JPH06342505A - Production of nonmagnetic substrate for magnetic head - Google Patents
Production of nonmagnetic substrate for magnetic headInfo
- Publication number
- JPH06342505A JPH06342505A JP12934692A JP12934692A JPH06342505A JP H06342505 A JPH06342505 A JP H06342505A JP 12934692 A JP12934692 A JP 12934692A JP 12934692 A JP12934692 A JP 12934692A JP H06342505 A JPH06342505 A JP H06342505A
- Authority
- JP
- Japan
- Prior art keywords
- coo
- nio
- magnetic head
- spinel
- time
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Magnetic Heads (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、金属性磁性膜を蒸着す
るための非磁性の磁気ヘッド用基板の製造方法に関する
ものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a non-magnetic magnetic head substrate for depositing a metallic magnetic film.
【０００２】[0002]
【従来技術】従来この種の用途のものとしては、チタン
酸バリウム、チタン酸カルシウム、アルミナ等が使用さ
れていた。しかしながら、その熱膨張率が磁性膜構造体
と大きく異なっていたため、蒸着した磁性膜構造体が剥
離しやすく、また熱膨張率の差により応力が発生しクラ
ックが発生することがあった。2. Description of the Related Art Conventionally, barium titanate, calcium titanate, alumina, etc. have been used for this kind of use. However, since the coefficient of thermal expansion was largely different from that of the magnetic film structure, the vapor-deposited magnetic film structure was easily peeled off, and stress was generated due to the difference in the coefficient of thermal expansion, and cracks were sometimes generated.
【０００３】本発明者等は上記の欠点を解決すべく酸化
物系セラミックスについて研究を進め、ＣｏＯ及びＮｉ
ＯまたはＮｉＯを基本組成とし、これにＺｒＯ2を０．
５〜７ｗｔ％、Ａｌ2Ｏ3を０．１〜２ｗｔ％添加した酸
化物系セラミックスが有効であるとして既に開示した。The present inventors have conducted research on oxide-based ceramics in order to solve the above-mentioned drawbacks, and have studied CoO and Ni.
O or NiO was used as a basic composition, and ZrO 2 was added to this in an amount of 0.
It has already been disclosed that oxide ceramics containing 5 to 7 wt% and Al 2 O 3 of 0.1 to 2 wt% are effective.
【０００４】さらに、ＣｏＯ及びＮｉＯまたはＮｉＯを
基本組成とした磁気ヘッド用非磁性基板の製造方法とし
て、以下の工程からなる製造方法が有効であるとして既
に開示した。すなわち、（１）原料粉を混合し、ふるい
分けを行なう混合工程、（２）ＣＩＰ成形した混合粉を
仮焼し、粉砕した後ふるい分けを行なう仮焼工程、
（３）仮焼粉を１μｍ以下に微粉砕する工程、（４）微
粉砕粉を２０μｍ以上の球形に造粒する工程、（５）造
粒粉をＣＩＰ成形する工程、（６）成形体を焼結する工
程、（７）焼結体をＨＩＰ処理する工程である。Further, it has already been disclosed that a manufacturing method comprising the following steps is effective as a manufacturing method of a non-magnetic substrate for a magnetic head having a basic composition of CoO and NiO or NiO. That is, (1) a mixing step of mixing raw material powders and sieving, (2) a calcination step of calcination of the CIP-molded mixed powder, crushing and sieving
(3) a step of finely pulverizing the calcined powder to 1 μm or less, (4) a step of granulating the finely ground powder into a spherical shape of 20 μm or more, (5) a step of CIP molding the granulated powder, (6) a molded body The step of sintering, (7) the step of HIPing the sintered body.
