JPH09269604A - Coating device for electrophotographic photoreceptor - Google Patents
Coating device for electrophotographic photoreceptorInfo
- Publication number
- JPH09269604A JPH09269604A JP7861996A JP7861996A JPH09269604A JP H09269604 A JPH09269604 A JP H09269604A JP 7861996 A JP7861996 A JP 7861996A JP 7861996 A JP7861996 A JP 7861996A JP H09269604 A JPH09269604 A JP H09269604A
- Authority
- JP
- Japan
- Prior art keywords
- coating
- tank
- cylindrical substrate
- storage tank
- pipe
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Photoreceptors In Electrophotography (AREA)
- Coating Apparatus (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】この発明は、電子写真用感光
体の感光層を浸漬塗布法により形成する塗布装置に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a coating apparatus for forming a photosensitive layer of an electrophotographic photoreceptor by a dip coating method.
【０００２】[0002]
【従来の技術】電子写真の技術は複写機の分野で発展を
遂げ、最近ではレーザープリンターなどの印刷装置の分
野にも応用され、高画質，高速，静粛性を誇り急速に広
まっている。これらの装置に用いられる感光体はアルミ
ニウムなどの円筒状基体の外表面に感光層を設けて形成
される。感光体の製造方法としては、薄くて均一に成膜
できる浸漬塗布法が簡便な方法として広く採用されてい
る。2. Description of the Related Art Electrophotographic technology has been developed in the field of copying machines, and has recently been applied to the field of printing devices such as laser printers, and has rapidly spread due to its high image quality, high speed, and quietness. The photoreceptor used in these devices is formed by providing a photosensitive layer on the outer surface of a cylindrical substrate such as aluminum. As a method of manufacturing a photoreceptor, a dip coating method, which allows thin and uniform film formation, is widely adopted as a simple method.
【０００３】浸漬塗布法では、光導電材料をバインダー
樹脂とともに有機溶剤に溶解または分散させ場合によっ
てはさらに粘着剤，可塑剤などを添加して所定の塗布液
を作成し、この塗布液を充填した塗布槽の中に円筒状基
体の円筒軸がほぼ鉛直を保つ状態でその内側に塗布液が
浸入しないようにした円筒状基体を所定の速さで浸漬
し、次いで円筒状基体を別の所定の速さで引き上げてそ
の表面に付着している塗布液を乾燥させるという一連の
成膜工程を成膜順に逐次繰り返すことによって感光体を
完成する。In the dip coating method, a photoconductive material is dissolved or dispersed in an organic solvent together with a binder resin, and a pressure sensitive adhesive, a plasticizer or the like is further added to prepare a predetermined coating solution, and the coating solution is filled. In the coating tank, the cylindrical substrate is kept at a substantially vertical axis so that the coating liquid does not infiltrate into the cylindrical substrate at a predetermined speed, and then the cylindrical substrate is covered with another predetermined substrate. The photosensitive member is completed by sequentially repeating a series of film forming steps of pulling up at a speed and drying the coating liquid adhering to the surface thereof in the film forming order.
【０００４】図９は電子写真用感光体の塗布装置の従来
の技術による一例の構成図である。以下図９について説
明する。従来の技術によれば、その構成は円筒状基体８
の外表面に感光層塗膜を形成するための塗布液７が満た
された塗布槽１と、塗布槽１の上部に周設されている樋
９および回収配管４を介して塗布槽１の上縁部から溢れ
た塗布液７を収容する貯留槽２と、圧送ポンプ６を介し
て貯留槽２の下部と塗布槽１の下部とを連結する供給配
管５と、上端開口部を密閉された円筒状基体８を塗布槽
１の中へ浸漬する昇降機構３とからなり、塗布槽１の上
縁部から溢れ出た塗布液７は貯留槽２に収容され圧送ポ
ンプ６の駆動により常時塗布槽１の下部へ供給されて還
流して循環している状態において、昇降機構３の可動部
を矢印Ｐの方向に所定の速さで下降させて円筒状基体８
を塗布槽１の中へ浸漬する時は、円筒状基体８の浸漬容
積相当の塗布液量が塗布槽１の上縁部から溢れ出て貯留
槽２に収容され、その後昇降機構３の可動部を矢印Ｑの
方向に別の所定の速さで上昇させて円筒状基体８を塗布
槽１の中から引き上げる時は、円筒状基体８の引き上げ
容積相当の塗布液量が塗布槽１の中で不足し、この不足
量を圧送ポンプ６の駆動により貯留槽２から即時に補充
して塗布液７が塗布槽１の上縁部から常時溢れ出ている
状態を保つように循環流量を調整して安定した塗膜の形
成が維持されていた。FIG. 9 is a block diagram of an example of a conventional coating device for an electrophotographic photosensitive member. Hereinafter, FIG. 9 will be described. According to the conventional technique, the structure is a cylindrical substrate 8
The coating tank 1 filled with the coating liquid 7 for forming the photosensitive layer coating film on the outer surface of the coating tank 1, and the gutter 9 and the recovery pipe 4 that are provided around the coating tank 1 and are provided on the coating tank 1. A storage tank 2 for containing the coating liquid 7 overflowing from the edge portion, a supply pipe 5 for connecting the lower portion of the storage tank 2 and the lower portion of the coating tank 1 via a pressure feed pump 6, and a cylinder whose upper end opening is sealed. The coating liquid 7 overflowing from the upper edge of the coating tank 1 is contained in the storage tank 2 and is constantly driven by the pressure pump 6 when the coating liquid 7 overflows from the upper edge of the coating tank 1. In the state in which the cylindrical base 8 is supplied to the lower portion of the cylindrical body 8 and is circulated by being circulated, the movable portion of the lifting mechanism 3 is lowered at a predetermined speed in the direction of arrow P.
When dipping into the coating tank 1, a coating liquid amount equivalent to the dipping volume of the cylindrical substrate 8 overflows from the upper edge of the coating tank 1 and is stored in the storage tank 2, and then the movable part of the lifting mechanism 3 is moved. When the cylindrical substrate 8 is pulled up from the coating tank 1 by raising at a different predetermined speed in the direction of the arrow Q, a coating liquid amount corresponding to the lifted volume of the cylindrical substrate 8 is set in the coating tank 1. The deficiency is deficient, and the deficient amount is immediately replenished from the storage tank 2 by driving the pressure pump 6 to adjust the circulation flow rate so that the coating liquid 7 always overflows from the upper edge of the coating tub 1. The formation of a stable coating film was maintained.
【０００５】[0005]
【発明が解決しようとする課題】従来の塗布装置におい
ては、塗布槽の上縁部からの溢出塗布液が樋に流出して
から貯留槽へ収容されるまでの間に、塗布液の中に空気
が混入して微細な気泡を生成することがあるとともに、
塗布槽の容積に対して比較的大きな円筒状基体を塗布処
理する際には貯留槽へ流入する塗布液量が多くなるため
貯留槽の中の貯留液面の上昇幅が大きくなり塗布液の循
環流量に脈流を生じることがあった。In the conventional coating apparatus, the overflow of the coating solution from the upper edge of the coating tank is caused to occur in the coating solution between the time when the coating solution flows into the gutter and the time when the coating solution is stored in the storage tank. Air may mix in and generate fine air bubbles,
When coating a relatively large cylindrical substrate with respect to the volume of the coating tank, the amount of coating liquid flowing into the storage tank increases, so the level of rise of the stored liquid level in the storage tank increases and the coating liquid circulates. There was a case where the flow rate was pulsating.
