JPH09164374A - Ultrasonic cleaner - Google Patents
Ultrasonic cleanerInfo
- Publication number
- JPH09164374A JPH09164374A JP32912695A JP32912695A JPH09164374A JP H09164374 A JPH09164374 A JP H09164374A JP 32912695 A JP32912695 A JP 32912695A JP 32912695 A JP32912695 A JP 32912695A JP H09164374 A JPH09164374 A JP H09164374A
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- wall
- tank
- cleaning liquid
- ultrasonic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は洗浄槽に収容した洗
浄液中に被洗浄物を浸漬して超音波を印加する超音波洗
浄装置の構造に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a structure of an ultrasonic cleaning device for immersing an object to be cleaned in a cleaning liquid contained in a cleaning tank and applying an ultrasonic wave thereto.
【０００２】[0002]
【従来の技術】液晶表示装置を始めとする各種の半導体
デバイス、あるいはそれに用いるガラス基板や半導体ウ
エハーなどの種々の基板などは、その製造工程におい
て、種々の処理液や洗浄液あるいは付着したゴミや異物
などを除去するために、幾度かの洗浄を必要とする。そ
の洗浄には従来から超音波洗浄装置が多用されている。2. Description of the Related Art Various semiconductor devices such as liquid crystal display devices, and various substrates such as glass substrates and semiconductor wafers used therefor are processed with various treatment liquids or cleaning liquids or dusts or foreign substances attached thereto. Some washing is required to remove the like. An ultrasonic cleaning device has been frequently used for the cleaning.
【０００３】そのような従来の超音波洗浄装置の例を図
３に断面図で示す。図３において、１は洗浄槽であり、
その内部には洗浄液２が収容されている。３は洗浄液２
に超音波を印加する超音波発振子であり、通常は洗浄槽
１の底部の外側に数個の発振子が配設されている。４は
各種の基板やデバイスなどの被洗浄物であり、適当な治
具やバスケットなど（図示せず）を用いて洗浄液２中に
浸漬される。５は洗浄槽１中に洗浄液２を供給する洗浄
液供給管であり、その内部に送り込まれた洗浄液２が管
壁に設けられた供給穴から洗浄槽１内に供給される。な
お、同図中の矢印は洗浄液２の流れを表している。An example of such a conventional ultrasonic cleaning apparatus is shown in a sectional view in FIG. In FIG. 3, 1 is a cleaning tank,
The cleaning liquid 2 is contained in the inside thereof. 3 is cleaning liquid 2
Is an ultrasonic oscillator for applying ultrasonic waves to the inside of the cleaning tank 1. Normally, several oscillators are arranged outside the bottom of the cleaning tank 1. Reference numeral 4 is an object to be cleaned such as various substrates and devices, which is immersed in the cleaning liquid 2 by using an appropriate jig or basket (not shown). Reference numeral 5 is a cleaning liquid supply pipe for supplying the cleaning liquid 2 into the cleaning tank 1, and the cleaning liquid 2 fed therein is supplied into the cleaning tank 1 through a supply hole provided in the pipe wall. The arrows in the figure indicate the flow of the cleaning liquid 2.
【０００４】図３に示した従来の超音波洗浄装置におい
ては、洗浄槽１内の洗浄液２中に被洗浄物４を浸漬し、
洗浄槽１の下部に配設した洗浄液供給管５から洗浄液２
を供給して洗浄槽１の上部からオーバーフローしなが
ら、洗浄槽１の底部に配設された超音波発振子３から超
音波を発振して被洗浄物４の超音波洗浄を行なってい
る。この場合、洗浄槽１中の洗浄液２の流れは図３中に
矢印で示したように洗浄槽１の下部から上部に向かう流
れとなっている。In the conventional ultrasonic cleaning apparatus shown in FIG. 3, the object to be cleaned 4 is immersed in the cleaning liquid 2 in the cleaning tank 1,
From the cleaning liquid supply pipe 5 arranged at the bottom of the cleaning tank 1 to the cleaning liquid 2
While being supplied and overflowing from the upper part of the cleaning tank 1, ultrasonic waves are oscillated from the ultrasonic oscillator 3 arranged at the bottom of the cleaning tank 1 to ultrasonically clean the object to be cleaned 4. In this case, the flow of the cleaning liquid 2 in the cleaning tank 1 is from the lower part to the upper part of the cleaning tank 1 as indicated by the arrow in FIG.
