JPH0894803A - Antireflection film for plastic optical parts - Google Patents
Antireflection film for plastic optical partsInfo
- Publication number
- JPH0894803A JPH0894803A JP6231927A JP23192794A JPH0894803A JP H0894803 A JPH0894803 A JP H0894803A JP 6231927 A JP6231927 A JP 6231927A JP 23192794 A JP23192794 A JP 23192794A JP H0894803 A JPH0894803 A JP H0894803A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- film layer
- layer
- plastic optical
- antireflection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Surface Treatment Of Optical Elements (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、レンズ、フィルター、
プリズム、ビームスプリッター等のプラスチック製光学
部品の反射防止膜に関する。The present invention relates to a lens, a filter,
The present invention relates to an antireflection film for plastic optical parts such as prisms and beam splitters.
【０００２】[0002]
【従来の技術】近年、レンズ、ミラー、プリズム等の光
学部材の素材として無機ガラスに代えてプラスチックが
多く用いられるようになってきている。その理由として
は、軽量且つ低コストにて作成することができ、更に形
状の自由度が大きいという利点を有しているためであ
る。またかかる利点を有することから、最近では光学部
品以外の各種部品にも幅広く利用されてきている。とこ
ろが、これらのプラスチックにて構成した部品は、何ら
かの表面処理を施さなければ実用上問題が多い。とく
に、プラスチックを光学部品として使用する場合には、
光学ガラスの場合と同様に光学薄膜を形成する必要があ
る。しかしながら、光学ガラスの場合には光学ガラスを
加熱して蒸着させることができるので、光学ガラスと光
学薄膜との密着製が良好であるが、プラスチックの場合
には、基板を加熱させて蒸着させることが困難なため
に、常温で蒸着させなければならず、そのためにプラス
チック基板に対する薄膜の付着力、密着性が悪くなり、
耐久製が劣るという問題があった。2. Description of the Related Art In recent years, plastics have been widely used as a material for optical members such as lenses, mirrors and prisms instead of inorganic glass. The reason for this is that it is lightweight and can be manufactured at low cost, and has the advantage that the degree of freedom in shape is great. Further, since it has such advantages, it has been widely used in various parts other than optical parts recently. However, parts made of these plastics have many practical problems if they are not subjected to any surface treatment. Especially when using plastics as optical parts,
As in the case of optical glass, it is necessary to form an optical thin film. However, in the case of optical glass, the optical glass can be heated for vapor deposition, so that the adhesion between the optical glass and the optical thin film is good, but in the case of plastic, the substrate should be heated for vapor deposition. Since it is difficult to deposit, it has to be vapor-deposited at room temperature, which deteriorates the adhesion and adhesion of the thin film to the plastic substrate.
There was a problem that it was inferior in durability.
【０００３】そこで、プラスチック基板との密着性を向
上させるために、従来、例えば特開昭６０−１５６００
１号公報には、プラスチック基板上の表面にニッケルや
クロム等の金属薄膜を形成し、この金属薄膜層の上に誘
電体薄膜層を形成して反射防止膜を構成したものが開示
されている。これは、プラスチック基板と密着性のよい
金属薄膜層を介して誘電体薄膜層を形成し、プラスチッ
ク基板と反射防止膜との密着性を改善するものである。
しかし、上記従来の反射防止膜にあっては、成膜直後の
密着性は優れているものの、徐々に密着性が低下し、数
日後には十分な密着性が得られないという問題点があっ
た。密着層としての金属薄膜層は可視光の光の吸収が問
題にならないほど薄く形成しなければならないが、その
ために安定した状態を維持することが困難である。ま
た、本来、金属薄膜層は、大気中の水分と反応してＯＨ
機との結合等が生じ、変質しやすい。そのため、従来技
術の金属薄膜層は、膜厚が極めて薄いことと併せて、成
膜直後の状態から変質してしまい、密着層としての機能
を保つことができなくなると考えられる。更に金属薄膜
は、可視光の吸収を少なくするために、従来の光学部品
の反射防止膜にあっては、金属薄膜層の膜厚を２０オン
グストローム以下にすることが必要であった。ところが
現在の技術では、このレベルの膜厚を再現性よく得るこ
とが非常に難しく、大量生産を図る上で不具合があっ
た。また特開平６−１３８３０３号にはこのような問題
を改善するためにプラスチック基板の表面に酸化クロム
薄膜層と、誘電体薄膜層からなるプラスチック製光学部
品の反射膜が開示されているが、酸化クロム層はクロム
化合物に毒性があり、更に該層は成膜後時間経過と共に
亀裂が生じやすいといった問題があり、まだ十分なもの
は得られていない。Therefore, in order to improve the adhesiveness with a plastic substrate, a conventional method, for example, JP-A-60-15600 is used.
