JPH0691750A - Syndiotactic polystyrene biaxially drawn film - Google Patents
Syndiotactic polystyrene biaxially drawn filmInfo
- Publication number
- JPH0691750A JPH0691750A JP4243463A JP24346392A JPH0691750A JP H0691750 A JPH0691750 A JP H0691750A JP 4243463 A JP4243463 A JP 4243463A JP 24346392 A JP24346392 A JP 24346392A JP H0691750 A JPH0691750 A JP H0691750A
- Authority
- JP
- Japan
- Prior art keywords
- film
- syndiotactic polystyrene
- poly
- flatness
- peak
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Manufacture Of Macromolecular Shaped Articles (AREA)
- Shaping By String And By Release Of Stress In Plastics And The Like (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は平面性と厚み斑に優れた
シンジオタクチックポリスチレン系二軸延伸フィルム、
さらに詳しく言えば、磁気テープ用、写真・製版用、コ
ンデンサー用、包装用として用いる場合に、良好な平面
性と厚み斑を有するシンジオタクチックポリスチレン系
二軸延伸フィルムに関するものである。The present invention relates to a biaxially stretched syndiotactic polystyrene film excellent in flatness and thickness unevenness,
More specifically, the present invention relates to a biaxially stretched syndiotactic polystyrene film having good flatness and thickness unevenness when used for magnetic tape, photo / plate making, condenser, and packaging.
【0002】[0002]
【従来の技術】シンジオタクチックポリスチレン系二軸
延伸フィルムは耐熱性、電気特性、透明性などに優れた
ものが開発され(特開平1−110122号、同1−1
68709号、同1−182346号、同2−2797
31号、同3−74437号、同3−109453号、
同3−99828号、同3−124427号、同3−1
31644号など)、磁気テープ用、コンデンサー用、
包装用等、各種のフィルム用途に展開が期待されてる。
特に近年上記分野においては、平面性・厚み斑が優れた
薄手フィルムが強く要求されている。しかし、これまで
のシンジオタクチックポリスチレン系二軸延伸フィルム
においては、薄手化するために高倍率まで延伸した時、
シンジオタクチックポリスチレン系二軸延伸フィルムは
脆い為、延伸時に破断が生じ、その延伸性が悪くなる。
その為に、延伸倍率を下げると、平面性・厚み斑の点で
満足のいくものではなかった為、非常に限られた用途展
開しか行われなかった。2. Description of the Related Art Syndiotactic polystyrene biaxially stretched films have been developed that have excellent heat resistance, electrical properties, transparency, etc. (Japanese Patent Laid-Open Nos. 1-110122 and 1-11).
68709, 1-182346, 2-2797.
No. 31, No. 3-74437, No. 3-109453,
3-99828, 3-124427, 3-1
31644), magnetic tapes, capacitors,
It is expected to be applied to various film applications such as packaging.
In recent years, in particular, there has been a strong demand in recent years for thin films having excellent flatness and thickness unevenness. However, in the conventional syndiotactic polystyrene biaxially stretched film, when stretched to a high ratio to make it thin,
Since the syndiotactic polystyrene-based biaxially stretched film is brittle, breakage occurs during stretching and the stretchability deteriorates.
Therefore, when the draw ratio was lowered, the flatness and thickness unevenness were not satisfactory, so that only a limited number of applications were developed.
【0003】[0003]
【発明が解決しようとする課題】シンジオタクチックポ
リスチレン系二軸延伸フィルムは脆いため、フィルムの
延伸時に破断が非常に発生し易い。このため延伸倍率を
低めに設定することがあるが、この時は、平面性・厚み
斑の点で問題が生じる。本発明は、平面性と厚み斑に優
れたシンジオタクチックポリスチレン系二軸延伸フィル
ムを提供することを目的とする。Since the syndiotactic polystyrene biaxially stretched film is fragile, it is apt to break during stretching of the film. For this reason, the draw ratio may be set lower, but at this time, problems arise in terms of flatness and thickness unevenness. An object of the present invention is to provide a syndiotactic polystyrene biaxially stretched film excellent in flatness and thickness unevenness.
