JPH0952075A - Cleaning apparatus - Google Patents

Cleaning apparatus

Info

Publication number
JPH0952075A
JPH0952075A JP21042295A JP21042295A JPH0952075A JP H0952075 A JPH0952075 A JP H0952075A JP 21042295 A JP21042295 A JP 21042295A JP 21042295 A JP21042295 A JP 21042295A JP H0952075 A JPH0952075 A JP H0952075A
Authority
JP
Japan
Prior art keywords
cleaning
tank
cleaning liquid
liquid
tanks
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP21042295A
Other languages
Japanese (ja)
Inventor
Toshihide Fujii
敏秀 藤井
Mitsunobu Nomura
充延 野村
Yutaka Yoshimura
豊 吉村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP21042295A priority Critical patent/JPH0952075A/en
Publication of JPH0952075A publication Critical patent/JPH0952075A/en
Pending legal-status Critical Current

Links

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)

Abstract

PROBLEM TO BE SOLVED: To reduce the contamination of cleaning liquid in a cleaning tank located in a latter stage and to improve the circulation of the cleaning liquid in the cleaning tank by installing a pipeline for recovered cleaning liquid which supplies the recovered cleaning liquid from the lower part of the first cleaning tank in the first cleaning tank. SOLUTION: When coarse cleaning is finished in the first cleaning tank 11a, precise cleaning is done in the second cleaning tank 11b. Cleaning liquid 12b which overflowed the second cleaning tank 11b is introduced into the first cleaning tank 11a, and the cleaning liquid 12a which overflowed the first cleaning tank 11a is recovered into a recovery tank 15 through a recovery passage 14. The recovered cleaning liquid 112a is sent below the first and second cleaning tanks 11a, 11b by a pump 17 through pipelines 16a, 16b for recovered cleaning liquid. The dirty cleaning liquid moves upward. As a result, the dirty cleaning liquid is removed effectively to reduce the contamination of the cleaning liquid.

Description

【発明の詳細な説明】Detailed Description of the Invention

【０００１】[0001]

【発明の属する技術分野】本発明は、ブラウン管用電子
銃部品などの物体をプレス加工した後、例えばアルカリ
洗浄する物体の洗浄装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning device for an object such as an electron gun component for a cathode ray tube, which is press-processed and then, for example, cleaned with an alkali.

【０００２】[0002]

【従来の技術】ブラウン管用電子銃部品などの物体をプ
レス加工した後、例えばアルカリ洗浄する場合、洗浄す
る物体を複数の洗浄槽内に順に移動させ、それぞれの洗
浄槽で洗浄している。この場合、各洗浄槽の洗浄濃度を
独立して設定できるように、洗浄槽ごとに洗浄液を循環
させる方式を採っている。2. Description of the Related Art When an object such as an electron gun component for a cathode ray tube is pressed, for example, when it is subjected to alkali cleaning, the object to be cleaned is sequentially moved into a plurality of cleaning tanks and cleaned in each cleaning tank. In this case, a cleaning liquid is circulated in each cleaning tank so that the cleaning concentration of each cleaning tank can be independently set.

【０００３】ここで、従来の物体の洗浄装置について、
アルカリ洗浄を例にとり図３を参照して説明する。３１
ａは第１の洗浄槽で、３１ｂは第２の洗浄槽である。第
１および第２の洗浄槽３１ａ、３１ｂには、洗浄液３２
ａ、３２ｂが注入されている。そして、ブラウン管用電
子銃部品などプレス加工された物体が、洗浄バレル３３
に収納され第１の洗浄槽３１ａの洗浄液３２ａ内につけ
られ粗洗浄される。Here, regarding a conventional object cleaning apparatus,
An example of alkali cleaning will be described with reference to FIG. 31
Reference numeral a is a first cleaning tank, and reference numeral 31b is a second cleaning tank. The cleaning liquid 32 is contained in the first and second cleaning tanks 31a and 31b.
a and 32b are injected. Then, the pressed object such as the electron gun component for the cathode ray tube is cleaned by the cleaning barrel 33.
And is immersed in the cleaning liquid 32a of the first cleaning tank 31a for rough cleaning.

【０００４】第１の洗浄槽３１ａで洗浄された物体は、
洗浄バレル３３に詰められたまま第２の洗浄槽３１ｂに
移される。そして第２の洗浄槽３１ｂの洗浄液３２ｂで
精密洗浄される。なお、新しい補充洗浄液は、例えば補
充洗浄液用配管３４ａ、３４ｂを通して洗浄液３２ａ、
３２ｂの上部から補充される。The object washed in the first washing tank 31a is
While being packed in the cleaning barrel 33, it is transferred to the second cleaning tank 31b. Then, precision cleaning is performed with the cleaning liquid 32b in the second cleaning tank 31b. In addition, the new replenishing cleaning liquid is, for example, the cleaning liquid 32a through the replenishing cleaning liquid pipes 34a and 34b.
It is replenished from the top of 32b.

【０００５】第１および第２の洗浄槽３１ａ、３１ｂか
らオーバーフローした洗浄液３２ａ、３２ｂは、それぞ
れ回収タンク３５ａ、３５ｂで回収される。回収タンク
３５ａ、３５ｂで回収された洗浄液３２ａ、３２ｂは回
収洗浄液として、第１および第２の洗浄槽３１ａ、３１
ｂに、回収洗浄液用配管３６ａ、３６ｂを通してポンプ
３７ａ、３７ｂで送られる。The cleaning liquids 32a and 32b overflowing from the first and second cleaning tanks 31a and 31b are recovered in recovery tanks 35a and 35b, respectively. The cleaning liquids 32a and 32b recovered in the recovery tanks 35a and 35b are used as recovery cleaning liquids as the first and second cleaning tanks 31a and 31.
b through pumps 37a and 37b through recovered cleaning liquid pipes 36a and 36b.

