JPH109829A - Measuring method of film thickness of multilayer thin film and method and equipment for manufacturing optical information recording medium which use the method - Google Patents
Measuring method of film thickness of multilayer thin film and method and equipment for manufacturing optical information recording medium which use the methodInfo
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- JPH109829A JPH109829A JP16602696A JP16602696A JPH109829A JP H109829 A JPH109829 A JP H109829A JP 16602696 A JP16602696 A JP 16602696A JP 16602696 A JP16602696 A JP 16602696A JP H109829 A JPH109829 A JP H109829A
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- film
- spectral reflectance
- thin film
- difference
- substrate
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Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、基板上に設けられ
たそれぞれ光学定数の異なる複数の薄膜からなる多層薄
膜の膜厚測定方法及びその膜厚測定方法を用いた光学情
報記録媒体の製造方法及び光学情報記録媒体の製造装置
に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for measuring the thickness of a multilayer thin film comprising a plurality of thin films provided on a substrate and having different optical constants, and a method for manufacturing an optical information recording medium using the method. And an optical information recording medium manufacturing apparatus.
【０００２】[0002]
【従来の技術】大容量で高密度なメモリーとして、書換
えが可能な消去型と呼ばれる光学情報記録媒体の開発が
進められている。この消去型の光学情報記録媒体の一つ
として、アモルファス状態と結晶状態の間で相変化する
薄膜を記録層として用い、レーザー光の照射による熱エ
ネルギーによって情報の記録及び消去を行うものがあ
る。2. Description of the Related Art A rewritable optical information recording medium called a erasable type has been developed as a large-capacity, high-density memory. As one of the erasable optical information recording media, there is a type that uses a thin film that changes phase between an amorphous state and a crystalline state as a recording layer, and performs recording and erasing of information by thermal energy by laser light irradiation.
【０００３】この記録層用の相変化材料としては、Ｇ
ｅ，Ｓｂ，Ｔｅ，Ｉｎ等を主成分とする、例えばＧｅＳ
ｂＴｅ，ＧｅＳｂＴｅＳｅ，ＩｎＳｂ，ＩｎＳｂＴｅ，
ＩｎＳｂＴｅＡｇ等の合金膜が一般的に知られている。
一般的に、情報の記録は記録層の部分的なアモルファス
化によってマークを形成して行い、消去はこのアモルフ
ァスマークの結晶化によって行う。アモルファス化は記
録層を融点以上に加熱した後に一定値以上の速さで冷却
することによって行われる。また、結晶化は記録層を結
晶化温度以上、融点以下の温度に加熱することによって
行われる。As a phase change material for this recording layer, G
e, Sb, Te, In or the like as a main component, for example, GeS
bTe, GeSbTeSe, InSb, InSbTe,
An alloy film such as InSbTeAg is generally known.
Generally, information is recorded by forming a mark by partially amorphizing the recording layer, and erasing is performed by crystallization of the amorphous mark. Amorphization is performed by heating the recording layer to a temperature equal to or higher than the melting point and then cooling the recording layer at a speed equal to or higher than a predetermined value. The crystallization is performed by heating the recording layer to a temperature higher than the crystallization temperature and lower than the melting point.
【０００４】さらに、一般的には、記録層の上下に誘電
体層を設けられている。誘電体層の第１の目的は、瞬間
的に融点以上に昇温する記録層の熱から基板を保護する
とともに記録層の変形や破損を防止することである。ま
た、第２の目的は、光干渉効果により記録情報の再生時
に十分な信号強度を得ることである。さらに、第３の目
的は、記録時に良好な形状のアモルファスマークを形成
するのに適した冷却速度を実現することである。そのた
め、誘電体材料としては、十分な耐熱性、大きな屈折
率、適度な熱伝導率等の特性が要求される。これらの条
件を満たす材料として、例えばＺｎＳ−ＳｉＯ2があ
る。Further, generally, a dielectric layer is provided above and below a recording layer. The first purpose of the dielectric layer is to protect the substrate from the heat of the recording layer, which instantaneously rises to a temperature higher than its melting point, and to prevent deformation and breakage of the recording layer. A second object is to obtain a sufficient signal strength at the time of reproducing recorded information by the optical interference effect. Further, a third object is to realize a cooling rate suitable for forming an amorphous mark having a good shape during recording. Therefore, characteristics such as sufficient heat resistance, a large refractive index, and an appropriate thermal conductivity are required for the dielectric material. As these conditions are satisfied materials, for example, a ZnS-SiO 2.
【０００５】一般的な消去型の光学情報記録媒体１０の
断面構成を図２に示す。透明基板１は中心孔９及び複数
の環状の案内溝２を有する円盤状である。透明基板１上
には順に、ＺｎＳ−ＳｉＯ2薄膜からなる膜厚約１５０
ｎｍの下引層３、ＧｅＳｂＴｅ合金薄膜からなる膜厚約
２０ｎｍの記録層４、ＺｎＳ−ＳｉＯ2薄膜からなる膜
厚約４０ｎｍの上引層５、Ａｌ合金薄膜からなる膜厚約
１００ｎｍの反射層６が、スパッタリングによって形成
され、さらにその上に樹脂保護層７が設けられている。
光学情報記録媒体の記録特性は各層の膜厚に大きく依存
し、特に下引層３、記録層４及び上引層５の３層の膜厚
のばらつきによる影響が大きい。そのため、その製造に
当たっては、これら各層の膜厚を正確に管理する必要が
ある。FIG. 2 shows a sectional configuration of a general erasable optical information recording medium 10. The transparent substrate 1 has a disk shape having a center hole 9 and a plurality of annular guide grooves 2. Turn is on the transparent substrate 1, a film thickness of about 150 made of ZnS-SiO 2 thin film
3 nm, a recording layer 4 of a GeSbTe alloy thin film having a thickness of about 20 nm, an upper coating layer 5 of a ZnS—SiO 2 thin film of about 40 nm, and a reflective layer of an Al alloy thin film having a thickness of about 100 nm. 6 is formed by sputtering, and a resin protective layer 7 is further provided thereon.
The recording characteristics of the optical information recording medium greatly depend on the film thickness of each layer, and in particular, there is a large influence due to the variation in the film thickness of the three layers of the undercoat layer 3, the recording layer 4 and the overcoat layer 5. Therefore, in the manufacture thereof, it is necessary to accurately control the thickness of each of these layers.
【０００６】従来、上記光学情報記録媒体１０の主要部
分である下引層３、記録層４及び上引層５を含む薄膜層
の製膜工程において、各層の膜厚管理のために、各層毎
に所定の条件下でスパッタリングによって一定時間成膜
したサンプルを定期的に作成し、その膜厚を段差計又は
エリプソメータによって測定し、その測定結果から得ら
れた成膜速度をもとに所望の膜厚が得られるよう成膜時
間を補正する方法が採用されている。Conventionally, in the process of forming a thin film layer including the undercoat layer 3, the recording layer 4 and the overcoat layer 5, which are the main parts of the optical information recording medium 10, each layer is controlled to control its thickness. A sample formed for a certain period of time by sputtering under predetermined conditions is periodically prepared, the film thickness is measured by a step gauge or an ellipsometer, and a desired film is formed based on a film forming speed obtained from the measurement result. A method of correcting the film formation time so as to obtain a thickness is adopted.
【０００７】[0007]
【発明が解決しょうとする課題】しかしながら、上記従
来の方法によれば、光学情報記録媒体１０を構成する各
薄膜層と同数の成膜速度測定用サンプルを作成し、各層
ごとにその膜厚を測定する必要があり、工程が複雑にな
ると共に、製膜に時間を要すると言う問題点を有してい
た。また、バッチ式のスパッタリングによって成膜を行
う場合、サンプル作成のバッチでは光記録媒体を生産す
ることができず、成膜速度の測定に伴う生産ロスが大き
いという問題点を有していた。さらに、サンプル作成の
ために一時的に製造条件を変える必要があり、各サンプ
ルを段差計やエリプソメータでの測定に適した膜厚で成
膜するため、実際の媒体の構造とは異なる膜厚で成膜速
度を算出することになり、誤差を伴うという問題点を有
していた。However, according to the above-mentioned conventional method, the same number of thin film layers as the number of thin film layers constituting the optical information recording medium 10 are prepared, and the number of samples for measuring the film thickness is determined for each layer. The measurement has to be performed, and the process is complicated, and there is a problem that it takes time to form a film. Further, when film formation is performed by batch-type sputtering, an optical recording medium cannot be produced in a batch for preparing a sample, and there is a problem that a production loss accompanying measurement of a film formation speed is large. Furthermore, it is necessary to temporarily change the manufacturing conditions for sample preparation.Because each sample is formed with a film thickness suitable for measurement with a step gauge or ellipsometer, a film thickness different from the actual medium structure is used. Calculating the film formation rate has a problem that an error is involved.