【０００５】しかしながら、ＣｏＯ及びＮｉＯまたはＮ
ｉＯ基本組成とし、ＺｒＯ2を０．５〜７ｗｔ％、Ａｌ2
Ｏ3を０．１〜２ｗｔ％添加した組成物は、添加したＡ
ｌ2Ｏ3の焼結助剤効果により緻密な焼結体を得ることが
できる反面、焼結冷却時にＣｏＯまたはＣｏＯ及びＮｉ
ＯとＡｌ2Ｏ3がスピネルを形成して析出するため、ダイ
シング加工時のチッピングや研磨加工時のスピネル脱粒
による研磨面の欠陥の原因となるといった問題があっ
た。However, CoO and NiO or N
iO basic composition, ZrO 2 0.5 to 7 wt%, Al 2
The composition in which 0.1 to 2 wt% of O 3 is added is A
Although a dense sintered body can be obtained by the sintering aid effect of l 2 O 3, on the other hand, CoO or CoO and Ni can be used at the time of cooling by sintering.
Since O and Al 2 O 3 form spinels and are deposited, there is a problem that they cause defects on the polished surface due to chipping during dicing and grain removal of spinel during polishing.
【０００６】[0006]
【発明の構成】本発明は、上記問題点を解決するもので
ある。即ち、本発明は、（１）ＣｏＯ及びＮｉＯあるい
はＮｉＯを基本組成とし、これにＺｒＯ2 ０．５〜７
ｗｔ％、Ａｌ2Ｏ3 ０．１〜２ｗｔ％添加した磁気ヘッ
ド用非磁性基板を下限温度１１５０℃から上限温度とし
て焼結温度に加熱後、３００℃／ｈ以上の冷却速度で急
冷処理を行う磁気ヘッド用非磁性基板の製造方法。The present invention solves the above problems. That is, the present invention has (1) CoO and NiO or NiO as a basic composition, and ZrO 2 0.5 to 7
wt%, Al 2 O 3 0.1-2 wt% non-magnetic substrate for magnetic head is heated from the lower limit temperature of 1150 ° C. to the upper limit temperature to the sintering temperature, and then subjected to rapid cooling treatment at a cooling rate of 300 ° C./h or more. Manufacturing method of non-magnetic substrate for magnetic head.
【０００７】（２）上記（１）の急冷処理を焼結過程の
冷却時に行うことを特徴とする磁気ヘッド用非磁性基板
の製造法方法。（３）上記（１）の急冷処理を焼結後の
ＨＩＰ処理過程での冷却時に行うことを特徴とする磁気
ヘッド用非磁性基板の製造方法に関する。(2) A method of manufacturing a non-magnetic substrate for a magnetic head, characterized in that the rapid cooling treatment of (1) above is performed during cooling in a sintering process. (3) The present invention relates to a method for manufacturing a non-magnetic substrate for a magnetic head, characterized in that the rapid cooling treatment of (1) above is performed during cooling in a HIP treatment process after sintering.
【０００８】[0008]
【発明の具体的説明】本発明の理解を容易にするため具
体的かつ詳細に説明する。基本組成は、ＮｉＯ単独の酸
化物あるいはＮｉＯとＣｏＯの複合酸化物を意味し、例
えば、ＣｏＯ／ＮｉＯ（モル比）＝０／１００〜８０／
２０で、より好ましくは、ＣｏＯ／ＮｉＯ（モル比）＝
３／９７〜６０／４０である。DETAILED DESCRIPTION OF THE INVENTION A specific and detailed description will be given to facilitate understanding of the present invention. The basic composition means an oxide of NiO alone or a composite oxide of NiO and CoO, for example, CoO / NiO (molar ratio) = 0/100 to 80 /
20 and more preferably CoO / NiO (molar ratio) =
It is 3 / 97-60 / 40.
