JPH06278042A - Abrasive material - Google Patents
Abrasive materialInfo
- Publication number
- JPH06278042A JPH06278042A JP9525593A JP9525593A JPH06278042A JP H06278042 A JPH06278042 A JP H06278042A JP 9525593 A JP9525593 A JP 9525593A JP 9525593 A JP9525593 A JP 9525593A JP H06278042 A JPH06278042 A JP H06278042A
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- abrasive
- layer
- abrasive material
- polishing layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、例えば、フロッピーデ
ィスク，ビデオ用テープ，ハードディスク，光ディスク
等の磁気記録媒体、磁気ヘッドや光ディスクのスタンパ
ー等の研磨に使用される研磨材に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an abrasive material used for polishing magnetic recording media such as floppy disks, video tapes, hard disks and optical disks, magnetic heads and stampers for optical disks.
【０００２】[0002]
【従来の技術】磁気記録媒体等の表面仕上げや精密仕上
げに使用される研磨材は、例えばポリエステルフィルム
等による可撓性の研磨材用基材と該研磨材用基材に形成
されている研磨層とからなり、研磨層が硬度の高い無機
質微粉末からなる研磨材粒子をバインダー用樹脂溶液中
に分散させた塗工剤の塗工層として形成されている。2. Description of the Related Art Abrasive materials used for surface finishing and precision finishing of magnetic recording media are, for example, flexible base materials for abrasive materials such as polyester films and polishing materials formed on the base materials for abrasive materials. The polishing layer is formed as a coating layer of a coating agent in which abrasive particles made of inorganic fine powder having high hardness are dispersed in a resin solution for a binder.
【０００３】[0003]
【発明が解決しようとする課題】前記従来の研磨材を利
用する研磨作業において、磁気ヘッドや光ディスクのス
タンパー等の研磨は、通常、荒削り研磨、中仕上げ研
磨、仕上げ研磨からなる数段階の研磨工程を経て行なわ
れている。また、例えば、フロッピーディスク，ビデオ
用テープ，ハードディスク，光ディスク等の磁気記録媒
体に対しては、領域ごとに異なる精度の研磨仕上げがな
されている。In the above-mentioned conventional polishing work using an abrasive, polishing of a magnetic head, a stamper of an optical disk, etc. is usually carried out in several steps including rough polishing, intermediate finish polishing and finish polishing. Has been carried out. Further, for example, a magnetic recording medium such as a floppy disk, a video tape, a hard disk, and an optical disk is subjected to polishing finish with different accuracy for each area.
【０００４】これらの各研磨作業は、研磨材粒子が異な
る複数種の研磨材を利用して行なわれており、研磨作業
中に研磨材を複数回に亙って交換しなければならない煩
わしさがある。Each of these polishing operations is carried out by utilizing a plurality of types of abrasives having different abrasive particles, and it is troublesome to replace the abrasives a plurality of times during the polishing operation. is there.
【０００５】これに対して本発明は、例えば、荒削り研
磨、中仕上げ研磨、仕上げ研磨等の数段階の研磨工程を
行なう場合、あるいは、被研磨体の領域ごとに異なる精
度の研磨仕上げを行なう場合にも、研磨材を取り替える
必要がなく、効率良く研磨作業を行なうことのできる研
磨材を提供することを目的とする。On the other hand, the present invention, for example, when performing several steps of polishing steps such as rough cutting polishing, intermediate finishing polishing, and finishing polishing, or when performing polishing finishing with different precision for each region of the object to be polished. Moreover, it is an object of the present invention to provide an abrasive material that does not require replacement of the abrasive material and can efficiently perform the polishing operation.
