JPH10253324A - Method for measuring film thickness of multi-layer thin film, and method and device for manufacturing optical information recording medium - Google Patents
Method for measuring film thickness of multi-layer thin film, and method and device for manufacturing optical information recording mediumInfo
- Publication number
- JPH10253324A JPH10253324A JP9051241A JP5124197A JPH10253324A JP H10253324 A JPH10253324 A JP H10253324A JP 9051241 A JP9051241 A JP 9051241A JP 5124197 A JP5124197 A JP 5124197A JP H10253324 A JPH10253324 A JP H10253324A
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- Prior art keywords
- film
- thickness
- thin film
- spectral reflectance
- difference
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
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- Length Measuring Devices By Optical Means (AREA)
- Manufacturing Optical Record Carriers (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、基板上に設けられ
たそれぞれ光学定数の異なる複数の薄膜からなる多層薄
膜の膜厚測定方法及びその膜厚測定方法を用いた光学情
報記録媒体の製造方法及び光学情報記録媒体の製造装置
に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for measuring the thickness of a multilayer thin film comprising a plurality of thin films provided on a substrate and having different optical constants, and a method for manufacturing an optical information recording medium using the method. And an optical information recording medium manufacturing apparatus.
【０００２】[0002]
【従来の技術】大容量で高密度なメモリーとして、書換
えが可能な消去型と呼ばれる光学情報記録媒体の開発が
進められている。この消去型の光学情報記録媒体の一つ
として、アモルファス状態と結晶状態の間で相変化する
薄膜を記録層として用い、レーザー光の照射による熱エ
ネルギーによって情報の記録及び消去を行うものがあ
る。2. Description of the Related Art A rewritable optical information recording medium called a erasable type has been developed as a large-capacity, high-density memory. As one of the erasable optical information recording media, there is a type that uses a thin film that changes phase between an amorphous state and a crystalline state as a recording layer, and performs recording and erasing of information by thermal energy by laser light irradiation.
【０００３】この記録層用の相変化材料としては、Ｇ
ｅ，Ｓｂ，Ｔｅ，Ｉｎ等を主成分とする、例えばＧｅＳ
ｂＴｅ，ＧｅＳｂＴｅＳｅ，ＩｎＳｂ，ＩｎＳｂＴｅ，
ＩｎＳｂＴｅＡｇ等の合金膜が一般的に知られている。
一般的に、情報の記録は記録層の部分的なアモルファス
化によってマークを形成して行い、消去はこのアモルフ
ァスマークの結晶化によって行う。アモルファス化は記
録層を融点以上に加熱した後に一定値以上の速さで冷却
することによって行われる。また、結晶化は記録層を結
晶化温度以上、融点以下の温度に加熱することによって
行われる。As a phase change material for this recording layer, G
e, Sb, Te, In or the like as a main component, for example, GeS
bTe, GeSbTeSe, InSb, InSbTe,
An alloy film such as InSbTeAg is generally known.
Generally, information is recorded by forming a mark by partially amorphizing the recording layer, and erasing is performed by crystallization of the amorphous mark. Amorphization is performed by heating the recording layer to a temperature equal to or higher than the melting point and then cooling the recording layer at a speed equal to or higher than a predetermined value. The crystallization is performed by heating the recording layer to a temperature higher than the crystallization temperature and lower than the melting point.
【０００４】さらに、一般的には、記録層の上下に誘電
体層が設けられている。この誘電体層の第１の目的は、
瞬間的に融点以上に昇温する記録層の熱から基板を保護
するとともに記録層の変形や破損を防止することであ
る。また、第二の目的は、光干渉効果により記録情報の
再生時に十分な信号強度を得ることである。さらに、第
三の目的は、記録時に良好な形状のアモルファスマーク
を形成するのに適した冷却速度を実現することである。
そのため、誘電体材料としては、十分な耐熱性、大きな
屈折率、適度な熱伝導率等の特性が要求される。これら
の条件を満たす材料として、例えばＺｎＳ−ＳｉＯ2が
ある。Further, generally, dielectric layers are provided above and below the recording layer. The primary purpose of this dielectric layer is to:
The purpose of the present invention is to protect the substrate from the heat of the recording layer that instantaneously rises to a temperature higher than the melting point and to prevent the recording layer from being deformed or damaged. A second object is to obtain a sufficient signal intensity at the time of reproducing recorded information by an optical interference effect. Further, a third object is to realize a cooling rate suitable for forming a good-shaped amorphous mark during recording.
Therefore, characteristics such as sufficient heat resistance, a large refractive index, and an appropriate thermal conductivity are required for the dielectric material. As these conditions are satisfied materials, for example, a ZnS-SiO 2.
【０００５】一般的な消去型の光学情報記録媒体１０の
断面図を図２に示す。透明基板１は中心孔９及び複数の
環状の案内溝２を有する円盤状である。透明基板１上に
は順に、ＺｎＳ−ＳｉＯ２薄膜からなる膜厚約１００nm
の下引層３、ＧｅＳｂＴｅ合金薄膜からなる膜厚約２０
nmの記録層４、ＺｎＳ−ＳｉＯ2薄膜からなる膜厚約２
０nmの上引層５、Ａｌ合金薄膜からなる膜厚約１００nm
の反射層６が、スパッタリングによって形成され、さら
にその上に樹脂保護層７が設けられている。この光学情
報記録媒体の記録特性は各層の膜厚に大きく依存し、特
に下引層３、記録層４の膜厚のばらつきによる影響が大
きい。そのため、製造に当たっては、これらの膜厚を正
確に管理する必要がある。FIG. 2 is a sectional view of a general erasable optical information recording medium 10. The transparent substrate 1 has a disk shape having a center hole 9 and a plurality of annular guide grooves 2. On the transparent substrate 1, a ZnS-SiO2 thin film having a thickness of about 100 nm
Undercoat layer 3, a film thickness of about 20 made of a GeSbTe alloy thin film
recording layer 4 having a thickness of about 2 formed of a ZnS-SiO 2 thin film.
0 nm overcoat layer 5, about 100 nm thick made of Al alloy thin film
Is formed by sputtering, and a resin protective layer 7 is further provided thereon. The recording characteristics of this optical information recording medium greatly depend on the film thickness of each layer, and in particular, the influence of the variation in the film thickness of the undercoat layer 3 and the recording layer 4 is great. Therefore, it is necessary to accurately control these film thicknesses in manufacturing.
【０００６】従来、上記光学情報記録媒体１０の主要部
分である各薄膜層の製膜工程において、各層の膜厚管理
のために、各層毎に所定の条件下でスパッタリングによ
って一定時間成膜したサンプルを定期的に作成し、その
膜厚を段差計またはエリプソメータによって測定し、そ
の測定結果から得られた成膜速度をもとに所望の膜厚が
得られるよう成膜時間を補正する方法が採用されてい
る。Conventionally, in the process of forming each thin film layer, which is a main part of the optical information recording medium 10, a sample formed by sputtering for a certain period of time under predetermined conditions for each layer in order to control the thickness of each layer. Is periodically created, the film thickness is measured by a step gauge or ellipsometer, and the film formation time is corrected so that the desired film thickness can be obtained based on the film formation speed obtained from the measurement result. Have been.
【０００７】[0007]
【発明が解決しょうとする課題】しかしながら、上記従
来の方法によれば、光学情報記録媒体１０を構成する各
薄膜層と同数の成膜速度測定用サンプルを作成し、各層
毎にその膜厚を測定する必要があり、工程が複雑になる
と共に、成膜に時間を要するという問題点を有してい
た。また、バッチ式のスパッタリングによって成膜を行
う場合、サンプル作成のバッチでは光学情報記録媒体を
生産することができず、成膜速度の測定に伴う生産ロス
が大きいという問題点を有していた。さらに、サンプル
作成のために一時的に製造条件を変える必要があること
や、各サンプルを段差計やエリプソメータでの測定に適
した膜厚で成膜するため実際の媒体の構造とは異なる膜
厚で成膜速度を算出することになり、誤差を伴うという
問題点を有していた。However, according to the above-mentioned conventional method, the same number of thin film layers as the number of thin film layers constituting the optical information recording medium 10 are prepared, and the number of samples for measuring the film thickness is determined for each layer. There is a problem that measurement is required, the process becomes complicated, and time is required for film formation. In addition, when film formation is performed by batch-type sputtering, an optical information recording medium cannot be produced in a batch for preparing a sample, and there is a problem that a production loss accompanying measurement of a film formation speed is large. Furthermore, it is necessary to temporarily change manufacturing conditions for sample preparation, and each sample is formed with a film thickness suitable for measurement with a step gauge or ellipsometer. In this case, the film formation rate is calculated, and there is a problem that an error is involved.