【０００６】また従来の塗布装置においては、円筒状基
体が塗布槽から引き上げられる際に塗布槽上の空間に充
満している塗布液の溶剤蒸気が円筒状基体の外表面に付
着するため塗膜が局部的に流失して欠落を生じることが
あった。さらに従来の塗布装置においては、円筒状基体
の浸漬・引き上げ過程で密閉機構により上端開口部を密
閉された円筒状基体の中空部内に閉じ込められた空気圧
の変化によって密閉機構に緩みを生じて塗布液が浸入し
たり中空部内で空気の破裂が発生することがあった。Further, in the conventional coating apparatus, when the cylindrical substrate is pulled up from the coating tank, the solvent vapor of the coating liquid filling the space above the coating tank adheres to the outer surface of the cylindrical substrate, so that the coating film is formed. Could be washed away locally, resulting in omissions. Further, in the conventional coating apparatus, during the dipping / pulling process of the cylindrical substrate, the sealing mechanism loosens due to a change in the air pressure trapped in the hollow portion of the cylindrical substrate whose upper end opening is sealed by the sealing mechanism. There was a case that the air penetrated and air burst occurred in the hollow part.
【０００７】上記のいずれの状況にあっても、円筒状基
体の外表面に形成する塗膜に成膜ムラが発生して感光体
として良好な塗膜が得られにくく、その結果感光体の電
気特性上のばらつきとなって現れ、電子写真装置にこの
感光体を用いると画像濃度ムラなどを引き起こす原因に
なるという問題があった。この発明は前記の問題点に鑑
みてなされたものであり、その目的は画像濃度ムラの原
因となる塗布ムラをなくした均一な膜厚を有する感光層
塗膜が形成できる電子写真用感光体の塗布装置を提供す
ることにある。In any of the above situations, the coating film formed on the outer surface of the cylindrical substrate is uneven in film formation, and it is difficult to obtain a good coating film as a photoconductor. There is a problem that it appears as a variation in characteristics, and when this photoconductor is used in an electrophotographic apparatus, it causes unevenness in image density. The present invention has been made in view of the above problems, and an object thereof is to provide an electrophotographic photoreceptor capable of forming a photosensitive layer coating film having a uniform film thickness that eliminates coating unevenness that causes image density unevenness. It is to provide a coating device.
【０００８】[0008]
【課題を解決するための手段】この発明によれば前述の
目的は、浸漬塗布法により円筒状基体の外表面に感光層
塗膜を形成するための塗布液を有する塗布槽と、この塗
布槽から溢れた塗布液を回収して塗布槽へ再供給するた
めの回収配管，貯留槽，供給配管からなる塗布液循環機
構と、塗布槽の中へ円筒状基体を浸漬する昇降機構とを
備えた塗布装置において、気泡を除去するために塗布液
循環機構の中に略鉛直をなす脱気管，ガイド，バリヤを
組み合わせてなる脱気機構を配設する、あるいは塗布液
の循環流量が脈流することを抑制するために円筒状基体
の最大浸漬容積に相当する溢出塗布液を収容した時の貯
留液面の上昇幅が１０ｃｍ以内になる容量を有する貯留
槽を備える、あるいはまた円筒状基体の外表面に形成す
る塗膜の局部的な欠落を防止するために塗布槽の上縁部
よりも低い位置に上縁部を有する樋を塗布槽の上部に周
設する、あるいはまた密閉機構の緩みおよび円筒状基体
の中空部内での空気の破裂を回避するために円筒状基体
の上端に昇降機構に連結された第一の密閉機構を設けて
この密閉機構を介して円筒状基体の内部気圧を検知して
適宜な給排気を行い得る内圧制御機構を設ける、あるい
はまた浸漬の際に円筒状基体の上部に未塗布部分を残し
中空部内が常時大気圧下にあるようにするために円筒状
基体の下端に昇降機構に連結された第二の密閉機構を設
けることにより達成される。According to the present invention, the above object is to provide a coating tank having a coating solution for forming a photosensitive layer coating film on the outer surface of a cylindrical substrate by a dip coating method, and the coating tank. A coating liquid circulating mechanism including a recovery pipe for collecting the coating liquid overflowing from the tank and re-supplying it to the coating tank, a storage tank, and a supply pipe, and an elevating mechanism for immersing the cylindrical substrate in the coating tank were provided. In the coating device, a degassing mechanism consisting of a combination of a substantially vertical degassing pipe, a guide, and a barrier is provided in the coating liquid circulating mechanism for removing bubbles, or the circulating flow rate of the coating liquid is pulsating. In order to suppress the above, a storage tank having a capacity such that the rising width of the stored liquid level when the overflow coating liquid corresponding to the maximum immersion volume of the cylindrical base is stored is 10 cm or less, or the outer surface of the cylindrical base is provided. Local coating film to be formed on A gutter having an upper edge at a position lower than the upper edge of the coating tank is provided around the upper part of the coating tank in order to prevent dropping, or loosening of the sealing mechanism and air flow in the hollow portion of the cylindrical substrate. In order to avoid rupture, a first sealing mechanism connected to the elevating mechanism is provided at the upper end of the cylindrical substrate, and the internal pressure that can detect the internal pressure of the cylindrical substrate through this sealing mechanism and perform appropriate air supply / exhaust. A control mechanism is provided, or at the time of immersion, a second part connected to an elevating mechanism at the lower end of the cylindrical substrate to leave an uncoated part on the upper part of the cylindrical substrate and keep the inside of the hollow part always under atmospheric pressure. It is achieved by providing a sealing mechanism of.
【０００９】[0009]
【発明の実施の形態】以下、図１〜図８に基づいてこの
発明の実施の形態を説明する。 （実施の形態１）図１はこの発明による実施の形態１の
構成図である。図１において、塗布装置は円筒状基体８
の外表面に感光層塗膜を形成するための塗布液７が満た
された塗布槽１と、塗布槽１の上部に周設されている樋
９と、樋９から回収配管４を介して連結されている略鉛
直をなす脱気管１１からなる脱気機構と、この脱気機構
に連接する貯留槽２と、圧送ポンプ６を介して貯留槽２
の下部と塗布槽１の下部とを連結する供給配管５と、円
筒状基体８を塗布槽１の中へ浸漬する昇降機構３とから
構成されている。回収配管４と脱気管１１との連結口は
樋９の底部よりも低くかつ貯留槽２の最高貯留液面より
も高い位置にあるとともに、貯留槽２と脱気管１１との
連結口は貯留槽２の最低貯留液面よりも低い位置にあ
る。BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to FIGS. (Embodiment 1) FIG. 1 is a block diagram of Embodiment 1 according to the present invention. In FIG. 1, the coating device is a cylindrical substrate 8
The coating tank 1 filled with the coating liquid 7 for forming the photosensitive layer coating on the outer surface of the tank, the gutter 9 provided around the coating tank 1 and the gutter 9 are connected via the recovery pipe 4. The deaeration mechanism including the substantially vertical deaeration pipe 11, the storage tank 2 connected to the deaeration mechanism, and the storage tank 2 via the pressure pump 6.
And a lowering mechanism 3 for immersing the cylindrical substrate 8 in the coating tank 1. The connection port between the recovery pipe 4 and the degassing pipe 11 is lower than the bottom of the gutter 9 and higher than the highest liquid level of the storage tank 2, and the connection port between the storage tank 2 and the degassing pipe 11 is the storage tank. It is at a position lower than the lowest stored liquid level of 2.
