JPH06316789A - Composite chromium plating and plating method - Google Patents
Composite chromium plating and plating methodInfo
- Publication number
- JPH06316789A JPH06316789A JP21316993A JP21316993A JPH06316789A JP H06316789 A JPH06316789 A JP H06316789A JP 21316993 A JP21316993 A JP 21316993A JP 21316993 A JP21316993 A JP 21316993A JP H06316789 A JPH06316789 A JP H06316789A
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- Prior art keywords
- plating
- composite
- chromium plating
- chromium
- hard particles
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Abstract
Description
【０００１】[0001]
【産業上の利用分野】この発明は耐摩耗性および耐食性
を向上することを目的とした３価クロムによる複合めっ
きおよびめっき方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a composite plating with trivalent chromium and a plating method for improving wear resistance and corrosion resistance.
【０００２】[0002]
【従来の技術】従来広く知られていたクロムめっき浴の
浴組織は、６価クロム（ＣｒＯ3 ）を主体とし、若干の
触媒根としてＨ2 ＳＯ4 、Ｈ2 ＳｉＦ6 などを添加した
いわゆるサージェント浴である。近年公害の少ない面お
よび電気エネルギーの節約面から、３価クロムを主体と
した浴からのめっきの研究開発が行なわれている（特公
昭５４−３７５６４号）。また６価クロムを主体にした
サージェント浴を用いてクロムめっきの耐摩耗性を向上
させる試みがなされ、硬質粒子例えばＳｉＣ、Ａｌ2 Ｏ
3 又はダイヤモンドなどの複合めっきが検討された。2. Description of the Related Art The bath structure of a chromium plating bath, which has been widely known in the past, is mainly composed of hexavalent chromium (CrO 3 ) and a so-called sergent in which H 2 SO 4 , H 2 SiF 6 and the like are added as some catalyst roots. It is a bath. In recent years, research and development of plating from a bath mainly containing trivalent chromium have been conducted from the viewpoint of less pollution and saving of electric energy (Japanese Patent Publication No. 54-37564). Attempts have also been made to improve the wear resistance of chromium plating by using a Sargent bath mainly composed of hexavalent chromium. Hard particles such as SiC, Al 2 O
Composite plating of 3 or diamond was considered.
【０００３】また研磨器用として複合めっきが知られて
いた（特公昭１３−４９６３号）。Further, composite plating has been known for a polishing machine (Japanese Examined Patent Publication No. 13-4963).
【０００４】[0004]
【発明により解決すべき課題】３価クロムを主体とした
浴によるめっきは、６価クロムを主体した浴より公害が
少なく、使用電気量も少ないという利益があるが、その
反面めっき皮膜が厚くなり難く、２μm 以下では均一で
光沢を有し、硬質のめっきが可能であるが、長時間の電
解めっきにあってはコブ状の析出となるため、厚めっき
を要求されるめっき加工については不適当である。従っ
て耐食性を要求される比較的薄めっきに限定した場合に
のみ実用に供すことができるという問題点があった。ま
た６価クロムの複合クロムめっきは、硬質粒子の析出量
が著しく少なく、実用に供し得ないものであった。[Problems to be solved by the invention] Plating with a bath mainly containing trivalent chromium has the advantages of less pollution and less electricity consumption than a bath mainly containing hexavalent chromium, but on the other hand, the plating film becomes thicker. It is difficult, and if it is 2 μm or less, it has uniform luster and hard plating is possible, but it is not suitable for plating processing that requires thick plating because it will form bumpy deposits in long-term electrolytic plating. Is. Therefore, there is a problem that it can be put to practical use only when it is limited to a relatively thin plating that requires corrosion resistance. Further, the hexavalent chromium composite chrome plating had a significantly small amount of hard particles deposited, and could not be put to practical use.
