JPH08179113A - Production of color filter, color filter obtained by this method and liquid crystal dispaly panel constituted by disposing this color filter - Google Patents
Production of color filter, color filter obtained by this method and liquid crystal dispaly panel constituted by disposing this color filterInfo
- Publication number
- JPH08179113A JPH08179113A JP32240194A JP32240194A JPH08179113A JP H08179113 A JPH08179113 A JP H08179113A JP 32240194 A JP32240194 A JP 32240194A JP 32240194 A JP32240194 A JP 32240194A JP H08179113 A JPH08179113 A JP H08179113A
- Authority
- JP
- Japan
- Prior art keywords
- color filter
- light
- region
- shielding member
- light shielding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、色特性に優れ、表面の
平滑性が良好な液晶用カラーフィルタの製造方法、該方
法により得られたカラーフィルタ及び該カラーフィルタ
を配して構成した液晶表示パネルに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a color filter for liquid crystal having excellent color characteristics and good surface smoothness, a color filter obtained by the method and a liquid crystal formed by arranging the color filter. Regarding display panel.
【０００２】[0002]
【従来の技術】近年、フラットディスプレイパネルとし
て液晶表示パネルの研究開発は拡大の一途をたどり液晶
表示パネルの市場規模は大きく拡がっている。2. Description of the Related Art In recent years, the research and development of a liquid crystal display panel as a flat display panel has continued to expand, and the market size of the liquid crystal display panel has greatly expanded.
【０００３】液晶表示パネルを構成する構成材料を大別
すると、偏光板、ガラス基板、配向膜、液晶材料、スペ
ーサ、カラーフィルタ等に分けられるが、この中でもカ
ラーフィルタは比較的価格が高いことから妥当な価格の
液晶表示パネルを達成するためのキーポイントとなると
いわれている。The constituent materials of the liquid crystal display panel are roughly classified into a polarizing plate, a glass substrate, an alignment film, a liquid crystal material, a spacer, a color filter and the like. Among them, the color filter is relatively expensive. It is said to be a key point to achieve a reasonable price LCD panel.
【０００４】液晶用カラーフィルタは、透明基板上に形
成された赤、緑、青の三原色の画素を一絵素として多数
の絵素から構成される。各画素間には、表示コントラス
トを高める為に一定の幅を持つ遮光領域が一般に設けら
れており、通常この遮光領域は黒色であることからブラ
ックマトリクスと呼ばれている。A liquid crystal color filter is composed of a large number of picture elements, each of which has pixels of three primary colors of red, green and blue formed on a transparent substrate as one picture element. A light-shielding region having a certain width is generally provided between each pixel in order to increase the display contrast, and since this light-shielding region is usually black, it is called a black matrix.
【０００５】カラーフィルタの製造については、フォト
リソグラフィの手法を用いて形成した可染媒体を染色す
る方法、顔料分散感光性組成物を用いる方法、パターニ
ングした電極を利用した電着法の他、低コストな製造方
法として印刷法やインクジェット法で着色部分を形成す
る方法等がある。The color filter is manufactured by a method of dyeing a dyeable medium formed by using a photolithography method, a method of using a pigment-dispersed photosensitive composition, an electrodeposition method using a patterned electrode, and As a costly manufacturing method, there is a method of forming a colored portion by a printing method or an inkjet method.
【０００６】[0006]
【発明が解決しようとする課題】低コストでカラーフィ
ルタを提供できる印刷法やインクジェット法では、各着
色領域の滲みや隣り合う着色領域間の混色等を防止して
高精度の着色を実現するために、予めフォトリソグラフ
ィ法で作成できるブラックマトリクスを利用する方法が
提案されている。この方法では、ブラックマトリクスを
構成する材料に、着色剤の着色目的領域外への広がりが
抑制される特性が求められている。In the printing method and ink jet method capable of providing a color filter at a low cost, it is possible to realize high-precision coloring by preventing bleeding of each colored region and color mixture between adjacent colored regions. A method using a black matrix that can be prepared in advance by a photolithography method has been proposed. In this method, the material forming the black matrix is required to have a property of suppressing the spreading of the coloring agent outside the coloring target region.