【０００６】図３の物体洗浄装置は、２つの洗浄槽３１
ａ、３１ｂで構成されている。ここで、４つの洗浄槽で
構成される従来の物体洗浄装置について図４で説明す
る。The object cleaning apparatus shown in FIG. 3 has two cleaning tanks 31.
It is composed of a and 31b. Here, a conventional object cleaning apparatus including four cleaning tanks will be described with reference to FIG.

【０００７】４１ａ〜４１ｄは洗浄槽である。各洗浄槽
４１ａ〜４１ｄには洗浄液４２ａ〜４２ｄが注入されて
いる。そして、各洗浄槽４１ａ〜４１ｄにおいて、矢印
ｙ１〜ｙ４のように流れオーバーフローした洗浄液４２
ａ〜４２ｄは、それぞれに設けられた回収タンク４３ａ
〜４３ｄで回収される。回収タンク４３ａ〜４３ｄで回
収された洗浄液４２ａ〜４２ｄは回収洗浄液として、そ
れぞれの洗浄槽４１ａ〜４１ｄに、回収洗浄液用配管４
４ａ〜４４ｄを通して、ポンプ４５ａ〜４５ｄで送られ
る。、なお、ブラウン管用電子銃部品などプレス加工さ
れた物体は、洗浄バレル（図示せず）に詰め込まれた状
態で、第１の洗浄槽４１ａから第４の洗浄槽４１ｄへと
順に送られ洗浄される。41a to 41d are cleaning tanks. The cleaning liquids 42a to 42d are injected into the respective cleaning tanks 41a to 41d. Then, in each of the cleaning tanks 41a to 41d, the cleaning liquid 42 that overflows and flows as indicated by arrows y1 to y4.
a to 42d are recovery tanks 43a respectively provided
Recovered at ~ 43d. The cleaning liquids 42a to 42d recovered in the recovery tanks 43a to 43d are used as recovery cleaning liquids in the respective cleaning tanks 41a to 41d, and the recovery cleaning liquid pipe 4 is used.
Pumped by pumps 45a-45d through 4a-44d. The pressed objects such as electron gun parts for cathode ray tubes are packed in a cleaning barrel (not shown) and sequentially sent from the first cleaning tank 41a to the fourth cleaning tank 41d for cleaning. It

【０００８】[0008]

【発明が解決しようとする課題】ブラウン管用電子銃部
品のコンバージェンスカップのような深絞り品や、第５
電極のようなバーリング品の場合、これらの部品は過酷
な塑性加工であるため、プレス加工する際、プレス加工
油として塩素系の合成油が使用される。塩素系合成油
は、比重が１．０〜１．１と水に近い値になっている。
したがって、塩素系合成油が洗浄によって物体から離れ
ると、洗浄槽の底に沈むでもなく、また水面に浮くでも
なく、洗浄液の中に溶け込んでしまう。A deep-drawn product such as a convergence cup of an electron gun component for a cathode ray tube,
In the case of burring products such as electrodes, since these parts are subjected to severe plastic working, chlorine-based synthetic oil is used as press working oil during press working. The chlorine-based synthetic oil has a specific gravity of 1.0 to 1.1, which is a value close to that of water.
Therefore, when the chlorine-based synthetic oil is separated from the object by cleaning, it does not sink to the bottom of the cleaning tank or float on the water surface, and dissolves in the cleaning liquid.

【０００９】このため、洗浄する物体がカップ形状をし
ていたり、洗浄する物体の洗浄槽間の移動が速かったり
すると、前段の洗浄槽における洗浄の液切りが十分でな
くなる。このため、汚れた洗浄液が後段の洗浄槽に持ち
込まれる。その結果、洗浄液を清浄にしておく必要があ
る最終段の洗浄槽、例えば、図３の場合は第２の洗浄槽
３１ｂ、また図４の場合は第４の洗浄槽４１ｄの洗浄液
がすぐ汚染されてしまう。For this reason, if the object to be cleaned has a cup shape or if the object to be cleaned moves quickly between the cleaning tanks, the drainage of the cleaning liquid in the previous cleaning tank will not be sufficient. For this reason, the dirty cleaning liquid is brought into the subsequent cleaning tank. As a result, the cleaning liquid at the final stage where the cleaning liquid needs to be cleaned, for example, the cleaning liquid in the second cleaning tank 31b in the case of FIG. 3 or the fourth cleaning tank 41d in the case of FIG. 4, is immediately contaminated. Will end up.

【００１０】最終段の洗浄槽の汚染は、洗浄装置全体の
洗浄液の寿命を低下させる。これは、新しい補充洗浄液
の補充を必要とすることになり洗浄剤の使用量が増え
る。また、精密な洗浄が必要とされる電子銃部品などの
場合に、最終段に位置する洗浄槽の洗浄液を清浄にして
おくことが洗浄品位を保つために必要とされるが、洗浄
液を清浄に保つことが困難になる。Contamination of the final stage cleaning tank shortens the life of the cleaning liquid in the entire cleaning device. This necessitates the replenishment of a new replenishing cleaning liquid, which increases the amount of cleaning agent used. Also, in the case of electron gun parts that require precise cleaning, it is necessary to clean the cleaning liquid in the cleaning tank located at the final stage in order to maintain the cleaning quality. It will be difficult to keep.

