JPH0760509A - Tip for cutting tool coated with ultra-hard film and manufacture thereof - Google Patents
Tip for cutting tool coated with ultra-hard film and manufacture thereofInfo
- Publication number
- JPH0760509A JPH0760509A JP23892493A JP23892493A JPH0760509A JP H0760509 A JPH0760509 A JP H0760509A JP 23892493 A JP23892493 A JP 23892493A JP 23892493 A JP23892493 A JP 23892493A JP H0760509 A JPH0760509 A JP H0760509A
- Authority
- JP
- Japan
- Prior art keywords
- hard film
- ultra
- film
- diamond
- tip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Cutting Tools, Boring Holders, And Turrets (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明はアルミニウム合金等の金
属やサーメット、セラミック、プラスチック系複合材料
等の構造材料、機械部品、光学部品、電子部品等の加工
に用いられる超硬質膜被覆切削工具用チップ並びにその
製造方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is for a super hard film-coated cutting tool used for processing metals such as aluminum alloys, cermets, ceramics, structural materials such as plastic composite materials, mechanical parts, optical parts and electronic parts. The present invention relates to a chip and a manufacturing method thereof.
【０００２】[0002]
【従来の技術】従来よりダイヤモンド膜を各種基材表面
に被着した切削工具は数多く提案されており、超硬合金
の表面上にダイヤモンド膜を形成したスローアウエイチ
ップも知られている。2. Description of the Related Art Conventionally, many cutting tools have been proposed in which a diamond film is attached to the surface of various base materials, and a throwaway tip having a diamond film formed on the surface of cemented carbide is also known.
【０００３】[0003]
【発明が解決しようとする課題】然し乍ら、このスロー
アウエイチップにおける、ダイヤモンドの生成膜厚は３
〜５μｍでその表面粗さは１〜３μｍＲmax と平滑で、
切刃稜の丸みの発達もわずかであるから、一般にその儘
切刃として使用されている。また切刃面を研磨仕上げし
ようとすれば全面研磨となり手数を要すると共に、均一
な仕上げは困難である。一方従来のダイヤモンド膜は基
材となる超硬合金との付着強度が低く、実際上は研磨加
工できる程の厚みも付着強度も得難いと云う基本的な問
題がある。However, in this throwaway tip, the diamond formation film thickness is 3 or less.
~ 5μm, its surface roughness is 1-3μm Rmax and smooth,
Since the roundness of the cutting edge is also slightly developed, it is generally used as the cutting edge. In addition, if the cutting edge surface is to be polished, the entire surface will be polished, which requires time and effort, and uniform finishing is difficult. On the other hand, the conventional diamond film has a low adhesion strength to the cemented carbide as the base material, and there is a fundamental problem that it is difficult to obtain a thickness and an adhesion strength that can be polished in practice.
【０００４】[0004]
【課題を解決するための手段】発明者らは、ダイヤモン
ド膜と超硬合金との付着強度、ダイヤモンド膜の表面研
磨の課題解決に当り、研磨仕上げを必要最小部分に止め
ること、基材表面に予め処理を加えて膜の付着強度を上
げることの２点に着目し、試験を重ねた。[Means for Solving the Problems] In solving the problems of adhesion strength between a diamond film and a cemented carbide and the surface polishing of a diamond film, the inventors of the present invention stopped the polishing finish at a necessary minimum portion, The test was repeated focusing on two points of increasing the adhesion strength of the film by applying a treatment in advance.
【０００５】その結果、直接切刃の構成に関与しない図
１の基材のすくい面中央部３を隅部５を除いてサンドブ
ラストをかけて段差４を設けて低くし、すくい面におい
ては高い隅部５部分上に形成された膜のみを研磨するこ
ととした。膜の形成いわゆる成膜は、公知のあるいは新
規な気相合成法で行うが、予め基材に次の処理を施して
おくこととした。As a result, the central part 3 of the rake face of the substrate shown in FIG. 1 which is not directly involved in the construction of the cutting edge is sandblasted except for the corner part 5 to provide a step 4 to lower the rake face and a high corner on the rake face. Only the film formed on the portion 5 was polished. Formation of a film So-called film formation is performed by a known or novel vapor phase synthesis method, and the substrate is preliminarily subjected to the following treatment.
