JPH11276992A - Solar radiation shielding film and its production - Google Patents
Solar radiation shielding film and its productionInfo
- Publication number
- JPH11276992A JPH11276992A JP10043298A JP10043298A JPH11276992A JP H11276992 A JPH11276992 A JP H11276992A JP 10043298 A JP10043298 A JP 10043298A JP 10043298 A JP10043298 A JP 10043298A JP H11276992 A JPH11276992 A JP H11276992A
- Authority
- JP
- Japan
- Prior art keywords
- rays
- fine particles
- oxide
- solar shading
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、ガラス、プラスチ
ックスその他の各種日射遮蔽機能を必要とする基材に適
用可能な日射遮蔽膜及びその形成方法に関する。より詳
しくは、無機微粒子を含有する溶液を基体上に塗布し、
この塗布膜に活性エネルギー線を照射して製造される日
射遮蔽膜及びその製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a solar shading film applicable to glass, plastics, and other substrates requiring various solar shading functions, and a method of forming the same. More specifically, a solution containing inorganic fine particles is applied on a substrate,
The present invention relates to a solar shading film manufactured by irradiating an active energy ray to the coating film and a manufacturing method thereof.
【０００２】[0002]
【従来の技術】太陽光は、近赤外光、可視光、紫外光の
３種に大きく分けることができる。近赤外光（熱線）は
熱エネルギーとして人体に感じる波長領域であり、夏季
の室内温度上昇の原因となる光線である。可視光は、人
間の肉眼に認識される領域の光線である。紫外光は、皮
膚癌の発生等人体へ悪影響を及ぼすことが指摘されてい
る光線である。2. Description of the Related Art Sunlight can be broadly classified into three types: near-infrared light, visible light, and ultraviolet light. Near-infrared light (heat ray) is a wavelength region that is perceived by the human body as heat energy, and is a light ray that causes a rise in indoor temperature in summer. Visible light is a light ray in an area recognized by the naked eye of a human. Ultraviolet light is a light beam that has been pointed out to have an adverse effect on the human body, such as the occurrence of skin cancer.
【０００３】従来、太陽光のこれらの領域のいずれか或
いは全部の領域の光線を遮蔽するための日射遮蔽膜が知
られている。日射遮蔽膜に使用されている材料には、貴
金属（Ａｕ、Ａｇ、Ｃｕ）や、窒化チタン、アルミニウ
ムなどのような伝導電子を多量にもつ材料が知られてい
る。日射遮蔽機能はこれら伝導電子のプラズモンによる
反射を主として利用している。これらの材料では、近赤
外光領域の光以外に可視光領域の光も同時に反射もしく
は吸収する性質があるので、建材、乗り物、電話ボック
ス等に使用する透明基材に適用する場合には可視光領域
の透過率が低下する。Heretofore, there has been known a solar shading film for blocking light rays in any or all of these regions of sunlight. As a material used for the solar shading film, a material having a large amount of conduction electrons, such as a noble metal (Au, Ag, Cu), titanium nitride, or aluminum is known. The solar shading function mainly utilizes the reflection of these conduction electrons by plasmons. These materials have the property of simultaneously reflecting or absorbing light in the visible light region in addition to light in the near-infrared light region, so when applied to transparent base materials used in building materials, vehicles, telephone boxes, etc. The transmittance of the light region decreases.
【０００４】近年、可視光透明性があり、かつ日射遮蔽
機能をもつ材料として各種酸化物材料が検討されてい
る。例えばインジウム錫酸化物（ＩＴＯ）、アルミニウ
ム添加酸化亜鉛（ＡＺＯ）、酸化チタン、酸化亜鉛、酸
化セリウム、酸化ルテニウムが知られている。[0004] In recent years, various oxide materials have been studied as materials having transparency to visible light and a function of shielding sunlight. For example, indium tin oxide (ITO), aluminum-added zinc oxide (AZO), titanium oxide, zinc oxide, cerium oxide, and ruthenium oxide are known.
