JPH09507428A - ガス注入と電気放電を用いた液体汚染物除去装置 - Google Patents
ガス注入と電気放電を用いた液体汚染物除去装置Info
- Publication number
- JPH09507428A JPH09507428A JP7518692A JP51869295A JPH09507428A JP H09507428 A JPH09507428 A JP H09507428A JP 7518692 A JP7518692 A JP 7518692A JP 51869295 A JP51869295 A JP 51869295A JP H09507428 A JPH09507428 A JP H09507428A
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- assembly
- anode
- cathode
- arc
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/4608—Treatment of water, waste water, or sewage by electrochemical methods using electrical discharges
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
- C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/34—Treatment of water, waste water, or sewage with mechanical oscillations
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F11/00—Treatment of sludge; Devices therefor
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/46—Apparatus for electrochemical processes
- C02F2201/461—Electrolysis apparatus
- C02F2201/46105—Details relating to the electrolytic devices
- C02F2201/4612—Controlling or monitoring
- C02F2201/4615—Time
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/46—Apparatus for electrochemical processes
- C02F2201/461—Electrolysis apparatus
- C02F2201/46105—Details relating to the electrolytic devices
- C02F2201/4616—Power supply
- C02F2201/46175—Electrical pulses
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2303/00—Specific treatment goals
- C02F2303/04—Disinfection
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2305/00—Use of specific compounds during water treatment
- C02F2305/02—Specific form of oxidant
- C02F2305/023—Reactive oxygen species, singlet oxygen, OH radical
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Water Supply & Treatment (AREA)
- General Health & Medical Sciences (AREA)
- Electrochemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Toxicology (AREA)
- Water Treatment By Electricity Or Magnetism (AREA)
- Physical Water Treatments (AREA)
- Apparatus For Disinfection Or Sterilisation (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Gas Separation By Absorption (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
- Electrostatic Separation (AREA)