【０００９】通常、この基本組成にＺｒＯ2を０．５〜
７ｗｔ％Ａｌ2Ｏ3を０．１から２ｗｔ％添加すると、Ｚ
ｒＯ2によるピンニング効果により結晶粒生長の抑制が
なされ、また、Ａｌ2Ｏ3の焼結助剤効果により焼結性が
向上するため、緻密で且つ微細組織の焼結体を得ること
ができる。しかしながら、焼結助剤として添加したＡｌ
2Ｏ3が焼結の冷却時にＣｏＯまたはＣｏＯ及びＮｉＯと
スピネルを形成し、ダイシング加工時或いは研磨加工時
の欠陥発生の原因となる。そこで、焼結の冷却時に形成
されるスピネル析出物を無くすために検討を行った結
果、本発明者等はＣｏＯまたはＣｏＯ及びＮｉＯとＡｌ
2Ｏ3とのスピネル析出物が焼結冷却時の１１５０℃以下
の温度で形成され、１１５０℃以上でＡｌ2Ｏ3はマトリ
ックスに固溶していることを見出した。このことから、
スピネル析出物を無くすために、Ａｌ2Ｏ3がマトリック
スと固溶する１１５０℃以上に加熱後３００℃／ｈ以上
の冷却速度で急冷処理することが有効であることを見出
した。この時の冷却速度が３００℃／ｈより少ないとス
ピネル析出物が形成してしまう。また、上記の加熱温度
は下限温度を１１５０℃とし上限温度を焼結温度とする
ことが好ましく、１１５０℃より低いとスピネル析出物
が残存してしまい、焼結温度より高いと結晶粒が大きく
なってしまう。また、上記急冷処理を焼結過程、或い
は、ＨＩＰ処理過程の冷却時に行うことも有効である。Usually, 0.5 to 0.5 of ZrO 2 is added to this basic composition.
Addition of 7 wt% Al 2 O 3 from 0.1 to 2 wt% results in Z
Crystal grain growth is suppressed by the pinning effect of rO 2 and sinterability is improved by the sintering aid effect of Al 2 O 3 , so that a sintered body having a fine and fine structure can be obtained. However, Al added as a sintering aid
2 O 3 forms spinel with CoO or CoO and NiO during cooling of sintering, which causes defects during dicing or polishing. Therefore, as a result of an examination for eliminating spinel precipitates formed during cooling of sintering, the present inventors found that CoO or CoO and NiO and Al.
It has been found that spinel precipitates with 2 O 3 are formed at a temperature of 1150 ° C. or lower during sinter cooling, and Al 1 O 3 is a solid solution in the matrix at 1150 ° C. or higher. From this,
In order to eliminate spinel precipitates, it has been found that it is effective to heat at 1150 ° C. or higher at which Al 2 O 3 forms a solid solution with the matrix and then perform quenching at a cooling rate of 300 ° C./h or higher. If the cooling rate at this time is less than 300 ° C./h, spinel precipitates will be formed. Further, it is preferable that the lower limit temperature of the above heating temperature is 1150 ° C. and the upper limit temperature is the sintering temperature, and if it is lower than 1150 ° C., spinel precipitates remain, and if it is higher than the sintering temperature, crystal grains become large. Will end up. It is also effective to perform the above-mentioned rapid cooling treatment during cooling in the sintering process or HIP treatment process.
【００１０】本発明の熱処理によって得られた磁気ヘッ
ド用非磁性基板は、ＣｏＯまたはＣｏＯ及びＮｉＯとＡ
ｌ2Ｏ3より形成されるスピネル析出物が無く、ダイシン
グ加工時のチッピングや研磨加工時のスピネル脱粒によ
る欠陥が無くなり、歩留まりが向上することが確認でき
た。The non-magnetic substrate for a magnetic head obtained by the heat treatment of the present invention is CoO or CoO and NiO and A.
It was confirmed that there was no spinel precipitate formed from l 2 O 3, defects were eliminated by chipping during dicing and spinel shedding during polishing, and the yield was improved.
【００１１】以下、本発明の実施例について説明する。An embodiment of the present invention will be described below.
【実施例１】ＣｏＯ、ＮｉＯを原料にＣｏＯ／ＮｉＯ
（モル比）＝５０／５０組成となるように調整し、これ
に添加材としてＺｒＯ2２ｗｔ％さらにＡｌ2Ｏ3を０．
４ｗｔ％添加し混合した。混合は、エタノ−ル中湿式ボ
−ルミルで２０時間行なった。この混合粉をＮ2中８５
０℃で仮焼し、次いで粗砕機を用いて粉砕し、１５０μ
ｍの篩で篩分けを行ない仮焼粉を得た。この仮焼粉を、
エタノ−ル中湿式ボ−ルミルで４０時間粉砕した。この
粉砕粉を造粒後ＣＩＰ成形し、成形体を酸素中１２５０
℃で１０時間焼結した。さらにこれを１２５０℃、１０
０ＭＰａ、２時間のＨＩＰ処理を行なった。この焼結体
を１１５０、１２００、１２５０℃に加熱後、３００℃
／ｈの冷却速度で冷却した。Example 1 CoO / NiO using CoO and NiO as raw materials
(Molar ratio) = 50/50 composition was adjusted, and ZrO 2 2 wt% and Al 2 O 3 were added to this as an additive.