【０００８】本発明は上記従来例の問題点を解決するた
めになされたものであり、１回の測定で複数の薄膜層の
膜厚測定が可能な多層薄膜の膜厚測定方法、及びその膜
厚測定方法を用いて、成膜速度測定用サンプルの作成に
よる生産ロスが少なく、製造条件の一時的な変更の必要
のない光学情報記録媒体の製造方法及び光学情報記録媒
体の製造装置を提供することを目的とする。SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems of the prior art, and a method for measuring the thickness of a multilayer thin film capable of measuring the thickness of a plurality of thin film layers by one measurement, and the film. Provided are a method for manufacturing an optical information recording medium and an apparatus for manufacturing an optical information recording medium, which use a thickness measurement method, reduce production loss due to creation of a sample for measuring a film formation rate, and do not need to temporarily change manufacturing conditions. The purpose is to:
【０００９】[0009]
【課題を解決するための手段】上記目的を達成するた
め、本発明の多層薄膜の膜厚測定方法は、基板上に設け
られたそれぞれ光学定数の異なる複数の薄膜からなる多
層薄膜の膜厚測定方法であって、前記多層薄膜の分光反
射率を測定し、測定結果をあらかじめ定められた標準値
と比較し、測定結果と標準値との差異に基づいて各層の
膜厚を求める。In order to achieve the above object, a method for measuring the thickness of a multilayer thin film according to the present invention comprises a method for measuring the thickness of a multilayer thin film provided on a substrate and comprising a plurality of thin films having different optical constants. A method of measuring a spectral reflectance of the multilayer thin film, comparing a measurement result with a predetermined standard value, and obtaining a film thickness of each layer based on a difference between the measurement result and the standard value.
【００１０】上記方法において、多層薄膜の分光反射率
の測定結果から極値を検出し、その極値における反射率
及び波長の少なくともいずれか一方とその標準値との差
異に基づいて各層の膜厚を求めることが好ましい。In the above method, an extreme value is detected from the measurement result of the spectral reflectance of the multilayer thin film, and the film thickness of each layer is determined based on a difference between at least one of the reflectance and the wavelength at the extreme value and the standard value. Is preferably obtained.
【００１１】また、分光反射率の測定結果の極小値にお
ける波長とその標準値との差異に基づいて、多層薄膜の
分光反射率を測定する側から第１番目の薄膜の膜厚を求
めることが好ましい。Further, based on the difference between the wavelength at the minimum value of the measurement result of the spectral reflectance and the standard value, the thickness of the first thin film from the side where the spectral reflectance of the multilayer thin film is measured may be obtained. preferable.
【００１２】さらに、分光反射率の測定結果の複数の極
大値における反射率とそれらの標準値との差異から、多
層薄膜の分光反射率を測定する側から第２番目及び第３
番目の薄膜の膜厚を求めることが好ましい。Further, from the difference between the reflectance at a plurality of local maximum values of the measurement result of the spectral reflectance and their standard values, the second and third from the side where the spectral reflectance of the multilayer thin film is measured.
It is preferable to determine the thickness of the third thin film.
【００１３】一方、本発明の光学情報記録媒体の製造方
法は、基板上に設けられたそれぞれ光学定数の異なる複
数の薄膜からなる多層薄膜を有する光学情報記録媒体の
製造方法であって、基板又はサンプル片上に前記複数の
薄膜をそれぞれ所定の成膜速度及び成膜時間により順次
成膜する工程と、成膜後の基板又はサンプル片上の多層
薄膜の分光反射率を測定する工程と、前記分光反射率の
測定値とあらかじめ定められた分光反射率の標準値とを
比較しそれらの差異を検出する工程と、検出された差異
に応じて前記所定の成膜速度及び成膜時間の少なくとも
一方を補正する工程と、新たな基板上に前記複数の薄膜
をそれぞれ補正された成膜速度及び成膜時間により順次
成膜する工程とを備えている。On the other hand, a method of manufacturing an optical information recording medium according to the present invention is a method of manufacturing an optical information recording medium having a multilayer thin film formed of a plurality of thin films having different optical constants provided on a substrate. A step of sequentially forming the plurality of thin films on a sample piece at a predetermined film formation rate and a film formation time respectively; a step of measuring a spectral reflectance of the multilayer thin film on the substrate or the sample piece after the film formation; Comparing the measured value of the rate with a predetermined standard value of spectral reflectance and detecting a difference between them, and correcting at least one of the predetermined film forming speed and the film forming time according to the detected difference. And a step of sequentially forming the plurality of thin films on a new substrate at a corrected film forming speed and film forming time.
【００１４】また、本発明の別の光学情報記録媒体の製
造方法は、基板上に設けられたそれぞれ光学定数の異な
る複数の薄膜からなる多層薄膜を有する光学情報記録媒
体の製造方法であって、基板又は基板及びサンプル片上
に前記複数の薄膜をそれぞれ所定の成膜速度及び成膜時
間により順次成膜する工程と、成膜後の基板又はサンプ
ル片上の多層薄膜の分光反射率を測定する工程と、前記
分光反射率の測定値とあらかじめ定められた分光反射率
の標準値とを比較しそれらの差異を検出する工程と、検
出された差異に基づいて基板上に形成された多層薄膜の
良否を判定し選別する工程とを備えている。Further, another method of manufacturing an optical information recording medium according to the present invention is a method of manufacturing an optical information recording medium having a multilayer thin film provided on a substrate and including a plurality of thin films having different optical constants, A step of sequentially forming the plurality of thin films on a substrate or a substrate and a sample piece at a predetermined film forming rate and a film forming time, and a step of measuring the spectral reflectance of the multilayer thin film on the substrate or the sample piece after the film formation. A step of comparing the measured value of the spectral reflectance with a predetermined standard value of the spectral reflectance and detecting a difference therebetween, and determining whether the multilayer thin film formed on the substrate is good or bad based on the detected difference. Judging and sorting.
【００１５】上記各方法において、多層薄膜の分光反射
率の測定結果から極値を検出し、その極値における反射
率及び波長の少なくともいずれか一方とその標準値との
差異に基づいて各層の膜厚を求めることが好ましい。In each of the above methods, an extreme value is detected from the measurement result of the spectral reflectance of the multilayer thin film, and the film thickness of each layer is determined based on a difference between at least one of the reflectance and the wavelength at the extreme value and the standard value. It is preferable to determine the thickness.
【００１６】また、分光反射率の測定結果の極小値にお
ける波長とその標準値との差異に基づいて、多層薄膜の
分光反射率を測定する側から第１番目の薄膜の膜厚を求
めることが好ましい。Further, based on the difference between the wavelength at the minimum value of the measurement result of the spectral reflectance and its standard value, the thickness of the first thin film from the side where the spectral reflectance of the multilayer thin film is measured may be obtained. preferable.
【００１７】さらに、分光反射率の測定結果の複数の極
大値における反射率とそれらの標準値との差異から、多
層薄膜の分光反射率を測定する側から第２番目及び第３
番目の薄膜の膜厚を求めることが好ましい。Further, based on the difference between the reflectance at a plurality of local maxima of the measurement result of the spectral reflectance and their standard values, the second and third from the side where the spectral reflectance of the multilayer thin film is measured.
It is preferable to determine the thickness of the third thin film.
【００１８】さらに、分光反射率を測定する際の各測定
波長の間隔が１０ｎｍ以下であることが好ましい。Further, it is preferable that the interval between each measurement wavelength when measuring the spectral reflectance is 10 nm or less.
【００１９】また、本発明の光学情報記録媒体の製造装
置は、基板上に設けられたそれぞれ光学定数の異なる複
数の薄膜からなる多層薄膜を有する光学情報記録媒体の
製造装置であって、基板又はサンプル片上に前記複数の
薄膜をそれぞれ所定の成膜速度及び成膜時間により順次
成膜する手段と、成膜後の基板又はサンプル片上の多層
薄膜の分光反射率を測定する手段と、あらかじめ定めら
れた分光反射率の標準値を記憶する手段と、前記分光反
射率の測定値と前記分光反射率の標準値とを比較しその
差異を検出する手段と、検出された差異に応じて前記所
定の成膜速度及び成膜時間の少なくとも一方を補正する
手段とを備えている。Further, the apparatus for manufacturing an optical information recording medium of the present invention is an apparatus for manufacturing an optical information recording medium having a multilayer thin film provided on a substrate and comprising a plurality of thin films having different optical constants. Means for sequentially forming the plurality of thin films on the sample piece at a predetermined film forming rate and film forming time, means for measuring the spectral reflectance of the multilayer thin film on the substrate or sample piece after film formation, and Means for storing a standard value of the measured spectral reflectance, means for comparing the measured value of the spectral reflectance with the standard value of the spectral reflectance and detecting a difference between the measured values, and the predetermined value according to the detected difference. Means for correcting at least one of the film forming speed and the film forming time.