【０００５】[0005]
【発明が解決しようとする課題】しかしながら、従来の
超音波洗浄装置においては、超音波の作用により被洗浄
物４から剥落した異物やゴミが、自重により洗浄槽１の
下部へ沈降しようとする作用と、洗浄液２の流れにより
洗浄槽１の上部へ浮かび上がらされる作用とが働くため
に、洗浄槽１内に停滞してしまっていた。However, in the conventional ultrasonic cleaning apparatus, the foreign matter or dust that has fallen off from the object to be cleaned 4 due to the action of ultrasonic waves tends to settle to the lower part of the cleaning tank 1 due to its own weight. Then, the flow of the cleaning liquid 2 causes the cleaning liquid to float above the cleaning tank 1, so that the cleaning liquid has stagnated in the cleaning tank 1.
【０００６】この洗浄槽１内に停滞した異物やゴミは、
被洗浄物４の洗浄を終えて洗浄液２の供給を止めて洗浄
液２の流れが停止すると、洗浄槽１の底部に沈降して洗
浄槽１内に滞留してしまう。ところが、次に被洗浄物４
を投入して超音波を発振させると、洗浄槽１の底部が激
しく振動するために底部に滞留していた異物やゴミが再
び洗浄液２中に分散されてしまい、洗浄を終えて被洗浄
物４を洗浄液２から引き上げる際に被洗浄物４に付着し
てしまうという問題点があった。[0006] The foreign matter and dust that have stagnated in the cleaning tank 1
If the supply of the cleaning liquid 2 is stopped after the cleaning of the object to be cleaned 4 and the flow of the cleaning liquid 2 is stopped, the cleaning liquid 2 settles on the bottom of the cleaning tank 1 and stays in the cleaning tank 1. However, the next item to be cleaned 4
When the ultrasonic wave is oscillated by throwing in, the foreign matter and dust staying at the bottom of the cleaning tank 1 vibrates violently, and the foreign matter and dust remaining at the bottom are dispersed again in the cleaning liquid 2, and the cleaning is completed and the cleaning target 4 There was a problem that the product adhered to the object to be cleaned 4 when it was pulled up from the cleaning liquid 2.
【０００７】そのような超音波の発振による洗浄液２中
の異物やゴミの分散は、印加する超音波のパワーが大き
い程多くなる。例えば、洗浄液２中のパーティクル数
は、洗浄液２が静止した状態および洗浄液２を供給して
液の流れのみがある状態では、いずれも 0.8μｍ以下の
大きさのパーティクルが 100個／cc以下であるのに対し
て、洗浄液２の流れがある状態で超音波を発振すると、
300 Ｗで約 3,000個／cc程度となり、500 Ｗでは約 5,0
00個／cc以上にまで増加する。Dispersion of foreign matter and dust in the cleaning liquid 2 due to such ultrasonic wave oscillation increases as the power of the applied ultrasonic wave increases. For example, the number of particles in the cleaning liquid 2 is 100 particles / cc or less with a size of 0.8 μm or less in a state in which the cleaning liquid 2 is stationary and a state in which the cleaning liquid 2 is supplied and only the liquid flows. On the other hand, when ultrasonic waves are oscillated with the flow of the cleaning liquid 2,
Approximately 3,000 pieces / cc at 300 W, approximately 5,0 at 500 W
Increase to over 00 / cc.
【０００８】そして、通常は超音波洗浄を行なう時間が
数分間程度であるのに対して、従来の超音波洗浄装置に
おいては洗浄液２を１時間程度流しても洗浄液２中の異
物やゴミはなくならず、異物やゴミの悪影響を無くすこ
とが困難であるという問題点があった。While the ultrasonic cleaning is usually performed for several minutes, in the conventional ultrasonic cleaning apparatus, there is no foreign matter or dust in the cleaning liquid 2 even if the cleaning liquid 2 is flowed for about 1 hour. In addition, there is a problem that it is difficult to eliminate the adverse effects of foreign matter and dust.
【０００９】本発明は上記問題点を解決すべく完成した
ものであり、その目的は、被洗浄物から剥落した異物や
ゴミが洗浄槽内の洗浄液中に停滞することがなく、洗浄
を終えた被洗浄物へのそれら異物やゴミの付着を防止し
た超音波洗浄装置を提供することにある。The present invention has been completed in order to solve the above problems, and an object thereof is to complete cleaning without causing foreign matter or dust that has peeled off the object to be cleaned from remaining in the cleaning liquid in the cleaning tank. An object of the present invention is to provide an ultrasonic cleaning device that prevents the foreign matter and dust from adhering to the object to be cleaned.