【0004】[0004]
【課題を解決するための手段】本発明者らは延伸時に破
断が生じにくい延伸条件下で、平面性と厚み斑を共に満
足させるべく鋭意研究の結果、シンジオタクチックポリ
スチレン分子鎖の配向と結晶子の配向を或る範囲に在ら
しめることにより平面性と厚み斑を共に満足させること
が可能であることを見いだし、本発明に到達したもので
ある。即ち、本発明は下記式によって求められる配向比
が0.4 〜2.0 であるとともに広角X線回折において20.6
゜にある結晶回折ピークを用いて評価した結晶子の方位
角方向における分布が極大値付近で***せず1つのピー
クのみを有することを特徴とする平面性と厚み斑に優れ
たシンジオタクチックポリスチレン二軸延伸フィルム。
本発明に用いられる立体規則性がシンジオタクチック構
造であるポリスチレン系重合体は、側鎖であるフェニル
基又は置換フェニル基が核磁気共鳴法により定量される
タクテイシテイがダイアッド(構成単位が2個)で85%
以上、ペンタッド(構成単位が5個)で50%以上のシン
ジオタクチック構造であることが望ましい。該ポリスチ
レン系重合体としては、ポリスチレン、ポリ(p-、m-又
はo-メチルスチレン)、ポリ(2,4-、2,5-、3,4-又は3,
5-ジメチルスチレン)、ポリ(p-ターシャリーブチルス
チレン)などのポリ(アルキルスチレン)、ポリ(p-、
m-又はo-クロロスチレン)、ポリ(p-、m-又はo-ブロモ
スチレン)、ポリ(p-、m-又はo-フルオロスチレン)、
ポリ(o-メチル-p- フルオロスチレン)などのポリ(ハ
ロゲン化スチレン)、ポリ(p-、m-又はo-クロロメチル
スチレン)などのポリ(ハロゲン置換アルキルスチレ
ン)、ポリ(p-、m-又はo-メトキシスチレン)、ポリ
(p-、m-又はo-エトキシスチレン)などのポリ(アルコ
キシスチレン)、ポリ(p-、m-又はo-カルボキシメチル
スチレン)などのポリ(カルボキシアルキルスチレン)
ポリ(p-ビニルベンジルプロピル)などのポリ(アルキ
ルエーテルスチレン)、ポリ(p-トリメチルシリルスチ
レン)などのポリ(アルキルシリルスチレン)、さらに
はポリ(ビニルベンジルジメトキシホスファイド)など
が挙げられる。Means for Solving the Problems Under the stretching conditions in which breakage is unlikely to occur during stretching, the present inventors have earnestly studied to satisfy both the flatness and the thickness unevenness, and as a result, the alignment and crystal of the syndiotactic polystyrene molecular chain The inventors have found that it is possible to satisfy both flatness and thickness unevenness by controlling the orientation of the child within a certain range, and have reached the present invention. That is, the present invention has an orientation ratio of 0.4 to 2.0 determined by the following formula and has a wide angle X-ray diffraction of 20.6.
Syndiotactic polystyrene excellent in flatness and thickness unevenness, characterized in that the distribution of crystallites in the azimuth direction evaluated using the crystal diffraction peak at ゜ does not split near the maximum value and has only one peak Biaxially stretched film.
