JP2002045754A - Application device - Google Patents
Application deviceInfo
- Publication number
- JP2002045754A JP2002045754A JP2000231495A JP2000231495A JP2002045754A JP 2002045754 A JP2002045754 A JP 2002045754A JP 2000231495 A JP2000231495 A JP 2000231495A JP 2000231495 A JP2000231495 A JP 2000231495A JP 2002045754 A JP2002045754 A JP 2002045754A
- Authority
- JP
- Japan
- Prior art keywords
- tank
- coating
- coating liquid
- circulation
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Coating Apparatus (AREA)
- Photoreceptors In Electrophotography (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は浸漬塗布法によりドラム
外周面に感光性物質を塗布して電子写真感光体ドラムを
製造する装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus for producing an electrophotographic photosensitive drum by applying a photosensitive substance to a drum outer peripheral surface by a dip coating method.
【０００２】[0002]
【従来の技術】電子写真感光体ドラムは通常アルミニウ
ムなどからなる円筒状基体の外周面に有機感光材料を含
む塗布液を塗布して感光層を形成する。塗布方法として
は浸漬塗布法、スプレー塗布法、リングコート法などが
あるが、比較的均一な膜圧と塗膜を得ることができ、し
かも生産性の高い浸漬塗布法が一般に採用されている。
一般的な浸漬塗布法は塗布液の収容されている塗工タン
クに円筒状基体を浸漬させ、再び引き上げてその外周面
に塗布液を塗布するするものであるが、浸漬する際塗工
タンクの上縁部からオーバーフローする塗布液を回収し
循環タンクを経て再度塗工タンクに戻す循環式である。2. Description of the Related Art In an electrophotographic photosensitive drum, a photosensitive layer is formed by applying a coating solution containing an organic photosensitive material to an outer peripheral surface of a cylindrical substrate usually made of aluminum or the like. As a coating method, there are a dip coating method, a spray coating method, a ring coating method and the like, and a dip coating method capable of obtaining a relatively uniform film pressure and a coating film and having high productivity is generally adopted.
In a general dip coating method, a cylindrical substrate is immersed in a coating tank containing a coating liquid, and then pulled up again to apply the coating liquid to its outer peripheral surface. This is a circulation type in which the coating liquid overflowing from the upper edge is collected and returned to the coating tank via the circulation tank.
【０００３】従来の循環式浸漬塗布法の装置について簡
単に説明する。図２は、浸漬塗布法の従来の塗布装置の
一例を示す概念図である。図２において、１は塗布液３
が収容されており円筒状基体１０が浸漬され引き上げら
れる塗工タンク、２は塗布液３が貯留され、塗工タンク
１に塗布液３を送液する循環タンクであり、塗布液３は
塗布液タンク２の下部と塗工タンク１の下部とを連結す
る配管４を通って圧送ポンプ６により塗工タンク１の下
部に送りこまれ、その上縁部からオーバーフローしてこ
れを受ける樋９を経て配管７を通って塗布液タンク２に
還流するように循環する。[0003] A conventional apparatus of the circulation type dip coating method will be briefly described. FIG. 2 is a conceptual diagram illustrating an example of a conventional coating apparatus using a dip coating method. In FIG. 2, 1 is a coating liquid 3
Is a coating tank in which the cylindrical substrate 10 is immersed and pulled up, 2 is a circulation tank for storing the coating liquid 3 and sending the coating liquid 3 to the coating tank 1, and the coating liquid 3 is a coating liquid. It is sent to the lower part of the coating tank 1 by a pressure pump 6 through a pipe 4 connecting the lower part of the tank 2 and the lower part of the coating tank 1, and flows through a gutter 9 which overflows from its upper edge and receives it. 7 and circulates back to the coating liquid tank 2.
