JPH06299200A - Rinsing agent and method for finish-washing - Google Patents
Rinsing agent and method for finish-washingInfo
- Publication number
- JPH06299200A JPH06299200A JP5111060A JP11106093A JPH06299200A JP H06299200 A JPH06299200 A JP H06299200A JP 5111060 A JP5111060 A JP 5111060A JP 11106093 A JP11106093 A JP 11106093A JP H06299200 A JPH06299200 A JP H06299200A
- Authority
- JP
- Japan
- Prior art keywords
- rinsing
- cleaning
- liquid crystal
- agent
- rinsing agent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims description 14
- 238000005406 washing Methods 0.000 title claims description 6
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 18
- 125000002947 alkylene group Chemical group 0.000 claims abstract description 15
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 6
- 150000001875 compounds Chemical class 0.000 claims abstract description 6
- 125000003342 alkenyl group Chemical group 0.000 claims abstract description 3
- 238000004140 cleaning Methods 0.000 claims description 23
- 239000012459 cleaning agent Substances 0.000 claims description 19
- 239000000126 substance Substances 0.000 claims description 12
- 125000004432 carbon atom Chemical group C* 0.000 claims description 11
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- 239000001257 hydrogen Substances 0.000 claims description 2
- 239000004973 liquid crystal related substance Substances 0.000 abstract description 34
- 238000011282 treatment Methods 0.000 abstract description 10
- 239000003599 detergent Substances 0.000 abstract description 5
- 239000000463 material Substances 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 16
- 239000000203 mixture Substances 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- 239000002904 solvent Substances 0.000 description 6
- 239000004094 surface-active agent Substances 0.000 description 5
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 2
- ACIAHEMYLLBZOI-ZZXKWVIFSA-N Unsaturated alcohol Chemical compound CC\C(CO)=C/C ACIAHEMYLLBZOI-ZZXKWVIFSA-N 0.000 description 2
- 239000004480 active ingredient Substances 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000012188 paraffin wax Substances 0.000 description 2
- 239000012487 rinsing solution Substances 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 239000011800 void material Substances 0.000 description 2
- GVNVAWHJIKLAGL-UHFFFAOYSA-N 2-(cyclohexen-1-yl)cyclohexan-1-one Chemical compound O=C1CCCCC1C1=CCCCC1 GVNVAWHJIKLAGL-UHFFFAOYSA-N 0.000 description 1
- RNMDNPCBIKJCQP-UHFFFAOYSA-N 5-nonyl-7-oxabicyclo[4.1.0]hepta-1,3,5-trien-2-ol Chemical compound C(CCCCCCCC)C1=C2C(=C(C=C1)O)O2 RNMDNPCBIKJCQP-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 101150065749 Churc1 gene Proteins 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- -1 Polyoxyethylene Polymers 0.000 description 1
- 102100038239 Protein Churchill Human genes 0.000 description 1
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 210000002858 crystal cell Anatomy 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical class OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000003752 hydrotrope Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- QUCDWLYKDRVKMI-UHFFFAOYSA-M sodium;3,4-dimethylbenzenesulfonate Chemical compound [Na+].CC1=CC=C(S([O-])(=O)=O)C=C1C QUCDWLYKDRVKMI-UHFFFAOYSA-M 0.000 description 1
- KVCGISUBCHHTDD-UHFFFAOYSA-M sodium;4-methylbenzenesulfonate Chemical compound [Na+].CC1=CC=C(S([O-])(=O)=O)C=C1 KVCGISUBCHHTDD-UHFFFAOYSA-M 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000011550 stock solution Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/66—Non-ionic compounds
- C11D1/825—Mixtures of compounds all of which are non-ionic
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Detergent Compositions (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、電子部品、特に液晶表
示パネルや極微細加工が施された電子部品の洗浄プロセ
スで用いられるすすぎ剤、およびこのすすぎ剤を用いた
洗浄仕上げ方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a rinsing agent used in a cleaning process of electronic parts, particularly a liquid crystal display panel or an electronic part subjected to ultrafine processing, and a cleaning finishing method using the rinsing agent.
