JPH0671039U - Vacuum suction type work holder - Google Patents
Vacuum suction type work holderInfo
- Publication number
- JPH0671039U JPH0671039U JP1660593U JP1660593U JPH0671039U JP H0671039 U JPH0671039 U JP H0671039U JP 1660593 U JP1660593 U JP 1660593U JP 1660593 U JP1660593 U JP 1660593U JP H0671039 U JPH0671039 U JP H0671039U
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- suction
- work
- rotary valve
- back surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Jigs For Machine Tools (AREA)
Abstract
(57)【要約】
【目的】 バキュームを利用してワークを安定的に吸着
保持する。又ワークの吸着保持のための準備作業を簡易
迅速に行う。
【構成】 基板3の表面部に、弾性シール材5を嵌着す
るための格子状の溝部6を設ける。区画された各格子目
に設けた凹部9に回転弁10を納装し、該回転弁表面2
6を底面とする吸着凹所29を形成する。回転弁10を
回転操作して、凹部の底面部に設けた第1の吸引孔16
を開閉する。
(57) [Summary] [Purpose] Use vacuum to hold and hold work stably. In addition, the preparation work for sucking and holding the work is performed simply and quickly. [Structure] The surface of the substrate 3 is provided with lattice-shaped grooves 6 for fitting the elastic sealing material 5. The rotary valve 10 is installed in the concave portions 9 provided in each divided grid, and the rotary valve surface 2
An adsorption recess 29 having a bottom surface 6 is formed. By rotating the rotary valve 10, the first suction hole 16 provided on the bottom surface of the recess is provided.
Open and close.
Description
【0001】[0001]
本考案は、バキュームを利用してワークを吸着保持するバキューム吸着方式の ワークホルダに関するものである。 The present invention relates to a vacuum suction type work holder that sucks and holds a work by using a vacuum.
【0002】[0002]
バキュームを利用してワークを吸着保持する従来のワークホルダとしては、図 7〜9に示すものが提供されている。 該ワークホルダは、基板aの表面側に、帯状の弾性シール材bを嵌着させるた めの格子状の溝部cを具え、該溝部cには、吸引部dに連なる吸引孔eを所要間 隔をおいて数箇所設けてなるものであった。そしてその使用に際しては、最終加 工状態においてもワークfが確実に吸着保持された状態となるよう、先ず、弾性 シール材の嵌着によって形成される閉じた空間部分に吸引孔eが少なくとも1つ 含まれるように、ワークを配置すべき場所を注意深く設定する。 As a conventional work holder for sucking and holding a work by using a vacuum, those shown in FIGS. 7 to 9 are provided. The work holder is provided with a lattice-shaped groove portion c on which the band-shaped elastic sealing material b is fitted on the surface side of the substrate a, and the groove portion c is provided with a suction hole e connected to the suction portion d for a predetermined time. It was provided in several places at intervals. In order to ensure that the work f is securely sucked and held even in the final working state, at least one suction hole e is formed in the closed space formed by the fitting of the elastic sealing material. Carefully set where the work should be placed so that it is included.
【0003】 然る後、図8に示すように、ワークfの裏面周縁部分に弾性シール材が当接す るよう、弾性シール材bを前記溝部cに嵌着し、又基板表面の露出状態になる吸 引孔は、図9に示すように蓋部材gで塞ぐものであった。After that, as shown in FIG. 8, the elastic sealing material b is fitted into the groove portion c so that the elastic sealing material comes into contact with the peripheral edge portion of the back surface of the work f, and the exposed state of the substrate surface. The suction hole which was to be covered was covered with a lid member g as shown in FIG.