【０００４】このような塗布装置を用いて、塗布液３を
循環させながら、塗工タンク１に、円筒内部に塗布液が
入り込まないような機構を付設された円筒状基体１０を
その円筒軸をほぼ鉛直に保持して、円筒軸方向に浸漬
し、続いて所定の速度で引き上げることにより、円筒状
基体１０の外表面に膜厚均一で均質な塗膜を形成する。
その場合、塗工タンク１に円筒状基体１０を浸漬すると
きには基体の体積に相当する分量の塗布液が定常のオー
バーフロー量にプラスされてオーバーフローするので塗
布液面が上昇し、引き上げるときには塗布液面が下がる
という液面変動が生じる。このために、基体の塗布液面
に対する引き上げ速度が変化することになり、基体外表
面に塗布液が均一に塗布され得ないことになる。このよ
うな液面変動の影響をできるだけ少なくするために、塗
布液の循環量を調節し、基体を引き上げるときに途切れ
ることなく塗布液がオーバーフローしている状態を保ち
ながら塗布する方法が採られる。Using such a coating apparatus, a cylindrical substrate 10 provided with a mechanism for preventing the coating liquid from entering the inside of the cylinder is placed in the coating tank 1 while the coating liquid 3 is circulated. By holding the tube almost vertically and immersing it in the direction of the cylinder axis, and then pulling it up at a predetermined speed, a uniform and uniform coating film is formed on the outer surface of the cylindrical substrate 10.
In this case, when the cylindrical substrate 10 is immersed in the coating tank 1, an amount of the coating liquid corresponding to the volume of the substrate is added to the steady overflow amount and overflows. , The liquid level changes. For this reason, the pulling speed of the substrate with respect to the coating liquid level changes, and the coating liquid cannot be uniformly applied to the outer surface of the substrate. In order to minimize the influence of such liquid level fluctuation, a method is adopted in which the amount of circulation of the coating liquid is adjusted, and the liquid is applied while the coating liquid overflows without interruption when lifting the substrate.
【０００５】[0005]
【発明が解決しようとする課題】このような循環式塗布
装置において、オーバーフローした液を回収する方法と
しては循環タンクと塗工タンクの高低差を利用して塗工
液を回収する自由落下方式と、ポンプにて回収する方法
がある。In such a circulation type coating apparatus, as a method for collecting the overflowed liquid, there is a free fall method in which the coating liquid is collected by utilizing the height difference between the circulation tank and the coating tank. , There is a method of collecting with a pump.
【０００６】これらの回収方法においてそれぞれ以下の
ような問題点がある。すなわち、自由落下方式はポンプ
等の駆動を必要としない簡便な方法であるが、塗工タン
クと循環タンクの位置関係を考慮する必要がある。また
回収された塗布液が循環タンクに収容されるとき塗布液
面に落下することによる衝撃で泡が発生する。またポン
プにて回収する方法は塗工タンクと循環タンクの位置関
係を考慮する必要はないが、ポンプの種類や駆動方式に
よって送液時に泡の噛み込みが発生する。これらの泡が
塗布液に存在すると塗布された感光体ドラムの感光層に
付着して、不良品となり歩留低下の原因になる。また塗
布液を循環タンクに投入したり、継ぎ足したりする場合
循環タンクの上部より直接投入するか、あるいはポンプ
にて外部タンクよりポンプにて送液していた。しかし、
このような方法では液投入時に多量の泡が発生し、同様
に感光体ドラムの歩留低下の原因となる。従来は、これ
らの塗布液中の泡を消すために８〜２４時間塗布液を循
環させる必要があった。[0006] Each of these recovery methods has the following problems. That is, the free fall method is a simple method that does not require driving of a pump or the like, but it is necessary to consider the positional relationship between the coating tank and the circulation tank. In addition, when the collected coating liquid is stored in the circulation tank, bubbles are generated due to an impact caused by falling on the coating liquid surface. Although it is not necessary to consider the positional relationship between the coating tank and the circulating tank when collecting with a pump, bubbles may be caught at the time of liquid feeding depending on the type of pump and the driving method. If these bubbles are present in the coating liquid, they adhere to the coated photosensitive layer of the photosensitive drum, resulting in defective products and a reduction in yield. In addition, when the coating liquid is introduced into or added to the circulation tank, the application liquid is directly introduced from the upper part of the circulation tank, or the liquid is sent from an external tank by a pump. But,
In such a method, a large amount of bubbles is generated when the liquid is supplied, which also causes a decrease in the yield of the photosensitive drum. Conventionally, it has been necessary to circulate the coating solution for 8 to 24 hours in order to eliminate bubbles in these coating solutions.
