JPH10221700A - Liquid crystal display device manufacturing method - Google Patents

Liquid crystal display device manufacturing method

Info

Publication number
JPH10221700A
JPH10221700A JP9026406A JP2640697A JPH10221700A JP H10221700 A JPH10221700 A JP H10221700A JP 9026406 A JP9026406 A JP 9026406A JP 2640697 A JP2640697 A JP 2640697A JP H10221700 A JPH10221700 A JP H10221700A
Authority
JP
Japan
Prior art keywords
liquid crystal
substrate
sealing material
band
display device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9026406A
Other languages
Japanese (ja)
Other versions
JP3874871B2 (en
Inventor
Kunihiro Tashiro
国広 田代
Arihiro Takeda
有広 武田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP02640697A priority Critical patent/JP3874871B2/en
Publication of JPH10221700A publication Critical patent/JPH10221700A/en
Application granted granted Critical
Publication of JP3874871B2 publication Critical patent/JP3874871B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a liquid crystal display device manufacturing method capable of avoiding it that oriented films and liquid crystal are irradiated with the short wavelength ultraviolet rays at the time of curing sealing material without adding a complicated process and capable of manufacturing a liquid crystal display device in which the optical degradation of the liquid crystal and the oriented films is suppressed to the minimum and which is excellent in a display performance in a liquid crystal display device manufacturing method in which ultraviolet-curing resin is used as sealing material. SOLUTION: Band-pass filters 23a are formed thinner than color filters 23 like surround outsides of display areas on the substrate 20 of a side where the color filters 23 are formed. These band-pass filters 23a are simultaneously formed by the same material (resist) as that of a blue color filter. Thereafter, a substrate 10 and the substrate 20 are joined by sealing material 18 and light shielding masks 27 covering the display areas are arranged at the substrate 20 side and then the sealing material 18 is cured by being irradiated with ultraviolet rays.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【０００１】[0001]

【発明の属する技術分野】本発明は、一対の透明基板間
に液晶を封入した液晶表示装置の製造方法に関し、特に
一対の基板を接合するシール材として紫外線硬化型樹脂
を用いた液晶表示装置の製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a liquid crystal display device in which liquid crystal is sealed between a pair of transparent substrates, and more particularly to a method for manufacturing a liquid crystal display device using an ultraviolet-curable resin as a sealant for joining the pair of substrates. It relates to a manufacturing method.

【０００２】[0002]

【従来の技術】液晶表示装置は、薄くて軽量であるとと
もに低電圧で駆動できて消費電力が少ないという長所が
あり、各種電子機器に広く使用されている。特に、近
年、ＴＦＴ（Thin Film Transistor：薄膜トランジス
タ）等の能動素子が画素毎に設けられたアクティブマト
リクス方式の液晶表示装置は、表示品質の点でもＣＲＴ
（Cathode-Ray Tube）に匹敵するほど優れたものが得ら
れるようになり、携帯テレビやパーソナルコンピュータ
等のディスプレイにも使用されている。2. Description of the Related Art A liquid crystal display device is advantageous in that it is thin and lightweight, can be driven at a low voltage, and has low power consumption, and is widely used in various electronic devices. In particular, in recent years, an active matrix type liquid crystal display device in which an active element such as a TFT (Thin Film Transistor) is provided for each pixel has a CRT in view of display quality.
(Cathode-Ray Tube), which is superior to that of Cathode-Ray Tube, has been used for displays of portable televisions and personal computers.

【０００３】一般的に、液晶表示装置は２枚の透明基板
の間に液晶を封入した構造を有している。それらの透明
基板の相互に対向する２つの面（対向面）のうち、一方
の面側には対向電極、カラーフィルタ及び配向膜等が形
成され、また他方の面側にはアクティブマトリクス回
路、画素電極及び配向膜等が形成されている。更に、各
透明基板の対向面と反対側の面には、それぞれ偏光板が
貼り付けられている。これらの２枚の偏光板は、例えば
偏光板の偏光軸が互いに直交するように配置され、これ
によれば、電界をかけない状態では光を透過し、電界を
印加した状態では遮光するモード、すなわちノーマリー
ホワイトモードとなる。また、２枚の偏光板の偏光軸が
平行な場合には、ノーマリーブラックモードとなる。Generally, a liquid crystal display device has a structure in which liquid crystal is sealed between two transparent substrates. Of the two surfaces (opposing surfaces) of the transparent substrate facing each other, a counter electrode, a color filter, an alignment film, and the like are formed on one surface side, and an active matrix circuit and a pixel are formed on the other surface side. An electrode, an alignment film, and the like are formed. Further, a polarizing plate is attached to a surface of each transparent substrate opposite to the facing surface. These two polarizing plates are arranged, for example, such that the polarization axes of the polarizing plates are orthogonal to each other. According to this, a mode in which light is transmitted when no electric field is applied and light is blocked when an electric field is applied, That is, a normally white mode is set. When the polarization axes of the two polarizing plates are parallel, a normally black mode is set.

【０００４】通常、液晶表示装置の製造工程では、対向
電極、カラーフィルタ及び配向膜等が形成された基板
（以下、ＣＦ基板という）と、アクティブマトリクス回
路、画素電極及び配向膜等が形成された基板（以下、Ｔ
ＦＴ基板という）とを接合するシール材として、紫外線
硬化型樹脂が使用されている。図１０（ａ）は従来の液
晶表示装置の製造方法を示す断面図、図１０（ｂ）は同
じくその基板接合部の近傍を詳細に示す拡大図である。
但し、図１０（ａ）では、対向電極６４及び配向膜５
４，６５の図示を省略している。Usually, in a manufacturing process of a liquid crystal display device, a substrate on which a counter electrode, a color filter, an alignment film and the like are formed (hereinafter referred to as a CF substrate), an active matrix circuit, pixel electrodes, an alignment film and the like are formed. Substrate (hereinafter, T
An ultraviolet-curable resin is used as a sealing material for bonding to an FT substrate. FIG. 10A is a cross-sectional view showing a conventional method of manufacturing a liquid crystal display device, and FIG. 10B is an enlarged view showing the vicinity of the substrate bonding portion in detail.
However, in FIG. 10A, the counter electrode 64 and the alignment film 5
4 and 65 are omitted.

【０００５】ＴＦＴ基板５０は、ガラス基板５１と、こ
のガラス基板５１の一方の面上にマトリクス状に配置さ
れた複数の画素電極５２と、各画素電極５２にそれぞれ
接続されたＴＦＴ（図示せず）と、これらの画素電極５
２及びＴＦＴを覆う配向膜５４とにより構成されてい
る。また、ＣＦ基板６０は、ガラス基板６１と、このガ
ラス基板６１の一方の面上に形成され、ＴＦＴ基板５０
の画素電極５２に対応する開口部が設けられたブラック
マトリクス６２と、ブラックマトリクス６２の各開口部
に対応して設けられ、開口部毎にＲ（赤）・Ｇ（緑）・
Ｂ（青）のいずれか一色を有するカラーフィルタ６３
と、ブラックマトリクス６２及びカラーフィルタ６３上
の全面を覆う対向電極６４と、この対向電極６４を覆う
配向膜６５とにより構成されている。なお、画素電極５
２及び対向電極６４は、いずれも透明なＩＴＯ（インジ
ウム酸化スズ）膜により形成されている。The TFT substrate 50 includes a glass substrate 51, a plurality of pixel electrodes 52 arranged in a matrix on one surface of the glass substrate 51, and a TFT (not shown) connected to each pixel electrode 52. ) And these pixel electrodes 5
2 and an alignment film 54 covering the TFT. Further, the CF substrate 60 is formed on a glass substrate 61 and one surface of the glass substrate 61, and the TFT substrate 50
And a black matrix 62 provided with openings corresponding to the pixel electrodes 52, and R (red), G (green), and
Color filter 63 having any one of B (blue) colors
And an opposing electrode 64 that covers the entire surface of the black matrix 62 and the color filter 63, and an alignment film 65 that covers the opposing electrode 64. The pixel electrode 5
2 and the counter electrode 64 are both formed of a transparent ITO (indium tin oxide) film.

【０００６】これらのＴＦＴ基板５０及びＣＦ基板６０
を接合する際には、まず、ＣＦ基板６０の内面の表示領
域（画素電極がマトリクス状に配置された領域）を囲む
ように額縁状にシール材（紫外線硬化型樹脂）５８を塗
布する。このとき、後工程で基板間に液晶を注入するた
めの液晶注入口として、一部分樹脂を塗布しない部分を
設けておく。The TFT substrate 50 and the CF substrate 60
First, a sealing material (ultraviolet curable resin) 58 is applied in a frame shape so as to surround a display region (a region where pixel electrodes are arranged in a matrix) on the inner surface of the CF substrate 60. At this time, a portion to which no resin is applied is provided as a liquid crystal injection port for injecting liquid crystal between the substrates in a later step.

【０００７】次に、基板５０，６０間にスペーサ５７を
散布し、ＴＦＴ基板５０とＣＦ基板６０とを対向させて
シール材５８により接合する。次に、ＣＦ基板６０上に
表示領域を覆う遮光マスク６７を配置し、ＣＦ基板６０
側から紫外線を照射してシール材５８を硬化させ、ＴＦ
Ｔ基板５０及びＣＦ基板６０が接合されてなる液晶パネ
ル（空パネル）を形成する。このとき、配向膜５４，６
５は、遮光マスク６７により紫外線に照射されることが
防止される。Next, spacers 57 are scattered between the substrates 50 and 60, and the TFT substrate 50 and the CF substrate 60 are opposed to each other and are joined by a sealing material 58. Next, a light-shielding mask 67 covering the display area is arranged on the CF substrate 60, and the CF substrate 60
Irradiate ultraviolet rays from the side to cure the sealing material 58, TF
A liquid crystal panel (empty panel) formed by joining the T substrate 50 and the CF substrate 60 is formed. At this time, the alignment films 54, 6
5 is prevented from being irradiated with ultraviolet light by the light shielding mask 67.

【０００８】次いで、遮光マスク６７を取り外し、液晶
パネルを真空チャンバ内に入れる。そして、チャンバ内
を真空にして液晶注入口を液晶が入った容器中に浸漬し
た後、チャンバ内を大気圧に戻す。そうすると、圧力差
により液晶がパネル内に充填される。その後、液晶注入
口に封止材として紫外線硬化型樹脂を充填し、紫外線を
照射して樹脂を硬化させる。このようにして、液晶表示
装置が形成される。Next, the light-shielding mask 67 is removed, and the liquid crystal panel is placed in a vacuum chamber. Then, the inside of the chamber is evacuated and the liquid crystal injection port is immersed in the container containing the liquid crystal, and then the inside of the chamber is returned to the atmospheric pressure. Then, the liquid crystal is filled in the panel by the pressure difference. Thereafter, the liquid crystal injection port is filled with an ultraviolet curable resin as a sealing material, and the resin is cured by irradiating ultraviolet rays. Thus, a liquid crystal display device is formed.

【０００９】ところで、配向膜５４，６５や液晶に紫外
線が照射されると、配向膜５４，６５や液晶が劣化し、
焼き付きや表示むらが発生して表示性能が低下してしま
う。このため、上述の如く、ＣＦ基板６０の外面側に遮
光マスク６７を設け、紫外線硬化樹脂を硬化させる際に
配向膜５４，６５や液晶に紫外線が照射されることを防
止している。When the alignment films 54 and 65 and the liquid crystal are irradiated with ultraviolet rays, the alignment films 54 and 65 and the liquid crystal are deteriorated.
Burn-in and display unevenness occur, and the display performance deteriorates. For this reason, as described above, the light shielding mask 67 is provided on the outer surface side of the CF substrate 60 to prevent the alignment films 54 and 65 and the liquid crystal from being irradiated with ultraviolet rays when the ultraviolet curing resin is cured.

