JPH0955392A - Soldering method for semiconductor device - Google Patents

Soldering method for semiconductor device

Info

Publication number
JPH0955392A
JPH0955392A JP20478695A JP20478695A JPH0955392A JP H0955392 A JPH0955392 A JP H0955392A JP 20478695 A JP20478695 A JP 20478695A JP 20478695 A JP20478695 A JP 20478695A JP H0955392 A JPH0955392 A JP H0955392A
Authority
JP
Japan
Prior art keywords
circuit board
solder
soldering
radiator
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20478695A
Other languages
Japanese (ja)
Other versions
JP3360778B2 (en
Inventor
Kazumi Takahata
和美 高畠
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanken Electric Co Ltd
Original Assignee
Sanken Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanken Electric Co Ltd filed Critical Sanken Electric Co Ltd
Priority to JP20478695A priority Critical patent/JP3360778B2/en
Publication of JPH0955392A publication Critical patent/JPH0955392A/en
Application granted granted Critical
Publication of JP3360778B2 publication Critical patent/JP3360778B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1306Field-effect transistor [FET]
    • H01L2924/13091Metal-Oxide-Semiconductor Field-Effect Transistor [MOSFET]
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/05Insulated conductive substrates, e.g. insulated metal substrate
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/341Surface mounted components
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/3457Solder materials or compositions; Methods of application thereof

Landscapes

  • Die Bonding (AREA)
  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
  • Wire Bonding (AREA)

Abstract

PROBLEM TO BE SOLVED: To simplify the soldering process for a semiconductor device and to improve the reliability in soldering. SOLUTION: The assembly comprising a heat radiator 3, a circuit board 1 and semiconductor chips 2 is heated from the heat radiator 3. Thus, heat is conducted in the sequence of the heat radiator 3, the circuit board 1 and the semiconductor chips 2. The temperature on one main surface 1a of the circuit board 1 becomes slightly lower than the temperature on one main surface 3a of the heat radiator 3. Therefore, a second solder 5 at a high melting point between the heat radiator 3 and the circuit board 1 and first solders 4 at a low melting point between the circuit board 1 and the semiconductor chips 2 start to melt at the approximately same time. Therefore, the assembly comprising the heat radiator 3, the circuit board 1 and the semiconductor chips 2 can be fixed by the first and second solders 4 and 5 by one heating process. Thus, the soldering process for the semiconductor device can be simplified. Furthermore, the first solders 4 between the circuit board 1 and the semiconductor chips 2 are not melted again, the loosening of the semiconductor chips 2 fixed to the circuit board 1 is prevented and the reliability of the semiconductor device can be improved.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は半田付け方法、特に
半導体部品、基板及び放熱体を有する半導体装置の半田
付け方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a soldering method, and more particularly to a soldering method for a semiconductor device having a semiconductor component, a board and a heat radiator.

【0002】[0002]

