JPH0673352B2 - High pressure jet cleaning method - Google Patents

High pressure jet cleaning method

Info

Publication number
JPH0673352B2
JPH0673352B2 JP10111684A JP10111684A JPH0673352B2 JP H0673352 B2 JPH0673352 B2 JP H0673352B2 JP 10111684 A JP10111684 A JP 10111684A JP 10111684 A JP10111684 A JP 10111684A JP H0673352 B2 JPH0673352 B2 JP H0673352B2
Authority
JP
Japan
Prior art keywords
cleaning
cleaning liquid
cleaned
pressure jet
disk
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP10111684A
Other languages
Japanese (ja)
Other versions
JPS60245136A (en
Inventor
勇 井上
一己 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP10111684A priority Critical patent/JPH0673352B2/en
Publication of JPS60245136A publication Critical patent/JPS60245136A/en
Publication of JPH0673352B2 publication Critical patent/JPH0673352B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
    • C23G5/04—Apparatus
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Description

【発明の詳細な説明】 産業上の利用分野 本発明は半導体，光学ディスク等の非常にシビアな洗浄
効果、すなわち被洗浄物に付着している異物を確実に除
去すると共に、洗浄を行なうことによって汚れる度合
（再汚染）をきわめて小さくでき、非常に高い清浄面を
得ることが要求される高圧ジェット洗浄方法及び洗浄装
置に関するものである。The present invention relates to a very severe cleaning effect on semiconductors, optical discs, etc., that is, by reliably removing foreign matter adhering to an object to be cleaned and performing cleaning. The present invention relates to a high-pressure jet cleaning method and a cleaning device that require extremely low cleanliness (recontamination) and a very high clean surface.

従来例の構成とその問題点 種々の洗浄法の中でも高圧流体を細いノズルから高速で
吹き出し、その高速流を被洗浄物に当てて異物を除去す
るいわゆる高圧ジェット洗浄法は強い物理的エネルギを
有し、強固に付着した異物の除去に非常に有効である。Conventional configuration and its problems Among various cleaning methods, the so-called high-pressure jet cleaning method in which a high-pressure fluid is blown out from a thin nozzle at high speed and foreign matter is removed by applying the high-speed flow to an object to be cleaned has strong physical energy. However, it is very effective in removing foreign matter that is firmly attached.

以下円板を洗浄する場合の従来の高圧ジェット洗浄装置
の一例を概略で示す第２図に基づき説明する。第１図に
おいて、27は装置本体、28はモータ等により回転駆動さ
れるスピンドルで上部に真空吸着テーブル29を有してい
る。30はこのテーブル29に固定された被洗浄物である円
板である。一点鎖線で示す31は上部にフタ32,側面37に
排気ダクト33を有するカバーで透明体で示してある。34
は支柱35に支持された高圧ノズルで図示しない高圧ポン
プに加圧された洗浄液を高圧ジェット36にして円板30に
噴射する。支柱36は図示しない手段により矢印Ａ方向に
揺動駆動されることによりノズル34は円板30の半径方向
に走査され、また円板30は回転しているので高圧ジェッ
ト36は円板30の全面に亘って洗浄を行なう。An example of a conventional high-pressure jet cleaning device for cleaning a disc will be described below with reference to FIG. 2 schematically showing. In FIG. 1, 27 is a main body of the apparatus, 28 is a spindle which is rotationally driven by a motor or the like, and has a vacuum suction table 29 on the upper portion. Reference numeral 30 denotes a disk which is an object to be cleaned and is fixed to the table 29. Reference numeral 31 shown by a one-dot chain line is a cover having a lid 32 on an upper portion and an exhaust duct 33 on a side surface 37 and is shown as a transparent body. 34
Is a high-pressure nozzle supported by a column 35, and a cleaning liquid pressurized by a high-pressure pump (not shown) is turned into a high-pressure jet 36 and jetted onto the disk 30. The nozzle 36 is scanned in the radial direction of the disk 30 by swinging the column 36 in the direction of arrow A by means not shown, and the disk 30 is rotating, so the high-pressure jet 36 covers the entire surface of the disk 30. Wash over.