【００１０】なお、特開昭５２−７３７５７号には、金
属酸化物の皮膜により、波長が４５０ｎｍ以下の可視光
及び紫外線をカットする技術が提案されている。また、
特開平８−１７６５４９号には、紫外線吸収材を液晶中
に添加し、液晶の劣化及び異性化を防止する技術が提案
されており、特開平５−１５０２２３号には、紫外線硬
化型樹脂に替えて可視光線硬化型樹脂を使用する技術が
提案されている。Japanese Patent Laid-Open Publication No. 52-73757 proposes a technique for cutting visible light and ultraviolet light having a wavelength of 450 nm or less by using a metal oxide film. Also,
Japanese Patent Application Laid-Open No. 8-176549 proposes a technique of adding an ultraviolet absorbing material to a liquid crystal to prevent the deterioration and isomerization of the liquid crystal. Japanese Patent Application Laid-Open No. 5-150223 discloses a technique in which an ultraviolet curable resin is used. A technique using a visible light curable resin has been proposed.

【００１１】[0011]

【発明が解決しようとする課題】しかしながら、上述し
た従来の技術では、図１１に示すように、遮光マスク６
７の縁部から回り込んだ紫外線により配向膜５４，６５
や液晶が劣化してしまうという欠点がある。例えば、配
向膜５４，６５の縁部の部分が紫外線に照射された場合
であっても、配向膜５４，６５に液晶中の不純物が付着
しやすくなって、長時間使用するとこれらの不純物が配
向膜５４，６５の端部から画素電極側に拡散し、焼き付
きや色むら等の原因になる。However, according to the above-mentioned prior art, as shown in FIG.
7 and the alignment films 54 and 65
And that the liquid crystal deteriorates. For example, even when the edge portions of the alignment films 54 and 65 are irradiated with ultraviolet rays, the impurities in the liquid crystal easily adhere to the alignment films 54 and 65, and when used for a long time, these impurities are aligned. Diffusion from the ends of the films 54 and 65 to the pixel electrode side causes burn-in and uneven color.

【００１２】また、特開昭５２−７３７５７号に開示さ
れた技術では、金属酸化物の被膜を形成するときに高温
（５００〜６００℃）を要し、本発明のように特定領域
のみに被膜を形成する場合、そのエッチング工程はかな
り煩雑なものになる。特開平８−１７６５４９号に開示
された技術では、液晶に添加する紫外線吸収材により液
晶の電気的特性が変化するという問題点がある。また、
紫外線吸収材の添加により液晶の色づきや配向膜の劣化
が発生するという問題点もある。In the technique disclosed in Japanese Patent Application Laid-Open No. 52-73757, a high temperature (500 to 600 ° C.) is required when forming a metal oxide film, and the film is formed only in a specific region as in the present invention. Is formed, the etching process becomes considerably complicated. The technique disclosed in Japanese Patent Application Laid-Open No. 8-176549 has a problem that electric characteristics of the liquid crystal are changed by an ultraviolet absorber added to the liquid crystal. Also,
There is also a problem that the addition of the ultraviolet absorber causes coloring of the liquid crystal and deterioration of the alignment film.

【００１３】特開平５−１５０２２３号に開示された技
術では、一般的に可視光線硬化型樹脂の強度が紫外線硬
化型樹脂に比べて劣ることから、用途が限定され、高強
度が要求される部分に使用するシール材として適用する
ことは難しい。紫外線硬化樹脂をメインシール及び封止
材に用いた液晶表示装置では、樹脂部に硬化に必要な紫
外線を当て、且つ樹脂境界部の液晶劣化を最小限に食い
止めるため、上記の紫外線カットフィルタや吸収材では
なく、樹脂硬化に必要な紫外線の特定波長域を透過し、
それ以外の波長をカットするバンドパスフィルタ機能が
必要になる。また、プロセス的にも、パネル基板上の特
定領域に容易に形成可能であることが条件になる。In the technique disclosed in Japanese Patent Application Laid-Open No. 5-150223, the strength of a visible light curable resin is generally inferior to that of an ultraviolet curable resin. It is difficult to apply as a sealing material to be used. In a liquid crystal display device using an ultraviolet-curable resin as a main seal and a sealing material, the above-mentioned ultraviolet cut filter or absorption is used to apply ultraviolet light necessary for curing to the resin portion and to minimize the liquid crystal deterioration at the resin boundary. Rather than the material, it transmits a specific wavelength range of ultraviolet light necessary for resin curing,
A band-pass filter function for cutting other wavelengths is required. Further, it is a condition that it can be easily formed in a specific region on the panel substrate in terms of process.

【００１４】[0014]

【課題を解決するための手段】上記した課題は、一対の
透明基板のいずれか一方の基板の表示領域の外側に紫外
線をカットするバンドパスフィルタを形成する工程と、
前記バンドパスフィルタを形成した面を内側にして、前
記一対の透明基板を前記バンドパスフィルタの外縁に沿
って塗布したシール材により接合する工程と、前記一方
の基板の外側に前記表示領域を覆う遮光マスクを配置
し、前記一方の基板側から紫外線を照射して前記シール
材を硬化させる工程とを有することを特徴とする液晶表
示装置の製造方法により解決する。The object of the present invention is to form a band-pass filter for cutting ultraviolet rays outside the display area of one of a pair of transparent substrates.
Bonding the pair of transparent substrates with a sealing material applied along the outer edge of the bandpass filter, with the surface on which the bandpass filter is formed being inside, and covering the display area outside the one substrate Arranging a light-shielding mask and irradiating ultraviolet rays from the one substrate side to cure the sealing material.

【００１５】この場合に、前記バンドパスフィルタは、
青のカラーフィルタと同じ材料により形成することが好
ましい。また、上記した課題は、一対の透明基板のいず
れか一方の基板に、複数の画素電極と各画素電極間の領
域を覆うブラックマトリクスとを形成する工程と、他方
の基板の表示領域の外側に紫外線をカットするバンドパ
スフィルタを形成する工程と、前記画素電極及び前記バ
ンドパスフィルタを形成した面を内側にして、前記一対
の透明基板を前記バンドパスフィルタの外縁に沿って塗
布したシール材により接合する工程と、前記他方の基板
の外側に前記表示領域を覆う遮光マスクを配置し、前記
他方の基板側から紫外線を照射して前記シール材を硬化
させる工程とを有することを特徴とする液晶表示装置の
製造方法により解決する。In this case, the band-pass filter is:
It is preferable to use the same material as the blue color filter. In addition, the above-described problem is that a step of forming a plurality of pixel electrodes and a black matrix covering a region between the pixel electrodes on one of the pair of transparent substrates and a step of forming a black matrix outside a display region of the other substrate. A step of forming a bandpass filter for cutting ultraviolet rays, and a sealing material applied to the pair of transparent substrates along an outer edge of the bandpass filter with the surface on which the pixel electrode and the bandpass filter are formed being inside. A liquid crystal comprising: a step of bonding; and a step of arranging a light-shielding mask covering the display region outside the other substrate and irradiating ultraviolet rays from the other substrate side to cure the sealing material. The problem is solved by a method for manufacturing a display device.

【００１６】以下、本発明の作用について説明する。本
発明においては、一方の透明基板の表示領域の外側にバ
ンドパスフィルタを形成する。従って、遮光マスクの縁
部から紫外線が配向膜又は液晶側に回り込んだとして
も、バンドパスフィルタにより有害な紫外線短波長はカ
ットされ、配向膜及び液晶の光劣化は最小限に抑えられ
る。Hereinafter, the operation of the present invention will be described. In the present invention, a band-pass filter is formed outside the display area of one of the transparent substrates. Therefore, even if the ultraviolet light enters the alignment film or the liquid crystal side from the edge of the light-shielding mask, the harmful ultraviolet short wavelength is cut by the bandpass filter, and the light deterioration of the alignment film and the liquid crystal is minimized.

【００１７】カラー液晶表示装置の場合、バンドパスフ
ィルタは、例えば青のカラーフィルタと同一の材料によ
り同時に形成することができる。通常使用されている青
のカラーフィルタは、一般的な紫外線硬化型樹脂の反応
波長域（約３３０〜３８０ｎｍ）の光を透過し、反応波
長域よりも短い波長（２５０〜３３０ｎｍ）の光を殆ど
透過しない。従って、青のカラーフィルタは、本発明に
おいて使用するバンドパスフィルタとして、極めて好適
である。また、バンドパスフィルタを、青のカラーフィ
ルタと同一の材料により形成することにより、製造工程
数の増加が回避される。In the case of a color liquid crystal display device, the bandpass filter can be formed simultaneously with the same material as the blue color filter, for example. A commonly used blue color filter transmits light in the reaction wavelength range (approximately 330 to 380 nm) of a general ultraviolet curable resin, and almost all light having a wavelength (250 to 330 nm) shorter than the reaction wavelength range. Does not transmit. Therefore, a blue color filter is extremely suitable as a bandpass filter used in the present invention. Further, by forming the bandpass filter using the same material as the blue color filter, an increase in the number of manufacturing steps can be avoided.

【００１８】この場合に、通常、青のカラーフィルタ
は、色純度を確保するために１．０〜２．５μｍの厚さ
に形成される。しかし、前記バンドパスフィルの厚さを
カラーフィルタと同じにすると、バンドパスフィルタ下
のシール材に十分な紫外線を照射することが困難にな
る。従って、青のカラーフィルタと同一材料によりバン
ドパスフィルタを形成するときは、バンドパスフィルタ
の厚さをカラーフィルタの厚さよりも薄くすることが好
ましい。In this case, the blue color filter is usually formed with a thickness of 1.0 to 2.5 μm in order to secure color purity. However, if the thickness of the bandpass filter is made the same as that of the color filter, it becomes difficult to irradiate a sufficient ultraviolet ray to the sealing material below the bandpass filter. Therefore, when the bandpass filter is formed of the same material as the blue color filter, it is preferable that the thickness of the bandpass filter be smaller than the thickness of the color filter.

【００１９】また、一方の透明基板に画素電極及びＴＦ
Ｔとともにブラックマトリクスを形成し、他方の基板に
カラーフィルタを形成するいわゆるＢＭオンＴＦＴ方式
の液晶表示装置の場合、他方の透明基板のバンドパスフ
ィルタをブラックマトリクスの縁部よりも内側に配置す
ることが可能になる。これにより、表示領域のサイズを
変えることなく、基板サイズを縮小することが可能にな
る。更に、このとき、基板上に液晶を滴下した後、液晶
を一対の基板で挟み込んで封入するいわゆる滴下注入法
を用いることにより、製造に要する時間が著しく短縮さ
れる。A pixel electrode and a TF are provided on one transparent substrate.
In the case of a so-called BM-on-TFT type liquid crystal display device in which a black matrix is formed together with T and a color filter is formed on the other substrate, the band-pass filter of the other transparent substrate is disposed inside the edge of the black matrix. Becomes possible. This makes it possible to reduce the size of the substrate without changing the size of the display area. Furthermore, at this time, after the liquid crystal is dropped on the substrate, a so-called drop injection method in which the liquid crystal is sandwiched between a pair of substrates and sealed is used, so that the time required for manufacturing is significantly reduced.

【００２０】[0020]

【発明の実施の形態】以下、本発明の実施の形態につい
て、添付の図面を参照して説明する。 （第１の実施の形態）図１（ａ）は本発明の第１の実施
の形態の液晶表示装置の製造方法を示す断面図、図１
（ｂ）は同じくその基板接合部の近傍を詳細に示す拡大
図である。但し、図１（ｂ）では、対向電極２４及び配
向膜１３，２５の図示を省略する。Embodiments of the present invention will be described below with reference to the accompanying drawings. (First Embodiment) FIG. 1A is a sectional view showing a method for manufacturing a liquid crystal display device according to a first embodiment of the present invention.
(B) is an enlarged view similarly showing the vicinity of the substrate bonding portion in detail. However, in FIG. 1B, illustration of the counter electrode 24 and the alignment films 13 and 25 is omitted.