【００１０】上述の構成において、昇降機構３の可動部
を矢印Ｐの方向に所定の速さで下降させて円筒状基体８
を塗布槽１の中へ浸漬する時、円筒状基体８の浸漬容積
相当の塗布液量が塗布槽１の上縁部から溢れ出る過程で
塗布液の中に空気が混入して微細な気泡を生成し、この
塗布液が樋９および回収配管４を通って脱気管１１へ流
入すると略鉛直をなす脱気管１１の中で気泡が浮上する
ので、脱気管１１の下部の連結口から貯留槽２へ気泡を
除去された塗布液が流入して収容される。In the above structure, the movable portion of the lifting mechanism 3 is lowered in the direction of arrow P at a predetermined speed to move the cylindrical substrate 8
When dipped in the coating tank 1, air is mixed into the coating solution in the process of the amount of the coating solution equivalent to the immersion volume of the cylindrical substrate 8 overflowing from the upper edge of the coating tank 1 to form fine bubbles. When this coating liquid is generated and flows into the degassing pipe 11 through the gutter 9 and the recovery pipe 4, bubbles float in the degassing pipe 11 that is substantially vertical, so that the storage tank 2 is discharged from the connection port at the bottom of the degassing pipe 11. The coating liquid from which bubbles have been removed flows in and is stored.
【００１１】また、この発明において、脱気管１１の中
に気泡を捕捉するためのバリヤ１０を装填することによ
り脱気効果を向上させることができる。図３は図１にお
ける円表示部Ｋに内装されているバリヤ１０の詳細形状
例を示す脱気管の斜断面の斜視図であり、同図（ａ）は
Ｗ形バリヤ１０ａ，同図（ｂ）は螺旋バリヤ１０ｂ，同
図（ｃ）はコ形バリヤ１０ｃのそれぞれの内装状態を示
している。 （実施例１，２および比較例１）内径１００ｍｍ，深さ
３００ｍｍの塗布槽と、上縁から２２０ｍｍの位置に直
径２５ｍｍの流入口が設けられた内径１００ｍｍ，深さ
２５０ｍｍの貯留槽と、内径２５ｍｍ，長さ２２０ｍｍ
の脱気管とを使用し、外径６０ｍｍ，長さ２５０ｍｍの
円筒状基体を用意してこの円筒状基体の浸漬および引き
上げの速さを通常の約３倍に速めて塗布処理を行った。
実施例１は脱気機構として脱気管のみを具備した場合で
あり、実施例２は脱気機構としてＷ形バリヤを脱気管に
内装した場合である。また比較例１は脱気機構を具備し
ない従来例において塗布槽および貯留槽の大きさが実施
例１，２と同じであり、用意した円筒状基体ならびに塗
布処理の条件も実施例１，２と同じ場合である。Further, in the present invention, the degassing effect can be improved by loading the barrier 10 for trapping bubbles in the degassing pipe 11. FIG. 3 is a perspective view of an oblique cross section of a degassing pipe showing a detailed shape example of the barrier 10 installed in the circle display portion K in FIG. 1, and FIG. 3A is a W-shaped barrier 10a and FIG. Shows the interior state of the spiral barrier 10b, and FIG. 7C shows the interior state of the U-shaped barrier 10c. (Examples 1 and 2 and Comparative Example 1) A coating tank having an inner diameter of 100 mm and a depth of 300 mm, a storage tank having an inner diameter of 100 mm and a depth of 250 mm provided with an inlet having a diameter of 25 mm at a position 220 mm from the upper edge, and an inner diameter. 25mm, length 220mm
A cylindrical substrate having an outer diameter of 60 mm and a length of 250 mm was prepared by using the deaeration pipe of No. 1, and the coating process was performed by accelerating the dipping and pulling-up speed of the cylindrical substrate to about 3 times the normal rate.
Example 1 is a case where only a degassing pipe is provided as a degassing mechanism, and Example 2 is a case where a W-shaped barrier is built in the degassing pipe as a degassing mechanism. Further, in Comparative Example 1, the size of the coating tank and the storage tank in the conventional example having no degassing mechanism is the same as in Examples 1 and 2, and the prepared cylindrical substrate and the coating treatment conditions are also those of Examples 1 and 2. It is the same case.
【００１２】上述のようにして塗布処理した実施例１，
２の感光体について外観の状態を比較例１と比べて観察
した。その結果の気泡起因欠陥による不良率を表１に示
す。Example 1, which was coated as described above
The appearance state of the photoconductor of No. 2 was observed as compared with that of Comparative Example 1. Table 1 shows the resulting defective rates due to defects caused by bubbles.
【００１３】[0013]
【表１】 実施例１，２は比較例１に比べて不良率が減少し、特にバリヤを内装したこと により不良率が大幅に減少したことがわかる。 （実施の形態２）図２はこの発明による実施の形態２の
構成図である。図２において、塗布装置は実施の形態１
による構成（図１）に加えて脱気機構の構成要素として
貯留槽２の中にガイド１２が配設された構成となってい
る。この構成において、実施の形態１により脱気された
塗布液が脱気管１１と貯留槽２との連結口を流入口とし
て貯留槽２の中へ流入すると、ガイド１２により貯留槽
２の中の塗布液の流れの方向を適宜に誘導することによ
り脱気効果の向上をはかるものとする。[Table 1] It can be seen that in Examples 1 and 2, the defective rate was reduced as compared with Comparative Example 1, and in particular, the defective rate was significantly reduced by incorporating the barrier. (Second Embodiment) FIG. 2 is a configuration diagram of a second embodiment according to the present invention. In FIG. 2, the coating device is the first embodiment.
In addition to the above configuration (FIG. 1), a guide 12 is arranged in the storage tank 2 as a component of the degassing mechanism. In this configuration, when the coating liquid degassed according to the first embodiment flows into the storage tank 2 with the connection port between the degassing pipe 11 and the storage tank 2 as the inflow port, the coating in the storage tank 2 is performed by the guide 12. The degassing effect should be improved by appropriately guiding the flow direction of the liquid.
【００１４】図４は図２におけるガイド１２の詳細形状
例を示す貯留槽の縦断面の斜視図で、同図（ａ）は丸味
をもってほぼ直角に曲げた管の一端が貯留槽２の流入口
に連結され反対端が最低貯留液面よりも低い位置にある
管ガイド１２ａ，同図（ｂ）は丸味をもってほぼ直角に
曲げた板の一端が貯留槽２の流入口の下部に固定され反
対端が最低貯留液面よりも低い位置にある板ガイド１２
ｂ，同図（ｃ）は貯留槽２の流入口の内側部および供給
配管５の連結口の上部を覆う板からなる覆板ガイド１２
ｃ，同図（ｄ）は貯留槽２の底から最低貯留液面を超え
ない高さに立設する円筒の外壁に貯留槽２の内壁と接す
る螺旋状の板が取り付けられてなる螺旋ガイド１２ｄの
それぞれの内装状態図である。管ガイド１２ａおよび板
ガイド１２ｂを用いると流入口から流入した塗布液が上
方へ誘導される過程で脱気され、覆板ガイド１２ｃおよ
び螺旋ガイド１２ｄを用いると流入口から流入した塗布
液が供給配管５の連結口へ到るまでの回流経路を誘導さ
れる過程で脱気される。 （実施例３および比較例１）実施例３は図４（ａ）にお
いて流入口から３０ｍｍ内側で高さ８０ｍｍの鉛直部分
を有する内径２５ｍｍの管ガイド１２ａをガイドとして
貯留槽の中に配設したことのほかは前述の実施例１と同
じ構成であるとともに、用意した円筒状基体ならびに塗
布処理の条件も実施例１と同じである。FIG. 4 is a perspective view of a vertical cross section of the storage tank showing an example of the detailed shape of the guide 12 in FIG. Is connected to the pipe guide 12a at a position where the opposite end is lower than the minimum stored liquid surface, and FIG. 9 (b) shows that one end of a plate bent at a substantially right angle with roundness is fixed to the lower part of the inlet of the storage tank 2 and the opposite end. The plate guide 12 at a position lower than the minimum liquid level
2B and FIG. 2C are cover plate guides 12 that are plates that cover the inside of the inflow port of the storage tank 2 and the upper part of the connection port of the supply pipe 5.