The polystyrene polymer with stereoregularity having a syndiotactic structure used in the present invention has a tacticity of diad (two constitutional units) in which a side chain phenyl group or substituted phenyl group is quantified by a nuclear magnetic resonance method. At 85%
As described above, it is desirable that the pentad (5 units) has a syndiotactic structure of 50% or more. Examples of the polystyrene-based polymer include polystyrene, poly (p-, m- or o-methylstyrene), poly (2,4-, 2,5-, 3,4- or 3,
5- (dimethylstyrene), poly (p-tertiarybutylstyrene) and other poly (alkylstyrenes), poly (p-,
m- or o-chlorostyrene), poly (p-, m- or o-bromostyrene), poly (p-, m- or o-fluorostyrene),
Poly (halogenated styrene) such as poly (o-methyl-p-fluorostyrene), poly (halogen-substituted alkylstyrene) such as poly (p-, m- or o-chloromethylstyrene), poly (p-, m -Or o-methoxystyrene), poly (p-, m- or o-ethoxystyrene) and other poly (alkoxystyrene), poly (p-, m- or o-carboxymethylstyrene) and other poly (carboxyalkylstyrene) )
Examples thereof include poly (alkyl ether styrene) such as poly (p-vinylbenzylpropyl), poly (alkylsilylstyrene) such as poly (p-trimethylsilylstyrene), and poly (vinylbenzyldimethoxyphosphide).
【0005】本発明においては、前記ポリスチレン系重
合体のなかで、特にポリスチレンが好適である。また、
本発明で用いるシンジオタクチック構造を有するポリス
チレン系重合体は、必ずしも単一化合物である必要はな
く、シンジオタクティシティが前記範囲内であればアタ
クチック構造やアイソタクチック構造のポリスチレン系
重合体との混合物や、共重合体及びそれらの混合物でも
よい。本発明の二軸延伸シンジオタクチックポリスチレ
ンはシンジオタクチックポリスチレンを常法で溶融押し
出しした後、逐次または同時二軸延伸を行い、更に必要
に応じ再度縦または横方向に延伸を行った後150 〜280
℃の温度で熱固定することによって得られるものである
が、その最大の特徴は該フィルムの分子配向と結晶配向
がある特定範囲内にあることである。赤外吸収法により
求められる分子配向はシンジオタクチックポリスチレン
分子鎖の主鎖がトランスコンフォメーションによりどの
程度並び揃っているかを結晶部・非晶部をあわせた系全
体として評価するパラメーターである。この値が1に近
づくほど分子鎖は等方的に存在し、0に近づくほどTD
方向に配向し、1より大きくなるに従ってMD方向に配
向していることを表している。発明者らは、この赤外吸
収法により求めた分子配向が延伸性と極めて相関が強い
ことを見いだし、この値が請求範囲外にあるときは、延
伸ないしは熱固定時の破断が急増し、延伸性が良好なフ
ィルムが得られない。In the present invention, polystyrene is particularly preferable among the polystyrene polymers. Also,
The polystyrene-based polymer having a syndiotactic structure used in the present invention is not necessarily a single compound, and if the syndiotacticity is within the above range, a polystyrene-based polymer having an atactic structure or an isotactic structure is used. It may be a mixture of, a copolymer and a mixture thereof. The biaxially stretched syndiotactic polystyrene of the present invention is obtained by melt-extruding the syndiotactic polystyrene by a conventional method, then sequentially or simultaneously biaxially stretched, and further stretched in the longitudinal direction or the transverse direction as needed, and then 150- 280
It is obtained by heat-setting at a temperature of ° C, and the most important feature is that the molecular orientation and crystal orientation of the film are within a certain range. The molecular orientation obtained by the infrared absorption method is a parameter for evaluating how much the main chains of syndiotactic polystyrene molecular chains are aligned by transconformation as a whole system including a crystal part and an amorphous part. As this value approaches 1, the molecular chains are isotropic, and as it approaches 0, TD
It is oriented in the direction, and as it becomes larger than 1, it is oriented in the MD direction. The inventors have found that the molecular orientation determined by this infrared absorption method has a very strong correlation with the stretchability, and when this value is outside the claimed range, the breakage during stretching or heat setting increases rapidly, A good film cannot be obtained.
