JPH10311937A - Packaging structure of end face light emitting element or light receiving element - Google Patents

Packaging structure of end face light emitting element or light receiving element

Info

Publication number
JPH10311937A
JPH10311937A JP9124224A JP12422497A JPH10311937A JP H10311937 A JPH10311937 A JP H10311937A JP 9124224 A JP9124224 A JP 9124224A JP 12422497 A JP12422497 A JP 12422497A JP H10311937 A JPH10311937 A JP H10311937A
Authority
JP
Japan
Prior art keywords
light receiving
receiving element
emitting element
light emitting
solder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9124224A
Other languages
Japanese (ja)
Inventor
Hiroki Ishikawa
弘樹 石川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Aviation Electronics Industry Ltd
Original Assignee
Japan Aviation Electronics Industry Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Aviation Electronics Industry Ltd filed Critical Japan Aviation Electronics Industry Ltd
Priority to JP9124224A priority Critical patent/JPH10311937A/en
Publication of JPH10311937A publication Critical patent/JPH10311937A/en
Pending legal-status Critical Current

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  • Optical Couplings Of Light Guides (AREA)
  • Led Device Packages (AREA)
  • Light Receiving Elements (AREA)

Abstract

PROBLEM TO BE SOLVED: To allow a solder thin film to collide against a metallic film interposed between the thin film and a silicon substrate and to prevent the film from being displaced downward even the solder thin film heated and packaged to the silicon substrate melts by forming metallic films on terminal electrode surfaces. SOLUTION: A V-groove 11 is formed on the surface of the silicon substrate 1 by etching the substrate and the substrate electrodes 12 to be packaged with an end face light emitting element or light receiving element are formed on the silicon substrate 1 surface in correspondence to the V-groove 11. At this time, the terminal electrode 13 is also formed on the silicon substrate 1 surface. Further, the striped metallic film 14 having a specified film thickness are formed on the surface of the substrate electrodes 12 formed in correspondence to the V-groove 11. The striped metallic films 14 are deposited by subjecting the metal of a high m.p. which does not melt in spite of melting of the solder to film thickness control with high accuracy by vapor deposition, sputtering, plating and other thin-film deposition technique. Ni, Cu, Pt and other materials which are wettable with solder and lessen solder leaching are used as the metallic materials.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】この発明は、端面発光素子或
は受光素子の実装構造に関し、特に、端面発光素子或は
受光素子を基板に対して高さ方向を高精度に実装する端
面発光素子或は受光素子の実装構造に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a mounting structure of an end face light emitting element or a light receiving element, and more particularly, to an end face light emitting element or a light receiving element for mounting the end face light emitting element or the light receiving element with respect to a substrate with high accuracy in a height direction. Relates to the mounting structure of the light receiving element.

【0002】[0002]

【従来の技術】従来例を図6および図7を参照して説明
する。図6および図7において、1は半導体基板である
シリコン基板を示す。11はシリコン基板1表面にエッ
チング加工により形成されたV字状溝11である。4は
V字状溝11に嵌合取り付けられる光ファイバである。
12はV字状溝11に対応してシリコン基板1に形成さ
れる基板電極である。2はハンダ薄膜を示す。3はシリ
コン基板1に実装されるべき端面発光素子或は受光素子
3である。31は端面発光素子或は受光素子3の下面に
形成される下側素子電極であり、32は上面に形成され
る上側素子電極である。
2. Description of the Related Art A conventional example will be described with reference to FIGS. 6 and 7, reference numeral 1 denotes a silicon substrate which is a semiconductor substrate. Reference numeral 11 denotes a V-shaped groove 11 formed on the surface of the silicon substrate 1 by etching. Reference numeral 4 denotes an optical fiber fitted and attached to the V-shaped groove 11.
Reference numeral 12 denotes a substrate electrode formed on the silicon substrate 1 corresponding to the V-shaped groove 11. Reference numeral 2 denotes a solder thin film. Reference numeral 3 denotes an edge light emitting element or light receiving element 3 to be mounted on the silicon substrate 1. Reference numeral 31 denotes a lower element electrode formed on the lower surface of the edge light emitting element or the light receiving element 3, and 32 denotes an upper element electrode formed on the upper surface.