c, the same figure (d) is a spiral guide 12d in which a spiral plate in contact with the inner wall of the storage tank 2 is attached to the outer wall of a cylinder standing upright from the bottom of the storage tank 2 to a height not exceeding the minimum stored liquid level. FIG. 3 is a diagram showing the interior state of each of the above. When the pipe guide 12a and the plate guide 12b are used, the coating liquid flowing from the inlet is deaerated in the process of being guided upward, and when the cover plate guide 12c and the spiral guide 12d are used, the coating liquid flowing from the inlet is supplied to the supply pipe. It is degassed in the process of guiding the circulation path up to the connection port of No. 5. (Example 3 and Comparative Example 1) In Example 3, in FIG. 4 (a), a pipe guide 12a having an inner diameter of 25 mm and having a vertical portion of 30 mm inside from the inlet and a height of 80 mm was arranged in the reservoir as a guide. Except for the above, the configuration is the same as that of the first embodiment described above, and the prepared cylindrical substrate and the conditions of the coating treatment are also the same as those of the first embodiment.
【００１５】上述のようにして塗布処理した実施例３の
感光体について外観の状態を実施の形態１における比較
例１と比べて観察した。その結果の気泡起因欠陥による
不良率を表２に示す。The appearance of the photoreceptor of Example 3 which was coated as described above was observed in comparison with Comparative Example 1 of Embodiment 1. Table 2 shows the resulting defective rates due to defects caused by bubbles.
【００１６】[0016]
【表２】 実施例３は比較例１に比べて不良率が１／４に減少したことがわかる。 （実施の形態３）図５はこの発明による実施の形態３に
おける貯留槽の説明図である。図５において、最低貯留
液面は円筒状基体を塗布槽に浸漬する直前の貯留槽の貯
留液面とし、最高貯留液面は円筒状基体を塗布槽に浸漬
してその最大浸漬容積相当量の溢出塗布液を収容したと
きの貯留槽の貯留液面とし、最高貯留液面と最低貯留液
面との落差を貯留液面の上昇幅ｈとするとき、ｈが１０
ｃｍ以内になるように貯留槽２の容量を設定するもので
ある。[Table 2] It can be seen that the defect rate of Example 3 is reduced to 1/4 of that of Comparative Example 1. (Third Embodiment) FIG. 5 is an explanatory view of a storage tank according to a third embodiment of the present invention. In FIG. 5, the minimum stored liquid surface is the stored liquid surface of the storage tank immediately before the cylindrical substrate is immersed in the coating tank, and the maximum stored liquid surface is the cylindrical substrate is immersed in the coating tank and the maximum immersion volume is When the stored liquid level of the storage tank when the overflow coating liquid is stored and the difference between the maximum stored liquid level and the minimum stored liquid level is the rising width h of the stored liquid level, h is 10
The capacity of the storage tank 2 is set to be within cm.
【００１７】すなわち、円筒状基体の最大浸漬容積Ｖ
（ｃｃ）による溢出塗布液を収容する貯留槽が必要とす
る最小横断面積Ｓ（ｃｍ2 ）はＳ＝Ｖ／ｈであるから、
例えば円筒状の貯留槽においてｈ＝１０とした時の最小
内径Ｄ（ｃｍ）は、That is, the maximum immersion volume V of the cylindrical substrate
Since the minimum cross-sectional area S (cm 2 ) required by the storage tank for storing the overflow coating solution according to (cc) is S = V / h,
For example, in a cylindrical storage tank, the minimum inner diameter D (cm) when h = 10 is
【００１８】[0018]
【数１】Ｄ＝（４Ｓ／π）1/2 ＝（４Ｖ／１０π）1/2
＝０．３６（Ｖ）1/2 の計算式により算定される。上述のようにすれば、貯留
液面の上昇幅ｈが１０ｃｍ以内になり貯留槽に収容され
た塗布液の静圧水頭の変化が塗布液の循環流量に脈流を
発生しない範囲に抑制できることを実験により確認して
いる。 （実施例４，５および比較例２，３）外径８０ｍｍ，長
さ３００ｍｍ，最大浸漬容積１５００ｃｃの円筒状基体
を用意し、貯留槽の内径として実施例４では１４０ｍ
ｍ，実施例５では１６０ｍｍ，比較例２では１００ｍ
ｍ，比較例３では１２０ｍｍの４種類の貯留槽を使用し
て通常の塗布処理を行い、貯留液面の上昇幅ｈの測定と
感光体の塗布外観の観察を実施した。その結果の外観判
定と貯留液面の上昇幅ｈについて表３に示す。## EQU1 ## D = (4S / π) 1/2 = (4V / 10π) 1/2
= 0.36 (V) 1/2 . According to the above, it is possible to suppress the change in the static pressure head of the coating liquid stored in the storage tank within the range in which the rising width h of the stored liquid is within 10 cm and to prevent a pulsating flow in the circulating flow rate of the coating liquid. Confirmed by experiments. (Examples 4 and 5 and Comparative Examples 2 and 3) A cylindrical substrate having an outer diameter of 80 mm, a length of 300 mm and a maximum immersion volume of 1500 cc was prepared, and the inner diameter of the storage tank was 140 m in Example 4.
m, 160 mm in Example 5, 100 m in Comparative Example 2
m, in Comparative Example 3, four types of 120 mm storage tanks were used to perform ordinary coating treatment, and the rise width h of the stored liquid surface was measured and the coating appearance of the photoconductor was observed. Table 3 shows the resulting appearance determination and the rise width h of the stored liquid surface.
【００１９】[0019]
【表３】 実施例４，５に見るようにｈが１０ｃｍ以内において塗布外観が良好であった が、比較例２，３に見るようにｈが１０ｃｍを超えると感光体の全体または下部 に輪状の塗布ムラが発生した。 （実施の形態４）図６はこの発明による実施の形態４に
おける塗布槽の説明図である。図６において、同図
（ａ）は塗布槽１の上縁部よりも樋９の上縁部が低い場
合の状態図であり、同図（ｂ）は塗布槽１の上縁部より
も樋９の上縁部が高い場合の状態図である。以下図６に
ついて説明する。[Table 3] As seen in Examples 4 and 5, the coating appearance was good when h was within 10 cm, but as seen in Comparative Examples 2 and 3, when h was more than 10 cm, a ring-shaped coating unevenness was formed on the entire or lower part of the photoreceptor. Occurred. (Embodiment 4) FIG. 6 is an explanatory view of a coating tank according to Embodiment 4 of the present invention. In FIG. 6, (a) is a state diagram when the upper edge of the gutter 9 is lower than the upper edge of the coating tank 1, and (b) of the same figure is a gutter than the upper edge of the coating tank 1. It is a state diagram when the upper edge part of 9 is high. 6 will be described below.