【００１１】また、油など汚れを含む洗浄液は、オーバ
ーフローしてそれぞれに設けられた回収タンクで回収さ
れている。そして、回収タンクで回収された洗浄液は、
それぞれの洗浄槽の底の方から回収洗浄液として補充さ
れる。このとき、回収洗浄液は下部から上部へという流
れを作る。これに対し、新しい補充洗浄液は液面の上方
から補充される。このため、新しい補充洗浄液はすぐオ
ーバーフローして前段の槽へ流れてしまう。したがっ
て、回収洗浄液と補充洗浄液で作られる流れが反対にな
り、洗浄液の循環が阻害される。この結果、汚れを含む
洗浄液の回収が十分でなくなる。Further, the cleaning liquid containing dirt such as oil overflows and is collected in a recovery tank provided in each of them. Then, the cleaning liquid collected in the collection tank is
The collected cleaning liquid is replenished from the bottom of each cleaning tank. At this time, the collected cleaning liquid makes a flow from the lower part to the upper part. On the other hand, the new replenishing cleaning liquid is replenished from above the liquid surface. For this reason, the new replenishing cleaning solution immediately overflows and flows into the previous tank. Therefore, the flow produced by the collected cleaning liquid and the supplementary cleaning liquid is opposite, and the circulation of the cleaning liquid is obstructed. As a result, the cleaning liquid containing dirt is not sufficiently collected.

【００１２】例えば、図４の構成の場合で、第１および
第２の洗浄槽を粗洗浄用として使用し、洗浄液の濃度を
例えば５％に設定している。また、第３および第４の洗
浄槽が精密洗浄用として使用し、洗浄液の濃度を３％に
設定している。そして、それぞれの洗浄槽に回収タンク
を設け、洗浄槽ごとに洗浄液を循環させる構成の場合、
最終段の第４の洗浄槽に汚染した洗浄液が持ち込まれ、
洗浄液の汚染が早いという結果がでている。For example, in the case of the configuration of FIG. 4, the first and second cleaning tanks are used for rough cleaning, and the concentration of the cleaning liquid is set to 5%, for example. Also, the third and fourth cleaning tanks are used for precision cleaning, and the concentration of the cleaning liquid is set to 3%. Then, in the case of a configuration in which a recovery tank is provided in each cleaning tank and the cleaning liquid is circulated in each cleaning tank,
Contaminated cleaning fluid was brought into the fourth cleaning tank in the final stage,
The result is that the cleaning liquid is contaminated quickly.

【００１３】本発明は、上記した欠点を解決するもの
で、後段に位置する洗浄槽の洗浄液の汚染を少なくし、
また、洗浄槽内の洗浄液の循環を良好にした物体の洗浄
装置を提供することを目的とする。The present invention solves the above-mentioned drawbacks by reducing the contamination of the cleaning liquid in the cleaning tank located at the rear stage,
Another object of the present invention is to provide a device for cleaning an object in which the circulation of the cleaning liquid in the cleaning tank is improved.

【００１４】[0014]

【課題を解決するための手段】本発明の物体の洗浄装置
は、物体を洗浄する洗浄液が注入された第１の洗浄槽
と、物体を洗浄する洗浄液が注入され、かつ前記第１の
洗浄槽で洗浄された物体を洗浄し、オーバーフローした
洗浄液が前記第１の洗浄槽に流れ込む第２の洗浄槽と、
前記第１の洗浄槽から洗浄液を回収する回収タンクと、
この回収タンクに回収された洗浄液を、前記第１および
第２の洗浄槽の少なくとも第１の洗浄槽に、その下部の
方から供給する回収洗浄液用配管とで構成されている。SUMMARY OF THE INVENTION An object cleaning apparatus according to the present invention includes a first cleaning tank in which a cleaning liquid for cleaning an object is injected, and a first cleaning tank in which a cleaning liquid for cleaning an object is injected. A second cleaning tank in which the object washed in step 1 is cleaned, and the overflowed cleaning liquid flows into the first cleaning tank;
A recovery tank for recovering the cleaning liquid from the first cleaning tank,
The cleaning liquid recovered in the recovery tank is composed of at least a first cleaning tank of the first and second cleaning tanks, and a recovery cleaning liquid pipe for supplying the cleaning solution from a lower portion thereof.

【００１５】また、本発明は、第１および第２の洗浄槽
の少なくとも一方が複数の槽から構成されている。Further, in the present invention, at least one of the first and second cleaning tanks is composed of a plurality of tanks.

【００１６】さらに、第１および第２の洗浄槽の少なく
とも第２の洗浄槽に、その下部の方から新しい洗浄液を
補充している。Furthermore, at least the second cleaning tank of the first and second cleaning tanks is replenished with fresh cleaning liquid from the lower part thereof.