【０００２】[0002]
【従来の技術】液晶表示パネル、精密加工部品、その組
立て工程に使用される治工具等の電子部品用金属部材、
プリント配線板、集積回路、シャドーマスク等の腐食加
工部品などの電子部品においては、高度の洗浄仕上がり
が要求されている。また、近年、エレクトロニクス分野
の発展とともに極微細構造を有した超精密部品も登場
し、洗浄に対する要求品質も厳しいものになってきてい
るのが現状である。2. Description of the Related Art Liquid crystal display panels, precision processed parts, metal members for electronic parts such as jigs and tools used in the assembly process,
Electronic parts such as printed wiring boards, integrated circuits, and corrosion processed parts such as shadow masks are required to have a high degree of cleaning finish. Further, in recent years, along with the development of the electronics field, ultra-precision parts having an ultrafine structure have appeared, and the required quality for cleaning is becoming strict.
【０００３】このような状況の中で、液晶表示パネルの
対向パネル間空隙部分、極***を有する金属部品、集積
回路等の微細加工された電子部品の洗浄に関しては、従
来から洗浄力に優れるフロン・塩素系溶剤が用いられて
きた。しかし、これらの溶剤の環境に対する深刻な影響
を考慮し、国際的にその使用が制限されてきている。Under these circumstances, with respect to the cleaning of the space between the opposed panels of the liquid crystal display panel, the metal parts having the small holes, and the microfabricated electronic parts such as integrated circuits, the flon has been conventionally excellent in cleaning power. -Chlorine solvents have been used. However, due to the serious environmental impact of these solvents, their use has been restricted internationally.
【０００４】さらに近年、これらの溶剤に替わるものと
して、環境に対して影響のない洗浄剤の開発が活発化し
ている。しかしながら、これらの新しい洗浄剤はそのほ
とんどが、界面活性剤やパラフィン等の溶剤を巧みに配
合し、比較的高濃度で洗浄に寄与させるものが多い。そ
のため、洗浄力という観点からはフロン・塩素系溶剤と
遜色ない能力を発揮するものの、すすぎ工程においては
多量の水あるいは温水を消費し、かつ、すすぎを完全に
行い良好な洗浄仕上りを達成させるためには、被洗物に
対して超音波照射等の過酷な負荷をかける必要があり、
さらにそのためのプロセス費用が増大するという重大な
欠点があった。なお、これらのすすぎ工程を省略する
と、洗浄後の電子部品上に界面活性剤やその他の洗浄成
分が残留し、製品に対して多大な悪影響を及ぼすことは
明白である。Furthermore, in recent years, as an alternative to these solvents, the development of a cleaning agent that does not affect the environment has been activated. However, most of these new cleaning agents skillfully blend a solvent such as a surfactant or paraffin to contribute to cleaning at a relatively high concentration. Therefore, from the viewpoint of detergency, it exhibits the same ability as a CFC / chlorine solvent, but consumes a large amount of water or warm water in the rinsing process and completes rinsing to achieve a good cleaning finish. , It is necessary to apply a severe load such as ultrasonic irradiation to the object to be washed,
Further, there is a serious drawback in that the process cost therefor increases. It should be noted that if these rinsing steps are omitted, it is obvious that the surfactant and other cleaning components remain on the electronic component after cleaning, which has a great adverse effect on the product.
【０００５】例えば、液晶表示パネルの製造に際して
は、透明電極が形成された２枚の基板間に液晶を封入す
べく、一部開口を残して上下基板をその周縁部で接着剤
により貼り合わせて液晶室を形成し、空の液晶表示パネ
ルを作成する。この空パネルは、真空にした注入室内で
開口部が液晶物質中に浸され、ついで、注入室を大気に
解放することにより、液晶物質が基板間（液晶室内）に
吸引され、開口部をシールすることにより、基板間に液
晶物質の封入された液晶パネルが形成される。しかしな
がら、２枚の液晶パネル基板の接着部の外側には、液晶
パネル基板が微小ギャップで対抗する空隙部の生じるこ
とが避けられない。そのため、上記の空パネルへの液晶
物質の注入時に、毛細管現象により液晶がこの空隙部に
入り込む。この空隙部には、透明電極に信号を印加する
ための電極端子が、各々絶縁を保って高密度に形成され
ていることから、この部分の液晶物質をそのままにして
おくと、液晶物質が大気中の汚染物質を溶解して絶縁不
良を起こしやすい。そこで、空隙部の液晶物質を洗浄除
去することが必要となり、近年、液晶セル用洗浄剤の開
発が活発化してきている。For example, when manufacturing a liquid crystal display panel, in order to seal the liquid crystal between two substrates having transparent electrodes formed thereon, the upper and lower substrates are bonded together at their peripheral edges with an adhesive, leaving some openings. A liquid crystal chamber is formed to create an empty liquid crystal display panel. In this empty panel, the opening is immersed in the liquid crystal substance in the vacuumed injection chamber, and then the injection chamber is exposed to the atmosphere so that the liquid crystal substance is sucked between the substrates (liquid crystal chamber) to seal the opening. By doing so, a liquid crystal panel in which a liquid crystal substance is sealed between the substrates is formed. However, it is unavoidable that a space is formed outside the bonded portion of the two liquid crystal panel substrates so that the liquid crystal panel substrates face each other with a minute gap. Therefore, when the liquid crystal substance is injected into the empty panel, the liquid crystal enters the void due to the capillary phenomenon. Since the electrode terminals for applying signals to the transparent electrodes are formed in the voids at a high density while maintaining insulation, if the liquid crystal substance in this part is left as it is, the liquid crystal substance will be released into the atmosphere. It is easy to dissolve the pollutants inside and cause poor insulation. Therefore, it is necessary to remove the liquid crystal substance in the voids by washing, and in recent years, the development of cleaning agents for liquid crystal cells has been activated.