【0006】次に、本発明のシンジオタクチックポリス
チレンフィルムは広角X線回折において20.6゜にある結
晶回折ピークを用いて評価した結晶子の方位角方向にお
ける分布曲線が極大値付近で***せずに1つのピークの
みを与えることが必要である。この結晶配向はシンジオ
タクチックポリスチレン結晶子の配向の程度を表してお
り、方位角方向の分布曲線が極大値付近で***せずに1
つのピークのみを与えることは、結晶子がその方向に極
度に配向していることを示している。発明者らはこの結
晶子の配向はフィルムの平面性・厚み斑に密接な相関が
あることを見いだし、更に、該配向分布曲線を極大値付
近で***させず1つのピークのみにすることによりその
ような平面性・厚み斑の改善がはかれることを見いだし
た。Next, in the syndiotactic polystyrene film of the present invention, the distribution curve in the azimuth direction of the crystallite evaluated using the crystal diffraction peak at 20.6 ° in wide-angle X-ray diffraction did not split near the maximum value. It is necessary to give only one peak. This crystal orientation represents the degree of orientation of the syndiotactic polystyrene crystallite, and the distribution curve in the azimuth direction does not split near the maximum value and
Giving only one peak indicates that the crystallites are extremely oriented in that direction. The inventors have found that the orientation of this crystallite has a close correlation with the flatness / thickness variation of the film, and further, by making the orientation distribution curve not split near the maximum value but only one peak, We found that such flatness and thickness unevenness can be improved.
【0007】[0007]
【実施例】以下に実施例にて本発明を具体的に説明する
が、本発明はこれら実施例のみに限定されるものではな
い。なお、フィルムの評価方法を以下に示す。 (1)分子配向 シンジオタクチックポリスチレン分子鎖の分子配向の測
定は1222cm-1にある赤外吸収バンドがトランスコンフォ
メーションに起因する報告に従って行った。パーキンエ
ルマー赤外分光光度計を用いて、偏光赤外に対する試料
の傾きを変え、吸収強度を測定した。1222cm-1の光で、
入射光の電気ベクトルがフィルムの幅方向と一致した時
の吸収強度を1182cm-1バンドで規格化した値をAx、フィ
ルムの長手方向と一致した時の吸収強度を1182cm-1バン
ドで規格化した値をAyとすると、分子配向はAx/Ay で定
義される。EXAMPLES The present invention will be specifically described below with reference to examples, but the present invention is not limited to these examples. The evaluation method of the film is shown below. (1) Molecular Orientation The molecular orientation of syndiotactic polystyrene molecular chains was measured according to the report that the infrared absorption band at 1222 cm −1 was due to transconformation. Using a Perkin Elmer infrared spectrophotometer, the inclination of the sample with respect to polarized infrared was changed and the absorption intensity was measured. 1222 cm -1 of light,
The absorption intensity when the electric vector of the incident light coincided with the width direction of the film was standardized in the 1182 cm -1 band as Ax, and the absorption intensity when it coincided with the longitudinal direction of the film was normalized in the 1182 cm -1 band. If the value is Ay, the molecular orientation is defined by Ax / Ay.
【0008】(2)結晶配向分布 二軸延伸フィルムを約500mmの厚さになるように積層
して、X線回折用の試料とし、X線回折装置(理学電機
(株)製 Rotaflex) の試料ホルダーに設置する。フィ
ルム面と垂直にX線を入射した場合をθ=0゜とし、入
射X線の延長線上に検出器がある場合を2θ=0゜とす
る。まず、走査面とフィルムの幅方向が平行になるよう
に試料を設置し、この状態を方位角χ=0゜とする。こ
の状態で2θをスキャンして2θ=20.6゜付近にみられ
る結晶回折ピークの極大位置で検出器を固定する。この
状態でさらにθをスキャンして回折ピークの強度が極大
値をもつところでθを固定する。このようにしていわゆ
る結晶面の面だしを行った上で方位角をスキャンし、こ
のときの結晶回折ピーク強度の方位角依存性を記録する
と、これが結晶配向分布曲線と呼ぶ。(2) Crystal orientation distribution A biaxially stretched film was laminated so as to have a thickness of about 500 mm to prepare a sample for X-ray diffraction, which was a sample of an X-ray diffractometer (Rotaflex, manufactured by Rigaku Denki Co., Ltd.). Install in the holder. When the X-ray is incident perpendicularly to the film surface, θ = 0 °, and when the detector is on the extension line of the incident X-ray, 2θ = 0 °. First, the sample is set so that the scanning surface and the width direction of the film are parallel to each other, and this state is set to an azimuth angle χ = 0 °. In this state, scan 2θ and fix the detector at the maximum position of the crystal diffraction peak seen near 2θ = 20.6 °. In this state, θ is further scanned and θ is fixed when the intensity of the diffraction peak has a maximum value. In this way, after so-called crystal plane alignment, the azimuth angle is scanned, and the azimuth angle dependence of the crystal diffraction peak intensity at this time is recorded, which is called a crystal orientation distribution curve.