【0004】 因みに、前記ワークホルダにおいて吸引孔の個数をこのように少数としていた のは、不要の吸引孔を蓋部材で塞ぐ面倒さや蓋部材の管理上の煩雑さを極力少な くするためであったと考えられる。By the way, the reason why the number of suction holes in the work holder is made small in this way is to minimize the troublesomeness of closing the unnecessary suction holes with the lid member and the complexity of management of the lid member. It is thought that
【0005】[0005]
しかしながらかかる従来のワークホルダによるときには、次のような問題があ った。 吸着保持すべきワークの形態やワークの最終的な加工状態を考慮に入れて、 ワークの裏側に少なくとも一つの吸引孔eが存するようにワークの設置場所を注 意深く設定しなければならない面倒さがあった。特に、複数個のワークを基板面 に並べて同時に吸着保持させるときには、その配置状態を余程考えないとワーク を配置できないことにもなった。 However, the conventional work holder has the following problems. Considering the shape of the work to be suction-held and the final processing state of the work, the installation location of the work must be carefully set so that there is at least one suction hole e on the back side of the work. was there. In particular, when a plurality of works are arranged on the substrate surface and adsorbed and held at the same time, the works cannot be arranged unless the arrangement state is carefully considered.
【0006】 弾性シール材の嵌着によって形成された閉じた空間部分には、一個或いはせ いぜい2個程度の少ない個数の吸引孔が存するに過ぎなかったため、排気速度が それほど速いものでなく、ワークを所要状態に吸着保持せしめるのに時間が掛か った。特に、加工時の抵抗や振動の影響によって弾性シール材とワークとの気密 状態が部分的に破れた場合には、安定的な吸着保持状態に瞬時に戻れないために 、ワークが外れて大きな事故を招く恐れがあった。In the closed space portion formed by the fitting of the elastic sealing material, only one or at most two suction holes are present, so the exhaust speed is not so high. , It took a long time to hold the work piece in the required state by suction. In particular, if the airtight state between the elastic seal material and the workpiece is partially broken due to the influence of resistance and vibration during processing, the workpiece cannot be returned to the stable suction-holding state instantaneously, resulting in a large accident. There was a risk of inviting.
【0007】[0007]
上記課題を解決するため、本考案は次のような手段を採用する。 即ち本考案に係るバキューム吸着方式のワークホルダ(以下ワークホルダとい う)は、基板3の表面部に、弾性を有するシール材5を嵌着するための格子状の 溝部6を設けるとともに、区画された各格子目7に凹部9を設け、該凹部9の底 面部11には、基板の裏面側に開放する軸孔13を設けるとともに該軸孔13の 周辺に、基板の裏面側に設けた吸引部15に連なる第1の吸引孔16を底面部1 1を貫通して設け,又前記凹部9に、前記第1の吸引孔16と連通しうる第2の 吸引孔21が板厚方向に貫設された板状の回転弁10を、その裏面側に突設され た回転軸20を前記軸孔13に挿通せしめて納装し、該納装状態において、回転 弁の表面26が基板表面27に沈む如くなすとともに前記回転軸20が基板の裏 面側に突出する如くなし、該突出する軸部分20aに設けた受部33と基板裏面 の軸孔周縁部分30との間に介装したバネ部材31の付勢作用によって、回転弁 の裏面35と凹部底面36とを弾性圧接状態となし、又回転弁10の表面側には 、回転工具と係合する係合部25を設けたことを特徴とするものである。 In order to solve the above problems, the present invention employs the following means. That is, a vacuum suction type work holder (hereinafter referred to as a work holder) according to the present invention is provided with a grid-like groove portion 6 for fitting an elastic sealing material 5 on the surface portion of a substrate 3 and is partitioned. Further, each grid 7 is provided with a concave portion 9, and a bottom surface portion 11 of the concave portion 9 is provided with a shaft hole 13 which opens to the back surface side of the substrate and a suction hole provided on the back surface side of the substrate around the shaft hole 13. A first suction hole 16 connected to the portion 15 is provided so as to penetrate the bottom surface portion 11, and a second suction hole 21 that can communicate with the first suction hole 16 is formed in the recess 9 in the plate thickness direction. The installed plate-shaped rotary valve 10 is mounted by inserting the rotary shaft 20 projecting on the rear surface side into the shaft hole 13 and in the mounted state, the surface 26 of the rotary valve is the substrate surface 27. The rotary shaft 20 projects toward the back side of the substrate. In other words, by the biasing action of the spring member 31 interposed between the receiving portion 33 provided on the projecting shaft portion 20a and the shaft hole peripheral edge portion 30 on the back surface of the substrate, the back surface 35 of the rotary valve and the bottom surface 36 of the recess are formed. Is in an elastic pressure contact state, and an engaging portion 25 for engaging a rotary tool is provided on the surface side of the rotary valve 10.