- Excavating Of Shafts Or Tunnels (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.a. 少なくとも一つの汚染物除去モジュール(module)、 b. 汚染物除去すべき液体を保持するための、前記モジュールに一体化され た室手段(室部材:chamber means)、 c. アノード電極部材を有する少なくとも一つのアノード組立体及びカソー ド電極部材を有する少なくとも一つのカソード組立体で、前記アノード電極部材 と前記カソード電極部材が前記室手段内に向かい合って配置され、それらの間に アーク放電領域を定めている、組立体、 b. 前記室手段を通って液体の流れをアーク放電領域近辺へ送るための液体 流動手段(部材)、 c. アーク放電領域内の液体中にガスを注入するためのガス注入器手段(部 材)、及び d. 前記アノード電極部材と前記カソード電極部材との間に一連の電気アー クを発生させるためのパルス発生機、 を具えた液体汚染物除去装置(システム)。 2.ガス注入器部材が、アノード組立体に対し一体化されたガス噴射器からな る、請求項1に記載の装置。 3.室手段内に液体を再循環するための液体再循環手段(部材)を更に有する 、請求項2に記載の装置。 4.室手段に入る前の液体中に、イオン及び遊離ラジカル促進性(enhancing) 化合物を注入する手段を更に有する、請求項2に記載の装置。 5.液体が室手段を出た後、酸化剤の液体中への分布を促進するための酸化器 手段(部材)を更に有する、請求項2に記載の装置。 6.ガス噴射器が、前記の室の外側からアノード電極部材を長手方向(longitu dinally)に通過して伸び、アーク放電領域中へ開いているガス孔を有する、請求 項2に記載の装置。 7.アノード電極組立体が、アノード電極部材を取り巻いて配置された絶縁体 を更に有し、前記アノード電極部材が伝導性管及び第二金属から作られたリップ 部分を有し、前記リップ部分がアーク放電領域に近い前記管内に挿入され、カソ ード電極部材の基底端(proximal end)を定める、請求項6に記載の装置。 8.カソード組立体がカソード電極部材の回りに配置された絶縁体を有し、前 記カソード電極部材が、第二金属から作られた基底端を有する金属管からなり、 前記基底端がアーク放電領域に近接している、請求項7に記載の装置。 9.カソード電極部材の基底端が、室手段内部から前記カソード電極部材を通 る液体流動排出通路を形成している金属管中への開口を定めている、請求項8に 記載の装置。 10.カソード絶縁体及びアノード絶縁体が、夫々アーク放電領域の方へ内側 へ細くなっていく円錐状基底部を有する、請求項9に記載の装置。 11.カソード絶縁体及びアノード絶縁体が、夫々フランジ部分を有し、室手 段が側壁、前記室の前記側壁に取付けられた上方板及び下方板を有し、モジュー ルが、前記カソード絶縁体の前記フランジ部分を前記上方板に留めるための複数 のクランプ手段(部材)、及び前記アノード絶縁体の前記フランジ部分を前記下 方板へ止めるための前記の複数のクランプ手段を更に有する、請求項10に記載 の装置。 12.室手段が、その室の内部に流れの向きを定める複数のバッフルを有する 、請求項10に記載の装置。 13.a. 前処理タンク、 b. 貯蔵タンク、 c. 前記貯蔵タンクから前記前処理タンクへイオン及び遊離ラジカル 促進化合物をおくるための手段、 d. 未処理水を前記前処理タンクへ送るための手段、 e. 汚染物除去室で、その室内に配置されたアノード及びカソードを 有し、前記室内の前記アノードと前記カソードとの間にアーク放電領域を定めて いる汚染物除去室、 f. 前記アーク放電領域内の前記アノードと前記カソードとの間に一 連のアークを発生させるためのパルス発生機、 g. 前記放電領域内の前記室中にガスを注入するための手段、 h. 酸化器塔で、その塔を通過する水に酸化剤を分布(distribute)す る手段を含む酸化器塔、 i. 前記前処理タンクから前記汚染物除去室へ水を送るための手段、 j. 前記汚染物除去室から前記オゾン塔へ水を送るための手段、 k. 後処理保持タンク、 l. 前記オゾン塔から前記後処理保持タンクヘ水を送るための手段、 及び m. 処理した水を前記後処理保持タンクから排出するための手段、 を具えた低流量バッチ式水処理装置(システム:system)。 14.汚染物除去室内に水を再循環させる手段を更に有する、請求項13に記 載の水処理装置。 15.過酸化水素タンク、前処理タンク、汚染物除去室、オゾン塔、及び後処 理保持タンクを出入りする水の動きを制御するための制御手段を更に有する、請 求項14に記載の水処理装置。 16.a. 第一処理室を有する処理モジュール、 b. 前記第一室内に、向かい合った位置に取付けられた第一アノード 組立体及び第一カソード組立体で、前記第一アノード組立体と前記第二カソード 組立体との間に第一アーク放電領域を定める、組立体、 c. 前記第一室へ未処理スラッジを送るための手段、 d. 第一アーク放電領域へガスを注入するための第一ガス注入手段を 有する、前記第一室中へガスを送るための手段、 e. 前記モジュールから処理済みスラッジを取り出す手段、及び f. 前記第一アノード組立体及び前記第一カソード組立体に一連のア ーク生成パルスを発生させるための第一固体スイッチ部材で、前記パルスがスラ ッジ内にアークを発生するのに充分な電圧及び電流を有する、第一固体スイッチ 部材、 を具えたスラッジ処理装置(システム)。 17.a. 第一室内に配置された第二アノード組立体及び第二カソード組立 体で、前記第二アノード組立体と前記第二カソード組立体との間に第二アーク放 電領域を定める、組立体、 b. 前記第一室内の前記第二アーク放電領域内にガスを注入するため の第二ガス注入手段、及び c. 前記第二アノード組立体及び前記第二カソード組立体に一連のア ーク生成パルスを発生させるための第二固体スイッチ手段(部材)で、前記パル スがスラッジ内にアークを発生するのに充分な電圧及び電流を有する、第二固体 スイッチ手段、 を更に有する請求項16に記載のスラッジ処理装置。 18.a. 第二処理室を有する第二処理モジュール、 b. 前記第二室内に、向かい合った位置に取付けた第三及び第四アノ ード組立体及び第三及び第四カソード組立体で、前記第三アノード組立体と前記 第三カソード組立体との間、及び前記第四アノード組立体と前記第四カソード組 立体との間に、夫々第三及び第四アーク放電領域を定める、組立体、 c. 前記第二室内の夫々第三及び第四アーク放電領域内にガスを注入 するための第三及び第四ガス注入手段、及び d. 