【００１０】[0010]
【課題を解決するための手段】本発明の超音波洗浄装置
は、被洗浄物が浸漬される洗浄液を収容する洗浄槽と、
この洗浄槽中の洗浄液に超音波を印加する超音波発振子
とを具備し、前記洗浄槽の側壁の少なくとも一部が外壁
と内壁とから成り、かつこの内壁の下部に洗浄液の連通
部が設けられて、前記洗浄液が前記洗浄槽の内壁の内側
上部から供給され前記連通部を通って外壁の上部から洗
浄槽外へ排出されることを特徴とするものである。An ultrasonic cleaning apparatus according to the present invention comprises a cleaning tank containing a cleaning liquid in which an object to be cleaned is immersed,
An ultrasonic oscillator for applying ultrasonic waves to the cleaning liquid in the cleaning tank, wherein at least a part of the side wall of the cleaning tank is composed of an outer wall and an inner wall, and a communication portion for the cleaning liquid is provided below the inner wall. The cleaning liquid is supplied from the inner upper part of the inner wall of the cleaning tank and discharged from the upper part of the outer wall to the outside of the cleaning tank through the communicating portion.
【００１１】[0011]
【発明の実施の形態】本発明の超音波洗浄装置では、洗
浄槽の側壁の少なくとも一部を外壁と下部に洗浄液の連
通部を設けた内壁とにより構成したことによって、洗浄
槽の内部（内壁の内側部）には上部から下部へ向かう洗
浄液の流れができるので、被洗浄物から剥落した異物や
ゴミが洗浄槽内の洗浄液中に停滞することがなくなる。
従って、洗浄槽内の洗浄液は常に異物やゴミの無いきれ
いな状態が保たれるようになる。BEST MODE FOR CARRYING OUT THE INVENTION In the ultrasonic cleaning apparatus of the present invention, at least a part of the side wall of the cleaning tank is composed of an outer wall and an inner wall provided with a communicating portion for the cleaning liquid in the lower part thereof. Since the cleaning liquid flows from the upper part to the lower part in the inner part) of the cleaning liquid, foreign matters and dusts peeled off from the object to be cleaned do not stay in the cleaning liquid in the cleaning tank.
Therefore, the cleaning liquid in the cleaning tank is always kept in a clean state free from foreign matter and dust.
【００１２】また、洗浄槽の下部に向かった異物やゴミ
は、洗浄液の流れに乗って内壁下部の連通部から内壁と
外壁との間を経由して外壁上部から速やかに排出される
ため、洗浄槽の底部に滞留することがなくなる。従っ
て、次に超音波を発振させても底部に滞留していた異物
やゴミが再び洗浄液中に分散されてしまうことがなくな
るので、被洗浄物を洗浄液から引き上げる際の被洗浄物
への異物やゴミの付着の問題がなくなる。Further, foreign matters and dust that have flowed to the lower part of the cleaning tank are quickly discharged from the upper part of the outer wall through the communication part of the lower part of the inner wall and between the inner wall and the outer wall by riding on the flow of the cleaning liquid. It does not stay at the bottom of the tank. Therefore, even if the ultrasonic wave is oscillated next time, foreign matter and dust staying at the bottom will not be dispersed again in the cleaning liquid. The problem of dust adhesion disappears.
【００１３】そのため、被洗浄物への異物やゴミの付着
を気にすることなく超音波の出力を高めることができて
洗浄の効率を向上させることができるようになり、スル
ープット、すなわち単位時間当たりの洗浄処理数を増加
させることができるようになる。Therefore, the output of ultrasonic waves can be increased and the efficiency of cleaning can be improved without worrying about the adhesion of foreign matter or dust to the object to be cleaned. Throughput, that is, per unit time. The number of cleaning processes can be increased.
【００１４】以下、本発明の超音波洗浄装置について図
面に基づいて説明する。なお、本発明は以下の例に限定
されるものではなく、本発明の趣旨を逸脱しない範囲で
種々の変更・改良を加えることは何ら差し支えない。The ultrasonic cleaning apparatus of the present invention will be described below with reference to the drawings. The present invention is not limited to the following examples, and various modifications and improvements can be made without departing from the spirit of the present invention.
