JPH02246115A - Precision cleaning, its cleaning solution, and drying - Google Patents
Precision cleaning, its cleaning solution, and dryingInfo
- Publication number
- JPH02246115A JPH02246115A JP6732789A JP6732789A JPH02246115A JP H02246115 A JPH02246115 A JP H02246115A JP 6732789 A JP6732789 A JP 6732789A JP 6732789 A JP6732789 A JP 6732789A JP H02246115 A JPH02246115 A JP H02246115A
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- cleaned
- cleaning liquid
- surfactant
- precision
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 168
- 238000001035 drying Methods 0.000 title claims description 34
- 239000004094 surface-active agent Substances 0.000 claims abstract description 45
- 239000002904 solvent Substances 0.000 claims abstract description 5
- 239000007788 liquid Substances 0.000 claims description 89
- 238000000034 method Methods 0.000 claims description 38
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 24
- 239000000243 solution Substances 0.000 claims description 17
- 239000012298 atmosphere Substances 0.000 claims description 13
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 13
- 239000000693 micelle Substances 0.000 claims description 13
- 239000001301 oxygen Substances 0.000 claims description 13
- 229910052760 oxygen Inorganic materials 0.000 claims description 13
- 230000015572 biosynthetic process Effects 0.000 claims description 12
- 239000011261 inert gas Substances 0.000 claims description 11
- 239000006259 organic additive Substances 0.000 claims description 10
- 239000011550 stock solution Substances 0.000 claims description 10
- 239000000126 substance Substances 0.000 claims description 7
- 238000007865 diluting Methods 0.000 claims description 6
- 238000005507 spraying Methods 0.000 claims description 6
- 238000010790 dilution Methods 0.000 claims 2
- 239000012895 dilution Substances 0.000 claims 2
- 239000010419 fine particle Substances 0.000 abstract description 15
- 238000012545 processing Methods 0.000 abstract description 6
- 238000006073 displacement reaction Methods 0.000 abstract 1
- 239000002699 waste material Substances 0.000 description 21
- 230000000694 effects Effects 0.000 description 18
- 239000000758 substrate Substances 0.000 description 15
- 229910052751 metal Inorganic materials 0.000 description 11
- 230000008569 process Effects 0.000 description 10
- 238000001816 cooling Methods 0.000 description 9
- 238000010586 diagram Methods 0.000 description 9
- 238000003912 environmental pollution Methods 0.000 description 8
- 238000002347 injection Methods 0.000 description 8
- 239000007924 injection Substances 0.000 description 8
- 239000007789 gas Substances 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 7
- 238000005516 engineering process Methods 0.000 description 6
- 238000004945 emulsification Methods 0.000 description 5
- 230000001590 oxidative effect Effects 0.000 description 5
- 238000011109 contamination Methods 0.000 description 4
- 238000005187 foaming Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000003921 oil Substances 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 230000009471 action Effects 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000003749 cleanliness Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 239000000498 cooling water Substances 0.000 description 2
- 238000010828 elution Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- -1 and for example Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 235000014593 oils and fats Nutrition 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000005201 scrubbing Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
Landscapes
- Detergent Compositions (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、精密洗浄技術およびそれに用いられる洗浄液
ならびに乾燥技術に関し、特に、磁気ディスクや半導体
基板などの製造過程における精密洗浄作業に適用して有
効な技術に関する。[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to precision cleaning technology, the cleaning liquid used therein, and drying technology, and is particularly applicable to precision cleaning work in the manufacturing process of magnetic disks, semiconductor substrates, etc. Concerning effective techniques.
〔従来の技術〕
たとえば、８己憶媒体として磁気ディスク装置などに使
用される磁気ディスクにおいては、当該磁気ディスクに
記録される情報の記録密度増大の要請に呼応して、情報
１ビツト当たりの体積がますます微細化しつつあるとと
もに、磁気ヘッドと磁気ディスクとの間隙も狭小化の一
途を辿っている。[Prior Art] For example, in a magnetic disk used as an 8-bit storage medium in a magnetic disk device, in response to the demand for an increase in the recording density of information recorded on the magnetic disk, the volume per 1 bit of information has been increased. As magnetic heads are becoming increasingly finer, the gap between the magnetic head and the magnetic disk is also becoming narrower.
このため、磁気ディスクの製造過程においては、ディス
ク基板の表面に付着した微細な粒子や油脂などを可能な
限り除去して高度に清浄化することが、ディスク基板表
面における欠陥の低減や平滑度の確保などの観点から必
須となっている。For this reason, in the manufacturing process of magnetic disks, it is important to remove as much of the fine particles, oil, etc. adhering to the surface of the disk substrate as possible, and to perform a high level of cleaning to reduce defects on the disk substrate surface and improve its smoothness. This is essential from the perspective of security.
また、半導体集積回路装置の製造プロセスにおける半導
体基板においても、当該半導体基板に形成される回路パ
ターンの一層の微細化によって同様の事情にある。Further, a similar situation exists in semiconductor substrates used in the manufacturing process of semiconductor integrated circuit devices due to further miniaturization of circuit patterns formed on the semiconductor substrates.
このため、従来では、たとえば米国特許第３８９３８６
９号の明細書に開示されるような技術が知られている。For this reason, conventionally, for example, U.S. Patent No. 389386
A technique as disclosed in the specification of No. 9 is known.
すなわち、所定の洗浄槽の内部に貯留された洗浄液内に
、洗浄すべき複数の半導体基板を互いに平行な姿勢で浸
漬し、洗浄槽の平面に設けられた超音波発振子から洗浄
液中に、半導体基板の平面にほぼ平行な方向に超音波振
動を印加することにより、半導体基板の表面に付着した
微細な異物を超音波エネルギによって効果的に除去しよ
うとするものである。That is, a plurality of semiconductor substrates to be cleaned are immersed in a cleaning liquid stored inside a predetermined cleaning tank in a mutually parallel posture, and an ultrasonic oscillator installed on the plane of the cleaning tank sends semiconductor substrates into the cleaning liquid. By applying ultrasonic vibrations in a direction substantially parallel to the plane of the substrate, ultrasonic energy is used to effectively remove minute foreign matter adhering to the surface of the semiconductor substrate.
また、超音波エネルギによって洗浄効果を高めようとす
る他の技術としては、たとえば、特開昭５６−６０６７
７号公報や特開昭４８−３５６７１号公報に開示される
技術が知られている。In addition, other techniques that attempt to enhance the cleaning effect using ultrasonic energy include, for example, Japanese Patent Application Laid-Open No. 56-6067.
Techniques disclosed in Publication No. 7 and Japanese Patent Application Laid-open No. 48-35671 are known.
これらの後者の従来技術は、洗浄液を噴射するノズルの
内部に超音波発振子を設け、このノズルから被洗浄物に
噴射される洗浄液に超音波を乗せて洗浄効果の向上を図
るものである。In these latter conventional techniques, an ultrasonic oscillator is provided inside a nozzle that sprays a cleaning liquid, and ultrasonic waves are applied to the cleaning liquid that is sprayed from the nozzle onto the object to be cleaned, thereby improving the cleaning effect.
ところが、上記のような各従来技術においては、洗浄液
の成分や性質などについては配慮されておらず、たとえ
ば被洗浄物の表面に付着した微粒子などは超音波エネル
ギによって比較的効果的に除去されるが、被洗浄物の表
面に付着した油脂などの除去が比較的困難で、洗浄作業
に長時間を要するという問題がある。However, in the above-mentioned conventional techniques, no consideration is given to the components or properties of the cleaning liquid, and for example, fine particles attached to the surface of the object to be cleaned are relatively effectively removed by ultrasonic energy. However, there are problems in that it is relatively difficult to remove oils and fats adhering to the surface of the object to be cleaned, and the cleaning operation takes a long time.
また、前者の従来技術のように、洗浄槽に貯留された洗
浄液に被洗浄物を浸漬した状態で洗浄作業を行う場合に
は、−旦被洗浄物の表面から除去された異物などによる
再汚染も懸念される。In addition, when cleaning is performed with the object to be cleaned immersed in the cleaning liquid stored in the cleaning tank, as in the former conventional technology, - re-contamination due to foreign matter etc. that was previously removed from the surface of the object to be cleaned; There are also concerns.
さらに、後者の従来技術のように、ノズルから洗浄液を
被洗浄物に噴射して洗浄作業を遂行する場合には、作業
に際して多量の廃液を生じることになるが、この廃液の
処理などについてはなんら言及していない。Furthermore, when cleaning work is carried out by spraying cleaning liquid onto the object being cleaned from a nozzle, as in the latter conventional technology, a large amount of waste liquid is generated during the work, but there is no way to deal with the treatment of this waste liquid. Not mentioned.