前記第三及び第四アノード組立体及び前記第三及び第四カソード 組立体に、夫々一連のアーク生成パルスを発生させるための、第三及び第四固体 スイッチ手段(部材)で、前記パルスがスラッジ内にアークを発生するのに充分 な電圧及び電流を有する、固体スイッチ手段、 を更に有する請求項17に記載のスラッジ処理装置。 19.第一モジュール及び第二モジュールが、操作上直列に接続されている、 請求項18に記載のスラッジ処理装置。 20.第一モジュール及び第二モジュールが、操作上並列に接続されている、 請求項18に記載のスラッジ処理装置。 21.アーク放電領域内のアノード組立体とカソード組立体との間に蓄積した 岩石屑(debris)を除去する手段を更に有する、請求項19に記載のスラッジ処理 装置。 22.固体スイッチ手段の各々を制御する制御手段、及びアーク放電領域内の 岩石屑を除去する該手段を更に有する、請求項21に記載のスラッジ処理装置。 23.制御装置が、各々の室内にアーク領域が存在するか否かを検出し、アー クが存在しないことが検出された時、装置を停止するための故障検出手段を有す る、請求項22に記載のスラッジ処理装置。 24.制御装置が、各室に送られるガスの圧力を調節し、前記室内のスラッジ の圧力より高い予め定められた圧力水準を維持する手段を更に有する、請求項2 3に記載のスラッジ処理装置。 25.ガス注入手段が、室の外側から室の中へ通ずる内部孔を有するアノード 電極を有する、請求項16に記載のスラッジ処理装置。 26.カソード組立体が、室の内側から室の外側へ通ずる内部孔を有するカソ ード電極部材を有する、請求項25に記載のスラッジ処理装置。 27.室が、その室内に発生するパルスの周波数に近い音響共鳴を起こす大き さを持つ、請求項16に記載のスラッジ処理装置。 28.a. 精製すべき液体を第一室に送り、 b. 第一室の第一の一対の電極間に気泡を導入し、そして c. 第一モジュール内の電極間に一連のパルス状電気放電アークを発 生し、然も、前記パルス中、液体内にアークを維持し、前記液体内に一連のパル ス状機械的衝撃波を生じるのに充分なエネルギー水準で前記アークを発生させる 、諸工程からなる液体精製法。 29.第二の一対の電極間の第一室に気泡を導入し、第一室内の第二の一対の 電極間に一連のパルス状電気放電アークを発生し、然も、前記パルス中、液体内 にアークを維持し、前記液体内に一連のパルス状機械的衝撃波を生じるのに充分 なエネルギー水準で前記アークを発生させる、諸工程を更に有する、請求項28 に記載の方法。 30.イオン及び遊離ラジカル促進化合物を、室へ入る前の液体に注入する工 程を更に有する、請求項29に記載の方法。 31.室を出た後の液体中の酸化剤の分布を促進する工程を更に有する、請求 項30に記載の方法。
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US08/180,961 US5464513A (en) | 1994-01-11 | 1994-01-11 | Method and apparatus for water decontamination using electrical discharge |
US08/370,447 US5630915A (en) | 1994-01-11 | 1995-01-09 | Liquid decontamination system using electrical discharge with gas injection |
US08/370,447 | 1995-01-09 | ||
PCT/US1995/000399 WO1995018768A1 (en) | 1994-01-11 | 1995-01-11 | Liquid decontamination system using electrical discharge with gas injection |
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Also Published As
Publication number | Publication date |
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JP3983282B2 (ja) | 2007-09-26 |
DE69516666D1 (de) | 2000-06-08 |
GR3033835T3 (en) | 2000-10-31 |
DE69516666T2 (de) | 2001-01-11 |
US5464513A (en) | 1995-11-07 |
CN1119290C (zh) | 2003-08-27 |
ATE192416T1 (de) | 2000-05-15 |
CA2178963C (en) | 2008-12-30 |
DK0739311T3 (da) | 2000-09-11 |
ES2147284T3 (es) | 2000-09-01 |
CA2126935C (en) | 2000-10-31 |
WO1995018768A1 (en) | 1995-07-13 |
CN1138316A (zh) | 1996-12-18 |
EP0739311A1 (en) | 1996-10-30 |
EP0739311A4 (en) | 1997-03-19 |
CA2126935A1 (en) | 1995-07-12 |
US5630915A (en) | 1997-05-20 |
EP0739311B1 (en) | 2000-05-03 |
CA2178963A1 (en) | 1995-07-13 |
BR9506486A (pt) | 1997-10-07 |
PT739311E (pt) | 2000-10-31 |
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