【００２０】塗布液７が満たされた塗布槽１の中に円筒
状基体８を浸漬して塗布槽１の上縁部から溢れ出た塗布
液７を塗布槽１の上部に周設されている樋９に回収した
後に円筒状基体８を矢印Ｑの方向に所定の速さで引き上
げている過程で、塗布液７が供給配管５から塗布槽１へ
再供給されて塗布槽１の上縁部から溢れ出ている時の状
態を示している。The coating liquid 7 overflowing from the upper edge of the coating tank 1 by immersing the cylindrical substrate 8 in the coating tank 1 filled with the coating liquid 7 is provided around the upper portion of the coating tank 1. In the process of pulling up the cylindrical substrate 8 in the direction of arrow Q at a predetermined speed after collecting in the gutter 9, the coating liquid 7 is re-supplied from the supply pipe 5 to the coating tank 1 and the upper edge portion of the coating tank 1 It shows the state when it is overflowing from.
【００２１】同図（ｂ）に示すように塗布槽１の上縁部
よりも樋９の上縁部が高い場合は、円筒状基体８が塗布
槽１の上に充満している溶剤蒸気層を通過する際に円筒
状基体８の外表面に形成されつつある未完成の塗膜がこ
の溶剤蒸気の付着によって流失して局部的な欠落を生じ
ることがあるので、同図（ａ）に示すように塗布槽１の
上縁部よりも樋９の上縁部を低くして塗布槽１の上に溶
剤蒸気が滞留しにくい形状の構造とすることにより塗膜
の局部的な欠落を防止する。 （実施例６および比較例４）外径６０ｍｍ，長さ２５０
ｍｍの円筒状基体を用意し、内径１００ｍｍ，深さ３０
０ｍｍの塗布槽を使用し、実施例６は塗布槽の上縁部よ
りも樋の上縁部が５ｍｍ低い形状の構造とし、比較例４
は塗布槽の上縁部よりも樋の上縁部が３０ｍｍ高い形状
の構造とした。When the upper edge of the gutter 9 is higher than the upper edge of the coating tank 1 as shown in FIG. 2B, the cylindrical substrate 8 fills the coating tank 1 with the solvent vapor layer. Since the unfinished coating film that is being formed on the outer surface of the cylindrical substrate 8 when passing through the chamber may be washed away by the adherence of the solvent vapor and a local loss may occur, so that it is shown in FIG. As described above, by making the upper edge of the gutter 9 lower than the upper edge of the coating tank 1 to form a structure in which the solvent vapor is less likely to stay on the coating tank 1, local loss of the coating film is prevented. . (Example 6 and Comparative Example 4) Outer diameter 60 mm, length 250
mm cylindrical base is prepared, inner diameter 100 mm, depth 30
In Comparative Example 4, a 0 mm coating tank was used, and Example 6 had a structure in which the upper edge of the gutter was lower by 5 mm than the upper edge of the coating tank.
Had a structure in which the upper edge of the gutter was 30 mm higher than the upper edge of the coating tank.
【００２２】上述のようにして円筒状基体の引き上げ速
さを通常の約半分に減速して塗布処理を行い、実施例６
および比較例４について感光体の上部，中央部，下部に
おけるそれぞれ５点の塗膜の膜厚を測定した。その結果
の膜厚について感光体の上部，中央部，下部における各
最大実測値を表４に示す。As described above, the coating speed was reduced to about half of the normal speed of the cylindrical substrate to carry out the coating process, and Example 6
For Comparative Example 4, the film thickness of the coating film was measured at each of 5 points on the upper, middle and lower parts of the photoreceptor. Table 4 shows the maximum measured values of the resulting film thickness at the top, center and bottom of the photoconductor.
【００２３】[0023]
【表４】 実施例６は塗膜が厚く均一に形成されて良好であったが、比較例４は塗膜が薄 く不均一であり下部の膜厚が特に薄かった。 （実施の形態５）図７はこの発明による実施の形態５に
おける円筒状基体の第一の密閉機構を示す要部斜視図で
ある。図７において、円筒状基体８の上端に蓋２０の片
面が緩衝板１５を介して嵌入されて第一の密閉機構が形
成され、蓋２０の他の片面は取付座１３ａと昇降アーム
３ａとを備えた昇降機構に連結されるようになってい
る。また空気配管２１が円筒状基体８の内側から蓋２０
を貫通して引き出され、圧力制御器２３を具備した圧力
計２４を介して給気と排気に二分され、圧力制御器２３
からの制御信号により作動する給気用と排気用それぞれ
のニードル弁２２に接続されて内圧制御機構を形成して
いる。[Table 4] In Example 6, the coating film was thick and uniform, which was good, but in Comparative Example 4, the coating film was thin and non-uniform, and the thickness of the lower portion was particularly thin. (Embodiment 5) FIG. 7 is a perspective view of essential parts showing a first sealing mechanism for a cylindrical substrate according to Embodiment 5 of the present invention. In FIG. 7, one side of the lid 20 is fitted on the upper end of the cylindrical substrate 8 via the cushioning plate 15 to form a first sealing mechanism, and the other side of the lid 20 mounts the mounting seat 13a and the lifting arm 3a. It is designed to be connected to the lifting mechanism provided. Further, the air pipe 21 is attached to the lid 20 from the inside of the cylindrical substrate 8.
Through the pressure gauge 23 equipped with the pressure controller 23, and is divided into air supply and exhaust air.
The internal pressure control mechanism is formed by being connected to the supply and exhaust needle valves 22 which are operated by a control signal from
【００２４】上述の構成において、第一の密閉機構の蓋
２０と昇降機構の取付座１３ａとを連結して円筒状基体
８を塗布液が満たされた塗布槽の中へ浸漬および引き上
げする時、内圧制御機構により円筒状基体８の内部気圧
を検知して適宜な内圧制御を行い得るので、円筒状基体
８の中空部内に密閉された空気の破裂が回避でき、安定
した塗布処理ができる。 （実施例７および比較例５，６）外径３０ｍｍ，長さ２
５０ｍｍの円筒状基体を用意し、内径１００ｍｍ，深さ
３００ｍｍの塗布槽を使用し、実施例７は円筒状基体８
の浸漬・引き上げ共に内圧制御した場合，比較例５は円
筒状基体８の引き上げ時のみ内圧制御した場合，比較例
６は円筒状基体８の浸漬・引き上げ共に内圧制御しない
場合について、感光体の塗布外観の観察を実施した。そ
の結果の外観判定について表５に示す。In the above structure, when the lid 20 of the first sealing mechanism and the mounting seat 13a of the elevating mechanism are connected to each other and the cylindrical substrate 8 is immersed in and pulled up from the coating tank filled with the coating liquid, Since the internal pressure control mechanism can detect the internal air pressure of the cylindrical substrate 8 and appropriately control the internal pressure, it is possible to avoid the rupture of the air sealed in the hollow portion of the cylindrical substrate 8 and to perform a stable coating process. (Example 7 and Comparative Examples 5 and 6) Outer diameter 30 mm, length 2
A cylindrical substrate having a diameter of 50 mm was prepared, and a coating tank having an inner diameter of 100 mm and a depth of 300 mm was used.
When the internal pressure is controlled for both immersion and pulling up, the comparative example 5 applies the internal pressure control only when the cylindrical substrate 8 is pulled up, and the comparative example 6 applies no internal pressure control for the immersion and pulling up of the cylindrical substrate 8. The appearance was observed. Table 5 shows the appearance judgment as a result.