【０００７】[0007]
【課題を解決するための手段】上記の課題を解決するた
め、この発明によれば円筒状基体をその円筒軸をほぼ鉛
直に保持した状態で、塗布液に浸漬し、塗布液から外部
に引き上げることにより前記円筒状基体の外表面に塗布
液を塗布する塗布装置において、塗布液を収容しており
前記円筒状基体が浸漬される塗工タンクと、少なくとも
塗布液中の泡の発生を抑える脱泡タンクと塗布液を塗工
タンクに循環させる循環タンクを有し、塗布液を循環タ
ンクの下部から圧送ポンプで塗工タンク下部に送り込
み，塗工タンク上縁部からオーバーフローさせて脱泡タ
ンクに還流させ、脱泡タンクの下部から循環タンクの塗
布液中に送り込む塗布液循環機構を備えるとともに脱泡
タンクには塗布液の供給口を設けることにより達成され
る。また、前記供給口から脱泡タンクへ供給される塗布
液は傾斜の緩い配管を経由して供給されることことによ
っても達成される。さらに、前記傾斜の緩い配管は螺旋
状であることによって達成される。そして、脱泡タンク
から循環タンクへ循環路にフィルターを設けることによ
り達成される。According to the present invention, in order to solve the above-mentioned problems, a cylindrical substrate is immersed in a coating solution with its cylindrical axis held substantially vertically, and pulled up from the coating solution to the outside. In the coating apparatus for applying the coating liquid to the outer surface of the cylindrical substrate, a coating tank containing the coating liquid and immersed in the cylindrical substrate is provided with a coating tank that suppresses at least the generation of bubbles in the coating liquid. It has a foam tank and a circulation tank that circulates the coating liquid to the coating tank. The coating liquid is sent from the lower part of the circulation tank to the lower part of the coating tank by a pressure pump, and overflows from the upper edge of the coating tank to the defoaming tank. This is achieved by providing a coating liquid circulation mechanism for refluxing and feeding the coating liquid from the lower part of the defoaming tank into the coating liquid in the circulation tank, and providing the supply port for the coating liquid in the defoaming tank. Further, the application liquid supplied from the supply port to the defoaming tank is also achieved by being supplied via a pipe having a gentle inclination. Further, the steeply inclined pipe is achieved by being spiral. And it is achieved by providing a filter in the circulation path from the defoaming tank to the circulation tank.
【０００８】[0008]
【発明の実施の形態】図面を用いてこの発明を説明す
る。図１はこの発明の塗布装置の一例の概念図で、１は
塗工タンク、２は循環タンク、１２は脱泡タンクであ
る。塗布液３は循環タンク２の下部と塗工タンク１の下
部とを連結する配管４を通って圧送ポンプ６により塗工
タンク１に送り込まれ、その上縁部からオーバーフロー
してこれを受ける樋９を経て配管７を通って脱泡タンク
１２に還流し、脱泡タンク１２の下部と循環タンクの塗
布液中に連結する配管８を通って循環タンク２に送り込
まれることにより塗布装置内を循環する。１４は塗布液
３を清浄化し，粘度を均一化し，塗布液が分散液の場合
にはその分散を均一にするためのフィルターである。１
３は塗布液３を供給するための供給口であり、供給口１
３から螺旋状配管１１が脱泡タンク１２の内部に付設さ
れている。DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described with reference to the drawings. FIG. 1 is a conceptual view of an example of a coating apparatus according to the present invention, wherein 1 is a coating tank, 2 is a circulation tank, and 12 is a defoaming tank. The coating liquid 3 is sent into the coating tank 1 by a pressure pump 6 through a pipe 4 connecting the lower part of the circulation tank 2 and the lower part of the coating tank 1, and overflows from the upper edge thereof to receive a gutter 9. Circulates through the pipe 7 to the defoaming tank 12 and is fed into the circulation tank 2 through the pipe 8 connecting the lower part of the defoaming tank 12 and the coating liquid in the circulation tank, thereby circulating in the coating apparatus. . Reference numeral 14 denotes a filter for cleaning the coating liquid 3 to make the viscosity uniform, and for uniforming the dispersion when the coating liquid is a dispersion liquid. 1
Reference numeral 3 denotes a supply port for supplying the coating liquid 3, and the supply port 1
From 3, a spiral pipe 11 is provided inside the defoaming tank 12.