【０００６】しかし、この空隙部のギャップは１０ミク
ロン以下と狭いため、液晶物質を洗浄した後に洗浄剤が
液晶物質の代りに残留し、液晶物質が残留した場合と全
く同様な悪影響を及ぼす。したがって、洗浄後のすすぎ
工程で、この残留洗浄剤を完全に除去する必要が生じ
る。しかしながら、前述の如く空隙部分が極小であるた
め、すすぎ水の大量消費による経済性の悪化や、過度の
超音波照射によるパネルの破損を余儀なくされている。However, since the gap of the void is as narrow as 10 microns or less, the cleaning agent remains in place of the liquid crystal substance after cleaning the liquid crystal substance, and the same adverse effect as when the liquid crystal substance remains. Therefore, it is necessary to completely remove the residual cleaning agent in the rinse step after cleaning. However, since the voids are extremely small as described above, it is unavoidable that the economy is deteriorated due to the large consumption of rinse water and the panel is damaged due to excessive irradiation of ultrasonic waves.
【０００７】[0007]
【発明が解決しようとする課題】本発明は、液晶表示パ
ネル等の電子部品などの洗浄後のすすぎが速やかに行え
るすすぎ剤、およびそれを用いた洗浄仕上げ方法を提供
するものである。DISCLOSURE OF THE INVENTION The present invention provides a rinsing agent capable of quickly rinsing an electronic component such as a liquid crystal display panel after cleaning, and a cleaning finishing method using the rinsing agent.
【０００８】[0008]
【課題を解決するための手段】本発明のすすぎ剤は、化
２の一般式（Ｉ）で示される化合物の１種あるいは２種
以上を含有することを特徴とする。The rinsing agent of the present invention is characterized by containing one or more compounds represented by the general formula (I) of Chemical formula 2.
【０００９】[0009]
【化２】Ｒ1−Ｏ（ＡＯ）ｎ−Ｒ2 …（Ｉ） （Ｒ1 ：炭素数１〜９のアルキル基またはアルケニル基 Ａ：炭素数２〜４のアルキレン基 ｎ：炭素数２〜４のアルキレンオキシド（ＡＯ）の平均
付加モル数を示し、１〜２０の数。但し、同一のアルキ
レンオキシドが単独で付加していても、２種類以上のア
ルキレンオキシドが混合して付加していてもよい Ｒ2 ：水素または炭素数１〜３のアルキル基）Embedded image R 1 —O (AO) n—R 2 (I) (R 1 : alkyl group or alkenyl group having 1 to 9 carbon atoms A: alkylene group having 2 to 4 carbon atoms n: 2 to carbon atoms 4 shows the average number of moles of alkylene oxide (AO) added, which is 1 to 20. However, even if the same alkylene oxide is added alone, two or more kinds of alkylene oxides are mixed and added. which may R 2: hydrogen or an alkyl group having 1 to 3 carbon atoms)
【００１０】また、本発明の洗浄仕上げ方法は、電子部
品等の被洗物を洗浄剤で洗浄した後、被洗物を上記すす
ぎ剤でリンス処理して、被洗物に残留付着している洗浄
剤成分を除去することを特徴とする。Further, in the cleaning and finishing method of the present invention, after washing an article to be washed such as an electronic component with a cleaning agent, the article to be washed is rinsed with the above rinsing agent and remains adhered to the article to be washed. It is characterized in that the cleaning agent component is removed.
