JPH11219884A - Structure of size converting jig for exposure mask of projection aligner - Google Patents

Structure of size converting jig for exposure mask of projection aligner

Info

Publication number
JPH11219884A
JPH11219884A JP10021817A JP2181798A JPH11219884A JP H11219884 A JPH11219884 A JP H11219884A JP 10021817 A JP10021817 A JP 10021817A JP 2181798 A JP2181798 A JP 2181798A JP H11219884 A JPH11219884 A JP H11219884A
Authority
JP
Japan
Prior art keywords
exposure mask
plate
hole
sized
size
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10021817A
Other languages
Japanese (ja)
Other versions
JP3912884B2 (en
Inventor
Hirokazu Asahara
浩和 浅原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm Co Ltd
Original Assignee
Rohm Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm Co Ltd filed Critical Rohm Co Ltd
Priority to JP02181798A priority Critical patent/JP3912884B2/en
Publication of JPH11219884A publication Critical patent/JPH11219884A/en
Application granted granted Critical
Publication of JP3912884B2 publication Critical patent/JP3912884B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PROBLEM TO BE SOLVED: To improve the workability of a projection aligner which uses large- sized exposure masks and makes a plurality of exposure masks effectively usable, so as to reduce the cost of the masks by constituting the aligner such that the aligner uses small-sized exposure masks. SOLUTION: A through-hole 3 having the same size as that of a small-sized exposure mask 2 is drilled through a platy body 1 which is formed in matching with the size of a large-sized exposure mask. In addition, receiving pieces 4 which protrude into the hole 3 are provided on the lower surface side of the platy body 1 by making the upper surfaces of the pieces 4 to be flush with the lower surface of the platy body 1 so that the small-sized mask 2 can be put in the hole 3 in a removable state.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、半導体装置又は液
晶表示装置の製造に際しその半導体ウエハー等の基板に
表面に対し露光マスク(レチクル)を使用して各種のパ
ターンを投影露光するようにした投影露光装置におい
て、この投影露光装置に対して、大きさ及び厚さの異な
る各種の露光マスクを使用できるようにした治具の構造
に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a projection apparatus in which a semiconductor device or a liquid crystal display device is manufactured by projecting and exposing various patterns on a surface of a substrate such as a semiconductor wafer by using an exposure mask (reticle). In an exposure apparatus, the present invention relates to a jig structure in which various types of exposure masks having different sizes and thicknesses can be used for the projection exposure apparatus.

【0002】[0002]

【従来の技術と発明が解決しようとする課題】一般に、
半導体装置の製造に際しその半導体ウエハーに対して各
種のパターンを投影露光するために使用する露光マスク
には、半導体ウエハーの大きさに合わせて、一辺寸法が
大きい(例えば、6インチ)正方形にした大きいサイズ
の露光マスクと、一辺寸法が小さい(例えば、5イン
チ)正方形にした小さいサイズの露光マスクとがあり、
更に、前記各サイズの露光マスクには、その厚さを厚く
(例えば、0.25インチ)した厚型の露光マスクと、
厚さを薄く(例えば、0.09インチ)した薄型の露光
マスクとが存在する。
2. Description of the Related Art In general,
2. Description of the Related Art An exposure mask used for projecting and exposing various patterns on a semiconductor wafer in the manufacture of a semiconductor device includes a large square having a large side (for example, 6 inches) in accordance with the size of the semiconductor wafer. There is an exposure mask of a size and an exposure mask of a small size made into a square having a small side dimension (for example, 5 inches).
Further, the exposure mask of each size includes a thick exposure mask whose thickness is increased (for example, 0.25 inch);
There is a thin exposure mask whose thickness is reduced (for example, 0.09 inches).