【０００８】本発明は上記従来の問題点を解決するため
になされたものであり、１回の測定で複数の薄膜層の膜
厚測定が可能な多層薄膜の膜厚測定方法、及びその膜厚
測定方法を用いて、成膜速度測定用サンプルの作成によ
る生産ロスが少なく、製造条件の一時的な変更の必要の
ない光学情報記録媒体の製造方法及び光学情報記録媒体
の製造装置を提供することを目的とする。SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned conventional problems, and a method for measuring the thickness of a multilayer thin film capable of measuring the thickness of a plurality of thin film layers by one measurement, and the thickness thereof. To provide a method for manufacturing an optical information recording medium and an apparatus for manufacturing an optical information recording medium, in which a production loss due to creation of a sample for measuring a film formation rate is small by using a measuring method, and there is no need to temporarily change manufacturing conditions. With the goal.
【０００９】[0009]
【課題を解決するための手段】上記目的を達成するた
め、本発明の光記録媒体の製造方法は、基板上に設けら
れたそれぞれ光学定数の異なる複数の薄膜からなる多層
薄膜の膜厚測定方法であって、前記多層薄膜の分光反射
率を測定し、測定結果から極値を検出し、その極大値に
おける波長とその標準値との差異に基づいて、多層薄膜
の分光反射率を測定する側から第１番目の薄膜の膜厚を
求める。In order to achieve the above object, a method for manufacturing an optical recording medium according to the present invention comprises a method for measuring the thickness of a multilayer thin film comprising a plurality of thin films having different optical constants provided on a substrate. Measuring the spectral reflectance of the multilayer thin film, detecting an extreme value from the measurement result, and measuring the spectral reflectance of the multilayer thin film based on the difference between the wavelength at the maximum value and the standard value. From this, the thickness of the first thin film is obtained.
【００１０】さらに、分光反射率の測定結果の極大値と
極小値における反射率差とその標準値との差異及び多層
薄膜の分光反射率を測定する側から第１番目の薄膜の膜
厚に基づいて、多層薄膜の分光反射率を測定する側から
第２番目の薄膜の膜厚を求める。Further, based on the difference between the reflectance difference between the maximum value and the minimum value of the measurement result of the spectral reflectance and the standard value and the thickness of the first thin film from the side where the spectral reflectance of the multilayer thin film is measured. Then, the thickness of the second thin film from the side where the spectral reflectance of the multilayer thin film is measured is determined.
【００１１】一方、本発明における光学情報記録媒体の
製造方法は、基板上に設けられたそれぞれ光学定数の異
なる複数の薄膜からなる多層薄膜を有する光学情報記録
媒体の製造方法であって、基板又はサンプル片上に前記
複数の薄膜をそれぞれ所定の成膜速度と成膜時間により
順次成膜する工程と、成膜後の基板又はサンプル片上の
多層薄膜の分光反射率を測定する工程と、前記分光反射
率の測定結果から極値を検出しその極大値における波長
とその標準値との差異に基づいて分光反射率を測定する
側から第１番目の薄膜の膜厚を推定する工程と、前記第
１番目の薄膜の膜厚の推定値と所望の膜厚との差異に応
じて前記第１番目の薄膜の成膜速度及び成膜時間の少な
くとも一方を補正する工程と、新たな基板上に前記複数
の薄膜をそれぞれ補正された成膜速度及び成膜時間によ
り順次成膜する工程とを備えている。On the other hand, a method for manufacturing an optical information recording medium according to the present invention is a method for manufacturing an optical information recording medium having a multilayer thin film formed of a plurality of thin films having different optical constants provided on a substrate. A step of sequentially forming the plurality of thin films on the sample piece at a predetermined film formation rate and a film formation time respectively; a step of measuring a spectral reflectance of the multilayer thin film on the substrate or the sample piece after the film formation; Detecting an extreme value from the measurement result of the reflectance, and estimating the thickness of the first thin film from the side where the spectral reflectance is measured based on the difference between the wavelength at the maximum value and the standard value; Correcting at least one of the film forming speed and the film forming time of the first thin film according to the difference between the estimated value of the film thickness of the second thin film and the desired film thickness; Each thin film And a step of sequentially formed by deposition rate and the deposition time was Tadashisa.
【００１２】上記方法において、さらに、分光反射率の
極大値と極小値における反射率差の標準値との差異及び
分光反射率を測定する側から第１番目の薄膜の膜厚から
分光反射率を測定する側から第２番目の薄膜の膜厚を推
定し、これによって求められた膜厚の推定値と所望の膜
厚との差異に応じて前記第２番目の薄膜の成膜速度及び
成膜時間の少なくとも一方を補正する工程を備えている
ことが好ましい。In the above method, the spectral reflectance is further determined from the difference between the standard value of the reflectance difference between the maximum value and the minimum value of the spectral reflectance and the thickness of the first thin film from the side where the spectral reflectance is measured. The thickness of the second thin film is estimated from the side to be measured, and the film forming rate and the film forming of the second thin film are determined according to the difference between the estimated value of the film thickness thus obtained and the desired film thickness. It is preferable to include a step of correcting at least one of the times.
【００１３】また、本発明における別の光学情報記録媒
体の製造方法は、基板上に設けられたそれぞれ光学定数
の異なる複数の薄膜からなる多層薄膜を有する光学情報
記録媒体の製造方法であって、基板又はサンプル片上に
前記複数の薄膜をそれぞれ所定の成膜速度と成膜時間に
より順次成膜する工程と、成膜後の基板又はサンプル片
上の多層薄膜の分光反射率を測定する工程と、前記分光
反射率の測定結果から極値を検出しその極大値における
波長とその標準値との差異に基づいて分光反射率を測定
する側から第１番目の薄膜の膜厚を推定する工程と、前
記第１番目の薄膜の膜厚の推定値と所望の膜厚との差異
に基づいて基板上に形成された多層薄膜の良否を判定し
選別する工程とを備えている。Further, another method of manufacturing an optical information recording medium according to the present invention is a method of manufacturing an optical information recording medium having a multilayer thin film formed of a plurality of thin films having different optical constants provided on a substrate, A step of sequentially forming the plurality of thin films on a substrate or a sample piece at a predetermined film forming rate and a film forming time, and a step of measuring the spectral reflectance of the multilayer thin film on the substrate or the sample piece after the film formation; Detecting the extreme value from the measurement result of the spectral reflectance, and estimating the thickness of the first thin film from the side where the spectral reflectance is measured based on the difference between the wavelength at the maximum value and the standard value; A step of judging the quality of the multilayer thin film formed on the substrate based on the difference between the estimated value of the thickness of the first thin film and the desired thickness and selecting the same.
【００１４】上記方法において、さらに、分光反射率の
極大値と極小値における反射率差の標準値との差異及び
分光反射率を測定する側から第１番目の薄膜の膜厚から
分光反射率を測定する側から第２番目の薄膜の膜厚を推
定し、これによって求められた膜厚の推定値と所望の膜
厚との差異にも基づいて基板上に形成された多層薄膜の
良否を判定し選別する工程を備えていることが好まし
い。In the above method, the spectral reflectance is further determined from the difference between the standard value of the reflectance difference between the maximum value and the minimum value of the spectral reflectance and the thickness of the first thin film from the side where the spectral reflectance is measured. The thickness of the second thin film is estimated from the side to be measured, and the quality of the multilayer thin film formed on the substrate is determined based on the difference between the estimated value of the thickness and the desired thickness. It is preferable to include a step of sorting.
【００１５】また、上記各方法において、分光反射率を
測定する際の各測定波長の間隔が５ｎｍ以下であること
が好ましい。In each of the above methods, it is preferable that the interval between each measurement wavelength when measuring the spectral reflectance is 5 nm or less.