【0008】[0008]
然してかかるワークホルダ1にワークを保持させるには、例えば当初は、全て の吸着凹所(ワーク38の下面40で閉蓋された、回転弁表面26を底面とする 凹所)29について、第1の吸引孔16と第2の吸引孔21が位置ずれして第1 の吸引孔16が回転弁10で遮断された状態にしておく。 However, in order to hold the work on the work holder 1, for example, first, all suction recesses (recesses closed by the lower surface 40 of the work 38 and having the rotary valve surface 26 as the bottom surface) 29 are first The first suction hole 16 and the second suction hole 21 are displaced from each other and the first suction hole 16 is blocked by the rotary valve 10.
【0009】 この状態において、最終加工状態においてもワークが確実に吸着保持された状 態となるよう、ワークの形態やワークの最終的な加工状態を考慮に入れて、弾性 シール材を、それがワークの裏面周縁部分に弾性圧縮状態で当接するよう、溝部 6にループを描いて嵌着する。In this state, in order to ensure that the workpiece is sucked and held even in the final processing state, the elastic sealing material is adjusted by considering the shape of the workpiece and the final processing state of the workpiece. A loop is drawn and fitted in the groove 6 so as to come into contact with the peripheral portion of the back surface of the work in an elastically compressed state.
【0010】 その後、加工後のワークの裏側に存する回転弁10に関して、第1の吸引孔1 6と第2の吸引孔21が連通状態となるように回転弁10を回転操作する。然る 後吸引部15を真空状態にすると、ワーク裏面の吸着凹所29の夫々において排 気されるため、ワーク設置後極短時間のうちに、ワークWは所要に吸着保持され た状態となる。After that, with respect to the rotary valve 10 existing on the back side of the work after processing, the rotary valve 10 is rotated so that the first suction hole 16 and the second suction hole 21 are in communication with each other. However, when the rear suction unit 15 is in a vacuum state, the workpiece W is sucked and held as required within a very short time after the workpiece is installed, because the suction is carried out in each of the suction recesses 29 on the back surface of the workpiece. .
【0011】 又、加工時の抵抗や振動の影響によって弾性シール材5とワークWとの気密状 態が部分的に破れた場合にも、排気速度が速いために、安定的な吸着保持状態に 瞬時に戻る。Further, even if the airtight state between the elastic seal material 5 and the work W is partially broken due to the influence of resistance and vibration during processing, the exhaust speed is high, so that a stable suction holding state is obtained. Return instantly.
【0012】[0012]
以下本考案の実施例を図面に基づいて説明する。 図1〜4において本考案に係るワークホルダー1は、内部が中空に形成された 直方体状箱体2の上部をなす基板3の表面部に、帯状をなす弾性を有するシール 材(例えばスポンジゴム製のもの)5を嵌着するための格子状の溝部6を設ける とともに区画された各格子目7に凹部9を設け、該凹部の夫々に円板状の回転弁 10を納装してなる。 An embodiment of the present invention will be described below with reference to the drawings. 1 to 4, a work holder 1 according to the present invention has a strip-shaped elastic sealing material (for example, sponge rubber) on a surface portion of a substrate 3 which is an upper portion of a rectangular parallelepiped box body 2 having a hollow interior. 1) is provided with a grid-like groove portion 6 for fitting therein, and a recess 9 is provided in each partitioned grid 7, and a disc-shaped rotary valve 10 is installed in each of the recesses.