【００２１】ＴＦＴ基板１０は、従来と同様に形成す
る。すなわち、ガラス基板１１上にＴＦＴ（図示せず）
及び画素電極１２を形成し、これらのＴＦＴ及び画素電
極１２上に配向膜１３を形成する。そして、配向膜１３
の表面をラビング処理する。一方、ＣＦ基板２０は以下
のように形成する。すなわち、まず、ガラス基板２１上
に、画素電極１２に対応する部分が開口されたブラック
マトリクス２２を形成する。また、ガラス基板２１上の
画素電極１２に対応する位置に、Ｒ（赤）・Ｇ（緑）・
Ｂ（青）の各カラーフィルタ２３を約１．０〜２．５μ
ｍの厚さで形成するとともに、ブラックマトリクス２２
の縁部からその外側の領域を覆うバンドパスフィルタ２
３ａを形成する。このバンドパスフィルタ２３ａは青の
カラーフィルタと同じ材料により形成し、露光量を調整
することにより約０．６μｍの厚さに形成するその後、
基板２１上の全面にＩＴＯからなる対向電極２４を形成
し、更に対向電極２４上に配向膜２５を形成する。そし
て、配向膜２５の表面をラビング処理する。The TFT substrate 10 is formed in the same manner as in the prior art. That is, a TFT (not shown) is formed on the glass substrate 11.
And the pixel electrode 12, and an alignment film 13 is formed on the TFT and the pixel electrode 12. And the alignment film 13
Rubbing the surface of. On the other hand, the CF substrate 20 is formed as follows. That is, first, a black matrix 22 having a portion corresponding to the pixel electrode 12 is formed on the glass substrate 21. Further, R (red), G (green), and R (red) are provided at positions corresponding to the pixel electrodes 12 on the glass substrate 21.
Each of the B (blue) color filters 23 is about 1.0 to 2.5 μm.
m and a black matrix 22
Band-pass filter 2 covering the area outside from the edge of
3a is formed. The band-pass filter 23a is formed of the same material as the blue color filter, and is formed to a thickness of about 0.6 μm by adjusting the amount of exposure.
A counter electrode 24 made of ITO is formed on the entire surface of the substrate 21, and an alignment film 25 is formed on the counter electrode 24. Then, the surface of the alignment film 25 is rubbed.

【００２２】次に、ＣＦ基板２０のバンドパスフィルタ
２３ａの縁部に沿って額縁状にシール材（紫外線硬化型
樹脂）１８を約１ｍｍの幅で塗布する。このとき、後工
程で液晶を注入するための液晶注入口として、一部にシ
ール材１８を塗布しない領域を設けておく。そして、Ｔ
ＦＴ基板１０とＣＦ基板２０との間に球形のスペーサ１
７を散布し、両方の基板１０，２０を配向膜１３，２５
が形成されている面を内側にして対向配置し、シール材
１８により接合する。Next, a sealing material (ultraviolet curing resin) 18 is applied in a frame shape along the edge of the band-pass filter 23a of the CF substrate 20 with a width of about 1 mm. At this time, a region where the sealing material 18 is not applied is provided in a part as a liquid crystal injection port for injecting liquid crystal in a later step. And T
Spherical spacer 1 between FT substrate 10 and CF substrate 20
7 and both substrates 10 and 20 are aligned with alignment films 13 and 25.
Are arranged facing each other with the surface on which the is formed inward, and are joined by the sealing material 18.

【００２３】次に、ＣＦ基板２０の外側に表示領域を覆
う遮光マスク（遮光性の金属膜又はフィルム等）２７を
配置し、ＣＦ基板２０側から紫外線を照射してシール材
１８を硬化させる。これにより、２枚の基板１０，２０
が接合されてなる液晶パネル（空パネル）が形成され
る。この場合に、遮光マスク２７の端部から回り込んだ
紫外線短波長はバンドパスフィルタ２３ａによりカット
され、配向膜１３，２５の光劣化は最小限に抑えられ
る。Next, a light-shielding mask (light-shielding metal film or film or the like) 27 that covers the display area is arranged outside the CF substrate 20, and the sealing material 18 is cured by irradiating ultraviolet rays from the CF substrate 20 side. Thereby, the two substrates 10 and 20
Are formed to form a liquid crystal panel (empty panel). In this case, the short-wavelength ultraviolet light wrapping around from the end of the light-shielding mask 27 is cut by the band-pass filter 23a, and light deterioration of the alignment films 13 and 25 is minimized.

【００２４】その後、液晶パネルを真空チャンバ内に入
れ、チャンバ内を真空にした後、液晶注入口を液晶中に
浸漬し、チャンバ内を大気圧に戻す。そうすると、パネ
ル内の圧力と大気圧との差により、パネル内に液晶が充
填される。次いで、液晶注入口に封止材として紫外線硬
化型樹脂を充填し、ＣＦ基板２０の外側に遮光マスク２
７を配置した後、紫外線を照射して封止材を硬化させ
る。このようにして、液晶表示装置が製造される。Thereafter, the liquid crystal panel is placed in a vacuum chamber, and the inside of the chamber is evacuated. Then, the liquid crystal injection port is immersed in the liquid crystal to return the inside of the chamber to atmospheric pressure. Then, the liquid crystal is filled in the panel due to the difference between the pressure in the panel and the atmospheric pressure. Next, the liquid crystal injection port is filled with an ultraviolet curable resin as a sealing material, and a light shielding mask 2 is provided outside the CF substrate 20.
After arranging 7, the sealing material is cured by irradiating ultraviolet rays. Thus, a liquid crystal display device is manufactured.

【００２５】図２は、横軸に波長をとり、縦軸に相対強
度をとって、シール材の硬化に使用されている水銀ショ
ートアークランプの輝線スペクトルを示す図である。紫
外線硬化型樹脂は、主に波長が３３０〜３８０ｎｍの光
により硬化し、液晶や配向膜の劣化は主にそれよりも短
い波長（図中Ａで示す波長域）の光により発生する。図
３及び図４は、横軸に波長をとり、縦軸に透過率をとっ
て、ガラス（無アルカリガラス）基板の光透過率特性を
示す図である。なお、図３はガラス基板のみの光透過率
特性を示し、図４は表面にＩＴＯ膜を有するガラス基板
の光透過率特性を示す。図３に示すようにＩＴＯ膜がな
いガラス基板では波長が約２５０ｎｍよりも長い光を透
過するのに対し、図４に示すようにＩＴＯ膜を有するガ
ラス基板では波長が約２８０ｎｍよりも長い波長の光を
透過する。すなわち、ＩＴＯ膜を有するガラス基板で
は、波長が２８０ｎｍ以下の光はほぼ１００％カットさ
れる。FIG. 2 is a graph showing the emission line spectrum of a mercury short arc lamp used for curing the sealing material, with the horizontal axis representing wavelength and the vertical axis representing relative intensity. The ultraviolet curable resin is mainly cured by light having a wavelength of 330 to 380 nm, and the deterioration of the liquid crystal and the alignment film is mainly caused by light having a shorter wavelength (the wavelength range indicated by A in the figure). FIGS. 3 and 4 are graphs showing the light transmittance characteristics of a glass (alkali-free glass) substrate, with the horizontal axis representing wavelength and the vertical axis representing transmittance. FIG. 3 shows the light transmittance characteristics of only the glass substrate, and FIG. 4 shows the light transmittance characteristics of the glass substrate having an ITO film on the surface. As shown in FIG. 3, a glass substrate having no ITO film transmits light having a wavelength longer than about 250 nm, whereas a glass substrate having an ITO film has a wavelength longer than about 280 nm as shown in FIG. Transmits light. That is, in a glass substrate having an ITO film, light having a wavelength of 280 nm or less is almost 100% cut.

【００２６】図５は、横軸に波長をとり、縦軸に光の透
過率をとって、青のカラーフィルタの透過率特性を示す
図である。但し、このカラーフィルタは、顔料分散法に
より形成したものであり、フィルタの厚さは約１．３μ
ｍである。この図に示すように、青のカラーフィルタ
は、波長が約３２０〜５９０ｎｍの光を透過し、波長が
約４６０ｎｍの光を最もよく透過する。このカラーフィ
ルタをバンドパスフィルタとして使用した場合、紫外線
硬化樹脂の硬化に有効な波長が３３０〜３８０ｎｍの光
は比較的多く（図中斜線で示す）透過し、液晶及び配向
膜の劣化の原因となる波長が３３０ｎｍ以下の光はほぼ
遮断される。この図から、青のカラーフィルタと同一材
料により形成したバンドパスフィルタは、シール材の硬
化に必要な波長の光を比較的よく透過し、液晶及び配向
膜の劣化の原因となる紫外線短波長を効率よく遮断する
ことが明らかである。FIG. 5 is a graph showing the transmittance characteristics of the blue color filter, with the horizontal axis representing wavelength and the vertical axis representing light transmittance. However, this color filter was formed by a pigment dispersion method, and the thickness of the filter was about 1.3 μm.
m. As shown in this figure, the blue color filter transmits light having a wavelength of about 320 to 590 nm, and most preferably transmits light having a wavelength of about 460 nm. When this color filter is used as a bandpass filter, light having a wavelength of 330 to 380 nm, which is effective for curing the ultraviolet curable resin, is transmitted through a relatively large amount (indicated by oblique lines in the drawing), which causes deterioration of the liquid crystal and the alignment film. Light having a wavelength of 330 nm or less is almost blocked. From this figure, it can be seen that the bandpass filter formed of the same material as the blue color filter transmits light of the wavelength necessary for curing the sealing material relatively well, and has a short wavelength of ultraviolet light which causes deterioration of the liquid crystal and the alignment film. It is clear that blocking is efficient.

【００２７】本実施の形態では、紫外線照射時に遮光マ
スクの端部から紫外線が回り込んだとしても、バンドパ
スフィルタ２３ａにより液晶及び配向膜に有害な紫外線
短波長が照射されることが抑制される。これにより、液
晶及び配向膜の光劣化は最小限に抑えられ、表示品質の
劣化は回避される。また、本実施の形態では、バンドパ
スフィルタ２３ａは、青のカラーフィルタと同一材料に
より同時に形成するので、工程数の増加が抑制される。In the present embodiment, even when ultraviolet rays circulate from the end of the light-shielding mask during ultraviolet irradiation, irradiation of the liquid crystal and the alignment film with harmful ultraviolet short wavelengths is suppressed by the bandpass filter 23a. . As a result, light deterioration of the liquid crystal and the alignment film is minimized, and deterioration of display quality is avoided. Further, in the present embodiment, since the band-pass filter 23a is formed simultaneously with the blue color filter using the same material, an increase in the number of steps is suppressed.

【００２８】以下、バンドパスフィルタの厚さの最適値
について調べた結果について説明する。第１の実施の形
態においては、バンドパスフィルタは、青のカラーフィ
ルタと同一材料により同時に形成する。そこで、カラー
フィルタに使用するレジストの膜厚と紫外線の遮蔽特性
との関係について調べた。なお、通常、カラーフィルタ
は、色純度を確保するために、１．０〜２．５μｍの厚
さに形成される。Hereinafter, a description will be given of a result obtained by examining the optimum value of the thickness of the bandpass filter. In the first embodiment, the bandpass filter is formed simultaneously with the blue color filter using the same material. Then, the relationship between the thickness of the resist used for the color filter and the shielding property of ultraviolet rays was examined. Usually, the color filter is formed to have a thickness of 1.0 to 2.5 μm in order to secure color purity.

【００２９】まず、ネガ型アクリル樹脂の感光性レジス
ト（ＣＢ−２０００：富士ハント社製）に青の顔料を分
散させ、このレジストをローラコータによりガラス基板
上に塗布した。そして、ガラス基板をホットプレート上
で１１０℃の温度で９０秒間加熱し予備硬化させた後、
露光及び現像処理を施した。その後、２３０℃の温度で
１０分間加熱することによりレジストを本硬化させて、
青のバンドパスフィルタを得た。First, a blue pigment was dispersed in a negative type acrylic resin photosensitive resist (CB-2000: manufactured by Fuji Hunt), and the resist was applied on a glass substrate by a roller coater. Then, the glass substrate is heated at 110 ° C. for 90 seconds on a hot plate and pre-cured,
Exposure and development were performed. Thereafter, the resist was fully cured by heating at a temperature of 230 ° C. for 10 minutes,
A blue bandpass filter was obtained.