4 wt% was added and mixed. Mixing was carried out for 20 hours in a wet ball mill in ethanol. 85% of this mixed powder in N 2
Calcination at 0 ° C, then crushing with a crusher, 150μ
Sieving was performed with a sieve of m to obtain a calcined powder. This calcined powder,
It was crushed for 40 hours with a wet ball mill in ethanol. After granulating this pulverized powder, CIP molding is performed, and the molded body is subjected to 1250 in oxygen.
Sintered at 0 ° C for 10 hours. Furthermore, this is 1250 ℃, 10
HIP treatment was performed at 0 MPa for 2 hours. After heating this sintered body to 1150, 1200, 1250 ℃, 300 ℃
It cooled at the cooling rate of / h.
【００１２】この結果、得られた焼結体にスピネル析出
物はみとめられず、ダイシング加工時のチッピングや研
磨時のスピネル脱粒による欠陥が図面代用写真図１に示
すごとく低減した。As a result, spinel precipitates were not found in the obtained sintered body, and defects due to chipping during dicing and spinel shedding during polishing were reduced as shown in FIG.
【００１３】[0013]
【実施例２】ＨＩＰ処理後までは実施例１と同じ条件で
作製した焼結体を１２００℃に加熱後、４００℃／ｈ、
５００℃／ｈ、１０００℃／ｈの冷却速度で冷却した。[Example 2] A sintered body produced under the same conditions as in Example 1 until after HIP treatment was heated to 1200 ° C, and then heated to 400 ° C / h.
It cooled at the cooling rate of 500 degreeC / h and 1000 degreeC / h.
【００１４】その結果、実施例１と同様の結果が得られ
た。（図面代用写真図２）As a result, the same results as in Example 1 were obtained. (Drawing substitute photograph Figure 2)
【００１５】[0015]
【実施例３】焼結過程の前までは実施例１と同じ条件で
作製した成形体を１３００℃で１０時間保持した後、３
００℃／ｈの冷却速度で冷却した。Example 3 A molded body produced under the same conditions as in Example 1 up to the sintering process was kept at 1300 ° C. for 10 hours, and then 3
It cooled at the cooling rate of 00 degreeC / h.
【００１６】その結果、実施例１と同様の結果が得られ
た。（図面代用写真図３）As a result, the same results as in Example 1 were obtained. (Drawing substitute photograph Figure 3)
【００１７】[0017]
【実施例４】ＨＩＰ処理過程の前までは実施例１と同じ
条件で作製した焼結体をＨＩＰ処理する際、１２５０℃
１００ＭＰａ ２時間保持した後、３００℃／ｈの冷却
速度で冷却した。[Embodiment 4] When the sintered body prepared under the same conditions as in Embodiment 1 was subjected to HIP processing until before the HIP processing step, at 1250 ° C.
After holding at 100 MPa for 2 hours, it was cooled at a cooling rate of 300 ° C./h.
【００１８】その結果、実施例１と同様の結果が得られ
た。（図面代用写真図４）As a result, the same results as in Example 1 were obtained. (Drawing substitute photograph Figure 4)
【００１９】次に比較例を示す。Next, a comparative example will be shown.
【比較例１】実施例１と同じ条件でＨＩＰ処理までを行
った焼結体を１０００℃及び１３００℃に加熱後、５０
０℃／ｈの冷却速度で冷却した。Comparative Example 1 A sintered body that had been subjected to the HIP treatment under the same conditions as in Example 1 was heated to 1000 ° C. and 1300 ° C., and then 50
It cooled at the cooling rate of 0 degreeC / h.