【００２０】また、本発明の別の光学情報記録媒体の製
造装置は、基板上に設けられたそれぞれ光学定数の異な
る複数の薄膜からなる多層薄膜を有する光学情報記録媒
体の製造装置であって、基板又は基板及びサンプル片上
に前記複数の薄膜をそれぞれ所定の成膜速度及び成膜時
間により順次成膜する手段と、成膜後の基板又はサンプ
ル片上の多層薄膜の分光反射率を測定する手段と、あら
かじめ定められた分光反射率の標準値を記憶する手段
と、前記分光反射率の測定値と前記分光反射率の標準値
とを比較しその差異を検出する手段と、検出された差異
に基づいて基板上に形成された多層薄膜の良否を判定し
選別する工程とを備えている。Further, another apparatus for manufacturing an optical information recording medium according to the present invention is an apparatus for manufacturing an optical information recording medium having a multilayer thin film formed of a plurality of thin films having different optical constants provided on a substrate, Means for sequentially forming the plurality of thin films on a substrate or a substrate and a sample piece at a predetermined film forming rate and film forming time, and means for measuring the spectral reflectance of the multilayer thin film on the substrate or the sample piece after the film formation. Means for storing a predetermined standard value of the spectral reflectance, means for comparing the measured value of the spectral reflectance with the standard value of the spectral reflectance and detecting the difference, and based on the detected difference. Judging the quality of the multilayer thin film formed on the substrate and selecting the same.
【００２１】上記各構成において、前記分光反射率の測
定値と前記分光反射率の標準値とを比較しその差異を検
出する手段として、多層薄膜の分光反射率の測定結果か
ら極値を検出する手段と、その極値における反射率及び
波長の少なくともいずれか一方とその標準値との差異に
基づいて各層の膜厚を求める手段とを有することが好ま
しい。In each of the above structures, as a means for comparing the measured value of the spectral reflectance with the standard value of the spectral reflectance and detecting the difference, an extreme value is detected from the measurement result of the spectral reflectance of the multilayer thin film. It is preferable to have means and means for calculating the thickness of each layer based on the difference between at least one of the reflectance and wavelength at the extreme value and the standard value.
【００２２】また、分光反射率の測定結果の極小値にお
ける波長とその標準値との差異に基づいて、多層薄膜の
分光反射率を測定する側から第１番目の薄膜の膜厚を推
定する手段と、膜厚の推定値と所望の膜厚との差異に応
じて第１番目の薄膜の成膜速度及び成膜時間の少なくと
も一方を補正する手段を備えることが好ましい。A means for estimating the thickness of the first thin film from the side for measuring the spectral reflectance of the multilayer thin film based on the difference between the wavelength at the minimum value of the spectral reflectance measurement result and its standard value. And a means for correcting at least one of the film forming speed and the film forming time of the first thin film according to the difference between the estimated value of the film thickness and the desired film thickness.
【００２３】さらに、分光反射率の測定結果の複数の極
大値における反射率とそれらの標準値との差異から、多
層薄膜の分光反射率を測定する側から第２番目及び第３
番目の薄膜の膜厚を推定する手段と、膜厚の推定値と所
望の膜厚との差異に応じて第２番目及び第３番目の薄膜
の成膜速度及び成膜時間の少なくとも一方を補正する手
段を備えることが好ましい。Further, based on the difference between the reflectance at a plurality of local maxima of the measurement result of the spectral reflectance and their standard values, the second and third from the side where the spectral reflectance of the multilayer thin film is measured.
Means for estimating the film thickness of the second thin film, and correcting at least one of the film forming speed and the film forming time of the second and third thin films according to the difference between the estimated film thickness and the desired film thickness It is preferable to provide a means for performing the above.
【００２４】さらに、分光反射率を測定する際の各測定
波長の間隔が１０ｎｍ以下であることが好ましい。Further, it is preferable that an interval between each measurement wavelength when measuring the spectral reflectance is 10 nm or less.
【００２５】[0025]
【発明の実施の形態】本発明は、多層薄膜の各層の膜厚
が変化すると分光反射率特性が変化することに着目し、
各膜厚の変化に対応して分光反射率の極大点及び極小点
の波長、反射率が特有の変化をすることに基づき、非破
壊で多層薄膜の膜厚を測定するものである。以下、図面
を参照しつつ本発明の多層薄膜の膜厚測定方法及びその
方法を用いた光学情報記録媒体の製造方法及び光学情報
記録媒体の製造装置について説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention focuses on the fact that the spectral reflectance characteristics change when the thickness of each layer of a multilayer thin film changes,
The thickness of the multilayer thin film is measured nondestructively based on the characteristic change of the wavelength and the reflectance of the maximum point and the minimum point of the spectral reflectance corresponding to the change of each film thickness. Hereinafter, a method for measuring the thickness of a multilayer thin film, a method for manufacturing an optical information recording medium using the method, and an apparatus for manufacturing an optical information recording medium according to the present invention will be described with reference to the drawings.
【００２６】（第１の実施形態）第１の実施形態は、多
層薄膜の膜厚測定方法及びその方法を用いた光学情報記
録媒体の製造方法に関するものであり、図１から図３を
参照しつつ説明する。図１は、本発明の光学情報記録媒
体の製造方法の要部を示すフローチャートである。図２
は前述のように一般的な消去型の光学情報記録媒体の断
面図である。また、図３は図２の示す構成を有する光学
情報記録媒体の分光器による分光反射率の測定結果の一
例を示す特性図である。(First Embodiment) The first embodiment relates to a method for measuring the thickness of a multilayer thin film and a method for manufacturing an optical information recording medium using the method, with reference to FIGS. I will explain it. FIG. 1 is a flowchart showing a main part of the method for manufacturing an optical information recording medium of the present invention. FIG.
Is a cross-sectional view of a general erasable optical information recording medium as described above. FIG. 3 is a characteristic diagram showing an example of the measurement result of the spectral reflectance of the optical information recording medium having the configuration shown in FIG. 2 by the spectroscope.
【００２７】図１に示すように、まず、所定の条件下で
の各層の成膜時間を設定する。次に、この成膜時間にし
たがって透明基板１上に下引層３、記録層４、上引層
５、反射層６の順に成膜する。その後、分光器により、
基板側からの分光反射率を測定波長範囲３５０〜８６０
ｎｍ、波長間隔５ｎｍで測定する。図３にこの測定結果
を示す。As shown in FIG. 1, first, a film forming time of each layer under a predetermined condition is set. Next, the undercoat layer 3, the recording layer 4, the overcoat layer 5, and the reflective layer 6 are sequentially formed on the transparent substrate 1 in accordance with the film formation time. Then, with the spectroscope,
The spectral reflectance from the substrate side is measured in a wavelength range of 350 to 860.
nm, at a wavelength interval of 5 nm. FIG. 3 shows the measurement results.
【００２８】次に、得られた測定結果から分光反射率の
極小点及び極大点を検出する。極小点における波長λｍ
ｉｎを測定し、波長λｍｉｎをあらかじめ定められた標
準値と比較し、その差異Δλｍｉｎを求める。これと平
行して、極大点における反射率Ｒｍａｘ１及びＲｍａｘ
２を測定し、Ｒｍａｘ１及びＲｍａｘ２をあらかじめ定
められた標準値と比較し、それらの差異ΔＲｍａｘ１及
びΔＲｍａｘ２を求める。ここで、標準値とは、各薄膜
層が本来の設計値どうりの膜厚に形成されている場合
の、分光反射率の極小点における波長及び極大点におけ
る反射率をいう。Next, the minimum point and the maximum point of the spectral reflectance are detected from the obtained measurement results. Wavelength λm at the minimum point
is measured, the wavelength λmin is compared with a predetermined standard value, and the difference Δλmin is obtained. In parallel with this, the reflectances Rmax1 and Rmax at the local maximum point
2 is measured, Rmax1 and Rmax2 are compared with a predetermined standard value, and their differences ΔRmax1 and ΔRmax2 are determined. Here, the standard value refers to the wavelength at the minimum point of the spectral reflectance and the reflectance at the maximum point when each thin film layer is formed to have a film thickness similar to the original design value.