【０００６】即ち基材をIa族， III族， IVb族，Vb族元
素の１種以上またはその化合物の存在下で処理して、基
材表面層の結合相金属中にその元素を存在させて気相合
成法による成膜時の結合相金属の基材表面への拡散を防
ぐ。上記処理により、超硬質膜は付着強度が高くその厚
みも従来の３〜５μｍ程度から、20μｍ超と一挙に増大
する。それにより工具寿命は改善されるものの、粗いす
くい面により切削抵抗が増大し、従来必要性の少なかっ
た生成膜表面の研磨加工がより必要となるが、すくい面
の研磨は高い隅部のみを一挙にできるので容易に短時間
で均質に行うことができる。That is, the base material is treated in the presence of one or more elements of group Ia, group III, group IVb, group Vb or a compound thereof to allow the element to be present in the binder phase metal of the surface layer of the substrate. Prevents diffusion of the binder phase metal to the surface of the substrate during film formation by the vapor phase synthesis method. By the above-mentioned treatment, the ultra-hard film has high adhesion strength and its thickness is increased from 3 to 5 μm in the past to more than 20 μm all at once. Although the tool life is improved by this, the cutting resistance increases due to the rough rake face, and it is necessary to polish the surface of the generated film, which was less necessary in the past, but the rake face is polished only at high corners. Therefore, it can be easily and uniformly carried out in a short time.
【０００７】以下実施例により本発明の内容を詳述す
る。尚実施例においては、何れも従来技術との比較よ
り、 WC-Co系に代表される超硬合金を基材とするものに
ついて示したが、炭化チタン系焼結合金等、硬質化合物
と結合金属とよりなる他のサーメットを基材とするもの
等についても実施できることは云うまでもない。また実
施例に示した実施工程乃至はその前後において、処理前
の基材表面に研削加工を行う等、既知のあるいは新しい
工程を付加しても勿論差支えない。The details of the present invention will be described below with reference to examples. In addition, in each of the examples, compared with the conventional technology, the case where the base material is a cemented carbide represented by the WC-Co system is shown. It goes without saying that the present invention can also be carried out on other cermets having a base material such as In addition, it is of course possible to add a known or new process such as grinding the surface of the base material before the treatment before or after the process shown in the examples.
【０００８】[0008]
【実施例１】図１は、本発明の効果が最も発揮される４
角隅部を切刃とするスローアウエイチップの例で、 WC-
５％Co超硬合金チップ１は、隅部５を残して、すくい面
中央部３は10〜30μｍ程度の段差４が生じる様に低く形
成されている。このチップに気相合成法によりダイヤモ
ンド膜を生成すると膜は全面に、また予め低い中央部３
にカーボンペーストを塗って形成すると、高い隅部５及
び側面中少くともコーナーＲ部６にダイヤモンド膜が形
成される。形成膜の表面粗さは１〜３μｍＲmax 程度で
あるから、比較的加工面の粗い切削はその儘でも使用可
能であるが、切削抵抗が高く、また多くの場合精度の高
い切削加工面が要求されるので、次の仕上げ加工を施
す。[Embodiment 1] FIG. 1 shows the effect of the present invention 4
An example of a throwaway tip with a cutting edge at the corner, WC-
The 5% Co cemented carbide chip 1 is formed so low that the rake face central portion 3 has a step 4 of about 10 to 30 μm while leaving the corner portion 5. When a diamond film is formed on this chip by the vapor phase synthesis method, the film is formed on the entire surface and in the lower central part 3
When the carbon paste is applied to the above, the diamond film is formed on the high corner portion 5 and the side surface and at least the corner R portion 6. Since the surface roughness of the formed film is about 1 to 3 μmRmax, it is possible to use a relatively rough surface for cutting, but a high cutting resistance and in many cases a highly accurate cutting surface is required. Therefore, the following finishing process is applied.