【００３０】この場合、紫外線露光量を調整して、種々
の膜厚のバンドパスフィルタを形成した。図６は横軸に
紫外線露光量をとり、縦軸にバンドパスフィルタの膜厚
をとって、両者の関係を示す図である。この図６に示す
ように、紫外線露光量を調整することにより、所望の膜
厚のバンドパスフィルタを形成することができる。次
に、分光器（キャノン製ＬＣ−ＳＰ）を使用し、膜厚が
０．３μｍ、０．６μｍ及び１．３μｍのバンドパスフ
ィルタの分光特性を調べた。図７は、横軸に波長をと
り、縦軸に光の透過率をとって、バンドパスフィルタの
膜厚と透過率との関係を示す図である。この図７に示す
ように、バンドパスフィルタの膜厚を薄くすると光の透
過率は上昇するが、過度に薄くすると液晶や配向膜の劣
化の原因となる波長の光も透過して、バンドパスフィル
タとしての性能が低下する。一方、バンドパスフィルタ
の厚さを厚くすると、シール材の硬化に有効な波長の光
も遮断されて、バンドパスフィルタの下のシール材を十
分に硬化させることができなくなる。第１の実施の形態
では、紫外線硬化樹脂の硬化に寄与する波長が約３３０
〜３８０ｎｍの光をできるだけ透過し、且つ液晶及び配
向膜に対し有害な短波長成分をカットできるバンドパス
フィルタとして、約０．６μｍの厚さのカラーフィルタ
が好適である。しかし、この図５に示すように、膜厚が
０．３〜１．３μｍのカラーフィルタでもバンドパスフ
ィルタとして使用することができる。In this case, bandpass filters having various thicknesses were formed by adjusting the amount of exposure to ultraviolet light. FIG. 6 is a diagram showing the relationship between the ultraviolet exposure amount on the horizontal axis and the film thickness of the bandpass filter on the vertical axis. As shown in FIG. 6, a band-pass filter having a desired film thickness can be formed by adjusting the amount of ultraviolet light exposure. Next, using a spectroscope (LC-SP manufactured by Canon), the spectral characteristics of the bandpass filters having the film thicknesses of 0.3 μm, 0.6 μm, and 1.3 μm were examined. FIG. 7 is a diagram showing the relationship between the film thickness of the band-pass filter and the transmittance, with the wavelength on the horizontal axis and the transmittance of light on the vertical axis. As shown in FIG. 7, when the thickness of the bandpass filter is reduced, the light transmittance increases. However, when the bandpass filter is excessively thin, light having a wavelength that causes deterioration of the liquid crystal and the alignment film is also transmitted. The performance as a filter decreases. On the other hand, when the thickness of the bandpass filter is increased, light having a wavelength effective for curing the sealant is also blocked, and the sealant below the bandpass filter cannot be sufficiently cured. In the first embodiment, the wavelength contributing to the curing of the ultraviolet curable resin is about 330
A color filter having a thickness of about 0.6 μm is suitable as a bandpass filter that transmits light of up to 380 nm as much as possible and can cut short wavelength components harmful to the liquid crystal and the alignment film. However, as shown in FIG. 5, even a color filter having a film thickness of 0.3 to 1.3 μm can be used as a bandpass filter.

【００３１】次に、上記のようにして形成したバンドパ
スフィルタに対するシール材（紫外線硬化樹脂）の接合
強度について調べた結果について説明する。まず、１５
×５０ｍｍの２枚のガラス基板の中央に紫外線硬化型樹
脂を直径が３ｍｍの点状に塗布し、直径が約５μｍの球
形スペーサ（ＳＰ−２０５：積水ファインケミカル製）
散布して、これらの基板を貼合わせた。これと同様に、
２枚のガラス基板にカラーフィルタ用レジストの膜を形
成し、このレジスト膜上に紫外線硬化型樹脂を塗布し、
基板間にスペーサを散布して２枚の基板を貼合わせた。
更に、ガラス基板にカラーフィルタ用レジストの膜をス
トライプ状に形成し、紫外線硬化樹脂を半分がガラス基
板に接触し、残りがレジスト膜に接触するように塗布し
て、基板間にスペーサを散布した後、貼合わせた。Next, a description will be given of the result of an examination on the bonding strength of the sealing material (ultraviolet curable resin) to the band pass filter formed as described above. First, 15
An ultraviolet-curable resin is applied in the form of a dot having a diameter of 3 mm to the center of two glass substrates of 50 mm and a spherical spacer having a diameter of about 5 μm (SP-205: manufactured by Sekisui Fine Chemical)
The substrates were sprinkled and bonded. Similarly,
A resist film for a color filter is formed on two glass substrates, and an ultraviolet curable resin is applied on the resist film,
Spacers were sprinkled between the substrates to bond the two substrates together.
Further, a color filter resist film was formed in a stripe shape on a glass substrate, and an ultraviolet curable resin was applied so that half of the resin was in contact with the glass substrate and the other was in contact with the resist film, and spacers were dispersed between the substrates. Later, they were laminated.

【００３２】そして、これらの基板に対し、３０００ｍ
Ｊ／ｃｍ2 の光量で紫外線を照射して樹脂を硬化させ
た。その後、剥離試験機を使用して剥離強度を測定し
た。その結果、ガラス基板に直接紫外線硬化型樹脂を塗
布した場合の剥離強度は１．５ｋｇｆ／ｃｍ2 であっ
た。また、レジスト膜上に紫外線硬化型樹脂を塗布した
場合の剥離強度は０．７ｋｇｆ／ｃｍ2 であった。さら
に、半分がガラス基板に接触し、残りがレジスト膜に接
触するように紫外線硬化型樹脂を塗布した場合の剥離強
度は１．２ｋｇｆ／ｃｍ2 であった。Then, for these substrates, 3000 m
The resin was cured by irradiating ultraviolet rays with a light amount of J / cm 2 . Thereafter, the peel strength was measured using a peel tester. As a result, the peel strength when the ultraviolet curable resin was directly applied to the glass substrate was 1.5 kgf / cm 2 . The peel strength when an ultraviolet curable resin was applied on the resist film was 0.7 kgf / cm 2 . Furthermore, the peel strength was 1.2 kgf / cm 2 when an ultraviolet curable resin was applied so that half of the resin was in contact with the glass substrate and the other half was in contact with the resist film.

【００３３】図８は、横軸にシール材とカラーフィルタ
用レジスト膜との重ね合わせの割合をとり、縦軸に剥離
強度をとって、両者の関係を示す図である。通常、液晶
表示装置では、パネル強度や耐湿性の点から、剥離強度
は１．０ｋｇｆ／ｃｍ2 以上必要であるとされている。
この図８から、シール材がガラス基板に直接接触してい
る部分が３０％以上であれば、剥離強度は１．０ｋｇｆ
／ｃｍ2 以上になり、十分な剥離強度を確保することが
できることがわかる。FIG. 8 is a diagram showing the relationship between the overlap ratio of the sealing material and the resist film for a color filter on the horizontal axis and the peel strength on the vertical axis. Generally, in a liquid crystal display device, a peel strength of 1.0 kgf / cm 2 or more is required from the viewpoint of panel strength and moisture resistance.
From FIG. 8, it can be seen from FIG. 8 that if the portion where the sealing material is in direct contact with the glass substrate is 30% or more, the peel strength is 1.0 kgf.
/ Cm 2 or more, indicating that sufficient peel strength can be secured.

【００３４】（第２の実施の形態）図９（ａ）は本発明
の第２の実施の形態の液晶表示装置を示す断面図、図９
（ｂ）は同じくその基板接合部の近傍を詳細に示す拡大
図である。本実施の形態は、ＴＦＴ基板側にブラックマ
トリクスを形成するいわゆるＢＭオンＴＦＴ方式の液晶
表示装置に本発明を適用したものである。なお、図９
（ａ）では、対向電極４４及び配向膜３４，４５の図示
を省略している。(Second Embodiment) FIG. 9A is a sectional view showing a liquid crystal display device according to a second embodiment of the present invention.
(B) is an enlarged view similarly showing the vicinity of the substrate bonding portion in detail. In the present embodiment, the present invention is applied to a so-called BM-on-TFT type liquid crystal display device in which a black matrix is formed on a TFT substrate side. Note that FIG.
In (a), the illustration of the counter electrode 44 and the alignment films 34 and 45 is omitted.

【００３５】ＴＦＴ基板３０は、以下のように形成す
る。すなわち、まず、ガラス基板３１上に、ブラックマ
トリクス３２を所定のパターンで形成する。その後、各
画素領域にそれぞれ画素電極３３とＴＦＴ（図示せず）
とを形成する。そして、基板３１上に、これらの画素電
極３３及びＴＦＴを覆う配向膜３４を形成した後、配向
膜３４の表面をラビング処理する。The TFT substrate 30 is formed as follows. That is, first, the black matrix 32 is formed on the glass substrate 31 in a predetermined pattern. Thereafter, a pixel electrode 33 and a TFT (not shown) are provided in each pixel region.
And are formed. Then, after forming an alignment film 34 covering the pixel electrode 33 and the TFT on the substrate 31, the surface of the alignment film 34 is subjected to a rubbing process.

【００３６】一方、ＣＦ基板４０は以下のように形成す
る。すなわち、ガラス基板４１の上に、各画素領域毎
に、Ｒ（赤）・Ｇ（緑）・Ｂ（青）のいずれか一色のカ
ラーフィルタ４３を形成する。このとき、青のカラーフ
ィルタと同一の材料により、表示領域の縁部に沿って額
縁状にバンドパスフィルタ４３ａを形成する。次に、基
板４１の表示領域上を覆う対向電極４４を形成し、この
対向電極４４上に配向膜４５を形成する。その後、配向
膜４５の表面をラビング処理する。On the other hand, the CF substrate 40 is formed as follows. That is, a color filter 43 of any one of R (red), G (green), and B (blue) is formed on the glass substrate 41 for each pixel region. At this time, the band-pass filter 43a is formed in the shape of a frame along the edge of the display region using the same material as the blue color filter. Next, a counter electrode 44 covering the display area of the substrate 41 is formed, and an alignment film 45 is formed on the counter electrode 44. After that, the surface of the alignment film 45 is rubbed.

【００３７】なお、画素電極３３及び対向電極４４はい
ずれもＩＴＯにより形成し、カラーフィルタ４３は約
１．０〜２．５μｍ、バンドパスフィルタ４３ａは約
０．６μｍの厚さに形成する。次に、ＣＦ基板４０のバ
ンドパスフィルタ４３ａの縁部に沿って額縁状にシール
材（紫外線硬化型樹脂）を塗布し、ＴＦＴ基板３０とＣ
Ｆ基板４０との間にスペーサ３７を散布するとともに、
液晶を滴下し、両方の基板３０，４０を配向膜３４，４
５が形成されている面を内側にして対向配置し、シール
材１８により接合する。The pixel electrode 33 and the counter electrode 44 are both formed of ITO, and the color filter 43 is formed to have a thickness of about 1.0 to 2.5 μm, and the band pass filter 43a is formed to have a thickness of about 0.6 μm. Next, a sealing material (ultraviolet curable resin) is applied in a frame shape along the edge of the bandpass filter 43a of the CF substrate 40, and the TFT substrate 30
While dispersing the spacer 37 between the F substrate 40 and
Liquid crystal is dropped, and both substrates 30 and 40 are aligned with alignment films 34 and 4.
5 are arranged facing each other with the surface on which they are formed inward, and joined by a seal material 18.