ところがこのような従来の構成では次のような問題点を
有している。However, such a conventional configuration has the following problems.

円板30に当った高圧ジェット36の一部ははね返り、他は
円板30の表面に沿って流れた後前記カバー31に衝突す
る。この時にはまだ十分な運動エネルギを有しているの
で衝突した洗浄液は飛沫となってカバー31内の空間を満
す。その飛沫のいくらかは排気ダクト33から図示しない
ファン等により排出されるが中に残った飛沫の一部は再
度円板30に付着する。飛沫が効果的に排出されるように
高圧ジェット36を傾けて円板30に噴射し、はね返った位
置に前記ダクト33の開口を設けたものもあるが、完全に
排出されるものではなく、またジェットが傾くことによ
り物理的作用力が弱くなる欠点を有していた。通常その
飛沫は円板30及びカバー31に付着していた異物を含んで
おり，それらの異物が付着することにより円板30に再汚
染が発生し、高圧ジェットが当った瞬間には異物が除去
されても結果として洗浄効果がきわめて低い、場合によ
っては洗浄することによって逆に汚染が増加するという
現象が発生していた。再汚染の度合は洗浄液の性質によ
っても異なり、洗浄液が純水の場合蒸発速度がきわめて
小さいので付着する飛沫の量が多く再汚染の度合も大で
ある。A part of the high-pressure jet 36 hitting the disk 30 is repelled, and the other part flows along the surface of the disk 30 and then collides with the cover 31. At this time, the cleaning liquid that has collided still has sufficient kinetic energy, and the cleaning liquid that has collided becomes droplets and fills the space inside the cover 31. Some of the droplets are discharged from the exhaust duct 33 by a fan or the like (not shown), but some of the droplets remaining inside adhere to the disc 30 again. There is also one in which the high-pressure jet 36 is inclined and jetted to the disc 30 so that the droplets are effectively discharged, and the opening of the duct 33 is provided at the rebounded position, but it is not completely discharged, and It has a drawback that the physical action force becomes weak due to the inclination of the jet. Usually, the droplets contain foreign substances that have adhered to the disc 30 and the cover 31, and these contaminants cause recontamination of the disc 30 and remove the foreign substances at the moment when the high-pressure jet hits them. As a result, the cleaning effect was extremely low, and in some cases, the phenomenon of increasing the contamination caused by cleaning occurred. The degree of recontamination differs depending on the nature of the cleaning liquid. When the cleaning liquid is pure water, the evaporation rate is extremely low, so that the amount of droplets that adhere is large and the degree of recontamination is large.

洗浄液として揮発性溶剤を用いる場合は、純水よりも汚
れを溶解除去する効果が大であり、また飛沫が円板に付
着する前に気化する割合が大である。したがって純水よ
りも洗浄効果が大で再汚染の度合も小さい。When a volatile solvent is used as the cleaning liquid, it has a greater effect of dissolving and removing dirt than pure water, and a large proportion of droplets are vaporized before adhering to the disc. Therefore, the cleaning effect is greater than that of pure water, and the degree of recontamination is small.

ところが揮発性溶剤は高価であるばかりでなく人体や環
境に悪影響を与えるので純水のように使い捨てができな
いので、回収使用が必要である。しかしながら高速で飛
散する溶剤は気化速度がきわめて大きいので大量に気化
し、冷却を行なってもかなりの回収もれを生じ運転コス
トが高価となるばかりではなく、人体に悪影響を与える
作業環境中のガス濃度が高くなる等の欠陥を有すると共
に、再汚染防止効果も不十分であった。However, since the volatile solvent is not only expensive but also has a bad influence on the human body and the environment, it cannot be disposable like pure water, and thus needs to be recovered and used. However, since the solvent that flies at high speed has a very high vaporization rate, it vaporizes in a large amount, and even if it is cooled, considerable recovery leakage occurs, resulting in high operating costs, as well as gas in the working environment that adversely affects the human body. In addition to having defects such as high concentration, the effect of preventing recontamination was insufficient.

以上のように従来の高圧ジェット洗浄方法及び装置は洗
浄効果，運転コスト，共に満足すべきものではなかっ
た。As described above, the conventional high-pressure jet cleaning method and device are not satisfactory in cleaning effect and operating cost.