【００２９】次に、この測定結果をもとに、光学情報記
録媒体１０の下引層３、記録層４及び上引層５の各膜厚
を算出する。その算出方法は、以下のとおりである。下
引層３の膜厚の標準値である１５０ｎｍとの差Ｘ
（％）、記録層４の膜厚の標準値である２０ｎｍとの差
Ｙ（％）、上引層５の膜厚の標準値である４０ｎｍとの
差ｚ（％）を、以下に示す式（１）〜（３）に従って算
出する。Next, based on the measurement results, the thicknesses of the undercoat layer 3, the recording layer 4, and the overcoat layer 5 of the optical information recording medium 10 are calculated. The calculation method is as follows. Difference X from 150 nm which is a standard value of the thickness of undercoat layer 3
(%), The difference Y (%) from the standard value of the film thickness of the recording layer 4 of 20 nm, and the difference z (%) from the standard value of the film thickness of the overcoat layer 5 of 40 nm are expressed by the following equations. It is calculated according to (1) to (3).
【００３０】[0030]
【数１】 ΔＲｍａｘ１＝ａＸ＋ｂＹ ・・・（１） ΔＲｍａｘ１−ΔＲｍａｘ２＝ｃＸ＋ｄＹ ・・・（２） Δλｍｉｎ＝ｅＺ ・・・（３）ΔRmax1 = aX + bY (1) ΔRmax1-ΔRmax2 = cX + dY (2) Δλmin = eZ (3)
【００３１】上記関係式は、下引層３が厚くなるとλｍ
ｉｎが長波長側にずれ、薄くなると短波長側にずれ、下
引層３の膜厚が一定であれば、記録層４及び上引層５の
膜厚が変化してもλｍｉｎはほぼ一定であること、記録
層４及び上引層５の膜厚が変化するとＲｍａｘ１及びＲ
ｍａｘ２が変化するが、記録層４の膜厚変化はＲｍａｘ
２に大きく影響し、上引層５の膜厚変化はＲｍａｘ１に
大きく影響することから導かれたものである。The above relational expression shows that when the undercoat layer 3 becomes thicker, λm
When in shifts to the long wavelength side and becomes thinner, the shift shifts to the short wavelength side, and when the thickness of the undercoat layer 3 is constant, λmin is substantially constant even if the thicknesses of the recording layer 4 and the overcoat layer 5 change. When the film thickness of the recording layer 4 and the overcoat layer 5 changes, Rmax1 and Rmax1
Although the max2 changes, the change in the film thickness of the recording layer 4 is Rmax.
2 and the change in the thickness of the overcoating layer 5 is derived from the fact that it greatly affects Rmax1.
【００３２】ただし、定数ａ＝０．３、ｂ＝０．４、ｃ
＝−０．１、ｄ＝０．２、ｅ＝４である。ここで、Ｘ、
Ｙ、Ｚは、各層の膜厚の標準値との差異の標準値に対す
る比率である。各定数は、各層の膜厚を実験的に変化さ
せた場合の分光反射率から求めることができる。また、
各層の薄膜の各波長における光学定数がわかっている場
合には、多重干渉による反射率を算出することによって
求めることもできる。この定数は各層膜厚の標準値によ
って異なる。Where constants a = 0.3, b = 0.4, c
= −0.1, d = 0.2, e = 4. Where X,
Y and Z are ratios of the difference between the standard value of the film thickness of each layer and the standard value. Each constant can be obtained from the spectral reflectance when the film thickness of each layer is experimentally changed. Also,
If the optical constants at each wavelength of the thin film of each layer are known, it can also be obtained by calculating the reflectance due to multiple interference. This constant depends on the standard value of each layer thickness.
【００３３】以上のようにして算出された各層の膜厚と
その目標値との差異に応じて、所望の膜厚になるように
成膜時間を変更して、以後の生産を行う。その結果、従
来例における各層毎に成膜速度測定用サンプルを作成す
る必要が無く、生産ロスを低減することができる。特
に、バッチ式のスパッタリングによって成膜を行う場合
に、その効果が顕著である。また、サンプル作成のため
に一時的に製造条件を変える必要がなく、３層の膜厚を
同時に測定することにより成膜速度測定に要する時間が
短縮できるため、製造ラインをより効率的に稼働させる
ことができる。さらに、実際の媒体の構造で膜厚を測定
することができるので、製造した媒体の良否を判定し、
選別することも可能である。In accordance with the difference between the film thickness of each layer calculated as described above and its target value, the film formation time is changed so that a desired film thickness is obtained, and subsequent production is performed. As a result, there is no need to prepare a sample for measuring the film-forming speed for each layer in the conventional example, and the production loss can be reduced. In particular, when the film is formed by batch type sputtering, the effect is remarkable. In addition, it is not necessary to temporarily change the manufacturing conditions for preparing the sample, and the time required for measuring the film forming speed can be reduced by simultaneously measuring the film thicknesses of the three layers, so that the manufacturing line can be operated more efficiently. be able to. Furthermore, since the film thickness can be measured with the structure of the actual medium, the quality of the manufactured medium is determined,
It is also possible to sort.
【００３４】（第２の実施形態）第２の実施形態は、上
記多層薄膜の膜厚測定方法を用いた光学情報記録媒体の
製造装置に関するものであり、図２及び図４を参照しつ
つ説明する。図４に示す光学情報記録媒体の製造装置２
０は、基板投入室１１、下引層成膜室１２、記録層成膜
室１３、上引層成膜室１４、反射層成膜室１５、基板排
出室１６、分光器１７、演算処理装置１８及び成膜条件
制御装置１９等で構成されている。(Second Embodiment) The second embodiment relates to an apparatus for manufacturing an optical information recording medium using the method for measuring the thickness of a multilayer thin film, and will be described with reference to FIGS. I do. Manufacturing apparatus 2 for optical information recording medium shown in FIG.
0 denotes a substrate input chamber 11, an undercoat layer deposition chamber 12, a recording layer deposition chamber 13, an overcoat layer deposition chamber 14, a reflective layer deposition chamber 15, a substrate discharge chamber 16, a spectroscope 17, and an arithmetic processing unit. And a film forming condition control device 19 and the like.
【００３５】以上のように構成された光学情報記録媒体
の製造装置について、その動作を説明する。基板投入室
１１から光学情報記録媒体１０の透明基板１を投入し、
下引層成膜室１２、記録層成膜室１３、上引層成膜室１
４及び反射層成膜室１５において、それぞれ下引層３、
記録層４、上引層５及び反射層６を順次形成する。その
後、各層の薄膜が形成された基板１’を基板排出室１６
から取り出す。各成膜室１２〜１５では、成膜条件制御
装置１９によりガス流量、圧力、電力及び時間がそれぞ
れ所定の値に制御され、その条件の下でスパッタリング
により成膜が行われる。The operation of the apparatus for manufacturing an optical information recording medium configured as described above will be described. The transparent substrate 1 of the optical information recording medium 10 is loaded from the substrate loading chamber 11,
Undercoat layer deposition chamber 12, recording layer deposition chamber 13, upper underlayer deposition chamber 1
4 and the reflective layer deposition chamber 15, the undercoat layer 3,
A recording layer 4, an overcoat layer 5, and a reflective layer 6 are sequentially formed. Thereafter, the substrate 1 ′ on which the thin films of the respective layers are formed is removed from the substrate discharge chamber 16.
Remove from In each of the film forming chambers 12 to 15, the gas flow rate, the pressure, the electric power, and the time are controlled to predetermined values by the film forming condition control device 19, and the film is formed by sputtering under the conditions.
【００３６】分光器１７は、成膜された基板１’の成膜
した面の反対側から分光反射率を測定する。演算処理装
置１８は、例えばＣＰＵ、メモリ等を含み、分光器１７
により測定した分光反射率の極小点及び極大点を検出す
るプロセスと、極小点における波長λｍｉｎをあらかじ
め定められた標準値と比較し、その差異Δλｍｉｎを求
めるプロセスと、極大点における反射率Ｒｍａｘ１及び
Ｒｍａｘ２をあらかじめ定められた標準値と比較し、そ
れらの差異ΔＲｍａｘ１及びΔＲｍａｘ２を求めるプロ
セスと、このΔλｍｉｎから上記所定の計算式により当
該光学情報記録媒体１０の下引層３の膜厚と標準値との
差異を算出するプロセスと、ΔＲｍａｘ１及びΔＲｍａ
ｘ２から上記所定の計算式により当該光学情報記録媒体
１０の記録層４及び上引層５の膜厚と標準値との差異を
算出するプロセスと、各層の膜厚と標準値との差異をも
とに所望の膜厚となる成膜時間を算出するプロセスを有
しており、その計算結果に基づいて成膜条件制御装置１
９で設定されている成膜時間を変更する。The spectroscope 17 measures the spectral reflectance from the side opposite to the surface on which the film is formed on the film-formed substrate 1 '. The arithmetic processing device 18 includes, for example, a CPU, a memory, and the like.
