JPH08151505A - Epoxy resin composition - Google Patents

Epoxy resin composition

Info

Publication number
JPH08151505A
JPH08151505A JP29525294A JP29525294A JPH08151505A JP H08151505 A JPH08151505 A JP H08151505A JP 29525294 A JP29525294 A JP 29525294A JP 29525294 A JP29525294 A JP 29525294A JP H08151505 A JPH08151505 A JP H08151505A
Authority
JP
Japan
Prior art keywords
red phosphorus
epoxy resin
flame retardant
content
boron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP29525294A
Other languages
Japanese (ja)
Other versions
JP3343704B2 (en
Inventor
Shigehisa Ueda
茂久 上田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP29525294A priority Critical patent/JP3343704B2/en
Publication of JPH08151505A publication Critical patent/JPH08151505A/en
Application granted granted Critical
Publication of JP3343704B2 publication Critical patent/JP3343704B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE: To obtain the subject composition useful for semiconductor sealing free from antimony and a halogen, reducing an amount of another flame- retardant added, improving water vapor resistance while maintaining heat resistance, by using both red phosphorus-based and boron-based flame retardants. CONSTITUTION: This composition comprises (A) an epoxy resin (e.g. o-cresol novolak type epoxy resin), (B) a phenolic resin curing agent, (C) a curing promoter (e.g. triphenylphosphine), (D) a red phosphorus-based flame-retardant, (E) a boron-based flame retardant and (F) an inorganic filler (e.g. fused silica powder). In the component D, preferably the red phosphorus is coated with a phenol resin or a mixture of aluminum hydroxide and a phenol resin, the content of red phosphorus in the component D is 60-95wt.% and the red phosphorus has 10-70μm average particle diameter and <=150μm maximum particle diameter. The component E is zinc borate (2ZnO.3B2 O3 .3.5H2 O) and its content is 0.5-8wt.% based on the whole composition. The content of red phosphorus in the whole composition is preferably 0.1-5wt.%.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は難燃性に優れた半導体封
止用エポキシ樹脂組成物に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor encapsulating epoxy resin composition having excellent flame retardancy.

【0002】[0002]

【従来の技術】従来、ダイオード、トランジスタ、集積
回路等の電子部品は、エポキシ樹脂組成物で封止されて
いる。この組成物中には、難燃剤としてハロゲン系難燃
剤単独あるいはハロゲン系難燃剤と三酸化アンチモンと
の併用、充填材として溶融シリカ、結晶シリカ等の無機
充填材が配合されている。ところが、環境衛生の点から
ハロゲン系難燃剤、三酸化アンチモンを使用しない難燃
性エポキシ樹脂組成物が要求されている。
2. Description of the Related Art Conventionally, electronic parts such as diodes, transistors and integrated circuits have been encapsulated with an epoxy resin composition. In this composition, a halogen-based flame retardant alone or a combination of a halogen-based flame retardant and antimony trioxide is used as a flame retardant, and an inorganic filler such as fused silica or crystalline silica is blended as a filler. However, from the viewpoint of environmental hygiene, there is a demand for a flame-retardant epoxy resin composition that does not use a halogen-based flame retardant or antimony trioxide.

【0003】この要求に対して、水酸化アルミニウムや
水酸化マグネシウム等の金属水酸化物、硼素化合物等が
検討されてきたが、不純物が多くかつ多量に添加しない
と難燃効果が発現できないことから実用化には至ってい
ない。又赤燐系の難燃剤は少量の添加でも難燃効果が有
りエポキシ樹脂組成物の難燃化に有用であるが、赤燐は
微量の水分と反応しフォスフィンや腐食性の燐酸を生ず
るため、耐湿性に対する要求が極めて厳しい半導体封止
用エポキシ樹脂組成物には使用できない。このため、赤
燐粒子を水酸化アルミニウム、金属酸化物、その他の無
機化合物、熱硬化性樹脂等の有機化合物で被覆し、赤燐
の安定化を図っているが半導体封止用エポキシ樹脂組成
物に採用できるまでの水準には至っていない。
In response to this requirement, metal hydroxides such as aluminum hydroxide and magnesium hydroxide, boron compounds, etc. have been studied, but since they contain many impurities and must be added in large amounts, the flame retardant effect cannot be exhibited. It has not been put to practical use. Red phosphorus-based flame retardants have a flame-retardant effect even when added in a small amount and are useful in making an epoxy resin composition flame-retardant, but since red phosphorus reacts with a small amount of water to generate phosphine and corrosive phosphoric acid, It cannot be used for epoxy resin compositions for semiconductor encapsulation which have extremely strict requirements for moisture resistance. For this reason, red phosphorus particles are coated with aluminum hydroxide, metal oxides, other inorganic compounds, organic compounds such as thermosetting resins to stabilize red phosphorus. It hasn't reached the standard yet.