発明の目的 本発明は洗浄液として揮発性溶剤を用い、被洗浄物に付
着している異物を確実に除去すると共に、再汚染を確実
に防止して優れた洗浄効果を得ることができ、しかも有
効に揮発性溶剤を回収することができる高圧ジェット洗
浄方法及び洗浄装置を提供することを目的とする。The object of the present invention is to use a volatile solvent as a cleaning liquid, to reliably remove foreign matter adhering to the object to be cleaned, and to reliably prevent recontamination to obtain an excellent cleaning effect, which is also effective. Another object of the present invention is to provide a high-pressure jet cleaning method and a cleaning device capable of recovering a volatile solvent.

発明の構成 本発明は揮発性の洗浄液中にてこの洗浄液の高圧ジェッ
ト流を被洗浄物表面に走査しつつ噴射せしめ、次にこの
被洗浄物を前記洗浄液の飽和蒸気中にてすすぎ洗浄し、
次に被洗浄物を洗浄液の蒸気密度の低い雰囲気中に移し
て被洗浄物を乾燥せしめてなる高圧ジェット洗浄方法及
び洗浄装置である。Configuration of the invention The present invention is a volatile cleaning liquid jetting a high-pressure jet stream of this cleaning liquid while scanning the surface of the object to be cleaned, and then rinsing and cleaning the object to be cleaned in saturated vapor of the cleaning liquid,
Next, there is provided a high-pressure jet cleaning method and a cleaning apparatus in which the object to be cleaned is transferred into an atmosphere having a low vapor density of the cleaning liquid to dry the object to be cleaned.

実施例の説明 本発明の一実施例を従来例と同様に円板の洗浄に適用し
た場合について説明する。Description of Embodiments A case will be described in which one embodiment of the present invention is applied to the cleaning of a disc as in the conventional example.

その概略を一部断面で示す第１図において１は洗浄装置
の機体で２は揮発性洗浄液（以下洗浄液と略す）３がた
められた洗浄槽である。４は沸騰槽でヒータ５を有し、
その中にためられた洗浄液を沸騰させる。６は機体の上
部開口７に巻回された冷却パイプでこの開口７の空間を
冷却し、前記沸騰層４から蒸発した洗浄液の蒸気を冷却
して凝結液化せしめ、この開口７から前記蒸気が逃げて
機体内の洗浄液が減ることを防止する。前記冷却パイプ
６の表面に凝結液化した洗浄液はその下部に設けた桶８
の中を流れて水と洗浄液の比重差を利用した水分離器９
に回収され冷却パイプ６の表面にて洗浄液と共に液化し
た空気中の水分は洗浄液から分離されてドレン10から排
出され、洗浄液は洗浄槽２に流入する。前記開口７には
上記の冷却パイプ６の冷却作用により、洗浄液の液化温
度となる界面11を境界として下部には通常過飽和状態に
ある飽和蒸気雰囲気12,上部には蒸気密度の低い領域13
が形成される。In FIG. 1, which is partially shown in cross section, reference numeral 1 is a machine body of a cleaning device, and 2 is a cleaning tank in which a volatile cleaning liquid (hereinafter abbreviated as cleaning liquid) 3 is stored. 4 is a boiling tank having a heater 5,
The cleaning liquid stored in it is boiled. Reference numeral 6 is a cooling pipe wound around the upper opening 7 of the machine body to cool the space of the opening 7 and to cool the vapor of the cleaning liquid evaporated from the boiling layer 4 to condense it, and the vapor escapes from the opening 7. To prevent the cleaning liquid inside the machine from running low. The cleaning liquid condensed and liquefied on the surface of the cooling pipe 6 is provided in a tub 8 provided below the cleaning liquid.
Separator 9 that flows through the inside of the tank and utilizes the difference in specific gravity between water and the cleaning liquid
The water in the air that has been collected and liquefied together with the cleaning liquid on the surface of the cooling pipe 6 is separated from the cleaning liquid and discharged from the drain 10, and the cleaning liquid flows into the cleaning tank 2. Due to the cooling action of the cooling pipe 6, the opening 7 has a saturated vapor atmosphere 12 which is normally in a supersaturated state at the lower part with an interface 11 at the liquefaction temperature of the cleaning liquid as a boundary, and an upper region 13 having a low vapor density 13
Is formed.