【００１１】[0011]
【発明の実施態様】本発明のすすぎ剤で主活性成分とし
て用いられる一般式（Ｉ）の化合物は、炭素数１〜９の
飽和または不飽和アルコールのアルキレンオキシド付加
物、またはそれらの末端アルキル化物であり、特に、炭
素数１〜６の飽和アルコールのアルキレンオキシド付加
物が好適である。BEST MODE FOR CARRYING OUT THE INVENTION The compound of the general formula (I) used as the main active ingredient in the rinse agent of the present invention is an alkylene oxide adduct of a saturated or unsaturated alcohol having 1 to 9 carbon atoms, or a terminal alkylated product thereof. And an alkylene oxide adduct of a saturated alcohol having 1 to 6 carbon atoms is particularly preferable.
【００１２】一般式（Ｉ）中のＡＯは、エチレンオキシ
ド、プロピレンオキシドまたはブチレンオキシドが単独
で、あるいは混合して付加していることを示し、特にエ
チレンオキシド付加物が好適である。ｎはアルキレンオ
キシドの平均付加モル数を示し、１〜２０、好ましくは
２〜１０である。AO in the general formula (I) indicates that ethylene oxide, propylene oxide or butylene oxide is added alone or in admixture, and an ethylene oxide adduct is particularly preferable. n represents the average number of moles of alkylene oxide added, and is 1 to 20, preferably 2 to 10.
【００１３】本発明のすすぎ剤は、一般式（Ｉ）の化合
物を単独で、あるいは２種以上混合して含むことがで
き、全体として水に溶解する水溶性組成物である。ま
た、必要に応じて、プロピレングリコール、トルエンス
ルホン酸ナトリウム等の通常のハイドロトロープ剤を配
合することができる。The rinsing agent of the present invention is a water-soluble composition which can contain the compound of the general formula (I) alone or in admixture of two or more, and is soluble in water as a whole. If necessary, a usual hydrotrope agent such as propylene glycol or sodium toluene sulfonate can be added.
【００１４】本発明の洗浄仕上げ方法においては、ま
ず、液晶表示パネルや微細加工された電子部品などの被
洗物を、洗浄剤を用いて洗浄する。洗浄剤は、界面活性
剤、あるいは界面活性剤と溶剤および／またはパラフィ
ン等の炭化水素類を含む水系の洗浄剤が好適である。洗
浄剤により洗浄し汚染物が除去された被洗物は、つい
で、本発明のすすぎ剤を含むすすぎ液でリンス処理（す
すぎ処理）が施される。このすすぎ液は、本発明の一般
式（Ｉ）の化合物を５〜１００重量％含む水溶液である
ことが望ましく、好ましくは３０〜６０重量％含む水溶
液である。このリンス処理は、すすぎ液への浸漬処理、
すすぎ液のスプレー処理など適宜の方法により行うこと
ができ、また、すすぎ処理時に超音波を照射することも
できるが、従来のすすぎ処理に比較して短時間で超音波
照射を終了させることが可能である。このリンス処理に
より、被洗物に付着している洗浄剤、あるいはこの洗浄
剤中に取り込まれている汚れ成分をすすぎ落すことがで
きる。これらのリンス処理を行なった後、水あるいは温
水で仕上げすすぎを施すことにより、乾燥工程でシミ等
の発生が全く生じない。In the cleaning and finishing method of the present invention, first, an object to be cleaned such as a liquid crystal display panel and finely processed electronic parts is cleaned with a cleaning agent. The detergent is preferably a surfactant or an aqueous detergent containing a surfactant and a solvent and / or hydrocarbons such as paraffin. The object to be washed, which has been cleaned with a cleaning agent to remove contaminants, is then subjected to a rinse treatment (rinsing treatment) with a rinse liquid containing the rinse agent of the present invention. This rinse solution is preferably an aqueous solution containing 5 to 100% by weight of the compound of the general formula (I) of the present invention, and preferably an aqueous solution containing 30 to 60% by weight. This rinsing treatment is a rinsing liquid immersion treatment,
It can be performed by an appropriate method such as spray treatment of rinsing liquid, and ultrasonic waves can be applied during the rinsing process, but ultrasonic irradiation can be completed in a shorter time than conventional rinsing processes. Is. By this rinsing treatment, the cleaning agent adhering to the object to be washed or the dirt component taken into the cleaning agent can be rinsed off. After these rinsing treatments, finish rinsing with water or warm water is performed, so that no spots are generated in the drying process.