【0003】端面発光素子或は受光素子3および光ファ
イバ4をシリコン基板1に実装取り付けて光を放射し或
は受光する光学装置を組み立てる順序について簡単に説
明するに、先ず、シリコン基板1を準備し、これにエッ
チング加工を施して表面にV字状溝11を形成する。次
いで、端面発光素子或は受光素子3を実装する基板電極
12をV字状溝11に対応してシリコン基板1表面に形
成する。シリコン基板1表面に基板電極12を形成する
に際して、端子電極13も同時にシリコン基板1表面に
形成しておく。そして、光ファイバ4を接着剤を適用し
てV字状溝11に嵌合取り付ける。ここで、端面発光素
子或は受光素子3を準備し、下側素子電極31或は基板
電極12の何れか一方にハンダ薄膜2を付与しておき、
端面発光素子或は受光素子3を基板電極12に実装す
る。
In order to briefly describe an order of assembling an optical device that emits or receives light by mounting and mounting an edge emitting element or light receiving element 3 and an optical fiber 4 on a silicon substrate 1, first, the silicon substrate 1 is prepared. Then, this is subjected to etching to form a V-shaped groove 11 on the surface. Next, a substrate electrode 12 on which the end face light emitting element or the light receiving element 3 is mounted is formed on the surface of the silicon substrate 1 corresponding to the V-shaped groove 11. When the substrate electrode 12 is formed on the surface of the silicon substrate 1, the terminal electrode 13 is also formed on the surface of the silicon substrate 1 at the same time. Then, the optical fiber 4 is fitted and attached to the V-shaped groove 11 by applying an adhesive. Here, the end face light emitting element or the light receiving element 3 is prepared, and the solder thin film 2 is applied to one of the lower element electrode 31 and the substrate electrode 12.
The edge emitting element or the light receiving element 3 is mounted on the substrate electrode 12.

【0004】以上の光学装置において、光ファイバ4先
端部と端面発光素子或は受光素子3の端面との間をパッ
シブアライメント、即ち、無調芯固定して両者の間の効
率的な光結合を実現するには、光ファイバ4をV字状溝
11に嵌合取り付けた状態において、端面発光素子或い
は受光素子3をシリコン基板1に形成した基板電極12
に対して光ファイバ4と高精度に整列して実装すること
が要請される。
In the above optical device, passive alignment between the tip of the optical fiber 4 and the end face of the end face light emitting element or the light receiving element 3, that is, non-alignment fixation, and efficient optical coupling between the two. In order to realize this, in a state where the optical fiber 4 is fitted and attached to the V-shaped groove 11, the substrate electrode 12 in which the end face light emitting element or the light receiving element 3 is formed on the silicon substrate 1.
It is required to mount the optical fiber 4 with high precision.

【0005】[0005]

【発明が解決しようとする課題】端面発光素子或は受光
素子3は、以上の通りにして基板電極12に対して位置
決めし、シリコン基板1に実装するのであるが、端面発
光素子或は受光素子3のシリコン基板1表面の水平方向
であるx、z方向に関する位置決め調整は画像処理技術
を採用することにより比較的容易に実施することができ
る。フリップ・チップ・ボンダの如き高精度実装機を使
用することにより充分に高精度な実装をすることができ
る。しかし、この高精度実装機は端面発光素子或は受光
素子3をシリコン基板1表面に実装する場合、実装の高
さを加重により制御するものであるので、シリコン基板
1の表面の垂直方向であるy方向に関しては、高精度の
実装を保証することは困難である。と言うのは、ハンダ
薄膜2は実装時に加熱溶融するところから、端面発光素
子或は受光素子3の高さはハンダ薄膜2の厚さの変動分
だけ変化し、高精度の実装高さは得られない。
The edge light emitting element or light receiving element 3 is positioned with respect to the substrate electrode 12 and mounted on the silicon substrate 1 as described above. The positioning adjustment in the horizontal x and z directions of the surface of the silicon substrate 1 can be performed relatively easily by employing an image processing technique. By using a high-precision mounting machine such as a flip chip bonder, sufficiently high-precision mounting can be performed. However, when the edge light emitting element or the light receiving element 3 is mounted on the surface of the silicon substrate 1 in this high-precision mounting machine, the height of the mounting is controlled by weight. As for the y direction, it is difficult to guarantee high-precision mounting. That is, since the solder thin film 2 is heated and melted at the time of mounting, the height of the end face light emitting element or the light receiving element 3 changes by an amount corresponding to the variation of the thickness of the solder thin film 2, and the mounting height with high precision is obtained. I can't.