【0009】(3)平面性 幅50cmのフィルムをロールから長さ200cm 巻出し、フィ
ルムの平面性の状態を観察し5 段回評価し、次のランク
付けで表した。 1級;強い張力をかけても波打ち全面にあり 2級;強い張力をかけても波打ち一部あり 3級;強い張力をかけると波打ちなし 4級;弱い張力をかけると波打ちなし 5級;張力をかけなくても波打ちなし(3) Flatness A film having a width of 50 cm was unwound from a roll for a length of 200 cm, and the flatness of the film was observed and evaluated in five steps, and the results were expressed by the following rankings. 1st grade; there is a wavy surface even with strong tension 2nd grade; there is some wavy even with strong tension 3rd grade; no waviness when strong tension is applied 4th grade; no waviness when weak tension is applied 5th grade; tension No waviness without applying
【0010】(4)厚み斑 ミクロン計測器社製連続フィルム厚さ測定器により二軸
延伸フィルムの幅方向中央部を長手方向に沿って測定
し、次式により算出した。 厚み班=(最大厚さー最小厚さ)/平均厚さ×100% 1級:厚み班10%以上 2級:厚み班8〜10% 3級:厚み班6〜8% 4級:厚み班4〜6% 5級:厚み班4%以下(4) Thickness unevenness The widthwise central portion of the biaxially stretched film was measured along the longitudinal direction with a continuous film thickness measuring instrument manufactured by Micron Instruments Co., Ltd. and calculated by the following formula. Thickness group = (maximum thickness-minimum thickness) / average thickness x 100% Grade 1: Thickness group 10% or more Grade 2: Thickness group 8-10% Grade 3: Thickness group 6-8% Grade 4: Thickness group 4-6% Grade 5: Thickness group 4% or less
【0011】実施例 滑剤として、平均粒子径0.8 μm、ばらつき度20%、面
積形状係数75%の炭酸カルシウムをシンジオタクチック
ポリスチレン(重量平均分子量300000)100 重量%に対
して2.0 重量%添加したポリマーチップと、滑剤の添加
されていないポリマーチップを重量比で1対9の割合で
混合した後、乾燥し、295 ℃で溶融押し出し冷却固化
し、無定形シートを得た。該無定形シートをまず赤外線
加熱ヒーターを複数個使用して110 ℃で縦方向に1.6 倍
延伸した後、140 ℃に加熱したロールを用いて縦方向に
2.0 倍延伸する。次にテンターで、横方向に110 ℃で1.
6 倍延伸した後、140 ℃で横方向に2.0 倍延伸する。こ
のフィルムを240 ℃で熱固定した後、230 ℃で幅方向に
3%リラックスさせた。得られたフィルムは分子配向が
0.9 で、結晶配向分布曲線は図1に示すように極大値付
近でも***せずに1つのピークのみを与えた。このフィ
ルムの平面性は5級で、厚み班は5級であった。EXAMPLE As a lubricant, 2.0% by weight of calcium carbonate having an average particle size of 0.8 μm, a degree of variation of 20% and an area shape factor of 75% was added to 100% by weight of syndiotactic polystyrene (weight average molecular weight 300000). Chips and polymer chips to which a lubricant was not added were mixed at a weight ratio of 1: 9, dried, melt-extruded at 295 ° C., cooled and solidified to obtain an amorphous sheet. The amorphous sheet was first stretched 1.6 times in the machine direction at 110 ℃ using multiple infrared heaters, and then stretched in the machine direction using a roll heated to 140 ℃.