すなわち、近年では、産業活動による環境汚染の防止に
高い注意義務が課せられており、実際の洗浄技術の運用
に当たっては重要な問題となる。That is, in recent years, a high degree of duty of care has been imposed on preventing environmental pollution caused by industrial activities, and this becomes an important issue in the actual operation of cleaning technology.
一方、洗浄作業の後は、被洗浄物の乾燥作業が必須とな
るが、たとえば、近年では、スパッタリング技術によっ
て磁性記録面を形成すべ（、磁気ディスク基板を、アル
ミニウム合金やその他の合金を用いて構成することが一
般的になりつつある。On the other hand, after cleaning, it is essential to dry the object to be cleaned. For example, in recent years, sputtering technology has been used to form magnetic recording surfaces (and magnetic disk substrates have been formed using aluminum alloys and other alloys). It is becoming common to configure
このため、純水などの液滴を付着させたままで、空気中
の酸化性の雰囲気下で乾燥作業を遂行したのでは、磁気
ディスク基板表面の金属元素が雰囲気の酸素の影響など
によって液滴の中に局部的に溶は出し、液滴の消失した
乾燥後に凹凸となって残存し、せっかく洗浄した磁気デ
ィスク基板の表面の平坦度が損なわれたり、発生した金
属元素の酸化物によって磁気ディスク基板の表面が再汚
染されることなどが懸念される。For this reason, if drying is performed in an oxidizing atmosphere in the air with droplets of pure water etc. still attached, the metal elements on the surface of the magnetic disk substrate will be affected by the oxygen in the atmosphere, causing the droplets to dry. The solution may locally leak out, and after the droplets have disappeared and dried, they remain as uneven surfaces, impairing the flatness of the surface of the magnetic disk substrate that has been cleaned, or causing the magnetic disk substrate to become damaged due to the generated oxides of metal elements. There are concerns that the surface of the equipment may be recontaminated.
そこで、本発明の目的は、被洗浄物に付着した微粒子や
油性異物などを短時間に確実に除去することが可能な精
密洗浄方法を提供することにある。SUMMARY OF THE INVENTION Therefore, an object of the present invention is to provide a precision cleaning method that can reliably remove fine particles, oily foreign matter, etc. attached to an object to be cleaned in a short period of time.
本発明の他の目的は、廃液処理の容易な精密洗浄方法を
提供することにある。Another object of the present invention is to provide a precision cleaning method that facilitates waste liquid treatment.
本発明のさらに他の目的は、被洗浄物に付着した微粒子
や油性異物などを短時間に確実に除去することが可能な
洗浄液を提供することにある。Still another object of the present invention is to provide a cleaning liquid that can reliably remove fine particles, oily foreign matter, etc. attached to an object to be cleaned in a short period of time.
本発明のさらに他の目的は、廃液処理の容易な洗浄液を
提供することにある。Still another object of the present invention is to provide a cleaning liquid that is easy to treat as waste liquid.
本発明のさらに他の目的は、洗浄後の被洗浄物における
表面の平坦度および清浄度を維持することが可能な乾燥
技術を提供することにある。Still another object of the present invention is to provide a drying technique capable of maintaining the surface flatness and cleanliness of an object to be cleaned after cleaning.
本発明の前記ならびにその他の目的と新規な特徴は、本
明細書の記述および添付図面から明らかになるであろう
。The above and other objects and novel features of the present invention will become apparent from the description of this specification and the accompanying drawings.
本願において開示される発明のうち、代表的なものの概
要を簡単に説明すれば、下記のとおりである。A brief overview of typical inventions disclosed in this application is as follows.
すなわち、本発明になる精密洗浄方法は、界面活性剤を
含む洗浄液または溶剤に超音波を乗せて被洗浄物に噴射
供給することにより洗浄を行うようにしたものである。That is, in the precision cleaning method of the present invention, cleaning is performed by applying ultrasonic waves to a cleaning liquid or solvent containing a surfactant and spraying the same onto an object to be cleaned.
また、本発明になる洗浄液は、超音波エネルギを援用し
た精密洗浄に用いられる洗浄液であって、界面活性剤ま
たは当該界面活性剤と有機系添加剤とを含む原液を純水
によってミセル形成臨界濃度の近傍まで希釈してなるも
のである。Further, the cleaning liquid of the present invention is a cleaning liquid used for precision cleaning using ultrasonic energy, in which a surfactant or an undiluted solution containing the surfactant and an organic additive is heated to a critical concentration for micelle formation using pure water. It is diluted to the vicinity of .
また、本発明になる乾燥方法は、精密洗浄を施されてな
る被洗浄物の乾燥方法であって、被洗浄物を不活性ガス
の雰囲気下で乾燥させるようにしたものである。Further, the drying method of the present invention is a method for drying an object to be cleaned that has been subjected to precision cleaning, and the object to be cleaned is dried in an atmosphere of an inert gas.
上記した本発明の精密洗浄方法によれば、たとえば、メ
ガ七帯域の周波数の超音波を用い、界面活性剤または当
該界面活性剤と有機系添加剤とを含む原液を純水によっ
てミセル形成臨界濃度の近傍に希釈してなる洗浄液を用
いることにより、洗浄液の発泡などに起因して超音波エ
ネルギの洗浄効果に対する寄与を損なうことなく、被洗
浄物の表面に付着した加工残滓などの微粒子を効果的に
除去できるとともに、被洗浄物に付着している油性異物
は、洗浄液中の界面活性剤との乳化反応によって、除去
しやすい粒子状態となり、被洗浄物に付着した微粒子お
よび油性異物のいずれをも短時間に確実に除去すること
ができる。According to the precision cleaning method of the present invention described above, for example, using ultrasonic waves with a frequency in the mega-7 band, a surfactant or an undiluted solution containing the surfactant and an organic additive is heated to a critical concentration for micelle formation using pure water. By using a diluted cleaning solution near the cleaning solution, it is possible to effectively remove fine particles such as processing residues attached to the surface of the object to be cleaned, without impairing the contribution of ultrasonic energy to the cleaning effect due to foaming of the cleaning solution. At the same time, oily foreign matter adhering to the object to be cleaned becomes particles that can be easily removed through an emulsification reaction with the surfactant in the cleaning solution, and both fine particles and oily foreign matter adhering to the object to be cleaned are removed. It can be removed reliably in a short time.
また、洗浄液にふける界面活性剤がミセル形成臨界濃度
の近傍の低濃度であるため、環境汚染などを懸念するこ
となく、簡単な廃液処理設備で廃液処理を容易に行うこ
とができる。Furthermore, since the surfactant present in the cleaning solution has a low concentration close to the critical concentration for micelle formation, waste liquid treatment can be easily performed using simple waste liquid treatment equipment without worrying about environmental pollution.
また、本発明の洗浄液によれば、たとえば、界面活性剤
または当該界面活性剤と有機系添加剤とを含む原液を純
水によってミセル形成臨界濃度の近傍に希釈して構成さ
れているので、たとえば高濃度の界面活性剤を含有させ
る場合のように、洗浄液の発泡などによって超音波エネ
ルギの被洗浄物への伝播効率が損なわれることがなく、
超音波エネルギを援用する洗浄作業に際して、被洗浄物
の表面に付着した微粒子を効果的に除去できるとともに
、界面活性剤の乳化反応などによる油性異物の粒子化作
用によって、被洗浄物の表面に付着した油性異物の除去
を効果的に行うことができる。Further, according to the cleaning liquid of the present invention, for example, a surfactant or a stock solution containing the surfactant and an organic additive is diluted with pure water to a concentration close to the critical concentration for micelle formation. The efficiency of propagation of ultrasonic energy to the object to be cleaned is not impaired due to foaming of the cleaning liquid, which is the case when a high concentration of surfactant is contained.
During cleaning operations that utilize ultrasonic energy, fine particles adhering to the surface of the object to be cleaned can be effectively removed, and oil-based foreign matter particles attached to the surface of the object to be cleaned can be removed by the emulsification reaction of surfactants, etc. It is possible to effectively remove oily foreign matter.
さらに、界面活性剤がミセル形成臨界濃度の近傍の低濃
度であるため、環境汚染などを懸念することなく、簡単
な廃液処理設備で廃液処理を容易に行うことができる。Furthermore, since the surfactant has a low concentration close to the critical concentration for micelle formation, waste liquid treatment can be easily performed using simple waste liquid treatment equipment without worrying about environmental pollution.