【0003】しかし、前記投影露光装置は、例えば、特
開平7−29802号公報等に記載されているように、
下面にパターン膜が形成されている露光マスク(レチク
ル)を、投影露光装置における露光マスクホルダに対し
て、当該露光マスクの下面の周囲が当該露光マスクホル
ダの上面に密接するようにして装着するように構成して
おり、従来における投影露光装置では、一つのサイズ
で、且つ、一つの厚さの露光マスクしか使用することが
できないように構成していることにより、大きいサイズ
の露光マスクを使用する投影露光装置に対して、小さい
サイズの露光マスクを使用することができないから、不
便で、作業性が低いばかりか、複数種類の露光マスクを
有効に利用できず、このために、投影露光に要するコス
トが可成りアップすると言う問題があった。
However, the projection exposure apparatus is disclosed in, for example, Japanese Patent Application Laid-Open No. 7-29802.
An exposure mask (reticle) having a pattern film formed on the lower surface is mounted on an exposure mask holder in a projection exposure apparatus such that the periphery of the lower surface of the exposure mask is in close contact with the upper surface of the exposure mask holder. The conventional projection exposure apparatus uses a large-sized exposure mask because it is configured to be able to use only one size and one-thickness exposure mask. Since a small-sized exposure mask cannot be used for a projection exposure apparatus, it is inconvenient, not only low in workability, but also a plurality of types of exposure masks cannot be effectively used. There was a problem that the cost was considerably increased.

【0004】本発明は、大きいサイズの露光マスクを使
用する投影露光装置に、小さいサイズの露光マスクをそ
のまま使用できるようにした治具を提供することによ
り、前記した問題を解消することを技術的課題とするも
のである。
The present invention solves the above-mentioned problem by providing a jig in which a small-sized exposure mask can be used as it is in a projection exposure apparatus using a large-sized exposure mask. It is an issue.

【0005】[0005]

【発明が解決しようとする課題】この技術的課題を達成
するため本発明は、「一辺寸法を、一辺寸法を大きくし
た大きいサイズの露光マスクに合わせて正方形に形成し
た板状体を備え、この板状体に、一辺寸法を前記大きい
サイズの露光マスクにおける一辺寸法よりも小さくした
小さいサイズの露光マスクが着脱自在に嵌まる正方形の
貫通孔を穿設する一方、前記板状体の下面側に、その貫
通孔内に嵌めた小さいサイズの露光マスクに対する受け
片を、当該受け片における上面を前記板状体の下面と同
一平面にして設ける。」と言う構成にした。
SUMMARY OF THE INVENTION In order to achieve the technical object, the present invention provides a plate-like member having a square shape in which one side is formed in accordance with a large-sized exposure mask having a large side. A plate-shaped body is provided with a square through-hole in which a small-sized exposure mask whose one side dimension is smaller than the one-sided dimension in the large-sized exposure mask is removably fitted, while a lower surface side of the plate-shaped body is provided. The receiving piece for the small-sized exposure mask fitted in the through hole is provided with the upper surface of the receiving piece being flush with the lower surface of the plate-shaped body. "

【0006】[0006]

【発明の作用・効果】このような構成において、板状体
における貫通孔内に、小さいサイズの露光マスクを嵌め
込むことで、この小さいサイズの露光マスクは、前記板
状体に対して、当該小さいサイズの露光マスクにおける
表裏両面のうちパターン膜が形成されている下面が前記
板状体の下面と同一平面になるように、換言すると、当
該小さいサイズの露光マスクにおけるパターン膜を板状
体における下面と同一平面に揃えた状態にして装着でき
る。
In such a configuration, a small-sized exposure mask is fitted into the through-hole in the plate-shaped body, so that the small-sized exposure mask is The pattern film of the small-sized exposure mask is formed on the plate-like body so that the lower surface on which the pattern film is formed on the front and back surfaces of the small-size exposure mask is flush with the lower surface of the plate-like body. It can be mounted on the same plane as the lower surface.