【0006】この発明は、上述の問題を解消した端面発
光素子或は受光素子の実装構造を提供するものである。
The present invention provides a mounting structure of an edge light emitting element or a light receiving element which solves the above-mentioned problem.

【0007】[0007]

【課題を解決するための手段】[Means for Solving the Problems]

請求項1:光ファイバ4を取り付けるV字状溝11が形
成されると共にV字状溝11に対応して端面発光素子或
は受光素子3をハンダにより実装する基板電極12が形
成される半導体基板1を具備する端面発光素子或は受光
素子の実装構造において、基板電極12表面に金属膜1
4を形成した端面発光素子或は受光素子の実装構造を構
成した。
A semiconductor substrate in which a V-shaped groove 11 for mounting the optical fiber 4 is formed and a substrate electrode 12 for mounting the end face light emitting element or the light receiving element 3 by solder corresponding to the V-shaped groove 11 is formed. In the mounting structure of the end face light emitting element or the light receiving element provided with
4 to form a mounting structure of the end face light emitting element or the light receiving element.

【0008】そして、請求項2:請求項1に記載される
端面発光素子或は受光素子の実装構造において、金属膜
14は一定膜厚のストライプ状の金属膜である端面発光
素子或は受光素子の実装構造を構成した。 また、請求項3:請求項1に記載される端面発光素子或
は受光素子の実装構造において、金属膜14は一定膜厚
の円板状の金属膜である端面発光素子或は受光素子の実
装構造を構成した。
Claim 2: In the mounting structure of the end face light emitting element or the light receiving element according to the first aspect, the metal film 14 is a striped metal film having a constant thickness. The mounting structure was constructed. Further, in the mounting structure of the end face light emitting element or the light receiving element according to claim 1, the mounting of the end face light emitting element or the light receiving element in which the metal film 14 is a disk-shaped metal film having a constant thickness. Structured.

【0009】更に、請求項4:請求項1ないし請求項3
に記載される端面発光素子或は受光素子の実装構造にお
いて、金属膜14はハンダに濡れ、ハンダ食われの少な
い金属材料より成るものである端面発光素子或は受光素
子の実装構造を構成した。 ここで、請求項5:請求項4に記載される端面発光素子
或は受光素子の実装構造において、金属材料はNi、C
u、Ptの内から選択された何れかである端面発光素子
或は受光素子の実装構造を構成した。
Further, claim 4: claims 1 to 3
In the mounting structure of the end face light emitting element or the light receiving element described in (1), the metal film 14 is made of a metal material which is less wetted by solder and less eroded by solder. Here, in the mounting structure of the edge light emitting element or the light receiving element according to claim 5, the metal material is Ni, C
A mounting structure of an end face light emitting element or a light receiving element selected from u and Pt was formed.

【0010】そして、請求項6:請求項1ないし請求項
5に記載される端面発光素子或は受光素子の実装構造に
おいて、基板電極12側或は端面発光素子或は受光素子
3側の何れか一方の側にハンダ薄膜2を予め付与した端
面発光素子或は受光素子の実装構造を構成した。
Claim 6: In the mounting structure of the end face light emitting element or the light receiving element according to any one of the first to fifth aspects, any one of the substrate electrode 12 side or the end face light emitting element or the light receiving element 3 side. A mounting structure of an edge emitting element or a light receiving element in which a solder thin film 2 was previously applied to one side was formed.

