JPH07300326A - Production of laminated quartz glass member having both transparent layer and opaque layer - Google Patents
Production of laminated quartz glass member having both transparent layer and opaque layerInfo
- Publication number
- JPH07300326A JPH07300326A JP6111848A JP11184894A JPH07300326A JP H07300326 A JPH07300326 A JP H07300326A JP 6111848 A JP6111848 A JP 6111848A JP 11184894 A JP11184894 A JP 11184894A JP H07300326 A JPH07300326 A JP H07300326A
- Authority
- JP
- Japan
- Prior art keywords
- quartz glass
- transparent
- powder
- quartz
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B23/00—Re-forming shaped glass
- C03B23/20—Uniting glass pieces by fusing without substantial reshaping
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/09—Other methods of shaping glass by fusing powdered glass in a shaping mould
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Glass Melting And Manufacturing (AREA)
- Surface Treatment Of Glass (AREA)
- Glass Compositions (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、透明層と不透明層を有
する積層石英ガラス部材の製造方法、特に半導体製造用
のベルジャー、拡散炉炉芯管、ボート保持治具等を構成
するフランジ部付石英ガラス容器のフランジ部の製造方
法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a laminated quartz glass member having a transparent layer and an opaque layer, and particularly to a bell jar for semiconductor production, a diffusion furnace core tube, and a flange portion constituting a boat holding jig. The present invention relates to a method for manufacturing a flange portion of a quartz glass container.
【０００２】[0002]
【従来の技術】従来、石英ガラスは高純度で、耐熱性に
優れているところから、半導体製造用の治工具、例えば
半導体製造用のベルジャー、拡散炉炉芯管、ボート保持
治具等のフランジ付石英ガラス容器用素材として使用さ
れてきた。この半導体製造用治工具は、その容器内に輻
射熱が発生し、それが容器の端部のシール部材を熱劣化
するので微細な気泡入りの不透明石英ガラスでフランジ
部を構成するのが一般的であった。ところが、不透明石
英ガラスは多くの気泡を含有し、それがシール面に露出
し、パッキング材を使用してもフランジ部を完全にシー
ルすることができなかった。そこで、フランジ部を強く
締めつけたところ素材がガラスであるところから容易に
破壊してしまった。こうした欠点を解決するため、不透
明石英ガラス層の上に透明石英ガラス層を形成した積層
石英ガラス部材が実公平１ー４３１６４号公報で提案さ
れた。2. Description of the Related Art Conventionally, quartz glass is high in purity and excellent in heat resistance. Therefore, jigs and tools for semiconductor manufacturing, such as bell jars for semiconductor manufacturing, diffusion furnace core tubes, and flanges for boat holding jigs, etc. It has been used as a material for attached quartz glass containers. In this jig for semiconductor manufacturing, radiant heat is generated in the container, which heat-deteriorates the sealing member at the end of the container, so it is common to configure the flange part with opaque quartz glass containing fine bubbles. there were. However, the opaque quartz glass contains many air bubbles, which are exposed on the sealing surface, and even if a packing material is used, the flange portion cannot be completely sealed. Then, when the flange part was strongly tightened, it was easily broken from the place where the material was glass. In order to solve these drawbacks, a laminated quartz glass member having a transparent quartz glass layer formed on an opaque quartz glass layer has been proposed in Japanese Utility Model Publication No. 1-43164.
【０００３】しかしながら、上記積層石英ガラス部材は
透明ガラス板をフランジ部に溶着するため、溶着時に透
明層と不透明層の界面に大きな気泡が残留したり、ある
いは部分冷却に起因するクラックが発生し割れることが
屡々であった。However, since the transparent glass plate is welded to the flange portion of the laminated quartz glass member, large bubbles remain at the interface between the transparent layer and the opaque layer at the time of welding, or cracks due to partial cooling are generated and cracked. That was often the case.
【０００４】[0004]
【発明が解決しようとする課題】こうした問題点を解決
すべく、本発明者等は鋭意研究した結果、耐熱性の鋳型
中に透明石英ガラス板を体を配置し、その上に石英粉を
堆積し、それを不活性ガス雰囲気中で加熱溶融すること
により、シール性に優れた積層石英ガラス部材が得られ
ることを見出し、本発明を完成したものである。In order to solve these problems, the inventors of the present invention have conducted diligent research, and as a result, arranged a transparent quartz glass plate in a heat-resistant mold, and deposited quartz powder on it. The present invention has been completed by finding that a laminated quartz glass member having an excellent sealing property can be obtained by heating and melting it in an inert gas atmosphere.