【００１５】[0015]
【発明の効果】本発明によれば、すすぎ剤の主活性成分
として、炭素数１〜９の飽和または不飽和アルコールの
アルキレンオキシド付加物またはその末端アルキル化物
を用いることにより、洗浄後の被洗物に残留付着してい
る洗浄剤成分を速やかに除去して良好な洗い上がりを実
現することができ、液晶表示パネル、精密加工電子部
品、プリント配線基板等の電子部品などの洗浄仕上げに
対する要求品質の高い物品の洗浄に好適である。特に、
液晶表示パネルや微細加工された袋穴等を有する電子部
品など、従来洗浄仕上げ処理が困難であったとされる被
洗物に好適であり、従来は必須とされていた超音波照射
を全く必要とすることなく、あるいは必要な場合であっ
ても簡略化することが可能となる。According to the present invention, by using an alkylene oxide adduct of a saturated or unsaturated alcohol having 1 to 9 carbon atoms or a terminal alkylated product thereof as a main active ingredient of a rinsing agent, it is possible to wash after washing. It is possible to quickly remove the residual cleaning agent component from the product to achieve good cleaning, and the required quality for cleaning and finishing electronic parts such as liquid crystal display panels, precision processed electronic parts, and printed wiring boards. Suitable for cleaning high quality items. In particular,
It is suitable for objects to be washed that have been difficult to wash and finish, such as liquid crystal display panels and electronic parts with microfabricated bag holes. It is possible to simplify without doing or even when necessary.
【００１６】また、洗浄剤として、界面活性剤を含む水
系の洗浄剤を用いた場合の後工程のすすぎ処理に好適で
あり、洗浄仕上げ工程全体として、脱フロン化、水系化
が可能となる。Further, when a water-based cleaning agent containing a surfactant is used as the cleaning agent, it is suitable for a rinsing treatment in a subsequent step, and deflonization and water-based processing can be performed as a whole cleaning and finishing step.
【００１７】[0017]
【実施例】以下の表１および表２に示す組成で、すすぎ
液を調製して本発明のすすぎ剤の有効性を確認し、その
評価結果を同表に示した。ここで、すすぎ効果は、以下
のようにして評価した。EXAMPLE A rinsing solution having the compositions shown in Tables 1 and 2 below was prepared to confirm the effectiveness of the rinsing agent of the present invention, and the evaluation results are shown in the same table. Here, the rinsing effect was evaluated as follows.
【００１８】（１） すすぎ効果の評価方法 上下基板間に空隙部分（間隔：５μｍ）を有する液晶表
示パネルを用意する。以下の組成の洗浄剤Ａ（原液とし
て使用）、洗浄剤Ｂ（水で２０重量％に希釈して使用）
を用い、それぞれの洗浄液中に液晶表示パネルを浸漬
し、５０℃、３分間の超音波照射を行い、空隙部を洗浄
剤で完全に満たす。なお、ＥＯｐはエチレンオキシドの
平均付加モル数を示す。(1) Method of evaluating rinsing effect A liquid crystal display panel having a gap (spacing: 5 μm) between upper and lower substrates is prepared. Detergent A having the following composition (used as a stock solution), Detergent B (used with water diluted to 20% by weight)
The liquid crystal display panel is dipped in each of the cleaning solutions by using, and ultrasonic irradiation is performed at 50 ° C. for 3 minutes to completely fill the voids with the cleaning agent. In addition, EOp shows the average addition mole number of ethylene oxide.