【００３８】その後、ＣＦ基板４０上に表示領域を覆う
遮光マスク４７を配置し、ＣＦ基板４０側から紫外線を
照射してシール材３８を硬化させる。このようにして液
晶表示装置が形成される。本実施の形態においては、ブ
ラックマトリクス３２がＴＦＴ基板３０側に形成されて
おり、バンドパスフィルタ４３ａはブラックマトリクス
３２の縁部よりも内側に配置することができるので、狭
額縁化が達成でき、第１の実施の形態に比べ基板の寸法
を削減できる。また、ＴＦＴ基板３０とＣＦ基板４０と
を接合するときに両者の間に液晶を滴下し、ＴＦＴ基板
３０とＣＦ基板４０との接合と同時に基板間に液晶を封
入するので、第１の実施の形態に比べて製造に要する時
間が著しく短縮される。After that, a light-shielding mask 47 for covering the display area is arranged on the CF substrate 40, and the sealing material 38 is cured by irradiating ultraviolet rays from the CF substrate 40 side. Thus, a liquid crystal display device is formed. In the present embodiment, the black matrix 32 is formed on the TFT substrate 30 side, and the band-pass filter 43a can be arranged inside the edge of the black matrix 32. The size of the substrate can be reduced as compared with the first embodiment. Further, when the TFT substrate 30 and the CF substrate 40 are joined, liquid crystal is dropped between the two, and the liquid crystal is sealed between the TFT substrate 30 and the CF substrate 40 simultaneously with the joining of the TFT substrate 30 and the CF substrate 40. The time required for manufacturing is significantly reduced as compared with the form.

【００３９】以下、第２の実施の形態の液晶表示装置を
実際に形成し、表示部のセル厚のばらつき、イオン密度
及び残留ＤＣ電圧を測定した結果について説明する。液
晶表示装置の劣化は、イオン密度及び残留ＤＣ電圧に関
係し、イオン密度又は残留ＤＣ電圧が高いほど劣化しや
すいということが知られている。実施例のパネルとし
て、上記の方法によりＢＭオンＴＦＴ方式の液晶表示装
置を形成した。パネル内に充填した液晶には、標準液晶
ＺＬＩ−４７９２（メルク社製）を用いた。なお、シー
ルに混入させるファイバスペーサの径は青のカラーフィ
ルタ膜厚分だけ小さくした。また、ブラックマトリクス
の外縁部（額縁部）の幅は４．５ｍｍ、バンドパスフィ
ルタ４３ａの幅は３ｍｍ、バンドパスフィルタ４３ａの
外縁からブラックマトリクス３２の外縁までの距離は
０．５ｍｍである。Hereinafter, the results of actually forming the liquid crystal display device of the second embodiment and measuring the variation in cell thickness, the ion density, and the residual DC voltage of the display section will be described. The deterioration of the liquid crystal display device is related to the ion density and the residual DC voltage, and it is known that the higher the ion density or the residual DC voltage, the more easily the liquid crystal display device deteriorates. A BM-on-TFT liquid crystal display device was formed as the panel of the example by the above method. Standard liquid crystal ZLI-4792 (manufactured by Merck) was used for the liquid crystal filled in the panel. The diameter of the fiber spacer mixed into the seal was reduced by the thickness of the blue color filter. Further, the width of the outer edge portion (frame portion) of the black matrix is 4.5 mm, the width of the bandpass filter 43a is 3 mm, and the distance from the outer edge of the bandpass filter 43a to the outer edge of the black matrix 32 is 0.5 mm.

【００４０】また、従来例として、バンドパスフィルタ
を有しないこと以外は実施例と同様の液晶表示装置を形
成した。そして、これらの実施例及び従来例の液晶表示
装置について、セル厚のばらつき、イオン密度及び残留
ＤＣ電圧を調べた。その結果を、下記表１に示す。但
し、セル厚のばらつきは、シール端部から３．５ｍｍの
位置（表示部端）におけるセル厚と、表示領域の中央の
厚さを測定し、その差を求めることによって評価した。
また、イオン密度は、温度が５０℃の条件で電極間に波
高値が１０Ｖ、周波数が０．０５Ｈｚの三角波電圧を印
加して測定した。更に残留ＤＣ電圧は、温度が５０℃の
条件で、波高値が２．０Ｖ、周波数が３０Ｈｚ、オフセ
ット電圧が４Ｖの矩形波電圧を電極間に約１０分間印加
した後、測定した。Further, as a conventional example, a liquid crystal display device similar to that of the embodiment except that no band pass filter was provided was formed. With respect to the liquid crystal display devices of these examples and the conventional example, variations in cell thickness, ion density, and residual DC voltage were examined. The results are shown in Table 1 below. However, the variation in the cell thickness was evaluated by measuring the cell thickness at a position 3.5 mm from the end of the seal (the end of the display section) and the thickness at the center of the display area, and calculating the difference.
The ion density was measured at a temperature of 50 ° C. by applying a triangular wave voltage having a peak value of 10 V and a frequency of 0.05 Hz between the electrodes. Further, the residual DC voltage was measured after applying a rectangular wave voltage having a peak value of 2.0 V, a frequency of 30 Hz, and an offset voltage of 4 V for about 10 minutes at a temperature of 50 ° C. between the electrodes.

【００４１】[0041]

【表１】 [Table 1]

【００４２】この表１に示すように、実施例及び従来例
の液晶表示装置は、いずれもセル厚のばらつきは±０．
１μｍの範囲であり、実施例と従来例との間で差異は認
められなかった。また、実施例の液晶表示パネルは、イ
オン密度が従来例の１／６〜１／７、残留ＤＣ電圧が従
来例の約１／３と低い値を示した。このことから、実施
例の液晶表示装置は、従来例に比べて、紫外線による液
晶及び配向膜の劣化が発生しにくいことが明らかであ
る。As shown in Table 1, each of the liquid crystal display devices of the embodiment and the conventional example has a cell thickness variation of ± 0.
It was in the range of 1 μm, and no difference was observed between the example and the conventional example. Further, the liquid crystal display panel of the example exhibited a low ion density of 1/6 to 1/7 of the conventional example and a low residual DC voltage of about 1/3 of the conventional example. From this, it is clear that the liquid crystal display device of the example is less likely to cause deterioration of the liquid crystal and the alignment film due to ultraviolet rays as compared with the conventional example.

【００４３】[0043]

【発明の効果】以上説明したように、本発明によれば、
一方の透明基板の表示領域の外側にバンドパスフィルタ
を設け、このバンドパスフィルタを形成した面を内側に
して一対の基板をシール材で接合し、前記一方の基板の
外側に遮光マスク配置して紫外線を照射することにより
シール材を硬化させるので、遮光マスクの端部から回り
込んだ紫外線短波長がバンドパスフィルタによりカット
され、配向膜及び液晶の光劣化を最小限に抑えることが
でき、焼き付きや表示むらのない液晶表示装置を製造で
きる。As described above, according to the present invention,
A band-pass filter is provided outside the display area of one of the transparent substrates, a pair of substrates is bonded with a sealant with the surface on which the band-pass filter is formed inside, and a light-shielding mask is arranged outside the one of the substrates. Since the sealing material is cured by irradiating the ultraviolet rays, the short-wavelength ultraviolet rays wrapping around from the end of the light-shielding mask are cut by the band-pass filter, and the light deterioration of the alignment film and the liquid crystal can be suppressed to a minimum. A liquid crystal display device having no display unevenness can be manufactured.

【００４４】また、青のカラーフィルタと同一材料で前
記バンドパスフィルタを形成することにより、工程数の
増加を回避できる。更に、本発明をＢＭオンＴＦＴ方式
の液晶表示装置に適用することにより、表示領域の外側
の寸法を縮小することができるという。更にまた、滴下
注入法により基板間に液晶を封入することにより、製造
に要する時間が著しく短縮される。Further, by forming the bandpass filter using the same material as the blue color filter, an increase in the number of steps can be avoided. Furthermore, by applying the present invention to a BM-on-TFT type liquid crystal display device, the size outside the display area can be reduced. Furthermore, by encapsulating the liquid crystal between the substrates by the drop-injection method, the time required for manufacturing is significantly reduced.

【図面の簡単な説明】[Brief description of the drawings]

【図１】（ａ）は本発明の第１の実施の形態の液晶表示
装置の製造方法を示す断面図、（ｂ）は同じくその基板
接合部の近傍を詳細に示す拡大図である。FIG. 1A is a cross-sectional view showing a method for manufacturing a liquid crystal display device according to a first embodiment of the present invention, and FIG. 1B is an enlarged view showing the vicinity of the substrate bonding portion in detail.

【図２】水銀ショートアークランプの輝線スペクトルを
示す図である。FIG. 2 is a diagram showing a bright line spectrum of a mercury short arc lamp.

【図３】ガラス基板のみの光透過率特性を示す図であ
る。FIG. 3 is a diagram showing light transmittance characteristics of only a glass substrate.

【図４】ＩＴＯ膜を有するガラス基板の光透過率特性を
示す図である。FIG. 4 is a diagram showing light transmittance characteristics of a glass substrate having an ITO film.

【図５】青のカラーフィルタの透過率特性を示す図であ
る。FIG. 5 is a diagram illustrating transmittance characteristics of a blue color filter.

【図６】紫外線露光量とバンドパスフィルタの膜厚との
関係を示す図である。FIG. 6 is a diagram showing a relationship between an ultraviolet exposure amount and a film thickness of a bandpass filter.

【図７】バンドパスフィルタの膜厚と透過率との関係を
示す図である。FIG. 7 is a diagram illustrating a relationship between a film thickness and a transmittance of a bandpass filter.

【図８】シール材及びフィルタの重ね合わせの割合と剥
離強度との関係を示す図である。FIG. 8 is a diagram showing a relationship between a ratio of superposition of a sealing material and a filter and a peel strength.

【図９】（ａ）は本発明の第２の実施の形態の液晶表示
装置を示す断面図、（ｂ）は同じくその基板接合部の近
傍を詳細に示す拡大図である。FIG. 9A is a cross-sectional view illustrating a liquid crystal display device according to a second embodiment of the present invention, and FIG. 9B is an enlarged view illustrating the vicinity of a substrate bonding portion in the same manner.

【図１０】（ａ）は従来の液晶表示装置の製造方法を示
す断面図、（ｂ）は同じくその基板接合部の近傍を詳細
に示す拡大図である。FIG. 10A is a cross-sectional view showing a conventional method for manufacturing a liquid crystal display device, and FIG. 10B is an enlarged view showing the vicinity of the substrate bonding portion in detail.

【図１１】従来の問題点を示す図である。FIG. 11 is a diagram showing a conventional problem.

【符号の説明】[Explanation of symbols]

１０，３０，５０ ＴＦＴ基板 １１，２１，３１，４２，５１，６１ ガラス基板 １２，３３，５２ 画素電極 １３，２５，３４，４５，５４，６５ 配向膜 １７，３７，５７ スペーサ １８，３８，５８ シール材 ２０，４０，６０ ＣＦ基板 ２２，３２，６２ ブラックマトリクス ２３，４３，６３ カラーフィルタ ２４，４４，６４ 対向電極 ２７，４７，６７ 遮光マスク ２３ａ，４３ａ バンドパスフィルタ 10, 30, 50 TFT substrate 11, 21, 31, 42, 51, 61 Glass substrate 12, 33, 52 Pixel electrode 13, 25, 34, 45, 54, 65 Alignment film 17, 37, 57 Spacer 18, 38, 58 Sealing material 20, 40, 60 CF substrate 22, 32, 62 Black matrix 23, 43, 63 Color filter 24, 44, 64 Counter electrode 27, 47, 67 Light shielding mask 23a, 43a Band pass filter

Claims (5)