【００２０】この比較例により得られた焼結体は、１０
００℃に加熱したものには図面代用写真図５のごとくス
ピネル析出物がみとめられた。また、１３００℃に加熱
したものはスピネル析出物はみとめられなかったが、熱
処理前の平均粒径が５μｍであったのにたいし熱処理後
の粒径は８μｍに粗大化していた。そのため、ダイシン
グ加工時のチッピングが大きくなった。The sintered body obtained by this comparative example has 10
Spinel precipitates were observed in the sample heated at 00 ° C. as shown in the photograph as a drawing substitute, FIG. Further, although spinel precipitates were not found in the material heated to 1300 ° C., the average particle diameter before heat treatment was 5 μm, whereas the particle diameter after heat treatment was coarsened to 8 μm. As a result, chipping during dicing is increased.
【００２１】[0021]
【比較例２】実施例１と同じ条件でＨＩＰ処理までを行
った焼結体を１２００℃に加熱後、１００℃／ｈ、２０
０℃／ｈ、２５０℃／ｈの冷却速度で冷却した。Comparative Example 2 A sintered body that had been subjected to HIP treatment under the same conditions as in Example 1 was heated to 1200 ° C., and then heated at 100 ° C./h for 20 hours.
It cooled at the cooling rate of 0 degreeC / h and 250 degreeC / h.
【００２２】その結果、冷却速度大きくなるに従いスピ
ネル析出物は少なくなるが比較例２による冷却速度では
いずれもスピネル析出物がみとめられた。（図面代用写
真図６）As a result, as the cooling rate increased, the spinel precipitates decreased, but at the cooling rate according to Comparative Example 2, spinel precipitates were found in all cases. (Drawing substitute photograph Figure 6)
【００２３】[0023]
【発明の効果】以上説明したように、本発明による熱処
理を行うことにより、ＣｏＯまたはＣｏＯ及びＮｉＯと
Ａｌ2Ｏ3とから形成されるスピネル析出物がみとめられ
ない磁気ヘッド用非磁性基板を得ることができ、ダイシ
ング加工時のチッピングや研磨加工時のスピネル脱粒に
よる欠陥の発生が無くなり、加工歩留まりの向上がなさ
れた。As described above, by performing the heat treatment according to the present invention, a non-magnetic substrate for a magnetic head in which spinel precipitates formed of CoO or CoO and NiO and Al 2 O 3 are not observed can be obtained. Therefore, the occurrence of defects due to chipping during dicing and spinel shedding during polishing was eliminated, and the processing yield was improved.
【００２４】[0024]
【図１】 実施例１の条件で急冷処理したものの研磨面
の図面代用ＳＥＭ写真FIG. 1 is a drawing-substitute SEM photograph of a polished surface of a material subjected to rapid cooling under the conditions of Example 1.
【図２】 実施例２の条件で急冷処理したものの研磨面
の図面代用ＳＥＭ写真FIG. 2 is a drawing-substitute SEM photograph of the polished surface of the material that was rapidly cooled under the conditions of Example 2.
【図３】 実施例３の条件で急冷処理したものの研磨面
の図面代用ＳＥＭ写真FIG. 3 is a drawing-substitute SEM photograph of a polished surface of the material that was rapidly cooled under the conditions of Example 3.
【図４】 実施例４の条件で急冷処理したものの研磨面
の図面代用ＳＥＭ写真FIG. 4 is a drawing-substitute SEM photograph of the polished surface of the material subjected to rapid cooling under the conditions of Example 4.
【図５】 比較例１の条件で急冷処理したものの研磨面
の図面代用ＳＥＭ写真FIG. 5 is a drawing-substitute SEM photograph of the polished surface of the material that was rapidly cooled under the conditions of Comparative Example 1.
【図６】 比較例１の条件で急冷処理したものの研磨面
の図面代用ＳＥＭ写真FIG. 6 is a drawing-substitute SEM photograph of a polished surface of a sample that was rapidly cooled under the conditions of Comparative Example 1.
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【手続補正書】[Procedure amendment]
【提出日】平成５年１０月２７日[Submission date] October 27, 1993
【手続補正１】[Procedure Amendment 1]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】図面の簡単な説明[Name of item to be corrected] Brief description of the drawing
【補正方法】変更[Correction method] Change
【補正内容】[Correction content]
【図面の簡単な説明】[Brief description of drawings]
【図１】 実施例１の条件で急冷処理したものの研磨面
のセラミック材料の組織を示すＳＥＭ写真FIG. 1 is an SEM photograph showing the structure of a ceramic material on a polished surface of a material that was rapidly cooled under the conditions of Example 1.