【００１７】また、本発明の物体の洗浄装置は、物体を
洗浄する洗浄液が注入された第１の洗浄槽と、物体を洗
浄する洗浄液が注入され、かつ前記第１の洗浄槽で洗浄
された物体を洗浄し、オーバーフローした洗浄液が前記
第１の洗浄槽に流れ込む第２の洗浄槽と、この第２の洗
浄槽で洗浄された物体を洗浄する第３の洗浄槽と、物体
を洗浄する洗浄液が注入され、かつ前記第３の洗浄槽で
洗浄された物体を洗浄し、オーバーフローした洗浄液が
前記第３の洗浄槽に流れ込む第４の洗浄槽と、前記第１
の洗浄槽から洗浄液を回収する第１の回収タンクと、前
記第３の洗浄槽から洗浄液を回収する第２の回収タンク
と、前記第１の回収タンクに回収された洗浄液を、前記
第１および第２の洗浄槽の少なくとも第１の洗浄槽に、
その下部の方から供給する第１の回収洗浄液用配管と、
前記第２の回収タンクに回収された洗浄液を、前記第１
乃至第３の洗浄槽の少なくとも１つの洗浄槽に、その下
部の方から供給する第２の回収洗浄液用配管とで構成さ
れている。Further, in the object cleaning apparatus of the present invention, the first cleaning tank into which the cleaning liquid for cleaning the object is injected, the cleaning liquid for cleaning the object are injected, and the object is cleaned in the first cleaning tank. A second cleaning tank for cleaning an object and overflowing cleaning solution flowing into the first cleaning tank, a third cleaning tank for cleaning the object cleaned in the second cleaning tank, and a cleaning solution for cleaning the object And a fourth cleaning tank in which the overflowed cleaning liquid flows into the third cleaning tank, and the first cleaning tank cleans the object that has been injected into the third cleaning tank.
The first recovery tank for recovering the cleaning liquid from the cleaning tank, the second recovery tank for recovering the cleaning liquid from the third cleaning tank, and the cleaning liquid recovered in the first recovery tank for the first and second cleaning tanks. At least the first cleaning tank of the second cleaning tank,
A first recovery cleaning liquid pipe to be supplied from below,
The cleaning liquid collected in the second collection tank is used as the first cleaning liquid.
To at least one cleaning tank of the third cleaning tank, and a second recovery cleaning liquid pipe supplied from the lower side thereof.

【００１８】また、第２および第４の洗浄槽に、その下
部の方から新しい洗浄液を補充している。Further, the second and fourth cleaning tanks are replenished with fresh cleaning liquid from the lower part thereof.

【００１９】上記した構成によれば、後段に位置する洗
浄槽からオーバーフローした洗浄液が前段の洗浄槽に流
れ込み、そして、前段の洗浄槽の洗浄液が回収タンクに
回収される構成になっている。したがって、汚れの少な
い後段の洗浄槽の洗浄液が前段の洗浄液を補充する形に
なるため洗浄液の消費を少なくできる。According to the above construction, the cleaning liquid overflowing from the cleaning tank located at the rear stage flows into the cleaning tank at the front stage, and the cleaning liquid in the cleaning tank at the front stage is recovered in the recovery tank. Therefore, the cleaning liquid in the latter-stage cleaning tank with less dirt is replenished with the cleaning liquid in the former stage, so that the consumption of the cleaning liquid can be reduced.

【００２０】また、新しい補充洗浄液が、回収洗浄液と
ともに洗浄槽の下方から供給される構成であるため、洗
浄槽内の洗浄液の流れが下から上方向となる。したがっ
て、汚染された洗浄液が上方に持ち上げられることにな
る。そして、オーバーフローなどで効果的に回収され
る。したがって、洗浄液の汚染が少なくなる。Further, since the new replenishing cleaning liquid is supplied from below the cleaning tank together with the recovered cleaning liquid, the flow of the cleaning liquid in the cleaning tank is from bottom to top. Therefore, the contaminated cleaning liquid is lifted up. Then, it is effectively recovered by overflow or the like. Therefore, the cleaning liquid is less contaminated.

【００２１】また、最終段の洗浄槽は新しい補充洗浄液
の補充だけとし、回収洗浄液を加えないようにすれば、
最終段の洗浄槽の洗浄液を清浄に保つことができ、洗浄
品位を向上できる。また、洗浄液の寿命を長くできる。In addition, if the cleaning tank at the final stage is only replenished with a new replenishing cleaning solution and the collected cleaning solution is not added,
The cleaning liquid in the final-stage cleaning tank can be kept clean and the cleaning quality can be improved. In addition, the life of the cleaning liquid can be extended.

【００２２】[0022]

【発明の実施の形態】本発明の実施の形態の一例につい
て、図１を参照して説明する。BEST MODE FOR CARRYING OUT THE INVENTION An example of an embodiment of the present invention will be described with reference to FIG.

【００２３】１１ａは第１の洗浄槽で、１１ｂは第２の
洗浄槽である。第１および第２の洗浄槽１１ａ、１１ｂ
には、洗浄液１２ａ、１２ｂが注入されている。そし
て、ブラウン管用電子銃部品などプレス加工された物体
が例えば洗浄バレル（図示せず）に収納されて第１の洗
浄槽１１ａで粗洗浄される。洗浄バレルは、両端の円板
間に金網容器が取り付けられた構造をしており、金網容
器内に洗浄する物体が収納される。Reference numeral 11a is a first cleaning tank, and 11b is a second cleaning tank. First and second cleaning tanks 11a and 11b
The cleaning liquids 12a and 12b are injected into. Then, the pressed object such as the electron gun component for the cathode ray tube is housed in, for example, a cleaning barrel (not shown) and roughly cleaned in the first cleaning tank 11a. The cleaning barrel has a structure in which a wire mesh container is attached between the disks at both ends, and an object to be cleaned is stored in the wire mesh container.