【特許請求の範囲】[Claims] 【請求項１】 一対の透明基板のいずれか一方の基板の
表示領域の外側に紫外線をカットするバンドパスフィル
タを形成する工程と、 前記バンドパスフィルタを形成した面を内側にして、前
記一対の透明基板を前記バンドパスフィルタの外縁に沿
って塗布したシール材により接合する工程と、 前記一方の基板の外側に前記表示領域を覆う遮光マスク
を配置し、前記一方の基板側から紫外線を照射して前記
シール材を硬化させる工程とを有することを特徴とする
液晶表示装置の製造方法。A step of forming a band-pass filter for cutting ultraviolet rays outside a display region of one of the pair of transparent substrates; and Bonding a transparent substrate with a sealing material applied along the outer edge of the bandpass filter; and placing a light-shielding mask covering the display area outside the one substrate, and irradiating ultraviolet rays from the one substrate side. Curing the sealing material by using the above method. 【請求項２】 前記一方の基板の前記表示領域に青のカ
ラーフィルタを形成する工程を有し、 前記バンドパスフィルタは、前記青のカラーフィルタと
同一の材料により形成することを特徴とする請求項１に
記載の液晶表示装置の製造方法。2. The method according to claim 1, further comprising the step of forming a blue color filter in the display area of the one substrate, wherein the band-pass filter is formed of the same material as the blue color filter. Item 2. A method for manufacturing a liquid crystal display device according to item 1. 【請求項３】 前記バンドパスフィルタは、前記青のカ
ラーフィルタよりも薄く形成することを特徴とする請求
項２に記載の液晶表示装置の製造方法。3. The method according to claim 2, wherein the band-pass filter is formed thinner than the blue color filter. 【請求項４】 一対の透明基板のいずれか一方の基板
に、複数の画素電極と各画素電極間の領域を覆うブラッ
クマトリクスとを形成する工程と、 他方の基板の表示領域の外側に紫外線をカットするバン
ドパスフィルタを形成する工程と、 前記画素電極及び前記バンドパスフィルタを形成した面
を内側にして、前記一対の透明基板を前記バンドパスフ
ィルタの外縁に沿って塗布したシール材により接合する
工程と、 前記他方の基板の外側に前記表示領域を覆う遮光マスク
を配置し、前記他方の基板側から紫外線を照射して前記
シール材を硬化させる工程とを有することを特徴とする
液晶表示装置の製造方法。4. A step of forming, on one of a pair of transparent substrates, a plurality of pixel electrodes and a black matrix covering a region between the pixel electrodes, and applying ultraviolet light to the outside of a display region of the other substrate. Forming a band-pass filter to be cut, and bonding the pair of transparent substrates with a sealing material applied along an outer edge of the band-pass filter, with a surface on which the pixel electrode and the band-pass filter are formed facing inside. And a step of arranging a light-shielding mask covering the display area outside the other substrate, and irradiating ultraviolet rays from the other substrate side to cure the sealing material. Manufacturing method. 【請求項５】 前記一対の透明基板をシール材で接合す
る工程において、滴下注入法により前記一対の基板間に
液晶を封入することを特徴とする請求項４に記載の液晶
表示装置の製造方法。5. The method for manufacturing a liquid crystal display device according to claim 4, wherein in the step of joining the pair of transparent substrates with a sealing material, a liquid crystal is sealed between the pair of substrates by a dropping method. .
JP02640697A 1997-02-10 1997-02-10 Manufacturing method of liquid crystal display device Expired - Fee Related JP3874871B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP02640697A JP3874871B2 (en) 1997-02-10 1997-02-10 Manufacturing method of liquid crystal display device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP02640697A JP3874871B2 (en) 1997-02-10 1997-02-10 Manufacturing method of liquid crystal display device

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2006234394A Division JP4387389B2 (en) 2006-08-30 2006-08-30 Liquid crystal display

Publications (2)

Publication Number Publication Date
JPH10221700A true JPH10221700A (en) 1998-08-21
JP3874871B2 JP3874871B2 (en) 2007-01-31

Family

ID=12192681

Family Applications (1)

Application Number Title Priority Date Filing Date
JP02640697A Expired - Fee Related JP3874871B2 (en) 1997-02-10 1997-02-10 Manufacturing method of liquid crystal display device

Country Status (1)

Country Link
JP (1) JP3874871B2 (en)

Cited By (79)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6459467B1 (en) 1998-05-15 2002-10-01 Minolta Co., Ltd. Liquid crystal light modulating device, and a manufacturing method and a manufacturing apparatus thereof
US6610364B1 (en) 2002-02-27 2003-08-26 Lg. Philips Lcd Co., Ltd. Apparatus for dispensing liquid crystal and method for controlling liquid crystal dropping amount
US6628365B1 (en) 2002-03-23 2003-09-30 Lg.Philips Lcd Co., Ltd. LCD with UV shielding part at dummy sealant region
US6712883B2 (en) 2002-02-25 2004-03-30 Lg.Philips Lcd Co., Ltd. Apparatus and method for deaerating liquid crystal
US6724458B2 (en) 2001-12-22 2004-04-20 Lg.Philips Lcd Co., Ltd. Liquid crystal display device and method of fabricating the same
US6738124B2 (en) 2002-03-07 2004-05-18 Lg. Philips Lcd Co., Ltd. Method for fabricating liquid crystal display panel
US6741320B2 (en) 2002-02-20 2004-05-25 L.G.Philips Lcd Co., Ltd. Method for cutting liquid crystal display panel
US6741322B2 (en) 2002-03-06 2004-05-25 Lg. Philips Lcd Co., Ltd. Production line of liquid crystal display device having shield of UV blocking material
US6741316B2 (en) 2002-03-06 2004-05-25 Lg.Philips Lcd Co., Ltd. Liquid crystal display device and fabricating method thereof
US6747725B2 (en) 2002-02-07 2004-06-08 Lg. Philips Lcd Co., Ltd. Device for cutting liquid crystal display panel and method for cutting using the same
US6755724B2 (en) 2002-03-21 2004-06-29 Lg.Philips Lcd Co., Ltd. Device for grinding liquid crystal display panel
US6774958B2 (en) 2002-02-26 2004-08-10 Lg.Philips Lcd Co., Ltd. Liquid crystal panel, apparatus for inspecting the same, and method of fabricating liquid crystal display thereof
US6774978B2 (en) 2002-02-09 2004-08-10 Lg.Philips Lcd Co., Ltd. Device for cutting liquid crystal display panel and method for cutting using the same
US6781402B2 (en) 2002-03-06 2004-08-24 Lg.Philips Lcd Co., Ltd. Apparatus and method for testing liquid crystal display panel
US6782928B2 (en) 2002-03-15 2004-08-31 Lg.Philips Lcd Co., Ltd. Liquid crystal dispensing apparatus having confirming function for remaining amount of liquid crystal and method for measuring the same
US6784970B2 (en) 2002-02-27 2004-08-31 Lg.Philips Lcd Co., Ltd. Method of fabricating LCD
US6795154B2 (en) 2002-02-19 2004-09-21 Lg. Philips Lcd Co., Ltd. Apparatus for cutting liquid crystal display panels and cutting method using the same
US6793756B2 (en) 2002-03-22 2004-09-21 Lg. Phillips Lcd Co., Ltd. Substrate bonding apparatus for liquid crystal display device and method for driving the same
US6803984B2 (en) 2002-02-25 2004-10-12 Lg.Philips Lcd Co., Ltd. Method and apparatus for manufacturing liquid crystal display device using serial production processes
US6805308B2 (en) 2002-02-22 2004-10-19 Lg. Philips Lcd Co., Ltd. Liquid crystal dispensing apparatus having controlling function of dropping amount caused by controlling tension of spring
US6811459B2 (en) 2002-03-15 2004-11-02 Lg. Philips Lcd Co., Ltd. Liquid crystal dispensing apparatus
US6815002B2 (en) 2002-03-25 2004-11-09 Lg. Philips Lcd Co., Ltd. Method for dispensing liquid crystal using plurality of liquid crystal dispensing devices
US6819391B2 (en) 2001-11-30 2004-11-16 Lg. Philips Lcd Co., Ltd. Liquid crystal display panel having dummy column spacer with opened portion
US6821176B2 (en) 2002-02-22 2004-11-23 Lg. Philips Lcd Co., Ltd. Apparatus and method for manufacturing liquid crystal display devices, method for using the apparatus, and device produced by the method
US6825897B2 (en) 2002-03-13 2004-11-30 Lg.Philips Lcd Co., Ltd. Indicator for deciding grinding amount of liquid crystal display panel and method for detecting grinding failure using the same
US6824023B2 (en) 2002-02-20 2004-11-30 Lg. Philips Lcd Co., Ltd. Liquid crystal dispensing apparatus
US6829032B2 (en) 2002-02-06 2004-12-07 Lg. Philips Lcd Co., Ltd. Apparatus and method for manufacturing liquid crystal device using unitary vacuum processing chamber
US6827240B2 (en) 2002-03-21 2004-12-07 Lg.Philips Lcd Co., Ltd. Liquid crystal dispensing apparatus
US6833901B2 (en) 2002-02-27 2004-12-21 Lg. Philips Lcd Co., Ltd. Method for fabricating LCD having upper substrate coated with sealant
US6846215B2 (en) 2002-03-25 2005-01-25 Lg.Philips Lcd Co., Ltd. Apparatus for removing bubbles from sealant for fabricating liquid crystal display device
US6848963B2 (en) 2002-03-20 2005-02-01 Lg. Philips Lcd Co., Ltd. Method for cleaning bonding chamber of bonding machine
US6859250B2 (en) 2002-02-04 2005-02-22 Lg. Philips Lcd Co., Ltd. Apparatus and method for manufacturing a liquid crystal display device, a method for using the apparatus, and a device produced by the method
US6860533B2 (en) 2002-03-08 2005-03-01 Lg. Philips Lcd Co., Ltd. Substrate loading/unloading apparatus for manufacturing a liquid crystal display device
US6864948B2 (en) 2002-02-22 2005-03-08 Lg.Philips Lcd Co., Ltd. Apparatus for measuring dispensing amount of liquid crystal drops and method for manufacturing liquid crystal display device using the same
US6863194B2 (en) 2002-02-20 2005-03-08 Lg.Philips Lcd Co., Ltd. Liquid crystal dispensing apparatus having integrated needle sheet
US6864946B2 (en) 2001-12-21 2005-03-08 Lg.Philips Lcd Co., Ltd. Liquid crystal display device and method of fabricating the same
US6863097B2 (en) 2002-07-20 2005-03-08 Lg Philips Lcd Co., Ltd. Apparatus and method for dispensing liquid crystal
US6874662B2 (en) 2002-03-21 2005-04-05 Lg. Philips Lcd Co., Ltd. Liquid crystal dispensing apparatus
US6885427B2 (en) 2002-03-15 2005-04-26 Lg.Philips Lcd Co., Ltd. Substrate bonding apparatus for liquid crystal display device having alignment system with one end provided inside vacuum chamber
US6892437B2 (en) 2002-03-13 2005-05-17 Lg. Philips Lcd Co., Ltd. Apparatus and method for manufacturing liquid crystal display device
US6893311B2 (en) 2002-03-25 2005-05-17 Lg.Philips Lcd Co., Ltd. LCD bonding machine and method for fabricating LCD by using the same
US6911246B2 (en) 2002-03-25 2005-06-28 Lg. Philips Lcd Co., Ltd. Rubbing apparatus having turning buffer for fabricating liquid crystal display device
US6953073B2 (en) 2002-02-20 2005-10-11 Lg.Philips Lcd Co., Ltd. Apparatus and method for manufacturing liquid crystal display devices, method for using the apparatus, and device produced by the method
US6997216B2 (en) 2003-06-27 2006-02-14 Lg. Philips Lcd Co., Ltd. Liquid crystal dispensing system
US7006202B2 (en) 2002-02-21 2006-02-28 Lg.Philips Lcd Co., Ltd. Mask holder for irradiating UV-rays
US7022199B2 (en) 2002-02-06 2006-04-04 Lg.Philips Lcd Co., Ltd. Method for fabricating LCD
US7027122B2 (en) 2002-03-12 2006-04-11 Lg.Philips Lcd Co., Ltd. Bonding apparatus having compensating system for liquid crystal display device and method for manufacturing the same
US7040525B2 (en) 2002-03-20 2006-05-09 Lg.Philips Lcd Co., Ltd. Stage structure in bonding machine and method for controlling the same
US7075611B2 (en) 2002-11-28 2006-07-11 Lg.Philips Lcd Co., Ltd. LCD manufacturing method involving forming a main seal pattern by screen printing and a dummy seal pattern by selective dispensing
JP2006201433A (en) * 2005-01-20 2006-08-03 Toppan Printing Co Ltd Method of manufacturing color filter for semi-transmissive liquid crystal display device and color filter for semi-transmissive liquid crystal display device
US7101268B2 (en) 2002-03-20 2006-09-05 Lg.Philips Lcd Co., Ltd. Grinding table for liquid crystal display panel and grinder apparatus using the same
JP2007041625A (en) * 1999-05-24 2007-02-15 Sharp Corp Liquid crystal display and method of fabricating the same
US7196764B2 (en) 2002-03-20 2007-03-27 Lg. Philips Lcd Co., Ltd. Liquid crystal display device and method of manufacturing the same comprising at least one portion for controlling a liquid crystal flow within a closed pattern of sealant material
US7214283B2 (en) 2002-03-25 2007-05-08 Lg.Philips Lcd Co., Ltd. Working range setting method for bonding device for fabricating liquid crystal display devices
US7273077B2 (en) 2003-11-28 2007-09-25 Lg.Philips Lcd Co., Ltd. Apparatus and method of dispensing liquid crystal
US7292304B2 (en) 2001-12-17 2007-11-06 Lg.Philips Lcd Co., Ltd. Liquid crystal display panel and method for fabricating the same comprising a dummy column spacer to regulate a liquid crystal flow and a supplemental dummy column spacer formed substantially parallel and along the dummy column spacer
US7365824B2 (en) 2002-06-28 2008-04-29 Lg.Philips Lcd Co., Ltd. System and method for manufacturing liquid crystal display devices
KR100847809B1 (en) * 2001-08-30 2008-07-23 엘지디스플레이 주식회사 Method For Fabricating Liquid Crystal Display Device
JP2008197673A (en) * 1999-02-15 2008-08-28 Sharp Corp Liquid crystal display device
US7423703B2 (en) 2002-03-25 2008-09-09 Lg Display Co., Ltd. Cassette for liquid crystal panel inspection and method of inspecting liquid crystal panel
WO2009028548A1 (en) * 2007-08-30 2009-03-05 Sony Corporation Liquid crystal display device and method for manufacturing the same
US7527743B2 (en) 2002-10-16 2009-05-05 Lg Display Co., Ltd. Apparatus and method for etching insulating film
US7547362B2 (en) 2002-12-18 2009-06-16 Lg Display Co., Ltd. Dispenser for liquid crystal display panel and method for controlling gap between substrate and nozzle using the same
US7595083B2 (en) 2003-12-10 2009-09-29 Lg Display Co., Ltd. Apparatus for aligning dispenser system, method of aligning dispenser system, and dispenser alignment system
US7619709B2 (en) 2002-03-20 2009-11-17 Lg Display Co., Ltd. Liquid crystal display panel and fabricating method thereof
JP2010002917A (en) * 2009-08-07 2010-01-07 Sharp Corp Method for producing liquid crystal display
US7659962B2 (en) 2002-06-14 2010-02-09 Lg Display Co., Ltd. Portable jig
US7678212B2 (en) 2003-06-24 2010-03-16 Lg Display Co., Ltd. Liquid crystal dispensing system which can read information of liquid crystal container and method of dispensing liquid crystal material using same
JP2010272542A (en) * 2006-12-13 2010-12-02 Samsung Mobile Display Co Ltd Organic electroluminescent display
US7897003B2 (en) 1999-05-24 2011-03-01 Sharp Kabushiki Kaisha Liquid crystal display and method of fabricating the same
JP2013127639A (en) * 2013-02-01 2013-06-27 Japan Display Inc Liquid crystal display device
US8496988B2 (en) 2002-11-11 2013-07-30 Lg Display Co., Ltd. Dispenser for fabricating liquid crystal display panel and method for controlling gap between nozzle and substrate by using the same
US8536567B2 (en) 2006-11-10 2013-09-17 Samsung Display Co., Ltd. Organic light emitting display and fabrication method thereof
US8593596B2 (en) 2011-03-02 2013-11-26 Hitachi Displays, Ltd. Liquid crystal display device
US8598780B2 (en) 2006-11-10 2013-12-03 Samsung Display Co., Ltd. Organic light emitting display and fabrication method thereof
CN103748507A (en) * 2011-08-25 2014-04-23 夏普株式会社 Method for manufacturing liquid crystal display device
US8899175B2 (en) 2002-03-23 2014-12-02 Lg Display Co., Ltd. Apparatus and method for dispensing liquid crystal material
US9285614B2 (en) 2003-04-24 2016-03-15 Lg Display Co., Ltd. Liquid crystal dispensing system and method of dispensing liquid crystal material using same
USRE46146E1 (en) 2002-02-20 2016-09-13 Lg Display Co., Ltd Liquid crystal display device and method of manufacturing the same