【従来の技術】例えば、図4に示すように一方の主面1
a上に銀白金(AgPt)箔の配線パターン1cが形成さ
れかつ他方の主面1b一面に銀白金箔1dが被着された回
路基板1と、回路基板1の一方の主面1aの配線パター
ン1c上に半田5により固着されたMOSFET、トラ
ンジスタ等の半導体チップ2と、回路基板1の他方の主
面1bの銀白金箔1dに半田4により固着された金属製の
放熱体3とから成る半導体装置は従来から公知である。
図4に示す半導体装置では、まず、回路基板1の一方の
主面1aの配線パターン1c上にペースト状の半田5(融
点:290℃)を塗布する。また、放熱体3の一方の主
面3aの半田付け領域3c上にペースト状の半田4(融
点:230℃〜250℃)を塗布する。次に、回路基板
1の一方の主面1aの配線パターン1c上に半導体チップ
2を載置し、回路基板1及び半導体チップ2の組立体を
加熱炉にて290℃近傍まで加熱して半田5を溶融し半
田付けする。最後に、放熱体3の半田付け領域3c上に
回路基板1及び半導体チップ2の組立体を載置し、回路
基板1及び半導体チップ2及び放熱体3の組立体を加熱
炉にて230℃〜250℃近傍まで加熱して半田4を溶
融し半田付けする。以上の工程を経ることにより、図4
に示す半導体装置が半田付けされる。
2. Description of the Related Art For example, as shown in FIG.
A circuit board 1 on which a wiring pattern 1c of silver-platinum (AgPt) foil is formed on a and a silver-platinum foil 1d is adhered on the other main surface 1b, and a wiring pattern 1c on one main surface 1a of the circuit board 1 A semiconductor device including a semiconductor chip 2 such as a MOSFET, a transistor, or the like fixed to the top with solder 5 and a metal radiator 3 fixed to the silver-platinum foil 1d on the other main surface 1b of the circuit board 1 with solder 4 It has been publicly known.
In the semiconductor device shown in FIG. 4, first, the paste-like solder 5 (melting point: 290 ° C.) is applied onto the wiring pattern 1c on the one main surface 1a of the circuit board 1. Further, paste-like solder 4 (melting point: 230 ° C. to 250 ° C.) is applied on the soldering region 3c on one main surface 3a of the radiator 3. Next, the semiconductor chip 2 is placed on the wiring pattern 1c on the one main surface 1a of the circuit board 1, and the assembly of the circuit board 1 and the semiconductor chip 2 is heated to near 290 ° C. in a heating furnace to solder 5 Melt and solder. Finally, the assembly of the circuit board 1 and the semiconductor chip 2 is placed on the soldering area 3c of the radiator 3, and the assembly of the circuit board 1, the semiconductor chip 2 and the radiator 3 is heated at 230 ° C. The solder 4 is melted by heating up to around 250 ° C. and soldered. Through the above steps, FIG.
The semiconductor device shown in is soldered.

【0003】[0003]

【発明が解決しようとする課題】ところで、上記の半導
体装置の半田付け方法では、回路基板1及び半導体チッ
プ2及び放熱体3の組立体を半田4、5により固着する
ときに2度加熱を行なうため、半田付け工程が煩雑にな
る欠点があった。また、回路基板1及び半導体チップ2
の組立体を放熱体3上に半田付けする際に回路基板1の
配線パターン1c上の半田5が融点近くまで加熱される
ため、半田5が再溶融して半導体チップ2の固着が緩
み、半導体装置の半田付けの信頼性が著しく低下する欠
点があった。
In the soldering method for a semiconductor device described above, heating is performed twice when the assembly of the circuit board 1, the semiconductor chip 2 and the radiator 3 is fixed by the solders 4 and 5. Therefore, there is a drawback that the soldering process becomes complicated. In addition, the circuit board 1 and the semiconductor chip 2
Since the solder 5 on the wiring pattern 1c of the circuit board 1 is heated to near the melting point when the assembly of 1 is soldered onto the heat sink 3, the solder 5 is remelted and the semiconductor chip 2 is loosely fixed, and the semiconductor There is a drawback that the reliability of soldering of the device is significantly reduced.

【0004】そこで、本発明は半田付け工程を簡略化し
かつ半田付けの信頼性を向上できる半導体装置の半田付
け方法を提供することを目的とする。
Therefore, an object of the present invention is to provide a soldering method for a semiconductor device, which can simplify the soldering process and improve the reliability of soldering.

【0005】[0005]

【課題を解決するための手段】本発明による半導体装置
の半田付け方法は、一方の主面上の第1の半田付け領域
に第1の半田が印刷された基板と一方の主面上の第2の
半田付け領域に前記第1の半田より高い融点を有する第
2の半田が印刷された放熱体とを用意する工程と、前記
基板の他方の主面を前記放熱体の前記第2の半田付け領
域に重ねかつ前記基板の前記第1の半田付け領域に半導
体部品を載置する工程と、前記放熱体及び前記基板及び
前記半導体部品から成る組立体を前記放熱体から加熱し
て前記第1の半田及び前記第2の半田を同時に溶融する
工程とを含む。
A method of soldering a semiconductor device according to the present invention comprises a substrate having a first solder printed on a first soldering area on one main surface and a first soldering area on the one main surface. Preparing a heat radiator in which second solder having a higher melting point than that of the first solder is printed in the second soldering region, and the other main surface of the substrate is the second solder of the heat radiator. A step of stacking a semiconductor component on the attachment area and placing the semiconductor component on the first soldering area of the substrate; and heating the assembly including the radiator and the substrate and the semiconductor component from the radiator to form the first component. And melting the second solder at the same time.