【００１５】図１は、本発明の超音波洗浄装置の例を示
す断面図である。図１において、11は洗浄槽であり、そ
の内部には洗浄液12が収容されている。この洗浄槽11の
側壁の少なくとも一部は外壁11ａと内壁11ｂとから成っ
ており、内壁11ｂの下部には洗浄液12の連通部11ｃが設
けられている。13は洗浄液12に超音波を印加する超音波
発振子であり、通常は洗浄槽11の底部の外側に数個の発
振子が配設されている。14は各種の基板やデバイスなど
の被洗浄物であり、適当な治具やバスケットなど（図示
せず）を用いて洗浄液12中に浸漬される。15は洗浄槽11
中に洗浄液12を供給する洗浄液供給管であり、洗浄槽11
の内壁11ｂの内側の上部に配設され、その内部に送り込
まれた洗浄液12が管壁に設けられた供給穴から洗浄槽11
内に上部から供給される。なお、同図中の矢印も洗浄液
12の流れを表している。FIG. 1 is a sectional view showing an example of the ultrasonic cleaning apparatus of the present invention. In FIG. 1, reference numeral 11 is a cleaning tank, and a cleaning liquid 12 is stored in the cleaning tank. At least a part of the side wall of the cleaning tank 11 is composed of an outer wall 11a and an inner wall 11b, and a communicating portion 11c for the cleaning liquid 12 is provided below the inner wall 11b. Reference numeral 13 denotes an ultrasonic oscillator for applying ultrasonic waves to the cleaning liquid 12, and usually several oscillators are arranged outside the bottom of the cleaning tank 11. Reference numeral 14 is an object to be cleaned such as various substrates and devices, which is immersed in the cleaning liquid 12 using an appropriate jig or basket (not shown). 15 is a cleaning tank 11
A cleaning liquid supply pipe for supplying the cleaning liquid 12 into the cleaning tank 11
The cleaning liquid 12 is disposed in the upper part of the inner wall 11b of the inner wall 11b, and the cleaning liquid 12 fed into the inner wall 11b is supplied from a supply hole provided in the pipe wall to the cleaning tank 11.
Is supplied from the top inside. The arrow in the figure also indicates the cleaning solution.
It shows 12 flows.
【００１６】図１に示した本発明の超音波洗浄装置にお
いては、洗浄槽11内の洗浄液12中に被洗浄物14を浸漬
し、洗浄槽11の上部に配設した洗浄液供給管15から洗浄
液12を供給して洗浄槽11の外壁11ａの上部からオーバー
フローしながら、洗浄槽11の底部に配設された超音波発
振子13から超音波を発振して被洗浄物14の超音波洗浄を
行なう。この場合、洗浄槽11中の洗浄液12の流れは、図
１中に矢印で示したように、洗浄槽11の内部（内壁11ｂ
の内側部）で上部から下部へ向かい、内壁11ｂの下部の
連通部11ｃから外壁11ａと内壁11ｂとの間へ出て上部へ
向かって、外壁11ａの上部から洗浄槽11の外へオーバー
フローするものとなる。In the ultrasonic cleaning apparatus of the present invention shown in FIG. 1, the object to be cleaned 14 is immersed in the cleaning liquid 12 in the cleaning tank 11, and the cleaning liquid is supplied from the cleaning liquid supply pipe 15 arranged above the cleaning tank 11. While supplying 12 and overflowing from the upper part of the outer wall 11a of the cleaning tank 11, ultrasonic waves are oscillated from the ultrasonic oscillator 13 arranged at the bottom of the cleaning tank 11 to ultrasonically clean the object to be cleaned 14. . In this case, the flow of the cleaning liquid 12 in the cleaning tank 11 is the inside of the cleaning tank 11 (inner wall 11b) as shown by the arrow in FIG.
From the upper part to the lower part of the inner wall 11b, from the lower communicating part 11c of the inner wall 11b to between the outer wall 11a and the inner wall 11b, and toward the upper part, overflowing from the upper part of the outer wall 11a to the outside of the cleaning tank 11. Becomes
【００１７】従って、被洗浄物14の周囲の洗浄液12の流
れは上から下へ向かうものとなるので、被洗浄物14から
剥落した異物やゴミが流れに乗って速やかに下部に移動
し、洗浄槽11内の洗浄液12中に停滞することがなくな
り、被洗浄物14の周囲は常に異物やゴミの無いきれいな
状態が保たれることとなる。Therefore, since the flow of the cleaning liquid 12 around the object to be cleaned 14 is from top to bottom, the foreign substances and dusts peeled off from the object to be cleaned 14 quickly move to the lower part along the flow and are cleaned. The cleaning liquid 12 in the tank 11 does not become stagnant, and the periphery of the object to be cleaned 14 is always kept in a clean state free from foreign matter and dust.