【００１６】また、本発明の光学情報記録媒体の製造装
置は、基板上に設けられたそれぞれ光学定数の異なる複
数の薄膜からなる多層薄膜を有する光学情報記録媒体の
製造装置であって、基板又はサンプル片上に前記複数の
薄膜をそれぞれ所定の成膜速度及び成膜時間により順次
成膜する手段と、成膜後の基板又はサンプル片上の多層
薄膜の分光反射率を測定する手段と、前記分光反射率の
測定結果から極値を検出しその極大値における波長とそ
の標準値との差異に基づいて分光反射率を測定する側か
ら第１番目の薄膜の膜厚を推定する手段と、これによっ
て求められた膜厚の推定値と所望の膜厚との差異に応じ
て前記第１番目の薄膜の成膜速度及び成膜時間の少なく
とも一方を補正する手段とを備えている。Further, the apparatus for manufacturing an optical information recording medium according to the present invention is an apparatus for manufacturing an optical information recording medium having a multilayer thin film comprising a plurality of thin films having different optical constants provided on a substrate. Means for sequentially forming the plurality of thin films on the sample piece at predetermined film forming rates and film forming times, means for measuring the spectral reflectance of the multilayer thin film on the substrate or the sample piece after film formation, and Means for detecting an extreme value from the measurement result of the reflectance and estimating the thickness of the first thin film from the side for measuring the spectral reflectance based on the difference between the wavelength at the maximum value and the standard value; Means for correcting at least one of the film forming speed and the film forming time of the first thin film in accordance with the difference between the obtained estimated film thickness and the desired film thickness.
【００１７】上記製造装置において、さらに、分光反射
率の極大値と極小値における反射率差の標準値との差異
及び分光反射率を測定する側から第１番目の薄膜の膜厚
から分光反射率を測定する側から第２番目の薄膜の膜厚
を推定する手段と、これによって求められた膜厚の推定
値と所望の膜厚との差異に応じて前記第２番目の薄膜の
成膜速度及び成膜時間の少なくとも一方を補正する手段
を備えることが好ましい。In the above manufacturing apparatus, the difference between the maximum value of the spectral reflectance and the standard value of the reflectance difference between the minimum value and the spectral reflectance is determined from the thickness of the first thin film from the side where the spectral reflectance is measured. Means for estimating the thickness of the second thin film from the side from which the second thin film is measured, and the deposition rate of the second thin film in accordance with the difference between the estimated value of the thickness obtained by this and the desired thickness. It is preferable to provide a means for correcting at least one of the film formation time and the film formation time.
【００１８】また、本発明の別の光学情報記録媒体の製
造装置は、基板上に設けられたそれぞれ光学定数の異な
る複数の薄膜からなる多層薄膜を有する光学情報記録媒
体の製造装置であって、基板又はサンプル片上に前記複
数の薄膜をそれぞれ所定の成膜速度及び成膜時間により
順次成膜する手段と、成膜後の基板又はサンプル片上の
多層薄膜の分光反射率を測定する手段と、前記分光反射
率の測定結果から極値を検出しその極大値における波長
とその標準値との差異に基づいて分光反射率を測定する
側から第１番目の薄膜の膜厚を推定する手段と、これに
よって求められた膜厚の推定値と所望の膜厚との差異に
基づいて基板上に形成された多層薄膜の良否を判定し選
別する手段とを備えている。Further, another apparatus for manufacturing an optical information recording medium according to the present invention is an apparatus for manufacturing an optical information recording medium having a multilayer thin film comprising a plurality of thin films having different optical constants provided on a substrate, Means for sequentially forming the plurality of thin films on a substrate or sample piece at a predetermined film formation rate and film formation time, means for measuring the spectral reflectance of the multilayer thin film on the substrate or sample piece after film formation, Means for detecting an extreme value from the measurement result of the spectral reflectance and estimating the thickness of the first thin film from the side for measuring the spectral reflectance based on the difference between the wavelength at the maximum value and the standard value; Means for judging the quality of the multilayer thin film formed on the substrate based on the difference between the estimated value of the film thickness obtained by the above and the desired film thickness and selecting the same.
【００１９】上記製造装置において、さらに、分光反射
率の極大値と極小値における反射率差の標準値との差異
及び分光反射率を測定する側から第１番目の薄膜の膜厚
から分光反射率を測定する側から第２番目の薄膜の膜厚
を推定する手段と、これによって求められた膜厚の推定
値と所望の膜厚との差異にも基づいて基板上に形成され
た多層薄膜の良否を判定し選別する手段とを備えること
が好ましい。In the above-described manufacturing apparatus, the difference between the maximum value and the minimum value of the spectral reflectance and the standard value of the reflectance difference and the spectral reflectance from the thickness of the first thin film from the side where the spectral reflectance is measured. Means for estimating the thickness of the second thin film from the side for measuring the thickness of the second thin film; It is preferable to include means for judging pass / fail and selecting.
【００２０】また、上記各製造装置において、分光反射
率を測定する際の各測定波長の間隔が５ｎｍ以下である
ことが好ましい。In each of the above-mentioned manufacturing apparatuses, it is preferable that an interval between each measurement wavelength when measuring the spectral reflectance is 5 nm or less.
【００２１】[0021]
【発明の実施の形態】以下に、本発明の実施の形態を図
面を参照しながら説明する。Embodiments of the present invention will be described below with reference to the drawings.
【００２２】本発明は、多層薄膜の各層の膜厚が変化す
ると分光反射率特性が変化することに着目し、各膜厚の
変化に対応して分光反射率の極大点及び極小点の波長、
反射率が特有の変化をすることに基づき、非破壊で多層
薄膜の膜厚を測定するものである。The present invention focuses on the fact that the spectral reflectance characteristics change as the thickness of each layer of the multilayer thin film changes, and the wavelength of the maximum point and the minimum point of the spectral reflectance corresponding to the change of each film thickness,
The thickness of the multilayer thin film is measured nondestructively based on a specific change in the reflectance.
【００２３】（第１の実施形態）第１の実施形態は、多
層薄膜の膜厚測定方法及びその膜厚測定方法を用いた光
学情報記録媒体の製造方法に関するものであり、図１か
ら図３を参照しつつ説明する。(First Embodiment) The first embodiment relates to a method for measuring the thickness of a multilayer thin film and a method for manufacturing an optical information recording medium using the method for measuring the thickness of a multilayer thin film. This will be described with reference to FIG.
【００２４】図１は本発明の光学情報記録媒体の製造方
法の要部を示すフローチャートである。図２は、前述の
一般的な消去型の光学情報記録媒体の断面図である。ま
た、図３は図２に示す構成を有する光学情報記録媒体の
分光器による分光反射率の測定結果の一例を示す特性図
である。FIG. 1 is a flowchart showing a main part of a method for manufacturing an optical information recording medium according to the present invention. FIG. 2 is a sectional view of the above-mentioned general erasable optical information recording medium. FIG. 3 is a characteristic diagram showing an example of the measurement result of the spectral reflectance of the optical information recording medium having the configuration shown in FIG. 2 by the spectroscope.
【００２５】図１に示すように、まず、所定の条件下で
の各層の成膜時間を設定する（Ｓ１）。次に、この成膜
時間にしたがって透明基板１上に下引層３、記録層４、
上引層５、反射層６の順に成膜する（Ｓ１〜Ｓ５）。そ
の後、分光器によって基板側からの分光反射率を測定波
長範囲３５０〜８６０ｎｍ、波長間隔５ｎｍで測定する
（Ｓ６）。図３にこの測定結果を示す。As shown in FIG. 1, first, a film formation time of each layer under predetermined conditions is set (S1). Next, the undercoat layer 3, the recording layer 4,
An overcoat layer 5 and a reflective layer 6 are formed in this order (S1 to S5). Thereafter, the spectral reflectance from the substrate side is measured with a spectroscope at a measurement wavelength range of 350 to 860 nm and a wavelength interval of 5 nm (S6). FIG. 3 shows the measurement results.