【0006】放熱体及び基板及び半導体部品から成る組
立体を放熱体から加熱することにより、放熱体、基板、
半導体部品の順で熱が伝導されるので、基板の一方の主
面上の温度は放熱体の一方の主面上の温度より若干低く
なる。このため、放熱体及び基板間の高い融点の第2の
半田と基板及び半導体部品間の低い融点の第1の半田と
が略同時に溶け始める。したがって、1度の加熱で放熱
体及び基板及び半導体部品から成る組立体を第1及び第
2の半田により固着できるので、半導体装置の半田付け
工程を簡略化できる。また、基板及び半導体部品間の第
1の半田が再溶融することがなく、基板に固着された半
導体部品の緩みを防止して半導体装置の半田付けの信頼
性を向上できる。
By heating the assembly consisting of the radiator, the substrate and the semiconductor component from the radiator, the radiator, the substrate,
Since heat is conducted in the order of the semiconductor components, the temperature on one main surface of the substrate becomes slightly lower than the temperature on one main surface of the radiator. Therefore, the second solder having a high melting point between the radiator and the substrate and the first solder having a low melting point between the substrate and the semiconductor component start to melt at substantially the same time. Therefore, since the assembly including the radiator and the substrate and the semiconductor component can be fixed by the first and second solders by heating once, the soldering process of the semiconductor device can be simplified. Further, the first solder between the substrate and the semiconductor component is not remelted, the looseness of the semiconductor component fixed to the substrate can be prevented, and the reliability of soldering of the semiconductor device can be improved.

【0007】[0007]

【発明の実施の形態】以下、本発明による半導体装置の
半田付け方法の実施の形態を図1〜図3に基づいて説明
する。但し、図1では図4と同一の箇所には同一の符号
を付し、その説明を省略する。図1に示すように、ま
ず、セラミック製の回路基板1の一方の主面1aの第1
の半田付け領域としての配線パターン1c上に第1の半
田としてのペースト状の半田4(融点:230℃〜25
0℃)を予め印刷する。また、図2に示すように金属製
の放熱体3の一方の主面3aの第2の半田付け領域とし
ての半田付け領域3c上に第2の半田としてのペースト
状の半田5(融点:280℃〜300℃)を予め印刷す
る。次に、回路基板1の他方の主面1bに被着された銀
白金箔1dを固着面として放熱体3の半田付け領域3cに
重ね、回路基板1の配線パターン1c上に半導体部品と
しての半導体チップ2を載置する。その後、図3に示す
ように放熱体3及び回路基板1及び半導体チップ2から
成る組立体をコンベア6上に載置し、コンベア6の下部
に設置されたヒータ7により前記の組立体を放熱体3の
他方の主面3bから半田5の融点近傍に加熱する。この
とき、放熱体3、回路基板1、半導体チップ2の順で熱
が伝導されるので、回路基板1の一方の主面1a上の温
度は放熱体3の一方の主面3a上の温度より若干低くな
り、半田4の融点に略等しくなる。このため、放熱体3
及び回路基板1間の半田5と回路基板1及び半導体チッ
プ2間の半田4とが略同時に溶け始める。半田4、5の
溶融後、コンベア6を矢印方向に移動させてヒータ7よ
り組立体を離間させ、半田4、5を硬化させて放熱体3
及び回路基板1及び半導体チップ2から成る組立体を半
田4、5により固着する。以上により、図1に示す半導
体装置の半田付けが完了する。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of a method for soldering a semiconductor device according to the present invention will be described below with reference to FIGS. However, in FIG. 1, the same parts as those in FIG. 4 are designated by the same reference numerals, and the description thereof will be omitted. As shown in FIG. 1, first, the first main surface 1a of the circuit board 1 made of ceramic is
On the wiring pattern 1c as the soldering area of the paste-like solder 4 as the first solder (melting point: 230 ° C. to 25 ° C.).
0 ° C) in advance. Further, as shown in FIG. 2, the paste-like solder 5 (melting point: 280) as the second solder is provided on the soldering area 3c as the second soldering area on the one main surface 3a of the metal radiator 3. (° C to 300 ° C) is printed in advance. Next, the silver-platinum foil 1d adhered to the other main surface 1b of the circuit board 1 is used as a fixing surface and overlapped with the soldering area 3c of the radiator 3, and the semiconductor chip as a semiconductor component is placed on the wiring pattern 1c of the circuit board 1 as a semiconductor component. Place 2. After that, as shown in FIG. 3, an assembly consisting of the radiator 3, the circuit board 1 and the semiconductor chip 2 is placed on the conveyor 6, and the heater 7 installed at the bottom of the conveyor 6 removes the assembly from the radiator. The other principal surface 3b of the solder 3 is heated to near the melting point of the solder 5. At this time, since heat is conducted in the order of the radiator 3, the circuit board 1, and the semiconductor chip 2, the temperature on the one main surface 1a of the circuit board 1 is higher than the temperature on the one main surface 3a of the radiator 3. It becomes a little lower and becomes substantially equal to the melting point of the solder 4. Therefore, the radiator 3
The solder 5 between the circuit board 1 and the solder 4 between the circuit board 1 and the semiconductor chip 2 start to melt at substantially the same time. After the solders 4 and 5 are melted, the conveyor 6 is moved in the direction of the arrow to separate the assembly from the heater 7, and the solders 4 and 5 are hardened to dissipate the heat sink 3.
The assembly consisting of the circuit board 1 and the semiconductor chip 2 is fixed by the solders 4 and 5. By the above, the soldering of the semiconductor device shown in FIG. 1 is completed.