【０００７】例えば、特開昭５９−７５２０５号公報に
は、三色の色素を基板上に配置するのにインクジェット
法を用いる技術が開示されており、色素の目的領域外へ
の広がりを防止するために、濡れ性の悪い物質で拡散防
止パターンの形成が有効であるとされている。しかしな
がら該公報においては、これを越える具体的な技術の開
示はなされていない。印刷法によるカラーフィルタの製
造方法については、特開昭６２−１０６４０７号公報に
おいて、印刷インクとして仕切り壁に対して濡れずらい
ものを推奨している。しかし、基板に対しては濡れやす
く、しきり壁に対して濡れずらいインク材料の選定は困
難であり、このような材料は非常に限定されたものであ
るのが実状である。また、特開平４−１９５１０２号公
報にはブラックマトリクスに感光性樹脂層（一般に「ポ
ジ型レジスト」という。）及びシリコーンゴム層をこの
順に形成し、ブラックマトリクスを露光用マスクとして
用いる技術事項が開示されている。即ち、基板裏面より
露光、現像することで露光部の感光性樹脂層とその上の
シリコーンゴム層を同時に除去し、表面が撥水・撥油性
のシリコーンゴム層から成りブラックマトリクスと一致
した仕切り壁のパターンを形成する。次いで、感光性樹
脂層とその上のシリコーンゴム層が除去された部分（開
孔部）に可染色性媒体層を塗布し、この可染色性媒体層
にインクを染み込ませるというものである。しかし、こ
の方法では可染色媒体層がブラックマトリクスと境界を
接するため、小さな応力が基板に加わったり、カラーフ
ィルタ製造以降の液晶表示素子製造工程における温度歪
みなどにより前記境界部に隙間が生じやすい。そして、
カラーフィルタ裏面に配置されるバックライトの光がこ
の隙間から漏れるという弊害が生ずる場合があった。For example, Japanese Patent Application Laid-Open No. 59-75205 discloses a technique of using an ink jet method to arrange dyes of three colors on a substrate, and prevents the dyes from spreading outside a target area. Therefore, it is said that the formation of the diffusion prevention pattern is effective with a substance having poor wettability. However, this publication does not disclose any specific technique beyond this. Regarding the method of manufacturing a color filter by a printing method, JP-A-62-106407 recommends a printing ink that is hard to wet the partition wall. However, it is difficult to select an ink material that easily wets the substrate and hardly wets the partition wall, and in reality, such materials are very limited. Further, JP-A-4-195102 discloses a technical matter in which a photosensitive resin layer (generally referred to as "positive resist") and a silicone rubber layer are formed in this order on a black matrix and the black matrix is used as an exposure mask. Has been done. That is, the photosensitive resin layer in the exposed area and the silicone rubber layer on it are removed at the same time by exposing and developing from the back surface of the substrate, and the surface is composed of a water-repellent / oil-repellent silicone rubber layer and is a partition wall that matches the black matrix. Pattern is formed. Then, a dyeable medium layer is applied to the portion (opening) where the photosensitive resin layer and the silicone rubber layer thereon are removed, and the dyeable medium layer is impregnated with ink. However, in this method, since the dyeable medium layer contacts the boundary with the black matrix, a small stress is applied to the substrate, and a gap is likely to be formed at the boundary due to temperature distortion in the liquid crystal display device manufacturing process after the color filter is manufactured. And
There may be a problem that the light of the backlight arranged on the back surface of the color filter leaks from this gap.
【０００８】本発明は、上述した解決すべき技術的課題
を解決し、色特性に優れると共にブラックマトリクスを
構成する遮光部材と、画素部との境界に生ずる隙間に依
存した色抜けの発生を除去したカラーフィルタの製造方
法を提供することを目的とする。本発明の別の目的は、
工程数が少なく、製造コストの削減を図ったカラーフィ
ルタの製造方法を提供することにある。The present invention solves the above-mentioned technical problems to be solved, and eliminates the occurrence of color loss depending on the gap between the light-shielding member forming the black matrix and the pixel portion, which has excellent color characteristics. An object of the present invention is to provide a method for manufacturing the color filter. Another object of the present invention is to
An object of the present invention is to provide a method for manufacturing a color filter that has a small number of steps and reduces the manufacturing cost.
【０００９】[0009]
【課題を解決するための手段及び作用】本発明は、上述
した課題を解決するため鋭意検討を行なってなされたも
のであり、下述する構成のものである。即ち、本発明の
カラーフィルタの製造方法は、画素が構成される領域と
隣接する領域に選択的に遮光部材を配した透明基板を用
意する工程、前記画素が構成される領域及び前記遮光部
材上にレジスト層を形成し、前記遮光部材をマスクとい
て露光及び現像処理を施し、前記レジスト層を部分的に
除去して前記遮光部材を露出させる工程、前記露出した
遮光部材上に撥水性を有する膜を形成し、該膜にオゾン
を照射する工程、前記画素が構成される領域及び前記撥
水性を有する膜が形成された遮光部材上にインク材料を
配する工程、とを具備することを特徴とするものであ
る。Means and Actions for Solving the Problems The present invention has been made through intensive studies in order to solve the above problems, and has the constitution described below. That is, the method of manufacturing a color filter according to the present invention includes a step of preparing a transparent substrate in which a light shielding member is selectively arranged in a region adjacent to a region in which a pixel is formed, a region in which the pixel is formed and the light shielding member Forming a resist layer on the substrate, exposing and developing the resist layer by using the light shielding member as a mask to partially expose the light shielding member, and the exposed light shielding member has water repellency. Forming a film, irradiating the film with ozone, and arranging an ink material on a region where the pixel is formed and on a light-shielding member on which the film having water repellency is formed. It is what
【００１０】本発明は、カラーフィルタ及び液晶表示パ
ネルをも包含する。本発明のカラーフィルタは、上述の
本発明のカラーフィルタの製造方法により得られたカラ
ーフィルタである。The present invention also includes a color filter and a liquid crystal display panel. The color filter of the present invention is a color filter obtained by the method of manufacturing a color filter of the present invention described above.