【0007】一方、前記板状体は、その一辺の寸法を大
きいサイズの露光マスクに合わせた正方形に形成されて
いるから、この板状体を、投影露光装置に対し、当該板
状体の下面の周囲の部分が投影露光装置における露光マ
スクホルダの上面に接当するように装着することによ
り、この大きいサイズの露光マスクを使用する投影露光
装置に対して、前記した小さいサイズの露光マスクを、
前記板状体を介して、当該小さいサイズの露光マスクの
下面におけるパターン膜を、露光マスクホルダの上面と
同一高さに正確に揃えた状態にして確実に装着できるの
である。
On the other hand, since the plate-like body is formed in a square with one side dimension corresponding to a large-sized exposure mask, the plate-like body is transferred to a projection exposure apparatus by a lower surface of the plate-like body. By mounting the peripheral portion of the exposure so as to contact the upper surface of the exposure mask holder in the projection exposure apparatus, for the projection exposure apparatus using this large size exposure mask, the small size exposure mask,
Through the plate-like body, the pattern film on the lower surface of the small-sized exposure mask can be securely mounted in a state where it is precisely aligned with the upper surface of the exposure mask holder at the same height.

【0008】また、厚型の露光マスクであっても、薄型
の露光マスクであっても、前記と同様に、大きいサイズ
の露光マスクを使用する投影露光装置に対して、板状体
を介して確実に装着できるのである。従って、本発明に
よると、大きいサイズの露光マスクを使用する投影露光
装置に対して、小さいサイズの薄型露光マスク、及び、
小さいサイズの厚型露光マスクを、当該投影露光装置に
通常適用される大きいサイズの露光マスクと同じように
して使用することができるから、不便さを解消できて作
業性を向上できると共に、複数種類の露光マスクを有効
に利用できて、投影露光に要するコストの低減を達成で
きる効果を有する。
[0008] Further, whether a thick or thin exposure mask is used, a projection exposure apparatus using a large-sized exposure mask is interposed through a plate-like body as described above. It can be securely attached. Therefore, according to the present invention, for a projection exposure apparatus using a large-sized exposure mask, a small-sized thin exposure mask, and
Since a small-sized thick exposure mask can be used in the same manner as a large-sized exposure mask usually applied to the projection exposure apparatus, inconvenience can be eliminated, workability can be improved, and a plurality of types of exposure masks can be used. Has the effect that the cost of projection exposure can be reduced.

【0009】また、前記板状体に穿設する貫通孔を、当
該貫通孔が板状体における一つの側面に開口するように
構成することにより、前記板状体を、投影露光装置に対
して装着した状態のもとで、この板状体に対して小さい
サイズの露光マスクを着脱自在に装着することができる
から、その作業性をより向上できる利点を有する。
[0009] Further, by forming the through-hole formed in the plate-shaped body such that the through-hole is opened on one side surface of the plate-shaped body, the plate-shaped body can be moved with respect to the projection exposure apparatus. Since the exposure mask of a small size can be detachably attached to the plate-like body in the attached state, there is an advantage that the workability can be further improved.

【0010】[0010]

【発明の実施の形態】以下、本発明の実施の形態を、図
1及び図2の図面について説明する。この図において、
符号1は、アルミニウム等のの金属板製の板状体示し、
この板状体1は、その厚さ寸法Tを0.25インチ(T
=6.35mm)で、一辺の寸法Aを6インチ(A=1
52.4mm)にした正方形に形成することにより、6
インチサイズ、つまり、大きいサイズの露光マスク(レ
チクル)を使用する投影露光装置に対して適用できるよ
うに構成されている。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to FIGS. In this figure,
Reference numeral 1 denotes a plate made of a metal plate such as aluminum.
The plate 1 has a thickness T of 0.25 inch (T
= 6.35 mm) and the dimension A of one side is 6 inches (A = 1
52.4 mm) to form a square.
It is configured to be applicable to a projection exposure apparatus using an exposure mask (reticle) of an inch size, that is, a large size.