【０００５】すなわち、本発明は、シール面が平坦であ
って、界面に大きな気泡の存在しない積層石英ガラス部
材の製造方法を提供することを目的とする。That is, it is an object of the present invention to provide a method for producing a laminated quartz glass member having a flat sealing surface and no large bubbles at the interface.
【０００６】また、本発明は、遮熱性が良く、シール性
にも優れたフランジ付容器の製造方法を提供することを
目的とする。Another object of the present invention is to provide a method of manufacturing a flanged container which has a good heat insulating property and an excellent sealing property.
【０００７】[0007]
【課題を解決するための手段】上記目的を達成する本発
明は、耐熱性型内に表面粗さが２０〜１００μｍの透明
石英ガラス体を配置し、その上に石英粉を堆積し、不活
性ガス雰囲気中で加熱溶融する透明部層と不透明層とを
有する石英ガラス部材の製造方法に係る。According to the present invention for achieving the above object, a transparent quartz glass body having a surface roughness of 20 to 100 μm is arranged in a heat resistant mold, and quartz powder is deposited on the transparent quartz glass body to make it inert. The present invention relates to a method for producing a quartz glass member having a transparent layer and an opaque layer that are heated and melted in a gas atmosphere.
【０００８】上記製造方法において使用される耐熱性型
としては、円筒状のカーボン鋳型が好適である。この円
筒状の型に図１に示すように円盤状の透明石英ガラス体
１を配置し、その上に石英粉２を堆積させ、それを加熱
溶融することにより図２に示す積層石英ガラス部材が製
造できる。前記製造方法において、透明石英ガラスをド
ーナツ状透明石英ガラス体１としたときには、その中央
部にカーボン製の棒状支柱４を立て、型３、透明石英ガ
ラス１および棒状支柱４で囲まれた空間に石英粉２を堆
積し、それを加熱溶融することによりフランジ付容器が
好適に製造できる。前記透明石英ガラス体１の表面粗さ
は２０〜１００μｍがよい。この表面粗さを有すること
により透明石英ガラス体と石英粉との接触面積が増し、
溶融加熱時に気泡が発生することなく接合される。表面
粗さが前記範囲未満では表面が滑らかで接合が緊密でな
く、また、前記範囲を超えると接合面に大きな気泡が生
じシール性が劣る。As the heat resistant mold used in the above-mentioned manufacturing method, a cylindrical carbon mold is suitable. As shown in FIG. 1, a disk-shaped transparent quartz glass body 1 is placed in this cylindrical mold, and quartz powder 2 is deposited on the transparent quartz glass body 1, which is heated and melted to obtain the laminated quartz glass member shown in FIG. Can be manufactured. In the above-mentioned manufacturing method, when the transparent quartz glass is the doughnut-shaped transparent quartz glass body 1, a carbon rod-shaped column 4 is erected at the center thereof, and a space surrounded by the mold 3, the transparent quartz glass 1 and the rod-shaped column 4 is formed. By depositing the quartz powder 2 and heating and melting it, a container with a flange can be suitably manufactured. The surface roughness of the transparent quartz glass body 1 is preferably 20 to 100 μm. By having this surface roughness, the contact area between the transparent quartz glass body and the quartz powder increases,
Bonding without generating bubbles during melting and heating. If the surface roughness is less than the above range, the surface is smooth and the bonding is not tight, and if it exceeds the above range, large bubbles are generated on the bonding surface, resulting in poor sealing performance.
【０００９】上記透明石英ガラス体上に堆積する石英粉
２は、粒径１００μｍ以下の粒子を５重量％以上含有す
る石英粉が良い。この石英粉を不活性ガス雰囲気下で
１，６００〜２，０００℃、好ましくは１，７００〜
１，８００℃の温度範囲で加熱溶融すると微細な独立気
泡を含有する不透明ガラスが得られる。石英粉が粒径１
００μｍ以下の粒子を５重量％未満含有するものでは、
大きな気泡が形成され、遮熱性に劣る。The quartz powder 2 deposited on the transparent quartz glass body is preferably a quartz powder containing 5% by weight or more of particles having a particle diameter of 100 μm or less. This quartz powder is in an inert gas atmosphere at 1,600 to 2,000 ° C., preferably 1,700 to
Opaque glass containing fine closed cells is obtained by heating and melting in the temperature range of 1,800 ° C. Quartz powder has a particle size of 1
In the case of containing less than 5% by weight of particles of 00 μm or less,
Large air bubbles are formed, resulting in poor heat insulation.