【０００５】また、日射遮蔽膜として可視光領域におい
て、その透過率を制御することで窓ガラス等の透明基材
にプライバシー保護機能を持たせる使用例も知られてい
る。[0005] Further, there is also known a use example in which a transparent base material such as a window glass is provided with a privacy protection function by controlling the transmittance in a visible light region as a solar shading film.
【０００６】[0006]
【発明が解決しようとする課題】前記従来の各種日射遮
蔽機能をもつ材料を用いた膜の形成方法には、主に、蒸
着法、塗布法の２つの方法に大別される。蒸着法では、
金属あるいは金属酸化物材料の真空蒸着法、或いはスパ
ッタリング法などが知られている。塗布法では、金属ア
ルコキシドの加水分解と重縮合反応利用するゾル−ゲル
法により基体上に金属酸化物薄膜を形成する方法、又は
金属或いは金属酸化物微粒子を有機バインダー中に分散
させた微粒子溶液を塗布する方法が知られている。The above-mentioned conventional methods of forming a film using various materials having a function of shielding solar radiation are roughly classified into two methods: a vapor deposition method and a coating method. In the evaporation method,
A vacuum evaporation method or a sputtering method of a metal or metal oxide material is known. In the coating method, a method of forming a metal oxide thin film on a substrate by a sol-gel method utilizing hydrolysis and polycondensation reaction of a metal alkoxide, or a fine particle solution in which metal or metal oxide fine particles are dispersed in an organic binder is used. A method of applying is known.
【０００７】しかし、これらの従来技術は、前記蒸着法
では比較的高度な真空を要するため製造コストが高く、
また、量産性に難点があった。前記塗布法では、ゾル−
ゲル法の場合、一般にコーティング液となるゾル液の反
応性が高く、不安定なため、塗布法の利点を生かした製
品の開発、例えば大面積の塗布などが行えない、また原
材料のコストが高いという難点があった。However, these prior arts require a relatively high vacuum in the above-mentioned vapor deposition method, so that the production cost is high,
In addition, there was a problem in mass productivity. In the coating method, sol-
In the case of the gel method, in general, the reactivity of a sol liquid serving as a coating liquid is high and unstable, so that it is not possible to develop a product utilizing the advantages of the coating method, for example, it is not possible to apply a large area, and the cost of raw materials is high. There was a drawback.
【０００８】一方、微粒子溶液を用いる場合、コーティ
ング液が安定かつ比較的安価で、量産性に優れた方法で
あるが、バインダー成分や分散剤等の有機物が膜中に残
存するため、透明性・日射遮蔽性などの性能が蒸着法よ
り劣っていることなどの問題があった。On the other hand, when a fine particle solution is used, the coating solution is stable and relatively inexpensive, and is excellent in mass productivity. However, since organic substances such as a binder component and a dispersant remain in the film, the transparency and the like are low. There is a problem that the performance such as solar shading is inferior to the vapor deposition method.
【０００９】本発明は、これらの問題点を解決するため
になされたもので、比較的低温度の膜形成でも優れた日
射遮蔽性を持つ日射遮蔽膜の製造方法を提供することを
目的とする。特に、大面積の塗布形成が可能であり、量
産性・コスト面で優れた日射遮蔽膜とその製造方法を提
供することを目的とする。The present invention has been made to solve these problems, and an object of the present invention is to provide a method of manufacturing a solar shading film having excellent solar shading properties even when a film is formed at a relatively low temperature. . In particular, it is an object of the present invention to provide a solar shading film which can be formed in a large area and is excellent in mass productivity and cost, and a method for manufacturing the same.
【００１０】[0010]
【課題を解決するための手段】上記の目的を達成するた
めに本発明者等が鋭意検討を行った結果、無機微粒子を
主成分とする塗布膜に対して活性エネルギー線照射を行
うことにより、微粒子塗布膜でも優れた日射遮蔽膜を得
られることを知見し、本発明に至ったものである。Means for Solving the Problems As a result of intensive studies by the present inventors in order to achieve the above object, the present inventors have found that a coating film containing inorganic fine particles as a main component is irradiated with active energy rays. The present inventors have found that an excellent solar shading film can be obtained even with a fine particle coating film, and have reached the present invention.