【0013】 前記凹部9の底面部11の表層部分は、ゴム板12の貼着層としてなり、その 中央には、基板3の裏面側に開放する軸孔13を設け、該軸孔13の周辺には、 軸孔13と同心の円上に例えば180度の角度間隔をおいて、基板裏面側の吸引 部(箱体の中空部)15に連なる第1の吸引孔16,16を、底面部11を上下 貫通して設けてなる。又、軸孔13の中間部位には周溝17を刻設し、前記吸引 部15には、真空ポンプに接続された吸引管19の端部を連設してなる。A surface layer portion of the bottom surface portion 11 of the recess 9 serves as an adhesive layer of the rubber plate 12, and a shaft hole 13 that opens to the back surface side of the substrate 3 is provided in the center thereof, and the periphery of the shaft hole 13 is provided. The first suction holes 16, 16 connected to the suction portion (hollow portion of the box) 15 on the back surface side of the substrate are provided on the bottom surface of the bottom hole portion at an angular interval of, for example, 180 degrees on a circle concentric with the shaft hole 13. 11 is provided so as to penetrate vertically. Further, a peripheral groove 17 is formed in an intermediate portion of the shaft hole 13, and the suction portion 15 is connected to an end portion of a suction pipe 19 connected to a vacuum pump.
【0014】 前記回転弁10は前記凹部9の内径に略等しい円板状をなし、その裏面には、 前記軸孔13を貫通して吸引部15内に所要長さ突出する回転軸20を突設する 。その周辺には、前記第1の吸引孔16と合致しうる第2の吸引孔21を180 度の角度間隔をおいて上下貫通して設けてなる。又回転軸20の基端側部分に設 けた環状溝22には、前記周溝17と弾性的に嵌合しうるOリング23を弾性的 に嵌着してなる。又、該回転弁10の表面側にはドライバー先端と係合しうる係 合部25を設け、回転弁表面26は基板表面27に稍沈む如くなし、該回転弁表 面26を底面とする凹所は吸着凹所29としてなる。The rotary valve 10 has a disk shape substantially equal to the inner diameter of the recess 9, and a rotary shaft 20 penetrating the shaft hole 13 and projecting a required length into the suction portion 15 is projected on the back surface of the rotary valve 10. Set up. A second suction hole 21 which can be matched with the first suction hole 16 is vertically provided around the periphery thereof at an angular interval of 180 degrees. Further, an O-ring 23 which can be elastically fitted to the peripheral groove 17 is elastically fitted in an annular groove 22 provided in the base end side portion of the rotary shaft 20. Further, an engaging portion 25 that can be engaged with the tip of a driver is provided on the surface side of the rotary valve 10, the rotary valve surface 26 is formed so as to sink into the substrate surface 27, and the rotary valve surface 26 is a bottom surface. The place is a suction recess 29.
【0015】 又回転軸20の基板裏面側の前記突出する軸部分20aには、基板裏面の軸孔 周縁部分30と当接しうる皿バネ31a(バネ部材31)を嵌装し、該軸部分2 0aのネジ部32に螺合せしめられたナット33a(受部33)が所要に締め付 けられて、該バネ部材31が弾性圧縮状態とされており、該バネ部材31の付勢 作用によって、回転弁の裏面35と凹部底面(ゴム板12の表面)36とは弾性 的に圧接した状態にある(図3)。Further, a disc spring 31 a (spring member 31) capable of abutting the shaft hole peripheral portion 30 on the back surface of the substrate is fitted to the protruding shaft portion 20 a on the back surface side of the rotation shaft 20, and the shaft portion 2 The nut 33a (the receiving portion 33) screwed into the screw portion 32 of 0a is tightened as required to bring the spring member 31 into the elastically compressed state. The back surface 35 of the rotary valve and the bottom surface of the recess (the surface of the rubber plate 12) 36 are in elastic contact with each other (FIG. 3).
【0016】 然してかかるワークホルダ1にワークを保持させるには、例えば当初は、全て の吸着凹所29について、図4に示すように、第1の吸引孔16と第2の吸引孔 21が位置ずれして第1の吸引孔16が回転弁10で遮断された状態にしておく 。However, in order to hold the work on the work holder 1, for example, initially, for all the suction recesses 29, the first suction hole 16 and the second suction hole 21 are positioned as shown in FIG. The first suction hole 16 is displaced so that the first suction hole 16 is blocked by the rotary valve 10.