通常前記界面11は冷却パイプ６に近い部分、すなわち開
口７の周辺はよく冷されるので低く、開口中央部はそれ
とは逆に高くなり、開口中央部でもり上った形となるこ
とが知られている。Normally, the interface 11 is low because the portion near the cooling pipe 6, that is, the periphery of the opening 7 is well cooled, and the central portion of the opening is high on the contrary, and it is known that the interface 11 rises. Has been.

26は洗浄槽２の内壁に巻回された冷却パイプで洗浄槽中
の洗浄液３を冷却する。A cooling pipe 26 is wound around the inner wall of the cleaning tank 2 to cool the cleaning liquid 3 in the cleaning tank.

14は回転軸15に図示しない機械的手段により保持された
円板状の被洗浄物である。16はモータを内蔵するハウジ
ングで、回転軸15とこのモータの軸は公知のマグネット
カップリングで結合されている。Reference numeral 14 is a disk-shaped object to be cleaned, which is held on the rotating shaft 15 by a mechanical means (not shown). Reference numeral 16 is a housing containing a motor, and the rotating shaft 15 and the shaft of this motor are connected by a known magnet coupling.

回転軸15のシールは上記マグネットカップリングでなく
とも接触形の例えばリップシールであってもよい。The seal of the rotary shaft 15 may be a contact type seal, such as a lip seal, instead of the magnet coupling.

17は前記モータハウジング16を上下送りせしめる昇降ロ
ッドで図示しない手段あるいは手動により上下駆動され
る。Reference numeral 17 denotes an elevating rod for vertically moving the motor housing 16, which is vertically driven by means (not shown) or manually.

18は洗浄槽２に固定された支柱19に取付けられた高圧ノ
ズルである。Reference numeral 18 is a high pressure nozzle attached to a column 19 fixed to the cleaning tank 2.

20,21,22は洗浄槽２内の洗浄液３を常に清浄に保っため
に設けられたそれぞれプレフィルタ，循環ポンプ，ファ
イナルフィルタである。Reference numerals 20, 21, and 22 are a prefilter, a circulation pump, and a final filter, which are provided to keep the cleaning liquid 3 in the cleaning tank 2 always clean.

23,24は高圧ノズル18に清浄な高圧の洗浄液を供給する
ために設けられた高圧ポンプと高耐圧ファイナルフィル
タである。Reference numerals 23 and 24 are a high-pressure pump and a high-withstand-pressure final filter which are provided for supplying a clean high-pressure cleaning liquid to the high-pressure nozzle 18.

通常洗浄液として電子工業等においてはフロン系溶剤あ
るいはIPA（イソプロピルアルコール）が多用されるが
他の溶剤であってもよい。As a cleaning liquid, a freon-based solvent or IPA (isopropyl alcohol) is often used as a cleaning liquid, but other solvent may be used.

次に動作を説明する。Next, the operation will be described.

第１図において被洗浄物である円板14は開口７の上部の
Ｂ位置にて回転軸15に保持され、次に昇降ロッド17が下
降してＣ位置、すなわち円板14は洗浄液３に浸かる位置
まで降下する。In FIG. 1, the disk 14, which is the object to be cleaned, is held by the rotating shaft 15 at the position B above the opening 7, and then the elevating rod 17 descends to the position C, that is, the disk 14 is immersed in the cleaning liquid 3. Descend to the position.

この状態でモータを駆動し、円板14を回転せしめると共
に高圧ポンプ24を駆動し、高圧ノズル18から洗浄液の高
圧ジェット流25を噴射せしめつつ昇降ロッド17をゆっく
り上昇させて円板14の全面を洗浄する。通常高圧ジェッ
ト流25と円板14の表面のなす角は最も物理的作用力の強
い90°に選ばれる。In this state, the motor is driven to rotate the disk 14 and the high pressure pump 24, and while the high pressure jet stream 25 of the cleaning liquid is ejected from the high pressure nozzle 18, the elevating rod 17 is slowly lifted to cover the entire surface of the disk 14. To wash. Normally, the angle formed by the high-pressure jet stream 25 and the surface of the disk 14 is selected to be 90 °, which has the strongest physical action force.