また、本発明になる乾燥方法によれば、リンス後、表面
に液滴が付着した状態の被洗浄物が不活性ガスの雰囲気
中で乾燥されるので、たとえば、雰囲気中の酸素の作用
などによって、金属や合金などからなる被洗浄物の表面
から液滴への金属元素の溶出が促進されることが確実に
防止される。Furthermore, according to the drying method of the present invention, after rinsing, the object to be cleaned with droplets attached to its surface is dried in an inert gas atmosphere, so that, for example, due to the action of oxygen in the atmosphere, This reliably prevents the elution of metal elements from the surface of the object to be cleaned made of metals, alloys, etc. into droplets from being accelerated.
これにより、せっかく前段の洗浄処理によって平坦かつ
清浄な状態にされた被洗浄物の表面が、食刻痕による凹
凸を生じたり、液滴に溶は出した金属元素の酸化物が液
滴の消失後に残留して生じる異物などによって再汚染さ
れることなどが確実に防止できる。As a result, the surface of the object to be cleaned, which has been made flat and clean by the previous cleaning process, may become uneven due to etching marks, and the oxides of metal elements dissolved into the droplets may disappear. It is possible to reliably prevent re-contamination caused by foreign matter that remains afterwards.
〔実施例１〕
第１図は、本発明の一実施例である精密洗浄方法を実施
するための装置構成の一例の要部を示す斜視図であり、
第２図および第３図は、その全体構成の概略を示す正面
図および側面図である。[Example 1] FIG. 1 is a perspective view showing a main part of an example of an apparatus configuration for carrying out a precision cleaning method according to an embodiment of the present invention.
FIGS. 2 and 3 are a front view and a side view schematically showing the overall configuration.
まず、装置構成の概略を説明する。First, the outline of the device configuration will be explained.
筐体１０には、たとえば円板状を呈する磁気ディスク基
板などからなる被洗浄物１の外周部の複数箇所に嵌合し
て当該被洗浄物１を支持する案内ローラ１１および複数
の回転駆動ローラ１２９回転駆動ローラ１３が鉛直面内
に配置されている。The housing 10 includes a guide roller 11 and a plurality of rotary drive rollers that fit into multiple locations on the outer periphery of the object 1 to be cleaned and support the object 1, which is made of, for example, a disc-shaped magnetic disk substrate. A 129 rotation drive roller 13 is arranged in a vertical plane.
複数の回転駆動ローラ１２および１３は、図示しないモ
ータなどによって自転する動作を行うとともに、筐体１
０に静止して支持された案内ローラ１１に対して接近ま
たは離反する方向に全体が変位可能な構造となっている
。The plurality of rotary drive rollers 12 and 13 are rotated by a motor (not shown), etc., and are rotated by a motor (not shown).
It has a structure in which the entire structure is movable towards or away from the guide roller 11 which is supported stationary at zero.
そして、案内ローラ１１と複数の回転駆動ローラ１２お
よび１３との間に、円板状の被洗浄物ｌをほぼ鉛直な姿
勢となるように着脱自在に保持するとともに、回転駆動
ローラ１２および１３を自転させることによって、これ
らに外周部を接した被洗浄物１が所望の速度で回転され
るものである。A disc-shaped object l to be cleaned is removably held between the guide roller 11 and a plurality of rotary drive rollers 12 and 13 in a substantially vertical position, and the rotary drive rollers 12 and 13 are By rotating, the object 1 to be cleaned whose outer peripheral portion is in contact with these objects is rotated at a desired speed.
前記案内ローラ１１右よび複数の回転駆動ローラ１２お
よび１３に支持された被洗浄物１０両側面には、複数の
洗浄ノズル１４および洗浄ノズル１５が、当該被洗浄物
１０両側面にそれぞれの噴射口１４ａおよび噴射口１５
ａを向けた姿勢で配置されている。A plurality of cleaning nozzles 14 and a cleaning nozzle 15 are provided on both sides of the object to be cleaned, which is supported by the right side of the guide roller 11 and a plurality of rotary drive rollers 12 and 13. 14a and injection port 15
It is placed in a position facing a.
この洗浄ノズル１４および１５は、それぞれ、駆動アー
ム１６および駆動アーム１７を介して、筐体１０に支持
された駆動ステージ１８および駆動ステージ１９に固定
されている。そして、第２図などに示されるように、駆
動ステージ１８および１９の独立した往復動作により、
各々に支持された洗浄ノズル１４および洗浄ノズル１５
は、被洗浄物１の両側面に右いて、当該被洗浄物１の径
方向に往復動する構造となっでいる。The cleaning nozzles 14 and 15 are fixed to a drive stage 18 and a drive stage 19 supported by the housing 10 via drive arms 16 and 17, respectively. As shown in FIG. 2, the independent reciprocating movements of the drive stages 18 and 19 cause
Washing nozzle 14 and washing nozzle 15 supported respectively
are located on both sides of the object 1 to be cleaned and are structured to reciprocate in the radial direction of the object 1 to be cleaned.
洗浄ノズル１４および洗浄ノズル１５には、液供給管１
４ｂおよび液供給管１５ｂが接続されており、外部の図
示しない液供給源から、後述のような所定の組成の洗浄
液２を所定の圧で供給することにより、各々の噴射口１
４ａおよび１５ａから被洗浄物１０両面にそれぞれ洗浄
液２が噴射される構造となっている。The cleaning nozzle 14 and the cleaning nozzle 15 are provided with a liquid supply pipe 1.
4b and a liquid supply pipe 15b are connected, and each injection port 1 is supplied with a cleaning liquid 2 having a predetermined composition as described below at a predetermined pressure from an external liquid supply source (not shown).
The structure is such that the cleaning liquid 2 is sprayed onto both sides of the object to be cleaned 10 from 4a and 15a, respectively.
さらに、洗浄ノズル１４および洗浄ノズル１５の内部に
は、それぞれ超音波発振器１４ｃおよび超音波１５Ｃが
設けられており、噴射口１４ａおよび１５ａから噴出す
る洗浄液２に対して、たとえば、０゜５〜５ＭＨｚの範
囲のメガヘルツ帯域の超音波振動が与えられるように構
成されている。Further, an ultrasonic oscillator 14c and an ultrasonic wave 15C are provided inside the cleaning nozzle 14 and the cleaning nozzle 15, respectively, and the cleaning liquid 2 ejected from the injection ports 14a and 15a has a frequency of, for example, 0°5 to 5MHz. The system is configured to provide ultrasonic vibrations in the megahertz range.
この場合、洗浄ノズル１４および１５から被洗浄物１に
対して噴射される洗浄液２は、たとえば、界面活性剤の
濃度が１〜５重量％、あるいは有機系添加剤を含めて１
〜１０重量％の原液を純水によってミセル臨界濃度程度
に希釈して調製されており、その状態において環境汚染
の指標の一つである化学的酸素要求量（ＣＯＤ値）は１
００ｍｇ／ｌ以下にされている。In this case, the cleaning liquid 2 sprayed onto the object 1 from the cleaning nozzles 14 and 15 has a surfactant concentration of 1 to 5% by weight, or a concentration of 1% by weight including organic additives.
It is prepared by diluting ~10% by weight stock solution with pure water to about the micelle critical concentration, and in that state, the chemical oxygen demand (COD value), which is one of the indicators of environmental pollution, is 1.
00mg/l or less.
また、特に図示しないが、液供給管１４ｂ（１５ｂ）の
経路または、図示しない液供給源には、加温機構が設け
られており、洗浄液２は所定の温度に加温された状態で
、洗浄ノズル１４右よび１５を介して被洗浄物１に供給
される構造となっている。Further, although not particularly shown, a heating mechanism is provided in the path of the liquid supply pipe 14b (15b) or the liquid supply source (not shown), and the cleaning liquid 2 is heated to a predetermined temperature. It has a structure in which it is supplied to the object 1 to be cleaned through the nozzles 14 and 15 on the right side.
さらに、この場合、洗浄ノズル１４および１５は、被洗
浄物１の平面に対して軸を傾斜させた姿勢でそれぞれの
駆動アーム１６および駆動アーム１７に固定されており
、それぞれの噴射口１４ａおよび１５ａから被洗浄物１
０表面に対して洗浄液２を所定の傾斜角度θ（たとえば
３０〜６０度）で噴射するように構成されている。Furthermore, in this case, the cleaning nozzles 14 and 15 are fixed to the respective drive arms 16 and 17 with their axes inclined with respect to the plane of the object 1 to be cleaned, and the respective injection ports 14a and 15a are fixed to the drive arms 16 and 17, respectively. Item to be cleaned 1
The cleaning liquid 2 is injected onto the zero surface at a predetermined inclination angle θ (for example, 30 to 60 degrees).