【0004】[0004]

【発明が解決しようとする課題】本発明は、この様な問
題に対して、赤燐系難燃剤と硼素系難燃剤を併用して、
各々の難燃剤の添加量を減らすことにより、耐燃性を維
持しながら耐湿性を向上させ、アンチモン及びハロゲン
フリーの半導体封止用エポキシ樹脂組成物を提供すると
ころにある。
The present invention addresses these problems by using a red phosphorus flame retardant and a boron flame retardant in combination,
It is an object of the present invention to provide an antimony-free and halogen-free epoxy resin composition for encapsulating a semiconductor by improving the moisture resistance while maintaining the flame resistance by reducing the addition amount of each flame retardant.

【0005】[0005]

【課題を解決するための手段】本発明は、(A)エポキ
シ樹脂、(B)フェノール樹脂硬化剤、(C)硬化促進
剤、(D)赤燐系難燃剤、(E)硼素系難燃剤及び
(F)無機充填材からなる半導体封止用エポキシ樹脂組
成物である。
The present invention provides (A) epoxy resin, (B) phenol resin curing agent, (C) curing accelerator, (D) red phosphorus flame retardant, (E) boron flame retardant. And (F) an epoxy resin composition for semiconductor encapsulation comprising an inorganic filler.

【0006】本発明で用いる赤燐系難燃剤には赤燐単独
も含まれるが酸化され易く、又不安定なため取扱いに難
点があり、フェノール樹脂、又は水酸化アルミニウムお
よびフェノール樹脂の混合物で赤燐の表面を予め被覆さ
れたものが好ましい。被覆された難燃剤中の赤燐の含有
量は60〜95重量%であることが好ましい。赤燐含有
量が60重量%未満だと多量に添加する必要があり、9
5重量%を超えると赤燐の安定性の点で問題がある。又
赤燐系難燃剤の粒径としては、平均粒径が10〜70μ
m、最大粒径が150μm以下のものが好ましい。平均
粒径が10μm未満だと組成物の流動性の低下をきた
し、70μmを越えると難燃剤の分散性が悪くなる。又
最大粒径が150μmを越えるとパッケージの充填性に
問題が生じる。赤燐系難燃剤としては、例えば燐化学工
業(株)のノーバレッド、ノーバエクセル等があり市場
より容易に入手することができる。全組成物中の赤燐の
含有量としては0.1〜5重量%が好ましく、0.1重
量%未満だと硼素系難燃剤を併用しても難燃性が不足す
る。又赤燐系難燃剤は可燃性で難燃剤自身が酸化して難
燃性を発揮するため、5重量%を超えると難燃剤が多過
ぎることにより難燃剤が燃焼を助ける働きをし難燃性が
不足する。
The red phosphorus-based flame retardant used in the present invention includes red phosphorus alone, but is difficult to handle because it is easily oxidized and unstable, and the red resin is a red resin or a mixture of aluminum hydroxide and phenol resin. It is preferable that the surface of phosphorus is previously coated. The content of red phosphorus in the coated flame retardant is preferably 60 to 95% by weight. If the red phosphorus content is less than 60% by weight, it is necessary to add a large amount.
If it exceeds 5% by weight, there is a problem in the stability of red phosphorus. The average particle size of the red phosphorus flame retardant is 10 to 70μ.
m, and the maximum particle size is preferably 150 μm or less. When the average particle size is less than 10 μm, the fluidity of the composition is lowered, and when it exceeds 70 μm, the dispersibility of the flame retardant is deteriorated. Further, if the maximum particle size exceeds 150 μm, there is a problem in the filling property of the package. Examples of the red phosphorus flame retardant include Noval red and Nova Excel of Phosphorus Chemical Co., Ltd., which can be easily obtained from the market. The content of red phosphorus in the entire composition is preferably 0.1 to 5% by weight, and if it is less than 0.1% by weight, the flame retardancy is insufficient even when a boron-based flame retardant is used in combination. The red phosphorus flame retardant is flammable, and the flame retardant itself oxidizes and exhibits flame retardancy. Therefore, if the amount exceeds 5% by weight, the flame retardant acts too much because the flame retardant acts to help combustion. Run out.