【００１０】上記加熱溶融温度範囲が１，６００℃未満
では、焼結が不十分で、クラックが発生しやすくなる。
逆に、溶融温度が２，０００℃を超えると、溶融が進み
過ぎ、不透明部分の不透明度が低下して熱線遮断効果が
低下する。また、雰囲気は不活性ガス雰囲気が好適であ
って、例えば真空下での加熱溶融では粉体部のガスが除
去され透明ガラス化され不透明石英ガラスが得られな
い。使用する不活性ガスとしては、安価なＮ2ガスが最
も好ましいが、特にこれに限定されない。When the heating and melting temperature range is less than 1,600 ° C., sintering is insufficient and cracks are likely to occur.
On the contrary, when the melting temperature exceeds 2,000 ° C., the melting proceeds excessively, the opacity of the opaque portion is lowered, and the heat ray shielding effect is lowered. Further, the atmosphere is preferably an inert gas atmosphere, and for example, by heating and melting under vacuum, the gas in the powder portion is removed and the glass is transparentized to give an opaque quartz glass. The inert gas used is most preferably inexpensive N 2 gas, but is not particularly limited thereto.
【００１１】上記製造方法を半導体製造用フランッジ付
容器のフランジ部の製造に使用する場合には、石英粉を
例えば米国特許第４，９８３，３７０号明細書に記載の
純化法に従って純化処理し、不透明石英ガラス中のアル
カリ金属元素濃度を０．２ｐｐｍ以下、ＯＨ基濃度を１
０ｐｐｍ以下、鉄元素濃度を０．１ｐｐｍ以下、マグネ
シウム元素濃度を０．０５ｐｐｍ以下、ジルコニウム元
素濃度を０．１ｐｐｍ以下とし、半導体の汚染を防止す
るのがよい。さらに、製造された積層石英ガラス部材を
平研し、焼き仕上げを施し、シール性を向上させるのが
よい。When the above-mentioned manufacturing method is used for manufacturing the flange portion of a container for flanging for semiconductor manufacturing, quartz powder is purified according to the purification method described in, for example, US Pat. No. 4,983,370, Concentration of alkali metal element in opaque quartz glass is 0.2ppm or less, OH group concentration is 1
It is preferable to prevent the semiconductor from being contaminated by setting the iron element concentration to 0 ppm or less, the iron element concentration to 0.1 ppm or less, the magnesium element concentration to 0.05 ppm or less, and the zirconium element concentration to 0.1 ppm or less. Further, it is preferable that the manufactured laminated quartz glass member is flat-polished and baked to improve the sealing property.
【００１２】[0012]
【実施例】以下に、本発明を実施例に従って具体的に説
明する。EXAMPLES The present invention will be described in detail below with reference to examples.
【００１３】実施例１ 内径３３０ｍｍ×高さ３００ｍｍの円筒状カーボン鋳型
３中に、図３に示す表面粗さが４０μｍの外径３３０ｍ
ｍ×厚さ１０ｍｍのドーナツ状透明石英ガラス体１を配
置し、その中央部に外径１７０ｍｍ×高さ３００ｍｍの
カーボン製棒状支柱４を立て、カーボン鋳型３と透明ガ
ラス板１と棒状物４に囲まれた空間に表１の純度を有
し、かつ表２の粒度を有する天然結晶質石英粉２を深さ
２００ｍｍまで充填し、そのまま真空炉中に設置し、Ｎ
2ガスを５ｌ／分の流量でフローさせ、室温から１，７
５０℃までは、１０℃／分以下の速度で昇温し、１，７
５０℃の温度で、１時間加熱溶融した。ヒーターを切っ
たのち、室温まで降温し取り出した。取り出したガラス
体の透明面を最大３ｍｍ、最低１ｍｍに平研し透明層を
形成した。次いで、前記石英ガラス体を外径３２０ｍｍ
×内径１８０ｍｍ×厚さ１５ｍｍに加工したのち、透明
面の焼き仕上を施して石英ガラス部材を作成した。前記
部材の透明層は図４に示すように平坦で表面粗さは、２
μｍ以下であった。また、透明層と不透明層の界面に
は、１００μｍを超える気泡の発生が確認されなかっ
た。Example 1 In a cylindrical carbon mold 3 having an inner diameter of 330 mm and a height of 300 mm, an outer diameter of 330 m having a surface roughness of 40 μm shown in FIG.