【００１１】本発明の液晶表示パネルは、上述の本発明
のカラーフィルタの製造方法により得られたカラーフィ
ルタを配した第１の基板と、画素電極を配した第２の基
板と、の間に液晶材料を配して構成したことを特徴とす
るものである。The liquid crystal display panel of the present invention includes a first substrate on which the color filter obtained by the method for producing a color filter of the present invention is arranged and a second substrate on which the pixel electrode is arranged. It is characterized in that a liquid crystal material is arranged.
【００１２】本発明のカラーフィルタの製造方法によれ
ば、上述した技術的課題が解決され、上述の目的が達成
される。本発明の方法によれば、遮光部材のパターン上
にもインク着色材料を配すると共に画素が構成される領
域にインク着色材料を配することができるので画素部の
色抜けがなく、高精度なカラーフィルタを提供すること
ができる。本発明の液晶表示パネルは、本発明のカラー
フィルタを配して構成したことで、優れた画像表示を安
定して行ない得る。According to the method for manufacturing a color filter of the present invention, the above-mentioned technical problems are solved and the above-mentioned object is achieved. According to the method of the present invention, it is possible to dispose the ink coloring material also on the pattern of the light shielding member and to dispose the ink coloring material in the region where the pixel is formed, so that there is no color loss in the pixel portion and high accuracy. A color filter can be provided. Since the liquid crystal display panel of the present invention is configured by disposing the color filter of the present invention, excellent image display can be stably performed.
【００１３】以下、図面を参照しながら本発明について
説明する。The present invention will be described below with reference to the drawings.
【００１４】図１〜図３は、本発明のカラーフィルタの
製造方法の工程の１例を模式的に示した図である。本発
明のカラーフィルタの製造方法においては、ガラス基板
等の光透過性基板１上にブラックマトリクス等の遮光部
材２を配した基板を用意する（図１）。ここで３は画素
が構成される領域である。次いで、画素が構成される領
域３及び遮光部材２上にレジスト層４を形成する（図
２）。レジスト層は非露光部が現像工程で除去されるネ
ガ型レジスト層とし、遮光部材２をマスクとして、遮光
部材２が配された面の裏面より紫外線光等の光６を照射
する（図２）。図２において、５は露光用照明系であ
る。次いで現像処理を施すことにより、光が照射されな
かった遮光部材２上のレジスト層を除去する。これによ
り、遮光部材２が露出する。露出した遮光部材２上及び
レジスト層４上に撥水性を有する膜７を形成する（図３
（Ａ））。撥水性を有する膜７は、例えばシランカップ
リング剤を用いて減圧雰囲気下でプラズマ重合法または
蒸着法を行なうことにより薄膜として形成することがで
きる。この場合の膜厚は、一般的には１ｎｍ〜１００ｎ
ｍの範囲とされ、望ましくは、１ｎｍ〜２０ｎｍの範囲
とするのが良い。1 to 3 are schematic views showing an example of the steps of the method for manufacturing a color filter of the present invention. In the color filter manufacturing method of the present invention, a substrate in which a light-shielding member 2 such as a black matrix is arranged on a light-transmitting substrate 1 such as a glass substrate is prepared (FIG. 1). Here, 3 is a region where pixels are formed. Next, a resist layer 4 is formed on the region 3 where the pixel is formed and the light shielding member 2 (FIG. 2). The resist layer is a negative type resist layer whose non-exposed portion is removed in the developing step, and the light shielding member 2 is used as a mask to irradiate light 6 such as ultraviolet light from the back surface of the surface on which the light shielding member 2 is arranged (FIG. 2). . In FIG. 2, 5 is an exposure illumination system. Then, a development process is performed to remove the resist layer on the light shielding member 2 which is not irradiated with light. As a result, the light blocking member 2 is exposed. A film 7 having water repellency is formed on the exposed light shielding member 2 and the resist layer 4 (see FIG. 3).