【図２】 実施例２の条件で急冷処理したものの研磨面
のセラミック材料の組織を示すＳＥＭ写真FIG. 2 is an SEM photograph showing the structure of the ceramic material on the polished surface of the material that was rapidly cooled under the conditions of Example 2.
【図３】 実施例３の条件で急冷処理したものの研磨面
のセラミック材料の組織を示すＳＥＭ写真FIG. 3 is an SEM photograph showing the structure of the ceramic material on the polished surface of the material that was rapidly cooled under the conditions of Example 3.
【図４】 実施例４の条件で急冷処理したものの研磨面
のセラミック材料の組織を示すＳＥＭ写真FIG. 4 is an SEM photograph showing the structure of the ceramic material on the polished surface of the material that was rapidly cooled under the conditions of Example 4.
【図５】 比較例１の条件で急冷処理したものの研磨面
のセラミック材料の組織を示すＳＥＭ写真5 is a SEM photograph showing the structure of the ceramic material on the polished surface of the material subjected to rapid cooling under the conditions of Comparative Example 1. FIG.
【図６】 比較例１の条件で急冷処理したものの研磨面
のセラミック材料の組織を示すＳＥＭ写真 ─────────────────────────────────────────────────────
FIG. 6 is an SEM photograph showing the structure of the ceramic material of the polished surface of the material subjected to rapid cooling under the conditions of Comparative Example 1 ─────────────────────────── ────────────────────────────
【手続補正書】[Procedure amendment]
【提出日】平成６年５月２４日[Submission date] May 24, 1994
【手続補正１】[Procedure Amendment 1]
【補正対象書類名】図面[Document name to be corrected] Drawing
【補正対象項目名】全図[Correction target item name] All drawings
【補正方法】変更[Correction method] Change
【補正内容】[Correction content]
【図１】 [Figure 1]
【図２】 [Fig. 2]
【図３】 [Figure 3]
【図４】 [Figure 4]
【図５】 [Figure 5]
【図６】 [Figure 6]
Claims (3)
組成とし、これにＺｒＯ2 ０．５〜７ｗｔ％、Ａｌ2Ｏ
3 ０．１〜２ｗｔ％添加した磁気ヘッド用非磁性基板
を下限温度１１５０℃から上限温度を焼結温度として加
熱後、３００℃／ｈ以上で急冷処理を行うことを特徴と
する磁気ヘッド用非磁性基板の製造方法。1. A basic composition of CoO and NiO or NiO, to which ZrO 2 0.5 to 7 wt% and Al 2 O are added.
3. A non-magnetic substrate for a magnetic head, to which 0.1 to 2 wt% is added, is heated from a lower limit temperature of 1150 ° C. to an upper limit temperature of a sintering temperature, and then rapidly cooled at 300 ° C./h or more. Method of manufacturing magnetic substrate.
に行うことを特徴とする磁気ヘッド用非磁性基板の製造
法方法。2. A method for manufacturing a non-magnetic substrate for a magnetic head, wherein the rapid cooling treatment according to claim 1 is performed during cooling in a sintering process.
理過程での冷却時に行うことを特徴とする磁気ヘッド用
非磁性基板の製造方法。3. A method for manufacturing a non-magnetic substrate for a magnetic head, wherein the rapid cooling treatment according to claim 1 is performed during cooling in a HIP treatment process after sintering.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12934692A JPH06342505A (en) | 1992-04-23 | 1992-04-23 | Production of nonmagnetic substrate for magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12934692A JPH06342505A (en) | 1992-04-23 | 1992-04-23 | Production of nonmagnetic substrate for magnetic head |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH06342505A true JPH06342505A (en) | 1994-12-13 |
Family
ID=15007342
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12934692A Pending JPH06342505A (en) | 1992-04-23 | 1992-04-23 | Production of nonmagnetic substrate for magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH06342505A (en) |
-
1992
- 1992-04-23 JP JP12934692A patent/JPH06342505A/en active Pending
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