【0007】本発明に用いる硼素系難燃剤は硼酸塩のも
のが好ましく、とくに成形性との兼ね合いから硼酸亜鉛
(2ZnO・3B23・3.5H2O)が好ましい。こ
の硼酸亜鉛は市場より容易に入手できる。硼素系の難燃
剤は充填材量、赤燐系難燃剤の添加量によるが全組成物
中に0.5〜8重量%含有することが好ましい。0.5
重量%以下だと赤燐系難燃剤の添加量が多くなり耐湿性
が低下し、8重量%を超えると成形性が低下するためで
ある。
The boron-based flame retardant used in the present invention is preferably a borate, and zinc borate (2ZnO.3B 2 O 3 .3.5H 2 O) is particularly preferable in view of moldability. This zinc borate is easily available on the market. The boron-based flame retardant is preferably contained in the entire composition in an amount of 0.5 to 8% by weight, depending on the amount of the filler and the amount of the red phosphorus-based flame retardant added. 0.5
This is because if the amount is less than 8% by weight, the amount of the red phosphorus flame retardant added becomes large and the moisture resistance decreases, and if it exceeds 8% by weight, the formability decreases.

【0008】本発明に用いるエポキシ樹脂は、1分子中
にエポキシ基を2個以上有するモノマー、オリゴマー、
ポリマー全般を言い、その分子量、分子構造を特に限定
するものではないが、例えばビフェニル型エポキシ化合
物、ビスフェノール型エポキシ化合物、フェノールノボ
ラック型エポキシ樹脂、クレゾールノボラック型エポキ
シ樹脂、トリフェノールメタン型エポキシ化合物、アル
キル変性トリフェノールメタン型エポキシ化合物及びト
リアジン核含有エポキシ樹脂等が挙げられ、単独でも混
合して用いても差し支えない。本発明に用いるフェノー
ル樹脂硬化剤は、その分子量、分子構造を特に限定する
ものではないが、例えばフェノールノボラック樹脂、ク
レゾールノボラック樹脂、ジシクロペンタジエン変性フ
ェノール樹脂、パラキシリレン変性フェノール樹脂、テ
ルペン変性フェノール樹脂、トリフェノールメタン化合
物等が挙げられ、特にフェノールノボラック樹脂、ジシ
クロペンタジエン変性フェノール樹脂、パラキシリレン
変性フェノール樹脂、テルペン変性フェノール樹脂等が
好ましく、単独でも混合しても差し支えない。又、これ
らの硬化剤の配合量としては、エポキシ化合物のエポキ
シ基数とフェノール樹脂硬化剤の水酸基数の比は0.8
〜1.2が好ましい。
The epoxy resin used in the present invention is a monomer, oligomer, or the like having two or more epoxy groups in one molecule.
It refers to polymers in general, and its molecular weight and molecular structure are not particularly limited, but examples thereof include biphenyl type epoxy compounds, bisphenol type epoxy compounds, phenol novolac type epoxy resins, cresol novolac type epoxy resins, triphenol methane type epoxy compounds, alkyls. Examples thereof include modified triphenol methane type epoxy compounds and triazine nucleus-containing epoxy resins, which may be used alone or in combination. Phenolic resin curing agent used in the present invention, the molecular weight, although not particularly limited molecular structure, for example, phenol novolac resin, cresol novolac resin, dicyclopentadiene modified phenol resin, paraxylylene modified phenol resin, terpene modified phenol resin, Examples thereof include triphenol methane compounds. Phenol novolac resins, dicyclopentadiene-modified phenol resins, paraxylylene-modified phenol resins, terpene-modified phenol resins and the like are preferable, and they may be used alone or in combination. The amount of these curing agents blended is such that the ratio of the number of epoxy groups in the epoxy compound to the number of hydroxyl groups in the phenol resin curing agent is 0.8.
~ 1.2 is preferable.