【００２５】[0025]
【表５】 実施例７は塗布外観が良好であったが、比較例５は浸漬速さが５（ｍｍ／ｓ） 以下の時にムラが発生し、比較例６は空気破裂により全体にムラが発生した。 （実施の形態６）図８はこの発明による実施の形態６に
おける円筒状基体の第二の密閉機構を示す要部分解図で
ある。図８において、円筒状基体８の外径より僅かに大
きな外径を有する円盤の上面側に円錐台状をなす突起が
中央に配設されその周辺に位置決め用の突起が周設され
中心部に貫通孔が設けられている台１４と、台１４を形
成する円盤と同じ外径を有するゴムなどの弾性材料から
なる緩衝板１５とから第二の密閉機構が構成され、この
上側に、円筒状基体８の内径より僅かに小さな外径を有
するゴムなどの弾性材料からなるドーナツ状の環状体１
６が下部内側に配設された円筒状基体８が冠置され、台
１４の貫通孔の上部から取付ねじ１７を通して取付座１
３ｂと昇降アーム３ｂとを備えた昇降機構の取付座１３
ｂの上面に固定されるようになっている。[Table 5] In Example 7, the coating appearance was good, but in Comparative Example 5, unevenness occurred when the dipping speed was 5 (mm / s) or less, and in Comparative Example 6, unevenness occurred due to air burst. (Embodiment 6) FIG. 8 is an exploded view of essential parts showing a second sealing mechanism for a cylindrical substrate according to Embodiment 6 of the present invention. In FIG. 8, a truncated cone-shaped projection is arranged in the center on the upper surface side of a disk having an outer diameter slightly larger than the outer diameter of the cylindrical base body 8, and a positioning projection is provided around the periphery of the disk. A second sealing mechanism is composed of a base 14 provided with a through hole and a cushioning plate 15 made of an elastic material such as rubber having the same outer diameter as the disk forming the base 14, and on the upper side of the second sealing mechanism, a cylindrical shape is formed. A donut-shaped annular body 1 made of an elastic material such as rubber having an outer diameter slightly smaller than the inner diameter of the base body 8.
A cylindrical substrate 8 having 6 inside is mounted on the bottom, and a mounting seat 1 is passed through a mounting screw 17 from the upper part of the through hole of the base 14.
Mounting seat 13 of lifting mechanism including 3b and lifting arm 3b
It is fixed to the upper surface of b.
【００２６】上述の構成において、緩衝板１５が敷設さ
れた台１４の上側に冠置された円筒状基体８の上縁部を
下方向へ押圧すると、台１４に配設されている円錐台状
をなす突起が環状体１６の内側に嵌挿されてその部分を
押し広げるので、環状体１６の外壁と円筒状基体８の内
壁とが圧着状態になり円筒状基体８が台１４に保持され
るとともに、円筒状基体８の下縁部が緩衝板１５に圧着
されて密閉機構が形成される。台１４と昇降機構の取付
座１３ｂとを取付ねじ１７により固定した後、昇降アー
ム３ｂを塗布液が満たされた塗布槽の中へ下降させて円
筒状基体８を塗布液に浸漬する際には、円筒状基体８の
上部に未塗布部分を残すような深さに止める操作により
円筒状基体８の中空部内を常時大気圧下に置くことが可
能となり、前述の実施の形態５における内圧制御機構を
省略できる。 （実施例８〜１０および比較例７）外径３０ｍｍ，長さ
２５０ｍｍの円筒状基体を用意し、内径１００ｍｍ，深
さ３００ｍｍの塗布槽を使用し、昇降アーム３ｂおよび
取付座１３ｂはテフロン加工を施し、緩衝板１５として
外径３２ｍｍ，厚さ５ｍｍのゴム（バイトン製）を使用
し、円筒状基体８の上部に１０ｍｍの未塗布部分を残す
ようにした。実施例８は浸漬・引き上げ速さが４ｍｍ／
ｓの場合，実施例９は浸漬・引き上げ速さが１０ｍｍ／
ｓの場合，実施例１０は浸漬・引き上げ速さが１４ｍｍ
／ｓの場合，比較例７は浸漬・引き上げ速さが１６ｍｍ
／ｓの場合について、感光体の塗布外観の観察を実施し
た。その結果の外観判定について表６に示す。In the above-mentioned structure, when the upper edge of the cylindrical substrate 8 placed on the upper side of the base 14 on which the cushioning plate 15 is laid is pressed downward, the conical trapezoidal shape arranged on the base 14 is formed. Since the protrusions that form are fitted into the inside of the annular body 16 and push out the portion thereof, the outer wall of the annular body 16 and the inner wall of the cylindrical base body 8 are in a crimped state, and the cylindrical base body 8 is held on the base 14. At the same time, the lower edge of the cylindrical substrate 8 is pressure-bonded to the buffer plate 15 to form a sealing mechanism. After the base 14 and the mounting base 13b of the lifting mechanism are fixed by the mounting screws 17, when the lifting arm 3b is lowered into the coating tank filled with the coating liquid to immerse the cylindrical substrate 8 in the coating liquid. The internal pressure control mechanism according to the fifth embodiment described above can always be kept under the atmospheric pressure by the operation of stopping at a depth such that an uncoated portion is left above the cylindrical substrate 8. Can be omitted. (Examples 8 to 10 and Comparative Example 7) A cylindrical substrate having an outer diameter of 30 mm and a length of 250 mm was prepared, a coating tank having an inner diameter of 100 mm and a depth of 300 mm was used, and the elevating arm 3b and the mounting seat 13b were made of Teflon. Then, rubber (made by Viton) having an outer diameter of 32 mm and a thickness of 5 mm was used as the buffer plate 15, and an uncoated portion of 10 mm was left on the upper portion of the cylindrical substrate 8. In Example 8, the immersion / pulling speed was 4 mm /
In the case of s, in Example 9, the immersion / pulling speed was 10 mm /
In the case of s, the immersion / pulling speed is 14 mm in Example 10.
/ S, Comparative Example 7 has a dipping / pulling speed of 16 mm
In the case of / s, the appearance of coating of the photoconductor was observed. Table 6 shows the result of appearance determination.
【００２７】[0027]
【表６】 浸漬・引き上げ速さが４〜１４（ｍｍ／ｓ）において良好な塗布外観が得られ たが、浸漬・引き上げ速さが１６（ｍｍ／ｓ）においては昇降機構の浸漬に伴う 塗布液面の変動の影響によりムラが発生した。[Table 6] A good coating appearance was obtained when the dipping / pulling speed was 4 to 14 (mm / s), but when the dipping / pulling speed was 16 (mm / s), fluctuations in the coating liquid level due to dipping in the lifting mechanism The unevenness occurred due to the influence of.