【００２６】次に、得られた分光反射率の極大点及び極
小点を検出する（Ｓ７、Ｓ１３）。極大点の波長λを測
定し（Ｓ８）、あらかじめ定められた標準値と比較し、
その差異Δλを求める（Ｓ９）。これと平行して、極大
点の反射率Ｒｍａｘ及び極小点の反射率Ｒｍｉｎを測定
し、この反射率差Ｒｍａｘ−Ｒｍｉｎをあらかじめ定め
られた標準値と比較し、その差異Δ（Ｒｍａｘ−Ｒｍｉ
ｎ）を求める（Ｓ１２、Ｓ１４、Ｓ１５、Ｓ１６）。こ
こで、標準値とは、各薄膜層が本来の設計値どうりの膜
厚に形成されている場合の、分光反射率の極大点におけ
る波長及び極大点と極小点の反射率差をいう。これらは
あらかじめ実験的に、あるいは計算上求めておくことが
できる。Next, the maximum point and the minimum point of the obtained spectral reflectance are detected (S7, S13). The wavelength λ of the maximum point is measured (S8) and compared with a predetermined standard value,
The difference Δλ is obtained (S9). In parallel with this, the reflectance Rmax at the maximum point and the reflectance Rmin at the minimum point are measured, the reflectance difference Rmax−Rmin is compared with a predetermined standard value, and the difference Δ (Rmax−Rmi) is measured.
n) (S12, S14, S15, S16). Here, the standard value refers to the wavelength at the local maximum point of the spectral reflectance and the reflectance difference between the local maximum point and the local minimum point when each of the thin film layers is formed to have a film thickness similar to the original design value. These can be obtained in advance experimentally or by calculation.
【００２７】次に、この測定結果をもとに、光学情報記
録媒体１０の下引層３、記録層４の膜厚を算出する（Ｓ
１０、Ｓ１７）。その算出方法は、以下の通りである。Next, based on the measurement results, the thicknesses of the undercoat layer 3 and the recording layer 4 of the optical information recording medium 10 are calculated (S
10, S17). The calculation method is as follows.
【００２８】下引層３の膜厚の標準値である１００ｎｍ
との差ｘ（％）、記録層の膜厚の標準値である２０ｎｍ
との差ｙ（％）を、以下に示す式（１）、（２）に従っ
て算出する。The standard value of the thickness of the undercoat layer 3 is 100 nm.
X (%), 20 nm which is a standard value of the thickness of the recording layer.
Is calculated according to the following equations (1) and (2).
【００２９】[0029]
【数１】 Δλ＝ａｘ ・・・（１）Δλ = ax (1)
【００３０】[0030]
【数２】 Δ（Ｒｍａｘ−Ｒｍｉｎ）＝ｂｘ＋ｃｙ ・・・（２） 上記関係式は、下引層３が厚くなるとλが長波長側にず
れ、薄くなると短波長側にずれ、下引層３の膜厚が一定
であれば、記録層４及び上引層５の膜厚が変化してもλ
はほぼ一定であること、下引層３及び記録層４の膜厚が
変化するとＲｍａｘ−Ｒｍｉｎが変化することから導か
れたものである。Δ (Rmax−Rmin) = bx + cy (2) In the above relational expression, λ shifts to the longer wavelength side when the undercoat layer 3 is thicker, shifts to the shorter wavelength side when the undercoat layer 3 is thinner, and Is constant, the film thickness of the recording layer 4 and the overcoat layer 5 changes even if
Is substantially constant, and is derived from the fact that Rmax-Rmin changes when the film thickness of the undercoat layer 3 and the recording layer 4 changes.
【００３１】ただし、定数ａ＝２．５、ｂ＝−０．２
２、ｃ＝０．３４である。ここで、ｘ、ｙは、各層膜厚
の標準値との差異の標準値に対する比率である。各定数
は、各層の膜厚を実験的に変化させた場合の分光反射率
から求めることができる。また、各層薄膜の各波長にお
ける光学定数がわかっている場合には、多重干渉による
反射率を算出することによって求めることもできる。こ
の定数は各層膜厚の標準値によって異なる。Where constants a = 2.5 and b = −0.2
2, c = 0.34. Here, x and y are the ratios of the difference from the standard value of each layer thickness to the standard value. Each constant can be obtained from the spectral reflectance when the film thickness of each layer is experimentally changed. In addition, when the optical constant at each wavelength of each layer thin film is known, it can be obtained by calculating the reflectance due to multiple interference. This constant depends on the standard value of each layer thickness.
【００３２】以上のようにして算出された各層の膜厚と
その目標値との差異に応じて、所望の膜厚になるように
成膜時間を変更して（Ｓ１１、Ｓ１８）、以後の生産を
行う。In accordance with the difference between the thickness of each layer calculated as described above and the target value, the film formation time is changed to a desired film thickness (S11, S18), and the subsequent production I do.
【００３３】その結果、従来例における各層毎の成膜速
度測定用サンプルを作成する必要が無く、生産ロスを低
減することができる。特にバッチ式のスパッタリングに
よって成膜を行う場合にはその効果が顕著である。ま
た、サンプル作成のために一時的に製造条件を変える必
要がなく、２層の膜厚を同時に測定することにより成膜
速度測定に要する時間が短縮できるため、製造ラインを
より効率的に稼働することができる。さらに、実際の媒
体の構造で膜厚を測定することができるので、製造した
媒体の良否を判定し、選別することも可能である。As a result, it is not necessary to prepare a sample for measuring the film forming speed for each layer in the conventional example, and the production loss can be reduced. In particular, when the film is formed by batch-type sputtering, the effect is remarkable. Further, it is not necessary to temporarily change the manufacturing conditions for sample preparation, and the time required for the film forming speed measurement can be reduced by simultaneously measuring the film thicknesses of the two layers, so that the manufacturing line operates more efficiently. be able to. Further, since the film thickness can be measured by the actual structure of the medium, it is possible to judge the quality of the manufactured medium and select the medium.
【００３４】（第２の実施形態）第２の実施形態は、上
記多層薄膜の膜厚測定方法を用いた光学情報記録媒体の
製造装置に関するものであり、図２及び図４を参照しつ
つ説明する。(Second Embodiment) The second embodiment relates to an apparatus for manufacturing an optical information recording medium using the method for measuring the thickness of a multilayer thin film, and will be described with reference to FIGS. I do.
【００３５】図４に示す光学情報記録媒体の製造装置２
０は、基板投入室１１、下引層成膜室１２、記録層成膜
室１３、上引層成膜室１４、反射層成膜室１５、基板排
出室１６、分光器１７、演算処理装置１８及び成膜条件
制御装置１９で構成されている。An optical information recording medium manufacturing apparatus 2 shown in FIG.
0 denotes a substrate input chamber 11, an undercoat layer deposition chamber 12, a recording layer deposition chamber 13, an overcoat layer deposition chamber 14, a reflective layer deposition chamber 15, a substrate discharge chamber 16, a spectroscope 17, and an arithmetic processing unit. 18 and a film forming condition control device 19.
【００３６】以上のように構成された光学情報記録媒体
の製造装置について、その動作を説明する。基板投入室
１１から光学情報記録媒体１０の透明基板１を投入し、
下引層成膜室１２、記録層成膜室１３、上引層成膜室１
４及び反射層成膜室１５において、それぞれ下引層３、
記録層４、上引層５及び反射層６を順次形成する。その
後、各層の薄膜が形成された基板１’を基板排出室１６
から取り出す。各成膜室１２〜１５では、成膜条件制御
装置１９によってガス流量、圧力、電力及び時間がそれ
ぞれ所定の値に制御され、その条件の下でスパッタリン
グにより成膜が行われる。The operation of the apparatus for manufacturing an optical information recording medium configured as described above will be described. The transparent substrate 1 of the optical information recording medium 10 is loaded from the substrate loading chamber 11,
Undercoat layer deposition chamber 12, recording layer deposition chamber 13, upper underlayer deposition chamber 1
4 and the reflective layer deposition chamber 15, the undercoat layer 3,
A recording layer 4, an overcoat layer 5, and a reflective layer 6 are sequentially formed. Thereafter, the substrate 1 ′ on which the thin films of the respective layers are formed is removed from the substrate discharge chamber 16.
Remove from In each of the film forming chambers 12 to 15, the gas flow rate, the pressure, the power, and the time are controlled to predetermined values by the film forming condition control device 19, and the film is formed by sputtering under the conditions.
【００３７】分光器１７は、成膜された基板１’の成膜
した面の反対側から分光反射率を測定する。演算処理装
置１８は、例えばＣＰＵ、メモリ等を含み、分光器１７
によって測定した分光反射率の極大点及び極小点を検出
するプロセスと、極大点における波長λをあらかじめ定
められた標準値と比較し、その差異Δλを求めるプロセ
スと、極大点と極小点におけるの反射率の差Ｒｍａｘ−
Ｒｍｉｎをあらかじめ定められた標準値と比較し、その
差異Δ（Ｒｍａｘ−Ｒｍｉｎ）を求めるプロセスと、前
記Δλから上記所定の計算式により当該光学情報記録媒
体１０の下引層３の膜厚と標準値との差異を算出するプ
ロセスと、前記Δ（Ｒｍａｘ−Ｒｍｉｎ）と下引層３の
膜厚とから上記所定の計算式により当該光記録媒体１０
の記録層４の膜厚と標準値との差異を算出するプロセス
と、各層の膜厚と標準値との差異をもとに所望の膜厚と
なる成膜時間を算出するプロセスを有しており、その計
算結果に基づいて成膜条件制御装置１９で設定されてい
る成膜時間を変更する。The spectroscope 17 measures the spectral reflectance from the side opposite to the surface on which the film is formed of the film-formed substrate 1 '. The arithmetic processing device 18 includes, for example, a CPU, a memory, and the like.