液中で噴射される高圧ジェット流が被洗浄物表面に及ぼ
す物理的作用力は空気中で噴射される場合に比較して弱
くなるが、ノズルと被洗浄物表面間の距離が小さければ
空気中に比較してさほど弱くならない。弱くなる度合は
ノズルのオリフィス径・圧力等により異なるが、数mmの
距離で作用力は空気中の70〜50％となる。しかしながら
ポンプで50〜100％増しの圧力を得ることは容易である
からさほど大きなデメリットではない。The physical force exerted by the high-pressure jet stream jetted in the liquid on the surface of the object to be cleaned is weaker than when jetted in air, but in the air if the distance between the nozzle and the surface of the object to be cleaned is small. It does not become so weak compared to. The degree of weakening depends on the orifice diameter of the nozzle, the pressure, etc., but the acting force is 70 to 50% of that in air at a distance of several mm. However, since it is easy to obtain a pressure of 50 to 100% increase with a pump, it is not a big disadvantage.

液中で被洗浄物表面に当った高圧ジェット流は分散され
るがすみやかに周囲の液にエネルギを吸収され、液の表
面から飛び出すことはない。The high-pressure jet stream that has hit the surface of the object to be cleaned in the liquid is dispersed, but the energy is immediately absorbed by the surrounding liquid and does not jump out from the surface of the liquid.

高圧ジェット流の周辺の液はこのジェット流に引かれて
負圧となり蒸発が促進されるが沸騰槽４からの蒸発量に
比較してわずかであり冷却パイプ６で十分に回収が可能
である。The liquid around the high-pressure jet stream is attracted by this jet stream and becomes a negative pressure to promote evaporation, but it is small compared with the amount of evaporation from the boiling tank 4 and can be sufficiently recovered by the cooling pipe 6.

次に昇降ロッド17が上昇し、円板14は飽和蒸気雰囲気12
中のＤ位置に移送される。Next, the elevating rod 17 rises, and the disk 14 becomes saturated vapor atmosphere 12
It is transferred to the D position inside.

円板14は冷却パイプ26により冷却された洗浄液３に浸か
っていたことにより冷却されているから、円板14の表面
で蒸気が凝結液化した非常に清浄な洗浄液が流れ落ちて
すすぎ洗浄が行なわれる。一般にこのプロセスにより行
なわれる洗浄は蒸気洗浄と称されている。なお凝結液化
は円板14の温度が洗浄液の液化温度まで上昇するまで行
なわれる。Since the disk 14 is cooled by being immersed in the cleaning liquid 3 cooled by the cooling pipe 26, a very clean cleaning liquid in which steam is condensed and liquefied flows down on the surface of the disk 14 to perform rinsing cleaning. The cleaning performed by this process is commonly referred to as steam cleaning. The condensation and liquefaction is performed until the temperature of the disc 14 rises to the liquefaction temperature of the cleaning liquid.

このすすぎ洗浄の目的を次に説明する。The purpose of this rinse cleaning will be described below.

洗浄槽２中の洗浄液３はフィルタで過されてはいるが
洗浄により円板14から脱落した異物はすぐにはろ過され
ないので洗浄液中に浮遊している。また洗浄液に洗い落
された油脂も洗浄液に含まれている。したがって円板14
がＣからＢへ引き上げられる時、前記浮遊異物及び油脂
が付着する。Although the cleaning liquid 3 in the cleaning tank 2 has been filtered by the filter, the foreign matter that has fallen off the disk 14 due to cleaning is not immediately filtered and therefore remains in the cleaning liquid. In addition, oils and fats washed off by the cleaning liquid are also included in the cleaning liquid. Therefore disc 14
When C is pulled up from C to B, the floating foreign matter and oils and fats adhere.

その付着度合は洗浄液の汚れ度合に比例する。The degree of adhesion is proportional to the degree of stain of the cleaning liquid.