【0011】また、符号2は、厚さ寸法T1を0.09
インチ(T1=2.286mm)で、一辺の寸法Bを5
インチ(B=127mm)の正方形にした5インチサイ
ズ、つまり、小さいサイズの薄型露光マスク(レチク
ル)を示し、この露光マスク2の下面に、パターン膜が
形成れている。そして、前記板状体1に、前記小さいサ
イズの薄型露光マスク2が着脱自在に嵌まる貫通孔3
を、当該貫通孔3が前記板状体1における一つの側面1
aに対して開口するように穿設する一方、前記板状体1
の下面1bに、前記貫通孔3における三つの内側面3
a,3b,3cの各々から内向きに突出する受け片4
を、当該受け片4における上面4aが前記板状体1の下
面1bと同一平面になるようにして設けるのである。な
お、この受け片4は、貫通孔3における三つの内側面3
a,3b,3cの全体にわたって連続するように形態に
構成しても良い。
Reference numeral 2 denotes a thickness T1 of 0.09.
Inches (T1 = 2.286 mm), the dimension B on one side is 5
A thin exposure mask (reticle) of a 5-inch size, that is, a small size of an inch (B = 127 mm) square, is shown. A pattern film is formed on the lower surface of the exposure mask 2. A through hole 3 into which the small-sized thin exposure mask 2 is detachably fitted in the plate-like body 1.
The through hole 3 is one side surface 1 of the plate-like body 1.
a while the plate-like body 1
Three inner side surfaces 3 in the through hole 3
a, receiving piece 4 projecting inward from each of 3b, 3c
Is provided such that the upper surface 4a of the receiving piece 4 is flush with the lower surface 1b of the plate-like body 1. In addition, this receiving piece 4 has three inner side surfaces 3 in the through hole 3.
a, 3b, and 3c may be configured to be continuous over the entirety.

【0012】この構成において、前記板状体1における
貫通孔3内に、前記5インチサイズの薄型露光マスク2
を嵌め込むことで、この5インチサイズの薄型露光マス
ク2は、前記板状体1に対して、当該露光マスク2にお
ける表裏両面のうちパターン膜が形成されている下面が
前記板状体1の下面1bと同一平面になるように、換言
すると、当該露光マスク2におけるパターン膜を板状体
1における下面1bの同一平面になるように正確に揃え
た状態にして確実に装着されることになる。
In this configuration, the thin exposure mask 2 of 5 inch size is provided in the through hole 3 of the plate-like body 1.
The thin exposure mask 2 having a size of 5 inches has a lower surface on which a pattern film is formed on the front and back surfaces of the exposure mask 2. The pattern film on the exposure mask 2 is precisely aligned so as to be flush with the lower surface 1b of the plate-like body 1 so as to be surely mounted so as to be flush with the lower surface 1b. .

【0013】この場合において、前記板状体1は、その
厚さ寸法T及び一辺の寸法Aを6インチサイズの露光マ
スクに合わせたものに構成されているから、この板状体
1を、6インチサイズの露光マスクを使用する投影露光
装置に対して、当該板状体1の下面の周囲の部分が投影
露光装置における露光マスクホルダの上面に接当するよ
うに装着することにより、この6インチサイズの露光マ
スクを使用する投影露光装置に対して、前記した5イン
チサイズの露光マスク2を、前記板状体1を介して、当
該5インチサイズの露光マスク2の下面におけるパター
ン膜を、露光マスクホルダの上面と同一高さに揃えた状
態にして確実に装着できるのである。
In this case, since the plate-like body 1 is configured so that its thickness dimension T and one side dimension A are adapted to a 6-inch size exposure mask, this plate-like body 1 is The projection exposure apparatus using an inch-size exposure mask is mounted so that a portion around the lower surface of the plate-shaped body 1 comes into contact with the upper surface of the exposure mask holder in the projection exposure apparatus, thereby forming a 6-inch projection exposure apparatus. The above-mentioned 5-inch size exposure mask 2 is exposed to the pattern film on the lower surface of the 5-inch size exposure mask 2 through the plate-like body 1 with respect to a projection exposure apparatus using a size exposure mask. Thus, the mask holder can be securely mounted with the same height as the upper surface of the mask holder.