A process of detecting the minimum point and the maximum point of the spectral reflectance measured by the above, a process of comparing the wavelength λmin at the minimum point with a predetermined standard value, and calculating a difference Δλmin, and a reflectance Rmax1 and Rmax2 at the maximum point. Is compared with a predetermined standard value to determine the difference ΔRmax1 and ΔRmax2, and the difference between Δλmin and the standard value of the film thickness of the undercoat layer 3 of the optical information recording medium 10 is calculated by the above-mentioned predetermined formula. The process of calculating the difference, ΔRmax1 and ΔRmax
x2, the process of calculating the difference between the film thickness of the recording layer 4 and the overcoat layer 5 of the optical information recording medium 10 and the standard value according to the above-mentioned predetermined formula, and the difference between the film thickness of each layer and the standard value. And a process for calculating a film forming time to obtain a desired film thickness.
The film forming time set in step 9 is changed.
【００３７】この製造装置によれば、各層毎に成膜速度
測定用サンプルを作成する必要が無く、生産ロスを低減
することができる。特に、バッチ式のスパッタリングに
よって成膜を行う場合に、その効果が顕著である。ま
た、サンプル作成のために一時的に製造条件を変える必
要がなく、３層の膜厚を同時に測定することにより成膜
速度測定に要する時間が短縮できるため、製造ラインを
より効率的に稼働させることができる。さらに、実際の
媒体の構造で膜厚を測定することができるので、製造し
た媒体の良否を判定し、選別することも可能である。According to this manufacturing apparatus, it is not necessary to prepare a sample for measuring the film forming speed for each layer, and the production loss can be reduced. In particular, when the film is formed by batch type sputtering, the effect is remarkable. In addition, it is not necessary to temporarily change the manufacturing conditions for preparing the sample, and the time required for measuring the film forming speed can be reduced by simultaneously measuring the film thicknesses of the three layers, so that the manufacturing line can be operated more efficiently. be able to. Further, since the film thickness can be measured by the actual structure of the medium, it is possible to judge the quality of the manufactured medium and select the medium.
【００３８】なお、上記各実施形態の説明において、各
層の薄膜を所望の膜厚にするために成膜時間を変更した
が、スパッタリングの電力、すなわち成膜速度を変更し
ても良い。また、光学情報記録媒体そのものの分光反射
率を測定する代わりに、同時に別の基板に成膜したサン
プルの分光反射率を測定しても良い。分光反射率の測定
は、一定の製造枚数毎に行っても良いし、１枚毎に行っ
ても良い。In the description of each of the above embodiments, the film forming time is changed in order to make the thin film of each layer a desired film thickness. However, the power of sputtering, that is, the film forming speed may be changed. Instead of measuring the spectral reflectance of the optical information recording medium itself, the spectral reflectance of a sample formed on another substrate may be measured at the same time. The measurement of the spectral reflectance may be performed for each fixed number of sheets manufactured, or may be performed for each sheet.
【００３９】また、分光反射率の測定波長間隔が大きい
と膜厚の測定精度が悪くなる。例えば下引層３の場合、
λｍｉｎの差２０ｎｍが膜厚の約５％に相当する。従っ
て、必要とする膜厚の測定精度を５％とすると、測定波
長間隔はその半分の１０ｎｍ以下とすることが好まし
い。If the wavelength interval of measurement of the spectral reflectance is large, the measurement accuracy of the film thickness deteriorates. For example, in the case of the undercoat layer 3,
The difference of 20 nm of λmin corresponds to about 5% of the film thickness. Therefore, assuming that the required film thickness measurement accuracy is 5%, it is preferable that the measurement wavelength interval is half or less, that is, 10 nm or less.
【００４０】[0040]
【発明の効果】以上のように、本発明の多層薄膜の膜厚
測定方法によれば、基板上に設けられたそれぞれ光学定
数の異なる複数の薄膜からなる多層薄膜の分光反射率を
測定し、測定結果をあらかじめ定められた標準値と比較
し、測定結果と標準値との差異に基づいて各層の膜厚を
求めるので、１回の測定で複数の薄膜の膜厚をそれぞれ
測定することができ、膜厚測定に要する時間を短縮する
ことができる。また、実際の媒体の構造で膜厚を測定す
ることができるので、特に、バッチ式のスパッタリング
により成膜する場合に有効である。As described above, according to the method for measuring the thickness of a multilayer thin film of the present invention, the spectral reflectance of a multilayer thin film provided on a substrate and comprising a plurality of thin films having different optical constants is measured. The measurement result is compared with a predetermined standard value, and the thickness of each layer is obtained based on the difference between the measurement result and the standard value. Therefore, the thickness of a plurality of thin films can be measured in one measurement. In addition, the time required for film thickness measurement can be reduced. Further, since the film thickness can be measured with the actual medium structure, it is particularly effective when forming a film by batch-type sputtering.
【００４１】また、多層薄膜の分光反射率の測定結果か
ら極値を検出し、その極値における反射率及び波長の少
なくともいずれか一方とその標準値との差異に基づいて
各層の膜厚を求めることにより、測定結果及び標準値に
おける反射率及び波長の特定が容易になり、両者の比較
及び差異の検出精度を高くすることができる。Further, an extreme value is detected from the measurement result of the spectral reflectance of the multilayer thin film, and a film thickness of each layer is obtained based on a difference between at least one of the reflectance and the wavelength at the extreme value and the standard value. Thereby, it is easy to specify the reflectance and the wavelength in the measurement result and the standard value, and it is possible to increase the accuracy of comparing the two and detecting the difference.
【００４２】また、上記（数１）において、例えば第１
番目の薄膜（下引層）が厚くなるとλｍｉｎが長波長側
にずれ、薄くなると短波長側にずれ、下引層の膜厚が一
定であれば、第２番目の薄膜（記録層）及び第３番目の
薄膜（上引層）の膜厚が変化してもλｍｉｎはほぼ一定
であること、記録層及び上引層の膜厚が変化するとＲｍ
ａｘ１及びＲｍａｘ２が変化するが、記録層の膜厚変化
はＲｍａｘ２に大きく影響し、上引層の膜厚変化はＲｍ
ａｘ１に大きく影響する。この性質を利用して、分光反
射率の測定結果の極小値における波長とその標準値との
差異に基づいて、多層薄膜の分光反射率を測定する側か
ら第１番目の薄膜の膜厚を求めることができる。また、
分光反射率の測定結果の複数の極大値における反射率と
それらの標準値との差異から、多層薄膜の分光反射率を
測定する側から第２番目及び第３番目の薄膜の膜厚を求
めることができる。In the above (Equation 1), for example, the first
When the second thin film (undercoat layer) becomes thicker, λmin shifts to the longer wavelength side, and when it becomes thinner, λmin shifts to the shorter wavelength side. If the thickness of the undercoat layer is constant, the second thin film (recording layer) and the second [Lambda] min is substantially constant even when the thickness of the third thin film (upcoat layer) changes.
amax1 and Rmax2 change, but a change in the thickness of the recording layer greatly affects Rmax2, and a change in the thickness of the upper layer is Rm.
ax1. Utilizing this property, the thickness of the first thin film from the side where the spectral reflectance of the multilayer thin film is measured is determined based on the difference between the wavelength at the minimum value of the spectral reflectance measurement result and its standard value. be able to. Also,
Obtaining the thicknesses of the second and third thin films from the side where the spectral reflectance of the multilayer thin film is measured from the difference between the reflectance at a plurality of local maximum values of the measurement results of the spectral reflectance and their standard values. Can be.