【０００５】また前記研磨器用複合めっきは六価クロム
を用いたものと思われるが、硬質粒子の析出量が著しく
少ないので、一般の硬質面を得る為のめっきとしては実
用性が乏しかった。従って実用例が知られていなかっ
た。The above-mentioned composite plating for polishers seems to use hexavalent chromium, but since the precipitation amount of hard particles is extremely small, it is not practical as a plating for obtaining a general hard surface. Therefore, no practical example was known.
【０００６】[0006]
【課題を解決するための手段】然るにこの発明は、３価
クロムめっきに耐摩耗性を有する硬質粒子又は硬質粒子
と自己潤滑性粒子を共析させることにより、クロムめっ
きの薄膜性能の向上を図ることに成功したのである。SUMMARY OF THE INVENTION However, the present invention aims to improve the thin film performance of chromium plating by co-depositing hard particles having abrasion resistance or hard particles and self-lubricating particles on trivalent chromium plating. It was successful.
【０００７】即ち、３価クロムを主体としたクロムめっ
きは、厚付けめっき加工ができない為に、その実用域が
著しく限定されていたが、この発明は３価クロム浴に耐
摩耗性硬質粒子又は硬質粒子と自己潤滑性粒子とを加え
ることによって耐摩耗性を増強させることに成功したの
である。前記における耐摩耗の硬質粒子としては、例え
ばダイヤモンド、ＳｉＣ、Ａｌ2 Ｏ3 、Ｃｒ3 Ｃ2 、Ｚ
ｒＢ2 、Ｂ4 Ｃ、ＣＢＮなどが考えられる。また自己潤
滑粒子としては、グラファイト、ＭｏＳ2 、ＷＳ2 、Ｂ
ａＳＯ4 、ポリエチレン又はＡＢＳ樹脂などが考えられ
る。従ってこの発明においては、用途に応じ、前記各粒
子の単独又は複数種を所定の割合に使用することができ
る。耐摩耗性および硬度を有するめっき膜を容易に得る
ことができる。That is, since the chromium plating mainly composed of trivalent chromium cannot be thickly plated, its practical range is extremely limited. However, the present invention uses a trivalent chromium bath for wear-resistant hard particles or The addition of hard particles and self-lubricating particles has succeeded in enhancing wear resistance. Examples of the wear-resistant hard particles mentioned above include diamond, SiC, Al 2 O 3 , Cr 3 C 2 , and Z.
rB 2 , B 4 C, CBN, etc. are considered. Further, as self-lubricating particles, graphite, MoS 2 , WS 2 , B
Possible examples include aSO 4 , polyethylene or ABS resin. Therefore, in the present invention, a single kind or a plurality of kinds of each of the above particles can be used in a predetermined ratio depending on the application. A plating film having wear resistance and hardness can be easily obtained.
【０００８】前記における３価クロムを主体とする浴
は、例えば塩化クロム、硫酸クロム又はフッ化クロムの
３価クロム塩に、蟻酸、酢酸などのカルボン酸塩及びグ
リシン、ダルタシン酸などのアミノ基とカルボキシル基
をもつ化合物の一種又は複数種を加え、更にＮａＣｌ、
ＫＣｌなどのアルカリ金属塩化物、硫酸塩及びVII ｂ族
の水素化合物からなる電導度改善剤を加えて調整する。The bath containing trivalent chromium as a main component is composed of, for example, a trivalent chromium salt such as chromium chloride, chromium sulfate or chromium fluoride, a carboxylate salt such as formic acid and acetic acid, and an amino group such as glycine and dalacic acid. Add one or more compounds having a carboxyl group, and further add NaCl,
It is adjusted by adding an electric conductivity improver consisting of an alkali metal chloride such as KCl, a sulfate and a hydrogen compound of Group VIIb.