【００１９】 洗浄剤Ａの組成 Ｃ14オレフィン ５０重量％ Ｃ6Ｈ13Ｏ（Ｃ2Ｈ4Ｏ）2Ｈ １０重量％ Ｃ18Ｈ37Ｏ（Ｃ2Ｈ4Ｏ）8Ｈ ２０重量％ Ｃ12Ｈ25Ｏ（Ｃ2Ｈ4Ｏ）15（Ｃ3Ｈ6Ｏ）2Ｈ １０重量％ イオン交換水 １０重量％Composition of Cleaning Agent A C 14 Olefin 50 wt% C 6 H 13 O (C 2 H 4 O) 2 H 10 wt% C 18 H 37 O (C 2 H 4 O) 8 H 20 wt% C 12 H 25 O (C 2 H 4 O) 15 (C 3 H 6 O) 2 H 10 wt% Ion-exchanged water 10 wt%
【００２０】 洗浄剤Ｂの組成 ポリオキシエチレン（ＥＯｐ＝９） ２５重量％ ノニルフェノールエーテル Ｃ6Ｈ13Ｏ（Ｃ2Ｈ4Ｏ）2Ｈ ２０重量％ Ｃ4Ｈ9Ｏ（Ｃ2Ｈ4Ｏ）3Ｈ ２０重量％ Ｃ12Ｈ26 ５重量％ クエン酸・ジエタノールアミン塩 ０．５重量％ イオン交換水 ２９．５重量％Composition of Cleaning Agent B Polyoxyethylene (EOp = 9) 25% by weight Nonylphenol ether C 6 H 13 O (C 2 H 4 O) 2 H 20% by weight C 4 H 9 O (C 2 H 4 O) 3 H 20 wt% C 12 H 26 5 wt% Citric acid / diethanolamine salt 0.5 wt% Ion-exchanged water 29.5 wt%
【００２１】その後、液晶表示パネルを同時に洗浄槽か
ら引き上げ、２５℃の流水で２分間すすぎを行う。別途
調製した表１および表２に示す”すすぎ剤”またはその
水溶液（すすぎ液）を５０℃恒温とする。ブランクとし
て、イオン交換水を同様に恒温とする。前述の如く洗浄
槽から引き上げ流水すすぎを行った液晶表示パネルを、
すすぎ液中に３分間浸漬し、さらに流水で２分間すすぎ
を行う。Thereafter, the liquid crystal display panel is simultaneously pulled out from the cleaning tank and rinsed with running water at 25 ° C. for 2 minutes. The separately prepared "rinsing agent" shown in Tables 1 and 2 or its aqueous solution (rinsing solution) is kept at a constant temperature of 50 ° C. As a blank, ion-exchanged water is also kept at a constant temperature. As mentioned above, the liquid crystal display panel that was pulled up from the washing tank and rinsed with running water
Immerse in the rinse solution for 3 minutes, and rinse with running water for 2 minutes.
【００２２】次ぎに、このすすぎ処理終了後の液晶表示
パネルを１００℃の乾燥器中で３０分間乾燥したのち、
液晶表示パネルの空隙部およびその周辺部を観察し、す
すぎ不良による”シミ”発生度合を目視判定し、以下の
基準で評価して表１および２に示した。なお、○以上が
合格である。 ◎：シミの発生が全く認められない ○：シミの発生がほとんど無い △：シミの発生がやや認められる ×：シミが大量に発生するNext, the liquid crystal display panel after the rinsing treatment is dried in a dryer at 100 ° C. for 30 minutes, and then,
The voids and their surroundings of the liquid crystal display panel were observed, and the degree of occurrence of "spots" due to poor rinsing was visually judged and evaluated according to the following criteria, and shown in Tables 1 and 2. In addition, ◯ or more is a pass. ⊚: No spots are found. ○: Almost no spots are found. Δ: Some spots are found. ×: Many spots are found.