【００１８】また、洗浄槽11の下部に向かった異物やゴ
ミは、連通部11ｃを通って内壁11ｂと外壁11ａとの間を
経由して外壁11ａ上部へ向かう洗浄液12の流れに乗って
洗浄槽11の外へ速やかに排出されるため、洗浄槽11の底
部に滞留するようなことがなくなって、超音波の発振に
より洗浄液12中に分散されることがなくなるので、被洗
浄物14への異物やゴミの付着の問題がなくなる。Further, the foreign matters and dust that have flowed to the lower portion of the cleaning tank 11 ride on the flow of the cleaning liquid 12 that passes through the communication portion 11c and between the inner wall 11b and the outer wall 11a toward the upper portion of the outer wall 11a. Since it is quickly discharged to the outside of the cleaning tank 11, it does not stay at the bottom of the cleaning tank 11 and is not dispersed in the cleaning liquid 12 due to the oscillation of ultrasonic waves. There is no problem of dust and dirt sticking.
【００１９】側壁の少なくとも一部を外壁11ａと内壁11
ｂとにより構成する場合、洗浄槽11が四角形状もしくは
多角形状などであれば、そのいくつかの側壁のうち１つ
もしくは２つ以上あるいはすべての側壁を外壁11ａと内
壁11ｂとにより構成すればよく、円形状もしくは楕円形
状などであれば、その側壁の一部もしくは数カ所あるい
は全周を外壁11ａと内壁11ｂとにより構成すればよい。At least a part of the side wall is formed by the outer wall 11a and the inner wall 11
When the cleaning tank 11 is formed into a rectangular shape or a polygonal shape, the outer wall 11a and the inner wall 11b may constitute one or more or all of the side walls. In the case of a circular shape or an elliptical shape, a part or several places or the entire circumference of the side wall may be formed by the outer wall 11a and the inner wall 11b.
【００２０】また、本例においては連通部11ｃとして内
壁11ｂの下部に孔またはスリット状のものを設けた例を
示しているが、これらの形状や大きさ・配置などは、洗
浄槽11の仕様や洗浄液12の流量・超音波の強度等の条
件、被洗浄物14の種類や超音波洗浄の要求仕様、被洗浄
物14から剥落する異物やゴミなどの状態に応じて、外壁
11ａおよび内壁11ｂの構成とともに適宜設定する。Further, in this example, as the communicating portion 11c, a hole or slit-like member is provided in the lower portion of the inner wall 11b, but the shape, size, arrangement, etc. of these are the specifications of the cleaning tank 11. Or the flow rate of the cleaning liquid 12 and the strength of ultrasonic waves, the type of the object to be cleaned 14 and the required specifications for ultrasonic cleaning, and the condition such as foreign matter or dust falling off from the object to be cleaned 14
It is appropriately set together with the configurations of the inner wall 11a and the inner wall 11b.
【００２１】さらに、洗浄液供給管15も洗浄槽11上部の
適当な箇所に所望に応じて適宜配設すればよく、スポッ
ト的に供給したりシャワー状や滝状に供給してもよい。Further, the cleaning liquid supply pipe 15 may also be appropriately arranged at an appropriate place on the upper part of the cleaning tank 11 as desired, and may be supplied spotwise or in a shower shape or a waterfall shape.
【００２２】なお、洗浄液12には超音波洗浄に通常に使
用される種々の洗浄液を用いることができ、水あるいは
純水の他にも、中性洗剤液・界面活性剤添加液・電界イ
オン水・化学洗浄液・有機溶媒などから、被洗浄物14の
種類や超音波洗浄の要求仕様に応じて適宜選択すればよ
い。As the cleaning liquid 12, various cleaning liquids usually used for ultrasonic cleaning can be used. In addition to water or pure water, a neutral detergent liquid / surfactant-added liquid / electric field ion water is used. -A chemical cleaning liquid, an organic solvent or the like may be appropriately selected according to the type of the object to be cleaned 14 and the required specifications of ultrasonic cleaning.