【０００６】[0006]
【課題を解決するための手段】本発明の研磨材は、研磨
材用基材と、該研磨材用基材の上に形成されている研磨
層とを有する研磨材において、前記研磨層が複数の領域
に形成されており、隣接する領域の研磨層同士は、研磨
材粒子の種類あるいは研磨材粒子の粒度の少なくともい
ずれかが相違して形成されているものである。The abrasive of the present invention comprises an abrasive base material and an abrasive layer formed on the abrasive base material, wherein the abrasive layers are plural. The abrasive layers in the adjacent areas are formed such that the types of the abrasive particles and / or the particle size of the abrasive particles are different from each other.
【０００７】本発明の研磨材における各領域の研磨層
は、当該領域の全面に研磨層形成用の塗工剤を塗工して
形成しても良いし、あるいは、当該領域内に例えば斜パ
ターン状、市松模様状等の部分的に研磨層形成用の塗工
剤を塗工して形成しても良い。The polishing layer in each region of the abrasive material of the present invention may be formed by coating the entire surface of the region with a coating agent for forming a polishing layer, or in the region, for example, an oblique pattern. It may be formed by partially applying a coating agent for forming a polishing layer, such as a checkerboard pattern or a checkerboard pattern.
【０００８】本発明の研磨材における研磨材用基材に
は、紙、不織布、合成紙、または、機械的強度，寸法安
定性，耐熱性等において優れた性質を有する厚さ１２〜
１５０μ程度のプラスチックフィルム、例えば、ポリエ
チレンテレフタレート，ポリプロピレン，ポリカーボネ
ート，ジ−酢酸アセテート，トリ−酢酸アセテート，ポ
リエチレン，ポリブチレンテレフタレート，ポリアリレ
ート等によるプラスチックフィルムが利用される。The base material for the abrasive material in the abrasive material of the present invention is paper, non-woven fabric, synthetic paper or a thickness of 12 to 12 having excellent properties such as mechanical strength, dimensional stability and heat resistance.
A plastic film of about 150 μm, for example, a plastic film made of polyethylene terephthalate, polypropylene, polycarbonate, di-acetate acetate, tri-acetate acetate, polyethylene, polybutylene terephthalate, polyarylate or the like is used.
【０００９】研磨材用基材の上の研磨層は、一般的に、
１次粒子の平均粒径が０．１〜２０μの例えば酸化アル
ミニウム，炭化珪素，窒化珪素，酸化ジルコニウム，酸
化クロム，酸化鉄，ダイヤモンド，窒化ホウ素，エメリ
ー，酸化セリウム等による無機質微粉末からなる研磨材
粒子と、例えば、ポリエステル樹脂，ブチラール樹脂，
塩化ビニル−酢酸ビニル共重合体樹脂，アクリル樹脂，
ウレタン樹脂，ポリアミド樹脂，エポキシ樹脂，硝化
綿，塩化ゴム等による単独樹脂または２種以上の混合樹
脂からなるバインダー用樹脂とを必須の成分として含有
する塗工剤により、厚さ５〜１００μ程度に形成され
る。The polishing layer on the substrate for the abrasive is generally
Polishing of an inorganic fine powder having an average primary particle diameter of 0.1 to 20 μm, for example, aluminum oxide, silicon carbide, silicon nitride, zirconium oxide, chromium oxide, iron oxide, diamond, boron nitride, emery, cerium oxide, etc. Material particles such as polyester resin, butyral resin,
Vinyl chloride-vinyl acetate copolymer resin, acrylic resin,
A coating agent containing as essential components a urethane resin, a polyamide resin, an epoxy resin, a nitrified cotton, a chlorinated rubber, and the like, or a binder resin consisting of a mixture of two or more resins, to a thickness of about 5-100 μm. It is formed.
【００１０】研磨層には、研磨材粒子である無機質微粉
末がバインダー用樹脂１００重量部に対して１００〜１
４００重量部程度の割合で使用される。In the polishing layer, 100 to 1 part of the inorganic fine powder as abrasive particles is used with respect to 100 parts by weight of the binder resin.
It is used in a proportion of about 400 parts by weight.