Detecting the maximum point and the minimum point of the spectral reflectance measured by the method, comparing the wavelength λ at the maximum point with a predetermined standard value, and determining the difference Δλ, and the reflection at the maximum point and the minimum point. Rate difference Rmax-
Rmin is compared with a predetermined standard value to determine a difference Δ (Rmax−Rmin); and the film thickness of the undercoat layer 3 of the optical information recording medium 10 and the standard The optical recording medium 10 is calculated from the process of calculating the difference between the values and the Δ (Rmax−Rmin) and the thickness of the undercoat layer 3 according to the above-mentioned predetermined formula.
A process of calculating the difference between the film thickness of the recording layer 4 and the standard value, and a process of calculating the film formation time to obtain a desired film thickness based on the difference between the film thickness of each layer and the standard value. Then, the film forming time set by the film forming condition control device 19 is changed based on the calculation result.
【００３８】この製造装置によれば、各層毎に成膜速度
測定用サンプルを作成する必要が無く、生産ロスを低減
することができる。特に、バッチ式のスパッタリングに
よって成膜を行う場合に、その効果が顕著である。ま
た、サンプル作成のために一時的に製造条件を変える必
要がなく、２層の膜厚を同時に測定することにより成膜
速度測定に要する時間が短縮できるため、製造ラインを
より効率的に稼働させることができる。さらに、実際の
媒体の構造で膜厚を測定することができるので、製造し
た媒体の良否を判定し、選別することも可能である。According to this manufacturing apparatus, it is not necessary to prepare a sample for measuring the film forming speed for each layer, and the production loss can be reduced. In particular, when the film is formed by batch type sputtering, the effect is remarkable. In addition, it is not necessary to temporarily change the manufacturing conditions for sample preparation, and by simultaneously measuring the film thicknesses of the two layers, the time required for measuring the film forming speed can be reduced, so that the manufacturing line can be operated more efficiently. be able to. Further, since the film thickness can be measured by the actual structure of the medium, it is possible to judge the quality of the manufactured medium and select the medium.
【００３９】なお、上記各実施形態の説明において、各
層の薄膜を所望の膜厚にするために成膜時間を変更した
が、スパッタリングの電力、すなわち成膜速度を変更し
ても良い。また、光学情報記録媒体そのものの分光反射
率を測定する代わりに、同時に別の基板に成膜したサン
プルの分光反射率を測定しても良い。分光反射率の測定
は、一定の製造枚数毎に行っても良いし、１枚毎に行っ
ても良い。In the description of each of the above embodiments, the film forming time is changed in order to make the thin film of each layer a desired film thickness. However, the power of sputtering, that is, the film forming speed may be changed. Instead of measuring the spectral reflectance of the optical information recording medium itself, the spectral reflectance of a sample formed on another substrate may be measured at the same time. The measurement of the spectral reflectance may be performed for each fixed number of sheets manufactured, or may be performed for each sheet.
【００４０】また、分光反射率の測定波長間隔が大きい
と膜厚の測定精度が悪くなる。例えば下引層３の場合λ
の差１０ｎｍが膜厚の約５％に相当する。したがって、
必要とする膜厚の測定精度を５％とすると、測定波長間
隔はその半分の５ｎｍ以下とすることが好ましい。If the wavelength interval for measuring the spectral reflectance is large, the accuracy of measuring the film thickness is deteriorated. For example, in the case of the undercoat layer 3, λ
10 nm corresponds to about 5% of the film thickness. Therefore,
Assuming that the required film thickness measurement accuracy is 5%, it is preferable that the measurement wavelength interval is half or less, that is, 5 nm or less.
【００４１】このように、本発明における光学情報記録
媒体の第１の製造方法は、基板上に設けられたそれぞれ
光学定数の異なる複数の薄膜からなる多層薄膜を有する
光学情報記録媒体の製造方法であって、基板又はサンプ
ル片上に前記複数の薄膜をそれぞれ所定の成膜速度及び
成膜時間により順次成膜する工程と、成膜後の基板又は
サンプル片上の多層薄膜の分光反射率を測定する工程
と、前記分光反射率の測定結果から極値を検出しその極
大値における波長とその標準値との差異に基づいて分光
反射率を測定する側から第１番目の薄膜（下引層）の膜
厚を推定する工程と、分光反射率の極大値と極小値にお
ける反射率差の標準値との差異及び分光反射率を測定す
る側から第１番目の薄膜（下引層）の膜厚から分光反射
率を測定する側から第２番目の薄膜（記録層）の膜厚を
推定する工程と、前記第１番目及び第２番目の薄膜の膜
厚の推定値と所望の膜厚との差異に応じて前記第１番目
及び第２番目の薄膜の成膜速度及び成膜時間の少なくと
も一方を補正する工程と、新たな基板上に前記複数の薄
膜をそれぞれ補正された成膜速度及び成膜時間により順
次成膜する工程とを備えている。すなわち、上記多層薄
膜の膜厚測定方法を用いて、最初に成膜した基板又は基
板と同時に成膜したサンプル片の膜厚を直接測定するこ
とにより、１回の測定で複数の薄膜の膜厚をそれぞれ測
定することができ、膜厚測定に要する時間を短縮するこ
とができ、成膜速度測定に要する時間が短縮できる。ま
た、実際の媒体の構造で膜厚を測定することができるの
で、サンプル作成のために一時的に製造条件を変える必
要がない。したがって、製造ラインをより効率的に稼働
させることができ、生産ロスを低減することができる。
特に、バッチ式のスパッタリングにより成膜する場合に
顕著な効果を奏する。As described above, the first method for manufacturing an optical information recording medium according to the present invention is a method for manufacturing an optical information recording medium having a multilayer thin film composed of a plurality of thin films having different optical constants provided on a substrate. A step of sequentially forming the plurality of thin films on a substrate or a sample piece at a predetermined film forming speed and a predetermined film forming time, and a step of measuring a spectral reflectance of the multilayer thin film on the substrate or the sample piece after the film formation. A first thin film (undercoat layer) from the side for detecting an extreme value from the measurement result of the spectral reflectance and measuring the spectral reflectance based on a difference between the wavelength at the maximum value and the standard value. Estimating the thickness and analyzing the spectral reflectance from the difference between the standard value of the reflectance difference between the maximum value and the minimum value, and the thickness of the first thin film (undercoat layer) from the side where the spectral reflectance is measured. From the side where the reflectance is measured Estimating the thickness of the second thin film (recording layer); and determining the first and second thicknesses according to a difference between the estimated value of the thickness of the first and second thin films and a desired thickness. A step of correcting at least one of the film forming speed and the film forming time of the second thin film, and a step of sequentially forming the plurality of thin films on a new substrate with the corrected film forming speed and the film forming time. Have. That is, the thickness of a plurality of thin films can be measured in one measurement by directly measuring the thickness of a substrate formed first or a sample piece formed simultaneously with the substrate by using the method for measuring the thickness of a multilayer thin film. Can be measured individually, the time required for film thickness measurement can be reduced, and the time required for film deposition rate measurement can be reduced. Further, since the film thickness can be measured with the actual medium structure, there is no need to temporarily change the manufacturing conditions for preparing a sample. Therefore, the production line can be operated more efficiently, and the production loss can be reduced.
In particular, a remarkable effect is obtained when the film is formed by batch-type sputtering.