【0014】また、前記板状体1に対して、前記5イン
チサイズの薄型露光マスク2を装着することに代えて、
5インチサイズで厚さを0.25インチと言うように厚
くした厚型露光マスクを装着することもできるのであ
る。なお、前記板状体1における上面の三箇所には、こ
れを投影露光装置に装着したときにおける位置合わせの
ためのアライメントマーク5が設けられる。
Further, instead of mounting the 5-inch thin exposure mask 2 on the plate 1,
It is also possible to mount a thick exposure mask having a thickness of 5 inches and a thickness of 0.25 inches. Note that alignment marks 5 are provided at three places on the upper surface of the plate-like body 1 for alignment when the plate-like body 1 is mounted on a projection exposure apparatus.

【0015】また、この板状体1の全表面、特に、下面
1bには、露光光線の反射を防ぐための表面処理(例え
ば、酸化クロム層の形成とか、黒色塗料の塗布等)が施
されている。更にまた、前記板状体1における貫通孔3
は、板状体1における一つの側面に開口することによ
り、前記板状体1を、投影露光装置に対して装着した状
態のもとで、この板状体1に対して5インチサイズの露
光マスク2を着脱自在に装着することができるように構
成されている。なお、このように構成する場合には、前
記板状体1のうち貫通孔3が開口する一つの側面1a
に、開閉片6を設けることにより、露光マスク2を貫通
孔3内に嵌めた状態に保持するように構成されている。
The entire surface of the plate 1, particularly the lower surface 1 b, is subjected to a surface treatment (for example, formation of a chromium oxide layer, application of a black paint, etc.) to prevent reflection of exposure light. ing. Furthermore, the through holes 3 in the plate 1
Is an opening on one side surface of the plate-like body 1 so that the plate-like body 1 can be exposed to a 5-inch size light with the plate-like body 1 attached to a projection exposure apparatus. The mask 2 is configured to be detachably mounted. In addition, in the case of such a configuration, one side surface 1a of the plate-like body 1 in which the through hole 3 is opened.
In addition, by providing the opening / closing piece 6, the exposure mask 2 is configured to be held in a state fitted in the through hole 3.

【0016】また、図3に示す別の実施の形態のよう
に、前記板状体1のうち貫通孔3が開口する一つの側面
1aに開閉片6を設けて、この開閉片6により露光マス
ク2を貫通孔3における奥の内側面3bに対して密着す
るように押圧するように構成することに加えて、貫通孔
3における一つの内側面3aに、板ばね7等の押圧付勢
手段を設けて、この押圧付勢手段により露光マスク2を
貫通孔3における別の内側面3cに対して密着するよう
に押圧するように構成することにより、前記露光マスク
2を、板状体1に対して正確に位置決めすることができ
るのである。
Further, as in another embodiment shown in FIG. 3, an opening / closing piece 6 is provided on one side surface 1a of the plate-like body 1 where the through hole 3 is opened. 2 is pressed so as to be in close contact with the inner surface 3b at the back of the through hole 3, and a pressing urging means such as a leaf spring 7 is applied to one inner surface 3a of the through hole 3. The exposure mask 2 is pressed against the plate-like body 1 by pressing and pressing the exposure mask 2 against another inner side surface 3 c of the through hole 3 by this pressing urging means. Position can be accurately determined.

【0017】更にまた、前記貫通孔3における二つの内
側面3a,3cのうちいずれか一方又は両方に、複数個
のコロ又はボールを回転自在に設けることにより、前記
貫通孔3内への露光マスク2の着脱を容易にすることが
できるのである。
Furthermore, a plurality of rollers or balls are rotatably provided on one or both of the two inner side surfaces 3a and 3c of the through hole 3, so that an exposure mask into the through hole 3 is provided. 2 can be easily attached and detached.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施の形態を示す斜視図である。FIG. 1 is a perspective view showing an embodiment of the present invention.

【図2】図1のII−II視拡大側面図である。FIG. 2 is an enlarged side view taken along the line II-II of FIG.