【００２４】第１の洗浄槽１１ａで粗洗浄が終了する
と、洗浄する物体を収納した洗浄バレルは第２の洗浄槽
１１ｂに移され、精密洗浄される。なお、新しい補充用
洗浄液は、例えば補充洗浄液用配管１３ａ、１３ｂを通
して各洗浄槽１１ａ、１１ｂに下方から補充される。When the rough cleaning is completed in the first cleaning tank 11a, the cleaning barrel containing the object to be cleaned is transferred to the second cleaning tank 11b for precision cleaning. The new replenishing cleaning liquid is replenished from below to the respective cleaning tanks 11a and 11b through the replenishing cleaning liquid pipes 13a and 13b, for example.

【００２５】また、第２の洗浄槽１１ｂから矢印Ｙのよ
うにオーバーフローした洗浄液１２ｂは第１の洗浄槽１
１ａに流れ込む。また、また第１の洗浄槽１１ａにおい
て矢印ｙのように流れオーバーフローした洗浄液１２ａ
は回収通路１４を通って回収タンク１５に回収される。
回収タンク１５に回収された洗浄液１２ａは回収洗浄液
として、第１および第２の洗浄槽１１ａ、１１ｂの下方
に、回収洗浄液用配管１６ａ、１６ｂを通してポンプ１
７で送られる。Further, the cleaning liquid 12b overflowing from the second cleaning tank 11b as shown by the arrow Y is stored in the first cleaning tank 1
It flows into 1a. In addition, the cleaning liquid 12a that has flowed and overflowed in the first cleaning tank 11a as shown by an arrow y.
Is collected in the collection tank 15 through the collection passage 14.
The cleaning liquid 12a recovered in the recovery tank 15 is used as a recovery cleaning liquid as a pump 1 through the recovery cleaning liquid pipes 16a and 16b below the first and second cleaning tanks 11a and 11b.
Sent by 7.

【００２６】上記した構成によれば、補充用洗浄液の補
充および回収洗浄液の供給が洗浄槽１１ａ、１１ｂの下
方から行われる。したがって、洗浄液の流れは下から上
方向となり、物体の洗浄によって油などで汚れた洗浄液
は上方に移動する。そして、第２の洗浄槽１１ｂでは汚
れた洗浄液がオーバーフローして第１の洗浄槽１１ａに
流れ込み、また、第１の洗浄槽１１ａではオーバーフロ
ーして回収タンク１５に回収される。According to the above structure, the replenishment cleaning liquid is replenished and the recovered cleaning liquid is supplied from below the cleaning tanks 11a and 11b. Therefore, the flow of the cleaning liquid is from the bottom to the top, and the cleaning liquid contaminated with oil or the like by cleaning the object moves upward. Then, the dirty cleaning liquid overflows in the second cleaning tank 11b and flows into the first cleaning tank 11a, and overflows in the first cleaning tank 11a and is recovered in the recovery tank 15.

【００２７】したがって、汚染された洗浄液が効果的に
除去され、洗浄液の汚染を少なくできる。なお、後段に
位置する第２の洗浄槽１１ｂの洗浄液１２ｂをより清浄
に保つ場合には、第２の洗浄槽１１ｂに対する回収洗浄
液の供給をやめ、新しい補充用洗浄液の補充だけにす
る。Therefore, the contaminated cleaning liquid is effectively removed, and the contamination of the cleaning liquid can be reduced. In order to keep the cleaning liquid 12b of the second cleaning tank 11b located at the latter stage more clean, the supply of the recovered cleaning liquid to the second cleaning tank 11b is stopped and only the replenishment cleaning liquid is replenished.

【００２８】次に、この発明の他の実施形態について図
２で説明する。Next, another embodiment of the present invention will be described with reference to FIG.

【００２９】２１ａ〜２１ｄは第１〜第４の洗浄槽であ
る。ブラウン管用電子銃部品などプレス加工された物体
は洗浄バレルに収納され、第１の洗浄槽２１ａから第４
の洗浄槽２１ｄへと順に送られ洗浄される。第１〜第４
の洗浄槽２１ａ〜２１ｄにはそれぞれ、洗浄液２２ａ〜
２２ｄが注入されている。また、第２および第４の洗浄
槽２１ｃ、２１ｄの下方には、補充洗浄液配管２３ｂ、
２３ｄを通して、新しい補充用洗浄液が補充される。Reference numerals 21a to 21d denote first to fourth cleaning tanks. Pressed objects such as electron gun parts for cathode ray tubes are housed in the cleaning barrel and are transferred from the first cleaning tank 21a to the fourth cleaning tank 21a.
Are sequentially sent to the cleaning tank 21d for cleaning. First to fourth
The cleaning tanks 21a to 21d of the cleaning liquids 22a to
22d has been injected. In addition, below the second and fourth cleaning tanks 21c and 21d, a replenishing cleaning liquid pipe 23b,
A new replenishing cleaning liquid is replenished through 23d.

