloxane macromer having a vinyl group at a terminal.
【００１０】一般的にポリオルガノシロキサンはオフセ
ット印刷インキに対して反発性があるため、あまり多く
添加すると画像部にインキが着肉し難くなってしまう。
そこで、これらポリオルガノシロキサンを蓄水性物質と
して使用する場合、親油性高分子化合物１００重量部に
対し、ポリオルガノシロキサン１〜５００重量部が好ま
しく、さらに好ましくは１０〜２００重量部である。In general, polyorganosiloxanes have resilience to offset printing inks. Therefore, if too much is added, it becomes difficult for the ink to deposit on the image area.
Therefore, when these polyorganosiloxanes are used as the water storage material, the amount is preferably 1 to 500 parts by weight, more preferably 10 to 200 parts by weight, per 100 parts by weight of the lipophilic polymer compound.
【００１１】光触媒性半導体粒子とともにこれら蓄水構
造を有するバインダー等を用いることにより、光触媒性
半導体粒子の光励起による表面の親水性化をより長時間
持続させることが可能となる。つまりこのバインダーの
添加効果は露光終了後の親水性、親油性の潜像を安定化
させる効果である。これらのバインダーと光触媒性半導
体粒子の層中の比率としては、両者の合計に対しバイン
ダーが３０〜９９重量％、光触媒性半導体粒子が１〜７
０重量％が好ましい。さらに好ましくは、バインダーが
５０〜９６重量％、光触媒性半導体粒子が４〜５０重量
％である。その他本発明の光触媒を含有する層には目的
に応じ、種々の添加剤を加えることができる。例えば、
塗布性を改良するための界面活性剤、版の外観を改良す
るための着色用染料、インキ着肉性をよくするための界
面活性剤等である。By using the binder having a water storage structure together with the photocatalytic semiconductor particles, it is possible to maintain the hydrophilicity of the surface of the photocatalytic semiconductor particles by photoexcitation for a longer time. That is, the effect of the addition of the binder is an effect of stabilizing a hydrophilic and lipophilic latent image after completion of exposure. The ratio of the binder and the photocatalytic semiconductor particles in the layer is 30 to 99% by weight based on the total of the binder and the photocatalytic semiconductor particles in the layer.
0% by weight is preferred. More preferably, the content of the binder is 50 to 96% by weight, and the content of the photocatalytic semiconductor particles is 4 to 50% by weight. In addition, various additives can be added to the layer containing the photocatalyst of the present invention according to the purpose. For example,
Examples of the surfactant include a surfactant for improving coating properties, a coloring dye for improving the appearance of the plate, and a surfactant for improving ink adhesion.
【００１２】光触媒性半導体粒子を含有する層を形成す
るための塗布溶剤としては、バインダーを溶解可能であ
り、かつ光触媒性粒子が分散可能であるか、光触媒性粒
子の分散を破壊しない溶剤であれば特に限定されるもの
ではない。分散塗布の方法としては従来公知のどのよう
な方法でも使用可能である。塗布後の塗膜の乾燥重量と
しては０．１ｇ／ｍ2 〜５０ｇ／ｍ2 が好ましい。さら
に好ましくは０．２ｇ／ｍ2 〜２０ｇ／ｍ2 である。As a coating solvent for forming the layer containing the photocatalytic semiconductor particles, any solvent that can dissolve the binder and disperse the photocatalytic particles or does not destroy the dispersion of the photocatalytic particles is used. It is not particularly limited. As the method of dispersion coating, any conventionally known method can be used. 0.1g / m 2 ~50g / m 2 is preferable as the dry weight of the coating film after coating. More preferably from 0.2g / m 2 ~20g / m 2 .