【０００９】次にこの発明を更に詳述すると、３価クロ
ムめっきは、Ｃｒ+3塩（例えばＣｒＣｌ3 、Ｃｒ2 （Ｓ
Ｏ4 ）3 ）に錯化剤を添加した浴を用いることでめっき
が可能になる。この錯化剤の電着におよぼす作用効果
は、電着に著しく重要で、錯化剤を用いない場合は黒色
皮膜が得られるものの金属クロムの電着は不可能であ
る。この出願の発明者は錯化剤の作用機構を研究し、錯
化剤が陰極面に吸着され、電着が進行されることを見出
し、さらにクロムめっき機能の向上を目的として複合め
っきを行うことで、耐摩耗性皮膜を作成する為に硬質粒
子であるダイヤモンド粉末、ＳｉＣ等を浴に添加したと
ころ、クローム・ダイヤモンド及びクローム、ＳｉＣ複
合めっき膜が容易に生成されることが判明した。またク
ロム基の複合めっきについて詳細に検討を重ねた結果、
陰極に吸着された錯化物は懸濁粒子の表面張力を低下さ
せるために、著しく効果があることが判明した。The present invention will be described in more detail below. The trivalent chromium plating is performed by using a Cr +3 salt (for example, CrCl 3 , Cr 2 (S).
Plating becomes possible by using a bath in which a complexing agent is added to O 4 ) 3 ). The action and effect of this complexing agent on electrodeposition are extremely important for electrodeposition. If a complexing agent is not used, a black film can be obtained but metal chromium cannot be electrodeposited. The inventor of this application studies the action mechanism of the complexing agent, finds that the complexing agent is adsorbed on the cathode surface, and electrodeposition proceeds, and further performs composite plating for the purpose of improving the chromium plating function. It was found that when diamond powder, SiC, etc., which are hard particles, were added to the bath in order to form an abrasion resistant film, chrome-diamond and chrome-SiC composite plating film were easily formed. In addition, as a result of repeated detailed studies on chromium-based composite plating,
It was found that the complex compound adsorbed on the cathode was remarkably effective in reducing the surface tension of the suspended particles.
【００１０】[0010]
【作用】即ち、この発明の方法によれば、３価クロムの
複合クロムめっきは耐摩耗性および硬度など著しく優れ
ており、かつ必要なめっき厚さを得ることができる。That is, according to the method of the present invention, the composite chromium plating of trivalent chromium is remarkably excellent in wear resistance and hardness, and the required plating thickness can be obtained.
【００１１】[0011]
【実施例１】３価クロムめっき浴組成として、ＣｒＣｌ
3 ６Ｈ2 Ｏ １００ｇ／l 、ＨＣＯＯＫ ８０ｇ／l 、
ＮＨ3 Ｂｒ １０ｇ／l 、ＮＨ4 Ｃｌ ５０ｇ／l をＰ
Ｈ３．０に調節した浴を用い、陽極フェライト電極、陰
極を黄銅板とし、添加微粒子はα−ＳｉＣ（平均粒径
０．５μm ）を５ｇ／l 添加し、８Ａ／dm2 で６０分間
電着した所、Ｃｒ−ＳｉＣ複合めっき厚９μm を得た。Example 1 As a trivalent chromium plating bath composition, CrCl
3 6H 2 O 100g / l, HCOOK 80g / l,
NH 3 Br 10 g / l, NH 4 Cl 50 g / l P
Using a bath adjusted to H3.0, using an anode ferrite electrode and a cathode as a brass plate, 5 g / l of α-SiC (average particle size 0.5 μm) was added as fine particles to be added, and electrodeposition was performed at 8 A / dm 2 for 60 minutes. As a result, a Cr-SiC composite plating thickness of 9 µm was obtained.
【００１２】前記めっきの硬さは、Ｈv ８００とクロム
めっきのみのものより若干高いものであつた。またこの
もののＳｉＣの共折量は０．５ｗｔ％であつた。The hardness of the plating was slightly higher than that of Hv 800 and chromium plating alone. The co-bending amount of SiC of this product was 0.5 wt%.