すすぎ洗浄の目的は円板ＣからＤへ引き上げる時付着し
た異物及び油脂を、異物や油脂が全く含まれていない蒸
気の凝結液化した洗浄液にて完全に除去することにあ
る。The purpose of rinsing and washing is to completely remove foreign substances and oils and fats attached when the discs are pulled up from the discs C to D with a cleaning liquid which is a condensed liquid of steam containing no foreign substances and oils and fats.

すすぎ洗浄が終了すると次に円板14はＤからＢへゆっく
り引き上げられる。円板14が前記界面11を越えて蒸気密
度の低い領域13へ移送される時円板14の表面を濡らして
いた前記液化洗浄液はすみやかに蒸発し、円板14は乾燥
する。以上の乾燥プロセスは一般に蒸気乾燥と称されて
いる。When the rinsing and cleaning are completed, the disk 14 is then slowly pulled up from D to B. When the disk 14 is transferred over the interface 11 to the region 13 of low vapor density, the liquefied cleaning liquid that has wet the surface of the disk 14 quickly evaporates and the disk 14 dries. The above drying process is generally called steam drying.

乾燥した後円板14を回転軸15から取外して洗浄を終了す
る。After drying, the disc 14 is removed from the rotary shaft 15 to finish the washing.

第１図に示す実施例を下記のように変更してもよい。The embodiment shown in FIG. 1 may be modified as follows.

（１）洗浄液３の冷却は、洗浄槽２に冷却パイプを設け
るかわりにポンプ21等から成る洗浄液の過系に冷却用
熱交換器を設けてもよい。(1) For cooling the cleaning liquid 3, instead of providing the cooling pipe in the cleaning tank 2, a cooling heat exchanger may be provided in the excess system of the cleaning liquid, which is composed of the pump 21 and the like.

（２）本発明の高圧ジェット洗浄方法及び装置の適用は
前記実施例にて説明した円板状の被洗浄物に限るもので
はない。被洗浄物の形状，汚れの性質等によっては被洗
浄物を回転させずに複数のノズルを用いたり、また直線
状のジェットではなく扇状に広がるジェットを噴射する
ノズルを用いて直線的に被洗浄物表面を走査してもよ
い。また被洗浄物をノズルに対して移動せしめてジェッ
ト流を被洗浄物表面に走査するかわりにノズルを被洗浄
物に対して移動せしめてもよい。(2) The application of the high-pressure jet cleaning method and apparatus of the present invention is not limited to the disk-shaped object to be cleaned described in the above embodiments. Depending on the shape of the object to be cleaned, the nature of dirt, etc., it may be possible to use multiple nozzles without rotating the object to be cleaned, or to use a nozzle that ejects a fan-shaped jet instead of a linear jet to linearly clean the object. The surface of the object may be scanned. Further, instead of moving the object to be cleaned with respect to the nozzle and scanning the jet stream on the surface of the object to be cleaned, the nozzle may be moved with respect to the object to be cleaned.

（３）前記一実施例において円板14の回転駆動用のモー
タを洗浄液に浸けて用いる構造としたがモータは蒸気密
度の低い領域13に配置して、ベルト・ロープあるいはフ
レキシブルシャフト・ユニバーサルジョイント，ギヤ等
を用いて回転動力を伝達してもよい。(3) In the above-described embodiment, the motor for rotating the disk 14 is used by immersing it in the cleaning liquid, but the motor is arranged in the region 13 where the vapor density is low, and the belt rope or the flexible shaft universal joint, Rotational power may be transmitted using gears or the like.

（４）被洗浄物が円板のような単純な形状ではなく凹凸
や深孔のある複雑な形状である場合は高圧ジェット流が
凹部や深穴の奥まで十分に作用しない場合がある。また
特定部分のみ高圧ジェット洗浄が必要であるが、他の部
分は通常の超音波洗浄でよい場合もある。このような場
合は第１図の洗浄槽に超音波振動子を付加すればよい。
そうすることにより、高圧ジェット洗浄と超音波洗浄を
同一槽内で順次あるいは同時に行なうことができ、両方
の特徴を生かしたより効果的な洗浄が可能となる。(4) When the object to be cleaned has a complicated shape with irregularities or deep holes instead of a simple shape such as a disc, the high-pressure jet flow may not fully act on the recesses or deep holes. Further, high-pressure jet cleaning is required only for a specific portion, but normal ultrasonic cleaning may be sufficient for other portions. In such a case, an ultrasonic vibrator may be added to the cleaning tank shown in FIG.
By doing so, high-pressure jet cleaning and ultrasonic cleaning can be performed sequentially or simultaneously in the same tank, and more effective cleaning that makes the most of both characteristics is possible.