【００１１】即ち、本発明の日射遮蔽膜の製造方法およ
びその日射遮蔽膜は、無機微粒子を含有する溶液を基体
上に塗布し、この塗布膜に活性エネルギー線を照射する
こと、およびこのようにして得られた日射遮蔽膜である
ことを特徴とする。That is, the method for producing a solar shading film of the present invention and the solar shading film are provided by applying a solution containing inorganic fine particles onto a substrate and irradiating the coated film with active energy rays. It is characterized by being a solar shading film obtained by the above method.
【００１２】本発明の重要な特徴は、上記塗布膜に活性
エネルギー線を照射することにより、日射遮蔽性発現を
阻害している因子を減らすことにある。詳述すると、活
性エネルギー線により塗布膜中の残留有機物が減少する
ことにより、膜の無機微粒子の純度が上がり、無機微粒
子が本来持ち合わせている日射遮蔽性により近づくこと
である。An important feature of the present invention is that by irradiating the above-mentioned coating film with an active energy ray, a factor which inhibits the onset of solar shading properties is reduced. More specifically, the purity of the inorganic fine particles of the film is increased by reducing the amount of organic substances remaining in the coating film due to the active energy rays, and the inorganic fine particles are closer to the solar shading property originally provided.
【００１３】[0013]
【発明の実施の形態】ここで、日射遮蔽膜が形成される
基体としては、特に限定する必要はなく、ガラス、金
属、プラスチック、紙、木材等の板状のもの、フィルム
状のもの、或いは成形体などを用いることができる。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Here, the substrate on which the solar shading film is formed is not particularly limited, and may be a plate-like material such as glass, metal, plastic, paper, wood, or the like, or a film-like material. A molded article or the like can be used.
【００１４】本発明においては、まず上記基体に無機微
粒子溶液が塗布される。この場合、無機微粒子は特に限
定されないが、例えばインジウム錫酸化物、アルミニウ
ム亜鉛酸化物、酸化亜鉛、酸化チタン微粒子、酸化セリ
ウム、等の金属酸化物などが挙げられるが、塗布膜の透
明性の点から、その粒子径が１ｎｍ〜５００ｎｍの範囲
である方が好ましい。無機微粒子溶液の溶媒としては、
基体上に塗布したのち、除去させる必要があるために、
揮発性の溶媒が好ましいが、特に限定されない。例え
ば、エチルアルコール、メチルアルコール、ｉｓｏ−プ
ロピルアルコール、ｎ−プロピルアルコール、ｎ−ブト
キシアルコール、ｓｅｃ−ブトキシアルコール、ｔｅｒ
ｔ−ブトキシアルコール等のアルコール類；水；酢酸エ
チル、酢酸メチル、２−メトキシ酢酸エチルなどの酢酸
エステル類；、アセトン、メチルエチルケトン、メチル
イソブチルケトンなどのケトン類；エチレングリコー
ル、ジエチレングリコール、ポリエチレングリコール等
のエチレングリコール類；エチレングリコールモノエチ
ルエーテル等のエチレングリコールアルキルエーテル
類、テトラヒドロフランなどのエーテル類、ジメチルフ
ォルムアミド、ジメチルスルフォキシド、キシレン、ク
ロロベンゼン、ジオキサン、酢酸イソアミルなどが挙げ
られる。In the present invention, first, an inorganic fine particle solution is applied to the above substrate. In this case, the inorganic fine particles are not particularly limited, and include, for example, metal oxides such as indium tin oxide, aluminum zinc oxide, zinc oxide, titanium oxide fine particles, cerium oxide, and the like. Therefore, the particle diameter is preferably in the range of 1 nm to 500 nm. As a solvent for the inorganic fine particle solution,
After applying on the substrate, it is necessary to remove
Volatile solvents are preferred, but not particularly limited. For example, ethyl alcohol, methyl alcohol, iso-propyl alcohol, n-propyl alcohol, n-butoxy alcohol, sec-butoxy alcohol, ter
alcohols such as t-butoxy alcohol; water; acetates such as ethyl acetate, methyl acetate and ethyl 2-methoxyacetate; ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone; ethylene glycol, diethylene glycol, polyethylene glycol and the like. Ethylene glycols; ethylene glycol alkyl ethers such as ethylene glycol monoethyl ether; ethers such as tetrahydrofuran; dimethylformamide, dimethyl sulfoxide, xylene, chlorobenzene, dioxane, isoamyl acetate and the like.