【0011】[0011]

【発明の実施の形態】この発明の実施の形態を図1ない
し図5を参照して説明する。図1を参照するに、端面発
光素子或は受光素子3および光ファイバ4をシリコン基
板1に実装取り付けて光を放射し或は受光する光学装置
を組み立てる順序について簡単に説明するに、先ず、シ
リコン基板1を準備し、これにエッチング加工を施して
表面にV字状溝11を形成する。次いで、端面発光素子
或は受光素子3を実装する基板電極12をV字状溝11
に対応してシリコン基板1表面に形成する。シリコン基
板1表面に基板電極12を形成するに際して、端子電極
13も同時にシリコン基板1表面に形成しておく。図2
および図4を参照するに、この発明は、V字状溝11に
対応して形成される基板電極12表面に、更に一定膜厚
のストライプ状の金属膜14を形成する。このストライ
プ状の金属膜14は、ハンダが溶融しても溶融しない高
融点の金属材料を蒸着、スパッタリング、メッキその他
の薄膜成膜技術により高精度に膜厚制御しながら成膜す
る。金属膜14を形成する金属材料としては、Ni、C
u、Ptその他のハンダに濡れ、ハンダ食われの少ない
金属材料を使用する。金属膜14はこれを図3に示され
る通りの円板状の金属膜とすることができる。そして、
光ファイバ4を接着剤を適用してV字状溝11に嵌合取
り付ける。次いで、端面発光素子或は受光素子3を準備
し、下側素子電極31或は基板電極12の何れか一方に
ハンダ薄膜2を予め付与しておく。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described with reference to FIGS. Referring to FIG. 1, the order of assembling an optical device for emitting or receiving light by mounting and mounting an end face light emitting element or light receiving element 3 and an optical fiber 4 on a silicon substrate 1 will be described first. A substrate 1 is prepared and subjected to an etching process to form a V-shaped groove 11 on the surface. Next, the substrate electrode 12 on which the end face light emitting element or the light receiving element 3 is mounted is inserted into the V-shaped groove 11.
Is formed on the surface of the silicon substrate 1. When the substrate electrode 12 is formed on the surface of the silicon substrate 1, the terminal electrode 13 is also formed on the surface of the silicon substrate 1 at the same time. FIG.
Referring to FIG. 4 and FIG. 4, in the present invention, a stripe-shaped metal film 14 having a constant film thickness is further formed on the surface of substrate electrode 12 formed corresponding to V-shaped groove 11. The stripe-shaped metal film 14 is formed by depositing a high-melting metal material that does not melt even when the solder is melted, while controlling the film thickness with high precision by vapor deposition, sputtering, plating, or other thin film forming techniques. As a metal material for forming the metal film 14, Ni, C
u, Pt, and other metal materials that are wetted by solder and are less likely to be eroded by solder are used. The metal film 14 can be a disk-shaped metal film as shown in FIG. And
The optical fiber 4 is fitted and attached to the V-shaped groove 11 by applying an adhesive. Next, the end face light emitting element or the light receiving element 3 is prepared, and the solder thin film 2 is applied to one of the lower element electrode 31 and the substrate electrode 12 in advance.