【００２８】[0028]
【発明の効果】この発明によれば、浸漬塗布法により円
筒状基体の外表面に感光層塗膜を形成するための塗布液
を有する塗布槽と、この塗布槽から溢れた塗布液を回収
して塗布槽へ再供給するための回収配管，貯留槽，供給
配管からなる塗布液循環機構と、塗布槽の中へ円筒状基
体を浸漬する昇降機構とを備えた塗布装置において、塗
布液循環機構の中に略鉛直をなす脱気管，ガイド，バリ
ヤを組み合わせてなる脱気機構を配設し、あるいは円筒
状基体の最大浸漬容積に相当する溢出塗布液を収容した
時の貯留液面の上昇幅が１０ｃｍ以内になる容量を有す
る貯留槽を備え、あるいは塗布槽の上縁部よりも低い位
置に上縁部を有する樋を塗布槽の上部に周設し、あるい
は円筒状基体の上端に昇降機構に連結された第一の密閉
機構を設けてこの密閉機構を介して円筒状基体の内部気
圧を検知して適宜な給排気を行い得る内圧制御機構を設
け、あるいは円筒状基体の下端に昇降機構に連結された
第二の密閉機構を設けたことにより、均一な膜厚を有す
る感光層塗膜が形成できるので、画像濃度ムラの原因と
なる塗布ムラをなくした電子写真用感光体の塗布装置を
提供することが可能となる。According to the present invention, a coating tank having a coating liquid for forming a photosensitive layer coating film on the outer surface of a cylindrical substrate by a dip coating method, and a coating liquid overflowing from the coating tank are recovered. In the coating apparatus, the coating liquid circulating mechanism includes a recovery pipe for re-supplying the coating substrate to the coating tank, a storage tank, and a supply pipe, and an elevating mechanism for immersing the cylindrical substrate in the coating tank. A degassing mechanism consisting of a combination of a degassing pipe, a guide, and a barrier, which is almost vertical, is installed in the chamber, or the rising width of the stored liquid level when the overflow coating liquid corresponding to the maximum immersion volume of the cylindrical substrate is stored. With a storage tank having a volume of 10 cm or less, or a gutter having an upper edge portion lower than the upper edge portion of the coating tank is provided around the upper portion of the coating tank, or an elevating mechanism is provided on the upper end of the cylindrical substrate. The first sealing mechanism connected to An internal pressure control mechanism capable of detecting the internal air pressure of the cylindrical substrate through the closing mechanism to perform appropriate air supply / exhaust, or a second sealing mechanism connected to the lifting mechanism at the lower end of the cylindrical substrate. As a result, a photosensitive layer coating film having a uniform film thickness can be formed, so that it is possible to provide a coating device for an electrophotographic photosensitive member that eliminates coating unevenness that causes image density unevenness.
【図１】この発明による実施の形態１の構成図FIG. 1 is a configuration diagram of a first embodiment according to the present invention.
【図２】この発明による実施の形態２の構成図FIG. 2 is a configuration diagram of a second embodiment according to the present invention.
【図３】実施の形態１によるバリヤの詳細形状例を示す
脱気管の斜断面の斜視図で、（ａ）はＷ形バリヤの内装
状態図，（ｂ）は螺旋バリヤの内装状態図，（ｃ）はコ
形バリヤの内装状態図FIG. 3 is a perspective view of an oblique cross section of a degassing pipe showing a detailed shape example of a barrier according to the first embodiment, (a) is an internal state diagram of a W-shaped barrier, (b) is an internal state diagram of a spiral barrier, c) Interior view of U-shaped barrier
【図４】実施の形態２によるガイドの詳細形状例を示す
貯留槽の縦断面の斜視図で、（ａ）は管ガイドの内装状
態図，（ｂ）は板ガイドの内装状態図，（ｃ）は覆板ガ
イドの内装状態図，（ｄ）は螺旋ガイドの内装状態図FIG. 4 is a perspective view of a vertical cross section of a storage tank showing an example of a detailed shape of a guide according to the second embodiment, where (a) is an interior state diagram of a pipe guide, (b) is an interior state diagram of a plate guide, and (c). ) Is the interior state diagram of the cover guide, (d) is the interior state diagram of the spiral guide
【図５】この発明による実施の形態３における貯留槽の
説明図FIG. 5 is an explanatory diagram of a storage tank according to a third embodiment of the present invention.
【図６】この発明による実施の形態４における塗布槽の
説明図で、（ａ）は塗布槽の上縁部よりも樋の上縁部が
低い場合の状態図，（ｂ）は塗布槽の上縁部よりも樋の
上縁部が高い場合の状態図6A and 6B are explanatory views of a coating tank according to a fourth embodiment of the present invention, in which FIG. 6A is a state diagram in which the upper edge of the gutter is lower than the upper edge of the coating tank, and FIG. State diagram when the upper edge of the gutter is higher than the upper edge
【図７】この発明による実施の形態５における円筒状基
体の第一の密閉機構を示す要部斜視図FIG. 7 is a perspective view of a main part showing a first sealing mechanism for a cylindrical substrate according to a fifth embodiment of the present invention.
【図８】この発明による実施の形態６における円筒状基
体の第二の密閉機構を示す要部分解図FIG. 8 is an essential part exploded view showing a second sealing mechanism for a cylindrical substrate according to the sixth embodiment of the present invention.
【図９】電子写真用感光体の塗布装置の従来の技術によ
る一例の構成図FIG. 9 is a configuration diagram of an example of a conventional coating device for an electrophotographic photoconductor coating device.
１ 塗布槽 ２ 貯留槽 ３ 昇降機構 ３ａ，３ｂ 昇降アーム ４ 回収配管 ５ 供給配管 ６ 圧送ポンプ ７ 塗布液 ８ 円筒状基体 ９ 樋 １０ バリヤ １０ａ Ｗ形バリヤ １０ｂ 螺旋バリヤ １０ｃ コ形バリヤ １１ 脱気管 １２ ガイド １２ａ 管ガイド １２ｂ 板ガイド １２ｃ 覆板ガイド １２ｄ 螺旋ガイド １３ａ，１３ｂ 取付座 １４ 台 １５ 緩衝板 １６ 環状体 １７ 取付ねじ ２０ 蓋 ２１ 空気配管 ２２ ニードル弁 ２３ 圧力制御器 ２４ 圧力計 1 Coating Tank 2 Storage Tank 3 Lifting Mechanism 3a, 3b Lifting Arm 4 Recovery Pipe 5 Supply Pipe 6 Pressure Pump 7 Coating Liquid 8 Cylindrical Substrate 9 Gutter 10 Barrier 10a W-shaped Barrier 10b Spiral Barrier 10c U-shaped Barrier 11 Degassing Pipe 12 Guide 12a Pipe guide 12b Plate guide 12c Cover plate guide 12d Spiral guide 13a, 13b Mounting seat 14 units 15 Buffer plate 16 Annular body 17 Mounting screw 20 Lid 21 Air piping 22 Needle valve 23 Pressure controller 24 Pressure gauge
───────────────────────────────────────────────────── フロントページの続き (72)発明者 廣田 信明 神奈川県川崎市川崎区田辺新田１番１号 富士電機株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Nobuaki Hirota 1-1, Tanabe Nitta, Kawasaki-ku, Kawasaki-shi, Kanagawa Fuji Electric Co., Ltd.
Claims (8)
光層塗膜を形成するための塗布液を有する塗布槽と、こ
の塗布槽から溢れた前記塗布液を回収して前記塗布槽へ
再供給するための回収配管，貯留槽，供給配管からなる
塗布液循環機構と、前記塗布槽の中へ前記円筒状基体を
浸漬する昇降機構とを備えた塗布装置において、前記塗
布液循環機構の中に脱気機構を配設したことを特徴とす
る電子写真用感光体の塗布装置。1. A coating tank having a coating solution for forming a photosensitive layer coating film on the outer surface of a cylindrical substrate by a dip coating method, and the coating solution overflowing from the coating tank is collected and transferred to the coating tank. In a coating apparatus including a coating liquid circulating mechanism for re-supplying, a storage tank, and a supply pipe, and an elevating mechanism for immersing the cylindrical substrate in the coating tank, the coating liquid circulating mechanism An electrophotographic photoconductor coating device having a degassing mechanism provided therein.