【００１５】また、無機微粒子溶液中には、必要に応じ
て分散剤やバインダー成分等の添加剤が入る。例えば、
シランカップリング剤、チタネート系カップリング剤、
アルミニウム系カップリング剤の各種カップリング剤、
アセチルアセトン、エチルアセチルアセトン等のベータ
ジケトン、その他、各種の界面活性剤やポリマー等が適
宜用いられる。The inorganic fine particle solution may contain additives such as a dispersant and a binder component, if necessary. For example,
Silane coupling agents, titanate coupling agents,
Various coupling agents of aluminum-based coupling agents,
Beta diketones such as acetylacetone and ethylacetylacetone, as well as various surfactants and polymers are appropriately used.
【００１６】上記無機微粒子溶液の基体上への塗布方法
としては、スプレー、ディップ、バーコーティング、ロ
ールコート、スピンコート、ブレードコート、フレキソ
印刷等の各種方法が可能である。また、オフセット、あ
るいはスクリーン印刷法でのパターン印刷法も採用可能
である。Various methods such as spraying, dipping, bar coating, roll coating, spin coating, blade coating, and flexographic printing can be used as a method for applying the inorganic fine particle solution on the substrate. Also, a pattern printing method using an offset or screen printing method can be adopted.
【００１７】この場合、塗布後に乾燥を行うと、溶剤の
蒸発とともに微粒子同士の接触が事前に促され、その後
の活性エネルギー線照射が効果的になるので好ましい。
加熱による乾燥を行う場合には、基体が耐熱性を有する
範囲であれば加熱温度は何度でもよい。例えば、プラス
チック基板を用いる場合などは、基材の材質を選択すれ
ば室温〜２５０℃が可能である。In this case, it is preferable to carry out drying after the application, since the contact between the fine particles is promoted in advance with the evaporation of the solvent, and the subsequent irradiation with active energy rays becomes effective.
When drying by heating, the heating temperature may be any number as long as the substrate has heat resistance. For example, when a plastic substrate is used, the temperature can be from room temperature to 250 ° C. if the material of the base material is selected.
【００１８】本発明において、このように基体上に無機
微粒子溶液を塗布した後、その塗膜に活性エネルギー線
照射を行う。In the present invention, after the inorganic fine particle solution is applied on the substrate as described above, the coating film is irradiated with active energy rays.
【００１９】上記活性エネルギー線としては、赤外線、
可視光線、紫外線、Ｘ線等の電磁波光線や電子線、イオ
ンビーム、中性子線、α線等の粒子線等が用いられる。
特に、電磁波の場合、低圧水銀ランプ、高圧水銀ラン
プ、超高圧水銀ランプ、キセノン水銀ランプ、エキシマ
ランプ、エキシマレーザ、高調波発生ＹＡＧレーザ、他
各種レーザを線源とする波長１ｎｍ〜４００ｎｍの紫外
線が残留有機物の除去には効果的であり、好ましい。ま
た、その中でも最大瞬間エネルギーの高いレーザ、例え
ばエキシマレーザ、高調波発生ＹＡＧレーザが効果的で
ある。これらのレーザを用いる場合の照射エネルギー密
度は、１〜１０００ｍＪ／ｃｍ2 の範囲であることが望
ましく、それより低い場合は残留有機物を除去すること
ができず、またそれより大きい場合は膜自身が破壊され
るために特性がでない。活性エネルギー線は、電子線で
もその効果を発揮する。この場合、線量は１０〜１００
０Ｍｒａｄの範囲であることが望ましい。The active energy rays include infrared rays,
Electromagnetic rays such as visible rays, ultraviolet rays, and X-rays, electron beams, ion beams, neutron rays, and particle rays such as α rays are used.