【0012】ここで、図5を参照するに、この図は端面
発光素子或は受光素子3を加熱し、ハンダ薄膜2を溶融
して基板電極12に実装した後の状態を示している。即
ち、ハンダ薄膜2が溶融して端面発光素子或は受光素子
3とシリコン基板1との間は溶融後に固化したハンダ薄
膜2を介して接合している。この場合、ハンダ薄膜2が
その溶融により上方に存在する端面発光素子或は受光素
子3を下から支持する力を消失しても、基板電極12と
端面発光素子或は受光素子3との間に両者間の間隔を保
持する金属膜14が介在するところから、金属膜14の
一定の厚さを保持した状態で接合がなされるに到る。
Here, referring to FIG. 5, this figure shows a state after the edge light emitting element or the light receiving element 3 is heated, the solder thin film 2 is melted and mounted on the substrate electrode 12. That is, the solder thin film 2 is melted, and the end face light emitting element or light receiving element 3 and the silicon substrate 1 are joined via the solder thin film 2 solidified after melting. In this case, even if the solder thin film 2 loses the force of supporting the edge light emitting element or the light receiving element 3 located above due to the melting thereof, the gap between the substrate electrode 12 and the edge light emitting element or the light receiving element 3 is lost. From the place where the metal film 14 holding the space between them is interposed, the joining is performed with the metal film 14 kept at a certain thickness.

【0013】[0013]

【発明の効果】以上の通りであって、この発明に依れ
ば、基板電極12表面の一部に端面発光素子或は受光素
子3の実装時に加熱されても溶融しない高融点金属を形
成しておくことにより、端面発光素子或は受光素子3
は、これをシリコン基板1に加熱実装してハンダ薄膜2
が溶融しても、シリコン基板1との間に介在する金属膜
14に突き当たり、これより下方に変位することは防止
される。
As described above, according to the present invention, a high melting point metal which does not melt even when heated at the time of mounting the edge emitting element or the light receiving element 3 is formed on a part of the surface of the substrate electrode 12. In this case, the edge emitting element or the light receiving element 3
Is mounted on a silicon substrate 1 by heating and forming a solder thin film 2
Even if is melted, the metal film 14 is prevented from hitting the metal film 14 interposed between the silicon substrate 1 and being displaced below.

【0014】ここで、この金属材料をハンダ薄膜に濡
れ、ハンダ食われの少ない金属材料、特に、Ni、C
u、Ptとすることにより、基板電極12と端面発光素
子或は受光素子3との間のハンダ薄膜2が実装時に溶融
しても素子3の高さ方向であるy方向の制御に影響は及
ばず、良好な実装をすることができる。この端面発光素
子或は受光素子3の高さは光ファイバ4のコアと素子3
の発光部或は受光部の中心とが一致すべく計算設計さ
れ、金属膜14の厚さをこの設計に対応して設計するこ
とにより高さ方向の精度を制御することができる。
Here, this metal material is wetted by a solder thin film, and a metal material with less solder erosion, especially Ni, C
By setting u and Pt, even if the solder thin film 2 between the substrate electrode 12 and the edge emitting element or the light receiving element 3 is melted at the time of mounting, it affects the control in the y direction, which is the height direction of the element 3. And good mounting can be achieved. The height of the end face light emitting element or light receiving element 3 is the same as that of the core of the optical fiber 4
The height of the metal film 14 can be controlled by designing the thickness of the metal film 14 in accordance with this design.

【0015】更に、端面発光素子或は受光素子3が発熱
する場合があるので、放熱に関して考慮する必要がある
が、膜14は金属膜であり、合成樹脂或はガラスと比較
して熱伝導が良好であるので放熱的に有利である。
Further, since the edge light emitting element or the light receiving element 3 may generate heat, it is necessary to take heat dissipation into consideration. However, the film 14 is a metal film and has a higher heat conduction than a synthetic resin or glass. Since it is good, it is advantageous in terms of heat radiation.

【図面の簡単な説明】[Brief description of the drawings]

【図1】実施例を説明する分解斜視図。FIG. 1 is an exploded perspective view illustrating an embodiment.

【図2】実施例の一部を上から視た図。FIG. 2 is a top view of a part of the embodiment.

【図3】他の実施例の一部を上から視た図。FIG. 3 is a top view of a part of another embodiment.

【図4】図2の実施例の一部の断面図。FIG. 4 is a partial sectional view of the embodiment of FIG. 2;

【図5】実施例の一部の断面図。FIG. 5 is a partial cross-sectional view of the embodiment.