一方、上述のような構成の洗浄作業を経た被洗浄物１の
乾燥を行う乾燥装置の構成の一例を示すものが第４図で
ある。On the other hand, FIG. 4 shows an example of the configuration of a drying apparatus that dries the object 1 to be cleaned that has undergone the cleaning operation as described above.
すなわち、本実施例の乾燥装置は、たとえば純水などの
リンス液３が貯留される温浴槽２０と、乾燥槽２１と、
冷却槽２２とを垂直方向に直列的に接続して構成されて
いる。That is, the drying device of this embodiment includes a hot tub 20 in which a rinsing liquid 3 such as pure water is stored, a drying tank 21,
The cooling tank 22 is connected vertically in series.
垂直方向に直列的に接続される温浴槽２０および乾燥槽
２１．冷却槽２２の中央部には、当該各部を軸方向に貫
くように上下動する搬送アーム２３が設けられている。A hot tub 20 and a drying tub 21 connected in series in the vertical direction. At the center of the cooling tank 22, a transport arm 23 is provided which moves up and down so as to axially pierce through each part.
そして、この搬送アーム２３の先端部に被洗浄物１を着
脱自在に保持して温浴槽２０．乾燥槽２１、冷却槽２２
などを移動させることにより、当該被洗浄物ｌに対する
後述のようなリンスや乾燥処理が実施されるものである
。The object to be cleaned 1 is removably held at the tip of the transfer arm 23 in the hot tub 20. Drying tank 21, cooling tank 22
By moving the objects such as the above, rinsing and drying processes as described below are performed on the object to be cleaned l.
温浴槽２０の底部にはヒータ２０ａが設けられており、
当該温浴槽２０の内部に貯留されているリンス液３が所
定の温度に加温される構造となっている。また、温浴槽
２０にはリンス液供給部２０ｂが接続されており、被洗
浄物ｌの浸漬時に温浴槽２０から溢れ出て失われるリン
ス液３が随時補充されるようになっている。A heater 20a is provided at the bottom of the hot tub 20,
The structure is such that the rinse liquid 3 stored inside the hot tub 20 is heated to a predetermined temperature. Further, a rinsing liquid supply section 20b is connected to the hot tub 20, so that the rinsing liquid 3 that overflows and is lost from the hot tub 20 when the object to be cleaned 1 is immersed is replenished as needed.
乾燥槽２１の壁面には、ヒータ２１ａが設けられてふり
、搬送アーム２３に保持された状態で当該乾燥槽２１の
内部に位置される被洗浄物１を輻射熱によって加熱する
ことにより、乾燥処理が行われるものである。A heater 21a is provided on the wall of the drying tank 21, and the drying process is performed by heating the object 1 to be cleaned, which is placed inside the drying tank 21 while being held by the transport arm 23, with radiant heat. It is something that is done.
この場合、この乾燥槽２１には、不活性ガス源２１ｂに
接続されたガスノズル２１Ｃが設けられている。そして
、このガスノズル２１ｃを通じて乾燥槽２１の内部に、
たとえば窒素ガスなどの不活性ガス２１ｄを導入するこ
とにより、不活性ガス２１ｄによる酸素濃度の極めて低
い非酸化性の雰囲気内において、被洗浄物１の乾燥処理
が遂行される構造となっている。In this case, this drying tank 21 is provided with a gas nozzle 21C connected to an inert gas source 21b. Then, inside the drying tank 21 through this gas nozzle 21c,
For example, by introducing an inert gas 21d such as nitrogen gas, the object to be cleaned 1 is dried in a non-oxidizing atmosphere with an extremely low oxygen concentration due to the inert gas 21d.
また、乾燥槽２１の上部側に接続された冷却槽２２の内
部には、当該乾燥槽２１の内部における被洗浄物ｌの移
動経路を取り囲むように、螺線状の冷却管２２ａが配置
されており、この冷却管２２ａの内部には冷却水２２ｂ
が流通されている。Further, inside the cooling tank 22 connected to the upper side of the drying tank 21, a spiral cooling pipe 22a is arranged so as to surround the movement path of the object to be cleaned l inside the drying tank 21. There is cooling water 22b inside this cooling pipe 22a.
is being distributed.
そして、温浴槽２０や乾燥槽２１などにおいて発生した
リンス液３の蒸気は、冷却管２２Ｈの表面に凝縮して回
収されるようになっている。The steam of the rinsing liquid 3 generated in the hot tub 20, drying tank 21, etc. is condensed on the surface of the cooling pipe 22H and collected.
以下、上述のような構成の本実施例の精密洗浄および乾
燥方法の一例について説明する。Hereinafter, an example of the precision cleaning and drying method of this embodiment having the above-described configuration will be described.
まず、磁気ディスク基板などの被洗浄物１を案内ローラ
１１および回転駆動ローラ１２，１３によってほぼ鉛直
面に平行となるように保持して所望の速度で回転させる
。First, the object 1 to be cleaned, such as a magnetic disk substrate, is held by the guide roller 11 and rotation drive rollers 12, 13 so as to be substantially parallel to a vertical plane, and rotated at a desired speed.
そして、回転されつつある被洗浄物１の両側面にそれぞ
れ配置された洗浄ノズル１４および洗浄ノズル１５の噴
射口１４ａおよび１５ａから、前述のように比較的低濃
度の界面活性剤などを含んで加温された洗浄液２を、た
とえば０．５〜５ＭＨｚの超音波を乗せた状態で当該被
洗浄物１０表面に対して、３０〜６０度の角度θをなす
ように噴射しながら、駆動ステージ１８および１９を変
位させることにより、個々の洗浄ノズル１４および１５
を被洗浄物１の径方向に往復動させる。Then, as mentioned above, a relatively low concentration of surfactant is applied from the injection ports 14a and 15a of the cleaning nozzle 14 and the cleaning nozzle 15 arranged on both sides of the object to be cleaned 1, which is being rotated. The drive stage 18 and By displacing 19, the individual cleaning nozzles 14 and 15
is reciprocated in the radial direction of the object 1 to be cleaned.
これにより、被洗浄物ｌの自転と、複数の洗浄ノズル１
４および１５の当該被洗浄物１の径方向における変位と
により、被洗浄物１０両側面が全面にわたって洗浄液２
によって洗浄される。This allows the rotation of the object to be cleaned and the rotation of the plurality of cleaning nozzles 1.
4 and 15 in the radial direction of the object 1 to be cleaned, both sides of the object 10 to be cleaned are covered with the cleaning liquid 2.
Washed by.
この時、本実施例の場合には、洗浄ノズル１４および１
５の各々に設けられた超音波発振器１４Ｃおよび１５Ｃ
から、洗浄液２に印加される０、５〜５ＭＨｚ程度の高
い周波数の超音波エネルギによって、被洗浄物１の表面
に付着している加工残滓などの微粒子状の異物が確実に
除去されるとともに、洗浄液２の内部に含有される低濃
度の界面活性剤などによる乳化作用などによって被洗浄
物１の表面に付着している油性異物が容易に除去されや
すい微粒子状にされ、この微粒子状になった油性異物も
超音波エネルギによって被洗浄物１の表面から迅速に除
去される。At this time, in the case of this embodiment, the cleaning nozzles 14 and 1
Ultrasonic oscillators 14C and 15C provided in each of 5
The ultrasonic energy at a high frequency of about 0.5 to 5 MHz applied to the cleaning liquid 2 reliably removes fine particulate foreign matter such as processing residues adhering to the surface of the object to be cleaned 1, and The oily foreign matter adhering to the surface of the object to be cleaned 1 is made into fine particles that are easily removed by the emulsification effect of the low concentration surfactant contained in the cleaning liquid 2, and the fine particles are formed into fine particles. Oily foreign matter is also quickly removed from the surface of the object to be cleaned 1 by ultrasonic energy.
この結果、被洗浄物ｌに付着していた微粒子状の異物や
油性異物などが短時間で確実に除去される。As a result, particulate foreign matter, oily foreign matter, etc. adhering to the object to be cleaned 1 are reliably removed in a short time.
上述のような本実施例の精密洗浄方法の効果の一例を示
すものが第５図である。FIG. 5 shows an example of the effect of the precision cleaning method of this embodiment as described above.