【０００９】このような装置を用い、塗布液３を循環さ
せながら、円筒内部に塗布液が入り込まないような機構
を付設された円筒状基体１０を図示はしてない昇降手段
により双方向矢印Ａのように軸方向に鉛直に移動させ、
塗工タンク１に浸漬し引き上げることにより塗布を行
う。円筒状基体１０を浸漬するときには塗工タンク１の
上縁部からオーバーフローする塗布液量は増大する。そ
の増大量に応じて、脱泡タンク１２内の塗布液面は上昇
する。そのために圧送ポンプ５の背圧が高くなるので循
環タンク２に送り込まれる塗布液流量は増加するが、そ
の増加量はオーバーフローする塗布液の増大量に比べる
とはるかに少ない。従って、循環タンク２内の塗布液面
の上昇は、循環タンク２に直接塗工タンク１の上縁部か
らオーバーフローする塗布液が還流する従来の場合に比
してはるかに少なく、圧送ポンプ６の背圧は極僅かしか
変わらず、塗工タンク１に送り込まれる塗布液流量は殆
ど変化しないことになる。また、フィルター９を配管８
に付設したことにより、フィルター９に起因する塗布液
流の脈流は循環タンク２で消滅し、塗工タンク１に送り
込まれる塗布液流量には影響しなくなる。Using such an apparatus, while circulating the coating liquid 3, the cylindrical base 10 provided with a mechanism for preventing the coating liquid from entering the inside of the cylinder is moved by a bidirectional arrow A by a lifting means (not shown). Move vertically in the axial direction like
The coating is performed by dipping in the coating tank 1 and lifting it up. When the cylindrical substrate 10 is immersed, the amount of the coating liquid overflowing from the upper edge of the coating tank 1 increases. The coating liquid level in the defoaming tank 12 rises according to the increase amount. As a result, the back pressure of the pressure feed pump 5 increases, so that the flow rate of the coating solution fed into the circulation tank 2 increases, but the increase is much smaller than the increase amount of the coating solution overflowing. Therefore, the rise of the coating liquid level in the circulation tank 2 is much smaller than in the conventional case where the coating liquid overflowing directly from the upper edge of the coating tank 1 to the circulation tank 2 is refluxed. The back pressure changes only slightly, and the flow rate of the coating solution fed into the coating tank 1 hardly changes. Filter 9 is connected to piping 8
The pulsating flow of the coating liquid flow caused by the filter 9 disappears in the circulation tank 2 and does not affect the flow rate of the coating liquid sent to the coating tank 1.
【００１０】このように塗布液タンクを二つとし、塗工
タンクへ塗布液を送り込む循環タンクと、塗工タンク上
縁部でオーバーフローし還流してくる塗布液を受ける脱
泡タンクとに機能を分けて分担させることにより、さら
に塗布液を濾過して清浄化，粘度の均一化，分散の均一
化を図るためのフィルターを、塗工タンクへ塗布液を送
り込む塗布液タンクの前段に付設することにより、塗工
タンク上縁部よりオーバーフローする塗布液量が大幅に
変動しても塗工タンクに送り込まれる塗布液流量をほぼ
一定に保つことが可能となり、塗工タンクの容積に比し
て比較的体積の大きい基体に対しても、また基体の浸
漬，引き上げの速度を比較的速くしても、十分に膜厚均
一で均質なサブミクロンオーダーの薄膜を得ることが可
能となる。As described above, the two coating liquid tanks are provided, and the circulation tank for feeding the coating liquid to the coating tank and the defoaming tank for receiving the coating liquid which overflows and refluxes at the upper edge of the coating tank are provided. A filter for separating and sharing the coating solution to further filter and clean the coating solution, to make the viscosity uniform, and to make the dispersion uniform, should be installed in front of the coating solution tank that sends the coating solution to the coating tank. This makes it possible to keep the flow rate of the coating liquid sent to the coating tank almost constant even if the amount of coating liquid overflowing from the upper edge of the coating tank fluctuates significantly. Even if the substrate has a large target volume, and even if the speed of dipping and lifting of the substrate is relatively high, it is possible to obtain a uniform thin film having a uniform thickness and a submicron order.