【００１１】なお、研磨層に耐摩耗性と耐熱性とに優れ
た性質を導入するために、トルイレンジイソシアナート
（ＴＤＩ），キシリレンジイソシアナート（ＸＤＩ），
ヘキサメチレンジイソシアナート（ＨＭＤＩ）等のイソ
シアナート系硬化剤を添加した研磨層形成用の塗工剤を
利用することにより、該塗工剤中の前記バインダー用樹
脂における−ＯＨ，−ＮＨ2 ，−ＣＯＯＨ等の官能基と
硬化剤とを反応させた熱硬化型樹脂層からなる研磨層に
するのが好ましい。In order to introduce excellent properties of abrasion resistance and heat resistance into the polishing layer, toluylene diisocyanate (TDI), xylylene diisocyanate (XDI),
By utilizing a coating agent for abrasive layer formed with the addition of isocyanate-based curing agent such as hexamethylene diisocyanate (HMDI), -OH in the binder resin in the coating engineering agents, -NH 2, It is preferable that the polishing layer is a thermosetting resin layer obtained by reacting a functional group such as —COOH with a curing agent.
【００１２】熱硬化型樹脂層からなる研磨層を形成する
際のイソシアナート系硬化剤の添加量は、［イソシアナ
ート基（−ＮＣＯ）／バインダー用樹脂における官能
基］で表示される当量比が０．５〜１０程度とされてい
ることが好ましい。The amount of the isocyanate-based curing agent added when forming the polishing layer comprising the thermosetting resin layer is determined by the equivalent ratio represented by [isocyanate group (-NCO) / functional group in binder resin]. It is preferably about 0.5 to 10.
【００１３】さらに、研磨層を形成する塗工剤中には、
必要に応じて、分散剤，帯電防止剤，染料等が添加さ
れ、例えばグラアビア印刷，シルク印刷，リバースロー
ルコート，ロールコート，バーコート，コンマコート，
ブレードコート，押出しコート法等により形成される。Further, in the coating material for forming the polishing layer,
If necessary, a dispersant, an antistatic agent, a dye, etc. are added, and for example, gravure printing, silk printing, reverse roll coating, roll coating, bar coating, comma coating,
It is formed by a blade coating method, an extrusion coating method, or the like.
【００１４】研磨層を形成するための塗工剤の溶剤に
は、バインダー用樹脂の種類に応じて、例えば、トルエ
ン，キシレン，メチルエチルケトン，メチルイソブチル
ケトン，アノン，イソプロピルアルコール，酢酸エチ
ル，酢酸ブチル，エタノール等からなる単独溶剤あるい
はこれらの２種以上の混合溶剤等が使用される。The solvent of the coating agent for forming the polishing layer may be, for example, toluene, xylene, methyl ethyl ketone, methyl isobutyl ketone, anone, isopropyl alcohol, ethyl acetate, butyl acetate, depending on the type of binder resin. A single solvent consisting of ethanol or the like, or a mixed solvent of two or more kinds of these is used.
【００１５】さらに、本発明の研磨材においては、前記
研磨層は複数の領域に形成されており、隣接する領域の
研磨層同士は、研磨材粒子の種類あるいは研磨材粒子の
粒度の少なくともいずれかが相違して形成されている。
例えば、テープ状をなす研磨材用基材に対して、該テー
プ状の研磨材用基材の長さ方向に平行に、研磨材粒子の
種類あるいは研磨材粒子の粒度が相違するそれぞれの研
磨層の領域が形成されていたり、あるいは、テープ状の
研磨材用基材の幅方向に対して平行に、研磨材粒子の種
類あるいは研磨材粒子の粒度が相違するそれぞれの研磨
層の領域が繰り返して形成される等している。Further, in the polishing material of the present invention, the polishing layer is formed in a plurality of regions, and the polishing layers in the adjacent regions have at least one of the type of abrasive particles and the particle size of the abrasive particles. Are formed differently.