の間に略鉛直に配設された脱気管からなることを特徴と
する請求項１記載の電子写真用感光体の塗布装置。2. The electrophotographic photoconductor coating apparatus according to claim 1, wherein the degassing mechanism comprises a degassing pipe disposed substantially vertically between the recovery pipe and the storage tank.
の間に略鉛直に配設された脱気管と前記貯留槽の中に配
設されたガイドとからなることを特徴とする請求項１記
載の電子写真用感光体の塗布装置。3. The deaeration mechanism comprises a deaeration pipe arranged substantially vertically between the recovery pipe and the storage tank, and a guide arranged in the storage tank. Item 1. An electrophotographic photoconductor coating device according to Item 1.
徴とする請求項２または３記載の電子写真用感光体の塗
布装置。4. The electrophotographic photoconductor coating apparatus according to claim 2, wherein the deaeration tube has a barrier built therein.
光層塗膜を形成するための塗布液を有する塗布槽と、こ
の塗布槽から溢れた前記塗布液を回収して前記塗布槽へ
再供給するための回収配管，貯留槽，供給配管からなる
塗布液循環機構と、前記塗布槽の中へ前記円筒状基体を
浸漬する昇降機構とを備えた塗布装置において、前記円
筒状基体の最大浸漬容積に相当する溢出塗布液を収容し
た時の貯留液面の上昇幅が１０ｃｍ以内になる容量を有
する前記貯留槽を備えたことを特徴とする電子写真用感
光体の塗布装置。5. A coating tank having a coating solution for forming a photosensitive layer coating film on the outer surface of a cylindrical substrate by a dip coating method, and the coating solution overflowing from the coating tank is collected and transferred to the coating tank. In a coating apparatus equipped with a coating liquid circulation mechanism including a recovery pipe for re-supply, a storage tank, and a supply pipe, and an elevating mechanism for immersing the cylindrical substrate in the coating tank, the maximum of the cylindrical substrate is An apparatus for coating an electrophotographic photosensitive member, comprising the storage tank having a capacity such that a rising width of a stored liquid surface when an overflow coating liquid corresponding to an immersion volume is stored is 10 cm or less.
光層塗膜を形成するための塗布液を有する塗布槽と、こ
の塗布槽から溢れた前記塗布液を回収して前記塗布槽へ
再供給するための回収配管，貯留槽，供給配管からなる
塗布液循環機構と、前記塗布槽の中へ前記円筒状基体を
浸漬する昇降機構とを備えた塗布装置において、前記塗
布槽の上縁部よりも低い位置に上縁部を有する樋を前記
塗布槽の上部に周設したことを特徴とする電子写真用感
光体の塗布装置。6. A coating tank having a coating solution for forming a photosensitive layer coating film on the outer surface of a cylindrical substrate by a dip coating method, and the coating solution overflowing from the coating tank is collected and fed to the coating tank. An upper edge of the coating tank, comprising: a coating liquid circulating mechanism including a collecting pipe for re-supplying, a storage tank, and a supplying pipe; and an elevating mechanism for immersing the cylindrical substrate in the coating tank. A coating device for an electrophotographic photosensitive member, characterized in that a gutter having an upper edge portion at a position lower than the part is provided around the coating tank.
光層塗膜を形成するための塗布液を有する塗布槽と、こ
の塗布槽から溢れた前記塗布液を回収して前記塗布槽へ
再供給するための回収配管，貯留槽，供給配管からなる
塗布液循環機構と、前記塗布槽の中へ前記円筒状基体を
浸漬する昇降機構とを備えた塗布装置において、前記円
筒状基体の上端に前記昇降機構に連結された第一の密閉
機構を設け、この第一の密閉機構を介して前記円筒状基
体の内圧制御機構を設けたことを特徴とする電子写真用
感光体の塗布装置。7. A coating tank having a coating solution for forming a photosensitive layer coating film on the outer surface of a cylindrical substrate by a dip coating method, and the coating solution overflowing from the coating tank is recovered and fed to the coating tank. An upper end of the cylindrical substrate in a coating apparatus comprising a coating liquid circulating mechanism for re-supplying, a storage tank, and a supply pipe, and an elevating mechanism for immersing the cylindrical substrate in the coating tank. 1. A coating device for an electrophotographic photosensitive member, comprising: a first sealing mechanism connected to the elevating mechanism; and an internal pressure control mechanism for the cylindrical substrate provided through the first sealing mechanism.
光層塗膜を形成するための塗布液を有する塗布槽と、こ
の塗布槽から溢れた前記塗布液を回収して前記塗布槽へ
再供給するための回収配管，貯留槽，供給配管からなる
塗布液循環機構と、前記塗布槽の中へ前記円筒状基体を
浸漬する昇降機構とを備えた塗布装置において、前記円
筒状基体の下端に前記昇降機構に連結された第二の密閉
機構を設けたことを特徴とする電子写真用感光体の塗布
装置。8. A coating tank having a coating solution for forming a photosensitive layer coating film on the outer surface of a cylindrical substrate by a dip coating method, and the coating solution overflowing from the coating tank is collected into the coating tank. In a coating apparatus including a coating liquid circulating mechanism for re-supplying, a storage tank, and a supply pipe, and an elevating mechanism for immersing the cylindrical substrate in the coating tank, a lower end of the cylindrical substrate. A coating device for an electrophotographic photosensitive member, characterized in that a second sealing mechanism connected to the elevating mechanism is provided.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7861996A JPH09269604A (en) | 1996-04-01 | 1996-04-01 | Coating device for electrophotographic photoreceptor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7861996A JPH09269604A (en) | 1996-04-01 | 1996-04-01 | Coating device for electrophotographic photoreceptor |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002234595A Division JP2003131408A (en) | 2002-08-12 | 2002-08-12 | Coating applicator for electrophotographic photoreceptor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH09269604A true JPH09269604A (en) | 1997-10-14 |
Family
ID=13666915
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7861996A Pending JPH09269604A (en) | 1996-04-01 | 1996-04-01 | Coating device for electrophotographic photoreceptor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH09269604A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100732319B1 (en) * | 2005-06-08 | 2007-06-25 | 주식회사 엘지화학 | A coater capable of eliminating a pulsation and controlling a flow rate |
| US7779780B2 (en) | 2006-04-12 | 2010-08-24 | Sharp Kabushiki Kaisha | Layer forming apparatus for electrophotographic photoreceptor |
| CN101966510A (en) * | 2010-09-28 | 2011-02-09 | 西安建筑科技大学 | Equipment for preparing thin film material by pulling down or obliquely pulling drip-type liquid surface sedimentation |
-
1996
- 1996-04-01 JP JP7861996A patent/JPH09269604A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100732319B1 (en) * | 2005-06-08 | 2007-06-25 | 주식회사 엘지화학 | A coater capable of eliminating a pulsation and controlling a flow rate |
| US7779780B2 (en) | 2006-04-12 | 2010-08-24 | Sharp Kabushiki Kaisha | Layer forming apparatus for electrophotographic photoreceptor |
| CN101966510A (en) * | 2010-09-28 | 2011-02-09 | 西安建筑科技大学 | Equipment for preparing thin film material by pulling down or obliquely pulling drip-type liquid surface sedimentation |
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