【００１１】さらに塗布液が減少してきた場合、脱泡タ
ンクに設けられた供給口から塗布液を注ぎ足すことがで
きる。注ぎ足された塗布液は供給口に連結された螺旋状
配管を経ることにより、脱泡タンク内の塗布液面に落下
するのではなく、非常に緩やかな傾斜を経て塗布液中に
注がれるので供給による気泡の発生はかなり少なくな
る。When the amount of the coating liquid further decreases, the coating liquid can be added from a supply port provided in the defoaming tank. The added coating liquid flows through the spiral pipe connected to the supply port, so that it does not drop onto the coating liquid surface in the defoaming tank, but is poured into the coating liquid through a very gentle slope. Therefore, generation of bubbles due to the supply is considerably reduced.
【００１２】[0012]
【発明の効果】この発明においては、円筒状基体をその
円筒軸をほぼ鉛直に保持した状態で、塗布液に浸漬し、
塗布液から外部に引き上げることにより前記円筒状基体
の外表面に塗布液を塗布する塗布装置において、塗布液
を収容しており前記円筒状基体が浸漬される塗工タンク
と、少なくとも塗布液中の泡の発生を抑える脱泡タンク
と塗布液を塗工タンクに循環させる循環タンクを有し、
塗布液を循環タンクの下部から圧送ポンプで塗工タンク
下部に送り込み，塗工タンク上縁部からオーバーフロー
させて脱泡タンクに還流させ、脱泡タンクの下部から循
環タンクの塗布液中に送り込む塗布液循環機構を備える
とともに脱泡タンクには塗布液の供給口を設けたことを
特徴とする。また、前記供給口から脱泡タンクへ供給さ
れる塗布液は傾斜の緩い配管を経由して供給されること
を特徴とする。さらに、前記傾斜の緩い配管は螺旋状で
あることを特徴とする。そして、脱泡タンクから循環タ
ンクへ循環路にフィルターを設けたことを特徴とする。According to the present invention, a cylindrical substrate is immersed in a coating solution while its cylindrical axis is held substantially vertically.
In a coating apparatus for coating a coating liquid on the outer surface of the cylindrical substrate by pulling up from the coating liquid to the outside, a coating tank containing the coating liquid and immersing the cylindrical substrate, at least a coating tank It has a defoaming tank that suppresses the generation of foam and a circulation tank that circulates the coating solution to the coating tank.
The coating liquid is sent from the lower part of the circulation tank to the lower part of the coating tank by a pressure pump, overflows from the upper edge of the coating tank, returns to the defoaming tank, and is fed from the lower part of the defoaming tank into the coating liquid in the circulation tank. A liquid circulation mechanism is provided, and a supply port for a coating liquid is provided in the defoaming tank. Further, the application liquid supplied from the supply port to the defoaming tank is supplied via a pipe having a gentle inclination. Further, the gently inclined pipe is helical. A filter is provided in the circulation path from the defoaming tank to the circulation tank.
【００１３】このような構成の塗布装置とすることによ
り、塗布液中の気泡の発生を少なくするとともに、また
発生した気泡の後工程への移動を少なくし、円筒状基体
の外表面に成膜むらがなく十分に膜厚均一で均質なサブ
ミクロンオーダーの薄膜を浸漬塗布することができ、か
つ、塗工タンクの容積に対する基体の大きさ、基体の浸
漬，引き上げの速度の制約を大幅に低減することが可能
となる。[0013] With the coating apparatus having such a configuration, the generation of bubbles in the coating liquid is reduced, and the generated bubbles are less likely to move to the subsequent process, so that the film is formed on the outer surface of the cylindrical substrate. Dip coating of submicron-order thin film with uniform thickness and uniformity is possible without unevenness, and drastically reduces restrictions on substrate size, substrate immersion and lifting speed with respect to coating tank volume. It is possible to do.
【図１】この発明の塗布装置の一実施例の概念図FIG. 1 is a conceptual diagram of one embodiment of a coating apparatus of the present invention.
【図２】従来の塗布装置の一例の概念図FIG. 2 is a conceptual diagram of an example of a conventional coating apparatus.