Cited By (103)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6842210B2 (en) 1998-05-15 2005-01-11 Minolta Co., Ltd. Liquid crystal light modulating device, and a manufacturing method and a manufacturing apparatus thereof
US6583848B2 (en) 1998-05-15 2003-06-24 Minolta Co., Ltd. Liquid crystal light modulating device, and a manufacturing method and a manufacturing apparatus thereof
US6459467B1 (en) 1998-05-15 2002-10-01 Minolta Co., Ltd. Liquid crystal light modulating device, and a manufacturing method and a manufacturing apparatus thereof
JP2008197673A (en) * 1999-02-15 2008-08-28 Sharp Corp Liquid crystal display device
JP2007041625A (en) * 1999-05-24 2007-02-15 Sharp Corp Liquid crystal display and method of fabricating the same
US8289481B2 (en) 1999-05-24 2012-10-16 Sharp Kabushiki Kaisha Liquid crystal display device comprising a shading film with a plurality of light incident holes above each of the transfers and method of fabricating the same
US7897003B2 (en) 1999-05-24 2011-03-01 Sharp Kabushiki Kaisha Liquid crystal display and method of fabricating the same
KR100847809B1 (en) * 2001-08-30 2008-07-23 엘지디스플레이 주식회사 Method For Fabricating Liquid Crystal Display Device
US6819391B2 (en) 2001-11-30 2004-11-16 Lg. Philips Lcd Co., Ltd. Liquid crystal display panel having dummy column spacer with opened portion
US7292304B2 (en) 2001-12-17 2007-11-06 Lg.Philips Lcd Co., Ltd. Liquid crystal display panel and method for fabricating the same comprising a dummy column spacer to regulate a liquid crystal flow and a supplemental dummy column spacer formed substantially parallel and along the dummy column spacer
US6864946B2 (en) 2001-12-21 2005-03-08 Lg.Philips Lcd Co., Ltd. Liquid crystal display device and method of fabricating the same
US6724458B2 (en) 2001-12-22 2004-04-20 Lg.Philips Lcd Co., Ltd. Liquid crystal display device and method of fabricating the same
US7382433B2 (en) 2002-02-04 2008-06-03 Lg Display Co., Ltd. Apparatus and method for manufacturing a liquid crystal display device, a method for using the apparatus, and a device produced by the method
US6859250B2 (en) 2002-02-04 2005-02-22 Lg. Philips Lcd Co., Ltd. Apparatus and method for manufacturing a liquid crystal display device, a method for using the apparatus, and a device produced by the method
US6829032B2 (en) 2002-02-06 2004-12-07 Lg. Philips Lcd Co., Ltd. Apparatus and method for manufacturing liquid crystal device using unitary vacuum processing chamber
US7022199B2 (en) 2002-02-06 2006-04-04 Lg.Philips Lcd Co., Ltd. Method for fabricating LCD
US6747725B2 (en) 2002-02-07 2004-06-08 Lg. Philips Lcd Co., Ltd. Device for cutting liquid crystal display panel and method for cutting using the same
US6774978B2 (en) 2002-02-09 2004-08-10 Lg.Philips Lcd Co., Ltd. Device for cutting liquid crystal display panel and method for cutting using the same
US6795154B2 (en) 2002-02-19 2004-09-21 Lg. Philips Lcd Co., Ltd. Apparatus for cutting liquid crystal display panels and cutting method using the same
US7883598B2 (en) 2002-02-20 2011-02-08 Lg Display Co., Ltd. Apparatus and method for manufacturing liquid crystal display devices, method for using the apparatus, and device produced by the method
US6824023B2 (en) 2002-02-20 2004-11-30 Lg. Philips Lcd Co., Ltd. Liquid crystal dispensing apparatus
US6863194B2 (en) 2002-02-20 2005-03-08 Lg.Philips Lcd Co., Ltd. Liquid crystal dispensing apparatus having integrated needle sheet
US6953073B2 (en) 2002-02-20 2005-10-11 Lg.Philips Lcd Co., Ltd. Apparatus and method for manufacturing liquid crystal display devices, method for using the apparatus, and device produced by the method
USRE46146E1 (en) 2002-02-20 2016-09-13 Lg Display Co., Ltd Liquid crystal display device and method of manufacturing the same
US6741320B2 (en) 2002-02-20 2004-05-25 L.G.Philips Lcd Co., Ltd. Method for cutting liquid crystal display panel
US7006202B2 (en) 2002-02-21 2006-02-28 Lg.Philips Lcd Co., Ltd. Mask holder for irradiating UV-rays
US6805308B2 (en) 2002-02-22 2004-10-19 Lg. Philips Lcd Co., Ltd. Liquid crystal dispensing apparatus having controlling function of dropping amount caused by controlling tension of spring
US6894759B2 (en) 2002-02-22 2005-05-17 Lg.Philips Lcd Co., Ltd. Apparatus for measuring dispensing amount of liquid crystal drops and method for manufacturing liquid crystal display device using the same
US6821176B2 (en) 2002-02-22 2004-11-23 Lg. Philips Lcd Co., Ltd. Apparatus and method for manufacturing liquid crystal display devices, method for using the apparatus, and device produced by the method
US6864948B2 (en) 2002-02-22 2005-03-08 Lg.Philips Lcd Co., Ltd. Apparatus for measuring dispensing amount of liquid crystal drops and method for manufacturing liquid crystal display device using the same
USRE45727E1 (en) 2002-02-25 2015-10-06 Lg Display Co., Ltd. Method and apparatus for manufacturing liquid crystal display device using serial production processes
US6712883B2 (en) 2002-02-25 2004-03-30 Lg.Philips Lcd Co., Ltd. Apparatus and method for deaerating liquid crystal
US6803984B2 (en) 2002-02-25 2004-10-12 Lg.Philips Lcd Co., Ltd. Method and apparatus for manufacturing liquid crystal display device using serial production processes
US6774958B2 (en) 2002-02-26 2004-08-10 Lg.Philips Lcd Co., Ltd. Liquid crystal panel, apparatus for inspecting the same, and method of fabricating liquid crystal display thereof
US6784970B2 (en) 2002-02-27 2004-08-31 Lg.Philips Lcd Co., Ltd. Method of fabricating LCD
US6833901B2 (en) 2002-02-27 2004-12-21 Lg. Philips Lcd Co., Ltd. Method for fabricating LCD having upper substrate coated with sealant
US6610364B1 (en) 2002-02-27 2003-08-26 Lg. Philips Lcd Co., Ltd. Apparatus for dispensing liquid crystal and method for controlling liquid crystal dropping amount
USRE42372E1 (en) * 2002-02-27 2011-05-17 Lg Display Co., Ltd. Apparatus for dispensing liquid crystal and method for controlling liquid crystal dropping amount
US6850088B2 (en) 2002-03-06 2005-02-01 Lg.Philips Lcd Co., Ltd. Apparatus and method for testing liquid crystal display panel
US6741322B2 (en) 2002-03-06 2004-05-25 Lg. Philips Lcd Co., Ltd. Production line of liquid crystal display device having shield of UV blocking material
US6741316B2 (en) 2002-03-06 2004-05-25 Lg.Philips Lcd Co., Ltd. Liquid crystal display device and fabricating method thereof
US6781402B2 (en) 2002-03-06 2004-08-24 Lg.Philips Lcd Co., Ltd. Apparatus and method for testing liquid crystal display panel
US6738124B2 (en) 2002-03-07 2004-05-18 Lg. Philips Lcd Co., Ltd. Method for fabricating liquid crystal display panel
US6860533B2 (en) 2002-03-08 2005-03-01 Lg. Philips Lcd Co., Ltd. Substrate loading/unloading apparatus for manufacturing a liquid crystal display device
US7027122B2 (en) 2002-03-12 2006-04-11 Lg.Philips Lcd Co., Ltd. Bonding apparatus having compensating system for liquid crystal display device and method for manufacturing the same
US6892437B2 (en) 2002-03-13 2005-05-17 Lg. Philips Lcd Co., Ltd. Apparatus and method for manufacturing liquid crystal display device
US6825897B2 (en) 2002-03-13 2004-11-30 Lg.Philips Lcd Co., Ltd. Indicator for deciding grinding amount of liquid crystal display panel and method for detecting grinding failure using the same
US6782928B2 (en) 2002-03-15 2004-08-31 Lg.Philips Lcd Co., Ltd. Liquid crystal dispensing apparatus having confirming function for remaining amount of liquid crystal and method for measuring the same
US6885427B2 (en) 2002-03-15 2005-04-26 Lg.Philips Lcd Co., Ltd. Substrate bonding apparatus for liquid crystal display device having alignment system with one end provided inside vacuum chamber
US6811459B2 (en) 2002-03-15 2004-11-02 Lg. Philips Lcd Co., Ltd. Liquid crystal dispensing apparatus
US7131893B2 (en) 2002-03-20 2006-11-07 Lg.Philips Lcd Co., Ltd. Method for grinding liquid crystal display panel
US7040525B2 (en) 2002-03-20 2006-05-09 Lg.Philips Lcd Co., Ltd. Stage structure in bonding machine and method for controlling the same
US7196764B2 (en) 2002-03-20 2007-03-27 Lg. Philips Lcd Co., Ltd. Liquid crystal display device and method of manufacturing the same comprising at least one portion for controlling a liquid crystal flow within a closed pattern of sealant material
US6848963B2 (en) 2002-03-20 2005-02-01 Lg. Philips Lcd Co., Ltd. Method for cleaning bonding chamber of bonding machine
US7619709B2 (en) 2002-03-20 2009-11-17 Lg Display Co., Ltd. Liquid crystal display panel and fabricating method thereof
US7101268B2 (en) 2002-03-20 2006-09-05 Lg.Philips Lcd Co., Ltd. Grinding table for liquid crystal display panel and grinder apparatus using the same
US6755724B2 (en) 2002-03-21 2004-06-29 Lg.Philips Lcd Co., Ltd. Device for grinding liquid crystal display panel
US7179155B2 (en) 2002-03-21 2007-02-20 Lg.Philips Lcd Co., Ltd. Device for grinding liquid crystal display panel
US6874662B2 (en) 2002-03-21 2005-04-05 Lg. Philips Lcd Co., Ltd. Liquid crystal dispensing apparatus
US6827240B2 (en) 2002-03-21 2004-12-07 Lg.Philips Lcd Co., Ltd. Liquid crystal dispensing apparatus
US7487812B2 (en) 2002-03-22 2009-02-10 Lg Display Co., Ltd. Substrate bonding apparatus for liquid crystal display device and method for fabricating the same
US6793756B2 (en) 2002-03-22 2004-09-21 Lg. Phillips Lcd Co., Ltd. Substrate bonding apparatus for liquid crystal display device and method for driving the same
US8899175B2 (en) 2002-03-23 2014-12-02 Lg Display Co., Ltd. Apparatus and method for dispensing liquid crystal material
US7075612B2 (en) 2002-03-23 2006-07-11 Lg.Philips Lcd Co., Ltd. Liquid crystal display device and method for manufacturing the same
US6628365B1 (en) 2002-03-23 2003-09-30 Lg.Philips Lcd Co., Ltd. LCD with UV shielding part at dummy sealant region
US6911246B2 (en) 2002-03-25 2005-06-28 Lg. Philips Lcd Co., Ltd. Rubbing apparatus having turning buffer for fabricating liquid crystal display device
US7214283B2 (en) 2002-03-25 2007-05-08 Lg.Philips Lcd Co., Ltd. Working range setting method for bonding device for fabricating liquid crystal display devices
US7423703B2 (en) 2002-03-25 2008-09-09 Lg Display Co., Ltd. Cassette for liquid crystal panel inspection and method of inspecting liquid crystal panel
US6846215B2 (en) 2002-03-25 2005-01-25 Lg.Philips Lcd Co., Ltd. Apparatus for removing bubbles from sealant for fabricating liquid crystal display device
US6893311B2 (en) 2002-03-25 2005-05-17 Lg.Philips Lcd Co., Ltd. LCD bonding machine and method for fabricating LCD by using the same
US6815002B2 (en) 2002-03-25 2004-11-09 Lg. Philips Lcd Co., Ltd. Method for dispensing liquid crystal using plurality of liquid crystal dispensing devices
US7659962B2 (en) 2002-06-14 2010-02-09 Lg Display Co., Ltd. Portable jig
US7710534B2 (en) 2002-06-28 2010-05-04 Lg Display Co., Ltd. System and method for manufacturing liquid crystal display devices
US7365824B2 (en) 2002-06-28 2008-04-29 Lg.Philips Lcd Co., Ltd. System and method for manufacturing liquid crystal display devices
US6863097B2 (en) 2002-07-20 2005-03-08 Lg Philips Lcd Co., Ltd. Apparatus and method for dispensing liquid crystal
US7527743B2 (en) 2002-10-16 2009-05-05 Lg Display Co., Ltd. Apparatus and method for etching insulating film
US8496988B2 (en) 2002-11-11 2013-07-30 Lg Display Co., Ltd. Dispenser for fabricating liquid crystal display panel and method for controlling gap between nozzle and substrate by using the same
US7075611B2 (en) 2002-11-28 2006-07-11 Lg.Philips Lcd Co., Ltd. LCD manufacturing method involving forming a main seal pattern by screen printing and a dummy seal pattern by selective dispensing
US7547362B2 (en) 2002-12-18 2009-06-16 Lg Display Co., Ltd. Dispenser for liquid crystal display panel and method for controlling gap between substrate and nozzle using the same
US8067057B2 (en) 2002-12-18 2011-11-29 Lg Display Co., Ltd. Dispenser for liquid crystal display panel and method for controlling gap between substrate and nozzle using the same
US9285614B2 (en) 2003-04-24 2016-03-15 Lg Display Co., Ltd. Liquid crystal dispensing system and method of dispensing liquid crystal material using same
US7678212B2 (en) 2003-06-24 2010-03-16 Lg Display Co., Ltd. Liquid crystal dispensing system which can read information of liquid crystal container and method of dispensing liquid crystal material using same
US6997216B2 (en) 2003-06-27 2006-02-14 Lg. Philips Lcd Co., Ltd. Liquid crystal dispensing system
US7273077B2 (en) 2003-11-28 2007-09-25 Lg.Philips Lcd Co., Ltd. Apparatus and method of dispensing liquid crystal
US7595083B2 (en) 2003-12-10 2009-09-29 Lg Display Co., Ltd. Apparatus for aligning dispenser system, method of aligning dispenser system, and dispenser alignment system
US9004005B2 (en) 2003-12-10 2015-04-14 Lg Display Co., Ltd. Apparatus for aligning dispenser using alignment plate and dispenser alignment system
JP2006201433A (en) * 2005-01-20 2006-08-03 Toppan Printing Co Ltd Method of manufacturing color filter for semi-transmissive liquid crystal display device and color filter for semi-transmissive liquid crystal display device
US8536567B2 (en) 2006-11-10 2013-09-17 Samsung Display Co., Ltd. Organic light emitting display and fabrication method thereof
US8598780B2 (en) 2006-11-10 2013-12-03 Samsung Display Co., Ltd. Organic light emitting display and fabrication method thereof
JP2010272542A (en) * 2006-12-13 2010-12-02 Samsung Mobile Display Co Ltd Organic electroluminescent display
US8916852B2 (en) 2006-12-13 2014-12-23 Samsung Display Co., Ltd. Organic light emitting display having a substrate support structure and fabricating method thereof
TWI422934B (en) * 2007-08-30 2014-01-11 Japan Display West Inc Liquid crystal display device and manufacturing method thereof
WO2009028548A1 (en) * 2007-08-30 2009-03-05 Sony Corporation Liquid crystal display device and method for manufacturing the same
JP2009058665A (en) * 2007-08-30 2009-03-19 Sony Corp Liquid crystal display and its manufacturing method
US8169560B2 (en) 2007-08-30 2012-05-01 Sony Corporation Liquid crystal display and method of manufacturing the same
JP2010002917A (en) * 2009-08-07 2010-01-07 Sharp Corp Method for producing liquid crystal display
US8593596B2 (en) 2011-03-02 2013-11-26 Hitachi Displays, Ltd. Liquid crystal display device
US8908134B2 (en) 2011-03-02 2014-12-09 Japan Display Inc. Liquid crystal display device
US9104071B2 (en) 2011-03-02 2015-08-11 Japan Display Inc. Liquid crystal display device
US9201273B2 (en) 2011-03-02 2015-12-01 Japan Display Inc. Liquid crystal display device
US9841633B2 (en) 2011-03-02 2017-12-12 Japan Display Inc. Liquid crystal display device
CN103748507A (en) * 2011-08-25 2014-04-23 夏普株式会社 Method for manufacturing liquid crystal display device
JP2013127639A (en) * 2013-02-01 2013-06-27 Japan Display Inc Liquid crystal display device