A donut-shaped transparent quartz glass body 1 having a size of m × 10 mm is arranged, and a carbon rod-shaped support column 4 having an outer diameter of 170 mm × height of 300 mm is erected in the central portion thereof, and a carbon mold 3, a transparent glass plate 1 and a rod-shaped member 4 are provided. The enclosed space was filled with natural crystalline quartz powder 2 having the purity shown in Table 1 and the particle size shown in Table 2 up to a depth of 200 mm, and placed in a vacuum furnace as it was.
Flow 2 gases at a flow rate of 5 l / min, from room temperature to 1,7
Up to 50 ° C, the temperature is raised at a rate of 10 ° C / min or less to 1,7
It was heated and melted at a temperature of 50 ° C. for 1 hour. After turning off the heater, the temperature was lowered to room temperature and the product was taken out. The transparent surface of the glass body taken out was flat-ground to a maximum of 3 mm and a minimum of 1 mm to form a transparent layer. Then, the quartz glass body is made to have an outer diameter of 320 mm.
After being processed to have an inner diameter of 180 mm and a thickness of 15 mm, the transparent surface was baked to prepare a quartz glass member. The transparent layer of the member is flat and has a surface roughness of 2 as shown in FIG.
It was less than μm. In addition, generation of bubbles exceeding 100 μm was not confirmed at the interface between the transparent layer and the opaque layer.
【００１４】[0014]
【表１】 [Table 1]
【００１５】[0015]
【表２】 [Table 2]
【００１６】比較例１ 透明石英ガラス体を配置せず、他は実施例１と同様な方
法で不透明石英ガラスフランジを作成した。得られた不
透明ガラス層は、気泡直径が１０〜１６０μｍ、不透明
石英ガラス中に占める気泡総体積が３〜１０％、不透明
石英ガラス中１００ｃｍ3当りの気泡総面積が８００〜
１，５００ｃｍ2の不透明ガラス層であった。このシー
ル面を平研した後、表面粗さを測定したところ図５に示
すように約１００μｍの表面粗さを示した。さらに焼き
仕上したが、その表面粗さは図６のように約１０μｍと
なるに過ぎなかった。Comparative Example 1 An opaque quartz glass flange was prepared in the same manner as in Example 1 except that the transparent quartz glass body was not placed. The obtained opaque glass layer had a bubble diameter of 10 to 160 μm, a total bubble volume in the opaque quartz glass of 3 to 10%, and a total bubble area per 100 cm 3 of the opaque quartz glass of 800 to.
It was an opaque glass layer of 1,500 cm 2 . After flattening the sealing surface, the surface roughness was measured, and as shown in FIG. 5, a surface roughness of about 100 μm was shown. Further, it was baked and finished, but its surface roughness was only about 10 μm as shown in FIG.
【００１７】比較例２ 外径３２０ｍｍ×内径１８０ｍｍの不透明石英ガラスか
らなるフランジ部材のシール面に同じ寸法を有する透明
石英ガラスリングを酸水素バーナーで溶融させながら溶
着した。界面には、最大４００μｍの気泡が数個発生し
た。また、溶着中、バーナー火炎照射され急冷した部分
から、クラックが発生し、全体で破損するものが多かっ
た。Comparative Example 2 A transparent quartz glass ring having the same dimensions was fused and welded to a sealing surface of a flange member made of opaque quartz glass having an outer diameter of 320 mm and an inner diameter of 180 mm while melting with an oxyhydrogen burner. Several bubbles with a maximum size of 400 μm were generated at the interface. In addition, during welding, cracks were generated from the part that was rapidly cooled by irradiation with a burner flame, and many of them were damaged as a whole.
【００１８】比較例３ 表面粗さ２μｍ以下である透明石英ガラス体を使用し
て、実施例１と同様な方法で透明石英ガラス層付不透明
石英ガラスフランジを作成した。しかし、透明ガラス層
と、不透明ガラス層の界面には、最大７ｍｍ程までの気
泡が多発した。Comparative Example 3 An opaque quartz glass flange with a transparent quartz glass layer was prepared in the same manner as in Example 1 using a transparent quartz glass body having a surface roughness of 2 μm or less. However, at the interface between the transparent glass layer and the opaque glass layer, bubbles of up to about 7 mm frequently occurred.