【００１３】この試験片を用いてテーパー摩耗試験機で
摩耗輪ＣＳ−１０、荷重１Kgｆ、１０，０００回転後の
摩耗量を求めた所、硬質粒子を用いないめっきのみのも
のは２mg／cm2 であり、この試験片では０．５mg／cm2
であつた。Using this test piece, the amount of wear after wear wheel CS-10, load 1 Kgf, 10,000 rotations was determined with a taper wear tester, and 2 mg / cm 2 was obtained only for plating without using hard particles. Is 0.5 mg / cm 2 in this test piece.
It was.
【００１４】前記電解条件で作成したクロム−ダイヤモ
ンド複合皮膜のダイヤモンド共折量は２．５ｗｔ％又は
２．７ｗｔ％とダイヤモンドの添加量が増加するに伴い
増加した。これらの試験片を用いて、前記と同様の摩耗
条件で試験した結果、０．４mg／cm2 又は０．３mg／cm
2 の摩耗量減量であつた。The amount of co-folded diamond in the chromium-diamond composite coating formed under the above-mentioned electrolysis conditions was 2.5 wt% or 2.7 wt%, which increased as the amount of diamond added increased. These test pieces were used and tested under the same wear conditions as described above. As a result, 0.4 mg / cm 2 or 0.3 mg / cm 2
The wear amount was reduced by 2 .
【００１５】[0015]
【実施例２】３価クロムめっき浴組成として、ＣｒＣｌ
3 ６Ｈ2 Ｏ １００ｇ／l 、ＨＣＯＯＫ ８０ｇ／l 、
ＮＨ3 Ｂｒ １０ｇ／l 、ＮＨ4 Ｃｌ ５０ｇ／l 、Ｋ
Ｃｌ７０ｇ／l 、Ｈ3 ＢＯ3 ４０ｇ／l に湿潤剤（ス
ルホこはく酸ナトリウム０．５ml／l ＋フェニルウレタ
ン０．５ml／l ）１ml／l 添加し、浴をＰＨ３．０に調
整して、２５℃、２４時間熟成後、人工ダイヤモンド
（平均粒径０．５μm）を１０ｇ／l と、グラファイト
１０ｇ／l とを添加し、スターラーを用いて攪拌懸濁
後、陽極カーボンを用い、陰極ステンレス板を用いて電
解条件８Ａ／dm2で６０分間電着した。このとき得られ
たクロムめっき厚は９μm であった。前記浴を用いての
ダイヤモンド共析しない電着クロムめっきの硬さはＨv
７００であったが、ダイヤモンドを共析させたクロムダ
イヤモンド複合皮膜の硬さはＨv ９００であった。また
この条件下で得られたクロムーダイヤモンド複合皮膜の
ダイヤモンド共析量は、２．０ｗｔ％であった。Example 2 CrCl was used as a trivalent chromium plating bath composition.
3 6H 2 O 100g / l, HCOOK 80g / l,
NH 3 Br 10 g / l, NH 4 Cl 50 g / l, K
Cl 70 g / l, H 3 BO 3 40 g / l, a wetting agent (sodium sulfosuccinate 0.5 ml / l + phenylurethane 0.5 ml / l) 1 ml / l were added, the bath was adjusted to pH 3.0, and 25 After aging at 24 ° C. for 24 hours, 10 g / l of artificial diamond (average particle size 0.5 μm) and 10 g / l of graphite were added, and the mixture was stirred and suspended using a stirrer, and anode carbon was used to form a cathode stainless steel plate. It was electrodeposited under electrolysis conditions of 8 A / dm 2 for 60 minutes. The chromium plating thickness obtained at this time was 9 μm. The hardness of the electrodeposited chrome plating that does not eutectoid diamond using the bath is Hv
Although it was 700, the hardness of the chromium-diamond composite coating formed by eutectoid diamond was Hv 900. The amount of eutectoid diamond in the chromium-diamond composite coating obtained under these conditions was 2.0 wt%.