【0009】本発明に用いる硬化促進剤は、エポキシ基
と水酸基との硬化反応を促進させるものであればよく、
一般に封止材料に使用されているものを広く使用するこ
とができる。例えば1,8−ジアザビシクロウンデセ
ン、トリフェニルホスフィン、ベンジルジメチルアミン
や2−メチルイミダゾール等が挙げられ、単独でも混合
して用いても差し支えない。無機充填材としては、溶融
シリカ粉末、結晶シリカ粉末、アルミナ、窒化珪素等が
挙げられる。これら無機充填材の配合量は成形性と信頼
性のバランスから全組成物中に60〜90重量%含有す
ることが好ましい。特に充填材量の多い配合では、球状
の溶融シリカを用いるのが一般的である。
The curing accelerator used in the present invention may be any one as long as it accelerates the curing reaction between the epoxy group and the hydroxyl group.
What is generally used as a sealing material can be widely used. Examples thereof include 1,8-diazabicycloundecene, triphenylphosphine, benzyldimethylamine and 2-methylimidazole, which may be used alone or in combination. Examples of the inorganic filler include fused silica powder, crystalline silica powder, alumina, silicon nitride and the like. The blending amount of these inorganic fillers is preferably 60 to 90% by weight based on the balance between moldability and reliability. Particularly in the case of a compound having a large amount of filler, spherical fused silica is generally used.

【0010】本発明のエポキシ樹脂組成物はエポキシ樹
脂、フェノール樹脂硬化剤、硬化促進剤、赤燐系難燃
剤、硼素系難燃剤及び無機充填材を必須成分とするが、
これ以外に必要に応じてシランカップリング剤、カーボ
ンブラック、ベンガラ等の着色剤、天然ワックス、合成
ワックス等の離型剤及びシリコーンオイル、ゴム等の低
応力添加剤等の種々の添加剤を適宜配合しても差し支え
ない。又本発明の封止用エポキシ樹脂組成物を成形材料
として製造するには、必須成分である各成分、その他の
添加剤をミキサー等によって充分に均一に混合した後、
更に熱ロール又はニーダー等で溶融混練し、冷却後粉砕
して封止材料とすることができる。これらの成形材料は
電気部品あるいは電子部品であるトランジスタ、集積回
路等の被覆、絶縁、封止等に適用することができる。
The epoxy resin composition of the present invention contains epoxy resin, phenol resin curing agent, curing accelerator, red phosphorus flame retardant, boron flame retardant and inorganic filler as essential components.
In addition to these, various additives such as a silane coupling agent, a coloring agent such as carbon black and red iron oxide, a release agent such as natural wax and a synthetic wax, and a low stress additive such as silicone oil and rubber are appropriately added as necessary. There is no problem even if it is mixed. Further, in order to produce the encapsulating epoxy resin composition of the present invention as a molding material, after the components which are essential components and other additives are sufficiently uniformly mixed by a mixer or the like,
Further, it can be melt-kneaded with a hot roll or a kneader, cooled, and then pulverized to obtain a sealing material. These molding materials can be applied to coating, insulation, sealing, etc. of transistors, integrated circuits, etc., which are electric or electronic parts.