【００２３】上記の連通部11ｃは、内壁11ｂの下部のほ
ぼ全体にわたって隙間を設けた形状のものであってもよ
い。そのような本発明の超音波洗浄装置の他の例を、図
１と同様の断面図で図２に示す。The communicating portion 11c may have a shape in which a gap is provided over almost the entire lower portion of the inner wall 11b. Another example of such an ultrasonic cleaning apparatus of the present invention is shown in FIG. 2 in a sectional view similar to FIG.
【００２４】図２において、図１と同様の箇所には同じ
符号を付してある。また、同図中の矢印は、同様に洗浄
液12の流れを示している。In FIG. 2, the same parts as those in FIG. 1 are designated by the same reference numerals. Further, the arrow in the figure also indicates the flow of the cleaning liquid 12.
【００２５】図２においては、洗浄槽11’の側壁の少な
くとも一部を外壁11ａ’と内壁11ｂ’とにより構成し、
内壁11ｂ’の下部に設けた連通部11ｃ’を、内壁11ｂ’
の下部のほぼ全体にわたって隙間を形成した形状のもの
としている。このようにして連通部11ｃ’と洗浄槽11’
の底部との間に洗浄液12の流れを遮るものをなくすこと
により、洗浄槽11’の下部における洗浄液12の流れがよ
りスムーズになり、異物やゴミの滞留をより効果的に防
止することができ、被洗浄物14への異物やゴミの付着の
問題をさらに低減できるものとなる。In FIG. 2, at least a part of the side wall of the cleaning tank 11 'is constituted by an outer wall 11a' and an inner wall 11b ',
The communication portion 11c 'provided at the bottom of the inner wall 11b' is replaced by the inner wall 11b '.
The shape is such that a gap is formed over almost the entire lower part of the. In this way, the communication part 11c 'and the cleaning tank 11'
By eliminating the obstacle that blocks the flow of the cleaning liquid 12 between the bottom of the cleaning liquid 12 and the bottom of the cleaning tank 11, the flow of the cleaning liquid 12 in the lower part of the cleaning tank 11 'becomes smoother, and the retention of foreign matter and dust can be prevented more effectively. Therefore, the problem of foreign matter or dust adhering to the object to be cleaned 14 can be further reduced.
【００２６】[0026]
【実施例】以下に本発明の超音波洗浄装置の具体例を述
べる。超音波洗浄装置としてソニックフェロー株式会社
製Ｇ−６００Ａを用い、洗浄槽として図１に示した構成
のものを用いて、本発明の超音波洗浄装置を用意した。
洗浄槽の寸法は幅約25cm×長さ約30cm×高さ約30cmとし
た。また、比較例の超音波洗浄装置として、洗浄槽を同
寸法で図３に示した従来の構成のものを用いたものも用
意した。EXAMPLES Specific examples of the ultrasonic cleaning apparatus of the present invention will be described below. An ultrasonic cleaning apparatus of the present invention was prepared using G-600A manufactured by Sonic Fellow Co., Ltd. as the ultrasonic cleaning apparatus and using the cleaning tank having the configuration shown in FIG.
The size of the cleaning tank was about 25 cm wide x 30 cm long x 30 cm high. Further, as the ultrasonic cleaning apparatus of the comparative example, a cleaning tank having the same size and the conventional structure shown in FIG. 3 was also prepared.
【００２７】それらの超音波洗浄装置により、被洗浄物
として４インチ角のガラス基板を用い、洗浄条件として
超音波発振周波数40ｋＨｚ、超音波発振出力 300Ｗ、純
水のオーバーフロー流量20リットル／分、洗浄時間３分
で超音波洗浄を行なった。そして、洗浄前後におけるガ
ラス基板上の片面に付着している異物数をゴミ検査装置
により調べて、両者の比較を行なった。なお、異物数は
パーティクルの粒径により、Ｌ１：0.5 〜１μｍ、Ｌ
２：１〜３μｍ、Ｌ３：３μｍ以上の３段階のレベルに
分けて調べた。With these ultrasonic cleaning devices, a 4-inch square glass substrate was used as the object to be cleaned, and the ultrasonic cleaning frequency was 40 kHz, the ultrasonic oscillation output was 300 W, and the overflow flow rate of pure water was 20 l / min. Ultrasonic cleaning was performed for 3 minutes. Then, the number of foreign substances adhering to one surface of the glass substrate before and after cleaning was examined by a dust inspection device, and the two were compared. The number of foreign particles depends on the particle size of the particles, L1: 0.5-1 μm, L
The test was conducted by dividing into 3 levels of 2: 1 to 3 μm and L3: 3 μm or more.