(A)). The water-repellent film 7 can be formed as a thin film by performing a plasma polymerization method or a vapor deposition method under a reduced pressure atmosphere using, for example, a silane coupling agent. The film thickness in this case is generally 1 nm to 100 n.
The range is m, preferably 1 nm to 20 nm.
【００１５】次いで、画素が構成される領域に形成され
ていたレジスト層４を除去する（図３（Ｂ））。これに
より遮光部材２上にのみ撥水層７が残ることになり、こ
の部分は、撥水性、撥油性を呈する。続いて撥水層７に
オゾンを照射する。オゾンの照射により撥水層７の撥水
性、撥油性が減少する。これにより撥水層７の撥水性、
撥油性が制御できるので、遮光部材２上に適度なはみ出
し部分をもった状態でインク材料８を画素を構成する領
域３に配することができる（図３（Ｃ））。ここでは、
撥水性、撥油性のない画素を構成する領域３（親水性）
にインク材料８を配し、インク材料の表面エネルギー、
インク材料の乾燥、固化時間と制御された遮光部材２の
撥水性、撥油性の組み合わせにより、インク材料８の形
状を最適に制御できる。本発明においては、インク材料
の噴射法（所謂「インクジェット法」）や転写法等を採
用することで、高精度で着色部の色抜けの無い液晶表示
用カラーフィルタの製造が可能となる。本説明では、図
３（Ｂ）に示したとおり、レジスト層４を除去した後
に、オゾン照射を行なったが、図３（Ａ）に示されるよ
うにレジスト層４を配した状態でオゾン照射を行なった
後に、レジスト層４を除去することもできる。図４に撥
水層７にオゾン照射を行なった場合の、照射時間と水接
触角の関係を示す。図４より理解されるようにオゾン照
射により水接触角が変化し、撥水性、撥油性を変化させ
ることができる。Next, the resist layer 4 formed in the area where the pixels are formed is removed (FIG. 3B). As a result, the water repellent layer 7 remains only on the light shielding member 2, and this portion exhibits water repellency and oil repellency. Then, the water-repellent layer 7 is irradiated with ozone. Irradiation with ozone reduces the water repellency and oil repellency of the water repellent layer 7. Thereby, the water repellency of the water repellent layer 7,
Since the oil repellency can be controlled, it is possible to dispose the ink material 8 on the region 3 forming a pixel with a proper protruding portion on the light shielding member 2 (FIG. 3C). here,
Area 3 (hydrophilic) that constitutes pixels that are neither water-repellent nor oil-repellent
The ink material 8 is arranged on the
The shape of the ink material 8 can be optimally controlled by the combination of the water repellency and the oil repellency of the light shielding member 2 which is controlled by the drying and solidifying time of the ink material. In the present invention, a color filter for liquid crystal display can be manufactured with high accuracy and with no color loss in the colored portion by adopting an ink material ejection method (so-called “inkjet method”), a transfer method, or the like. In the present description, as shown in FIG. 3B, ozone irradiation is performed after removing the resist layer 4, but as shown in FIG. 3A, ozone irradiation is performed with the resist layer 4 arranged. The resist layer 4 can be removed after the process. FIG. 4 shows the relationship between the irradiation time and the water contact angle when the water-repellent layer 7 is irradiated with ozone. As understood from FIG. 4, the water contact angle is changed by ozone irradiation, and the water repellency and the oil repellency can be changed.
【００１６】[0016]
【実施例】以下、具体的な実施例を挙げて本発明を説明
するが、本発明はこれに限定されるものではない。本発
明は、本発明の目的が達成される範囲内で構成要素を公
知技術と変更、置換したものをも包含する。EXAMPLES The present invention will be described below with reference to specific examples, but the present invention is not limited thereto. The present invention also includes modifications and substitutions of the constituent elements with known techniques within the scope of achieving the object of the present invention.
【００１７】（実施例１）ＭｏＴａ製のブラックマトリ
クスが形成されたガラス基板上にネガレジスト（東京応
化（株）製、ＯＭＲ−８５）を塗布し、８０℃の熱風中
で３０分乾燥し、膜厚１μｍのネガレジスト層を設け
た。Example 1 A negative resist (manufactured by Tokyo Ohka Kogyo Co., Ltd., OMR-85) was applied on a glass substrate on which a black matrix made of MoTa was formed, and dried in hot air at 80 ° C. for 30 minutes. A negative resist layer having a film thickness of 1 μm was provided.