For example, with respect to a tape-shaped abrasive base material, respective polishing layers having different types of abrasive particles or different abrasive particle sizes in parallel to the length direction of the tape-shaped abrasive base material. Area is formed, or the areas of the respective polishing layers in which the types of abrasive particles or the particle sizes of abrasive particles are different are repeated in parallel to the width direction of the tape-shaped abrasive base material. Is formed.
【００１６】なお、隣接する研磨層の領域同士の間に
は、研磨層の領域を区画するような研磨層の無い帯域が
存在していても良い。It should be noted that a zone without a polishing layer may be present between adjacent regions of the polishing layer to partition the regions of the polishing layer.
【００１７】また、本発明の研磨材において、研磨層の
各領域および研磨層の存在しない帯域を、研磨材用基材
上に所定のピッチで形成しておくようにすれば、研磨作
業の際に研磨材を機械的に自動送り制御することができ
る。Further, in the polishing material of the present invention, if each region of the polishing layer and the zone where the polishing layer does not exist are formed on the polishing material base material at a predetermined pitch, during polishing work. The abrasive can be mechanically and automatically controlled.
【００１８】以上の通りの構成による本発明の研磨材
は、テープ状であってもあるいは枚葉状であっても良
い。The abrasive material of the present invention having the above-described structure may be in the form of a tape or a sheet.
【００１９】[0019]
【作用】本発明は、研磨材用基材と、該研磨材用基材の
上に形成されている研磨層とを有する研磨材において、
前記研磨層が複数の領域に形成されており、隣接する領
域の研磨層同士は、研磨材粒子の種類あるいは研磨材粒
子の粒度の少なくともいずれかが相違している。The present invention provides an abrasive having a base material for abrasives and a polishing layer formed on the base material for abrasives,
The polishing layer is formed in a plurality of regions, and the polishing layers in the adjacent regions are different from each other in at least either the type of abrasive particles or the particle size of the abrasive particles.
【００２０】したがって、本発明の研磨材を利用する研
磨作業においては、荒削り研磨、中仕上げ研磨、仕上げ
研磨からなる数段階の研磨工程を実施する場合、あるい
は、被研磨体の領域ごとに異なる精度の研磨仕上げを行
なう場合等においても、研磨材を交換する必要がなく、
手際の良い研磨操作が行なえる。Therefore, in the polishing operation using the abrasive of the present invention, when performing several steps of polishing steps including rough polishing, intermediate finishing polishing, and final polishing, or different accuracy for each region of the object to be polished. It is not necessary to replace the abrasive material even when performing the polishing finish of
You can perform sophisticated polishing operations.
【００２１】[0021]
【実施例】以下、本発明の研磨材の具体的な構成を製造
実施例を以って説明する。EXAMPLES The specific constitution of the abrasive material of the present invention will be described below with reference to production examples.
【００２２】実施例１ 「研磨層用の塗工剤［ａ］の製造」線状飽和ポリエステ
ル樹脂「東洋紡績 (株) ：バイロン＃２８０ 」６０重
量部とトルエン９０重量部とメチルエチルケトン９０重
量部とからなる樹脂溶液中に、酸化アルミニウム微粉末
「昭和電工 (株) ：ＷＡ＃６０００」２００重量部を添
加してサンドミルで良く分散させた後、さらに、キシリ
レンジイソシアナート「ザ・インクテック (株) ：ＸＥ
Ｌ硬化剤（Ｄ）」１０重量部を添加し、これをトルエン
とメチルエチルケトンとの等量混合溶媒で希釈すること
により、粘度１００ｃｐｓの研磨層用の塗工剤［ａ］を
得た。Example 1 "Production of coating agent [a] for polishing layer" 60 parts by weight of linear saturated polyester resin "Toyo Boseki Co., Ltd .: Byron # 280", 90 parts by weight of toluene, and 90 parts by weight of methyl ethyl ketone 200 parts by weight of aluminum oxide fine powder "Showa Denko KK: WA # 6000" was added to a resin solution consisting of and dispersed well in a sand mill, and then xylylene diisocyanate "The Inktech Co., Ltd. ): XE
10 parts by weight of "L curing agent (D)" was added, and this was diluted with an equal amount mixed solvent of toluene and methyl ethyl ketone to obtain a coating agent [a] for a polishing layer having a viscosity of 100 cps.