【００２８】上記の比較を本発明および従来の超音波洗
浄装置のそれぞれについて３回ずつ行なった結果を表１
にまとめた。The results of performing the above comparison three times for each of the present invention and the conventional ultrasonic cleaning apparatus are shown in Table 1.
Summarized in
【００２９】[0029]
【表１】 [Table 1]
【００３０】表１の結果から、本発明の超音波洗浄装置
によれば、Ｌ１・Ｌ２・Ｌ３のいずれのレベルの異物数
も従来の超音波洗浄装置と比べて格段に少なくなってお
り、被洗浄物への異物やゴミの付着を効果的に防止でき
たことが分かる。From the results shown in Table 1, according to the ultrasonic cleaning apparatus of the present invention, the number of foreign substances at any level of L1, L2 and L3 is significantly smaller than that of the conventional ultrasonic cleaning apparatus. It can be seen that it was possible to effectively prevent the adherence of foreign matter and dust to the wash items.
【００３１】[0031]
【発明の効果】以上詳述したように本発明の超音波洗浄
装置によれば、洗浄槽の側壁の少なくとも一部を外壁と
下部に洗浄液の連通部を設けた内壁とにより構成したこ
とによって、被洗浄物から剥落した異物やゴミが洗浄槽
内の洗浄液中に停滞することがなくなって洗浄槽内の洗
浄液が常に異物やゴミの無いきれいな状態に保つことが
できるようになるとともに、洗浄槽の下部に向かった異
物やゴミは連通部から内壁と外壁との間を経由して外壁
上部から速やかに排出されるため、洗浄槽の底部に滞留
することがなくなって超音波の発振により洗浄液中に分
散されてしまうことがなくなった。それにより、被洗浄
物を洗浄液から引き上げる際の被洗浄物への異物やゴミ
の付着を防止できた超音波洗浄装置を提供することがで
きた。As described above in detail, according to the ultrasonic cleaning apparatus of the present invention, at least a part of the side wall of the cleaning tank is constituted by the outer wall and the inner wall having the communicating portion for the cleaning liquid at the lower part thereof. The foreign substances and dust that have fallen off the objects to be cleaned will not stagnate in the cleaning liquid in the cleaning tank, and the cleaning liquid in the cleaning tank will always be kept in a clean state free of foreign substances and dust. Foreign matter and dust directed to the lower part is quickly discharged from the upper part of the outer wall from the communicating part through the space between the inner wall and the outer wall, so that it does not stay in the bottom part of the cleaning tank and is ultrasonically oscillated into the cleaning liquid. It is no longer dispersed. As a result, it was possible to provide an ultrasonic cleaning apparatus capable of preventing foreign matter and dust from adhering to the object to be cleaned when the object to be cleaned is pulled up from the cleaning liquid.
【００３２】本発明の超音波洗浄装置によれば、被洗浄
物への異物やゴミの付着を気にすることなく超音波の出
力を高めることができるので、洗浄の効率を向上させる
ことができるようになり、スループット、すなわち単位
時間当たりの洗浄処理数を増加させることができるよう
にもなる。According to the ultrasonic cleaning apparatus of the present invention, the output of ultrasonic waves can be increased without worrying about the adhesion of foreign matter or dust to the object to be cleaned, so that the cleaning efficiency can be improved. As a result, the throughput, that is, the number of cleaning processes per unit time can be increased.
【図１】本発明の超音波洗浄装置の例を示す断面図であ
る。FIG. 1 is a cross-sectional view showing an example of an ultrasonic cleaning device of the present invention.
【図２】本発明の超音波洗浄装置の他の例を示す断面図
である。FIG. 2 is a cross-sectional view showing another example of the ultrasonic cleaning device of the present invention.
【図３】従来の超音波洗浄装置の例を示す断面図であ
る。FIG. 3 is a cross-sectional view showing an example of a conventional ultrasonic cleaning device.