すなわち、同図の縦軸および横軸には、それぞれ、汚れ
除去率（％）および洗浄液２に含有される界面活性剤の
濃度（ｖｏ１％）がとられており、洗浄処理時間が１５
秒（△印））／３０秒（口印）７６０秒（○印）の各々
の場合について、界面活性剤の濃度が、０．０．５．１
（ｖｏ１％）における実験結果を示したものである。That is, the stain removal rate (%) and the concentration of surfactant contained in cleaning liquid 2 (vo1%) are plotted on the vertical and horizontal axes of the figure, respectively, and the cleaning processing time is 15%.
For each case, the concentration of surfactant is 0.0.5.1
(vol 1%) shows the experimental results.
また、界面活性剤の濃度が１ｖｏ１％で、超音波振動を
印加しない場合が、■印および・印で示されている。Further, the case where the concentration of the surfactant is 1 vol % and no ultrasonic vibration is applied is shown by the ■ mark and the * mark.
なお、縦軸の汚れ除去率（％）は、本実施例の場合、親
水性の清浄な被洗浄物１の表面（面積Ｓ）全体に軽油を
擦り込み塗布して完全な疎水性（水濡れ性０％）とし、
前述のような洗浄処理を施した後に、純水中に完全に浸
漬して引き上げ、垂直状態で１０秒間保持して水切りを
した後、純水に濡れている面積Ａを測定し、（Ａ／Ｓ）
ｘ １００（％）によって得られた数値を用いている
。In this example, the dirt removal rate (%) on the vertical axis is determined by rubbing light oil onto the entire surface (area S) of the clean hydrophilic object 1 to achieve complete hydrophobicity (water wettability). 0%),
After performing the cleaning treatment as described above, it was completely immersed in pure water, pulled out, held vertically for 10 seconds and drained, and then the area A wetted by pure water was measured, and (A/ S)
The numerical value obtained by x 100 (%) is used.
同図に示されるように、界面活性剤を全く添加しない場
合と、１ｖ０１％程度添加した場合とで、洗浄効果に大
きな差異が見られ、同時に、超音波振動の印加の有無も
洗浄結果に大きく影響していることが判る。As shown in the figure, there is a large difference in the cleaning effect between when no surfactant is added and when it is added at around 1v01%, and at the same time, the presence or absence of application of ultrasonic vibration also has a large effect on the cleaning results. It is clear that it is having an influence.
すなわち、本実施例の場合のように、洗浄液２に対して
１ｖ０１％程度の低、ａ度に界面活性剤を添加すること
で、洗浄液２の発泡などに起因して超音波エネルギによ
る洗浄効果を損なうことなく、被洗浄物１の表面に付着
している微粒子状の異物や油性異物を、６０秒程度の短
時間でほぼ完全に除去できる効果が得られることが判る
。That is, as in the case of this embodiment, by adding a surfactant to the cleaning liquid 2 at a low level of about 1v01%, the cleaning effect by ultrasonic energy is reduced due to foaming of the cleaning liquid 2. It can be seen that it is possible to almost completely remove particulate foreign matter and oily foreign matter adhering to the surface of the object 1 to be cleaned in a short period of about 60 seconds without damaging the surface.
なお、特に図示しないが、本発明者らの研究によれば、
流量０．５７！／分、１１／分、２１／分とした場合に
、それぞれ、３０％、７０％、９５％の汚れ除去率とな
ることが知られており、本実施例の場合には、被洗浄物
１に噴射される洗浄液２の流°量をたとえば２１７分以
上に設定して大きな洗浄効果が得られるようにしている
。Although not particularly shown, according to the research of the present inventors,
Flow rate 0.57! It is known that the dirt removal rate is 30%, 70%, and 95% when the cleaning rate is 11/min, 11/min, and 21/min, respectively. The flow rate of the cleaning liquid 2 that is sprayed is set to, for example, 217 minutes or more to obtain a large cleaning effect.
また、本実施例のように、洗浄液２を被洗浄物１に噴射
しながら洗浄処理を遂行する場合には、多量の廃液を生
じることとなり、環境汚染防止などの観点から、この廃
液の処理が実際の作業上重要な問題となる。In addition, as in this embodiment, when the cleaning process is performed while spraying the cleaning liquid 2 onto the object to be cleaned 1, a large amount of waste liquid is generated, and from the viewpoint of preventing environmental pollution, it is necessary to dispose of this waste liquid. This is an important problem in actual work.
ところが、本実施例の場合には、洗浄液２に添加される
界面活性剤などの濃度を、前述のように１ｖ０１％程度
のミセル形成臨界濃度とし、化学的酸素要求量（ＣＯＤ
）が、はぼ１００■／１以下になるようにしているので
、通常の洗剤のように高濃度の界面活性剤を含む場合に
比較して、廃液の処理設備を大幅に簡略化することが可
能となり、被洗浄物ｌの精密洗浄工程におけるコスト低
減が実現する。However, in the case of this example, the concentration of the surfactant etc. added to the cleaning liquid 2 is set to the critical concentration for micelle formation of about 1v01% as described above, and the chemical oxygen demand (COD
) is set to be less than 100μ/1, which greatly simplifies waste treatment equipment compared to when detergents contain high concentrations of surfactants. This makes it possible to realize cost reduction in the precision cleaning process of the object to be cleaned.
また第６図は、洗浄液２に添加される界面活性剤などの
濃度が１ｖｏ１％右よびＱ、５ ｖ ｏ １％の各々の
場合について、洗浄液２の温度を種々変化させた場合の
実験結果の一例を示すものである。Furthermore, Figure 6 shows the experimental results when the temperature of the cleaning liquid 2 was varied in the cases where the concentration of the surfactant etc. added to the cleaning liquid 2 was 1% by volume, 5% by volume, and 5% by volume. This is an example.
同図に示されるように、洗浄液２に添加される界面活性
剤などの濃度が１ｖｏ１％程度の場合には、４０℃程度
までの加温が有効であることが知られる。As shown in the figure, it is known that heating up to about 40° C. is effective when the concentration of the surfactant or the like added to the cleaning liquid 2 is about 1 vol%.
これにより、本実施例の場合のように、洗浄ノズル１４
および１５から被洗浄物１に供給される洗浄液２を加温
することにより、被洗浄物１の洗浄効果を高めることが
できる。As a result, as in the case of this embodiment, the cleaning nozzle 14
By heating the cleaning liquid 2 supplied to the object 1 from 15 and 15, the cleaning effect of the object 1 can be enhanced.
また、被洗浄物１をほぼ鉛直方向に直立させるとともに
、この被洗浄物１の表面に対して、洗浄液２を所定の傾
斜角度θをなして噴射供給することにより、洗浄操作を
終えた洗浄液２（廃液）が迅速に被洗浄物１０表面から
排除され、廃液による被洗浄物１の再汚染を効果的に防
止できる。Further, the object to be cleaned 1 is made to stand upright in a substantially vertical direction, and the cleaning liquid 2 is sprayed onto the surface of the object to be cleaned 1 at a predetermined inclination angle θ. (waste liquid) is quickly removed from the surface of the object to be cleaned 10, and re-contamination of the object to be cleaned 1 by the waste liquid can be effectively prevented.
このように、本実施例の場合には、被洗浄物１の加工残
滓などによる微粒子状の異物と、油性異物などのように
性質の異なる異物を被洗浄物１の表面から同一工程で除
去することができるので、両者を個別の工程で除去する
場合などに比較して、被洗浄物１の精密洗浄工程を簡略
化できる効果かえられる。As described above, in the case of this embodiment, fine particulate foreign matter such as processing residue of the object 1 to be cleaned and foreign matter having different properties such as oily foreign matter are removed from the surface of the object 1 to be cleaned in the same process. Therefore, the effect of simplifying the precision cleaning process of the object to be cleaned 1 can be obtained compared to the case where both are removed in separate processes.
次に、上述のようにした洗浄処理が施された被洗浄物１
を、搬送アーム２３に保持して第４図に示される温浴槽
２０の内部のリンス液３に浸漬させ、表面に付着してい
る洗浄時の廃液などを濯いで除去する。Next, the object to be cleaned 1 which has been subjected to the cleaning process as described above.
is held on the transfer arm 23 and immersed in the rinsing liquid 3 inside the hot bath 20 shown in FIG. 4, and the waste liquid from cleaning adhering to the surface is rinsed and removed.