（５）高圧ジェットと被洗浄面のなす角は90°が最も物
理的作用力が強くなるが目的によっては傾けてもよい。(5) The angle between the high-pressure jet and the surface to be cleaned is 90 °, which has the strongest physical action force, but may be inclined depending on the purpose.

発明の効果 本発明は洗浄槽にためられた揮発性の洗浄液中にて高圧
ジェット流を被洗浄物表面に走査しつつ噴射せしめて高
圧ジェット洗浄を行ない、次に被洗浄物を洗浄液の飽和
蒸気中に移して蒸気洗浄を行ない、次に被洗浄物を洗浄
液の蒸気密度の低い雰囲気に移して蒸気乾燥を行なう高
圧ジェット洗浄方法および装置であり、高圧ジェット流
による強い物理的エネルギで強固に付着した異物の除去
を効果的に、しかも気化速度の大なる揮発性洗浄液を有
効に回収しつつ行なうことができるばかりでなく、再汚
染を確実に防止することができ、非常に高い清浄面を得
ることができる。しかも洗浄液を有効に回収できるので
運転コストも安価であり、作業環境中の洗浄液のガス濃
度も高くならないので人体に悪影響を与えにくいもので
ある。EFFECTS OF THE INVENTION The present invention performs high-pressure jet cleaning by jetting a high-pressure jet stream while scanning the surface of an object to be cleaned in a volatile cleaning liquid stored in a cleaning tank, and then cleaning the object to be cleaned with saturated vapor of the cleaning liquid. This is a high-pressure jet cleaning method and device in which the material to be cleaned is transferred to the inside for steam cleaning, and then the object to be cleaned is transferred to an atmosphere with a low vapor density of the cleaning liquid to perform steam drying. It is possible not only to remove the foreign matter effectively, but also to collect the volatile cleaning liquid with a high vaporization rate effectively, and to prevent recontamination reliably, and obtain a very high clean surface. be able to. Moreover, since the cleaning liquid can be effectively collected, the operating cost is low, and the gas concentration of the cleaning liquid in the working environment does not increase, so that the human body is unlikely to be adversely affected.

【図面の簡単な説明】[Brief description of drawings]

第１図は本発明の一実施例における高圧ジェット洗浄装
置の原理図、第２図は従来例における高圧ジェット洗浄
装置の斜視図である。 ２……洗浄槽、３……洗浄液、４……沸騰槽、6,27……
冷却パイプ、11……界面、12……飽和蒸気雰囲気、13…
…蒸気密度の低い領域、14……円板、18……高圧ノズ
ル、20……プレフィルタ、21……循環ポンプ、22……フ
ァイナルフィルタ、23……高圧ポンプ、24……高圧ファ
イナルフィルタ。FIG. 1 is a principle view of a high-pressure jet cleaning apparatus according to an embodiment of the present invention, and FIG. 2 is a perspective view of a conventional high-pressure jet cleaning apparatus. 2 ... Cleaning tank, 3 ... Cleaning solution, 4 ... Boiling tank, 6,27 ...
Cooling pipe, 11 ... Interface, 12 ... Saturated steam atmosphere, 13 ...
Area with low vapor density, 14 disk, 18 high pressure nozzle, 20 pre filter, 21 circulation pump, 22 final filter, 23 high pressure pump, 24 high pressure final filter.