【図3】本発明の別の形態を示す斜視図である。FIG. 3 is a perspective view showing another embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 板状体 2 5インチサイズ(小さいサイ
ズ)の露光マスク 3 貫通孔 4 受け片 5 アライメントマーク 6 開閉片 7 板ばね
DESCRIPTION OF SYMBOLS 1 Plate-shaped body 2 Exposure mask of 5 inch size (small size) 3 Through hole 4 Receiving piece 5 Alignment mark 6 Opening / closing piece 7 Leaf spring

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】一辺寸法を、一辺寸法を大きくした大きい
サイズの露光マスクに合わせて正方形に形成した板状体
を備え、この板状体に、一辺寸法を前記大きいサイズの
露光マスクにおける一辺寸法よりも小さくした小さいサ
イズの露光マスクが着脱自在に嵌まる正方形の貫通孔を
穿設する一方、前記板状体の下面側に、その貫通孔内に
嵌めた小さいサイズの露光マスクに対する受け片を、当
該受け片における上面を前記板状体の下面と同一平面に
して設けたことを特徴とする投影露光装置における露光
マスクサイズ変換用治具の構造。
1. A plate-like body having one side dimension formed in a square shape in accordance with a large-sized exposure mask having a large side dimension, and one side dimension of the plate-shaped body in the large-size exposure mask is provided. While a smaller through-hole is provided with a square through-hole in which a smaller-sized exposure mask is detachably fitted, a receiving piece for the smaller-size exposure mask fitted in the through-hole is provided on the lower surface side of the plate-like body. An exposure mask size conversion jig in the projection exposure apparatus, wherein an upper surface of the receiving piece is provided on the same plane as a lower surface of the plate-like body.
【請求項2】前記請求項1において、前記貫通孔を、当
該貫通孔が前記板状体における一つの辺の側面に開口す
るように構成したことを特徴とする投影露光装置におけ
る露光マスクサイズ変換用治具の構造。
2. The exposure mask size conversion in a projection exposure apparatus according to claim 1, wherein said through-hole is formed so as to open on a side surface of one side of said plate-like body. Jig structure.
JP02181798A 1998-02-03 1998-02-03 Structure of jig for exposure mask size conversion in projection exposure equipment Expired - Fee Related JP3912884B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP02181798A JP3912884B2 (en) 1998-02-03 1998-02-03 Structure of jig for exposure mask size conversion in projection exposure equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP02181798A JP3912884B2 (en) 1998-02-03 1998-02-03 Structure of jig for exposure mask size conversion in projection exposure equipment

Publications (2)

Publication Number Publication Date
JPH11219884A true JPH11219884A (en) 1999-08-10
JP3912884B2 JP3912884B2 (en) 2007-05-09

Family

ID=12065622

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP3912884B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007164047A (en) * 2005-12-16 2007-06-28 Advanced Color Tec Kk Photomask
JP2009157095A (en) * 2007-12-26 2009-07-16 Nsk Ltd Proximity exposure apparatus and mask adaptor for proximity exposure apparatus
JP2011013196A (en) * 2009-07-06 2011-01-20 Hitachi High-Technologies Corp Scanning electron microscope
WO2020162396A1 (en) * 2019-02-06 2020-08-13 株式会社ニコン Mask adapter, mask adapter attachment tool, exposure device, and device production method

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007164047A (en) * 2005-12-16 2007-06-28 Advanced Color Tec Kk Photomask
JP2009157095A (en) * 2007-12-26 2009-07-16 Nsk Ltd Proximity exposure apparatus and mask adaptor for proximity exposure apparatus
JP2011013196A (en) * 2009-07-06 2011-01-20 Hitachi High-Technologies Corp Scanning electron microscope
WO2020162396A1 (en) * 2019-02-06 2020-08-13 株式会社ニコン Mask adapter, mask adapter attachment tool, exposure device, and device production method
JPWO2020162396A1 (en) * 2019-02-06 2021-12-02 株式会社ニコン Mask adapters, mask adapter mounting tools, exposure equipment, and device manufacturing methods

Also Published As

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