【００１６】[0016]
【実施例３】めっき浴組成として、Ｃｒ2 （ＳＯ4 ）3
２００ｇ／l 、（ＮＨ4 ）2 ＳＯ4 ３２０ｇ／l 、
（ＮＨ2 ）ＣＯ ２２０ｇ／l 、ＣＨ2 （ＮＨ2 ）ＣＯ
ＯＨ８５ｇ／l 、Ｈ3 ＢＯ3 ５０ｇ／l をＰＨ２．２
〜２．５に調整、浴温４５℃に保持し、実施例２で用い
た湿潤剤１ml／l 添加した後、ＣＢＮ（六方晶、平均粒
径０．５μm ）を１０ｇ／l と、ＭｏＳ2 を１０ｇ／l
とを添加し、スターラーを用いて攪拌懸濁後、陽極にフ
ェライト電極、陰極に鋼板とし、電解条件５Ａ／dm2 、
６０分間電解を行ない７μm めっきを得て、試験片とし
た。この試験片のかたさはＨv １０００を示した。また
ＢＮの共析量は１．２ｗｔ％であった。この試験片を用
いて、実施例１と同様の摩耗条件下で試験を行なったと
ころ、摩耗減量は０．５mg／cm2 であった。さらに本浴
にα−ＳｉＣ（平均粒径０．５μm ）を１０ｇ／l を添
加し、Ｃｒ−ＳｉＣの複合めっきを上述電解条件下で行
ない、さらに上述と同様の条件で摩耗試験を行なったと
ころ、摩耗減量は０．１mg／cm2 と著しく減少し、自己
潤滑性の効果をさらに助長することができた。Example 3 Cr 2 (SO 4 ) 3 was used as the plating bath composition.
200 g / l, (NH 4 ) 2 SO 4 320 g / l,
(NH 2 ) CO 220 g / l, CH 2 (NH 2 ) CO
OH 85 g / l, H 3 BO 3 50 g / l to PH 2.2
The bath temperature was adjusted to ˜2.5, the bath temperature was kept at 45 ° C., 1 ml / l of the wetting agent used in Example 2 was added, and then 10 g / l of CBN (hexagonal crystal, average particle size 0.5 μm) and MoS 2 10 g / l
And were added and stirred and suspended using a stirrer, a ferrite electrode was used as the anode, and a steel plate was used as the cathode. Electrolysis conditions were 5 A / dm 2 ,
Electrolysis was carried out for 60 minutes to obtain 7 μm plating, which was used as a test piece. The hardness of this test piece was Hv 1000. The eutectoid amount of BN was 1.2 wt%. When this test piece was used to perform a test under the same wear conditions as in Example 1, the loss on wear was 0.5 mg / cm 2 . Further, 10 g / l of α-SiC (average particle size 0.5 μm) was added to the main bath, composite plating of Cr-SiC was carried out under the above electrolytic conditions, and a wear test was conducted under the same conditions as above. The wear loss was significantly reduced to 0.1 mg / cm 2, and the self-lubricating effect could be further promoted.
【００１７】[0017]
【発明の効果】即ちこの発明の方法によれば、３価クロ
ムを用い、硬質粒子を含む複合クロムめっきを行うの
で、めっき皮膜は耐摩耗性に富み硬度が大きく、かつ必
要なめっき厚を得ることができる等の顕著な効果があ
る。That is, according to the method of the present invention, since trivalent chromium is used to perform composite chromium plating containing hard particles, the plating film has high wear resistance and high hardness, and a required plating thickness is obtained. There are remarkable effects such as being able to.
【００１８】従来３価クロムめっきにおいては、めっき
皮膜の硬さが満足のゆくものでなかったが、この発明の
複合めっきをすることによって従来の問題点を解決し
た。また６価クロムの複合めっきにおいては共析量で問
題があったが、この発明の３価クロムめっきによってこ
の問題を解決し、複合クロムめっきを可能にしたのであ
る。In the conventional trivalent chromium plating, the hardness of the plating film was not satisfactory, but the conventional problems were solved by using the composite plating of the present invention. Further, in the hexavalent chromium composite plating, there was a problem in the amount of eutectoid, but the trivalent chromium plating of the present invention solved this problem and enabled composite chromium plating.