【0017】 この状態において、最終加工状態においてもワークが確実に吸着保持された状 態となるよう、ワークの形態やワークの最終的な加工状態を考慮に入れて、図3 、図5に示す如く、ワークWの裏面周縁部分に弾性シール材5が当接するように 該弾性シール材5を格子状の溝部6にループを描いて嵌着する。なお図5におい ては、ワークの中央部分にドリル孔加工が施されるため、形成されるべき貫通孔 (図5において一点鎖線で示す)39部分と対向する回転弁10aの全ては、遮 断状態とされている。In this state, the shape of the work and the final processed state of the work are taken into consideration so that the work is surely sucked and held even in the final processed state, as shown in FIGS. 3 and 5. In this way, the elastic sealing material 5 is fitted in the lattice-shaped groove portion 6 in a loop so that the elastic sealing material 5 contacts the peripheral portion of the back surface of the work W. In addition, in FIG. 5, since the central portion of the workpiece is drilled, all of the rotary valve 10a facing the through hole (shown by the alternate long and short dash line in FIG. 39) to be formed is cut off. It is in a state.
【0018】 その後、加工後ワークの裏側に存することになる回転弁10の全てに関して、 第1の吸引孔16と第2の吸引孔21が連通状態となるように回転弁10を回転 操作する。然る後吸引部15を真空状態にすると、圧縮状態の弾性シール材5に より気密が保持されてワーク裏側の吸着凹所29の夫々で排気されるため、ワー ク設置後極短時間のうちに、ワークWは所要に吸着保持された状態となる。After that, with respect to all of the rotary valves 10 that are to be present on the back side of the processed workpiece, the rotary valve 10 is rotated so that the first suction holes 16 and the second suction holes 21 are in communication with each other. After that, when the suction portion 15 is placed in a vacuum state, airtightness is maintained by the elastic sealing material 5 in the compressed state and the air is exhausted in each of the suction recesses 29 on the back side of the work. In addition, the work W is in a state of being suction-held as required.
【0019】 又、加工時の抵抗や振動の影響によって弾性シール材5とワークWとの気密状 態が部分的に破れた場合にも、排気速度が速いために、安定的な吸着保持状態に 瞬時に戻る。Further, even when the airtight state between the elastic seal material 5 and the work W is partially broken due to the influence of resistance and vibration during processing, the exhaust speed is high, so that a stable suction and hold state is obtained. Return instantly.
【0020】 図6は、基板裏側に突出する軸部分20aに嵌着されたスナップリング33b (受部33)と基板裏面の軸孔周縁部分30との間にコイルバネ31b(バネ部 材31)を稍圧縮状態に介装してなる本考案の他の実施例を示すものである。FIG. 6 shows that a coil spring 31b (spring member 31) is provided between the snap ring 33b (receiving portion 33) fitted to the shaft portion 20a protruding to the back side of the substrate and the shaft hole peripheral edge portion 30 on the back surface of the substrate. 7 shows another embodiment of the present invention which is interposed in a slightly compressed state.
【0021】[0021]
本考案は以下の如き優れた効果を奏する。 本考案に係るワークホルダは、帯状シール材を嵌着するための格子状の溝部 を基板の表面部に設けるとともに区画された各格子目に凹部を設け、該凹部に納 装した回転弁を適宜回転操作することによって、吸着凹所を吸引状態とするか否 かを制御するものである。 従って、前記した従来のワークホルダにおける如く、吸引孔との関係でワーク の設置場所を見定める必要がなく、基板表面の任意の場所にワークを設置すれば よい。又、吸着凹所を吸引状態とするか否かの制御を回転弁の回転操作によって 容易に行いうることから、従来方式のもの、即ち蓋部材の着脱に面倒さが伴い又 蓋部材の管理が煩雑となる従来の蓋部材着脱方式のものに比し、ワークの吸着保 持のための準備作業を簡易迅速に行うことができる。これらの利点は、基板表面 に多数のワークを並べて吸着保持させるときに顕著である。 The present invention has the following excellent effects. In the work holder according to the present invention, a grid-like groove for fitting a band-shaped sealing material is provided on the surface of the substrate, and a recess is provided at each partitioned grid, and the rotary valve installed in the recess is appropriately provided. The rotation operation controls whether or not the suction recess is in the suction state. Therefore, unlike the conventional work holder described above, it is not necessary to determine the installation location of the work in relation to the suction hole, and the work may be installed at any location on the substrate surface. Further, since it is possible to easily control whether or not the suction recess is brought into the suction state by rotating the rotary valve, the conventional method, that is, the attachment and detachment of the lid member is troublesome, and the lid member can be managed easily. Compared with the conventional lid member attachment / detachment method, which is complicated, the preparatory work for holding and holding the work can be performed simply and quickly. These advantages are remarkable when a large number of works are arranged and adsorbed and held on the substrate surface.