その後、搬送アーム２３を駆動して被洗浄物１を乾燥槽
２１の内部に位置させ、ガスノズル２１Ｃから供給され
る不活性ガス２１ｄの雰囲気中において、ヒータ２１ａ
からの輻射熱によって乾燥処理が行われる。Thereafter, the transfer arm 23 is driven to position the object 1 to be cleaned inside the drying tank 21, and the heater 21a is placed in the atmosphere of the inert gas 21d supplied from the gas nozzle 21C.
The drying process is performed using radiant heat from the
この時、従来のように、乾燥槽２１の内部が通常の空気
などのような酸化性の雰囲気にある場合には、前述のよ
うに、被洗浄物１０表面に付着している液滴中に、被洗
浄物１を構成する金属元素が溶は出して、酸化物を形成
する反応が促進され、折角精密洗浄を施して高度に清浄
化および平坦化した被洗浄物１の表面に凹凸を生じたり
、液滴の消失後、金属元素の酸化物が微粒子状の異物と
なって被洗浄物ｌの表面を再汚染することが懸念される
。At this time, if the inside of the drying tank 21 is in an oxidizing atmosphere such as normal air, as in the conventional case, as described above, the droplets attached to the surface of the object to be cleaned 10 may contain , the metal elements constituting the object to be cleaned 1 are leached out, the reaction to form oxides is promoted, and the surface of the object to be cleaned 1, which has been highly cleaned and flattened through precision cleaning, becomes uneven. In addition, after the droplets disappear, there is a concern that the oxide of the metal element may turn into fine particle foreign matter and recontaminate the surface of the object to be cleaned.
すなわち、本発明者らの研究によれば、第７図に示され
るように、雰囲気ガス中の酸素濃度が高いほど、液滴中
への被洗浄物ｌの構成元素の溶出量が増大することが明
らかになっている。That is, according to the research conducted by the present inventors, as shown in FIG. 7, the higher the oxygen concentration in the atmospheric gas, the more the constituent elements of the object to be cleaned l elute into the droplets. has become clear.
そこで、本実施例の場合には、前述のように不活性ガス
２１ｄによる非酸化性（酸素濃度がほぼ零）の雰囲気下
で乾燥処理を遂行することで、上述のような懸念をなく
し、洗浄後の被洗浄物１における表面の平坦度および清
浄度を維持することを可能にしている。これにより精密
洗浄右よび乾燥の一貫した処理工程において、被洗浄物
１の良好な洗浄結果を得ることができる。Therefore, in the case of this embodiment, by performing the drying process in a non-oxidizing atmosphere (oxygen concentration is almost zero) using the inert gas 21d as described above, the above-mentioned concerns can be eliminated and the cleaning This makes it possible to maintain the flatness and cleanliness of the surface of the object 1 to be cleaned later. This makes it possible to obtain good cleaning results for the object 1 to be cleaned in a consistent process of precision cleaning and drying.
〔実施例２〕
第８図は、本発明の精密洗浄方法の他の実施例の要部を
示す斜視図である。[Embodiment 2] FIG. 8 is a perspective view showing a main part of another embodiment of the precision cleaning method of the present invention.
すなわち、本実施例２の場合には、複数の洗浄ノズル１
４および１５とともに、被洗浄物１の両側面に純水など
からなるウォータ・ジェット３０ａおよび３１ａをそれ
ぞれ吹きつけるジェットノズル３０およびジェットノズ
ル３１を設けたところが前記実施例１の場合と異なるも
のである。That is, in the case of the second embodiment, a plurality of cleaning nozzles 1
This embodiment differs from the first embodiment in that, together with 4 and 15, a jet nozzle 30 and a jet nozzle 31 are provided for spraying water jets 30a and 31a made of pure water or the like onto both sides of the object 1 to be cleaned, respectively. .
これにより、ウォータ・ジェット３０ａおよび３１ｂに
よって、洗浄処理を終えて廃液となった洗浄液２を被洗
浄物ｌの表面から強制的に排除でき、廃液の付着による
被洗浄物１の再汚染を確実に防止できる。As a result, the water jets 30a and 31b can forcibly remove the cleaning liquid 2, which has become a waste liquid after the cleaning process, from the surface of the object 1 to be cleaned, thereby ensuring that the object 1 to be cleaned is not recontaminated due to adhesion of the waste liquid. It can be prevented.
このことを示す本発明者らによる実験結果が第９図であ
る。FIG. 9 shows experimental results by the inventors showing this.
同図から明らかなように、同一濃度の界面活性剤を含む
洗浄液２による同一時間の洗浄処理の場合には、本実施
例２のように、被洗浄物ｌを直立させるとともに、ウォ
ータ・ジェット３０ａおよび３１ａを併用した場合に、
最も高い洗浄効果が得られる。As is clear from the figure, in the case of cleaning treatment for the same time using the cleaning liquid 2 containing the same concentration of surfactant, as in the second embodiment, the object l to be cleaned is held upright, and the water jet 30a is and 31a when used together,
The highest cleaning effect can be obtained.
以上本発明者によってなされた発明を実方イ例に基づき
具体的に説明したが、本発明は前記実施例に限定される
ものではなく、その要旨を逸脱しない範囲で種々変更可
能であることはいうまでもない。Although the invention made by the present inventor has been specifically explained based on practical examples, the present invention is not limited to the above-mentioned examples, and it is understood that various changes can be made without departing from the gist of the invention. Needless to say.
たとえば、被洗浄物から廃液を排除する方法としては、
超音波振動と、ウォータ・ジェットなどを併用すること
に限らず、テープ拭き取り方式、あるいはスクラブ方式
などを併用してもよい。For example, as a method to remove waste liquid from the object to be cleaned,
The method is not limited to the combination of ultrasonic vibration and water jet, but may also be combined with a tape wiping method, a scrubbing method, or the like.
また、洗浄および乾燥装置の構成は、前記の各実施例に
例示したものに限定されないことは言うまでもない。Furthermore, it goes without saying that the configuration of the washing and drying apparatus is not limited to that exemplified in each of the above embodiments.
本願において開示される発明のうち、代表的なものによ
って得られる効果を簡単に説明すれば、以下のとおりで
ある。Among the inventions disclosed in this application, the effects obtained by typical inventions are briefly described below.
すなわち、本発明になる精密洗浄方法によれば、界面活
性剤を含む洗浄液または溶剤に超音波を乗せて被洗浄物
に噴射供給することにより洗浄を行うので、たとえば、
メガ七帯域の周波数の超音波を用い、界面活性剤または
当該界面活性剤と有機系添加剤とを含む原液を純水によ
ってミセル形成臨界濃度の近傍に希釈してなる洗浄液を
用いることにより、超音波エネルギの洗浄効果に対する
寄与を損なうことなく、被洗浄物の表面に付着した加工
残滓などの微粒子を効果的に除去できるとともに、被洗
浄物に付着している油性異物は、洗浄液中の界面活性剤
との乳化反応によって、除去しやすい粒子状態となり、
被洗浄物に付着した微粒子および油性異物のいずれをも
短時間に確実に除去することができる。That is, according to the precision cleaning method of the present invention, cleaning is performed by applying ultrasonic waves to a cleaning liquid or solvent containing a surfactant and spraying the same onto the object to be cleaned.
By using ultrasonic waves with a frequency in the mega-7 band and using a cleaning solution made by diluting a surfactant or a stock solution containing the surfactant and an organic additive with pure water to a concentration close to the critical concentration for micelle formation, Fine particles such as processing residues adhering to the surface of the object to be cleaned can be effectively removed without impairing the contribution of sonic energy to the cleaning effect, and oily foreign matter adhering to the object to be cleaned can be removed by the surfactant in the cleaning liquid. Through an emulsification reaction with the agent, it becomes particles that are easy to remove.
Both fine particles and oily foreign matter adhering to the object to be cleaned can be reliably removed in a short time.
また、洗浄液における界面活性剤がミセル形成臨界濃度
の近傍の低濃度であるため、環境汚染の指標の一つであ
る化学的酸素要求量をたとえば１００■／ｊｉ！以下程
度に小さくでき、環境汚染などを懸念することなく、簡
単な廃液処理設備で廃液処理を容易に行うことができる
。In addition, since the surfactant in the cleaning solution is at a low concentration near the critical concentration for micelle formation, the chemical oxygen demand, which is one of the indicators of environmental pollution, is, for example, 100 ■/ji! It can be made as small as below, and waste liquid treatment can be easily carried out using simple waste liquid treatment equipment without worrying about environmental pollution.