Also Published As

Publication number Publication date
JP3874871B2 (en) 2007-01-31

Similar Documents

Publication Publication Date Title
JP3874871B2 (en) Manufacturing method of liquid crystal display device
JP4177658B2 (en) Liquid crystal display
US6967704B2 (en) Reflective liquid crystal display device including organic film prevented from being degraded due to moisture absorption
WO2011062009A1 (en) Liquid crystal panel and liquid crystal display device
JPH11109373A (en) Liquid crystal display element
US10705371B2 (en) Color filter substrate, manufacturing method thereof, display panel, manufacturing method thereof and bright spot defect correction method thereof, and display apparatus
US6879369B2 (en) Structure of LCD manufactured by one-drop fill technology including a substrate with transparent conductive patterns
JP2010204417A (en) Liquid crystal display device and method for manufacturing the same
JPS61184518A (en) Manufacture of liquid crystal display unit
JP4719289B2 (en) Liquid crystal display device
JP3384964B2 (en) Liquid crystal display device and manufacturing method thereof
JP4387389B2 (en) Liquid crystal display
JP2007041625A (en) Liquid crystal display and method of fabricating the same
JP3683785B2 (en) Liquid crystal display device and manufacturing method thereof
KR20060110196A (en) Sealant for adhesion substrates, liquid crystal display device and fabricating method using the same
JP2007264102A (en) Liquid crystal display panel and method of manufacturing same
JP2000019540A (en) Liquid crystal display device
JP2002131759A (en) Liquid crystal display device
JP2002072187A (en) Liquid crystal display device
JPH10333158A (en) Liquid crystal display device
JP2002098976A (en) Liquid crystal device and method of manufacture, and electronic device
JPH07333624A (en) Production of liquid crystal display device and light shielding mask for curing sealing material
JP2004233836A (en) Structure of liquid crystal display and its manufacturing method
JP2000187225A (en) Manufacture of liquid crystal display device
KR20060083712A (en) Method for manufacturing substrate assembly

Legal Events

Date Code Title Description
RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7422

Effective date: 20040121

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20040122

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20040427

A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A711

Effective date: 20050712

A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A711

Effective date: 20050713

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050721

RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7422

Effective date: 20050721

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050818

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20050901

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20051108

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20051227

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20060704

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060830

A911 Transfer of reconsideration by examiner before appeal (zenchi)

Free format text: JAPANESE INTERMEDIATE CODE: A911

Effective date: 20060911

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20061024

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20061025

R150 Certificate of patent (=grant) or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20091102

Year of fee payment: 3

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20101102

Year of fee payment: 4

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20111102

Year of fee payment: 5

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20111102

Year of fee payment: 5

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20121102

Year of fee payment: 6

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20121102

Year of fee payment: 6

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20131102

Year of fee payment: 7

LAPS Cancellation because of no payment of annual fees