【００１９】比較例４ 表面粗さ４０μｍである透明石英ガラス体を使用し、か
つ１５０μｍ以下の粒度の石英ガラス粉を除去した天然
結晶質石英粉を使用し、実施例１と同様な方法で透明石
英ガラス層付不透明石英ガラスフランジを作成した。透
明層と、不透明層の界面には、径３００μｍ程度の気泡
が多発していた。Comparative Example 4 A transparent quartz glass body having a surface roughness of 40 μm was used, and a natural crystalline quartz powder from which quartz glass powder having a particle size of 150 μm or less was removed was used. An opaque quartz glass flange with a quartz glass layer was created. At the interface between the transparent layer and the opaque layer, many bubbles with a diameter of about 300 μm were generated.
【００２０】[0020]
【発明の効果】本発明の製造方法によれば、表面粗さが
２μｍ以下の平坦な面を有し、シール性の優れた石英ガ
ラス部材を製造できる。特に本発明の製造方法で得られ
た半導体製造用フランジ付容器のフランジ部シール性が
優れ、しかも高純度で半導体を汚染することがなかっ
た。According to the manufacturing method of the present invention, it is possible to manufacture a quartz glass member having a flat surface having a surface roughness of 2 μm or less and having an excellent sealing property. In particular, the flanged container of the semiconductor manufacturing flanged container obtained by the manufacturing method of the present invention was excellent in the sealing property of the flange portion, and the semiconductor was not polluted with high purity.
【図面の簡単な説明】[Brief description of drawings]
【図１】本発明の製造方法の概略図である。FIG. 1 is a schematic view of a manufacturing method of the present invention.
【図２】本発明の製造方法で得られた積層石英ガラス部
材である。FIG. 2 is a laminated quartz glass member obtained by the manufacturing method of the present invention.
【図３】本発明の製造方法で使用する透明石英ガラス体
の表面粗さの状態図である。FIG. 3 is a state diagram of the surface roughness of the transparent quartz glass body used in the manufacturing method of the present invention.
【図４】本発明の製造方法で得られた透明石英ガラス表
面を平研した後の表面粗さの状態図である。FIG. 4 is a state diagram of the surface roughness after the surface of the transparent quartz glass obtained by the manufacturing method of the present invention is flattened.
【図５】１００μｍの表面粗さを有する透明石英ガラス
体の表面状態図である。FIG. 5 is a surface state diagram of a transparent quartz glass body having a surface roughness of 100 μm.
【図６】図５の透明石英ガラスの表面を平研した後の表
面粗さの状態図である。6 is a state diagram of the surface roughness after the surface of the transparent quartz glass of FIG. 5 is flattened.
１ 透明石英ガラス板 ２ 石英粉 ３ 耐熱性型 ４ 棒状支柱 ５ 透明石英ガラス層 ６ 不透明石英ガラス層 1 transparent quartz glass plate 2 quartz powder 3 heat-resistant type 4 rod-shaped support 5 transparent quartz glass layer 6 opaque quartz glass layer
───────────────────────────────────────────────────── フロントページの続き (72)発明者 横田 透 福島県郡山市田村町金屋字川久保88 信越 石英株式会社石英技術研究所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Toru Yokota 88 Kawakubo, Kanaya, Tamura-cho, Koriyama-shi, Fukushima Shin-Etsu Quartz Co., Ltd.
Claims (4)
の透明石英ガラス体を配置し、その上に石英粉を堆積
し、不活性ガス雰囲気中で加熱溶融することを特徴とす
る透明層と不透明層を有する積層石英ガラス部材の製造
方法。1. Surface roughness in a heat resistant mold is 20 to 100 μm.
1. A method for producing a laminated quartz glass member having a transparent layer and an opaque layer, which comprises arranging the transparent quartz glass body of claim 1, depositing quartz powder on the transparent quartz glass body, and heating and melting in an inert gas atmosphere.
のドーナツ状透明石英ガラス体を配置し、そのドーナツ
状透明石英ガラス体の中央部にカーボン製棒状体を設置
し、型と棒状体と透明石英ガラス体に囲まれた空間に石
英粉を充填したのち、不活性ガス雰囲気中で加熱溶融す
ることを特徴とする透明層と不透明層を有する積層石英
ガラス部材の製造方法。2. The surface roughness of the heat resistant mold is 20 to 100 μm.