Japanese Unexamined Patent Publication (Kokai) No. 1 discloses a structure in which a metal thin film such as nickel or chromium is formed on the surface of a plastic substrate, and a dielectric thin film layer is formed on the metal thin film layer to form an antireflection film. . This is to improve the adhesion between the plastic substrate and the antireflection film by forming the dielectric thin film layer via the metal thin film layer having good adhesion to the plastic substrate.
However, although the above-mentioned conventional antireflection film has excellent adhesiveness immediately after film formation, there is a problem that the adhesiveness gradually decreases and sufficient adhesiveness cannot be obtained after several days. It was The metal thin film layer as the adhesion layer must be formed so thin that the absorption of visible light does not matter, but it is difficult to maintain a stable state for that reason. Originally, the metal thin film layer reacts with moisture in the atmosphere to react with OH.
It is likely to be altered due to binding with machines. Therefore, it is considered that the metal thin film layer of the conventional technique is deteriorated in the state immediately after the film formation together with the extremely thin film thickness, and the function as the adhesion layer cannot be maintained. Furthermore, in order to reduce the absorption of visible light, the metal thin film requires the thickness of the metal thin film layer to be 20 angstroms or less in the conventional antireflection film for optical components. However, with the current technology, it is very difficult to obtain this level of film thickness with good reproducibility, and there is a problem in mass production. Further, Japanese Patent Laid-Open No. 6-138303 discloses a reflective film of a plastic optical component comprising a chromium oxide thin film layer and a dielectric thin film layer on the surface of a plastic substrate in order to improve such a problem. The chromium layer has a problem that the chromium compound is toxic to the chromium compound, and further, the layer is apt to be cracked with the lapse of time after the film formation.
【０００４】[0004]
【発明が解決しようとする課題】本発明は、上記の点に
鑑みてなされたもので、密着性及び耐久性に優れ、且つ
毒性が無く反射防止能に優れたプラスチック製光学部品
の反射防止膜を提供することを目的とする。SUMMARY OF THE INVENTION The present invention has been made in view of the above points, and is an antireflection film for a plastic optical component which is excellent in adhesion and durability, nontoxic, and excellent in antireflection property. The purpose is to provide.
【０００５】[0005]
【課題を解決するための手段】本発明について以下に詳
細に説明する。第一の発明はプラスチック製光学部品の
表面に一窒化一珪素薄膜層を形成し、さらに該一窒化一
珪素薄膜層上に誘電体薄膜層を設けたことを特徴とする
プラスチック製光学部品の反射防止膜、第二の発明はプ
ラスチック製光学部品の反射防止膜において、一窒化一
珪素薄膜層上に酸化アルミニウム薄膜層、一窒化一珪素
薄膜層、二酸化珪素薄膜層を設けたことを特徴とするプ
ラスチック製光学部品の反射防止膜、第三の発明はプラ
スチック製光学部品の反射防止膜において、窒化珪素薄
膜層上に酸化アルミニウム薄膜層、四窒化三珪素薄膜
層、二酸化珪素薄膜層を設けたことを特徴とするプラス
チック製光学部品の反射防止膜、第四の発明はプラスチ
ック製光学部品の反射防止膜において、一窒化一珪素薄
膜層上に酸化ランタン薄膜層、一窒化一珪素薄膜層、酸
化ジルコニウム薄膜層、弗化マグネシウム薄膜層を設け
たことを特徴とするプラスチック製光学部品の反射防止
膜、第五の発明はプラスチック製光学部品の反射防止膜
において、一窒化一珪素薄膜層上に弗化マグネシウム薄
膜層、亜酸化珪素薄膜層、酸化チタン薄膜層、弗化マグ
ネシウム薄膜層を設けたことを特徴とするプラスチック
製光学部品の反射防止膜、第六の発明はプラスチック製
光学部品の基板がポリカーボネートであることを特徴と
する第一乃至第五の発明のプラスチック製光学部品の反
射防止膜である。The present invention will be described in detail below. A first invention is a reflection of a plastic optical component, characterized in that a monosilicon mononitride thin film layer is formed on the surface of a plastic optical component, and a dielectric thin film layer is further provided on the monosilicon mononitride thin film layer. An antireflection film according to a second aspect of the present invention is an antireflection film for a plastic optical component, characterized in that an aluminum oxide thin film layer, a monosilicon mononitride thin film layer, and a silicon dioxide thin film layer are provided on the monosilicon mononitride thin film layer. A third invention is an antireflection film for plastic optical parts, wherein an aluminum oxide thin film layer, a trisilicon tetranitride thin film layer, and a silicon dioxide thin film layer are provided on the silicon nitride thin film layer. A fourth invention is an antireflection film for a plastic optical component, characterized in that, in the antireflection film for a plastic optical component, a lanthanum oxide thin film layer, a mononitride film, and A silicon thin film layer, a zirconium oxide thin film layer, and a magnesium fluoride thin film layer are provided, and an antireflection film for a plastic optical component is provided. A fifth invention is an antireflection film for a plastic optical component. An antireflection film for a plastic optical part, characterized in that a magnesium fluoride thin film layer, a silicon suboxide thin film layer, a titanium oxide thin film layer, and a magnesium fluoride thin film layer are provided on a silicon thin film layer. The antireflection film for a plastic optical component of the first to fifth inventions, wherein the substrate of the optical component is made of polycarbonate.