【００１３】以上の如く形成された、本発明に係わる光
触媒を用いた現像不要の感光性平版印刷版は、画像露光
することにより未露光部が親油性で、露光部が両親媒性
化（保水性化）されることにより印刷潜像が形成され
る。画像露光に用いる光としては、光触媒性半導体粒子
を励起可能な光線を含むものである必要がある。アナタ
ーゼ型チタニアの場合は励起に必要な波長は３９０ｎｍ
以下なので、この波長以下の光線を含む光で露光する必
要がある。このような光線を含む光源としては、通常の
オフセット印刷版に用いられる光源である水銀灯やメタ
ルハライドランプが使用可能である。また、露光部であ
る非画像部が十分に親水性化する露光量が必要であり、
この露光量は用いる素材にも依存するが、一般的に言っ
て４００ｍＪ／ｃｍ2 以上である。The photosensitive lithographic printing plate formed using the photocatalyst according to the present invention and which does not require development, as described above, is made lipophilic in the unexposed area by image exposure and becomes amphiphilic in the exposed area (water retention). ) To form a printing latent image. The light used for the image exposure needs to include a light beam capable of exciting the photocatalytic semiconductor particles. In the case of anatase titania, the wavelength required for excitation is 390 nm
Therefore, it is necessary to expose with light including a light beam having a wavelength equal to or less than this wavelength. As a light source including such a light beam, a mercury lamp or a metal halide lamp, which is a light source used for a normal offset printing plate, can be used. In addition, the exposure amount is required to sufficiently hydrophilize the non-image portion as the exposed portion,
This exposure dose depends on the material used, but is generally 400 mJ / cm 2 or more.
【００１４】なお、通常のオフセット用の感光性平版の
場合は、現像工程により非画像部を除去し潜像を顕像化
するため、現像工程以降は白色灯下で取り扱うが、本発
明の感光性平版印刷版の場合、潜像状態のまま印刷機に
とりつけるため、この間もあまり紫外線を含む白色灯下
にさらすことは好ましくない。このような一般の白色灯
下で取り扱い可能な時間（セーフライト性）は約１０分
程度である。逆に、白色灯でも特に紫外線カットの照明
の場合は、セーフライト性は非常に長く、このような照
明下であれば露光前の段階から問題なく版を取り扱うこ
とができる。In the case of an ordinary photosensitive lithographic plate for offset, the non-image portion is removed by a developing step to make a latent image visible, so that it is handled under a white lamp after the developing step. In the case of a lithographic printing plate, it is not preferable to expose the printing plate under a white lamp containing much ultraviolet light during this time because the printing plate is attached to a printing machine in a latent image state. The time that can be handled under such a general white light (safe light property) is about 10 minutes. Conversely, even in the case of white light, especially in the case of ultraviolet cut illumination, the safelight property is very long, and under such illumination, the plate can be handled without problems from the stage before exposure.
【００１５】[0015]
【実施例】以下、本発明を実施例により、更に具体的に
説明するが、本発明は、その要旨を超えない限り、以下
の実施例に制約されるものではない。 実施例１ ［版の準備］板サイズ３０ｃｍ角で板厚０．２４ｍｍの
アルミニウム板（合金１０５０）をアルカリにより脱脂
処理した。このアルミニウム板上に、下記組成物をバル
ブホモジナイザーを２回通し組成中のチタニアを分散さ
せて調製した塗布液を、ワイヤーバーを用いて乾燥時の
塗膜重量が２ｇ／ｍ2 になるように塗布し、８０℃で５
分間加熱乾燥させて、光触媒を用いた現像不要の感光性
平版印刷版を得た。EXAMPLES Hereinafter, the present invention will be described in more detail with reference to examples, but the present invention is not limited to the following examples unless it exceeds the gist of the present invention. Example 1 [Preparation of plate] An aluminum plate (alloy 1050) having a plate size of 30 cm square and a plate thickness of 0.24 mm was degreased with alkali. On the aluminum plate, a coating solution prepared by passing the following composition twice through a valve homogenizer to disperse the titania in the composition was dried using a wire bar so that the coating weight when dried was 2 g / m 2. Apply, 5 at 80 ° C
After heating and drying for minutes, a photosensitive lithographic printing plate not requiring development using a photocatalyst was obtained.