【００４２】また、本発明における光学情報記録媒体の
第２の製造方法は、基板上に設けられたそれぞれ光学定
数の異なる複数の薄膜からなる多層薄膜を有する光学情
報記録媒体の製造方法であって、基板又はサンプル片上
に前記複数の薄膜をそれぞれ所定の成膜速度及び成膜時
間により順次成膜する工程と、成膜後の基板又はサンプ
ル片上の多層薄膜の分光反射率を測定する工程と、前記
分光反射率の測定結果から極値を検出しその極大値にお
ける波長とその標準値との差異に基づいて分光反射率を
測定する側から第１番目の薄膜（下引層）の膜厚を推定
する工程と、分光反射率の極大値と極小値における反射
率差の標準値との差異及び分光反射率を測定する側から
第１番目の薄膜（下引層）の膜厚から分光反射率を測定
する側から第２番目の薄膜（記録層）の膜厚を推定する
工程と、前記第１番目及び第２番目の薄膜の膜厚の推定
値と所望の膜厚との差異に基づいて基板上に形成された
多層薄膜の良否を判定し選別する工程とを備えている。
したがって、実際に製造した光学情報記録媒体の膜厚を
直接測定することができるので、製造した光学情報記録
媒体の良否を判定し、選別することが可能である。A second method for manufacturing an optical information recording medium according to the present invention is a method for manufacturing an optical information recording medium having a multilayer thin film formed of a plurality of thin films having different optical constants provided on a substrate. A step of sequentially forming the plurality of thin films on a substrate or sample piece at a predetermined film forming rate and a film forming time, and a step of measuring the spectral reflectance of the multilayer thin film on the substrate or sample piece after film formation, An extreme value is detected from the measurement result of the spectral reflectance, and the thickness of the first thin film (undercoat layer) from the side where the spectral reflectance is measured is determined based on the difference between the wavelength at the maximum value and the standard value. Estimating process, spectral reflectance from difference between standard value of reflectance difference between maximum value and minimum value of spectral reflectance and thickness of first thin film (undercoat layer) from the side where spectral reflectance is measured Second from the side measuring Estimating the thickness of the thin film (recording layer) of the first and second thin films, and the multilayer thin film formed on the substrate based on a difference between the estimated value of the thickness of the first and second thin films and a desired thickness. And a step of judging pass / fail and sorting.
Therefore, the thickness of the actually manufactured optical information recording medium can be directly measured, so that the quality of the manufactured optical information recording medium can be determined and sorted.
【００４３】一方、本発明における光学情報記録媒体の
第１の製造装置は、基板上に設けられたそれぞれ光学定
数の異なる複数の薄膜からなる多層薄膜を有する光学情
報記録媒体の製造装置であって、基板又はサンプル片上
に前記複数の薄膜をそれぞれ所定の成膜速度及び成膜時
間により順次成膜する手段と、成膜後の基板又はサンプ
ル片上の多層薄膜の分光反射率を測定する手段と、前記
分光反射率の測定結果から極値を検出しその極大値にお
ける波長とその標準値との差異に基づいて分光反射率を
測定する側から第１番目の薄膜（下引層）の膜厚を推定
する手段と、分光反射率の極大値と極小値における反射
率差の標準値との差異及び分光反射率を測定する側から
第１番目の薄膜（下引層）の膜厚から分光反射率を測定
する側から第２番目の薄膜（記録層）の膜厚を推定する
手段と、前記第１番目及び第２番目の薄膜の膜厚の推定
値と所望の膜厚との差異に応じて前記第１番目及び第２
番目の薄膜の成膜速度及び成膜時間の少なくとも一方を
補正する手段とを備えている。すなわち、上記多層薄膜
の膜厚測定方法を用いて、最初に成膜した基板又は基板
と同時に成膜したサンプル片の膜厚を測定し、測定値と
標準値との差異に応じて各薄膜の成膜時間及び成膜速度
の少なくとも一方を補正することにより、次回基板上に
成膜される薄膜の膜厚を設計値により近づけることがで
きる。さらに、この工程を繰り返すことにより、製造さ
れた光学情報記録媒体の各薄膜の膜厚の精度をより高く
することができる。On the other hand, the first apparatus for manufacturing an optical information recording medium according to the present invention is an apparatus for manufacturing an optical information recording medium having a multilayer thin film formed of a plurality of thin films having different optical constants provided on a substrate. A means for sequentially forming the plurality of thin films on a substrate or a sample piece at a predetermined film formation rate and a film formation time, and a means for measuring a spectral reflectance of a multilayer thin film on a substrate or a sample piece after film formation, An extreme value is detected from the measurement result of the spectral reflectance, and the thickness of the first thin film (undercoat layer) from the side where the spectral reflectance is measured is determined based on the difference between the wavelength at the maximum value and the standard value. Means for estimating the spectral reflectance from the difference between the standard value of the reflectance difference between the maximum value and the minimum value of the spectral reflectance and the thickness of the first thin film (undercoat layer) from the side where the spectral reflectance is measured Second from the side measuring Thin film (recording layer) and the means for estimating the thickness of the 1st and the 1st according to the second difference in the estimated value of the film thickness of the thin film and a desired thickness and a second
Means for correcting at least one of the film forming speed and the film forming time of the second thin film. That is, using the above-described method for measuring the thickness of a multilayer thin film, the thickness of a substrate formed first or a sample piece formed simultaneously with the substrate is measured, and the thickness of each thin film is determined according to the difference between the measured value and the standard value. By correcting at least one of the deposition time and the deposition rate, the thickness of the thin film to be deposited next time on the substrate can be made closer to the design value. Further, by repeating this process, the accuracy of the thickness of each thin film of the manufactured optical information recording medium can be further improved.
【００４４】また、本発明における光学情報記録媒体の
第２の製造装置は、基板上に設けられたそれぞれ光学定
数の異なる複数の薄膜からなる多層薄膜を有する光学情
報記録媒体の製造装置であって、基板又はサンプル片上
に前記複数の薄膜をそれぞれ所定の成膜速度及び成膜時
間により順次成膜する手段と、成膜後の基板又はサンプ
ル片上の多層薄膜の分光反射率を測定する手段と、前記
分光反射率の測定結果から極値を検出しその極大値にお
ける波長とその標準値との差異に基づいて分光反射率を
測定する側から第１番目の薄膜（下引層）の膜厚を推定
する手段と、分光反射率の極大値と極小値における反射
率差の標準値との差異及び分光反射率を測定する側から
第１番目の薄膜（下引層）の膜厚から分光反射率を測定
する側から第２番目の薄膜（記録層）の膜厚を推定する
手段と、前記第１番目及び第２番目の薄膜の膜厚の推定
値と所望の膜厚との差異に基づいて基板上に形成された
多層薄膜の良否を判定し選別する手段とを備えている。
したがって、実際に製造した光学情報記録媒体の膜厚を
直接測定することができるので、製造した光学情報記録
媒体の良否を判定し、選別することが可能である。Further, a second apparatus for manufacturing an optical information recording medium according to the present invention is an apparatus for manufacturing an optical information recording medium having a multilayer thin film provided on a substrate and comprising a plurality of thin films having different optical constants. A means for sequentially forming the plurality of thin films on a substrate or a sample piece at a predetermined film formation rate and a film formation time, and a means for measuring a spectral reflectance of a multilayer thin film on a substrate or a sample piece after film formation, An extreme value is detected from the measurement result of the spectral reflectance, and the thickness of the first thin film (undercoat layer) from the side where the spectral reflectance is measured is determined based on the difference between the wavelength at the maximum value and the standard value. Means for estimating the spectral reflectance from the difference between the standard value of the reflectance difference between the maximum value and the minimum value of the spectral reflectance and the thickness of the first thin film (undercoat layer) from the side where the spectral reflectance is measured Second from the side measuring Means for estimating the thickness of the thin film (recording layer) of the first and second layers, and a multilayer thin film formed on the substrate based on a difference between the estimated value of the thickness of the first and second thin films and a desired thickness. Means for judging the pass / fail of the device and selecting it.
Therefore, the thickness of the actually manufactured optical information recording medium can be directly measured, so that the quality of the manufactured optical information recording medium can be determined and sorted.
【００４５】さらに、上記光学情報記録媒体の各製造方
法及び製造装置において、分光反射率を測定する際の各
測定波長の間隔を５ｎｍ以下とすることにより、膜厚の
測定精度を約５％に維持することができる。Further, in each of the methods and apparatus for manufacturing an optical information recording medium described above, the measurement accuracy of the film thickness is reduced to about 5% by setting the interval of each measurement wavelength at the time of measuring the spectral reflectance to 5 nm or less. Can be maintained.