【0008】本発明では、融点の異なる半田4、5が略
同時に溶融するので、1度の加熱で放熱体3及び回路基
板1及び半導体チップ2から成る組立体を半田4、5に
より短時間で固着でき、半導体装置の半田付け工程を簡
略化できる。また、1度の加熱で半田付けできるため、
回路基板1及び半導体チップ間の半田4が再溶融するこ
とがなく、回路基板1に固着された半導体チップ2の緩
みを防止して半導体装置の半田付けの信頼性を向上でき
る。
In the present invention, since the solders 4 and 5 having different melting points are melted substantially at the same time, the assembly consisting of the radiator 3 and the circuit board 1 and the semiconductor chip 2 can be heated by the solder 4 and 5 in a short time by heating once. It can be fixed and the semiconductor device soldering process can be simplified. Also, since it can be soldered by heating once,
The solder 4 between the circuit board 1 and the semiconductor chip does not remelt, the looseness of the semiconductor chip 2 fixed to the circuit board 1 is prevented, and the reliability of soldering of the semiconductor device can be improved.

【0009】本発明の実施態様は上記の実施の形態に限
定されず、種々の変更が可能である。例えば、上記の実
施の形態では1個の半導体装置の半田付けについて説明
したが複数個の半導体装置の半田付けにも適用できる。
即ち、複数個の半導体装置の組立体を図3に示すコンベ
ア6の長手方向に並べて載置し、逐次コンベア6を移動
させて前記の各組立体を放熱体3からヒータ7により逐
次加熱してもよい。また、複数の半田付け領域3cに各
々高融点の半田5が印刷された放熱体3を用意し、表面
に低融点の半田4が印刷された複数個の回路基板1の裏
面を放熱体3の各々の半田付け領域3cにそれぞれ重ね
かつ各回路基板1の半田4の印刷面にそれぞれ半導体チ
ップ2を載置し、放熱体3と複数個の回路基板1及び半
導体チップ2との組立体を放熱体3の裏面からヒータ7
により加熱して半田付けを行なった後、必要に応じて放
熱体3を複数個に分割して複数個の半導体装置を得ても
よい。
The embodiment of the present invention is not limited to the above embodiment, and various modifications can be made. For example, in the above embodiment, the soldering of one semiconductor device has been described, but the present invention can also be applied to the soldering of a plurality of semiconductor devices.
That is, an assembly of a plurality of semiconductor devices is placed side by side in the longitudinal direction of the conveyor 6 shown in FIG. 3, and the conveyor 6 is sequentially moved to sequentially heat each assembly from the radiator 3 by the heater 7. Good. Further, the heat radiator 3 having the high melting point solder 5 printed on each of the plurality of soldering regions 3c is prepared, and the back surface of the plurality of circuit boards 1 having the low melting point solder 4 printed on the front surface thereof is used as the heat sink 3. The semiconductor chip 2 is placed on each soldering area 3c and on the printed surface of the solder 4 of each circuit board 1, and the assembly of the heat radiator 3 and the plurality of circuit boards 1 and semiconductor chips 2 is radiated. Heater 7 from the back of body 3
After heating and soldering by the method, the heat radiator 3 may be divided into a plurality of pieces to obtain a plurality of semiconductor devices, if necessary.