【0022】 保持すべきワークが大きくなるにつれて吸引部分の数が増大するため、少な い個数の吸引孔から吸引して真空状態を形成する従来のワークホルダに比し、ワ ークは、その設置後極短時間のうちに所要に吸着保持された状態となる。又、加 工時の抵抗や振動の影響を受けて弾性シール材とワークとの気密状態が部分的に 破れた場合にも、排気速度が速いために安定的な吸着保持状態に瞬時に戻り、従 って、ワークの吸着保持が不安定化するといった従来の問題点を解消しうること となる。Since the number of suction portions increases as the work to be held becomes larger, the work is installed in comparison with a conventional work holder that suctions from a small number of suction holes to form a vacuum state. After that, it is in a state of being adsorbed and held as required in an extremely short time. In addition, even if the airtight state between the elastic seal material and the work partly breaks due to the influence of resistance and vibration during processing, the exhaust speed is high and the stable suction-holding state is returned instantly. Therefore, it is possible to solve the conventional problem that the adsorption and holding of the work becomes unstable.
【図1】本考案の一実施例を説明する斜視図である。FIG. 1 is a perspective view illustrating an embodiment of the present invention.
【図2】基板に設けた吸着凹所と、それを構成する凹部
及び回転弁を説明する斜視図である。FIG. 2 is a perspective view illustrating a suction concave portion provided on a substrate, a concave portion and a rotary valve forming the suction concave portion.
【図3】本考案の要部構成を、第1の吸引孔を開放した
使用状態において説明する断面図である。FIG. 3 is a cross-sectional view illustrating a configuration of a main part of the present invention in a use state in which a first suction hole is opened.
【図4】第1の吸引孔を遮断した状態を説明する断面図
である。FIG. 4 is a cross-sectional view illustrating a state in which a first suction hole is blocked.
【図5】基板に設けた格子状の溝部に、ワークの形態や
その最終加工状態を考慮に入れて弾性シール材を嵌着し
た状態を説明する平面図である。FIG. 5 is a plan view illustrating a state in which an elastic seal material is fitted into a lattice-shaped groove portion provided on a substrate in consideration of a form of a work and a final processing state thereof.
【図6】本考案の他の実施例をその使用状態において説
明する断面図である。FIG. 6 is a cross-sectional view for explaining another embodiment of the present invention in its usage state.
【図7】従来の吸引方式のワークホルダを説明する斜視
図である。FIG. 7 is a perspective view illustrating a conventional suction type work holder.
【図8】従来のワークホルダの使用状態を説明する断面
図である。FIG. 8 is a cross-sectional view illustrating a usage state of a conventional work holder.
【図9】従来のワークホルダの格子状溝部に弾性シール
材を嵌着した状態を説明する平面図である。FIG. 9 is a plan view illustrating a state where an elastic seal member is fitted in a lattice-shaped groove portion of a conventional work holder.