Of the donut-shaped transparent quartz glass body, a carbon rod-shaped body was installed in the center of the donut-shaped transparent quartz glass body, and the space surrounded by the mold, the rod-shaped body, and the transparent quartz glass body was filled with quartz powder. Then, a method for producing a laminated quartz glass member having a transparent layer and an opaque layer, which comprises heating and melting in an inert gas atmosphere.
量％以上含有する粉体であることを特徴とする請求項１
または２記載の積層石英ガラス部材の製造方法。3. The quartz powder is a powder containing 5% by weight or more of particles having a particle diameter of 100 μm or less.
Alternatively, the method for producing a laminated quartz glass member according to the item 2.
の範囲であることを特徴とする請求項１または２記載の
積層石英ガラス部材の製造方法。4. A heating and melting temperature of 1,600 to 2,000 ° C.
The method for producing a laminated quartz glass member according to claim 1 or 2, characterized in that
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11184894A JP3394320B2 (en) | 1994-04-28 | 1994-04-28 | Method for producing laminated quartz glass member having transparent layer and opaque layer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11184894A JP3394320B2 (en) | 1994-04-28 | 1994-04-28 | Method for producing laminated quartz glass member having transparent layer and opaque layer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH07300326A true JPH07300326A (en) | 1995-11-14 |
| JP3394320B2 JP3394320B2 (en) | 2003-04-07 |
Family
ID=14571688
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11184894A Expired - Lifetime JP3394320B2 (en) | 1994-04-28 | 1994-04-28 | Method for producing laminated quartz glass member having transparent layer and opaque layer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3394320B2 (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09183624A (en) * | 1995-12-27 | 1997-07-15 | Shinetsu Quartz Prod Co Ltd | Flange made of quartz glass and its production |
| JPH09202632A (en) * | 1996-01-25 | 1997-08-05 | Shinetsu Quartz Prod Co Ltd | Production of cylindrical quartz glass |
| JPH11209135A (en) * | 1998-01-27 | 1999-08-03 | Tosoh Corp | Production of opaque quartz glass ring with transparent part |
| JPH11236234A (en) * | 1998-02-24 | 1999-08-31 | Tosoh Corp | Production of opaque quartz glass ring |
| US6312775B1 (en) | 1997-10-16 | 2001-11-06 | Tosoh Quartz Corporation | Opaque silica glass article having transparent portion and process for producing same |
| US6405563B1 (en) | 1997-10-16 | 2002-06-18 | Tosoh Corporation | Opaque silica glass article having transparent portion and process for producing same |
| JP2014005154A (en) * | 2012-06-21 | 2014-01-16 | Covalent Materials Corp | Quartz glass crucible for pulling up silicon single crystal and manufacturing method therefor |
| JP2017165643A (en) * | 2016-03-10 | 2017-09-21 | クアーズテック株式会社 | Composite silica glass-made light diffusion member |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0450126A (en) * | 1990-06-15 | 1992-02-19 | Ryobi Ltd | Glass article having transparent layer on surface and production thereof |
-
1994
- 1994-04-28 JP JP11184894A patent/JP3394320B2/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0450126A (en) * | 1990-06-15 | 1992-02-19 | Ryobi Ltd | Glass article having transparent layer on surface and production thereof |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09183624A (en) * | 1995-12-27 | 1997-07-15 | Shinetsu Quartz Prod Co Ltd | Flange made of quartz glass and its production |
| JPH09202632A (en) * | 1996-01-25 | 1997-08-05 | Shinetsu Quartz Prod Co Ltd | Production of cylindrical quartz glass |
| US6312775B1 (en) | 1997-10-16 | 2001-11-06 | Tosoh Quartz Corporation | Opaque silica glass article having transparent portion and process for producing same |
| US6405563B1 (en) | 1997-10-16 | 2002-06-18 | Tosoh Corporation | Opaque silica glass article having transparent portion and process for producing same |
| JPH11209135A (en) * | 1998-01-27 | 1999-08-03 | Tosoh Corp | Production of opaque quartz glass ring with transparent part |
| JPH11236234A (en) * | 1998-02-24 | 1999-08-31 | Tosoh Corp | Production of opaque quartz glass ring |
| JP2014005154A (en) * | 2012-06-21 | 2014-01-16 | Covalent Materials Corp | Quartz glass crucible for pulling up silicon single crystal and manufacturing method therefor |
| JP2017165643A (en) * | 2016-03-10 | 2017-09-21 | クアーズテック株式会社 | Composite silica glass-made light diffusion member |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3394320B2 (en) | 2003-04-07 |
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