【００１６】[0016]
【表１】 （塗布液組成） 光触媒性アナターゼ型チタニア ３０重量部 （石原産業（株）製 粒径４０ｎｍ） 両末端水酸基のポリジメチルシロキサン ２０重量部 （東芝シリコーン製ＹＦ３８０２） トリアセトキシメチルシラン ４重量部 ジブチル錫ジアセテート ０．１重量部 親油性高分子化合物 ４０重量部 （メチルメタクリレート／２−ヒドロキシエチルアクリレート、 ５０／５０ｍｏｌ％の共重合体、Ｍw ＝８００００） メチルエチルケトン ９００重量部(Composition of coating liquid) 30 parts by weight of photocatalytic anatase type titania (particle size: 40 nm, manufactured by Ishihara Sangyo Co., Ltd.) 20 parts by weight of polydimethylsiloxane having hydroxyl groups at both ends (YF3802, manufactured by Toshiba Silicone Co., Ltd.) 4 parts by weight of triacetoxymethylsilane Part Dibutyltin diacetate 0.1 part by weight Lipophilic polymer compound 40 parts by weight (methyl methacrylate / 2-hydroxyethyl acrylate, copolymer of 50/50 mol%, Mw = 80000) Methyl ethyl ketone 900 parts by weight
【００１７】（画像形成性評価）得られた感光性平版印
刷版の画像形成性を以下の手順で評価した。 １：版面の半分を遮光し３９０ｎｍ以下の光を含む高圧
水銀灯で約４３０ｎｍ換算で１５００ｍＪ／ｃｍ2 まで
露光した。 ２：露光後の版面を通常の水道水で水洗した。この結
果、未露光部は水をはじき、露光部は水が濡れ保水化さ
れていることが分かった。 ３：２の状態のまま酸化重合型の印刷インキを盛り、ハ
ンドローラでインキを版面全面に広げた。その後再度水
洗した。 この結果、露光部にはインキがつかず、未露光部にのみ
インキが受容された。以上の評価より、本発明の感光性
平版印刷版が現像処理無しに、いわゆる湿し水を用いた
オフセット印刷版として使用可能であると判断された。(Evaluation of Image Formability) The image forming properties of the resulting photosensitive lithographic printing plate were evaluated according to the following procedure. 1: Half of the plate surface was shielded from light and exposed to 1500 mJ / cm 2 in terms of about 430 nm using a high-pressure mercury lamp containing light of 390 nm or less. 2: The plate after exposure was washed with ordinary tap water. As a result, it was found that the unexposed portion repels water, and the exposed portion is wetted with water. Oxidation polymerization type printing ink was applied in the state of 3: 2, and the ink was spread over the entire surface of the plate with a hand roller. Then, it was washed again with water. As a result, no ink was applied to the exposed portions, and only the unexposed portions received the ink. From the above evaluations, it was determined that the photosensitive lithographic printing plate of the present invention can be used as a so-called offset printing plate using a fountain solution without development processing.
【００１８】[0018]
【発明の効果】本発明の、光触媒性半導体粒子を含有す
る層を設けた感光性平板印刷版は、画像露光後、現像処
理することなく印刷版として使用することが出来る。従
って、現像処理に起因する廃液処理や、安定な現像処理
等の問題がなく、工程が簡略化され、ランニングコスト
も低減される。According to the present invention, the photosensitive lithographic printing plate provided with a layer containing photocatalytic semiconductor particles can be used as a printing plate without developing after image exposure. Therefore, there is no problem such as waste liquid treatment or stable development treatment caused by the development treatment, and the process is simplified and the running cost is reduced.
Claims (6)
性化される光触媒性半導体粒子を含有する層を設けてな
る現像不要の感光性平版印刷版。1. A photosensitive lithographic printing plate requiring no development, comprising a support and a layer containing at least photocatalytic semiconductor particles which are made hydrophilic by exposure.
Ｏ、ＳｎＯ2 、ＳｒＴｉＯ2 、ＷＯ3 、Ｂｉ2 Ｏ3 から
選ばれる少なくとも１種であることを特徴とする請求項
１記載の現像不要の感光性平版印刷版。2. A photocatalytic semiconductor particle comprising TiO 2 , Zn
O, SnO 2, SrTiO 2, WO 3, developing unnecessary photosensitive lithographic printing plate according to claim 1, wherein the at least one selected from Bi 2 O 3.
とを特徴とする請求項２記載の現像不要の感光性平版印
刷版。3. The photosensitive lithographic printing plate according to claim 2 , wherein the photocatalytic semiconductor particles are TiO 2 .
ることを特徴とする請求項１乃至３の何れかに記載の現
像不要感光性平版印刷版。4. The development-free photosensitive lithographic printing plate according to claim 1, wherein the TiO 2 is anatase-type TiO 2 .
に、（ａ）親油性高分子化合物及び分子構造中に水を取
り込むことのできる蓄水性物質との混合物、または
（ｂ）親油性高分子化合物の分子中に蓄水性構造を含む
高分子化合物、を含有することを特徴とする請求項１乃
至４の何れかに記載の現像不要の感光性平版印刷版。5. The layer containing the photocatalytic semiconductor particles, further comprising: (a) a mixture of a lipophilic polymer compound and a water storage substance capable of incorporating water into a molecular structure; or (b) a lipophilic compound. The photosensitive lithographic printing plate according to any one of claims 1 to 4, further comprising a polymer compound having a water storage structure in the molecule of the polymer compound.