Stretch 2.0 times. Then in a tenter, laterally at 110 ° C 1.
After stretching 6 times, it is stretched 2.0 times in the transverse direction at 140 ° C. This film was heat-set at 240 ° C. and then relaxed at 230 ° C. in the width direction by 3%. The resulting film has a molecular orientation
At 0.9, the crystal orientation distribution curve gave only one peak without splitting near the maximum value as shown in FIG. The flatness of this film was grade 5, and the thickness group was grade 5.
【0012】比較例 実施例で用いた無定形シートを135 ℃に加熱したロール
を用いて縦方向に2.8倍延伸する。次にテンターで横方
向に120 ℃で3.0 倍延伸し、250 ℃で熱固定した後、23
0 ℃で幅方向に3%リラックスさせた。得られたフィル
ムは分子配向が0.8 で、結晶配向分布曲線は図2に示す
ように極大値付近で2つに***した。このフィルムの平
面性は2級で、厚み班は2級であった。Comparative Example The amorphous sheet used in the examples is stretched 2.8 times in the machine direction using a roll heated to 135 ° C. Then, it was stretched 3.0 times in the transverse direction at 120 ° C with a tenter and heat set at 250 ° C.
It was relaxed at 0 ° C in the width direction by 3%. The obtained film had a molecular orientation of 0.8, and the crystal orientation distribution curve was split into two near the maximum value as shown in FIG. The flatness of this film was grade 2, and the thickness group was grade 2.
【0013】[0013]
【発明の効果】以上、記載のとおり、本発明は前記特許
請求の範囲に記載のとおりの構成を採用することによ
り、平面性および厚み斑に極めて優れたシンジオタクチ
ックポリスチレン系二軸延伸フィルムであると言うこと
ができる。As described above, the present invention is a syndiotactic polystyrene biaxially stretched film which is extremely excellent in flatness and thickness unevenness by adopting the constitution as described in the claims. Can be said to be.
【図1】図1は実施例で得られたフィルムの結晶配向分
布曲線である。FIG. 1 is a crystal orientation distribution curve of a film obtained in an example.
【図2】図2は比較例で得られたフィルムの結晶配向分
布曲線である。FIG. 2 is a crystal orientation distribution curve of a film obtained in a comparative example.
Azimuthal angle :フィルムの方位角 Intensity :結晶回折強度 Azimuthal angle: Film azimuth Intensity: Crystal diffraction intensity
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 FI 技術表示箇所 B29K 105:32 B29L 7:00 4F (72)発明者 奥平 正 滋賀県大津市堅田二丁目1番1号 東洋紡 績株式会社総合研究所内─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 5 Identification number Reference number within the agency FI Technical display location B29K 105: 32 B29L 7:00 4F (72) Inventor Tadashi Okuhira 2-1-1 Katata, Otsu City, Shiga Prefecture No. 1 Toyobo Co., Ltd.