【０００９】隅部５表面をスカイフまたはダイヤモンド
ホイールにより表面粗さ 0.1μｍＲmax 程度以下に研磨
加工する。隅部５は高く形成されてるので複数個のチッ
プを並べて、一挙に効率よく研磨仕上げができる。また
チップのコーナーＲ部６等直接切り刃を構成する部分、
即ち逃げ面を研磨しても勿論差し支えない。尚この様な
研磨加工は、超硬合金チップ表面を予め 300℃のホウ酸
(H3BO3) 融液に20分間浸漬処理した後、熱フィラメント
ＣＶＤ装置にて、圧力 100Torr，ガス組成 H2-0.5Vol％
CH4，チップ温度 850℃で６〜10時間成膜したものによ
って行うことが出来た。成膜による膜厚は15〜20μｍ、
表面粗さ１〜２μｍＲmax 、研磨加工後の研磨箇所にお
ける残存膜厚は10〜15μｍであった。The surface of the corner 5 is ground to a surface roughness of about 0.1 μm Rmax or less using a skiff or a diamond wheel. Since the corner portion 5 is formed to be high, a plurality of chips can be arranged and efficiently polished at once. In addition, the part that directly constitutes the cutting edge, such as the corner R part 6 of the tip,
That is, it is of course possible to polish the flank. It should be noted that such polishing is performed by preliminarily treating the surface of the cemented carbide chip with boric acid at 300 ° C.
(H 3 BO 3 ) After dipping in the melt for 20 minutes, in a hot filament CVD device, pressure 100 Torr, gas composition H 2 -0.5Vol%
It was possible to use CH 4 with a chip temperature of 850 ℃ for 6-10 hours. The film thickness by film formation is 15 to 20 μm,
The surface roughness was 1 to 2 μm Rmax, and the residual film thickness at the polishing site after polishing was 10 to 15 μm.
【００１０】段差４は10〜30μｍで、成膜前の超硬合金
チップ11の隅部５にビニールテープによるマスキングを
し、 SiCサンドブラストをかけてこの形を形成した（砥
粒 SiC＃80，吹付圧力４kg/cm2，吹付時間各３０秒）。
隅部５の形状大きさは切削方向、条件により自由に選択
できる。実施例２，３はこのチップの処理方法を変えた
ものの例である。The step 4 is 10 to 30 μm, and the corner 5 of the cemented carbide chip 11 before film formation is masked with vinyl tape and subjected to SiC sandblasting to form this shape (abrasive grain SiC # 80, sprayed). Pressure 4 kg / cm 2 , spraying time 30 seconds each).
The shape and size of the corner 5 can be freely selected depending on the cutting direction and conditions. Examples 2 and 3 are examples in which the processing method of this chip is changed.