【００１８】こうして得られた基板の裏面より、キヤノ
ン（株）製ＰＬＡ−５００Ｆを用いてＵＶ光（波長４５
０ｎｍ、照度１１ｍ／ｃｍ2 ）を１．５秒間照射した。
次いで、東京応化（株）製のＯＭＲ現像液及びＯＭＲリ
ンス液を用いて現像及びリンスを行ない、画素が構成さ
れる領域のみをネガレジスト層で被った。基板を真空チ
ャンバー内に設置し、該チャンバー内を５×１０-5Ｔｏ
ｒｒに減圧排気した後、圧力が５×１０-4Ｔｏｒｒとな
るまでシランカップリング剤（信越化学工業（株）製、
ヘプタデカフルオロデシルトリメトキシシラン）をチャ
ンバー内に導入した。次いで、ＲＦ電界（１３．５６Ｍ
Ｈｚ、１００Ｗ）を１５秒間にわたって印加してチャン
バー内にプラズマ放電を生じさせた。これにより基板表
面に約５ｎｍの撥水層が形成された。この基板を１００
℃に保ったネガレジスト剥離液（東京応化（株）製、剥
離液−５０２）に５秒間浸漬して洗浄を施し画素が構成
される領域を被っていたネガレジストを剥離した。次い
で基板をＩＰＡ洗浄した。以上の工程によりブラックマ
トリクスを撥水膜で被覆した。この時の画素部の水接触
角は約３０ｄｅｇであり、撥水膜で被われたブラックマ
トリクス表面の水接触角は約１２０ｄｅｇであった。From the back surface of the thus obtained substrate, UV light (wavelength 45 nm) was used using PLA-500F manufactured by Canon Inc.
Irradiation with 0 nm and an illuminance of 11 m / cm 2 ) for 1.5 seconds.
Next, development and rinsing were performed using an OMR developing solution and an OMR rinsing solution manufactured by Tokyo Ohka Co., Ltd., and only a region where a pixel was formed was covered with a negative resist layer. The substrate is placed in a vacuum chamber, and the inside of the chamber is 5 × 10 −5 To
After evacuating to rr under reduced pressure, the silane coupling agent (manufactured by Shin-Etsu Chemical Co., Ltd., until the pressure reaches 5 × 10 −4 Torr,
Heptadecafluorodecyltrimethoxysilane) was introduced into the chamber. Then RF field (13.56M
(Hz, 100 W) was applied for 15 seconds to generate plasma discharge in the chamber. As a result, a water repellent layer having a thickness of about 5 nm was formed on the surface of the substrate. 100 this board
The negative resist stripping solution (TOKYO OHKA KOGYO CO., LTD. Stripping solution-502) kept at 0 ° C. was immersed for 5 seconds for cleaning, and the negative resist covering the pixel area was stripped. The substrate was then IPA cleaned. The black matrix was covered with the water-repellent film by the above steps. At this time, the water contact angle of the pixel portion was about 30 deg, and the water contact angle of the surface of the black matrix covered with the water repellent film was about 120 deg.
【００１９】次に、撥水膜で被われたブラックマトリク
スを配した基板表面にオゾン照射を施した。具体的に
は、岩崎電気（株）製のＵＶ−オゾン洗浄装置ＯＣ−２
５０３を用いて、Ｏ3 濃度２３０ｐｐｍの雰囲気に基板
表面を４分間照射処理を行なった。Next, the surface of the substrate on which the black matrix covered with the water-repellent film was placed was irradiated with ozone. Specifically, UV-ozone cleaning device OC-2 manufactured by Iwasaki Electric Co., Ltd.
503 was used to irradiate the substrate surface for 4 minutes in an atmosphere with an O 3 concentration of 230 ppm.
【００２０】次いで、画素が構成される領域に赤、緑、
青の染料性インクをインクジェット法により噴射塗布し
た。具体的には、キヤノン（株）製ＢＪ−ＣＯＬＯＲＰ
ＲＩＮＴＥＲ、ＢＪＳ−６００Ｊを用いて染色処理を施
した。これにより、赤、緑、青の三原色の着色処理がな
されたカラーフィルタが得られた。Next, red, green, and
A blue dye-based ink was spray-applied by the inkjet method. Specifically, BJ-COLORP manufactured by Canon Inc.
Staining treatment was performed using RINTER, BJS-600J. As a result, a color filter subjected to coloring treatment of the three primary colors of red, green and blue was obtained.
【００２１】このようにして得られたカラーフィルタ
は、ブラックマトリクスと画素部境界に色抜けが無く、
平滑性及び透過性の良い高精度なものであった。The color filter thus obtained has no color loss at the boundary between the black matrix and the pixel portion,
It was a highly accurate one with good smoothness and transparency.
【００２２】このカラーフィルタを用いて液晶表示パネ
ルを作製した。A liquid crystal display panel was produced using this color filter.