【００２３】「研磨層用の塗工剤［ｂ］の製造」研磨層
用の塗工剤［ａ］の製造工程において、酸化アルミニウ
ム微粉末「昭和電工 (株) ：ＷＡ＃６０００」の代わり
に、酸化アルミニウム微粉末「昭和電工(株) ：ＷＡ＃
３０００」を使用することにより、粘度１００ｃｐｓの
研磨層用の塗工剤［ｂ］を得た。"Manufacture of coating agent [b] for polishing layer" In the manufacturing process of coating agent [a] for polishing layer, instead of aluminum oxide fine powder "Showa Denko KK: WA # 6000" , Fine powder of aluminum oxide "Showa Denko KK: WA #
By using "3000", a coating agent [b] for a polishing layer having a viscosity of 100 cps was obtained.
【００２４】「研磨層用の塗工剤［ｃ］の製造」研磨層
用の塗工剤［ａ］の製造工程において、酸化アルミニウ
ム微粉末「昭和電工 (株) ：ＷＡ＃６０００」の代わり
に、酸化アルミニウム微粉末「昭和電工(株) ：ＷＡ＃
６００」を使用することにより、粘度１００ｃｐｓの研
磨層用の塗工剤［ｃ］を得た。"Production of coating agent [c] for polishing layer" In the process of producing coating agent [a] for polishing layer, instead of aluminum oxide fine powder "Showa Denko KK: WA # 6000" , Fine powder of aluminum oxide "Showa Denko KK: WA #
By using "600", a coating agent [c] for a polishing layer having a viscosity of 100 cps was obtained.
【００２５】「研磨材の製造」［図１］〜［図２］にお
いて、厚さ２５μのテープ状をなすポリエチレンテレフ
タレートフィルムからなる研磨材用基材２の片側表面
に、前記した研磨層用の塗工剤［ａ］、研磨層用の塗工
剤［ｂ］、研磨層用の塗工剤［ｃ］をグラビア印刷法に
て塗工，乾燥し、さらに、５０℃の雰囲気中にて５日間
のエージング処理に付すことにより、塗工剤［ａ］によ
る研磨層３ａと、塗工剤［ｂ］による研磨層３ｂと、塗
工剤［ｃ］による研磨層３ｃとを形成し、符号１で表示
される本発明の実施例品である研磨材を得た。In "Manufacture of Abrasive Material" [Fig. 1] to [Fig. 2], one side surface of the abrasive material base material 2 made of a tape-shaped polyethylene terephthalate film having a thickness of 25 µ is used for the above-mentioned abrasive layer. The coating agent [a], the coating agent for the polishing layer [b], and the coating agent for the polishing layer [c] are applied by a gravure printing method and dried, and further, in an atmosphere of 50 ° C. for 5 minutes. By subjecting it to aging treatment for a day, a polishing layer 3a made of the coating agent [a], a polishing layer 3b made of the coating agent [b], and a polishing layer 3c made of the coating agent [c] are formed. An abrasive, which is an example product of the present invention represented by, was obtained.
【００２６】[0026]
【発明の効果】本発明の研磨材を利用する研磨作業にお
いては、例えば、荒削り研磨、中仕上げ研磨、仕上げ研
磨等の数段階の研磨工程を行なう場合、あるいは、被研
磨体の領域ごとに異なる精度の研磨仕上げを行なう場合
にも、研磨材を取り替える必要がなく、効率の良い研磨
作業を行なうことができる。EFFECTS OF THE INVENTION In the polishing operation using the abrasive of the present invention, for example, when performing several steps of polishing steps such as rough cutting polishing, intermediate polishing, and final polishing, or different for each region of the object to be polished. Even when performing precision polishing finishing, it is not necessary to replace the polishing material, and efficient polishing work can be performed.