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭56−67926（ＪＰ，Ａ) 特開 昭57−89486（ＪＰ，Ａ) 特開 昭58−207638（ＪＰ，Ａ) 特開 昭54−69260（ＪＰ，Ａ) 実公 昭49−45436（ＪＰ，Ｙ１) 実公 昭53−32523（ＪＰ，Ｙ２) ─────────────────────────────────────────────────── --Continued from the front page (56) Reference JP-A-56-67926 (JP, A) JP-A-57-89486 (JP, A) JP-A-58-207638 (JP, A) JP-A-54- 69260 (JP, A) Actual public 49-45436 (JP, Y1) Actual public 53-32523 (JP, Y2)

Claims (2)

【特許請求の範囲】[Claims] 【請求項１】洗浄槽にためられた揮発性洗浄液中にて、
この揮発性洗浄液の高圧ジェット流を前記洗浄槽から飛
び出さないように被洗浄物に噴射せしめてこの被洗浄物
の汚れを除去し、次に前記被洗浄物を前記揮発性洗浄液
中より前記揮発性洗浄液の上部に形成された前記揮発性
洗浄液の飽和蒸気中に移して前記被洗浄物の表面に前記
蒸気を凝結液化せしめ、この液化した揮発性洗浄液を前
記被洗浄物の表面に流してすすぎ洗浄し、次に前記飽和
蒸気中の前記被洗浄物を、前記揮発性洗浄液の蒸気密度
の低い雰囲気中に移して前記被洗浄物の表面の揮発性洗
浄液を気化せしめて前記被洗浄物を乾燥せしめることを
特徴とする高圧ジェット洗浄方法。1. In a volatile cleaning liquid stored in a cleaning tank,
The high-pressure jet stream of this volatile cleaning liquid is sprayed onto the object to be cleaned so as not to jump out of the cleaning tank to remove dirt on the object to be cleaned, and then the object to be cleaned is volatilized from the volatile cleaning liquid. The cleaning liquid to the saturated vapor of the volatile cleaning liquid formed on the top of the cleaning liquid to cause the vapor to condense and liquefy on the surface of the object to be cleaned, and to rinse the liquefied volatile cleaning liquid on the surface of the object to be cleaned. After cleaning, the object to be cleaned in the saturated vapor is transferred to an atmosphere in which the vapor density of the volatile cleaning liquid is low, and the volatile cleaning liquid on the surface of the object to be cleaned is vaporized to dry the object to be cleaned. A high-pressure jet cleaning method characterized by urging. 【請求項２】洗浄槽を超音波振動子を有する槽により構
成した特許請求の範囲第１項記載の高圧ジェット洗浄方
法。2. The high-pressure jet cleaning method according to claim 1, wherein the cleaning tank is a tank having an ultrasonic vibrator.
JP10111684A 1984-05-18 1984-05-18 High pressure jet cleaning method Expired - Lifetime JPH0673352B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10111684A JPH0673352B2 (en) 1984-05-18 1984-05-18 High pressure jet cleaning method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10111684A JPH0673352B2 (en) 1984-05-18 1984-05-18 High pressure jet cleaning method

Publications (2)

Publication Number Publication Date
JPS60245136A JPS60245136A (en) 1985-12-04
JPH0673352B2 true JPH0673352B2 (en) 1994-09-14

Family

ID=14292101

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10111684A Expired - Lifetime JPH0673352B2 (en) 1984-05-18 1984-05-18 High pressure jet cleaning method

Country Status (1)

Country Link
JP (1) JPH0673352B2 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8900480A (en) * 1989-02-27 1990-09-17 Philips Nv METHOD AND APPARATUS FOR DRYING SUBSTRATES AFTER TREATMENT IN A LIQUID
US5222310A (en) * 1990-05-18 1993-06-29 Semitool, Inc. Single wafer processor with a frame
US5772784A (en) * 1994-11-14 1998-06-30 Yieldup International Ultra-low particle semiconductor cleaner
JP3889811B2 (en) * 1995-10-16 2007-03-07 アー モンフォルツ テクスティールマシーネン ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー Equipment for dyeing by reactive dyeing
US5806544A (en) * 1997-02-11 1998-09-15 Eco-Snow Systems, Inc. Carbon dioxide jet spray disk cleaning system
US6516816B1 (en) * 1999-04-08 2003-02-11 Applied Materials, Inc. Spin-rinse-dryer
US6748961B2 (en) * 2001-03-30 2004-06-15 Lam Research Corporation Angular spin, rinse, and dry module and methods for making and implementing the same

Also Published As

Publication number Publication date
JPS60245136A (en) 1985-12-04

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