【００１１】[0011]
【実施例２】実施例１と同様の超硬合金11に熱フィラメ
ントＣＶＤ装置を使って下記条件の熱処理を行った。 熱処理 フィラメント温度 2150℃ 基材表面温度 850℃ 圧力 100Torr ガス組成 熱処理１：H2-1%CH4,1.5Hr 熱処理２：H2-1%CH4,1.5Hr 熱処理３：H2-2%CH4,1.5Hr 熱処理４：H2-2%CH4,3.5Hr ガス流量 500sccmExample 2 The same cemented carbide 11 as in Example 1 was heat-treated under the following conditions using a hot filament CVD apparatus. Heat treatment Filament temperature 2150 ℃ Base material surface temperature 850 ℃ Pressure 100Torr Gas composition Heat treatment 1: H 2 -1% CH 4 , 1.5Hr Heat treatment 2: H 2 -1% CH 4 , 1.5Hr Heat treatment 3: H 2 -2% CH 4 , 1.5Hr Heat treatment 4: H 2 -2% CH 4 , 3.5Hr Gas flow rate 500sccm
【００１２】除煤と検査 熱処理１，２，３，４を終える毎に基材を取りだし、基
材表面上に生じた炭素を主成分とする堆積物（煤）を紙
ナプキンで拭い去った後、基材表面を走査型電子顕微鏡
（ＳＥＭ）で観察し、堆積物が除去されていること、析
出物の大きさ及び量を検査した。Soot removal and inspection After the heat treatments 1, 2, 3 and 4 are finished, the base material is taken out, and the carbon-based deposit (soot) generated on the surface of the base material is wiped off with a paper napkin. The surface of the base material was observed with a scanning electron microscope (SEM) to check that the deposit was removed and the size and amount of the deposit.
【００１３】超硬質膜の被覆 堆積物の生成がなくなり、析出物の生成が飽和状態とな
った時点でダイヤモンドを被覆する工程を開始した。そ
の被覆条件は以下の通りである。 フィラメント温度 2150℃ 基板温度 850℃ 圧力 100Torr ガス組成 H2-0.5%CH4,10Hr ガス流量 500sccmCoating of ultra-hard film The process of coating diamond was started when the formation of deposits disappeared and the formation of precipitates became saturated. The coating conditions are as follows. Filament temperature 2150 ℃ Substrate temperature 850 ℃ Pressure 100Torr Gas composition H 2 -0.5% CH 4 , 10Hr Gas flow rate 500sccm
【００１４】超硬質膜を被覆した後すくい面はスカイフ
盤で高くした隅部のみをコーナーＲ逃げ面は工具研削板
で♯８００のダイヤモンドホイールを使い研磨した。After coating with the ultra-hard film, the rake face was polished only on the corners raised by the skiff machine, and the corner R flank was polished with a tool grinding plate using a # 800 diamond wheel.
【００１５】該被覆品並びに該被覆品に研磨加工を施し
たものの状態及び切削試験結果は夫々表１並びに表２に
示す通りである。The states and cutting test results of the coated article and the coated article subjected to polishing are shown in Table 1 and Table 2, respectively.
【００１６】[0016]
【表１】 [Table 1]
【００１７】[0017]
【表２】 [Table 2]
【００１８】尚、切削試験の条件は次の通りである。 加工方式 湿式・連続旋削 被削材 Ａ３９０−Ｔ６ Ａｌ−１８％Ｓｉｌ 切削速度 ８００ ｍ／ｍｉｎ 送 り ０．１ ｍｍ／ｒｅｖ 切削液 １０％エマルジョン 工具 ＳＰＧＮ１２０３０８ ホルダー ＦＰ１４Ｌ−３３The cutting test conditions are as follows. Processing method Wet / continuous turning Work material A390-T6 Al-18% Sil Cutting speed 800 m / min Feed 0.1 mm / rev Cutting fluid 10% Emulsion Tool SPGN120308 Holder FP14L-33
【００１９】[0019]
【実施例３】超硬合金チップ11表面への気相合成法によ
る超硬質膜の形成前の処理として、ホウ酸融液に替え、
ホウ砂融液を用いること、水酸化ナトリウム水溶液を用
いること、水酸化カリウム水溶液を用いること、飽和食
塩水溶液を用いることを夫々実験したが、ホウ砂、水酸
化ナトリウム、水酸化カリウム、飽和食塩水の順で処理
効果が認められた。また、Ｃに替えＮ原子の存在するＮ
2 ，ＮＨ3 等の雰囲気での処理でも効果が得られたの
で、本発明における処理は、Ia， III， IVb，Vbの各族
元素の１種以上またはその化合物の存在で処理すること
を製造法上の要件と考えた。[Example 3] A boric acid melt was used as a treatment before forming a superhard film on the surface of the cemented carbide chip 11 by a vapor phase synthesis method.