【００４３】一方、本発明の光学情報記録媒体の第１の
製造方法は、基板上に設けられたそれぞれ光学定数の異
なる複数の薄膜からなる多層薄膜を有する光学情報記録
媒体の製造方法であって、基板又はサンプル片上に前記
複数の薄膜をそれぞれ所定の成膜速度及び成膜時間によ
り順次成膜する工程と、成膜後の基板又はサンプル片上
の多層薄膜の分光反射率を測定する工程と、前記分光反
射率の測定値とあらかじめ定められた分光反射率の標準
値とを比較しそれらの差異を検出する工程と、検出され
た差異に応じて前記所定の成膜速度及び成膜時間の少な
くとも一方を補正する工程と、新たな基板上に前記複数
の薄膜をそれぞれ補正された成膜速度及び成膜時間によ
り順次成膜する工程とを備えている。すなわち、上記多
層薄膜の膜厚測定方法を用いて、最初に成膜した基板又
は基板と同時に成膜したサンプル片の膜厚を直接測定す
ることにより、１回の測定で複数の薄膜の膜厚を同時に
測定することができ、成膜速度測定に要する時間が短縮
できるため、製造ラインをより効率的に稼働させること
ができる。また、従来例のように各層毎に成膜速度測定
用サンプルを作成する必要が無くなり、生産ロスを低減
することができる。特に、バッチ式のスパッタリングに
よって成膜を行う場合に、顕著な効果を奏する。On the other hand, a first method for producing an optical information recording medium according to the present invention is a method for producing an optical information recording medium having a multilayer thin film comprising a plurality of thin films having different optical constants provided on a substrate. A step of sequentially forming the plurality of thin films on a substrate or sample piece at a predetermined film forming rate and a film forming time, and a step of measuring the spectral reflectance of the multilayer thin film on the substrate or sample piece after film formation, A step of comparing the measured value of the spectral reflectance with a predetermined standard value of the spectral reflectance and detecting a difference between them, and at least the predetermined film forming speed and the film forming time according to the detected difference. The method includes a step of correcting one of the thin films and a step of sequentially forming the plurality of thin films on a new substrate at the corrected film forming speed and film forming time. That is, the thickness of a plurality of thin films can be measured in one measurement by directly measuring the thickness of a substrate formed first or a sample piece formed simultaneously with the substrate by using the method for measuring the thickness of a multilayer thin film. Can be measured at the same time, and the time required for film formation rate measurement can be reduced, so that the production line can be operated more efficiently. Further, it is not necessary to prepare a sample for measuring the film-forming speed for each layer as in the conventional example, and the production loss can be reduced. In particular, a remarkable effect is exhibited when the film is formed by batch-type sputtering.
【００４４】また、本発明の光学情報記録媒体の第２の
製造方法は、基板上に設けられたそれぞれ光学定数の異
なる複数の薄膜からなる多層薄膜を有する光学情報記録
媒体の製造方法であって、基板又は基板及びサンプル片
上に前記複数の薄膜をそれぞれ所定の成膜速度及び成膜
時間により順次成膜する工程と、成膜後の基板又はサン
プル片上の多層薄膜の分光反射率を測定する工程と、前
記分光反射率の測定値とあらかじめ定められた分光反射
率の標準値とを比較しそれらの差異を検出する工程と、
検出された差異に基づいて基板上に形成された多層薄膜
の良否を判定し選別する工程とを備えている。従って、
上記第１の製造方法の効果に加えて、実際に製造した光
学情報記録媒体の膜厚を直接測定することができるの
で、製造した光学情報記録媒体の良否を判定し、選別す
ることが可能である。A second method for manufacturing an optical information recording medium according to the present invention is a method for manufacturing an optical information recording medium having a multilayer thin film comprising a plurality of thin films having different optical constants provided on a substrate. A step of sequentially forming the plurality of thin films on a substrate or a substrate and a sample piece at a predetermined film forming rate and a film forming time, and a step of measuring a spectral reflectance of a multilayer thin film on the substrate or the sample piece after the film formation. And a step of comparing the measured value of the spectral reflectance and a predetermined standard value of the spectral reflectance to detect a difference therebetween,
Judging the quality of the multilayer thin film formed on the substrate based on the detected difference and selecting the same. Therefore,
In addition to the effects of the first manufacturing method, the thickness of the actually manufactured optical information recording medium can be directly measured, so that the quality of the manufactured optical information recording medium can be determined and sorted. is there.
【００４５】また、本発明の光学情報記録媒体の第１の
製造装置は、基板上に設けられたそれぞれ光学定数の異
なる複数の薄膜からなる多層薄膜を有する光学情報記録
媒体の製造装置であって、基板又はサンプル片上に前記
複数の薄膜をそれぞれ所定の成膜速度及び成膜時間によ
り順次成膜する手段と、成膜後の基板又はサンプル片上
の多層薄膜の分光反射率を測定する手段と、あらかじめ
定められた分光反射率の標準値を記憶する手段と、前記
分光反射率の測定値と前記分光反射率の標準値とを比較
しその差異を検出する手段と、検出された差異に応じて
前記所定の成膜速度及び成膜時間の少なくとも一方を補
正する手段とを備えている。すなわち、上記多層薄膜の
膜厚測定方法を用いて、最初に所定の成膜速度及び成膜
時間に基づいて成膜した基板又はサンプル片の膜厚を測
定し、測定値と標準値との差異から成膜速度及び成膜時
間の少なくとも一方を補正することにより、次回基板上
に成膜される薄膜の膜厚を所定の設計値により近づける
ことができる。さらに、この工程を繰り返すことによ
り、測定値を標準値に収斂させることができ、製造され
た光学情報記録媒体の各薄膜の膜厚の精度をより高くす
ることができる。A first apparatus for manufacturing an optical information recording medium according to the present invention is an apparatus for manufacturing an optical information recording medium having a multilayer thin film comprising a plurality of thin films having different optical constants provided on a substrate. A means for sequentially forming the plurality of thin films on a substrate or a sample piece at a predetermined film formation rate and a film formation time, and a means for measuring a spectral reflectance of a multilayer thin film on a substrate or a sample piece after film formation, Means for storing a predetermined standard value of the spectral reflectance, means for comparing the measured value of the spectral reflectance with the standard value of the spectral reflectance and detecting the difference, and according to the detected difference Means for correcting at least one of the predetermined film forming speed and the film forming time. That is, using the method for measuring the thickness of the multilayer thin film, the thickness of a substrate or a sample piece formed first is measured based on a predetermined film forming speed and a predetermined film forming time, and the difference between the measured value and the standard value is measured. By correcting at least one of the film formation rate and the film formation time, the film thickness of the thin film formed next on the substrate can be made closer to a predetermined design value. Further, by repeating this step, the measured value can be converged to the standard value, and the accuracy of the thickness of each thin film of the manufactured optical information recording medium can be further improved.
【００４６】また、本発明の光学情報記録媒体の第２の
製造装置は、基板上に設けられたそれぞれ光学定数の異
なる複数の薄膜からなる多層薄膜を有する光学情報記録
媒体の製造装置であって、基板又は基板及びサンプル片
上に前記複数の薄膜をそれぞれ所定の成膜速度及び成膜
時間により順次成膜する手段と、成膜後の基板又はサン
プル片上の多層薄膜の分光反射率を測定する手段と、あ
らかじめ定められた分光反射率の標準値を記憶する手段
と、前記分光反射率の測定値と前記分光反射率の標準値
とを比較しその差異を検出する手段と、検出された差異
に基づいて基板上に形成された多層薄膜の良否を判定し
選別する工程とを備えている。従って、上記第１の製造
方法の効果に加えて、実際に製造した光学情報記録媒体
の膜厚を直接測定することができるので、製造した光学
情報記録媒体の良否を判定し、選別することが可能であ
る。A second apparatus for manufacturing an optical information recording medium according to the present invention is an apparatus for manufacturing an optical information recording medium having a multilayer thin film provided on a substrate and comprising a plurality of thin films having different optical constants. Means for sequentially forming the plurality of thin films on a substrate or a substrate and a sample piece at predetermined film forming rates and film forming times, and means for measuring the spectral reflectance of the multilayer thin film on the substrate or the sample piece after the film formation Means for storing a predetermined standard value of spectral reflectance, means for comparing the measured value of the spectral reflectance with the standard value of the spectral reflectance and detecting the difference, and And judging the quality of the multilayer thin film formed on the substrate based on the judgment based on the judgment. Therefore, in addition to the effects of the first manufacturing method, the film thickness of the actually manufactured optical information recording medium can be directly measured, so that the quality of the manufactured optical information recording medium can be determined and sorted. It is possible.
【００４７】さらに、上記光学情報記録媒体の各製造方
法及び製造装置において、分光反射率を測定する際の各
測定波長の間隔を１０ｎｍ以下とすることにより、膜厚
の測定精度を約５％に維持することができる。Further, in each of the methods and apparatus for manufacturing an optical information recording medium described above, the measurement accuracy of the film thickness is reduced to about 5% by setting the interval of each measurement wavelength at the time of measuring the spectral reflectance to 10 nm or less. Can be maintained.
【図１】本発明の光学情報記録媒体の製造方法の一実施
形態の要部を示すフローチャートFIG. 1 is a flowchart showing a main part of an embodiment of a method for manufacturing an optical information recording medium of the present invention.