【0011】以下本発明を実施例で具体的に説明する。 実施例1 下記組成物 オルソクレゾールノボラック型エポキシ樹脂(融点65℃、エポキシ当量20 0g/eq) 18.3重量部 フェノールノボラック樹脂硬化剤(軟化点80℃、水酸基当量104g/eq ) 9.5重量部 溶融シリカ粉末(平均粒径15μm、比表面積2.2m2/g) 67.5重量部 トリフェニルホスフィン 0.2重量部 カーボンブラック 0.5重量部 カルナバワックス 0.5重量部 赤燐系難燃剤A(水酸化アルミニウム及びフェノール樹脂の混合物で赤燐を表 面処理したもので、赤燐含有量75重量%、平均粒径40μm、最大粒径150 μm) 0.5重量部 硼酸亜鉛(2ZnO・3B23・3.5H2O) 3.0重量部 をミキサーで常温で混合し、70〜100℃で2軸ロー
ルにより混練し、冷却後粉砕して成形材料とした。更に
得られた成形材料をタブレット化し、低圧トランスファ
ー成形機にて175℃、70Kg/cm2、120秒の
条件で、耐燃テスト用試験片を成形し、又耐湿性試験用
として3×3.5 のチップを16pDIPに封止し
た。封止したテスト用素子について下記の耐湿性試験を
行なった。評価結果を表1に示す。耐燃テスト:UL−
94垂直試験(試料厚さ1.0mm)、難燃性で表し
た。耐湿性試験:封止したテスト用素子をプレッシャー
クッカー試験(125℃、100%RH)を行い、回路
のオープン不良を測定した。
The present invention will be specifically described below with reference to examples. Example 1 The following composition Orthocresol novolac type epoxy resin (melting point 65 ° C., epoxy equivalent 200 g / eq) 18.3 parts by weight Phenol novolac resin curing agent (softening point 80 ° C., hydroxyl equivalent 104 g / eq) 9.5 parts by weight Parts fused silica powder (average particle size 15 μm, specific surface area 2.2 m 2 / g) 67.5 parts by weight triphenylphosphine 0.2 parts by weight carbon black 0.5 parts by weight carnauba wax 0.5 parts by weight red phosphorus system difficult Combustion agent A (red phosphorus surface-treated with a mixture of aluminum hydroxide and phenol resin, red phosphorus content 75% by weight, average particle size 40 μm, maximum particle size 150 μm) 0.5 parts by weight zinc borate (2ZnO · 3B 2 a O 3 · 3.5H 2 O) 3.0 parts by weight at room temperature in a mixer, kneaded by biaxial roll at 70 to 100 ° C., cooled pulverized Was a molding material Te. Further, the obtained molding material was tabletted, and a flame-proof test piece was molded with a low-pressure transfer molding machine under the conditions of 175 ° C., 70 Kg / cm 2 , and 120 seconds, and 3 × 3.5 for a humidity resistance test. The chip was encapsulated in 16 pDIP. The following moisture resistance test was performed on the sealed test element. Table 1 shows the evaluation results. Flame resistance test: UL-
94 vertical test (sample thickness 1.0 mm), expressed as flame retardancy. Moisture resistance test: The sealed test element was subjected to a pressure cooker test (125 ° C., 100% RH) to measure the open circuit failure.

【0012】実施例2〜7 表1の処方に従って配合し、実施例1と同様にして成形
材料を得た。なお実施例5の赤燐系難燃剤Bは、フェノ
ール樹脂で赤燐を表面処理したもので、赤燐含有量85
重量%、平均粒径25μm、最大粒径150μmであ
る。この成形材料で試験用の封止した成形品を得、この
成形品を用いて実施例1と同様に耐燃テスト及び耐湿性
試験を行なった。評価結果を表1に示す。 比較例1〜9 表2の処方に従って配合し、実施例1と同様にして成形
材料を得た。比較例8、9のブロム化エポキシ樹脂は、
軟化点60℃、エポキシ当量360g/eqである。こ
の成形材料で試験用の封止した成形品を得、この成形品
を用いて実施例1と同様に耐燃テスト及び耐湿性試験を
行なった。試験結果を表2に示す。
Examples 2 to 7 Compounding was carried out according to the formulation shown in Table 1, and molding materials were obtained in the same manner as in Example 1. The red phosphorus flame retardant B of Example 5 was obtained by surface treating red phosphorus with a phenol resin and had a red phosphorus content of 85.
% By weight, average particle size 25 μm, maximum particle size 150 μm. A molded product sealed with a test material was obtained from this molding material, and a flame resistance test and a moisture resistance test were conducted in the same manner as in Example 1 using this molded product. Table 1 shows the evaluation results. Comparative Examples 1 to 9 Compounding was performed according to the formulation shown in Table 2, and a molding material was obtained in the same manner as in Example 1. The brominated epoxy resins of Comparative Examples 8 and 9 are
It has a softening point of 60 ° C. and an epoxy equivalent of 360 g / eq. A molded product sealed with a test material was obtained from this molding material, and a flame resistance test and a moisture resistance test were conducted in the same manner as in Example 1 using this molded product. The test results are shown in Table 2.