【００４６】[0046]
【発明の効果】以上のように、本発明の光学情報記録媒
体の膜厚測定造方法によれば、１回の測定で複数の薄膜
の膜厚をそれぞれ測定することができ、膜厚測定に要す
る時間を短縮することができる。As described above, according to the method for measuring the thickness of an optical information recording medium of the present invention, the thickness of each of a plurality of thin films can be measured in one measurement. The time required can be reduced.
【００４７】また、実際の媒体の構造で膜厚を測定する
ことができるので、サンプル作成のために一時的に製造
条件を変える必要がなく、特に、バッチ式のスパッタリ
ングにより成膜する場合に有効である。Further, since the film thickness can be measured with the actual medium structure, there is no need to temporarily change the manufacturing conditions for sample preparation, and it is particularly effective when forming a film by batch-type sputtering. It is.
【図１】本発明の光学情報記録媒体の製造方法の一実施
形態の要部を示すフローチャートFIG. 1 is a flowchart showing a main part of an embodiment of a method for manufacturing an optical information recording medium of the present invention.
【図２】一般的な光学情報記録媒体の構成を示す断面図FIG. 2 is a sectional view showing a configuration of a general optical information recording medium.
【図３】光学情報記録媒体の分光反射率と波長の関係を
示す特性図FIG. 3 is a characteristic diagram showing a relationship between a spectral reflectance and a wavelength of an optical information recording medium.
【図４】本発明の光学情報記録媒体の製造装置の一実施
形態の要部を示す構成図FIG. 4 is a configuration diagram illustrating a main part of an embodiment of an optical information recording medium manufacturing apparatus according to the present invention.
１ 透明基板 １’ 多層薄膜が形成された透明基板 ２ 案内溝 ３ 下引層 ４ 記録層 ５ 上引層 ６ 反射層 ７ 樹脂保護層 ９ 中心孔 １０光学情報記録媒体 １１ 基板投入室 １２ 下引層成膜室 １３ 記録層成膜室 １４ 上引層成膜室 １５ 反射層成膜室 １６ 基板排出室 １７ 分光器 １８ 演算処理装置 １９ 成膜条件制御装置 ２０ 光学情報記録媒体の製造装置 REFERENCE SIGNS LIST 1 transparent substrate 1 ′ transparent substrate on which multilayer thin film is formed 2 guide groove 3 undercoat layer 4 recording layer 5 overcoat layer 6 reflective layer 7 resin protective layer 9 center hole 10 optical information recording medium 11 substrate loading chamber 12 undercoat layer Film forming chamber 13 Recording layer film forming chamber 14 Overcoat layer film forming chamber 15 Reflective layer film forming chamber 16 Substrate discharge chamber 17 Spectroscope 18 Arithmetic processing device 19 Film forming condition control device 20 Optical information recording medium manufacturing device
Claims (14)
異なる複数の薄膜からなる多層薄膜の膜厚測定方法であ
って、総合反射光の反射率のピークを与える波長と、第
１の膜厚との関係を、あらかじめ得ておき、総合反射光
における実際の反射率のピークを与える波長を検出し、
上記関係を利用して、その波長に対応する膜厚から前記
第１番目の膜厚を測定することを特徴とする多層薄膜の
膜厚測定方法。1. A method for measuring the thickness of a multilayer thin film provided on a substrate and comprising a plurality of thin films having different optical constants, the method comprising: providing a wavelength giving a peak of the reflectance of total reflected light; Is obtained in advance, and the wavelength that gives the peak of the actual reflectance in the total reflected light is detected,
A method for measuring the thickness of a multilayer thin film, wherein the first thickness is measured from the thickness corresponding to the wavelength using the above relationship.
異なる複数の薄膜からなる多層薄膜の膜厚測定方法であ
って、あらかじめ第１の膜厚が所定の厚さの場合の、第
２の膜厚と、総合反射光の反射率のピーク値との関係を
得ておき、請求項１の測定方法により測定された第１の
膜厚と、その膜厚における、前記第２の膜厚と反射率の
ピークとの関係とを利用して、実際の反射率のピーク値
から第２の膜厚を測定することを特徴とする多層薄膜の
膜厚測定方法。2. A method for measuring the thickness of a multilayer thin film provided on a substrate and comprising a plurality of thin films having different optical constants, wherein a second thickness is determined in advance when the first thickness is a predetermined thickness. A relationship between the film thickness and the peak value of the reflectance of the total reflected light is obtained, and the first film thickness measured by the measuring method according to claim 1 and the second film thickness in the film thickness. A method for measuring the thickness of a multilayer thin film, comprising: measuring a second thickness from an actual peak value of a reflectance using a relationship with a reflectance peak.
異なる複数の薄膜からなる多層薄膜の膜厚測定方法であ
って、前記多層薄膜の分光反射率を測定し、測定結果か
ら極値を検出し、その極大値における波長とその標準値
との差異に基づいて、多層薄膜の分光反射率を測定する
側から第１番目の薄膜の膜厚を求める多層薄膜の膜厚測
定方法。3. A method for measuring the thickness of a multilayer thin film provided on a substrate and comprising a plurality of thin films having different optical constants, wherein a spectral reflectance of the multilayer thin film is measured, and an extreme value is detected from the measurement result. And a method for measuring the thickness of the first thin film from the side where the spectral reflectance of the multilayer thin film is measured based on the difference between the wavelength at the maximum value and the standard value.
における反射率差とその標準値との差異及び多層薄膜の
分光反射率を測定する側から第１番目の薄膜の膜厚に基
づいて、多層薄膜の分光反射率を測定する側から第２番
目の薄膜の膜厚を求めることを特徴とする請求項３記載
の多層膜の膜厚測定方法。4. A method according to claim 1, wherein the difference between the maximum value and the minimum value of the measurement result of the spectral reflectance and the difference between the standard value and the thickness of the first thin film from the side where the spectral reflectance of the multilayer thin film is measured. 4. The method according to claim 3, wherein the thickness of the second thin film is determined from the side where the spectral reflectance of the multilayer thin film is measured.
異なる複数の薄膜からなる多層薄膜を有する光学情報記
録媒体の製造方法であって、基板又はサンプル片上に前
記複数の薄膜をそれぞれ所定の成膜速度と成膜時間によ
り順次成膜する工程と、成膜後の基板又はサンプル片上
の多層薄膜の分光反射率を測定する工程と、前記分光反
射率の測定結果から極値を検出しその極大値における波
長とその標準値との差異に基づいて分光反射率を測定す
る側から第１番目の薄膜の膜厚を推定する工程と、前記
第１番目の薄膜の膜厚の推定値と所望の膜厚との差異に
応じて前記第１番目の薄膜の成膜速度及び成膜時間の少
なくとも一方を補正する工程と、新たな基板上に前記複
数の薄膜をそれぞれ補正された成膜速度及び成膜時間に
より順次成膜する工程とを備えた光学情報記録媒体の製
造方法。5. A method for producing an optical information recording medium having a multilayer thin film formed of a plurality of thin films having different optical constants provided on a substrate, wherein the plurality of thin films are formed on a substrate or a sample piece, respectively. A step of sequentially forming a film according to a film speed and a film forming time; a step of measuring a spectral reflectance of a multilayer thin film on a substrate or a sample piece after the film formation; Estimating the thickness of the first thin film from the side where the spectral reflectance is measured based on the difference between the wavelength in the value and the standard value, and estimating the thickness of the first thin film and a desired value. Correcting at least one of the film forming speed and the film forming time of the first thin film in accordance with the difference between the film thickness and the film thickness; and correcting the film forming speed and the film forming of the plurality of thin films on a new substrate. Steps to form films sequentially according to film time A method for manufacturing an optical information recording medium comprising:
射率差の標準値との差異及び分光反射率を測定する側か
ら第１番目の薄膜の膜厚から分光反射率を測定する側か
ら第２番目の薄膜の膜厚を推定し、これによって求めら
れた膜厚の推定値と所望の膜厚との差異に応じて前記第
２番目の薄膜の成膜速度及び成膜時間の少なくとも一方
を補正することを特徴とする請求項５記載の光学情報記
録媒体の製造方法。6. The difference between the standard value of the reflectance difference between the maximum value and the minimum value of the spectral reflectance and the side from which the spectral reflectance is measured from the thickness of the first thin film from the side where the spectral reflectance is measured. Estimating the film thickness of the second thin film, and at least one of the film forming speed and the film forming time of the second thin film according to a difference between the estimated value of the film thickness thus obtained and a desired film thickness. 6. The method for manufacturing an optical information recording medium according to claim 5, wherein
異なる複数の薄膜からなる多層薄膜を有する光学情報記
録媒体の製造方法であって、基板又はサンプル片上に前
記複数の薄膜をそれぞれ所定の成膜速度と成膜時間によ
り順次成膜する工程と、成膜後の基板又はサンプル片上
の多層薄膜の分光反射率を測定する工程と、前記分光反
射率の測定結果から極値を検出しその極大値における波
長とその標準値との差異に基づいて分光反射率を測定す
る側から第１番目の薄膜の膜厚を推定する工程と、前記
第１番目の薄膜の膜厚の推定値と所望の膜厚との差異に
基づいて基板上に形成された多層薄膜の良否を判定し選
別する工程とを備えた光学情報記録媒体の製造方法。7. A method for manufacturing an optical information recording medium having a multilayer thin film formed of a plurality of thin films having different optical constants provided on a substrate, wherein the plurality of thin films are formed on a substrate or a sample piece, respectively. A step of sequentially forming a film according to a film speed and a film formation time, a step of measuring a spectral reflectance of a multilayer thin film on a substrate or a sample piece after the film is formed, and detecting an extreme value from a result of the measurement of the spectral reflectance to obtain a maximum value. Estimating the thickness of the first thin film from the side where the spectral reflectance is measured based on the difference between the wavelength in the value and the standard value, and estimating the thickness of the first thin film and a desired value. A step of judging the quality of a multilayer thin film formed on a substrate based on a difference from the film thickness and selecting the multilayer thin film.