１ 塗工タンク ２ 循環タンク ３ 塗布液 ４，７，８ 配管 ６ 圧送ポンプ ９ 樋 １０ 円筒状基体 １１ 螺旋状配管 １２ 脱泡タンク １３ 供給口 １４ フィルター DESCRIPTION OF SYMBOLS 1 Coating tank 2 Circulation tank 3 Coating liquid 4, 7, 8 Piping 6 Pressure pump 9 Gutter 10 Cylindrical base 11 Spiral piping 12 Defoaming tank 13 Supply port 14 Filter
Claims (4)
持した状態で、塗布液に浸漬し、塗布液から外部に引き
上げることにより前記円筒状基体の外表面に塗布液を塗
布する塗布装置において、塗布液を収容しており前記円
筒状基体が浸漬される塗工タンクと、少なくとも塗布液
中の泡の発生を抑える脱泡タンクと塗布液を塗工タンク
に循環させる循環タンクを有し、塗布液を循環タンクの
下部から圧送ポンプで塗工タンク下部に送り込み，塗工
タンク上縁部からオーバーフローさせて脱泡タンクに還
流させ、脱泡タンクの下部から循環タンクの塗布液中に
送り込む塗布液循環機構を備えるとともに脱泡タンクに
は塗布液の供給口を設けたことを特徴とする塗布装置。A coating apparatus for applying a coating liquid to an outer surface of a cylindrical substrate by immersing the cylindrical substrate in a coating liquid while keeping its cylindrical axis substantially vertical, and pulling the coating liquid out of the coating liquid. In the, has a coating tank containing the coating liquid and the cylindrical substrate is immersed, a defoaming tank that suppresses at least the generation of bubbles in the coating liquid, and a circulation tank that circulates the coating liquid to the coating tank Then, the coating liquid is sent from the lower part of the circulation tank to the lower part of the coating tank by a pressure pump, overflows from the upper edge of the coating tank, is returned to the defoaming tank, and is sent from the lower part of the defoaming tank into the coating liquid in the circulation tank. A coating apparatus comprising a coating liquid circulation mechanism and a coating liquid supply port provided in a defoaming tank.
塗布液は傾斜の緩い配管を経由して供給されることを特
徴とする請求項１記載の塗布装置。2. The coating apparatus according to claim 1, wherein the coating liquid supplied from the supply port to the defoaming tank is supplied via a pipe having a gentle inclination.
を特徴とする請求項２記載の塗布装置。3. The coating apparatus according to claim 2, wherein the gently inclined pipe has a spiral shape.
ィルターを設けたことを特徴とする請求項１乃至３記載
の塗布装置。4. The coating apparatus according to claim 1, wherein a filter is provided in a circulation path from the defoaming tank to the circulation tank.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000231495A JP2002045754A (en) | 2000-07-31 | 2000-07-31 | Application device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000231495A JP2002045754A (en) | 2000-07-31 | 2000-07-31 | Application device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2002045754A true JP2002045754A (en) | 2002-02-12 |
Family
ID=18724326
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000231495A Pending JP2002045754A (en) | 2000-07-31 | 2000-07-31 | Application device |
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| Country | Link |
|---|---|
| JP (1) | JP2002045754A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011128234A (en) * | 2009-12-15 | 2011-06-30 | Canon Inc | Method of manufacturing electrophotographic photoreceptor |
| WO2011138881A1 (en) * | 2010-05-06 | 2011-11-10 | 東京エレクトロン株式会社 | Chemical supply system, substrate processing apparatus provided with same, and application/development system provided with the substrate processing apparatus |
-
2000
- 2000-07-31 JP JP2000231495A patent/JP2002045754A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011128234A (en) * | 2009-12-15 | 2011-06-30 | Canon Inc | Method of manufacturing electrophotographic photoreceptor |
| WO2011138881A1 (en) * | 2010-05-06 | 2011-11-10 | 東京エレクトロン株式会社 | Chemical supply system, substrate processing apparatus provided with same, and application/development system provided with the substrate processing apparatus |
| US9086190B2 (en) | 2010-05-06 | 2015-07-21 | Tokyo Electron Limited | Chemical supply system, substrate treatment apparatus incorporating the same, and coating and developing system incorporating the same apparatus |
| US10035173B2 (en) | 2010-05-06 | 2018-07-31 | Tokyo Electron Limited | Chemical supply system, substrate treatment apparatus incorporating the same, and coating and developing system incorporating the same apparatus |
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