【００１９】この発明の３価クロムによる複合クロムめ
っきによれば、６価クロムめっきの場合よりも公害が少
なく、排水処理の簡易化ができると共に、使用電気量も
ほぼ1/2 程度に節減できるなど実用上においても著しい
効果がある。According to the composite chromium plating of trivalent chromium of the present invention, pollution is less than in the case of hexavalent chromium plating, the wastewater treatment can be simplified, and the amount of electricity used can be reduced to about 1/2. It has a remarkable effect in practical use.
Claims (8)
硬質粒子を含むことを特徴とした複合クロムめっき。1. A composite chromium plating comprising a trivalent chromium plating film containing hard particles having abrasion resistance.
硬質粒子及び自己潤滑粒子を含むことを特徴とした複合
クロムめっき。2. A composite chromium plating comprising a trivalent chromium plating film containing hard particles having abrasion resistance and self-lubricating particles.
又はフッ化クロムとした請求項１又は２記載の複合クロ
ムめっき。3. The composite chromium plating according to claim 1, wherein the trivalent chromium salt is chromium chloride, chromium sulfate or chromium fluoride.
混合した浴に耐摩耗性の硬質粒子又は硬質粒子及び自己
潤滑粒子を加えて懸濁させ、浴をＰＨ１〜３とした後、
陽極に不溶性電極を用い陰極を被めっき材として通電し
てめっき皮膜を生成することを特徴とした複合クロムめ
っき方法。4. A bath prepared by mixing a trivalent chromium salt with a complexing agent and a conductivity improver and adding hard particles having abrasion resistance or hard particles and self-lubricating particles and suspending them to obtain a bath having a pH of 1 to 3. rear,
A composite chromium plating method characterized in that an insoluble electrode is used as an anode and a cathode is used as a material to be plated to generate electricity to form a plating film.
及びグリシン、ダルタシン酸などのアミノ基とカルボキ
シル基をもつ化合物とした請求項４記載の複合クロムめ
っき方法。5. The composite chromium plating method according to claim 4, wherein the complexing agent is a carboxylate such as formic acid and acetic acid, and a compound having an amino group and a carboxyl group such as glycine and daltadic acid.
アルカリ金属塩化物、硫酸塩及びVII ｂ族の水素化合物
から構成させたことを特徴とする請求項４記載の複合ク
ロムめっき方法。6. The composite chromium plating method according to claim 4, wherein the conductivity improver is composed of an alkali metal chloride such as NaCl or KCl, a sulfate and a hydrogen compound of Group VIIb.
2 Ｏ3 、Ｃｒ3 Ｃ2、ＺｒＢ2 、Ｂ4 Ｃ、ＣＢＮの一種
又は複数種とした請求項４記載の複合クロムめっき方
法。7. Hard particles made of diamond, SiC, Al
The composite chromium plating method according to claim 4, wherein one or a plurality of 2 O 3 , Cr 3 C 2 , ZrB 2 , B 4 C and CBN is used.