【0013】[0013]

【表1】 [Table 1]

【0014】[0014]

【表2】 [Table 2]

【0015】[0015]

【発明の効果】本発明の組成物により、半導体素子を封
止することにより、ハロゲン系難燃剤、三酸化アンチモ
ンを含まないの耐湿性及び難燃性に優れた半導体装置を
得ることができる。
By encapsulating a semiconductor element with the composition of the present invention, a semiconductor device which does not contain a halogen-based flame retardant or antimony trioxide and has excellent moisture resistance and flame retardancy can be obtained.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 C09C 3/10 PCC H01L 23/29 23/31 ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Internal reference number FI technical display area C09C 3/10 PCC H01L 23/29 23/31

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 (A)エポキシ樹脂、(B)フェノール
樹脂硬化剤、(C)硬化促進剤、(D)赤燐系難燃剤、
(E)硼素系難燃剤及び(F)無機充填材からなること
を特徴とする半導体封止用エポキシ樹脂組成物。
1. (A) Epoxy resin, (B) Phenolic resin curing agent, (C) Curing accelerator, (D) Red phosphorus flame retardant,
An epoxy resin composition for semiconductor encapsulation, comprising (E) a boron-based flame retardant and (F) an inorganic filler.
【請求項2】 赤燐系難燃剤が赤燐をフェノール樹脂、
又は水酸化アルミニウム及びフェノール樹脂の混合物で
被覆されてなり、該赤燐系難燃剤中の赤燐の含有量が6
0〜95重量%で、かつ平均粒径が10〜70μm、最
大粒径が150μm以下である請求項1記載の半導体封
止用エポキシ樹脂組成物。
2. The red phosphorus flame retardant is red phosphorus which is a phenol resin,
Alternatively, it is coated with a mixture of aluminum hydroxide and a phenol resin, and the content of red phosphorus in the red phosphorus flame retardant is 6
The epoxy resin composition for semiconductor encapsulation according to claim 1, which is 0 to 95% by weight, has an average particle size of 10 to 70 μm, and has a maximum particle size of 150 μm or less.
【請求項3】 硼素系難燃剤が硼酸亜鉛(2ZnO・3
23・3.5H2O)である請求項1又は請求項2記
載の半導体封止用エポキシ樹脂組成物。
3. The boron-based flame retardant is zinc borate (2ZnO.3).
B 2 O 3 .3.5H 2 O), The epoxy resin composition for semiconductor encapsulation according to claim 1 or 2.
【請求項4】 全組成物中の赤燐の含有量が0.1〜5
重量%である請求項1、請求項2又は請求項3記載の半
導体封止用エポキシ樹脂組成物。
4. The content of red phosphorus in the entire composition is 0.1-5.
The epoxy resin composition for semiconductor encapsulation according to claim 1, 2 or 3, which is in weight%.
【請求項5】 全組成物中の硼素系難燃剤の含有量が
0.5〜8重量%である請求項1、請求項2、請求項3
又は請求項4記載の半導体封止用エポキシ樹脂組成物。
5. The content of the boron-based flame retardant in the entire composition is 0.5 to 8% by weight, claim 1, claim 2, claim 3.
Alternatively, the epoxy resin composition for semiconductor encapsulation according to claim 4.
JP29525294A 1994-11-29 1994-11-29 Epoxy resin composition Expired - Fee Related JP3343704B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP29525294A JP3343704B2 (en) 1994-11-29 1994-11-29 Epoxy resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29525294A JP3343704B2 (en) 1994-11-29 1994-11-29 Epoxy resin composition

Publications (2)

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JPH08151505A true JPH08151505A (en) 1996-06-11
JP3343704B2 JP3343704B2 (en) 2002-11-11

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Cited By (13)