平版印刷版を、該光触媒性半導体粒子を励起可能な光線
により画像露光することにより、未露光部が親油性であ
り、露光部が両親媒性化された印刷潜像を形成すること
を特徴とする感光性平版印刷版の刷版方法。6. The photosensitive lithographic printing plate according to claim 1, wherein an unexposed portion is lipophilic by exposing the photosensitive lithographic printing plate to light that can excite the photocatalytic semiconductor particles. A printing method for a photosensitive lithographic printing plate, wherein a printing latent image having an amphiphilic part is formed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10906298A JPH11305422A (en) | 1998-04-20 | 1998-04-20 | Photosensitive planographic printing plate using photocatalyst and unnecessitating development and its printing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10906298A JPH11305422A (en) | 1998-04-20 | 1998-04-20 | Photosensitive planographic printing plate using photocatalyst and unnecessitating development and its printing method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH11305422A true JPH11305422A (en) | 1999-11-05 |
Family
ID=14500642
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10906298A Pending JPH11305422A (en) | 1998-04-20 | 1998-04-20 | Photosensitive planographic printing plate using photocatalyst and unnecessitating development and its printing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH11305422A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8092985B2 (en) | 2008-12-18 | 2012-01-10 | Eastman Kodak Company | Method of making a planographic printing plate |
-
1998
- 1998-04-20 JP JP10906298A patent/JPH11305422A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8092985B2 (en) | 2008-12-18 | 2012-01-10 | Eastman Kodak Company | Method of making a planographic printing plate |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102540709B (en) | Infrared sensitive chemistry-free light-sensing composition and lithographic printing plate made from same | |
| JP3346866B2 (en) | Water developable diazo-based lithographic printing plate | |
| US5786128A (en) | On-press development of a lithographic printing plate having an aryldiazosulfonate resin in a photosensitive layer | |
| EP1074887B1 (en) | Radiation-sensitive compositions for printing plates for improving their chemical and developer resistance and printing plates comprising said compositions | |
| EP0257504B1 (en) | Presensitized printing plate and process for the production of dry lithographic printing plates | |
| JPS589146A (en) | Plate meterial for lithography requiring no water | |
| EP0257505A2 (en) | Presensitized printing plate and process for the production of dry lithographic printing plates | |
| JPS60191262A (en) | Production of photosensitive lithographic printing plate without requiring damping water | |
| US5402725A (en) | Lithographic base with a modified dextran or pullulan hydrophilic layer | |
| JPH11305422A (en) | Photosensitive planographic printing plate using photocatalyst and unnecessitating development and its printing method | |
| JP3784933B2 (en) | Development method for photosensitive lithographic printing plate | |
| US5057394A (en) | Method of forming an image | |
| JPH11119416A (en) | Waterless planographic printing plate | |
| JPH09150589A (en) | Original plate of direct writing waterless lithographic printing plate | |
| JPH056000A (en) | Automatic developing device for waterless planography | |
| JPH11305423A (en) | Photosensitive planographic printing plate using photocatalyst and unnecessitating development and damping water and its printing method | |
| US20030099888A1 (en) | Method for the production of a printing plate using particle growing acceleration by an additive polymer | |
| JP3841546B2 (en) | Offset printing plate | |
| EP0306784A2 (en) | Presensitized lithographic printing plate for dry lithography, and process for its production | |
| JPS5849940A (en) | Photosensitive composition | |
| JPS6153716B2 (en) | ||
| JP2019132915A (en) | Manufacturing method of photosensitive lithographic printing plate | |
| JP2831766B2 (en) | Lithographic printing materials | |
| JPS6097358A (en) | Developer for photosensitive lithographic printing plate | |
| JP3978695B2 (en) | Photosensitive composition |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A711 | Notification of change in applicant |
Effective date: 20040510 Free format text: JAPANESE INTERMEDIATE CODE: A711 |
|
| RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7422 Effective date: 20050913 |
|
| RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20051109 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20051129 |
|
| A02 | Decision of refusal |
Effective date: 20060328 Free format text: JAPANESE INTERMEDIATE CODE: A02 |