In particular, in the case of electromagnetic waves, low-pressure mercury lamps, high-pressure mercury lamps, ultra-high-pressure mercury lamps, xenon mercury lamps, excimer lamps, excimer lasers, harmonic generation YAG lasers, and other lasers having a wavelength of 1 nm to 400 nm are used. It is effective and preferred for removing residual organic matter. Among them, a laser having a high maximum instantaneous energy, for example, an excimer laser or a harmonic generation YAG laser is effective. The irradiation energy density in the case of using these lasers is desirably in the range of 1 to 1000 mJ / cm 2. If the irradiation energy density is lower than this, the residual organic substances cannot be removed. No property to be destroyed. Active energy rays also exert their effects with electron beams. In this case, the dose is 10-100
It is desirable to be in the range of 0 Mrad.
【００２０】[0020]
【実施例】以下、実施例により本発明を詳細に説明す
る。なお、以下の説明で示される事例は、本発明の範囲
内の好適例に過ぎない。従って、本発明が以下に示す実
施例にのみ限定されるものではない。The present invention will be described below in detail with reference to examples. Note that the cases shown in the following description are merely preferred examples within the scope of the present invention. Therefore, the present invention is not limited only to the embodiments described below.
【００２１】１．ＩＴＯ微粒子溶液の調製 体積抵抗値（１００ｋｇ／ｃｍ加圧時測定値）１０-2Ω
ｃｍ、平均一次粒子径が２０ｎｍのＩＴＯ微粒子（Ｉｎ
2 Ｏ3 ／ＳｎＯ2 比は９５／５重量比）５ｇを、イソプ
ロピルアルコール９４ｇにアセチルアセトン１ｇを添加
した溶媒に均一に分散し、ＩＴＯ微粒子溶液とした。1. Preparation of ITO fine particle solution Volume resistance value (measured value under pressure of 100 kg / cm) 10 -2 Ω
cm, the average primary particle diameter is 20 nm.
5 g of a 2 O 3 / SnO 2 ratio (weight ratio: 95/5) was uniformly dispersed in a solvent obtained by adding 1 g of acetylacetone to 94 g of isopropyl alcohol to obtain an ITO fine particle solution.
【００２２】２．膜形成方法 上述のように調製したＩＴＯ微粒子溶液を、石英ウエハ
（（株）信越化学製）上に、スピンコーティング法によ
り５００ｒｐｍで５秒間、その後１５００ｒｐｍで１５
秒間の条件で、塗布した。これを循環式クリーンオーブ
ンにて１２０℃、３０分の条件で予備乾燥した。2. Film forming method The ITO fine particle solution prepared as described above was spin-coated on a quartz wafer (manufactured by Shin-Etsu Chemical Co., Ltd.) at 500 rpm for 5 seconds, and then at 1500 rpm for 15 seconds.
The coating was performed under the condition of seconds. This was preliminarily dried in a circulating clean oven at 120 ° C. for 30 minutes.
【００２３】〔実施例１〕予備乾燥後に、エキシマレー
ザ（ラムダフィジックス社製）にて、波長３０８ｎｍ、
照射エネルギー密度２００ｍＪ／ｃｍ2 の紫外線を膜に
照射した。照射パルス数は１パルスである。以上のよう
にして、膜厚約１５００Åの透明膜を得た。Example 1 After pre-drying, a wavelength of 308 nm was measured with an excimer laser (manufactured by Lambda Physics).