【０００６】[0006]
【作用】本発明の光学用基材としてはプラスチックが使
用できるが、とくにポリエチレンカーボネートが好まし
く用いられる。また本発明において設けられる一窒化一
珪素薄膜層、酸化アルミニウム薄膜層、二酸化珪素薄膜
層、酸化ランタン薄膜層、四窒化三珪素薄膜層、酸化ジ
ルコニウム薄膜層、酸化マグネシウム薄膜層、弗化マグ
ネシウム薄膜層、亜酸化珪素薄膜層、酸化チタン薄膜層
は従来より知られているような電子ビームによる蒸着法
により設けることができる。FUNCTION As the optical substrate of the present invention, plastic can be used, but polyethylene carbonate is particularly preferably used. Further, in the present invention, a monosilicon mononitride thin film layer, an aluminum oxide thin film layer, a silicon dioxide thin film layer, a lanthanum oxide thin film layer, a trisilicon tetranitride thin film layer, a zirconium oxide thin film layer, a magnesium oxide thin film layer, a magnesium fluoride thin film layer. The silicon suboxide thin film layer and the titanium oxide thin film layer can be provided by an electron beam vapor deposition method as conventionally known.
【０００７】以下に実施例に基づいて本発明を具体的に
説明するが、これらに限定されるものではない。The present invention will be specifically described below based on examples, but the invention is not limited thereto.
【０００８】〔実施例１〕屈折率ｎ＝１．５９のポリカ
ーボネートからなるプラスチック基板の表面に、第１層
として膜厚１３ｎｍの一窒化一珪素からなる薄膜層を電
子ビーム蒸着により形成した。ついで反射防止膜として
第２層に膜厚１２７ｎｍの酸化アルミニウムからなる薄
膜層を、第３層に膜厚２５４ｎｍの一窒化一珪素からな
る薄膜層を、第４層として膜厚１２７ｎｍの二酸化珪素
なる薄膜層をそれぞれ電子ビームによる蒸着法により形
成し、本発明の第一の光学部品の反射防止膜を得た。表
１に実施例の各層の物質の屈折率及び膜厚を示すExample 1 On a surface of a plastic substrate made of polycarbonate having a refractive index n = 1.59, a thin film layer made of monosilicon mononitride having a thickness of 13 nm was formed as a first layer by electron beam evaporation. Then, as the antireflection film, a thin film layer made of aluminum oxide having a film thickness of 127 nm is formed as the second layer, a thin film layer made of monosilicon mononitride having a film thickness of 254 nm is formed as the third layer, and a silicon dioxide film having a film thickness of 127 nm is formed as the fourth layer. Each thin film layer was formed by an electron beam evaporation method to obtain an antireflection film of the first optical component of the present invention. Table 1 shows the refractive index and the film thickness of the material of each layer in the examples.