【図6】従来例を説明する断面図。FIG. 6 is a cross-sectional view illustrating a conventional example.

【図7】従来例の分解斜視図。FIG. 7 is an exploded perspective view of a conventional example.

【符号の説明】[Explanation of symbols]

1 シリコン基板 11 V字状溝 12 基板電極 13 端子電極 14 金属膜 2 ハンダ薄膜 3 端面発光素子或は受光素子 31 下側素子電極 32 上側素子電極 4 光ファイバ DESCRIPTION OF SYMBOLS 1 Silicon substrate 11 V-shaped groove 12 Substrate electrode 13 Terminal electrode 14 Metal film 2 Solder thin film 3 Edge light emitting element or light receiving element 31 Lower element electrode 32 Upper element electrode 4 Optical fiber

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 光ファイバを取り付けるV字状溝が形成
されると共にV字状溝に対応して端面発光素子或は受光
素子をハンダにより実装する基板電極が形成される半導
体基板を具備する端面発光素子或は受光素子の実装構造
において、 基板電極表面に金属膜を形成したことを特徴とする端面
発光素子或は受光素子の実装構造。
1. An end face comprising a semiconductor substrate in which a V-shaped groove for mounting an optical fiber is formed and a substrate electrode for mounting an end face light emitting element or a light receiving element by solder corresponding to the V-shaped groove. A mounting structure for a light emitting element or a light receiving element, wherein a metal film is formed on a surface of a substrate electrode.
【請求項2】 請求項1に記載される端面発光素子或は
受光素子の実装構造において、 金属膜は一定膜厚のストライプ状の金属膜であることを
特徴とする端面発光素子或は受光素子の実装構造。
2. The edge light emitting device or light receiving element according to claim 1, wherein the metal film is a stripe-shaped metal film having a constant thickness. Mounting structure.
【請求項3】 請求項1に記載される端面発光素子或は
受光素子の実装構造において、 金属膜は一定膜厚の円板状の金属膜であることを特徴と
する端面発光素子或は受光素子の実装構造。
3. The edge light emitting device or the light receiving device according to claim 1, wherein the metal film is a disk-shaped metal film having a constant thickness. Device mounting structure.
【請求項4】 請求項1ないし請求項3に記載される端
面発光素子或は受光素子の実装構造において、 金属膜はハンダに濡れ、ハンダ食われの少ない金属材料
より成るものであることを特徴とする端面発光素子或は
受光素子の実装構造。
4. The mounting structure of an edge-emitting device or a light-receiving device according to claim 1, wherein the metal film is made of a metal material which is less wetted by solder and less eroded by solder. The mounting structure of the end face light emitting element or the light receiving element.
【請求項5】 請求項4に記載される端面発光素子或は
受光素子の実装構造において、 金属材料はNi、Cu、Ptの内から選択された何れか
であることを特徴とする端面発光素子或は受光素子の実
装構造。
5. The edge light emitting device according to claim 4, wherein the metal material is any one of Ni, Cu, and Pt. Or the mounting structure of the light receiving element.
【請求項6】 請求項1ないし請求項5に記載される端
面発光素子或は受光素子の実装構造において、 基板電極側或は端面発光素子或は受光素子側の何れか一
方の側にハンダ薄膜を予め付与したことを特徴とする端
面発光素子或は受光素子の実装構造。
6. The mounting structure of an edge emitting element or a light receiving element according to claim 1, wherein a solder thin film is provided on one of a substrate electrode side and an edge emitting element or a light receiving element side. Characterized in that an edge emitting element or a light receiving element is provided in advance.
JP9124224A 1997-05-14 1997-05-14 Packaging structure of end face light emitting element or light receiving element Pending JPH10311937A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9124224A JPH10311937A (en) 1997-05-14 1997-05-14 Packaging structure of end face light emitting element or light receiving element

Publications (1)

Publication Number Publication Date
JPH10311937A true JPH10311937A (en) 1998-11-24

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Country Link
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