The film was irradiated with ultraviolet light having an irradiation energy density of 200 mJ / cm 2 . The number of irradiation pulses is one pulse. As described above, a transparent film having a thickness of about 1500 ° was obtained.
【００２４】〔実施例２〕予備乾燥後に、４倍高調波Ｙ
ＡＧレーザ（Ｐｈｏｔｏｎｉｃｓ Ｉｎｄｕｓｔｒｉｅ
ｓ Ｉｎｔｅｒｎａｔｉｏｎａｌ社製）にて、波長２６
６ｎｍ、照射エネルギー密度２０ｍＪ／ｃｍ2 の紫外線
を膜に照射した。照射パルス数は１００パルスである。
以上のようにして、膜厚約１５００Åの透明膜を得た。Example 2 After preliminary drying, the fourth harmonic Y
AG Laser (Photonics Industry)
s International, Inc.)
The film was irradiated with ultraviolet rays having an irradiation energy density of 6 nm and an irradiation energy density of 20 mJ / cm 2 . The number of irradiation pulses is 100 pulses.
As described above, a transparent film having a thickness of about 1500 ° was obtained.
【００２５】〔実施例３〕予備乾燥後に、電子線照射装
置Ｃｕｒｅｔｒｏｎ（日新ハイボルテージ社製）にて、
線量１００Ｍｒａｄの電子線を膜に照射した。以上のよ
うにして、膜厚約１５００Åの透明膜を得た。[Example 3] After preliminary drying, an electron beam irradiation apparatus Curetron (manufactured by Nissin High Voltage) was used.
The film was irradiated with an electron beam at a dose of 100 Mrad. As described above, a transparent film having a thickness of about 1500 ° was obtained.
【００２６】〔比較例〕前記実施例において、各活性エ
ネルギー線による照射工程を除いた点以外は、前記実施
例の１．ＩＴＯ微粒子溶液の調製および２．膜形成方法
と同一にして膜を形成した。[Comparative Example] The same procedure as in Example 1 was applied except that the irradiation step with each active energy ray was omitted. 1. Preparation of ITO fine particle solution and A film was formed in the same manner as the film forming method.
【００２７】３．日射遮蔽膜の評価 上述のようにして得られた前記各実施例及び比較例の日
射遮蔽膜について評価を行った。その際に、形成された
膜の３４０〜１８００ｎｍの分光透過率を測定し、ＪＩ
ＳＲ３１０６に従って日射透過率を算出した。その結果
を、下記の表１に示す。各実施例により得られた透明膜
の比抵抗はいずれも、１０-2Ωｃｍの値を示した。3. Evaluation of solar shading film The solar shading films of each of the above-mentioned Examples and Comparative Examples obtained as described above were evaluated. At that time, the spectral transmittance of the formed film at 340 to 1800 nm was measured,
The solar transmittance was calculated according to SR3106. The results are shown in Table 1 below. The specific resistance of each of the transparent films obtained in each example showed a value of 10 −2 Ωcm.
【００２８】[0028]
【表１】 [Table 1]
【００２９】[0029]
【発明の効果】本発明の製造方法による日射遮蔽膜は、
無機微粒子分散溶液を塗布する方法でありながら、活性
エネルギー線を照射することにより実用上充分な日射遮
蔽性を有することができる。すなわち、活性エネルギー
線照射により、導電性を低下させている残留有機物の除
去や、微粒子同士のつながりができ、膜の日射遮蔽性
が、無機微粒子が本来持ち合わせている特性に近づく。
従って、本発明によれば比較的低温度の膜形成でも優れ
た日射遮蔽性を示し、大面積の塗布形成が可能であり、
量産性・コスト面で優れた日射遮蔽膜を得ることができ
る。The solar shading film according to the manufacturing method of the present invention is
Irradiation with an active energy ray can provide practically sufficient solar shading even though the method is a method of applying an inorganic fine particle dispersion. That is, by the irradiation of the active energy ray, the residual organic substances that have reduced the conductivity are removed and the fine particles are connected to each other, and the solar light shielding property of the film approaches the characteristic originally possessed by the inorganic fine particles.