【０００９】[0009]
【表１】 [Table 1]
【００１０】〔実施例２〕実施例１と同様に屈折率ｎ＝
１．５９のポリカーボネートからなるプラスチック基板
の表面に、第１層として膜厚１３ｎｍの一窒化一珪素か
らなる薄膜層を電子ビーム蒸着により形成した。ついで
反射防止膜として第２層に膜厚１２７ｎｍの酸化ランタ
ンからなる薄膜層を、第３層に膜厚１２７ｎｍの四窒化
三珪素からなる薄膜層を、第４層として膜厚１２７ｎｍ
の酸化ジルコニウムからなる薄膜層を、第５層として膜
厚１２７ｎｍの二酸化珪素からなる薄膜層をそれぞれ電
子ビームによる蒸着法により形成し、本発明の第二の光
学部品の反射防止膜を得た。表２に実施例の各層の物質
の屈折率及び膜厚を示すExample 2 As in Example 1, the refractive index n =
On the surface of the plastic substrate made of 1.59 polycarbonate, a thin film layer made of monosilicon mononitride having a thickness of 13 nm was formed as the first layer by electron beam evaporation. Then, as the antireflection film, a thin film layer of lanthanum oxide having a film thickness of 127 nm was formed as the second layer, a thin film layer of trisilicon tetranitride having a film thickness of 127 nm was formed as the third layer, and a film thickness of 127 nm was formed as the fourth layer.
The thin film layer made of zirconium oxide was formed as a fifth layer, and a thin film layer made of silicon dioxide having a film thickness of 127 nm was formed by an electron beam vapor deposition method to obtain an antireflection film of the second optical component of the present invention. Table 2 shows the refractive index and the film thickness of the material of each layer of the example.
【００１１】[0011]
【表２】 [Table 2]
【００１２】〔実施例３〕屈折率ｎ＝１．５９のポリカ
ーボネートからなるプラスチック基板の表面に、第１層
として膜厚１３ｎｍの一窒化一珪素からなる薄膜層を電
子ビーム蒸着により形成した。ついで反射防止膜として
第２層に膜厚１２７ｎｍの酸化マグネシウムからなる薄
膜層を、第３層に膜厚１２７ｎｍの一窒化一珪素からな
る薄膜層を、第４層として膜厚１２７ｎｍの弗化マグネ
シウムなる薄膜層を電子ビームによる蒸着法により形成
し、本発明の第三の光学部品の反射防止膜を得た。表３
に実施例の各層の物質の屈折率及び膜厚を示すExample 3 A thin film layer made of monosilicon mononitride having a thickness of 13 nm was formed as a first layer on the surface of a plastic substrate made of polycarbonate having a refractive index n = 1.59 by electron beam evaporation. Then, as the antireflection film, a thin film layer made of magnesium oxide having a film thickness of 127 nm was formed as a second layer, a thin film layer made of monosilicon mononitride having a film thickness of 127 nm was formed as a third layer, and a magnesium fluoride film having a film thickness of 127 nm was formed as a fourth layer. Was formed by an electron beam evaporation method to obtain an antireflection film of the third optical component of the present invention. Table 3
Shows the refractive index and the film thickness of the substance of each layer in the example.
【００１３】[0013]
【表３】 [Table 3]
【００１４】〔実施例４〕屈折率ｎ＝１．５９のポリカ
ーボネートからなるプラスチック基板の表面に、第１層
として膜厚１３ｎｍの一窒化一珪素からなる薄膜層を電
子ビーム蒸着により形成した。ついで反射防止膜として
第２層に膜厚１２７ｎｍの弗化マグネシウムからなる薄
膜層を、第３層に膜厚１２７ｎｍの亜酸化珪素からなる
薄膜層を、第４層として膜厚２５４ｎｍの酸化チタンな
る薄膜層を、第５層として膜厚１２７ｎｍの弗化マグネ
シウムからなる薄膜層を電子ビームによる蒸着法により
形成し、本発明の第四の光学部品の反射防止膜を得た。
表４に実施例の各層の物質の屈折率及び膜厚を示すExample 4 On the surface of a plastic substrate made of polycarbonate having a refractive index n = 1.59, a thin film layer made of monosilicon mononitride having a thickness of 13 nm was formed as a first layer by electron beam evaporation. Next, a 127-nm-thick thin film layer of magnesium fluoride is formed as the antireflection film, a 127-nm-thick thin film layer of silicon suboxide is formed as the third layer, and a 254-nm-thick titanium oxide film is formed as the fourth layer. The thin film layer was formed as a fifth layer of a 127 nm-thickness magnesium fluoride thin film layer by an electron beam evaporation method to obtain an antireflection film of the fourth optical component of the present invention.
Table 4 shows the refractive index and the film thickness of the substance of each layer of the example.