11、11’・・・洗浄槽 11ａ、11ａ’・・・外壁 11ｂ、11ｂ’・・・内壁 11ｃ、11ｃ’・・・連通部 12・・・洗浄液 13・・・超音波発振子 14・・・被洗浄物 15・・・洗浄液供給管 11, 11 '... Washing tank 11a, 11a' ... Outer wall 11b, 11b '... Inner wall 11c, 11c' ... Communication part 12 ... Washing liquid 13 ... Ultrasonic oscillator 14 ...・ Cleaning object 15 ・ ・ ・ Cleaning liquid supply pipe
Claims (1)
洗浄槽と、該洗浄槽中の洗浄液に超音波を印加する超音
波発振子とを具備し、前記洗浄槽の側壁の少なくとも一
部が外壁と内壁とから成り、かつ該内壁の下部に洗浄液
の連通部が設けられて、前記洗浄液が前記洗浄槽の内壁
の内側上部から供給され前記連通部を通って外壁の上部
から洗浄槽外へ排出されることを特徴とする超音波洗浄
装置。1. A cleaning tank containing a cleaning liquid in which an object to be cleaned is immersed, and an ultrasonic oscillator for applying ultrasonic waves to the cleaning liquid in the cleaning tank, at least a part of a side wall of the cleaning tank. Is composed of an outer wall and an inner wall, and a communicating portion for the cleaning liquid is provided in the lower portion of the inner wall, and the cleaning liquid is supplied from the inner upper portion of the inner wall of the cleaning tank, and passes through the communicating portion from the upper portion of the outer wall to the outside of the cleaning tank. The ultrasonic cleaning device is characterized in that it is discharged to.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32912695A JPH09164374A (en) | 1995-12-18 | 1995-12-18 | Ultrasonic cleaner |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32912695A JPH09164374A (en) | 1995-12-18 | 1995-12-18 | Ultrasonic cleaner |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH09164374A true JPH09164374A (en) | 1997-06-24 |
Family
ID=18217918
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP32912695A Pending JPH09164374A (en) | 1995-12-18 | 1995-12-18 | Ultrasonic cleaner |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH09164374A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009208064A (en) * | 2008-02-04 | 2009-09-17 | Nidec Sankyo Corp | Washing tank and washing apparatus |
| KR101506873B1 (en) * | 2013-05-10 | 2015-03-30 | 주식회사 엘지실트론 | Apparatus for cleaning a semiconductor wafer |
| US10478752B2 (en) | 2015-09-11 | 2019-11-19 | Toshiba Memory Corporation | Chemical liquid tank |
-
1995
- 1995-12-18 JP JP32912695A patent/JPH09164374A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009208064A (en) * | 2008-02-04 | 2009-09-17 | Nidec Sankyo Corp | Washing tank and washing apparatus |
| KR101506873B1 (en) * | 2013-05-10 | 2015-03-30 | 주식회사 엘지실트론 | Apparatus for cleaning a semiconductor wafer |
| US10478752B2 (en) | 2015-09-11 | 2019-11-19 | Toshiba Memory Corporation | Chemical liquid tank |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH02257632A (en) | Method and apparatus for cleaning of semiconductor device | |
| EP0675525B1 (en) | Substrate processing equipment | |
| JPH0855827A (en) | Wafer cassette and cleaning equipment using it | |
| JP3380021B2 (en) | Cleaning method | |
| KR100526192B1 (en) | Apparatus and Method For Cleaning Wafer | |
| JPH09164374A (en) | Ultrasonic cleaner | |
| JPH0695509B2 (en) | Cleaning method and its apparatus | |
| JPS6336534A (en) | Cleaning equipment | |
| JP2836888B2 (en) | Cleaning method for plate | |
| JPH0448629A (en) | Liquid processor for semiconductor wafer | |
| JPH0581314B2 (en) | ||
| JP2883844B2 (en) | High frequency cleaning method | |
| JPH0442530A (en) | Ultrasonic cleaning device | |
| JPH08332465A (en) | Washing method and washing device | |
| JP3326310B2 (en) | Ultrasonic cleaning equipment | |
| JPH06126260A (en) | Ultrasonic washing method and washing liquid | |
| JPH05291222A (en) | Method and apparatus for rinsing | |
| JPH08141481A (en) | Processing liquid circulating device | |
| JP2000294528A (en) | Cleaning device and its method | |
| JPH04281884A (en) | Washing method for washing brush | |
| JP3247322B2 (en) | Cleaning equipment | |
| JPS62286231A (en) | Cleaning apparatus | |
| JPH05206095A (en) | Ultrasonic treating tub and single wafer type substrate treating device | |
| JP2987132B2 (en) | Substrate cleaning device | |
| KR940005503B1 (en) | Wafer cleaning method and apparatus thereof |