* Cited by examiner, † Cited by third party
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EP0783025A3 (en) * 1995-12-22 1997-10-01 Sumitomo Bakelite Co Epoxy resin composition
JPH10152599A (en) * 1996-11-21 1998-06-09 Sumitomo Bakelite Co Ltd Epoxy resin composition
JPH11106612A (en) * 1997-08-07 1999-04-20 Sumitomo Bakelite Co Ltd Epoxy resin composition and semiconductor device
WO2001005889A1 (en) * 1999-07-14 2001-01-25 Hitachi, Ltd. Epoxy resin composition for semiconductor sealing and semiconductor device
US6387537B1 (en) 1999-03-31 2002-05-14 Sumitomo Bakelite Co., Ltd. Epoxy resin composition and semiconductor device
SG90752A1 (en) * 2000-09-26 2002-08-20 Sumitomo Bakelite Co Epoxy resin composition and semiconductor device
KR100407209B1 (en) * 2000-12-06 2003-11-28 제일모직주식회사 Epoxy resin composition for encapsulating semiconductor device
WO2006129480A1 (en) * 2005-05-31 2006-12-07 Adeka Corporation Hardenable epoxy resin composition
KR100660082B1 (en) * 2005-05-12 2006-12-20 권성웅 Improved Phenolic Foam Using Novolak Type Phenolic Resin and its Method and the Composition
KR100675267B1 (en) * 2000-01-14 2007-01-26 오츠카 가가쿠 홀딩스 가부시키가이샤 Epoxy resin composition and electronic part
KR100679368B1 (en) * 1999-12-31 2007-02-05 주식회사 케이씨씨 Epoxy resin composition for sealing semiconductor element and semiconductor device using the same
EP2123712A1 (en) 2008-05-19 2009-11-25 Evonik Degussa GmbH Epoxy resin composition and electronic part
JP4720063B2 (en) * 1999-10-22 2011-07-13 日立化成工業株式会社 Photosensitive resin composition, photosensitive element using the same, method for producing resist pattern, resist pattern and resist pattern laminated substrate

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5869553A (en) * 1995-12-22 1999-02-09 Sumitomo Bakelite Company Limited Epoxy resin composition comprising red phosphorus
EP0783025A3 (en) * 1995-12-22 1997-10-01 Sumitomo Bakelite Co Epoxy resin composition
JPH10152599A (en) * 1996-11-21 1998-06-09 Sumitomo Bakelite Co Ltd Epoxy resin composition
JPH11106612A (en) * 1997-08-07 1999-04-20 Sumitomo Bakelite Co Ltd Epoxy resin composition and semiconductor device
US6387537B1 (en) 1999-03-31 2002-05-14 Sumitomo Bakelite Co., Ltd. Epoxy resin composition and semiconductor device
WO2001005889A1 (en) * 1999-07-14 2001-01-25 Hitachi, Ltd. Epoxy resin composition for semiconductor sealing and semiconductor device
JP4720063B2 (en) * 1999-10-22 2011-07-13 日立化成工業株式会社 Photosensitive resin composition, photosensitive element using the same, method for producing resist pattern, resist pattern and resist pattern laminated substrate
KR100679368B1 (en) * 1999-12-31 2007-02-05 주식회사 케이씨씨 Epoxy resin composition for sealing semiconductor element and semiconductor device using the same
KR100675267B1 (en) * 2000-01-14 2007-01-26 오츠카 가가쿠 홀딩스 가부시키가이샤 Epoxy resin composition and electronic part
SG90752A1 (en) * 2000-09-26 2002-08-20 Sumitomo Bakelite Co Epoxy resin composition and semiconductor device
KR100407209B1 (en) * 2000-12-06 2003-11-28 제일모직주식회사 Epoxy resin composition for encapsulating semiconductor device
KR100660082B1 (en) * 2005-05-12 2006-12-20 권성웅 Improved Phenolic Foam Using Novolak Type Phenolic Resin and its Method and the Composition
WO2006129480A1 (en) * 2005-05-31 2006-12-07 Adeka Corporation Hardenable epoxy resin composition
US8426504B2 (en) 2005-05-31 2013-04-23 Adeka Corporation Hardenable epoxy resin composition
JP5234584B2 (en) * 2005-05-31 2013-07-10 株式会社Adeka Epoxy resin curable composition
EP2123712A1 (en) 2008-05-19 2009-11-25 Evonik Degussa GmbH Epoxy resin composition and electronic part

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