【0010】[0010]

【実施例】更に、図1に示す実施の形態において、半田
4、5が以下に示す組成であるときに良好な半田付け性
能が得られた。 半田4;Sn(錫)8%、Sb(アンチモン)10%、残
りPb(鉛)(融点250℃、液相温度261℃、固相
温度247℃) 半田5;Ag(銀)2.5%、Sn(錫)5%、残りPb
(鉛)(融点290℃、液相温度305℃、固相温度2
92℃)
EXAMPLES Further, in the embodiment shown in FIG. 1, good soldering performance was obtained when the solders 4 and 5 had the compositions shown below. Solder 4; Sn (tin) 8%, Sb (antimony) 10%, balance Pb (lead) (melting point 250 ° C, liquidus temperature 261 ° C, solidus temperature 247 ° C) Solder 5; Ag (silver) 2.5% , Sn (tin) 5%, rest Pb
(Lead) (melting point 290 ° C, liquidus temperature 305 ° C, solidus temperature 2
92 ° C)

【0011】[0011]

【発明の効果】本発明によれば、短時間に1度の加熱で
半導体装置の半田付けが完了するため、半導体装置の半
田付け工程を簡略化できかつ半田付けの信頼性を向上で
きる。また、半田付けの際の加熱時間が短時間であるた
め、半導体チップ等の半導体部品が受ける熱的ストレス
が少なく、半導体部品の電気的特性の劣化を防止できる
利点がある。
According to the present invention, the soldering of the semiconductor device is completed by heating once in a short time. Therefore, the soldering process of the semiconductor device can be simplified and the reliability of the soldering can be improved. Further, since the heating time at the time of soldering is short, there is little thermal stress applied to a semiconductor component such as a semiconductor chip, and there is an advantage that deterioration of the electrical characteristics of the semiconductor component can be prevented.

【図面の簡単な説明】[Brief description of drawings]

【図1】 本発明により半田付けされた半導体装置の構
造断面図
FIG. 1 is a structural sectional view of a semiconductor device soldered according to the present invention.

【図2】 半田付け領域に半田が印刷された放熱体の一
部を示す平面図
FIG. 2 is a plan view showing a part of a radiator in which solder is printed in a soldering area.

【図3】 本発明の加熱工程を示す断面図FIG. 3 is a sectional view showing a heating step of the present invention.

【図4】 従来の方法により半田付けされた半導体装置
の構造断面図
FIG. 4 is a structural cross-sectional view of a semiconductor device soldered by a conventional method.

【符号の説明】[Explanation of symbols]

1...回路基板(基板)、1a...一方の主面、1
b...他方の主面、1c...配線パターン(第1の半
田付け領域)、1d...銀白金箔、2...半導体チ
ップ(半導体部品)、3...放熱体、3a...一方
の主面、3b...他方の主面、3c...半田付け領域
(第2の半田付け領域)、4...半田(第1の半
田)、5...半田(第2の半田)、6...コンベ
ア、7...ヒータ
1. . . Circuit board (board), 1a. . . One main surface, 1
b. . . The other main surface, 1c. . . Wiring pattern (first soldering area), 1d. . . Silver platinum foil, 2. . . Semiconductor chips (semiconductor components), 3. . . Radiator, 3a. . . One main surface, 3b. . . The other major surface, 3c. . . 3. Soldering area (second soldering area), . . Solder (first solder), 5. . . Solder (second solder), 6. . . Conveyor, 7. . . heater