【００２３】[0023]
【表１】 実 施 例 試料No. １ ２ ３ ４ ５ ６ ７ ８ すすぎ液組成(wt％)： CH3O(EO)3H 100 − − − − − 50 − CH3O(PO)1(EO)2H − 100 − − − − − − (CH3)2CHO(EO)2H − − 100 − − − − − C4H9O(EO)3H − − − 100 − − 50 60 CH2=CHCH2O(EO)1H − − − − 100 − − − C2H5O(EO)2C2H5 − − − − − 100 − − C6H13O(EO)2H − − − − − − − − C9H19O(EO)10H − − − − − − − − 水 − − − − − − − 40 評価結果： 洗浄剤Ａ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ 洗浄剤Ｂ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ （註）ＥＯ：エチレンオキシド（C2H4O） ＰＯ：プロピレンオキシド（C3H6O） [Table 1] Practical example Sample No. 1 2 3 4 5 6 7 8 Rinse solution composition (wt%): CH 3 O (EO) 3 H 100 − − − − − − 50 − CH 3 O (PO) 1 ( EO) 2 H − 100 − − − − − − (CH 3 ) 2 CHO (EO) 2 H − − 100 − − − − − C 4 H 9 O (EO) 3 H − − − 100 − − 50 60 CH 2 = CHCH 2 O (EO) 1 H − − − − 100 − − − C 2 H 5 O (EO) 2 C 2 H 5 − − − − − 100 − − C 6 H 13 O (EO) 2 H − − − − − − − − C 9 H 19 O (EO) 10 H − − − − − − − − − Water − − − − − − − 40 Evaluation result: Cleaning agent A ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ Cleaner B ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ (Note) EO: Ethylene oxide (C 2 H 4 O) PO: Propylene oxide (C 3 H 6 O)
【００２４】[0024]
【表２】 [Table 2]
Claims (2)
１種あるいは２種以上を含有することを特徴とするすす
ぎ剤。 【化１】Ｒ1−Ｏ（ＡＯ）ｎ−Ｒ2 …（Ｉ） （Ｒ1 ：炭素数１〜９のアルキル基またはアルケニル基 Ａ：炭素数２〜４のアルキレン基 ｎ：炭素数２〜４のアルキレンオキシド（ＡＯ）の平均
付加モル数を示し、１〜２０の数。但し、同一のアルキ
レンオキシドが単独で付加していても、２種類以上のア
ルキレンオキシドが混合して付加していてもよい Ｒ2 ：水素または炭素数１〜３のアルキル基）1. A rinsing agent containing one or more compounds represented by the general formula (I) of Chemical formula 1. Embedded image R 1 —O (AO) n—R 2 (I) (R 1 : alkyl group or alkenyl group having 1 to 9 carbon atoms A: alkylene group having 2 to 4 carbon atoms n: 2 to carbon atoms 4 shows the average number of moles of alkylene oxide (AO) added, which is 1 to 20. However, even if the same alkylene oxide is added alone, two or more kinds of alkylene oxides are mixed and added. which may R 2: hydrogen or an alkyl group having 1 to 3 carbon atoms)
１に記載のすすぎ剤を用いてすすぎ処理を行うことを特
徴とする洗浄仕上げ方法。2. A method of cleaning and finishing, comprising: washing an object to be washed with a cleaning agent, and then rinsing with the rinsing agent according to claim 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11106093A JP3461526B2 (en) | 1993-04-13 | 1993-04-13 | Rinse agent and cleaning finish method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11106093A JP3461526B2 (en) | 1993-04-13 | 1993-04-13 | Rinse agent and cleaning finish method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH06299200A true JPH06299200A (en) | 1994-10-25 |
| JP3461526B2 JP3461526B2 (en) | 2003-10-27 |
Family
ID=14551391
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11106093A Expired - Fee Related JP3461526B2 (en) | 1993-04-13 | 1993-04-13 | Rinse agent and cleaning finish method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3461526B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09217087A (en) * | 1996-02-13 | 1997-08-19 | Lion Corp | Cleansing agent composition and the cleansing method using the same |
| US5958298A (en) * | 1994-10-13 | 1999-09-28 | Kao Corporation | Anti-corrosive draining agent and rinsing process |
| JP2007154238A (en) * | 2005-12-02 | 2007-06-21 | Kao Corp | Rinse agent composition for steel strip |
| KR100748257B1 (en) * | 2005-05-27 | 2007-08-09 | 칭-린 쿠오 | A kind of detergent composition and its cleansing method |
-
1993
- 1993-04-13 JP JP11106093A patent/JP3461526B2/en not_active Expired - Fee Related
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5958298A (en) * | 1994-10-13 | 1999-09-28 | Kao Corporation | Anti-corrosive draining agent and rinsing process |
| MY119363A (en) * | 1994-10-13 | 2005-05-31 | Kao Corp | Anti-corrosive draining agent and rinsing process |
| JPH09217087A (en) * | 1996-02-13 | 1997-08-19 | Lion Corp | Cleansing agent composition and the cleansing method using the same |
| US6007638A (en) * | 1996-02-13 | 1999-12-28 | Lion Corporation | Detergent composition and cleaning method using the same |
| KR100748257B1 (en) * | 2005-05-27 | 2007-08-09 | 칭-린 쿠오 | A kind of detergent composition and its cleansing method |
| JP2007154238A (en) * | 2005-12-02 | 2007-06-21 | Kao Corp | Rinse agent composition for steel strip |
| JP4549965B2 (en) * | 2005-12-02 | 2010-09-22 | 花王株式会社 | Rinsing agent composition for steel strip |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3461526B2 (en) | 2003-10-27 |
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