【００３０】なお、第２の洗浄槽２１ｂから矢印ｙｂの
ようにオーバーフローした洗浄液２２ｂは、第１の洗浄
槽２１ａに流れ込む。また、矢印ｙａのように第１の洗
浄槽２１ａからオーバーフローした洗浄液２２ａは、回
収通路２４ａを通して回収タンク２５ａに回収される。
回収タンク２５ａには複数のフィルタＦがある間隔で設
けられている。したがって、回収タンク２５ａで回収さ
れた洗浄液２２ｂに含まれる汚染物質はフィルタＦで除
かれる。このとき、フィルタＦで回収された汚染物質
は、廃液ポンプ２６によって廃液用配管２７ａから廃液
回収用ドラム缶（図示せず）に送られる。また、汚染物
質が除去された洗浄液２２ａは回収洗浄液として、第１
および第２の洗浄槽２１ａ、２１ｂの下方に、回収洗浄
液用配管２８ａ、２８ｂを通して、ポンプ２９ａで送ら
れる。The cleaning liquid 22b overflowing from the second cleaning tank 21b as shown by the arrow yb flows into the first cleaning tank 21a. Further, the cleaning liquid 22a overflowing from the first cleaning tank 21a as indicated by the arrow ya is recovered in the recovery tank 25a through the recovery passage 24a.
The recovery tank 25a is provided with a plurality of filters F at certain intervals. Therefore, the contaminants contained in the cleaning liquid 22b collected in the collection tank 25a are removed by the filter F. At this time, the pollutants collected by the filter F are sent by the waste liquid pump 26 from the waste liquid pipe 27a to the waste liquid collecting drum can (not shown). In addition, the cleaning liquid 22a from which the contaminants have been removed is
And, below the second cleaning tanks 21a and 21b, it is sent by a pump 29a through recovered cleaning liquid pipes 28a and 28b.

【００３１】また、第４の洗浄槽２１ｄから矢印ｙｄの
ようにオーバーフローした洗浄液２２ｄは、第３の洗浄
槽２１ｃに流れ込む。そして、矢印ｙｃのように第３の
洗浄槽２１ｃからオーバーフローした洗浄液２２ｃは回
収通路２４ｃを通して回収タンク２５ｃで回収される。
回収タンク２５ｃにも複数のフィルタＦがある間隔で設
けられており、洗浄液２２ｃに含まれる汚染物質がフィ
ルタＦで除かれる。汚染物質が除去された洗浄液２２ｃ
は回収洗浄液として、回収洗浄液用配管２８ｂ、２８ｃ
を通して、第２および第３の洗浄槽２１ｂ、２１ｃの下
方に、ポンプ２９ｃで送られる。この場合、回収洗浄液
は最終の第４の洗浄槽２１ｄには送られない。The cleaning liquid 22d overflowing from the fourth cleaning tank 21d as indicated by the arrow yd flows into the third cleaning tank 21c. Then, as shown by the arrow yc, the cleaning liquid 22c overflowing from the third cleaning tank 21c is recovered in the recovery tank 25c through the recovery passage 24c.
The recovery tank 25c is also provided with a plurality of filters F at certain intervals, and the contaminants contained in the cleaning liquid 22c are removed by the filters F. Cleaning liquid 22c from which contaminants have been removed
Is the recovery cleaning liquid, and the recovery cleaning liquid pipes 28b and 28c
Through a pump 29c below the second and third cleaning tanks 21b and 21c. In this case, the collected cleaning liquid is not sent to the final fourth cleaning tank 21d.

【００３２】なお、第２の洗浄槽２１ｂ内には、洗浄す
る物体を収納する洗浄バレル３０が示されている。この
場合、洗浄バレル３０の回転方向を矢印Ｙのようにし、
第２の洗浄槽２１ｂから第１の洗浄槽２１ａ方向にオー
バーフローする洗浄液２２ｂの流れの方向（矢印ｙｂ）
と同じにしている。A cleaning barrel 30 for accommodating an object to be cleaned is shown in the second cleaning tank 21b. In this case, the direction of rotation of the cleaning barrel 30 is set as indicated by arrow Y,
Direction of flow of the cleaning liquid 22b overflowing from the second cleaning tank 21b toward the first cleaning tank 21a (arrow yb)
And the same.

【００３３】上記した構成の場合も、補充用洗浄液の補
充および回収洗浄液の供給が洗浄槽の下方から行われ
る。したがって、洗浄液の流れは下から上方向となり、
油などで汚れた洗浄液は上方に移動する。このような汚
れた洗浄液は、第２および第４の洗浄槽２１ｂ、２１ｄ
からオーバーフローして前段の第１、第３の洗浄槽２１
ａ、２１ｃに流れ込み、そして、第１の洗浄槽２１ａや
第３の洗浄槽２１ｃからオーバーフローして回収タンク
２５ａ、２５ｃに回収される。したがって、汚染された
洗浄液が効果的に除去され、洗浄液の汚染を少なくな
る。また、最終段に位置する第４の洗浄槽２１ｄには、
回収洗浄液が供給されず新しい補充用洗浄液の補充だけ
であるため、洗浄液は清浄に保たれ洗浄品位を高くでき
る。Also in the case of the above configuration, the replenishment cleaning liquid is replenished and the recovered cleaning liquid is supplied from below the cleaning tank. Therefore, the flow of cleaning liquid is from bottom to top,
The cleaning liquid soiled with oil moves upward. Such dirty cleaning liquid is used for the second and fourth cleaning tanks 21b and 21d.
Overflows from the first and third cleaning tanks 21 in the previous stage
a, 21c, and overflows from the first cleaning tank 21a and the third cleaning tank 21c, and is collected in the recovery tanks 25a, 25c. Therefore, the contaminated cleaning liquid is effectively removed, and the contamination of the cleaning liquid is reduced. Further, in the fourth cleaning tank 21d located at the final stage,
Since the recovered cleaning liquid is not supplied and only the new cleaning liquid for replenishment is replenished, the cleaning liquid is kept clean and the cleaning quality can be improved.

【００３４】なお、図４の実施形態の場合、次のような
特徴がある。The embodiment of FIG. 4 has the following features.