【図１】本発明の研磨材の１実施例品の平面図である。FIG. 1 is a plan view of an example of an abrasive material of the present invention.
【図２】本発明の研磨材の１実施例品の模型断面図であ
る。FIG. 2 is a model cross-sectional view of one example of the abrasive material of the present invention.
１：研磨材 ２：研磨材用基材 ３ａ，３ｂ，３ｃ：研磨層 1: Abrasive material 2: Abrasive base material 3a, 3b, 3c: Abrasive layer
Claims (1)
に形成されている研磨層とを有する研磨材において、前
記研磨層が複数の領域に形成されており、隣接する領域
の研磨層同士は、研磨材粒子の種類あるいは研磨材粒子
の粒度の少なくともいずれかが相違して形成されている
ことを特徴とする研磨材。1. A polishing material having a polishing material base material and a polishing layer formed on the polishing material base material, wherein the polishing layer is formed in a plurality of regions, and the regions are adjacent to each other. The polishing layers are formed such that at least one of the types of abrasive particles and the particle size of the abrasive particles are different from each other.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9525593A JPH06278042A (en) | 1993-03-30 | 1993-03-30 | Abrasive material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9525593A JPH06278042A (en) | 1993-03-30 | 1993-03-30 | Abrasive material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH06278042A true JPH06278042A (en) | 1994-10-04 |
Family
ID=14132658
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9525593A Pending JPH06278042A (en) | 1993-03-30 | 1993-03-30 | Abrasive material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH06278042A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1997006926A1 (en) * | 1995-08-11 | 1997-02-27 | Minnesota Mining And Manufacturing Company | Method of making a coated abrasive article having multiple abrasive natures |
| US5928394A (en) * | 1997-10-30 | 1999-07-27 | Minnesota Mining And Manufacturing Company | Durable abrasive articles with thick abrasive coatings |
| US6080215A (en) * | 1996-08-12 | 2000-06-27 | 3M Innovative Properties Company | Abrasive article and method of making such article |
| JP2008188743A (en) * | 2007-02-07 | 2008-08-21 | Denki Kagaku Kogyo Kk | Polishing sheet, manufacturing method for polishing sheet, polishing method for semiconductor wafer, and spraying device |
| US9011211B2 (en) | 2010-03-29 | 2015-04-21 | Christian T. Zyniecki | Sandpaper and method of use thereof |
-
1993
- 1993-03-30 JP JP9525593A patent/JPH06278042A/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1997006926A1 (en) * | 1995-08-11 | 1997-02-27 | Minnesota Mining And Manufacturing Company | Method of making a coated abrasive article having multiple abrasive natures |
| WO1997006928A1 (en) * | 1995-08-11 | 1997-02-27 | Minnesota Mining And Manufacturing Company | Abrasive article and method of making such article |
| US6277160B1 (en) | 1995-08-11 | 2001-08-21 | 3M Innovative Properties Company | Abrasive article and method of making such article |
| US6080215A (en) * | 1996-08-12 | 2000-06-27 | 3M Innovative Properties Company | Abrasive article and method of making such article |
| US5928394A (en) * | 1997-10-30 | 1999-07-27 | Minnesota Mining And Manufacturing Company | Durable abrasive articles with thick abrasive coatings |
| JP2008188743A (en) * | 2007-02-07 | 2008-08-21 | Denki Kagaku Kogyo Kk | Polishing sheet, manufacturing method for polishing sheet, polishing method for semiconductor wafer, and spraying device |
| US9011211B2 (en) | 2010-03-29 | 2015-04-21 | Christian T. Zyniecki | Sandpaper and method of use thereof |
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