【００２３】まず、カラーフィルタの画素が構成される
領域に対応して行列状に画素電極と薄膜トランジスタを
ガラス基板上に配した後、ポリイミド配向膜を設けた所
謂アクティブマトリクス基板を作製した。次いで画素が
形成される領域にインクが配されたカラーフィルタ上に
アクリル樹脂を保護膜として形成した後、透明導電膜と
してＩＴＯ（Ｉｎｄｉｕｍ Ｔｉｎ Ｏｘｉｄｅ）と配
向膜を配し対向基板を作製した。アクティブマトリクス
基板と対向基板とをシール剤を介して貼りあわせ、両基
板の隙間にＴＮ（ツイストネマチック）液晶を封入し
た。この後、液晶を封入した基板の両側に偏光子を配し
て液晶生じパネルを構成した。このようにして構成した
液晶表示パネルにＮＴＳＣ方式のテレビ信号を入力して
画像表示を行なったところ、優れた画像を安定して表示
できた。First, after arranging pixel electrodes and thin film transistors on a glass substrate in a matrix corresponding to the regions where the pixels of the color filter are formed, a so-called active matrix substrate provided with a polyimide alignment film was produced. Next, an acrylic resin was formed as a protective film on the color filter in which the ink was arranged in the region where the pixels were formed, and then ITO (Indium Tin Oxide) and the alignment film were arranged as the transparent conductive film to prepare a counter substrate. The active matrix substrate and the counter substrate were bonded together via a sealant, and TN (twisted nematic) liquid crystal was sealed in the gap between both substrates. After that, polarizers were arranged on both sides of the substrate in which the liquid crystal was sealed to form a liquid crystal generating panel. An image was displayed by inputting an NTSC television signal to the liquid crystal display panel thus constructed, and an excellent image could be stably displayed.
【００２４】（実施例２）実施例１におけるオゾン照射
時間を５分間としたこと及び染色用インクとして顔料性
インクを用いたこと以外実施例１と同様にしてカラーフ
ィルタを作製した。ここでオゾンの照射時間を実施例１
の場合と異ならせたのは実施例１で用いたインクとここ
で用いたインクとはインクの表面エネルギーが異なるた
めである。このカラーフィルタのブラックマトリクス表
面の水接触角は約６０ｄｅｇであった。このカラーフィ
ルタは、ブラックマトリクスと画素部に境界に色抜けが
無く、平滑性及び透過性に優れたものであった。このカ
ラーフィルタを用いて実施例１と同様に液晶表示パネル
を作製した。こうして得られた液晶表示パネルにＮＴＳ
Ｃ方式のテレビ信号を入力して画像表示を行なったとこ
ろ、優れた画像を安定して表示できた。Example 2 A color filter was produced in the same manner as in Example 1 except that the ozone irradiation time in Example 1 was 5 minutes and that the pigmented ink was used as the dyeing ink. Here, the ozone irradiation time is set to the value in Example 1.
The difference from the above case is that the ink used in Example 1 and the ink used here have different ink surface energies. The water contact angle of the black matrix surface of this color filter was about 60 deg. This color filter was excellent in smoothness and transparency, with no color loss at the boundary between the black matrix and the pixel portion. Using this color filter, a liquid crystal display panel was produced in the same manner as in Example 1. The liquid crystal display panel thus obtained has NTS
When an image was displayed by inputting a C system television signal, an excellent image could be stably displayed.
【００２５】[0025]
【発明の効果】以上の説明から理解されるように、本発
明の方法によれば、色特性に優れると共にブラックマト
リクスを構成する遮光部材と、画素部との境界に生ずる
隙間に依存した色抜けの発生を除去したカラーフィルタ
を提供できる。更に本発明の方法は、工程数が少なく低
コストでカラーフィルタを製造できる。また、本発明の
方法で製造されたカラーフィルタは一つの塗布層である
インク染色層を三原色に染め分けた形態であり、染色法
カラーフィルタの特徴である色特性に優れると共にブラ
ックマトリクスと画素部の境界に隙間による色抜けが生
じることも無く平滑性に優れたものとなる。As can be understood from the above description, according to the method of the present invention, the color loss depending on the gap between the light shielding member forming the black matrix and the pixel portion is excellent as well as the color characteristic. It is possible to provide a color filter that eliminates the occurrence of. Further, the method of the present invention has a small number of steps and can manufacture a color filter at low cost. In addition, the color filter manufactured by the method of the present invention has a form in which the ink dyeing layer that is one coating layer is dyed separately into three primary colors, and is excellent in the color characteristics that are characteristic of the dyeing method color filter, and the black matrix and the pixel portion There is no loss of color due to gaps at the boundary, resulting in excellent smoothness.
【００２６】このような本発明のカラーフィルタを用い
た本発明の液晶表示パネルは、優れた画像を安定して表
示できる。The liquid crystal display panel of the present invention using such a color filter of the present invention can stably display an excellent image.