【図２】一般的な光学情報記録媒体の構成を示す断面図FIG. 2 is a sectional view showing a configuration of a general optical information recording medium.
【図３】光学情報記録媒体を測定した分光反射率と波長
の関係を示す特性図FIG. 3 is a characteristic diagram showing a relationship between spectral reflectance and wavelength measured on an optical information recording medium.
【図４】本発明の光学情報記録媒体の製造装置の一実施
形態の要部を示す構成図FIG. 4 is a configuration diagram illustrating a main part of an embodiment of an optical information recording medium manufacturing apparatus according to the present invention.
１ ：透明基板 １’：多層薄膜が形成された透明基板 ２ ：案内溝 ３ ：下引層 ４ ：記録層 ５ ：上引層 ６ ：反射層 ７ ：樹脂保護層 ９ ：中心孔 １０ ：光学情報記録媒体 １１ ：基板投入室 １２ ：下引層成膜室 １３ ：記録層成膜室 １４ ：上引層成膜室 １５ ：反射層成膜室 １６ ：基板排出室 １７ ：分光器 １８ ：演算処理装置 １９ ：成膜条件制御装置 ２０ ：光学情報記録媒体の製造装置 1: Transparent substrate 1 ′: Transparent substrate on which a multilayer thin film is formed 2: Guide groove 3: Undercoat layer 4: Recording layer 5: Overcoat layer 6: Reflective layer 7: Resin protective layer 9: Central hole 10: Optical information Recording medium 11: Substrate input chamber 12: Sublayer deposition chamber 13: Recording layer deposition chamber 14: Upper layer deposition chamber 15: Reflective layer deposition chamber 16: Substrate discharge chamber 17: Spectrograph 18: Operation processing Apparatus 19: film formation condition control apparatus 20: optical information recording medium manufacturing apparatus
Claims (16)
異なる複数の薄膜からなる多層薄膜の膜厚測定方法であ
って、前記多層薄膜の分光反射率を測定し、測定結果を
あらかじめ定められた標準値と比較し、測定結果と標準
値との差異に基づいて各層の膜厚を求める多層薄膜の膜
厚測定方法。1. A method for measuring the thickness of a multilayer thin film provided on a substrate and comprising a plurality of thin films having different optical constants, wherein a spectral reflectance of the multilayer thin film is measured, and a measurement result is determined in advance. A method for measuring the thickness of a multilayer thin film, wherein the thickness of each layer is determined based on the difference between the measurement result and the standard value, as compared with a standard value.
値を検出し、その極値における反射率及び波長の少なく
ともいずれか一方とその標準値との差異に基づいて各層
の膜厚を求めることを特徴とする請求項１記載の多層薄
膜の膜厚測定方法。2. An extreme value is detected from a measurement result of a spectral reflectance of the multilayer thin film, and a film thickness of each layer is obtained based on a difference between at least one of the reflectance and the wavelength at the extreme value and a standard value. 2. The method for measuring the thickness of a multilayer thin film according to claim 1, wherein:
波長とその標準値との差異に基づいて、多層薄膜の分光
反射率を測定する側から第１番目の薄膜の膜厚を求める
ことを特徴とする請求項２記載の多層膜の膜厚測定方
法。3. A method for obtaining a thickness of a first thin film from a side where a spectral reflectance of a multilayer thin film is measured, based on a difference between a wavelength at a minimum value of a measurement result of the spectral reflectance and a standard value thereof. 3. The method for measuring the thickness of a multilayer film according to claim 2, wherein:
おける反射率とそれらの標準値との差異から、多層薄膜
の分光反射率を測定する側から第２番目及び第３番目の
薄膜の膜厚を求めることを特徴とする請求項２又は３記
載の多層膜の膜厚測定方法。4. The second and third thin films from the side where the spectral reflectance of the multilayer thin film is measured, based on the difference between the reflectance at a plurality of maximum values of the spectral reflectance measurement result and their standard values. 4. The method for measuring the thickness of a multilayer film according to claim 2, wherein the thickness is determined.
異なる複数の薄膜からなる多層薄膜を有する光学情報記
録媒体の製造方法であって、基板又はサンプル片上に前
記複数の薄膜をそれぞれ所定の成膜速度及び成膜時間に
より順次成膜する工程と、成膜後の基板又はサンプル片
上の多層薄膜の分光反射率を測定する工程と、前記分光
反射率の測定値とあらかじめ定められた分光反射率の標
準値とを比較しそれらの差異を検出する工程と、検出さ
れた差異に応じて前記所定の成膜速度及び成膜時間の少
なくとも一方を補正する工程と、新たな基板上に前記複
数の薄膜をそれぞれ補正された成膜速度及び成膜時間に
より順次成膜する工程とを備えた光学情報記録媒体の製
造方法。5. A method for producing an optical information recording medium having a multilayer thin film formed of a plurality of thin films having different optical constants provided on a substrate, wherein the plurality of thin films are formed on a substrate or a sample piece, respectively. A step of sequentially forming a film according to a film speed and a film forming time; a step of measuring a spectral reflectance of a multilayer thin film on a substrate or a sample piece after the film formation; a measurement value of the spectral reflectance and a predetermined spectral reflectance Comparing with a standard value of the two, detecting a difference between them, a step of correcting at least one of the predetermined film forming speed and the film forming time according to the detected difference, and Forming a thin film sequentially according to the corrected film forming speed and film forming time, respectively.
異なる複数の薄膜からなる多層薄膜を有する光学情報記
録媒体の製造方法であって、基板又は基板及びサンプル
片上に前記複数の薄膜をそれぞれ所定の成膜速度及び成
膜時間により順次成膜する工程と、成膜後の基板又はサ
ンプル片上の多層薄膜の分光反射率を測定する工程と、
前記分光反射率の測定値とあらかじめ定められた分光反
射率の標準値とを比較しそれらの差異を検出する工程
と、検出された差異に基づいて基板上に形成された多層
薄膜の良否を判定し選別する工程とを備えた光学情報記
録媒体の製造方法。6. A method for manufacturing an optical information recording medium having a multilayer thin film formed of a plurality of thin films having different optical constants provided on a substrate, wherein the plurality of thin films are respectively provided on a substrate or a substrate and a sample piece. A step of sequentially forming a film according to a film forming speed and a film forming time, and a step of measuring a spectral reflectance of a multilayer thin film on a substrate or a sample piece after film formation,
A step of comparing the measured value of the spectral reflectance with a predetermined standard value of the spectral reflectance and detecting a difference between them; and determining the quality of the multilayer thin film formed on the substrate based on the detected difference. And selecting the optical information recording medium.
値を検出し、その極値における反射率及び波長の少なく
ともいずれか一方とその標準値との差異に基づいて各層
の膜厚を求めることを特徴とする請求項５又は６記載の
光学情報記録媒体の製造方法。7. An extreme value is detected from a measurement result of a spectral reflectance of the multilayer thin film, and a film thickness of each layer is obtained based on a difference between at least one of the reflectance and the wavelength at the extreme value and a standard value thereof. 7. The method for manufacturing an optical information recording medium according to claim 5, wherein:
波長とその標準値との差異に基づいて、多層薄膜の分光
反射率を測定する側から第１番目の薄膜の膜厚を求める
ことを特徴とする請求項７記載の光学情報記録媒体の製
造方法。8. A method for determining a thickness of a first thin film from a side where a spectral reflectance of a multilayer thin film is measured, based on a difference between a wavelength at a minimum value of a measurement result of the spectral reflectance and a standard value thereof. The method for manufacturing an optical information recording medium according to claim 7, wherein:
おける反射率とそれらの標準値との差異から、多層薄膜
の分光反射率を測定する側から第２番目及び第３番目の
薄膜の膜厚を求めることを特徴とする請求項７記載の光
学情報記録媒体の製造方法。9. The second and third thin films from the side from which the spectral reflectance of the multilayer thin film is measured, based on the difference between the reflectance at a plurality of local maximum values of the spectral reflectance measurement result and their standard values. The method for manufacturing an optical information recording medium according to claim 7, wherein the film thickness is determined.
の間隔が１０ｎｍ以下であることを特徴とする請求項８
又は９記載の光学情報記録媒体の製造方法。10. The method according to claim 8, wherein an interval between each measurement wavelength when measuring the spectral reflectance is 10 nm or less.
Or a method for producing an optical information recording medium according to item 9.