1 ワークホルダ 3 基板 5 弾性シール材 6 溝部 7 格子目 9 凹部 10 回転弁 11 凹部の底面部 13 軸孔 15 吸引部 16 第1の吸引孔 20 回転軸 21 第2の吸引孔 25 係合部 26 回転弁の表面 27 基板表面 31 バネ部材 33 受部 35 回転弁の裏面 36 凹部底面 1 Work Holder 3 Substrate 5 Elastic Sealing Material 6 Groove 7 Grid 9 Recess 10 Rotating Valve 11 Bottom of Recess 13 Shaft Hole 15 Suction Part 16 First Suction Hole 20 Rotation Shaft 21 Second Suction Hole 25 Engagement Part 26 Front surface of rotary valve 27 Substrate surface 31 Spring member 33 Receiving portion 35 Back surface of rotary valve 36 Bottom surface of recess
Claims (1)
材5を嵌着するための格子状の溝部6を設けるととも
に、区画された各格子目7に凹部9を設け、該凹部9の
底面部11には、基板の裏面側に開放する軸孔13を設
けるとともに該軸孔13の周辺に、基板の裏面側に設け
た吸引部15に連なる第1の吸引孔16を底面部11を
貫通して設け、 又前記凹部9に、前記第1の吸引孔16と連通しうる第
2の吸引孔21が板厚方向に貫設された板状の回転弁1
0を、その裏面側に突設された回転軸20を前記軸孔1
3に挿通せしめて納装し、該納装状態において、回転弁
の表面26が基板表面27に沈む如くなすとともに前記
回転軸20が基板の裏面側に突出する如くなし、該突出
する軸部分20aに設けた受部33と基板裏面の軸孔周
縁部分30との間に介装したバネ部材31の付勢作用に
よって、回転弁の裏面35と凹部底面36とを弾性圧接
状態となし、又回転弁10の表面側には、回転工具と係
合する係合部25を設けたことを特徴とするバキューム
吸着方式のワークホルダ。1. A lattice-shaped groove portion 6 for fitting a sealing material 5 having elasticity is provided on a surface portion of a substrate 3, and a concave portion 9 is provided in each of the divided lattice cells 7, and the concave portion 9 is formed. The bottom surface portion 11 is provided with a shaft hole 13 that opens to the back surface side of the substrate, and a first suction hole 16 that is continuous with the suction portion 15 provided on the back surface side of the substrate is provided around the shaft hole 13 to form the bottom surface portion 11. A plate-shaped rotary valve 1 having a second suction hole 21 penetrating therethrough and having a second suction hole 21 that can communicate with the first suction hole 16 in the plate thickness direction.
0, the rotary shaft 20 projectingly provided on the back side thereof
3 is inserted and installed, and in the installed state, the surface 26 of the rotary valve is made to sink into the substrate surface 27, and the rotary shaft 20 is projected to the rear surface side of the substrate, and the projecting shaft portion 20a. The back surface 35 of the rotary valve and the bottom surface of the recess 36 are brought into elastic pressure contact with each other by the urging action of the spring member 31 interposed between the receiving portion 33 provided on the back surface of the substrate and the peripheral portion 30 of the shaft hole on the back surface of the substrate, and the rotation A vacuum suction type work holder characterized in that an engaging portion 25 for engaging a rotary tool is provided on the front surface side of the valve 10.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1993016605U JPH088039Y2 (en) | 1993-03-10 | 1993-03-10 | Vacuum suction type work holder |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1993016605U JPH088039Y2 (en) | 1993-03-10 | 1993-03-10 | Vacuum suction type work holder |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0671039U true JPH0671039U (en) | 1994-10-04 |
JPH088039Y2 JPH088039Y2 (en) | 1996-03-06 |
Family
ID=11920938
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1993016605U Expired - Lifetime JPH088039Y2 (en) | 1993-03-10 | 1993-03-10 | Vacuum suction type work holder |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH088039Y2 (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002217251A (en) * | 2001-01-19 | 2002-08-02 | Murata Mfg Co Ltd | Head and device for ultrasonic bonding |
KR100522977B1 (en) * | 2000-06-02 | 2005-10-19 | 스미토모 오사카 세멘토 가부시키가이샤 | Holding apparatus for clamping a workpiece |