また、本発明になる洗浄液によれば、たとえば、界面活
性剤または当該界面活性剤と有機系添加剤とを含む原液
を純水によってミセル形成臨界濃度の近傍に希釈して構
成されているので、たとえば高濃度の界面活性剤を含有
させる場合のように、洗浄液の発泡などによって超音波
エネルギの被洗浄物への伝播効率が損なわれることがな
く、超音波エネルギを援用する洗浄作業に際して、被洗
浄物の表面に付着した微粒子を効果的に除去できるとと
もに、界面活性剤の乳化反応などによる油性異物の粒子
化作用によって、被洗浄物の表面に付着した油性異物の
除去を効果的に行うことができる。Further, according to the cleaning liquid of the present invention, for example, the surfactant or a stock solution containing the surfactant and an organic additive is diluted with pure water to a concentration close to the critical concentration for micelle formation. For example, unlike when containing a high concentration of surfactant, the propagation efficiency of ultrasonic energy to the object to be cleaned is not impaired due to foaming of the cleaning solution, and it is possible to It is possible to effectively remove fine particles attached to the surface of objects, and it is also possible to effectively remove oily foreign substances attached to the surface of objects to be cleaned by turning oily foreign substances into particles through the emulsification reaction of surfactants. can.
さらに、界面活性剤がミセル形成臨界濃度の近傍の低濃
度であるため、環境汚染などを懸念することなく、簡単
な廃液処理設備で廃液処理を容易に行うことができる。Furthermore, since the surfactant has a low concentration close to the critical concentration for micelle formation, waste liquid treatment can be easily performed using simple waste liquid treatment equipment without worrying about environmental pollution.
また、本発明になる乾燥方法によれば、精密洗浄を施さ
れてなる被洗浄物の乾燥方法であって、前記被洗浄物を
不活性ガスの雰囲気下で乾燥させるようにしたので、リ
ンス後、表面に液滴が付着した状態の被洗浄物が非酸化
性の雰囲気中で乾燥され、たとえば、雰囲気中の酸素の
作用などによって、金属や合金などからなる被洗浄物の
表面から液滴への金属元素の溶出が促進されることが確
実に防止される。Further, according to the drying method of the present invention, the method for drying an object to be cleaned that has been subjected to precision cleaning is such that the object to be cleaned is dried in an atmosphere of an inert gas, so that after rinsing, the object to be cleaned is dried. , the object to be cleaned with droplets attached to its surface is dried in a non-oxidizing atmosphere, and droplets form on the surface of the object made of metal or alloy due to the action of oxygen in the atmosphere. The promotion of elution of the metal elements is reliably prevented.
これにより、せっかく前段の洗浄処理によって平坦かつ
清浄な状態にされた被洗浄物の表面が、食刻痕による凹
凸を生、じたり、液滴に溶は出した金属元素の酸化物が
液滴の消失後に残留して生じる異物などによって再汚染
されることなどが確実に防止できる。As a result, the surface of the object to be cleaned, which has been made flat and clean by the previous cleaning process, may become uneven due to etching marks, or the oxides of metal elements dissolved into the droplets may become It is possible to reliably prevent re-contamination caused by foreign matter that remains after the disappearance of the water.
第１図は、本発明の一実施例である精密洗浄方法を実施
するための装置構成の一例の要部を示す斜視図、
第２図は、その全体構成の概略を示す正面図、第３図は
、同じく、その全体構成の概略を示す側面図、
第４図は、本発明の一実施例である乾燥方法が実施され
る乾燥装置の構成の概略を説明する断面図、
第５図は、洗浄液への界面活性剤の添加および洗浄時間
と汚れ除去率との関係の一例を示す線図、第６図は、洗
浄液の温度と汚れ除去率との関係の一例を示す線図、
第７図は、乾燥工程における雰囲気ガスの酸素濃度と被
洗浄物に付着した液滴への金属元素の溶出量との関係の
一例を示す線図、
第８図は、本発明の他の実施例である精密洗浄方法を実
施するための装置構成の一例を示す斜視図、
第９図は、その効果の一例を示す説明図である。
１・・・被洗浄物、２・・・洗浄液、３・・・リンス液
、１０・・・筐体、１１・・・案内ローラ、１２．１３
・・・回転運動ローラ、１４・・・洗浄ノズル、１４ａ
・・・噴射口、１４ｂ・・・液供給管、１４ｃ・・・超
音波発振器、１５・・・・洗浄ノズル、１５ａ・・・噴
射口、１５ｂ・・・液供給管、１５ｃ・・・超音波、１
６．１７・・・駆動アーム、１８．１９・・・駆動ステ
ージ、２０・・・温浴槽、２０ａ・・・ヒータ、２０ｂ
・・・リンス液供給部、２１・・・乾燥槽、２１ａ・・
・ヒータ、２１ｂ・・・不活性ガス源、２１ｃ・・・ガ
スノズル、２１ｄ・・・不活性ガス、２２・・・冷却槽
、２２ａ・・・冷却管、２２ｂ・・・冷却水、２３・・
・搬送アーム、３０゜３１・・・ジェットノズル、３０
ａ、３１ａ・・・ウォータ・ジェット、θ・・・被洗浄
物の表面に対する洗浄液の噴射角度。
代理人 弁理士 筒 井 大 和
第
図
θ：彼＆浄物に対する洗浄ノズルの傾斜角度第
図
第
図
雰囲気ガス中の酸素濃度（％）
第
図
洗
浄
液
温
度（１＞
第
図FIG. 1 is a perspective view showing a main part of an example of an apparatus configuration for carrying out a precision cleaning method according to an embodiment of the present invention, FIG. 2 is a front view showing an outline of the overall configuration, and FIG. Similarly, the figure is a side view showing the outline of the overall structure, FIG. , a diagram showing an example of the relationship between the addition of a surfactant to the cleaning solution and the cleaning time, and the dirt removal rate; FIG. 6 is a diagram showing an example of the relationship between the temperature of the cleaning solution and the dirt removal rate; The figure is a diagram showing an example of the relationship between the oxygen concentration of the atmospheric gas and the amount of metal elements eluted into the droplets attached to the object to be cleaned in the drying process. FIG. 9 is a perspective view showing an example of an apparatus configuration for implementing a certain precision cleaning method. FIG. 9 is an explanatory diagram showing an example of the effect. DESCRIPTION OF SYMBOLS 1...Object to be cleaned, 2...Cleaning liquid, 3...Rinse liquid, 10...Casing, 11...Guide roller, 12.13
...Rotating motion roller, 14...Washing nozzle, 14a
... injection port, 14b ... liquid supply pipe, 14c ... ultrasonic oscillator, 15 ... cleaning nozzle, 15a ... injection port, 15b ... liquid supply pipe, 15c ... super Sound waves, 1
6.17... Drive arm, 18.19... Drive stage, 20... Hot tub, 20a... Heater, 20b
...Rinse liquid supply section, 21...Drying tank, 21a...
- Heater, 21b...Inert gas source, 21c...Gas nozzle, 21d...Inert gas, 22...Cooling tank, 22a...Cooling pipe, 22b...Cooling water, 23...