の異なる複数の薄膜からなる多層薄膜を有する光学情報
記録媒体の製造装置であって、基板又はサンプル片上に
前記複数の薄膜をそれぞれ所定の成膜速度及び成膜時間
により順次成膜する手段と、成膜後の基板又はサンプル
片上の多層薄膜の分光反射率を測定する手段と、あらか
じめ定められた分光反射率の標準値を記憶する手段と、
前記分光反射率の測定値と前記分光反射率の標準値とを
比較しその差異を検出する手段と、検出された差異に応
じて前記所定の成膜速度及び成膜時間の少なくとも一方
を補正する手段とを備えた光学情報記録媒体の製造装
置。11. An apparatus for manufacturing an optical information recording medium having a multi-layer thin film comprising a plurality of thin films having different optical constants provided on a substrate, wherein said plurality of thin films are formed on a substrate or a sample piece, respectively. Means for sequentially forming a film according to a film speed and a film formation time, means for measuring a spectral reflectance of a multilayer thin film on a substrate or a sample piece after film formation, and means for storing a standard value of a predetermined spectral reflectance. ,
Means for comparing the measured value of the spectral reflectance with the standard value of the spectral reflectance and detecting the difference, and correcting at least one of the predetermined film forming speed and the film forming time according to the detected difference. Manufacturing apparatus for an optical information recording medium, comprising:
の異なる複数の薄膜からなる多層薄膜を有する光学情報
記録媒体の製造装置であって、基板又は基板及びサンプ
ル片上に前記複数の薄膜をそれぞれ所定の成膜速度及び
成膜時間により順次成膜する手段と、成膜後の基板又は
サンプル片上の多層薄膜の分光反射率を測定する手段
と、あらかじめ定められた分光反射率の標準値を記憶す
る手段と、前記分光反射率の測定値と前記分光反射率の
標準値とを比較しその差異を検出する手段と、検出され
た差異に基づいて基板上に形成された多層薄膜の良否を
判定し選別する工程とを備えた光学情報記録媒体の製造
装置。12. An apparatus for manufacturing an optical information recording medium having a multilayer thin film comprising a plurality of thin films having different optical constants provided on a substrate, wherein the plurality of thin films are respectively provided on a substrate or a substrate and a sample piece. Means for sequentially forming a film according to the film forming speed and film forming time, means for measuring the spectral reflectance of a multilayer thin film on a substrate or a sample piece after film formation, and storage of a predetermined standard value of spectral reflectance. Means, means for comparing the measured value of the spectral reflectance with the standard value of the spectral reflectance and detecting the difference, and determining the quality of the multilayer thin film formed on the substrate based on the detected difference. A manufacturing apparatus for an optical information recording medium, comprising:
射率の標準値とを比較しその差異を検出する手段とし
て、多層薄膜の分光反射率の測定結果から極値を検出す
る手段と、その極値における反射率及び波長の少なくと
もいずれか一方とその標準値との差異に基づいて各層の
膜厚を求める手段とを有する請求項１１又は１２記載の
光学情報記録媒体の製造装置。13. A means for comparing a measured value of the spectral reflectance with a standard value of the spectral reflectance and detecting a difference between the measured value and a standard value of the spectral reflectance of the multilayer thin film; 13. The apparatus for manufacturing an optical information recording medium according to claim 11, further comprising means for obtaining a film thickness of each layer based on a difference between at least one of the reflectance and the wavelength at the extreme value and the standard value.
る波長とその標準値との差異に基づいて、多層薄膜の分
光反射率を測定する側から第１番目の薄膜の膜厚を推定
する手段と、膜厚の推定値と所望の膜厚との差異に応じ
て第１番目の薄膜の成膜速度及び成膜時間の少なくとも
一方を補正する手段を備えた請求項１３記載の光学情報
記録媒体の製造装置。14. A means for estimating the thickness of the first thin film from the side where the spectral reflectance of the multilayer thin film is measured, based on the difference between the wavelength at the minimum value of the spectral reflectance measurement result and its standard value. 14. The optical information recording medium according to claim 13, further comprising means for correcting at least one of a film forming speed and a film forming time of the first thin film according to a difference between the estimated value of the film thickness and a desired film thickness. Manufacturing equipment.
における反射率とそれらの標準値との差異から、多層薄
膜の分光反射率を測定する側から第２番目及び第３番目
の薄膜の膜厚を推定する手段と、膜厚の推定値と所望の
膜厚との差異に応じて第２番目及び第３番目の薄膜の成
膜速度及び成膜時間の少なくとも一方を変化させる手段
を備えた請求項１３記載の光学情報記録媒体の製造装
置。15. The second and third thin films from the side from which the spectral reflectance of the multilayer thin film is measured, based on the difference between the reflectance at a plurality of local maxima of the measurement result of the spectral reflectance and their standard values. A means for estimating the film thickness, and a means for changing at least one of the film forming speed and the film forming time of the second and third thin films according to a difference between the estimated film thickness and the desired film thickness. An apparatus for manufacturing an optical information recording medium according to claim 13.
の間隔が１０ｎｍ以下である請求項１４又は１５記載の
光学情報記録媒体の製造装置。16. The apparatus for manufacturing an optical information recording medium according to claim 14, wherein an interval between respective measurement wavelengths when measuring the spectral reflectance is 10 nm or less.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16602696A JP3732894B2 (en) | 1996-06-26 | 1996-06-26 | Method for measuring film thickness of multilayer thin film, method for manufacturing optical information recording medium using the method, and apparatus for manufacturing optical information recording medium |
| US08/883,530 US5883720A (en) | 1996-06-26 | 1997-06-26 | Method of measuring a film thickness of multilayer thin film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16602696A JP3732894B2 (en) | 1996-06-26 | 1996-06-26 | Method for measuring film thickness of multilayer thin film, method for manufacturing optical information recording medium using the method, and apparatus for manufacturing optical information recording medium |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH109829A true JPH109829A (en) | 1998-01-16 |
| JP3732894B2 JP3732894B2 (en) | 2006-01-11 |
Family
ID=15823569
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16602696A Expired - Fee Related JP3732894B2 (en) | 1996-06-26 | 1996-06-26 | Method for measuring film thickness of multilayer thin film, method for manufacturing optical information recording medium using the method, and apparatus for manufacturing optical information recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3732894B2 (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10253324A (en) * | 1997-03-06 | 1998-09-25 | Matsushita Electric Ind Co Ltd | Method for measuring film thickness of multi-layer thin film, and method and device for manufacturing optical information recording medium |
| WO2003010764A1 (en) * | 2001-07-27 | 2003-02-06 | Tdk Corporation | Optical recording medium inspecting method |
| JP2005276262A (en) * | 2004-03-23 | 2005-10-06 | Ricoh Co Ltd | Method and device for inspecting optical laminate, and method and device for manufacturing optical laminate |
| EP1760423A1 (en) | 2005-09-06 | 2007-03-07 | Ricoh Company, Ltd. | Method of inspecting optical recording medium |
| JP2008039789A (en) * | 2003-06-20 | 2008-02-21 | Lg Electron Inc | Method of measuring thickness in optical disc |
| JP2010002328A (en) * | 2008-06-20 | 2010-01-07 | Otsuka Denshi Co Ltd | Film thickness measuring instrument |
| WO2010097972A1 (en) * | 2009-02-27 | 2010-09-02 | 三菱重工業株式会社 | Apparatus and method for inspecting thin film |
-
1996
- 1996-06-26 JP JP16602696A patent/JP3732894B2/en not_active Expired - Fee Related
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10253324A (en) * | 1997-03-06 | 1998-09-25 | Matsushita Electric Ind Co Ltd | Method for measuring film thickness of multi-layer thin film, and method and device for manufacturing optical information recording medium |
| WO2003010764A1 (en) * | 2001-07-27 | 2003-02-06 | Tdk Corporation | Optical recording medium inspecting method |
| JP2008039789A (en) * | 2003-06-20 | 2008-02-21 | Lg Electron Inc | Method of measuring thickness in optical disc |
| JP2005276262A (en) * | 2004-03-23 | 2005-10-06 | Ricoh Co Ltd | Method and device for inspecting optical laminate, and method and device for manufacturing optical laminate |
| EP1760423A1 (en) | 2005-09-06 | 2007-03-07 | Ricoh Company, Ltd. | Method of inspecting optical recording medium |
| JP2010002328A (en) * | 2008-06-20 | 2010-01-07 | Otsuka Denshi Co Ltd | Film thickness measuring instrument |
| WO2010097972A1 (en) * | 2009-02-27 | 2010-09-02 | 三菱重工業株式会社 | Apparatus and method for inspecting thin film |
| JP2010203814A (en) * | 2009-02-27 | 2010-09-16 | Mitsubishi Heavy Ind Ltd | Apparatus and method for testing thin film |
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|---|---|
| JP3732894B2 (en) | 2006-01-11 |
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