Therefore, according to the present invention, even in the formation of a film at a relatively low temperature, it shows excellent solar shading properties, and a large-area coating can be formed.
A solar shading film excellent in mass productivity and cost can be obtained.
Claims (6)
布し、この塗布膜に活性エネルギー線を照射することを
特徴とする日射遮蔽膜の製造方法。1. A method for producing a solar shading film, comprising applying a solution containing inorganic fine particles onto a substrate and irradiating the applied film with active energy rays.
０ｎｍの酸化物微粒子である請求項１記載の日射遮蔽膜
の製造方法。2. The method according to claim 1, wherein the inorganic fine particles have a particle diameter of 1 nm to 50 nm.
The method for producing a solar shading film according to claim 1, wherein the fine particles are 0 nm oxide fine particles.
物、アルミニウム亜鉛酸化物、酸化亜鉛、酸化チタン微
粒子および酸化セリウムから選ばれた１種類以上である
請求項２記載の日射遮蔽膜の製造方法。3. The method for producing a solar shading film according to claim 2, wherein said oxide fine particles are at least one selected from indium tin oxide, aluminum zinc oxide, zinc oxide, titanium oxide fine particles and cerium oxide. .
４００ｎｍの電磁波である請求項１、２または３記載の
日射遮蔽膜の製造方法。4. The method according to claim 1, wherein the active energy ray has a wavelength of 1 nm or more.
The method for producing a solar shading film according to claim 1, 2 or 3, which is an electromagnetic wave of 400 nm.
ー密度１〜１０００ｍＪ／ｃｍ2 の紫外線レーザ、照射
エネルギー密度１〜１０００ｍＪ／ｃｍ2 のエキシマレ
ーザ、照射エネルギー密度１〜１０００ｍＪ／ｃｍ2 の
高調波発生ＹＡＧレーザ、および線量１０〜１０００Ｍ
ｒａｄの電子線から選ばれたものである請求項１、２、
３または４記載の日射遮蔽膜の製造方法。Wherein said active energy rays, ultraviolet laser irradiation energy density 1~1000mJ / cm 2, the excimer laser irradiation energy density 1~1000mJ / cm 2, harmonic generation of the irradiation energy density 1~1000mJ / cm 2 YAG laser and dose 10-1000M
3. The method according to claim 1, wherein the rad electron beam is selected from the group consisting of:
5. The method for producing a solar shading film according to 3 or 4.
射遮蔽膜の製造方法により得られた日射遮蔽膜。6. A solar shading film obtained by the method for producing a solar shading film according to claim 1, 2, 3, 4, or 5.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10043298A JPH11276992A (en) | 1998-03-27 | 1998-03-27 | Solar radiation shielding film and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10043298A JPH11276992A (en) | 1998-03-27 | 1998-03-27 | Solar radiation shielding film and its production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH11276992A true JPH11276992A (en) | 1999-10-12 |
Family
ID=14273799
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10043298A Pending JPH11276992A (en) | 1998-03-27 | 1998-03-27 | Solar radiation shielding film and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH11276992A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014518589A (en) * | 2011-04-12 | 2014-07-31 | ダイパワー | Sintering method for metal oxide compounds |
| CN113667375A (en) * | 2021-07-30 | 2021-11-19 | 哈尔滨工业大学 | Nano rare earth oxide composite powder for shielding neutrons and gamma rays, composite material thereof and preparation method thereof |
-
1998
- 1998-03-27 JP JP10043298A patent/JPH11276992A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014518589A (en) * | 2011-04-12 | 2014-07-31 | ダイパワー | Sintering method for metal oxide compounds |
| CN113667375A (en) * | 2021-07-30 | 2021-11-19 | 哈尔滨工业大学 | Nano rare earth oxide composite powder for shielding neutrons and gamma rays, composite material thereof and preparation method thereof |
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