・Transport arm, 30° 31...Jet nozzle, 30
a, 31a... Water jet, θ... Injection angle of cleaning liquid with respect to the surface of the object to be cleaned. Agent Patent Attorney Kazu Tsutsui Diagram θ: Angle of inclination of the cleaning nozzle with respect to the object Diagram Diagram Oxygen concentration in the atmospheric gas (%) Diagram Cleaning liquid temperature (1> Diagram
Claims (1)
て被洗浄物に噴射供給することにより洗浄を行うことを
特徴とする精密洗浄方法。 ２、前記超音波の周波数がほぼ０．５〜５ＭＨｚの範囲
内にあり、前記被洗浄物の表面に対して所定の傾斜角を
なすように前記洗浄液または溶剤を噴射することを特徴
とする請求項１記載の精密洗浄方法。 ３、前記被洗浄物をほぼ鉛直面内に位置する姿勢で保持
し、超音波を乗せた前記洗浄液の噴射と機械的な力また
は物理的な力による前記洗浄液の前記被洗浄物からの除
去とを併用するようにした請求項１または２記載の精密
洗浄方法。 ４、前記洗浄液が、界面活性剤または当該界面活性剤と
有機系添加剤とを含む原液を純水によってミセル形成臨
界濃度の近傍まで希釈してなることを特徴とする請求項
１、２または３記載の精密洗浄方法。 ５、前記洗浄液が、界面活性剤の濃度が１〜５重量％、
あるいは有機系添加剤を含めて１〜１０重量％の原液を
純水によって希釈して調製されることを特徴とする請求
項１、２、３または４記載の精密洗浄方法。 ６、前記洗浄液における化学的酸素要求量（ＣＯＤ値）
が、１００ｍｇ／ｌ以下となるように前記原液の前記純
水による希釈率を設定することを特徴とする請求項１、
２、３、４または５記載の精密洗浄方法。 ７、超音波エネルギを援用した精密洗浄に用いられる洗
浄液であって、界面活性剤または当該界面活性剤と有機
系添加剤とを含む原液を純水によってミセル形成臨界濃
度の近傍に希釈してなることを特徴とする洗浄液。 ８、前記洗浄液が、界面活性剤の濃度が１〜５重量％、
あるいは有機系添加剤を含めて１〜１０重量％の原液を
純水によって希釈して構成されることを特徴とする請求
項７記載の洗浄液。 ９、前記洗浄液における化学的酸素要求量（ＣＯＤ値）
が、１００ｍｇ／ｌ以下となるように前記原液の前記純
水による希釈率を設定することを特徴とする請求項７ま
たは８記載の洗浄液。 １０、精密洗浄を施されてなる被洗浄物の乾燥方法であ
って、前記被洗浄物を不活性ガスの雰囲気下で乾燥させ
るようにしたことを特徴とする乾燥方法。 １１、請求項１、２、３、４、５または６記載の精密洗
浄方法と併用されることを特徴とする請求項１０記載の
乾燥方法。[Claims] 1. A precision cleaning method characterized in that cleaning is carried out by spraying ultrasonic waves onto a cleaning liquid or solvent containing a surfactant onto an object to be cleaned. 2. A claim characterized in that the frequency of the ultrasonic waves is within a range of approximately 0.5 to 5 MHz, and the cleaning liquid or solvent is sprayed at a predetermined angle of inclination with respect to the surface of the object to be cleaned. Precision cleaning method according to item 1. 3. Holding the object to be cleaned in a position substantially in a vertical plane, ejecting the cleaning liquid carrying ultrasonic waves, and removing the cleaning liquid from the object by mechanical force or physical force. 3. The precision cleaning method according to claim 1 or 2, wherein: 4. Claim 1, 2 or 3, wherein the cleaning liquid is obtained by diluting a surfactant or a stock solution containing the surfactant and an organic additive with pure water to a concentration close to the critical concentration for micelle formation. Precision cleaning method described. 5. The cleaning liquid has a surfactant concentration of 1 to 5% by weight,
Alternatively, the precision cleaning method according to claim 1, 2, 3, or 4, characterized in that it is prepared by diluting a 1 to 10% by weight stock solution including organic additives with pure water. 6. Chemical oxygen demand (COD value) in the cleaning solution
Claim 1, characterized in that the dilution rate of the stock solution with the pure water is set so that the amount of the undiluted solution is 100 mg/l or less.
Precision cleaning method according to 2, 3, 4 or 5. 7. A cleaning liquid used for precision cleaning using ultrasonic energy, which is prepared by diluting a surfactant or a stock solution containing the surfactant and an organic additive with pure water to a concentration close to the critical concentration for micelle formation. A cleaning liquid characterized by: 8. The cleaning liquid has a surfactant concentration of 1 to 5% by weight,
Alternatively, the cleaning liquid according to claim 7, characterized in that it is formed by diluting a 1 to 10% by weight stock solution including organic additives with pure water. 9. Chemical oxygen demand (COD value) in the cleaning solution
9. The cleaning liquid according to claim 7 or 8, wherein the dilution rate of the stock solution with the pure water is set so that the amount of the undiluted solution is 100 mg/l or less. 10. A method for drying an object to be cleaned that has been subjected to precision cleaning, characterized in that the object to be cleaned is dried in an atmosphere of an inert gas. 11. The drying method according to claim 10, which is used in combination with the precision cleaning method according to claim 1, 2, 3, 4, 5, or 6.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6732789A JPH02246115A (en) | 1989-03-17 | 1989-03-17 | Precision cleaning, its cleaning solution, and drying |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6732789A JPH02246115A (en) | 1989-03-17 | 1989-03-17 | Precision cleaning, its cleaning solution, and drying |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02246115A true JPH02246115A (en) | 1990-10-01 |
Family
ID=13341817
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6732789A Pending JPH02246115A (en) | 1989-03-17 | 1989-03-17 | Precision cleaning, its cleaning solution, and drying |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02246115A (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05104071A (en) * | 1991-06-12 | 1993-04-27 | Puretetsuku:Kk | High-frequency washing method |
| EP0779647A1 (en) * | 1995-12-15 | 1997-06-18 | Wacker Siltronic Gesellschaft für Halbleitermaterialien Aktiengesellschaft | Method and apparatus for treatment of semiconductor material |
| WO1998001896A1 (en) * | 1996-07-03 | 1998-01-15 | Ultraclean Technology Research Institute | Washing apparatus and washing method |
| JP2002224948A (en) * | 2001-01-26 | 2002-08-13 | Daido Chem Ind Co Ltd | DETERGENT COMPOSITION FOR ABRASIVE LIQUID FOR MAGNETIC DISK Ni-P SUBSTRATE, AND MANUFACTURING METHOD FOR MAGNETIC DISK Ni-P SUBSTRATE USING THE SAME |
| CN1319657C (en) * | 2003-10-22 | 2007-06-06 | 株式会社海上 | Ultrasonic shower cleaning apparatus of double-side cleaning type |
| JP2011230079A (en) * | 2010-04-28 | 2011-11-17 | Kyocera Kinseki Corp | Washing apparatus |
| CN102513301A (en) * | 2011-12-29 | 2012-06-27 | 清华大学 | Megasonic cleaning device for wafer |
| JP2013056310A (en) * | 2011-09-09 | 2013-03-28 | Olympus Corp | Cleaning apparatus |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59109599A (en) * | 1982-12-16 | 1984-06-25 | 株式会社東芝 | Drug vessel cleaning method |
| JPS60249331A (en) * | 1984-05-24 | 1985-12-10 | Nec Corp | Semiconductor wafer washing apparatus |
| JPS6116528A (en) * | 1985-06-14 | 1986-01-24 | Hitachi Ltd | Cleaning device for wafer |
| JPS6356921A (en) * | 1986-08-28 | 1988-03-11 | Tokyo Ohka Kogyo Co Ltd | Treating method of substrate |
-
1989
- 1989-03-17 JP JP6732789A patent/JPH02246115A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59109599A (en) * | 1982-12-16 | 1984-06-25 | 株式会社東芝 | Drug vessel cleaning method |
| JPS60249331A (en) * | 1984-05-24 | 1985-12-10 | Nec Corp | Semiconductor wafer washing apparatus |
| JPS6116528A (en) * | 1985-06-14 | 1986-01-24 | Hitachi Ltd | Cleaning device for wafer |
| JPS6356921A (en) * | 1986-08-28 | 1988-03-11 | Tokyo Ohka Kogyo Co Ltd | Treating method of substrate |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05104071A (en) * | 1991-06-12 | 1993-04-27 | Puretetsuku:Kk | High-frequency washing method |
| EP0779647A1 (en) * | 1995-12-15 | 1997-06-18 | Wacker Siltronic Gesellschaft für Halbleitermaterialien Aktiengesellschaft | Method and apparatus for treatment of semiconductor material |
| WO1998001896A1 (en) * | 1996-07-03 | 1998-01-15 | Ultraclean Technology Research Institute | Washing apparatus and washing method |
| US6325081B1 (en) | 1996-07-03 | 2001-12-04 | Kabushiki Kaisha Ultraclean Technology Research Institute | Washing apparatus and washing method |
| JP2002224948A (en) * | 2001-01-26 | 2002-08-13 | Daido Chem Ind Co Ltd | DETERGENT COMPOSITION FOR ABRASIVE LIQUID FOR MAGNETIC DISK Ni-P SUBSTRATE, AND MANUFACTURING METHOD FOR MAGNETIC DISK Ni-P SUBSTRATE USING THE SAME |
| CN1319657C (en) * | 2003-10-22 | 2007-06-06 | 株式会社海上 | Ultrasonic shower cleaning apparatus of double-side cleaning type |
| JP2011230079A (en) * | 2010-04-28 | 2011-11-17 | Kyocera Kinseki Corp | Washing apparatus |
| JP2013056310A (en) * | 2011-09-09 | 2013-03-28 | Olympus Corp | Cleaning apparatus |
| US9511394B2 (en) | 2011-09-09 | 2016-12-06 | Olympus Corporation | Cleaning apparatus |
| CN102513301A (en) * | 2011-12-29 | 2012-06-27 | 清华大学 | Megasonic cleaning device for wafer |
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