【００３５】１）第２の回収タンク２５ｃに回収される
洗浄液は、精密洗浄によるものであまり汚れていない。
このように汚れていない洗浄液が回収洗浄液として第
２、第３の洗浄槽２１ｂ、２１ｃに送られ有効に利用さ
れる。このため、洗浄液の消費を少なくできる。1) The cleaning liquid recovered in the second recovery tank 25c is precision cleaned and is not very dirty.
Thus, the uncleaned cleaning liquid is sent to the second and third cleaning tanks 21b and 21c as the collected cleaning liquid and is effectively used. Therefore, the consumption of the cleaning liquid can be reduced.

【００３６】２）第１および第２の回収タンク２５ａ、
２５ｃに底の部分に、ついたて状のフィルタが設けられ
ている。したがって、汚染物質を効果的に除去でき、回
収洗浄液を清浄にできる。2) First and second recovery tanks 25a,
On the bottom of 25c, a vertical filter is provided. Therefore, the contaminants can be effectively removed, and the collected cleaning liquid can be cleaned.

【００３７】３）第１の回収タンク２５ａから廃液ドラ
ム缶に送られる廃液と同じ量の補充用洗浄液を、例えば
第２の洗浄槽２１ｂに補充する構成にでき、洗浄液の量
や洗浄度を一定に維持できる。3) The second cleaning tank 21b can be replenished with the same amount of the replenishing cleaning liquid as the amount of the waste liquid sent from the first recovery tank 25a to the waste liquid drum, so that the amount and the cleaning degree of the cleaning liquid can be kept constant. Can be maintained.

【００３８】４）洗浄する物体を収納したバレルを、洗
浄槽内の洗浄液の流れに合わせて回転させれば、汚染し
た洗浄液をオーバーフローさせやすくなり、洗浄液の汚
染を少なくできる。なお、上記した実施形態では２つあ
るいは４つの洗浄槽で構成しているが、洗浄槽は複数で
あればよく、洗浄槽の数は自由に選定することができ
る。4) If the barrel accommodating the object to be cleaned is rotated according to the flow of the cleaning solution in the cleaning tank, the contaminated cleaning solution can easily overflow and the contamination of the cleaning solution can be reduced. In the above-described embodiment, the cleaning tank is composed of two or four cleaning tanks, but the number of cleaning tanks may be plural, and the number of cleaning tanks can be freely selected.

【００３９】[0039]

【発明の効果】本発明によれば、後段に位置する洗浄槽
の洗浄液の汚染を少なくし、また、洗浄槽内の洗浄液の
循環を良好にした物体の洗浄装置を実現できる。According to the present invention, it is possible to realize a device for cleaning an object in which the contamination of the cleaning liquid in the cleaning tank located at the rear stage is reduced and the circulation of the cleaning liquid in the cleaning tank is improved.

【図面の簡単な説明】[Brief description of drawings]

【図１】本発明の一実施形態を示す概略構成図である。FIG. 1 is a schematic configuration diagram showing an embodiment of the present invention.

【図２】本発明の他の実施形態を示す概略構成図であ
る。FIG. 2 is a schematic configuration diagram showing another embodiment of the present invention.

【図３】従来例を示す概略構成図である。FIG. 3 is a schematic configuration diagram showing a conventional example.

【図４】他の従来例を示す概略構成図である。FIG. 4 is a schematic configuration diagram showing another conventional example.

【符号の説明】[Explanation of symbols]

１１ａ…第１の洗浄槽 １１ｂ…第２の洗浄槽 １２ａ、１２ｂ…洗浄液 １３ａ、１３ｂ…補充洗浄液用配管 １４…回収通路 １５…回収タンク １６ａ、１６ｂ…回収洗浄液用配管 １７…ポンプ 11a ... 1st cleaning tank 11b ... 2nd cleaning tank 12a, 12b ... Cleaning liquid 13a, 13b ... Replenishment cleaning liquid piping 14 ... Recovery passage 15 ... Recovery tank 16a, 16b ... Recovery cleaning liquid piping 17 ... Pump

Claims (5)