【００１５】[0015]
【表４】 [Table 4]
【００１６】〔比較例〕屈折率ｎ＝１．４９のアクリル
樹脂からなるプラスチック基板の表面に、第１層として
膜厚１５ｎｍの酸化クロムからなる薄膜層を電子ビーム
蒸着により形成した。ついで反射防止膜として第２層に
膜厚５５ｎｍの二酸化珪素からなる薄膜層を、第３層に
膜厚２５５ｎｍの酸化ジルコニウム及び酸化チタンから
なる薄膜層を、第４層として膜厚１２５ｎｍの二酸化珪
素なる薄膜層を電子ビームによる蒸着法により形成し、
比較用の光学部品の反射防止膜を得た。表５に比較例の
各層の物質の屈折率及び膜厚を示すComparative Example A thin film layer made of chromium oxide having a film thickness of 15 nm was formed as a first layer on the surface of a plastic substrate made of acrylic resin having a refractive index n = 1.49 by electron beam evaporation. Then, as the antireflection film, a thin film layer made of silicon dioxide having a thickness of 55 nm is formed as a second layer, a thin film layer made of zirconium oxide and titanium oxide having a thickness of 255 nm is formed as a third layer, and a silicon dioxide film having a thickness of 125 nm is formed as a fourth layer. Thin film layer is formed by an electron beam evaporation method,
An antireflection film of an optical component for comparison was obtained. Table 5 shows the refractive index and the film thickness of each layer material of the comparative example.
【００１７】[0017]
【表５】 [Table 5]
【００１８】[0018]
【効果】上記実施例及び比較例の反射防止膜の分光反射
率を測定した結果を図１乃至５に示す。第１図に示した
基板のみの反射率に比較して本発明のプラスチック製光
学部品の反射膜防止膜が良好な反射防止能を有している
ことがわかる。また本発明の反射防止膜は毒性等の点で
問題を有する酸化クロム等を用ることなく、良好な特性
を有するものを得ることが出来る。また、請求項１に記
載された反射防止膜ではプラスチック基板と反射防止膜
との密着性が優れている。請求項２に記載された反射防
止膜では反射防止膜の表面に高硬度を有する酸化珪素薄
膜層を形成したため耐摩耗性に優れている。請求項３に
記載された反射防止膜では第２層から第５層まで光学的
膜厚が同じ厚さであるため製造時の制御が容易であり、
生産効率に優れている。請求項４に記載された反射防止
膜では反射防止膜の表面に高硬度を有する弗化マグネシ
ウム薄膜層を形成したため耐摩耗性に優れている。請求
項５に記載された反射防止膜では第２層から第５層まで
光学的膜厚が同じ厚さであるため製造時の制御が容易で
あり、生産効率に優れている。請求項６に記載された反
射防止膜では特にポリカーボネートとの密着性が良好で
あるため、耐久性等に優れている。なお、比較例の反射
防止膜は時間が経過すると共に亀裂が生じ、経時特性に
問題を有しているのに対し、本発明の反射防止膜は薄膜
層形成後、時間が経過しても変化は生じず、経時特性の
点でも優れたものである。[Effect] The results of measuring the spectral reflectances of the antireflection films of the above-mentioned Examples and Comparative Examples are shown in FIGS. It can be seen that the antireflection film of the plastic optical component of the present invention has a good antireflection ability as compared with the reflectance of only the substrate shown in FIG. In addition, the antireflection film of the present invention can be provided with good properties without using chromium oxide or the like, which has a problem in terms of toxicity. Further, in the antireflection film described in claim 1, the adhesion between the plastic substrate and the antireflection film is excellent. In the antireflection film described in claim 2, since the silicon oxide thin film layer having high hardness is formed on the surface of the antireflection film, it has excellent wear resistance. In the antireflection film according to claim 3, since the optical thicknesses of the second layer to the fifth layer are the same, it is easy to control during manufacturing,
Excellent in production efficiency. In the antireflection film according to the fourth aspect, the magnesium fluoride thin film layer having high hardness is formed on the surface of the antireflection film, so that it has excellent wear resistance. In the antireflection film according to the fifth aspect, since the second layer to the fifth layer have the same optical film thickness, control at the time of manufacturing is easy and production efficiency is excellent. The antireflection film according to the sixth aspect is particularly excellent in adhesion and the like, and thus is excellent in durability and the like. Incidentally, while the antireflection film of the comparative example cracks over time and has a problem with the aging characteristics, the antireflection film of the present invention changes after a thin film layer has formed over time. It does not occur and is excellent in terms of aging characteristics.