KR101133295B1 (en) * | 2009-09-15 | 2012-04-04 | 임권현 | vacuum-padded for vacuum-chuck |
KR101463698B1 (en) * | 2013-11-14 | 2014-12-04 | 최병근 | A portable zig |
CN108942425A (en) * | 2018-09-27 | 2018-12-07 | 深圳市南科燃料电池有限公司 | A kind of bipolar plates Special Fixture for Machining and the bipolar plates processing method using the fixture |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS432692Y1 (en) * | 1964-12-23 | 1968-02-03 | ||
JPS6110115A (en) * | 1985-05-22 | 1986-01-17 | Hitachi Ltd | Air-bearing type straight advance guide |
JPH03187701A (en) * | 1989-12-18 | 1991-08-15 | Shinko Kogyo Co Ltd | Table device for woodworking machine and the like |
-
1993
- 1993-03-10 JP JP1993016605U patent/JPH088039Y2/en not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS432692Y1 (en) * | 1964-12-23 | 1968-02-03 | ||
JPS6110115A (en) * | 1985-05-22 | 1986-01-17 | Hitachi Ltd | Air-bearing type straight advance guide |
JPH03187701A (en) * | 1989-12-18 | 1991-08-15 | Shinko Kogyo Co Ltd | Table device for woodworking machine and the like |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100522977B1 (en) * | 2000-06-02 | 2005-10-19 | 스미토모 오사카 세멘토 가부시키가이샤 | Holding apparatus for clamping a workpiece |
JP2002217251A (en) * | 2001-01-19 | 2002-08-02 | Murata Mfg Co Ltd | Head and device for ultrasonic bonding |
JP4635346B2 (en) * | 2001-01-19 | 2011-02-23 | 株式会社村田製作所 | Ultrasonic bonding head and ultrasonic bonding apparatus |
KR101133295B1 (en) * | 2009-09-15 | 2012-04-04 | 임권현 | vacuum-padded for vacuum-chuck |
KR101463698B1 (en) * | 2013-11-14 | 2014-12-04 | 최병근 | A portable zig |
CN108942425A (en) * | 2018-09-27 | 2018-12-07 | 深圳市南科燃料电池有限公司 | A kind of bipolar plates Special Fixture for Machining and the bipolar plates processing method using the fixture |
CN108942425B (en) * | 2018-09-27 | 2023-08-29 | 深圳市南科燃料电池有限公司 | Special fixture for machining bipolar plate and bipolar plate machining method using fixture |
Also Published As
Publication number | Publication date |
---|---|
JPH088039Y2 (en) | 1996-03-06 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR102344555B1 (en) | Suction apparatus for an end effector, end effector for holding substrates and method of producing an end effector | |
JP2000296489A (en) | Vacuum gripper | |
CN109585353B (en) | Suction cup and working method thereof | |
US6491177B1 (en) | Thin-plate accommodating/transporting container | |
CN114558839A (en) | Adsorption rotating device and single-chip wafer cleaning machine | |
JPH0671039U (en) | Vacuum suction type work holder | |
JP3341990B2 (en) | Workpiece chuck table | |
JP2546652B2 (en) | Check table | |
JPH1145930A (en) | Suction head | |
JP4797013B2 (en) | Bonding device | |
JPH05187430A (en) | Sucking structure and sucker | |
JPH06143073A (en) | Vacuum chuck plate | |
JP2522830Y2 (en) | Vacuum cup device | |
JPH0243638Y2 (en) | ||
JPH081464A (en) | Automatic change-over device for universal chuck mechanism | |
JPH05315434A (en) | Semiconductor wafer retainer | |
CN220774328U (en) | Carrier device and wafer thinning machine | |
CN217787150U (en) | Wafer leveling device and test equipment | |
JPH0246331B2 (en) | ||
CN220138284U (en) | Wafer adsorption device | |
CN217544568U (en) | Wafer adsorption device | |
JPH0724560U (en) | Work suction tool | |
JP2565673Y2 (en) | Wafer holding device | |
JPH0641143U (en) | Spin chuck | |
WO2003030222A3 (en) | Tool for handling wafers and epitaxial growth station |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 19960820 |
|
EXPY | Cancellation because of completion of term |