Experiments were conducted using borax melt, sodium hydroxide aqueous solution, potassium hydroxide aqueous solution, and saturated saline solution, respectively. However, borax, sodium hydroxide, potassium hydroxide, saturated saline solution were used. The treatment effect was recognized in the order of. Also, instead of C, N with N atoms present
Since the effect was obtained even by the treatment in an atmosphere of 2 , NH 3, etc., the treatment in the present invention is performed by treating in the presence of one or more elements of the respective group elements Ia, III, IVb and Vb or the compounds thereof. Considered a legal requirement.
【００２０】超硬質膜表面の仕上げは、スカイフまたは
ダイヤモンドによる従来の機械的研磨について示した
が、本発明の実施に際してはレーザー、イオンビームの
様な高エネルギー加工等他の公知あるいは新規な加工法
によっても勿論差支えない。The finishing of the surface of the ultra-hard film has been shown by conventional mechanical polishing with skiff or diamond, but in the practice of the present invention, other known or novel processing methods such as high energy processing such as laser and ion beam are used. Of course, it doesn't matter.
【００２１】[0021]
【発明の効果】本発明においては、チップのすくい面に
おいて、特に直接切刃を構成する隅部を高くし、その部
分上のみを研磨してなるものであるから、その製造に際
して成膜並びに研磨仕上げは選択的に均一、容易に行な
われる。しかも隅部形成はサンドブラストで簡単にで
き、該膜の付着強度が強固となる様、基材に予め処理が
加えてあるので、該膜表面を表面粗さ 0.1μｍＲmax 程
度以下に仕上げることができ、仕上げすべきすくい面は
隅部の部分に限られているので、仕上げに要する時間も
短かく、コストが四角形スローアウエイチップにおいて
１／12〜１／６と大きく軽減される。勿論仕上げにより
高精度、長寿命の切削ができる。According to the present invention, on the rake face of the chip, the corners that directly constitute the cutting edge are raised and only the part is polished, so that film formation and polishing are performed during the manufacturing. The finishing is selectively uniform and easy. Moreover, the corners can be easily formed by sandblasting, and the substrate is pre-treated so that the adhesion strength of the film becomes strong, so that the film surface can be finished to have a surface roughness of about 0.1 μmRmax or less. Since the rake face to be finished is limited to the corner portion, the time required for finishing is short, and the cost is greatly reduced to 1/12 to 1/6 in the square throwaway tip. Of course, finishing allows high precision and long life cutting.
【図１】実施例の一つを示すスローアウエイチップの斜
視図。FIG. 1 is a perspective view of a throwaway tip showing one of embodiments.
１ 超硬合金チップ ２ ダイヤモンド膜 ３ すくい面の中央部 ４ 段差 ５ 隅部 ６ コーナーＲ部 1 cemented carbide tip 2 diamond film 3 central part of rake face 4 step 5 corner 6 corner R
───────────────────────────────────────────────────── フロントページの続き (72)発明者 冨森 紘 大阪府堺市鳳北町２丁80番地 大阪ダイヤ モンド工業株式会社内 (72)発明者 中谷 征司 大阪府堺市鳳北町２丁80番地 大阪ダイヤ モンド工業株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Hiromi Tomimori, 2-80 Hotori-cho, Sakai City, Osaka Prefecture Osaka Diamond Diamond Industry Co., Ltd. Within Mondo Kogyo Co., Ltd.