【図１】本発明のカラーフィルタの製造方法の工程例を
示す模式図である。FIG. 1 is a schematic view showing an example of steps of a method for manufacturing a color filter according to the present invention.
【図２】本発明のカラーフィルタの製造方法の工程例を
示す模式図である。FIG. 2 is a schematic view showing an example of steps of a method for manufacturing a color filter of the present invention.
【図３】本発明のカラーフィルタの製造方法の工程例を
示す模式図である。FIG. 3 is a schematic view showing an example of steps of a method for manufacturing a color filter of the present invention.
【図４】撥水層にオゾン照射をした場合の、照射時間と
撥水層の水接触角の関係を示すグラフである。FIG. 4 is a graph showing the relationship between the irradiation time and the water contact angle of the water repellent layer when the water repellent layer is irradiated with ozone.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 岩田 研逸 東京都大田区下丸子３丁目30番２号キヤノ ン株式会社内 (72)発明者 小佐野 永人 東京都大田区下丸子３丁目30番２号キヤノ ン株式会社内 (72)発明者 松久 裕英 東京都大田区下丸子３丁目30番２号キヤノ ン株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Ken Iwata 3-30-2 Shimomaruko, Ota-ku, Tokyo Canon Inc. (72) Nagahito Osano 3-30-2 Shimomaruko, Ota-ku, Tokyo Canon Inc. (72) Inventor Hirohide Matsuhisa 3-30-2 Shimomaruko, Ota-ku, Tokyo Canon Inc.
Claims (10)
選択的に遮光部材を配した光透過性基板を用意する工
程、 前記画素が構成される領域及び前記遮光部材上にレジス
ト層を形成し、前記遮光部材をマスクとして露光及び現
像処理を施し、前記レジスト層を部分的に除去して前記
遮光部材を露出させる工程、 前記露出した遮光部材上に撥水性を有する膜を形成し、
該膜にオゾンを照射する工程、 前記画素が構成される領域及び前記撥水性を有する膜が
形成された遮光部材上にインク材料を配する工程、とを
具備することを特徴とするカラーフィルタの製造方法。1. A step of preparing a light transmissive substrate in which a light blocking member is selectively arranged in a region adjacent to a region where a pixel is formed, and a resist layer is formed on the region where the pixel is formed and the light blocking member. And exposing and developing the resist layer by partially exposing the light-shielding member using the light-shielding member as a mask, forming a water-repellent film on the exposed light-shielding member,
A step of irradiating the film with ozone; a step of disposing an ink material on the light-shielding member on which the region where the pixel is formed and the film having water repellency are formed. Production method.
構成される領域上に形成されたレジスト層を除去する請
求項１に記載のカラーフィルタの製造方法。2. The method of manufacturing a color filter according to claim 1, wherein the resist layer formed on a region where the pixel is formed is removed before the ozone irradiation.
インク材料を前記撥水性を有する膜が形成された前記遮
光部材上にはみ出させる請求項１に記載のカラーフィル
タの製造方法。3. The method for manufacturing a color filter according to claim 1, wherein the ink material to be arranged in a region where the pixel is formed is projected onto the light shielding member on which the film having water repellency is formed.
られていて、該領域に配される前記インク材料は、互い
に接触しない請求項３に記載のカラーフィルタの製造方
法。4. The method of manufacturing a color filter according to claim 3, wherein a plurality of regions in which the pixels are formed are provided, and the ink materials arranged in the regions do not contact each other.
リング剤を用いて、減圧雰囲気下でプラズマ重合法、ま
たは蒸着法により形成される請求項１に記載のカラーフ
ィルタの製造方法。5. The method for producing a color filter according to claim 1, wherein the water-repellent film is formed by a plasma polymerization method or a vapor deposition method under a reduced pressure atmosphere using a silane coupling agent.
は顔料性インクである請求項１に記載のカラーフィルタ
の製造方法。6. The method of manufacturing a color filter according to claim 1, wherein the ink material is a dye-based ink or a pigment-based ink.
る請求項１に記載のカラーフィルタの製造方法。7. The method of manufacturing a color filter according to claim 1, wherein the ink material is arranged by a jetting method.
請求項１に記載のカラーフィルタの製造方法。8. The method of manufacturing a color filter according to claim 1, wherein the resist is a negative resist.
いて得られたことを特徴とするカラーフィルタ。9. A color filter obtained by using the method according to any one of claims 1 to 8.