ト、ＭｏＳ2 、ＷＳ2、ＢａＳＯ4 、ポリエチレン、Ａ
ＢＳ樹脂とした請求項４記載の複合クロムめっき方法。8. Particles having a self-lubricating property are graphite, MoS 2 , WS 2 , BaSO 4 , polyethylene, A
The composite chromium plating method according to claim 4, which is a BS resin.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21316993A JPH06316789A (en) | 1993-08-27 | 1993-08-27 | Composite chromium plating and plating method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21316993A JPH06316789A (en) | 1993-08-27 | 1993-08-27 | Composite chromium plating and plating method |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60259077A Division JPH0631462B2 (en) | 1985-11-19 | 1985-11-19 | Film formation method by composite chrome plating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH06316789A true JPH06316789A (en) | 1994-11-15 |
Family
ID=16634705
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21316993A Pending JPH06316789A (en) | 1993-08-27 | 1993-08-27 | Composite chromium plating and plating method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH06316789A (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19931829A1 (en) * | 1999-07-08 | 2001-01-18 | Federal Mogul Burscheid Gmbh | Galvanic hard chrome layer |
| KR100389959B1 (en) * | 2001-03-12 | 2003-07-02 | 한국기계연구원 | A Method of Forming Cr/Cr-X Layer for Corrosion Resistance |
| US6791245B2 (en) | 1999-02-25 | 2004-09-14 | Ngk Spark Plug Co., Ltd. | Glow plug and spark plug, and manufacturing method therefor |
| WO2013176149A1 (en) * | 2012-05-22 | 2013-11-28 | 日本化学工業株式会社 | Chromium plated article and chromium plating film |
| WO2014157305A1 (en) | 2013-03-29 | 2014-10-02 | 株式会社リケン | Composite rigid chromium coating film, and sliding member coated with said coating film |
| JP2016216833A (en) * | 2016-08-08 | 2016-12-22 | 日本化学工業株式会社 | Chromium plated article and chromium plated film |
| JP2017172030A (en) * | 2016-03-18 | 2017-09-28 | 国立大学法人長岡技術科学大学 | Mechanical component for sliding |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5437564A (en) * | 1977-08-30 | 1979-03-20 | Oki Electric Ind Co Ltd | Setting circuit for oscillation fequency |
| JPS5558386A (en) * | 1978-10-24 | 1980-05-01 | C Uyemura & Co Ltd | Zinc-trivalent chrome electric plating bath |
| JPS5928640A (en) * | 1982-08-10 | 1984-02-15 | Tokyo Optical Co Ltd | Lens meter and target plate used therefor |
-
1993
- 1993-08-27 JP JP21316993A patent/JPH06316789A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5437564A (en) * | 1977-08-30 | 1979-03-20 | Oki Electric Ind Co Ltd | Setting circuit for oscillation fequency |
| JPS5558386A (en) * | 1978-10-24 | 1980-05-01 | C Uyemura & Co Ltd | Zinc-trivalent chrome electric plating bath |
| JPS5928640A (en) * | 1982-08-10 | 1984-02-15 | Tokyo Optical Co Ltd | Lens meter and target plate used therefor |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6791245B2 (en) | 1999-02-25 | 2004-09-14 | Ngk Spark Plug Co., Ltd. | Glow plug and spark plug, and manufacturing method therefor |
| DE19931829A1 (en) * | 1999-07-08 | 2001-01-18 | Federal Mogul Burscheid Gmbh | Galvanic hard chrome layer |
| KR100389959B1 (en) * | 2001-03-12 | 2003-07-02 | 한국기계연구원 | A Method of Forming Cr/Cr-X Layer for Corrosion Resistance |
| WO2013176149A1 (en) * | 2012-05-22 | 2013-11-28 | 日本化学工業株式会社 | Chromium plated article and chromium plating film |
| JP2013241656A (en) * | 2012-05-22 | 2013-12-05 | Nippon Chem Ind Co Ltd | Chromium plated article and chromium plating film |
| WO2014157305A1 (en) | 2013-03-29 | 2014-10-02 | 株式会社リケン | Composite rigid chromium coating film, and sliding member coated with said coating film |
| US9850587B2 (en) | 2013-03-29 | 2017-12-26 | Kabushiki Kaisha Riken | Hard composite chromium plating film and sliding member coated with such film |
| JP2017172030A (en) * | 2016-03-18 | 2017-09-28 | 国立大学法人長岡技術科学大学 | Mechanical component for sliding |
| JP2016216833A (en) * | 2016-08-08 | 2016-12-22 | 日本化学工業株式会社 | Chromium plated article and chromium plated film |
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