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 一方の主面上の第1の半田付け領域に第
1の半田が印刷された基板と、一方の主面上の第2の半
田付け領域に前記第1の半田より高い融点を有する第2
の半田が印刷された放熱体とを用意する工程と、 前記基板の他方の主面を前記放熱体の前記第2の半田付
け領域に重ねかつ前記基板の前記第1の半田付け領域に
半導体部品を載置する工程と、 前記放熱体及び前記基板及び前記半導体部品から成る組
立体を前記放熱体から加熱して前記第1の半田及び前記
第2の半田を同時に溶融する工程とを含むことを特徴と
する半導体装置の半田付け方法。
1. A substrate on which a first solder is printed in a first soldering area on one main surface, and a melting point higher than that of the first solder in a second soldering area on one main surface. Second with
A step of preparing a heat-dissipating body on which the solder is printed, the other main surface of the substrate being overlaid on the second soldering area of the heat-dissipating body, and the semiconductor component being on the first soldering area of the substrate. And a step of heating an assembly composed of the radiator, the substrate, and the semiconductor component from the radiator to simultaneously melt the first solder and the second solder. A characteristic method for soldering a semiconductor device.
JP20478695A 1995-08-10 1995-08-10 Semiconductor device soldering method Expired - Fee Related JP3360778B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20478695A JP3360778B2 (en) 1995-08-10 1995-08-10 Semiconductor device soldering method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20478695A JP3360778B2 (en) 1995-08-10 1995-08-10 Semiconductor device soldering method

Publications (2)

Publication Number Publication Date
JPH0955392A true JPH0955392A (en) 1997-02-25
JP3360778B2 JP3360778B2 (en) 2002-12-24

Family

ID=16496332

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20478695A Expired - Fee Related JP3360778B2 (en) 1995-08-10 1995-08-10 Semiconductor device soldering method

Country Status (1)

Country Link
JP (1) JP3360778B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7038313B2 (en) * 2003-05-06 2006-05-02 Fuji Electric Device Technology Co., Ltd. Semiconductor device and method of manufacturing the same
CN102263092A (en) * 2010-05-31 2011-11-30 三菱电机株式会社 Semiconductor module and method of manufacturing the same
JP2020503688A (en) * 2016-12-28 2020-01-30 シーメンス アクチエンゲゼルシヤフトSiemens Aktiengesellschaft Semiconductor module having first and second connection elements for connecting semiconductor chips and manufacturing method
CN113784499A (en) * 2021-08-05 2021-12-10 珠海市晶讯物联技术有限公司 Finished circuit board and method for module heat dissipation

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7038313B2 (en) * 2003-05-06 2006-05-02 Fuji Electric Device Technology Co., Ltd. Semiconductor device and method of manufacturing the same
KR100705868B1 (en) * 2003-05-06 2007-04-10 후지 덴키 디바이스 테크놀로지 가부시키가이샤 Semiconductor device and the method of manufacturing the same
CN100390977C (en) * 2003-05-06 2008-05-28 富士电机电子设备技术株式会社 Semiconductor device and its manufacturing method
CN102263092A (en) * 2010-05-31 2011-11-30 三菱电机株式会社 Semiconductor module and method of manufacturing the same
JP2020503688A (en) * 2016-12-28 2020-01-30 シーメンス アクチエンゲゼルシヤフトSiemens Aktiengesellschaft Semiconductor module having first and second connection elements for connecting semiconductor chips and manufacturing method
US11837571B2 (en) 2016-12-28 2023-12-05 Siemens Aktiengesellschaft Semiconductor module comprising a first and second connecting element for connecting a semiconductor chip, and also production method
CN113784499A (en) * 2021-08-05 2021-12-10 珠海市晶讯物联技术有限公司 Finished circuit board and method for module heat dissipation

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