Claims (3)
段差を設けて高くした基材上に、気相合成法によりダイ
ヤモンド及び／又はダイヤモンド状炭素よりなる超硬質
膜を形成した切削工具用チップにおいて、すくい面は段
差を付けて高くした隅部上の超硬質膜のみを膜生成時の
表面粗さよりも平滑に仕上げてなることを特徴とする超
硬質膜被覆切削工具用チップ。1. A cutting method in which a superhard film made of diamond and / or diamond-like carbon is formed by a vapor phase synthesis method on a base material in which a corner of the surface of a base material on which a rake face is to be formed is provided with a step, and the height is raised. In a tool tip, a rake surface is formed by forming a step and raising only a super hard film on a corner to finish the surface smoother than the surface roughness at the time of film formation.
除いてサンドブラストをかけて隅部以外を低くした後、
気相合成法により該基材上にダイヤモンド及び／又はダ
イヤモンド状炭素よりなる超硬質膜を形成し、すくい面
は高い隅部上の超硬質膜のみを膜生成時の表面粗さより
も平滑に仕上げることを特徴とする超硬質膜被覆切削工
具用チップの製造方法。2. The surface of the base material on which the rake face is to be formed is subjected to sandblasting except the corners to lower the height except the corners,
An ultra-hard film made of diamond and / or diamond-like carbon is formed on the base material by a vapor phase synthesis method, and only the ultra-hard film on the high corner of the rake surface is finished to be smoother than the surface roughness at the time of film formation. A method for manufacturing a tip for a super-hard film-coated cutting tool, comprising:
の１種以上またはその化合物の存在下で処理を施す工程
と、該処理された基材のすくい面を形成すべき表面に、
隅部を除いてサンドブラストをかけて隅部以外を低くす
る工程と、該ブラストをかけた基材の表面上に気相合成
法によりダイヤモンド及びまたはダイヤモンド状炭素よ
りなる超硬質膜を形成する工程と、すくい面は高い隅部
上の超硬質膜のみを膜生成時の表面粗さよりも平滑に仕
上げする工程とを経てなることを特徴とする超硬質膜被
覆切削工具用チップの製造方法。3. A step of treating a substrate in the presence of one or more elements of group Ia, group III, group IVb, group Vb or a compound thereof, and forming a rake face of the treated substrate. On the surface,
A step of sandblasting except the corners to lower the parts other than the corners, and a step of forming a super-hard film made of diamond and / or diamond-like carbon on the surface of the blasted base material by a vapor phase synthesis method. And a rake face, which comprises a step of finishing only the ultra-hard film on a high corner to be smoother than the surface roughness at the time of film formation, the method for manufacturing an insert for a super-hard film-coated cutting tool.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23892493A JPH0760509A (en) | 1993-08-30 | 1993-08-30 | Tip for cutting tool coated with ultra-hard film and manufacture thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23892493A JPH0760509A (en) | 1993-08-30 | 1993-08-30 | Tip for cutting tool coated with ultra-hard film and manufacture thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0760509A true JPH0760509A (en) | 1995-03-07 |
Family
ID=17037304
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP23892493A Pending JPH0760509A (en) | 1993-08-30 | 1993-08-30 | Tip for cutting tool coated with ultra-hard film and manufacture thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0760509A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6705806B2 (en) | 1998-12-28 | 2004-03-16 | Ngk Spark Plug Co., Ltd. | Cutting tool coated with diamond |
| US6929428B1 (en) * | 1999-06-16 | 2005-08-16 | Sandvik Ab | Cutting insert and cutting insert holder therefor |
-
1993
- 1993-08-30 JP JP23892493A patent/JPH0760509A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6705806B2 (en) | 1998-12-28 | 2004-03-16 | Ngk Spark Plug Co., Ltd. | Cutting tool coated with diamond |
| US7059811B2 (en) | 1998-12-28 | 2006-06-13 | Ngk Spark Plug Co., Ltd. | Cutting tool coated with diamond |
| US7179022B2 (en) | 1998-12-28 | 2007-02-20 | Ngk Spark Plug Co., Ltd. | Cutting tool coated with diamond |
| US6929428B1 (en) * | 1999-06-16 | 2005-08-16 | Sandvik Ab | Cutting insert and cutting insert holder therefor |
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