射率差の標準値との差異及び分光反射率を測定する側か
ら第１番目の薄膜の膜厚から分光反射率を測定する側か
ら第２番目の薄膜の膜厚を推定し、これによって求めら
れた膜厚の推定値と所望の膜厚との差異に基づいて基板
上に形成された多層薄膜の良否を判定し選別することを
特徴とする請求項７記載の光学情報記録媒体の製造方
法。8. The difference between the standard value of the reflectance difference between the maximum value and the minimum value of the spectral reflectance and the side from which the spectral reflectance is measured from the thickness of the first thin film from the side where the spectral reflectance is measured. Estimating the thickness of the second thin film, judging the quality of the multilayer thin film formed on the substrate based on the difference between the estimated thickness of the second thin film and the desired thickness and selecting the thin film. The method for manufacturing an optical information recording medium according to claim 7, wherein:
下であることを特徴とする請求項５又は請求項７記載の
光学情報記録媒体の製造方法。9. The method for manufacturing an optical information recording medium according to claim 5, wherein an interval between wavelengths for measuring spectral reflectance is 5 nm or less.
の異なる複数の薄膜からなる多層薄膜を有する光学情報
記録媒体の製造装置であって、基板又はサンプル片上に
前記複数の薄膜をそれぞれ所定の成膜速度及び成膜時間
により順次成膜する手段と、成膜後の基板又はサンプル
片上の多層薄膜の分光反射率を測定する手段と、前記分
光反射率の測定結果から極値を検出しその極大値におけ
る波長とその標準値との差異に基づいて分光反射率を測
定する側から第１番目の薄膜の膜厚を推定する手段と、
前記第１番目の薄膜の膜厚の推定値と所望の膜厚との差
異に応じて前記第１番目の薄膜の成膜速度及び成膜時間
の少なくとも一方を補正する手段とを備えた光学情報記
録媒体の製造装置。10. An apparatus for manufacturing an optical information recording medium having a multilayer thin film formed of a plurality of thin films having different optical constants provided on a substrate, wherein the plurality of thin films are formed on a substrate or a sample piece, respectively. A means for sequentially forming a film according to a film speed and a film formation time, a means for measuring a spectral reflectance of a multilayer thin film on a substrate or a sample piece after the film formation, and detecting an extreme value from the measurement result of the spectral reflectance to obtain a maximum value. Means for estimating the thickness of the first thin film from the side for measuring the spectral reflectance based on the difference between the wavelength in the value and the standard value;
Means for correcting at least one of a film forming speed and a film forming time of the first thin film according to a difference between an estimated value of the film thickness of the first thin film and a desired film thickness. Manufacturing equipment for recording media.
反射率差の標準値との差異及び分光反射率を測定する側
から第１番目の薄膜の膜厚から分光反射率を測定する側
から第２番目の薄膜の膜厚を推定する手段と、これによ
って求められた膜厚の推定値と所望の膜厚との差異に応
じて前記第２番目の薄膜の成膜速度及び成膜時間の少な
くとも一方を補正する手段を備えた請求項１０記載の光
学情報記録媒体の製造装置。11. The difference between the standard value of the reflectance difference between the maximum value and the minimum value of the spectral reflectance and the side from which the spectral reflectance is measured based on the thickness of the first thin film from the side from which the spectral reflectance is measured. Means for estimating the film thickness of the second thin film, and determining the film forming rate and the film forming time of the second thin film according to the difference between the estimated value of the film thickness obtained thereby and the desired film thickness. 11. The apparatus for manufacturing an optical information recording medium according to claim 10, further comprising means for correcting at least one of the optical information.
の異なる複数の薄膜からなる多層薄膜を有する光学情報
記録媒体の製造装置であって、基板又はサンプル片上に
前記複数の薄膜をそれぞれ所定の成膜速度及び成膜時間
により順次成膜する手段と、成膜後の基板又はサンプル
片上の多層薄膜の分光反射率を測定する手段と、前記分
光反射率の測定結果から極値を検出しその極大値におけ
る波長とその標準値との差異に基づいて分光反射率を測
定する側から第１番目の薄膜の膜厚を推定する手段と、
前記第１番目の薄膜の膜厚の推定値と所望の膜厚との差
異に基づいて基板上に形成された多層薄膜の良否を判定
し選別する手段とを備えた光学情報記録媒体の製造装
置。12. An apparatus for manufacturing an optical information recording medium having a multilayer thin film formed of a plurality of thin films having different optical constants provided on a substrate, wherein the plurality of thin films are formed on a substrate or a sample piece, respectively. A means for sequentially forming a film according to a film speed and a film formation time, a means for measuring a spectral reflectance of a multilayer thin film on a substrate or a sample piece after the film formation, and detecting an extreme value from the measurement result of the spectral reflectance to obtain a maximum value. Means for estimating the thickness of the first thin film from the side for measuring the spectral reflectance based on the difference between the wavelength in the value and the standard value;
Means for judging the quality of a multilayer thin film formed on a substrate based on a difference between an estimated value of the thickness of the first thin film and a desired thickness and selecting the same. .
反射率差の標準値との差異及び分光反射率を測定する側
から第１番目の薄膜の膜厚から分光反射率を測定する側
から第２番目の薄膜の膜厚を推定する手段と、これによ
って求められた膜厚の推定値と所望の膜厚との差異に基
づいて基板上に形成された多層薄膜の良否を判定し選別
する手段とを備えた請求項１２記載の光学情報記録媒体
の製造方法。13. The difference between the standard value of the reflectance difference between the maximum value and the minimum value of the spectral reflectance and the side from which the spectral reflectance is measured from the thickness of the first thin film from the side where the spectral reflectance is measured. Means for estimating the thickness of the second thin film, and judging the quality of the multilayer thin film formed on the substrate based on a difference between the estimated value of the thickness obtained by the second thin film and a desired thickness, and selecting the same. 13. The method for manufacturing an optical information recording medium according to claim 12, comprising means.
以下であることを特徴とする請求項１０又は請求項１２
記載の光記録媒体の製造装置。14. An interval between wavelengths for measuring spectral reflectance is 5 nm.
The following is characterized by the following.
An apparatus for manufacturing the optical recording medium according to the above.
Priority Applications (2)
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| JP05124197A JP3764794B2 (en) | 1997-03-06 | 1997-03-06 | Multilayer thin film thickness measuring method, optical information recording medium manufacturing method and manufacturing apparatus |
| US08/883,530 US5883720A (en) | 1996-06-26 | 1997-06-26 | Method of measuring a film thickness of multilayer thin film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP05124197A JP3764794B2 (en) | 1997-03-06 | 1997-03-06 | Multilayer thin film thickness measuring method, optical information recording medium manufacturing method and manufacturing apparatus |
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| Publication Number | Publication Date |
|---|---|
| JPH10253324A true JPH10253324A (en) | 1998-09-25 |
| JP3764794B2 JP3764794B2 (en) | 2006-04-12 |
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