した第１の基板と、画素電極を配した第２の基板と、の
間に液晶材料を配して構成したことを特徴とする液晶表
示パネル。10. A liquid crystal characterized in that a liquid crystal material is arranged between a first substrate on which the color filter according to claim 9 is arranged and a second substrate on which a pixel electrode is arranged. Display panel.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32240194A JPH08179113A (en) | 1994-12-26 | 1994-12-26 | Production of color filter, color filter obtained by this method and liquid crystal dispaly panel constituted by disposing this color filter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32240194A JPH08179113A (en) | 1994-12-26 | 1994-12-26 | Production of color filter, color filter obtained by this method and liquid crystal dispaly panel constituted by disposing this color filter |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH08179113A true JPH08179113A (en) | 1996-07-12 |
Family
ID=18143257
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP32240194A Withdrawn JPH08179113A (en) | 1994-12-26 | 1994-12-26 | Production of color filter, color filter obtained by this method and liquid crystal dispaly panel constituted by disposing this color filter |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH08179113A (en) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6042974A (en) * | 1996-08-08 | 2000-03-28 | Canon Kabushiki Kaisha | Production processes of color filter and liquid crystal display device |
| JP2001215898A (en) * | 2000-01-28 | 2001-08-10 | Dainippon Printing Co Ltd | Image display medium and method of producing the same |
| JP2001272527A (en) * | 2000-03-27 | 2001-10-05 | Dainippon Printing Co Ltd | Color filter and its manufacturing method |
| JP2002022932A (en) * | 2000-07-13 | 2002-01-23 | Canon Inc | Optical element, method for producing the same, and liquid crystal device |
| JP2002055221A (en) * | 2000-08-11 | 2002-02-20 | Canon Inc | Optical device, method for manufacturing the same and liquid crystal device |
| US6613399B2 (en) | 1997-03-21 | 2003-09-02 | Canon Kabushiki Kaisha | Production processes of printed substrate, electron-emitting element, electron source and image-forming apparatus |
| WO2005107346A1 (en) * | 2004-04-30 | 2005-11-10 | Sharp Kabushiki Kaisha | Component placement substrate and production method thereof |
| JP2006113604A (en) * | 2005-12-13 | 2006-04-27 | Seiko Epson Corp | Substrate for forming color filter, color filter, and manufacturing method therefor |
| US7098121B2 (en) | 2002-03-14 | 2006-08-29 | Seiko Epson Corporation | Method of forming a film of predetermined pattern on a surface as well as device manufactured by employing the same, and method of manufacturing device |
-
1994
- 1994-12-26 JP JP32240194A patent/JPH08179113A/en not_active Withdrawn
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6042974A (en) * | 1996-08-08 | 2000-03-28 | Canon Kabushiki Kaisha | Production processes of color filter and liquid crystal display device |
| US6613399B2 (en) | 1997-03-21 | 2003-09-02 | Canon Kabushiki Kaisha | Production processes of printed substrate, electron-emitting element, electron source and image-forming apparatus |
| JP2001215898A (en) * | 2000-01-28 | 2001-08-10 | Dainippon Printing Co Ltd | Image display medium and method of producing the same |
| JP4533489B2 (en) * | 2000-01-28 | 2010-09-01 | 大日本印刷株式会社 | Image display medium and manufacturing method thereof |
| JP2001272527A (en) * | 2000-03-27 | 2001-10-05 | Dainippon Printing Co Ltd | Color filter and its manufacturing method |
| JP2002022932A (en) * | 2000-07-13 | 2002-01-23 | Canon Inc | Optical element, method for producing the same, and liquid crystal device |
| JP4663068B2 (en) * | 2000-07-13 | 2011-03-30 | キヤノン株式会社 | Optical element manufacturing method |
| JP4521949B2 (en) * | 2000-08-11 | 2010-08-11 | キヤノン株式会社 | Optical element manufacturing method and liquid crystal element manufacturing method |
| JP2002055221A (en) * | 2000-08-11 | 2002-02-20 | Canon Inc | Optical device, method for manufacturing the same and liquid crystal device |
| US7098121B2 (en) | 2002-03-14 | 2006-08-29 | Seiko Epson Corporation | Method of forming a film of predetermined pattern on a surface as well as device manufactured by employing the same, and method of manufacturing device |
| WO2005107346A1 (en) * | 2004-04-30 | 2005-11-10 | Sharp Kabushiki Kaisha | Component placement substrate and production method thereof |
| US7718903B2 (en) | 2004-04-30 | 2010-05-18 | Sharp Kabushiki Kaisha | Component placement substrate and production method thereof |
| JP4640151B2 (en) * | 2005-12-13 | 2011-03-02 | セイコーエプソン株式会社 | Manufacturing method of color filter |
| JP2006113604A (en) * | 2005-12-13 | 2006-04-27 | Seiko Epson Corp | Substrate for forming color filter, color filter, and manufacturing method therefor |
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