【特許請求の範囲】[Claims] 【請求項１】 物体を洗浄する洗浄液が注入された第１
の洗浄槽と、物体を洗浄する洗浄液が注入され、かつ前
記第１の洗浄槽で洗浄された物体を洗浄し、オーバーフ
ローした洗浄液が前記第１の洗浄槽に流れ込む第２の洗
浄槽と、前記第１の洗浄槽から洗浄液を回収する回収タ
ンクと、この回収タンクに回収された洗浄液を、前記第
１および第２の洗浄槽の少なくとも第１の洗浄槽に、そ
の下部の方から供給する回収洗浄液用配管とを具備した
物体の洗浄装置。1. A first liquid injecting a cleaning liquid for cleaning an object
And a second cleaning tank in which a cleaning liquid for cleaning an object is injected and an object which has been cleaned in the first cleaning tank is cleaned and the overflowing cleaning liquid flows into the first cleaning tank, A recovery tank for recovering the cleaning liquid from the first cleaning tank, and a cleaning liquid recovered in the recovery tank is supplied to at least the first cleaning tank of the first and second cleaning tanks from the lower side thereof. An object cleaning device including a cleaning liquid pipe. 【請求項２】 第１および第２の洗浄槽の少なくとも第
２の洗浄槽に、その下部の方から新しい洗浄液を補充す
ることを特徴とする請求項１記載の物体の洗浄装置。2. The apparatus for cleaning an object according to claim 1, wherein at least the second cleaning tank of the first and second cleaning tanks is replenished with fresh cleaning liquid from the lower side thereof. 【請求項３】 第１および第２の洗浄槽の少なくとも一
方が複数の槽から構成されていることを特徴とする請求
項１記載の物体の洗浄装置。3. The object cleaning apparatus according to claim 1, wherein at least one of the first and second cleaning tanks is composed of a plurality of tanks. 【請求項４】 物体を洗浄する洗浄液が注入された第１
の洗浄槽と、物体を洗浄する洗浄液が注入され、かつ前
記第１の洗浄槽で洗浄された物体を洗浄し、オーバーフ
ローした洗浄液が前記第１の洗浄槽に流れ込む第２の洗
浄槽と、この第２の洗浄槽で洗浄された物体を洗浄する
第３の洗浄槽と、物体を洗浄する洗浄液が注入され、か
つ前記第３の洗浄槽で洗浄された物体を洗浄し、オーバ
ーフローした洗浄液が前記第３の洗浄槽に流れ込む第４
の洗浄槽と、前記第１の洗浄槽から洗浄液を回収する第
１の回収タンクと、前記第３の洗浄槽から洗浄液を回収
する第２の回収タンクと、前記第１の回収タンクに回収
された洗浄液を、前記第１および第２の洗浄槽の少なく
とも第１の洗浄槽に、その下部の方から供給する第１の
回収洗浄液用配管と、前記第２の回収タンクに回収され
た洗浄液を、前記第１乃至第３の洗浄槽の少なくとも１
つの洗浄槽に、その下部の方から供給する第２の回収洗
浄液用配管とを具備した物体の洗浄装置。4. A first liquid injecting a cleaning liquid for cleaning an object.
And a second cleaning tank in which a cleaning liquid for cleaning an object is injected and an object which has been cleaned in the first cleaning tank is cleaned and overflow cleaning liquid flows into the first cleaning tank. A third cleaning tank for cleaning the object cleaned in the second cleaning tank and a cleaning solution for cleaning the object are injected, and the object cleaned in the third cleaning tank is cleaned, and the overflowed cleaning solution is Fourth flowing into the third cleaning tank
Cleaning tank, a first recovery tank for recovering the cleaning solution from the first cleaning tank, a second recovery tank for recovering the cleaning solution from the third cleaning tank, and a first recovery tank. The cleaning liquid collected in the second recovery tank and the first recovery cleaning liquid pipe for supplying the cleaning liquid to at least the first cleaning tank of the first and second cleaning tanks from the lower part thereof. , At least one of the first to third cleaning tanks
An object cleaning apparatus comprising two cleaning tanks and a second recovery cleaning liquid pipe supplied from the lower side thereof. 【請求項５】 第２および第４の洗浄槽に、その下部の
方から新しい補充洗浄液を補充することを特徴とする請
求項４記載の物体の洗浄装置。5. The apparatus for cleaning an object according to claim 4, wherein the second and fourth cleaning tanks are replenished with a new replenishing cleaning liquid from the lower side thereof.
JP21042295A 1995-08-18 1995-08-18 Cleaning apparatus Pending JPH0952075A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21042295A JPH0952075A (en) 1995-08-18 1995-08-18 Cleaning apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21042295A JPH0952075A (en) 1995-08-18 1995-08-18 Cleaning apparatus

Publications (1)

Publication Number Publication Date
JPH0952075A true JPH0952075A (en) 1997-02-25

Family

ID=16589057

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21042295A Pending JPH0952075A (en) 1995-08-18 1995-08-18 Cleaning apparatus

Country Status (1)

Country Link
JP (1) JPH0952075A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017004931A (en) * 2015-06-11 2017-01-05 住友化学株式会社 Separator cleaning method, separator manufacturing method, and film cleaning method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017004931A (en) * 2015-06-11 2017-01-05 住友化学株式会社 Separator cleaning method, separator manufacturing method, and film cleaning method

Similar Documents

Publication Publication Date Title
RU2434570C1 (en) Method of self-cleaning of continuous dishwasher
US20130220478A1 (en) Process liquid changing method and substrate processing apparatus
US20080029463A1 (en) Device and Method for Filtering Particles from a Liquid in a Dishwasher
CN107695047A (en) A kind of high-effective cleansing system of tubular type parts
JP2017185471A (en) Emulsion washing device
US5013432A (en) Filter system for liquids with particles in suspension
JPH0952075A (en) Cleaning apparatus
JPS6358840A (en) Cleaning and apparatus therefor
CN213856170U (en) Cleaning device
JP2003245615A (en) Washing apparatus and washing method
US6589358B1 (en) Method and apparatus for cleaning an article
CN208513221U (en) A kind of ultrasonic cleaning apparatus filtration cycle mechanism
JP2009233565A (en) Cylindrical filtration element and filtration apparatus or stock solution filtration apparatus
JP2901705B2 (en) Semiconductor substrate cleaning method
JPS60139379A (en) Method and device for washing article
JPH08155208A (en) Oil film removing device
CN114558837B (en) LCD Panel cleaning method and cleaning equipment
JP2005305097A (en) Dish washing method and dish washing system embodying its method
JPH10249291A (en) Washing apparatus
KR930007613B1 (en) Cleaning device
JPH11176793A (en) Cleaning system
JP2005177567A (en) Method and apparatus for washing
JP2017136538A (en) Ion exchange device
JP3408646B2 (en) Dry cleaner filter regeneration method, dry cleaner and dry cleaning method
JPH0337755Y2 (en)