Claims (1)
るスチレン系重合体から成り、下記式によって求められ
る配向比が0.4 〜2.0 であり、且つ広角X線回折におい
て20.6゜にある結晶回折ピークを用いて評価した結晶子
の方位角方向における分布が極大値付近で***せず1つ
のピークのみを有することを特徴とするシンジオタクチ
ックポリスチレン系二軸延伸フィルム。 配向比=Ax/Ay Ax:赤外光の偏光方向がフィルムの幅方向と一致した時
の1222cm-1 バンド強度 Ay:赤外光の偏光方向がフィルムの長手方向と一致した
時の1222cm-1 バンド強度1. A crystal diffraction peak composed of a styrene-based polymer having a substantially syndiotactic structure, having an orientation ratio of 0.4 to 2.0 determined by the following formula and having a wide-angle X-ray diffraction at 20.6 ° is used. A biaxially stretched syndiotactic polystyrene film, characterized in that the distribution of crystallites evaluated in the azimuth direction does not split around the maximum value and has only one peak. Orientation ratio = Ax / Ay Ax: infrared light polarization direction 1222Cm -1 band intensity Ay when matched with the width direction of the film: the infrared light polarization direction when matched with the longitudinal direction of the film 1222Cm -1 Band strength
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4243463A JPH0691750A (en) | 1992-09-11 | 1992-09-11 | Syndiotactic polystyrene biaxially drawn film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4243463A JPH0691750A (en) | 1992-09-11 | 1992-09-11 | Syndiotactic polystyrene biaxially drawn film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0691750A true JPH0691750A (en) | 1994-04-05 |
Family
ID=17104268
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4243463A Pending JPH0691750A (en) | 1992-09-11 | 1992-09-11 | Syndiotactic polystyrene biaxially drawn film |
Country Status (1)
Country | Link |
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JP (1) | JPH0691750A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0699485A (en) * | 1992-09-21 | 1994-04-12 | Toyobo Co Ltd | Syndiotactic polystyrenic biaxially stretched film |
JPH06106616A (en) * | 1992-09-28 | 1994-04-19 | Toyobo Co Ltd | Syndiotactic polystyrenr biaxially oriented film |
JPH06107813A (en) * | 1992-09-28 | 1994-04-19 | Toyobo Co Ltd | Biaxially oriented syndiotactic polystyrene film |
JPH06107812A (en) * | 1992-09-28 | 1994-04-19 | Toyobo Co Ltd | Biaxially oriented syndiotactic polystyrene film |
JPH0724911A (en) * | 1993-07-08 | 1995-01-27 | Toyobo Co Ltd | Syndyotactic polystyrene film |
US5707719A (en) * | 1995-05-29 | 1998-01-13 | Toyo Boseki Kabushiki Kaisha | Oriented film including polystyrene polymer having syndiotactic configuration |
KR100625734B1 (en) * | 1999-04-15 | 2006-09-20 | 코니카 미놀타 홀딩스 가부시키가이샤 | Protective Film for Polarizing Plate |
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JPH03149206A (en) * | 1989-11-06 | 1991-06-25 | Idemitsu Kosan Co Ltd | Production of oriented film or sheet |
JPH04103757A (en) * | 1990-08-24 | 1992-04-06 | Idemitsu Kosan Co Ltd | Film for package |
JPH06500369A (en) * | 1991-07-29 | 1994-01-13 | モンテル テクノロジー カンパニー ビーブイ | Syndiotactic semi-crystalline product made of poly-p-methylstyrene (s-PpMS) |
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Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0699485A (en) * | 1992-09-21 | 1994-04-12 | Toyobo Co Ltd | Syndiotactic polystyrenic biaxially stretched film |
JPH06106616A (en) * | 1992-09-28 | 1994-04-19 | Toyobo Co Ltd | Syndiotactic polystyrenr biaxially oriented film |
JPH06107813A (en) * | 1992-09-28 | 1994-04-19 | Toyobo Co Ltd | Biaxially oriented syndiotactic polystyrene film |
JPH06107812A (en) * | 1992-09-28 | 1994-04-19 | Toyobo Co Ltd | Biaxially oriented syndiotactic polystyrene film |
JPH0724911A (en) * | 1993-07-08 | 1995-01-27 | Toyobo Co Ltd | Syndyotactic polystyrene film |
US5707719A (en) * | 1995-05-29 | 1998-01-13 | Toyo Boseki Kabushiki Kaisha | Oriented film including polystyrene polymer having syndiotactic configuration |
KR100625734B1 (en) * | 1999-04-15 | 2006-09-20 | 코니카 미놀타 홀딩스 가부시키가이샤 | Protective Film for Polarizing Plate |
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