【００１９】[0019]
【図１】本発明の実施例１の反射防止膜の分光反射率及
び基板の反射率を示す線図である。FIG. 1 is a diagram showing the spectral reflectance of an antireflection film and the reflectance of a substrate of Example 1 of the present invention.
【図２】本発明の実施例２の反射防止膜の分光反射率を
示す線図である。FIG. 2 is a diagram showing a spectral reflectance of an antireflection film of Example 2 of the present invention.
【図３】本発明の実施例３の反射防止膜の分光反射率を
示す線図である。FIG. 3 is a diagram showing a spectral reflectance of an antireflection film of Example 3 of the present invention.
【図４】本発明の実施例４の反射防止膜の分光反射率を
示す線図である。FIG. 4 is a diagram showing a spectral reflectance of an antireflection film of Example 4 of the present invention.
【図５】比較例の反射防止膜の分光反射率を示す線図で
ある。FIG. 5 is a diagram showing a spectral reflectance of an antireflection film of a comparative example.
Claims (6)
珪素薄膜層を形成し、さらに該一窒化一珪素薄膜層上に
誘電体薄膜層を設けたことを特徴とするプラスチック製
光学部品の反射防止膜。1. A reflection of a plastic optical component, characterized in that a monosilicon mononitride thin film layer is formed on the surface of the plastic optical component, and a dielectric thin film layer is further provided on the monosilicon mononitride thin film layer. Preventive film.
反射防止膜において、一窒化一珪素薄膜層上に酸化アル
ミニウム薄膜層、一窒化一珪素薄膜層、二酸化珪素薄膜
層を設けたことを特徴とするプラスチック製光学部品の
反射防止膜。2. The antireflection film for a plastic optical component according to claim 1, wherein an aluminum oxide thin film layer, a monosilicon mononitride thin film layer and a silicon dioxide thin film layer are provided on the monosilicon mononitride thin film layer. Anti-reflection film for plastic optical parts.
反射防止膜において、窒化珪素薄膜層上に酸化アルミニ
ウム薄膜層、四窒化三珪素薄膜層、二酸化珪素薄膜層を
設けたことを特徴とするプラスチック製光学部品の反射
防止膜。3. The antireflection film for a plastic optical component according to claim 1, wherein an aluminum oxide thin film layer, a trisilicon tetranitride thin film layer, and a silicon dioxide thin film layer are provided on the silicon nitride thin film layer. Anti-reflection film for plastic optical parts.
反射防止膜において、一窒化一珪素薄膜層上に酸化ラン
タン薄膜層、一窒化一珪素薄膜層、酸化ジルコニウム薄
膜層、弗化マグネシウム薄膜層を設けたことを特徴とす
るプラスチック製光学部品の反射防止膜。4. The antireflection film for a plastic optical component according to claim 1, wherein the lanthanum oxide thin film layer, the monosilicon mononitride thin film layer, the zirconium oxide thin film layer, and the magnesium fluoride thin film layer are formed on the monosilicon mononitride thin film layer. An antireflection film for a plastic optical part, which is provided with.
反射防止膜において、一窒化一珪素薄膜層上に弗化マグ
ネシウム薄膜層、亜酸化珪素薄膜層、酸化チタン薄膜
層、弗化マグネシウム薄膜層を設けたことを特徴とする
プラスチック製光学部品の反射防止膜。5. The antireflection film for a plastic optical component according to claim 1, wherein a magnesium fluoride thin film layer, a silicon suboxide thin film layer, a titanium oxide thin film layer, and a magnesium fluoride thin film layer are formed on the monosilicon mononitride thin film layer. An antireflection film for a plastic optical part, which is provided with.
ボネートであることを特徴とする請求項１乃至５のいず
れかに記載のプラスチック製光学部品の反射防止膜。6. The antireflection film for a plastic optical component according to claim 1, wherein the substrate of the plastic optical component is polycarbonate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6231927A JPH0894803A (en) | 1994-09-27 | 1994-09-27 | Antireflection film for plastic optical parts |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6231927A JPH0894803A (en) | 1994-09-27 | 1994-09-27 | Antireflection film for plastic optical parts |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0894803A true JPH0894803A (en) | 1996-04-12 |
Family
ID=16931248
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6231927A Pending JPH0894803A (en) | 1994-09-27 | 1994-09-27 | Antireflection film for plastic optical parts |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0894803A (en) |
-
1994
- 1994-09-27 JP JP6231927A patent/JPH0894803A/en active Pending
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